CN116177504A - Substitution method of purification system of argon recovery device - Google Patents
Substitution method of purification system of argon recovery device Download PDFInfo
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- CN116177504A CN116177504A CN202111427116.XA CN202111427116A CN116177504A CN 116177504 A CN116177504 A CN 116177504A CN 202111427116 A CN202111427116 A CN 202111427116A CN 116177504 A CN116177504 A CN 116177504A
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- Prior art keywords
- argon
- recovery device
- valve
- purification system
- seconds
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 title claims abstract description 134
- 229910052786 argon Inorganic materials 0.000 title claims abstract description 67
- 238000011084 recovery Methods 0.000 title claims abstract description 36
- 238000000746 purification Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000006467 substitution reaction Methods 0.000 title description 2
- 238000001179 sorption measurement Methods 0.000 claims abstract description 36
- 239000007789 gas Substances 0.000 claims abstract description 18
- 238000011069 regeneration method Methods 0.000 claims abstract description 11
- 230000008929 regeneration Effects 0.000 claims abstract description 10
- 238000009835 boiling Methods 0.000 claims abstract description 5
- 239000002994 raw material Substances 0.000 claims description 17
- 230000003584 silencer Effects 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 3
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 239000006096 absorbing agent Substances 0.000 claims 1
- 238000004886 process control Methods 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 9
- 238000004519 manufacturing process Methods 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000004134 energy conservation Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0036—Physical processing only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
Whether the purification system in the argon recovery device is regenerated thoroughly or not greatly influences the stable operation of a subsequent cryogenic rectification system and the stable external supply of product argon. The invention provides a replacement method for a purification system of an argon recovery device, wherein the regeneration gas of the purification system of the argon recovery device is generally dry compressed air or nitrogen, and is replaced by dry nitrogen after regeneration is completed, but a certain temperature difference exists between the boiling point of nitrogen and the boiling point of argon, and after the replacement of nitrogen, process argon enters a low-temperature rectifying tower and cannot be completely condensed, so that the fluctuation of the rectifying working condition in the low-temperature rectifying tower is large, and the output and external supply of the argon product are seriously influenced. The pressure relief replacement of the process argon is added after the original regeneration replacement step, the nitrogen in the regeneration adsorption tank of the purification system is replaced by the process argon after the 2 times of pressure relief replacement of the process argon, the cryogenic rectification system operates stably after the purification system is switched, and the product argon can be produced and supplied externally, so that the operation stability and reliability of the argon recovery device are improved, and the argon recovery rate of the argon recovery device is improved.
Description
Technical Field
The invention belongs to the field of air separation, relates to an argon recovery device, and particularly relates to regeneration and replacement of a purification system in the argon recovery device.
Background
In recent years, the solar photovoltaic power generation industry is rapidly developed, the argon demand is rapidly increased, the price of the argon is continuously increased, even the situation of supply and demand is generated, and the development of the photovoltaic industry in China is seriously influenced and even restricted. In order to promote the national productivity upgrade and realize sustainable utilization of energy, an argon recovery technology is produced. However, this design has the following problems and disadvantages: the fluctuation of the cryogenic rectification system is larger when the purification system of the argon recovery device is switched, and the fluctuation of the output quantity of the product argon is larger when the purification system of the argon recovery device is switched, so that the recovery rate of the argon is lower.
Disclosure of Invention
In order to solve the problems, the invention provides a replacement method for a purification system of an argon recovery device, which aims to stabilize a low-temperature rectification system of the argon recovery device and produce argon as a product, improve the recovery rate of the argon recovery device and achieve the purposes of energy conservation and efficiency improvement.
In order to achieve the above object, the present invention provides a replacement method for a purification system of an argon recovery device, which is implemented as follows: the purification system of the argon recovery device adopts a A, B adsorption tank to switch regeneration, the regenerated gas is generally dry compressed air or nitrogen, the regenerated gas is replaced by dry nitrogen after the regeneration is completed, but a certain temperature difference exists between the boiling point of the nitrogen and the boiling point of the argon, the argon is added for replacement twice after the nitrogen is replaced, the rectification in a low-temperature rectifying tower is stable after the replacement, and the product argon can be stably produced and supplied.
The purification system of the argon recovery device mainly adsorbs and purifies moisture, carbon dioxide, hydrocarbon and the like in raw material argon, and mainly comprises an A adsorption tank, a B adsorption tank, an electric heater, a control valve pipeline and the like, and the purification system A, B adsorption tank is switched to finish the purification of the raw material argon. When the adsorption tank A is in adsorption work, the adsorption tank B is regenerated, and the regeneration steps are as follows: decompression, heating, cold blowing, replacement, pressure equalizing and switching. And (3) feeding the raw material argon purified by the purification system into a subsequent cryogenic rectification system, and compressing and externally supplying the qualified product argon. Taking the adsorption operation of the adsorption tank A as an example, the regeneration of the adsorption tank B is carried out, and the regeneration procedure of the adsorption tank B is as follows:
decompression, raw material argon enters an adsorption tank A through a V1 valve, enters a subsequent cryogenic rectification system to participate in production through a V3 after adsorption, and gas absorbed and saturated by an adsorption tank B enters a silencer C2 through a V6 valve to be exhausted;
heating, wherein raw material argon enters an adsorption tank A through a V1 valve, is absorbed and then enters a subsequent low-temperature rectification system to participate in production through a V3, and regenerated gas enters an electric heater E through a V10 valve, is heated and then enters an adsorption tank B through a V8 valve, and then enters a silencer C2 through a V6 valve to be emptied;
cold blowing, wherein raw material argon enters an adsorption tank A through a V1 valve, is absorbed and then enters a subsequent low-temperature rectification system to participate in production through a V3, and regenerated gas enters an electric heater E (the heater does not work) through a V10 valve, enters an adsorption tank B through a V8 valve and then enters a silencer C2 through a V6 valve to be exhausted;
the method comprises the steps of replacing, enabling raw material argon to enter an A adsorption tank through a V1 valve, enabling the raw material argon to enter a subsequent low-temperature rectification system to participate in production after being adsorbed, enabling replacement gas to enter a B adsorption tank through a V9 valve to replace regenerated gas in the replacement gas, enabling the replacement gas to enter a silencer C2 through a V6 valve to be emptied, and enabling the regenerated gas to enter a silencer C1 through a V13 valve to be emptied;
equalizing pressure, enabling raw material argon to enter an adsorption tank A through a V1 valve, enabling the raw material argon to enter a subsequent cryogenic rectification system to participate in production after being adsorbed, enabling the raw material argon to enter an adsorption tank B through a V9 valve to boost pressure, enabling regenerated gas to enter a silencer C1 through a V13 valve to be exhausted;
switching, wherein raw material argon enters a A, B adsorption tank through a V1 valve and a V2 valve respectively, is absorbed, then enters a subsequent cryogenic rectification system through V3 and V4 to participate in production, and the regenerated gas enters a silencer C1 through a V13 valve to be exhausted;
because the invention adds the replacement step, the regenerative adsorption tank is thoroughly replaced by adopting the raw material argon gas twice, thereby the following beneficial effects can be obtained: when the purification system is switched, the cryogenic rectification system of the argon recovery device works stably, the argon recovery device can stably produce qualified product argon, the recovery rate of the argon recovery device is improved, and the purposes of energy conservation and efficiency improvement are achieved.
Drawings
The invention is described in further detail below with reference to the drawings, but is not intended to limit the scope of the invention.
FIG. 1 is a schematic diagram of the present invention, and should not be construed as limiting the invention, and the names of the related devices in FIG. 1 are defined as follows for better clarity of description.
Device name:
tank A, adsorption tank B, adsorption tank C1 and silencer
C2 muffler E electric heater
Detailed Description
As shown in FIG. 1, the preferred embodiment of the invention can correspondingly adjust and control the displacement time of the adsorption tanks with different working conditions and different capacities.
The working principle and working process of the invention are as follows:
12000Nm3/h argon recovery device, the purification system A, B adsorption tank is not replaced by raw material argon when in switching operation, the yield of the produced argon is 10700Nm3/h, the recovery rate is about 90%, and with reference to figure 1, after the replacement step is added, the yield of the produced argon is 11500Nm3/h, and the recovery rate is about 95%.
The specific replacement steps are as follows:
step S1, 18% opening of a V9 valve for 420 seconds to charge the B adsorption tank with 40Kpa;
step S2: after 420 seconds the V9 valve is closed;
step S3: the V6 valve is closed after being fully opened and discharged for 30 seconds;
s4, a step of S4; the V9 valve is 18 percent opened for 420 seconds to charge the B adsorption tank with 40Kpa;
step S5: after 420 seconds the V9 valve is closed;
step S6: the V6 valve is closed after being fully opened and discharged for 30 seconds;
the regenerated gas of the raw materials in the adsorption tank B is thoroughly replaced after twice replacement, when the pressure equalization and the switching work are carried out, the low-temperature rectification system of the argon recovery device stably works and produces qualified product argon when the pressure equalization and the switching work are carried out, the recovery rate of the argon recovery device is improved, and the replacement time can be adjusted according to the volumes of different adsorption tanks.
Claims (7)
1. An argon recovery device purification system displacement device, comprising: adsorber, electric heater, muffler and piping and process control valves connecting these devices
As shown in figure 1
An absorber comprises an argon recovery device for absorbing A tank and B tank
An electric heater for heating regenerated gas
Silencer for reducing noise generated in gas emptying
And the control valve is used for controlling the state of the switching process of the purification system.
2. The method for replacing the purification system of the argon recovery device is characterized by comprising the following steps of:
step S1, 18% opening of a V9 valve for 420 seconds to charge the B adsorption tank with 40Kpa;
step S2: after 420 seconds the V9 valve is closed;
step S3: the V6 valve is closed after being fully opened and discharged for 30 seconds;
s4, a step of S4; the V9 valve is 18 percent opened for 420 seconds to charge the B adsorption tank with 40Kpa;
step S5: after 420 seconds the V9 valve is closed;
step S6: the V6 valve was closed after 30 seconds of full open drain.
3. The method according to claim 2, wherein in the step S1, a raw material argon having a low boiling point is selected.
4. The method according to claim 2, wherein in the step S1, the V9 valve is 18% opened for 420 seconds to charge the B canister with raw material argon gas by 40Kpa.
5. The method according to claim 2, wherein in said step S2, the V9 valve is closed after 420 seconds.
6. The method according to claim 2, wherein in the step S3, the V6 valve is closed after being fully opened for 30 seconds.
7. The method for replacing a purification system of an argon recovery device according to claim 4, 5 or 6, wherein the regeneration adsorption tank of the purification system of the lower argon recovery device is subjected to the cycle of pressure relief, heating, cold blowing, replacement, pressure equalizing and switching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111427116.XA CN116177504A (en) | 2021-11-28 | 2021-11-28 | Substitution method of purification system of argon recovery device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111427116.XA CN116177504A (en) | 2021-11-28 | 2021-11-28 | Substitution method of purification system of argon recovery device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116177504A true CN116177504A (en) | 2023-05-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111427116.XA Pending CN116177504A (en) | 2021-11-28 | 2021-11-28 | Substitution method of purification system of argon recovery device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5125934A (en) * | 1990-09-28 | 1992-06-30 | The Boc Group, Inc. | Argon recovery from argon-oxygen-decarburization process waste gases |
| CN102583281A (en) * | 2012-03-23 | 2012-07-18 | 杭州杭氧股份有限公司 | Method and device for recovering and purifying argon in monocrystalline silicon production |
| US20140245782A1 (en) * | 2013-03-01 | 2014-09-04 | Henry E. Howard | Argon production method and apparatus |
| CN204778831U (en) * | 2015-06-09 | 2015-11-18 | 珠海华信净化设备有限公司 | Argon gas desicator |
-
2021
- 2021-11-28 CN CN202111427116.XA patent/CN116177504A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5125934A (en) * | 1990-09-28 | 1992-06-30 | The Boc Group, Inc. | Argon recovery from argon-oxygen-decarburization process waste gases |
| CN102583281A (en) * | 2012-03-23 | 2012-07-18 | 杭州杭氧股份有限公司 | Method and device for recovering and purifying argon in monocrystalline silicon production |
| US20140245782A1 (en) * | 2013-03-01 | 2014-09-04 | Henry E. Howard | Argon production method and apparatus |
| CN204778831U (en) * | 2015-06-09 | 2015-11-18 | 珠海华信净化设备有限公司 | Argon gas desicator |
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