CN116177504A - A replacement method for the purification system of an argon recovery device - Google Patents
A replacement method for the purification system of an argon recovery device Download PDFInfo
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- CN116177504A CN116177504A CN202111427116.XA CN202111427116A CN116177504A CN 116177504 A CN116177504 A CN 116177504A CN 202111427116 A CN202111427116 A CN 202111427116A CN 116177504 A CN116177504 A CN 116177504A
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 title claims abstract description 124
- 229910052786 argon Inorganic materials 0.000 title claims abstract description 62
- 238000011084 recovery Methods 0.000 title claims abstract description 35
- 238000000746 purification Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 17
- 239000007789 gas Substances 0.000 claims abstract description 40
- 238000001179 sorption measurement Methods 0.000 claims abstract description 39
- 238000011069 regeneration method Methods 0.000 claims abstract description 18
- 230000008929 regeneration Effects 0.000 claims abstract description 17
- 238000009835 boiling Methods 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 15
- 230000003584 silencer Effects 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 3
- 239000006096 absorbing agent Substances 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 claims 1
- 238000004886 process control Methods 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 7
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000001172 regenerating effect Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0036—Physical processing only
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
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- C01B23/001—Purification or separation processes of noble gases
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Abstract
氩气回收装置中纯化系统再生彻底与否，较大程度上影响后续低温精馏系统的稳定运行和产品氩气的稳定外供。本发明提供一种氩气回收装置纯化系统置换方法，氩气回收装置纯化系统再生气一般采用干燥的压缩空气或氮气，再生完成后再采用干燥氮气对其进行置换，但是氮气沸点与氩气沸点存在一定的温差，采用氮气置换后，工艺氩气进入低温精馏塔内不能全部冷凝，低温精馏塔内精馏工况波动较大，严重影响产品氩气的产出与外供。在原来再生置换步骤后增加工艺氩气泄压置换，经过2次工艺氩气泄压置换，纯化系统再生吸附罐氮气被工艺氩气置换，纯化系统切换后低温精馏系统运行稳定，产品氩气能够稳定产出和外供，从而增加氩气回收装置运行的稳定性和可靠性，提高了氩气回收装置的氩气回收率。Whether the regeneration of the purification system in the argon recovery unit is complete or not will largely affect the stable operation of the subsequent cryogenic rectification system and the stable external supply of product argon. The invention provides a replacement method for the purification system of an argon gas recovery device. The regeneration gas of the purification system of the argon gas recovery device generally adopts dry compressed air or nitrogen, and after the regeneration is completed, it is replaced with dry nitrogen gas, but the boiling point of nitrogen gas is different from that of argon gas. There is a certain temperature difference. After nitrogen replacement, the process argon cannot be completely condensed when it enters the cryogenic rectification tower. The rectification conditions in the cryogenic rectification tower fluctuate greatly, which seriously affects the output and external supply of product argon. After the original regeneration and replacement step, process argon pressure relief replacement was added. After two process argon pressure relief replacements, the nitrogen in the regeneration adsorption tank of the purification system was replaced by process argon. The output and external supply can be stabilized, thereby increasing the stability and reliability of the operation of the argon gas recovery device, and improving the argon gas recovery rate of the argon gas recovery device.
Description
技术领域technical field
本发明属于空分领域，涉及一种氩气回收装置，尤其涉及氩气回收装置中纯化系统再生置换。The invention belongs to the field of air separation, and relates to an argon gas recovery device, in particular to regeneration replacement of a purification system in the argon gas recovery device.
背景技术Background technique
近年来，太阳能光伏发电行业发展迅猛，氩气需求量激增，其价格持续攀升，甚至出现供不应求的局面，严重影响、甚至制约我国光伏产业的发展。为了促进国家产能升级，实现能源可持续利用，氩气回收技术应运而生。然而，这种设计存在以下问题和缺点：氩气回收装置纯化系统切换时低温精馏系统波动较大，氩气回收装置纯化系统切换时产品氩气产出量波动较大，导致氩气回收率偏低。In recent years, with the rapid development of the solar photovoltaic power generation industry, the demand for argon gas has increased sharply, and its price has continued to rise, and even a situation in which the supply exceeds demand has seriously affected or even restricted the development of my country's photovoltaic industry. In order to promote the upgrading of national production capacity and realize the sustainable utilization of energy, argon recovery technology came into being. However, this design has the following problems and disadvantages: the cryogenic rectification system fluctuates greatly when the purification system of the argon gas recovery device is switched, and the product argon output fluctuates greatly when the purification system of the argon gas recovery device is switched, resulting in a high recovery rate of argon gas. On the low side.
发明内容Contents of the invention
为了解决上述问题，本发明提供一种氩气回收装置纯化系统置换方法，其目的在于稳定氩气回收装置的低温精馏系统并产出产品氩气，提高氩气回收装置的回收率，达到节能增效的目的。In order to solve the above problems, the present invention provides a replacement method for the purification system of the argon gas recovery device, the purpose of which is to stabilize the low-temperature rectification system of the argon gas recovery device and produce argon gas, improve the recovery rate of the argon gas recovery device, and achieve energy saving efficiency purpose.
为实现上述目的，本发明提供的一种氩气回收装置纯化系统置换方法是这样实现的：氩气回收装置纯化系统，采用A、B吸附罐切换再生工作，再生气一般采用干燥的压缩空气或氮气，再生完成后采用干燥氮气对其进行置换，但是氮气沸点与氩气沸点存在一定的温差，在氮气置换后增加氩气置换两次，置换后低温精馏塔内精馏稳定，产品氩气的能够稳定产出与外供。In order to achieve the above purpose, a replacement method for the purification system of the argon gas recovery device provided by the present invention is realized in the following way: the purification system of the argon gas recovery device adopts A and B adsorption tanks to switch regeneration work, and the regeneration gas generally adopts dry compressed air or Nitrogen, replace it with dry nitrogen after the regeneration is completed, but there is a certain temperature difference between the boiling point of nitrogen and the boiling point of argon. After nitrogen replacement, add argon replacement twice. After the replacement, the rectification in the low-temperature distillation tower is stable, and the product argon stable output and external supply.
氩气回收装置纯化系统主要对原料氩气中的水分、二氧化碳、碳氢化合物等吸附净化，纯化系统主要有A吸附罐、B吸附罐、电加热器及控制阀门管道等组成，纯化系统A、B吸附罐切换工作，以完成对原料氩气的净化。A吸附罐吸附工作时，B吸附罐进行再生，再生步骤为：泄压、加热、冷吹、置换、均压、切换。经过纯化系统净化后的原料氩气进入后续低温精馏系统，产出合格产品氩气经压缩后外供。以A吸附罐吸附工作时，B吸附罐进行再生为例，B吸附罐再生程序如下:The purification system of the argon gas recovery device mainly absorbs and purifies the moisture, carbon dioxide and hydrocarbons in the raw material argon. The purification system mainly consists of A adsorption tank, B adsorption tank, electric heater and control valve pipeline. The purification system A, The B adsorption tank is switched to complete the purification of the raw material argon. When the A adsorption tank is working, the B adsorption tank is regenerated. The regeneration steps are: pressure relief, heating, cold blowing, replacement, pressure equalization, and switching. The raw material argon gas purified by the purification system enters the subsequent low-temperature rectification system, and the qualified product argon gas is compressed and then supplied externally. Take the regeneration of adsorption tank B when adsorption tank A is working as an example, the regeneration procedure of adsorption tank B is as follows:
泄压，原料氩气经过V1阀门进入A吸附罐经过吸附后由V3进入后续低温精馏系统参与生产，B吸附罐吸附饱和的气体由V6阀门进入消音器C2放空；Pressure relief, the raw material argon enters the A adsorption tank through the V1 valve and enters the subsequent low-temperature rectification system through the V3 to participate in production after adsorption, and the saturated gas absorbed by the B adsorption tank enters the silencer C2 through the V6 valve to be emptied;
加热，原料氩气经过V1阀门进入A吸附罐经过吸附后由V3进入后续低温精馏系统参与生产，再生气由V10阀门进入电加热器E加热后经过V8阀门进入B吸附罐，后由V6阀门进入消音器C2放空；Heating, the raw material argon enters the adsorption tank A through the V1 valve and enters the subsequent low-temperature rectification system through the V3 to participate in the production after adsorption. The regeneration gas enters the electric heater E through the V10 valve to be heated and enters the B adsorption tank through the V8 valve, and then enters the B adsorption tank through the V6 valve. Enter the muffler C2 to vent;
冷吹，原料氩气经过V1阀门进入A吸附罐经过吸附后由V3进入后续低温精馏系统参与生产，再生气由V10阀门进入电加热器E（加热器不工作）后经过V8阀门进入B吸附罐，后由V6阀门进入消音器C2放空；Cold blowing, the raw material argon enters the adsorption tank A through the V1 valve and enters the subsequent low-temperature rectification system through V3 to participate in the production after adsorption, and the regeneration gas enters the electric heater E through the V10 valve (the heater is not working) and then enters the B adsorption through the V8 valve tank, and then enter the muffler C2 through the V6 valve to vent;
置换，原料氩气经过V1阀门进入A吸附罐经过吸附后由V3进入后续低温精馏系统参与生产，置换气由V9阀门进入B吸附罐对其内再生气进行置换，后由V6阀门进入消音器C2放空，再生气由V13阀门进入消音器C1放空；Replacement, the raw material argon enters the A adsorption tank through the V1 valve and enters the subsequent low-temperature rectification system through V3 to participate in production after adsorption. The replacement gas enters the B adsorption tank through the V9 valve to replace the regeneration gas in it, and then enters the silencer through the V6 valve C2 is vented, and the regenerative gas enters the silencer C1 from the V13 valve to vent;
均压，原料氩气经过V1阀门进入A吸附罐经过吸附后由V3进入后续低温精馏系统参与生产，原料氩气由V9阀门进入B吸附罐对其进行升压，再生气由V13阀门进入消音器C1放空；Pressure equalization, the raw material argon enters the A adsorption tank through the V1 valve and enters the subsequent low-temperature rectification system to participate in production after adsorption, the raw material argon enters the B adsorption tank through the V9 valve to boost its pressure, and the regeneration gas enters the silencer through the V13 valve The device C1 is empty;
切换，原料氩气经过V1、V2阀门分别进入A、B吸附罐经过吸附后,由V3、V4进入后续低温精馏系统参与生产，再生气由V13阀门进入消音器C1放空；Switching, the raw material argon enters the A and B adsorption tanks respectively through the V1 and V2 valves, and after being adsorbed, enters the subsequent low-temperature rectification system through V3 and V4 to participate in production, and the regeneration gas enters the silencer C1 through the V13 valve to be emptied;
由于本发明增加了置换步骤，采用原料氩气两次对再生吸附罐进行彻底置换，从而可以得到以下有益效果：纯化系统切换时氩气回收装置的低温精馏系统稳定工作，氩气回收装置能够稳定产出合格产品氩气，提高了氩气回收装置的回收率，达到节能增效的目的。Due to the addition of the replacement step in the present invention, the regenerative adsorption tank is completely replaced twice by the raw material argon, thus the following beneficial effects can be obtained: when the purification system is switched, the low-temperature rectification system of the argon recovery device works stably, and the argon recovery device can The stable output of qualified product argon improves the recovery rate of the argon recovery device and achieves the purpose of energy saving and efficiency enhancement.
附图说明Description of drawings
以下结合附图对本发明做进一步详细描述，但不用来限制本发明的使用范围。The present invention will be described in further detail below in conjunction with the accompanying drawings, but it is not intended to limit the application scope of the present invention.
附图1是本发明的示意图，不应构成对本发明的限制，图1中相关设备名称做如下定义，以便叙述的更为明了。Accompanying drawing 1 is the schematic diagram of the present invention, should not constitute the limitation of the present invention, and relevant equipment name is defined as follows in Fig. 1, so that the description is clearer.
设备名称：Device name:
A罐:A吸附罐 B罐:B吸附罐 C1:消音器A tank: A adsorption tank B tank: B adsorption tank C1: silencer
C2:消音器 E:电加热器C2: Muffler E: Electric heater
具体实施方式Detailed ways
如图1所示，本发明的优选实施方式是针对不同工况以及不同容量的吸附罐对置换时间可以做相应调整控制。As shown in Figure 1, the preferred embodiment of the present invention is that the replacement time can be adjusted and controlled for adsorption tanks with different working conditions and capacities.
本发明的工作原理与工作过程如下：Operating principle and working process of the present invention are as follows:
12000Nm3/h氩气回收装置，纯化系统A、B吸附罐切换工作时未采用原料氩气置换，产出产品氩气约为10700Nm3/h，回收率约为90%，参照附图1，增加置换步骤后，产出产品氩气约为11500Nm3/h，回收率约为95%。12000Nm3/h argon gas recovery device, when the purification system A and B adsorption tanks are switched, the raw material argon gas is not used for replacement, the output product argon gas is about 10700Nm3/h, and the recovery rate is about 90%. After the step, the output product argon is about 11500Nm3/h, and the recovery rate is about 95%.
具体置换步骤为：The specific replacement steps are:
步骤S1:V9阀门18%打开420秒对B吸附罐充压40Kpa;Step S1: Open V9 valve 18% for 420 seconds to pressurize B adsorption tank to 40Kpa;
步骤S2：420秒后V9阀门关闭；Step S2: after 420 seconds, the V9 valve is closed;
步骤S3：V6阀门全开排放30秒后关闭；Step S3: V6 valve is fully opened to discharge for 30 seconds and then closed;
步骤S4；V9阀门18%打开420秒对B吸附罐充压40Kpa；Step S4; V9 valve is opened 18% for 420 seconds to pressurize B adsorption tank to 40Kpa;
步骤S5：420秒后V9阀门关闭；Step S5: after 420 seconds, the V9 valve is closed;
步骤S6：V6阀门全开排放30秒后关闭；Step S6: V6 valve is fully opened to discharge for 30 seconds and then closed;
经过两次置换后B吸附罐中原料的再生气得到彻底置换，经过均压后切换工作时，切换时氩气回收装置的低温精馏系统稳定工作并产出合格产品氩气，提高了氩气回收装置的回收率，可以依据不同吸附罐的容积对置换时间进行调整。After two replacements, the regenerative gas of the raw material in the B adsorption tank is completely replaced. When the work is switched after pressure equalization, the low-temperature rectification system of the argon recovery device works stably and produces qualified argon gas, which improves the argon gas production efficiency. The recovery rate of the recovery device can adjust the replacement time according to the volume of different adsorption tanks.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5125934A (en) * | 1990-09-28 | 1992-06-30 | The Boc Group, Inc. | Argon recovery from argon-oxygen-decarburization process waste gases |
| CN102583281A (en) * | 2012-03-23 | 2012-07-18 | 杭州杭氧股份有限公司 | Method and device for recovering and purifying argon in monocrystalline silicon production |
| US20140245782A1 (en) * | 2013-03-01 | 2014-09-04 | Henry E. Howard | Argon production method and apparatus |
| CN204778831U (en) * | 2015-06-09 | 2015-11-18 | 珠海华信净化设备有限公司 | Argon gas desicator |
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- 2021-11-28 CN CN202111427116.XA patent/CN116177504A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5125934A (en) * | 1990-09-28 | 1992-06-30 | The Boc Group, Inc. | Argon recovery from argon-oxygen-decarburization process waste gases |
| CN102583281A (en) * | 2012-03-23 | 2012-07-18 | 杭州杭氧股份有限公司 | Method and device for recovering and purifying argon in monocrystalline silicon production |
| US20140245782A1 (en) * | 2013-03-01 | 2014-09-04 | Henry E. Howard | Argon production method and apparatus |
| CN204778831U (en) * | 2015-06-09 | 2015-11-18 | 珠海华信净化设备有限公司 | Argon gas desicator |
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