CN116096146A - Display panel, preparation method thereof and display device - Google Patents

Display panel, preparation method thereof and display device Download PDF

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Publication number
CN116096146A
CN116096146A CN202111247461.5A CN202111247461A CN116096146A CN 116096146 A CN116096146 A CN 116096146A CN 202111247461 A CN202111247461 A CN 202111247461A CN 116096146 A CN116096146 A CN 116096146A
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layer
substrate
display panel
sub
light
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CN202111247461.5A
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Chinese (zh)
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毕文涛
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Beijing Xiaomi Mobile Software Co Ltd
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Beijing Xiaomi Mobile Software Co Ltd
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Priority to CN202111247461.5A priority Critical patent/CN116096146A/en
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Abstract

The application discloses a display panel, a preparation method thereof and a display device, and belongs to the technical field of display. The display panel includes: a substrate, a light emitting device, an optical adjustment layer, a black matrix, and a color resist layer. In the display panel, the black matrix and the color resistance layer are positioned on one side of the optical adjusting layer, which is far away from the substrate, and the black matrix and the color resistance layer can reduce the emergent quantity of the light entering the display panel from the emergent surface of the display panel after being reflected by the internal structure of the external light back display panel. In addition, the orthographic projection of the color resistance layer on the substrate is at least partially overlapped with the orthographic projection of the light emitting device on the substrate, and the optical adjusting layer can collect part of light blocked by the black matrix in the light emitted by the light emitting device to the color resistance layer and then emit the light. Therefore, the light-emitting efficiency of the light-emitting device in the display panel can be effectively improved, and the display effect of the display panel can be better.

Description

Display panel, preparation method thereof and display device
Technical Field
The application relates to the technical field of display, in particular to a display panel, a preparation method thereof and a display device.
Background
As a current-type Light Emitting device, an Organic Light-Emitting Diode (OLED) has been increasingly used in the field of high-performance display due to its characteristics of low power consumption, self-luminescence, high color saturation, fast response, wide viewing angle, and capability of achieving flexibility.
Currently, in order to ensure the display effect of an OLED display panel in a display device, it is required to reduce the reflectivity of the internal structure of the OLED display panel to external light. For this, a circular polarizer (i.e., a quarter-wave plate and a polarizer, which are stacked) may be generally disposed at the light-emitting side of the OLED display panel. The circular polaroid can reduce the emergent quantity of external light entering the OLED display panel from the emergent surface of the OLED display panel after being reflected by the internal structure of the OLED display panel.
However, the circular polarizer has low transmittance for light emitted from the OLED display panel, so the OLED display panel provided with the circular polarizer has poor display effect.
Disclosure of Invention
The embodiment of the application provides a display panel, a preparation method thereof and a display device. The problem of poor display effect of the display panel in the prior art can be solved, and the technical scheme is as follows:
in one aspect, there is provided a display panel including:
a substrate, a light emitting device, an optical adjustment layer, a black matrix, and a color resist layer;
the light emitting device is positioned on the substrate;
the optical adjusting layer is positioned on one side of the light emitting device away from the substrate;
The black matrix and the color resistance layer are both positioned on one side of the optical adjusting layer, which is far away from the substrate, the orthographic projection of the black matrix on the substrate is not overlapped with the orthographic projection of the light-emitting device on the substrate, and the orthographic projection of the color resistance layer on the substrate is at least partially overlapped with the orthographic projection of the light-emitting device on the substrate;
the optical adjusting layer is used for converging light rays emitted by the light emitting device to the color resistance layer.
Optionally, the optical adjustment layer includes: a first sub-optical adjustment layer and a second sub-optical adjustment layer stacked in a direction perpendicular to and away from the substrate;
the first sub-optical adjusting layer is provided with an opening, the orthographic projection of the opening on the substrate is at least partially overlapped with the orthographic projection of the light emitting device on the substrate, and the second sub-optical adjusting layer covers the first sub-optical adjusting layer and the opening;
wherein the refractive index of the first sub-optical adjustment layer is smaller than the refractive index of the second sub-optical adjustment layer.
Optionally, an opening area of a side of the opening close to the substrate is smaller than an opening area of a side of the opening far away from the substrate.
Optionally, the side surface of the opening is an arc-shaped convex surface.
Optionally, the orthographic projection of the light emitting device on the substrate is located within the orthographic projection of the opening on the substrate.
Optionally, the first sub-optical conditioning layer and the second sub-optical conditioning layer are each a film layer made of an organic material.
Optionally, the display panel further includes: the first inorganic packaging layer is positioned on one side of the first sub-optical adjusting layer close to the substrate, and the second inorganic packaging layer is positioned on one side of the second sub-optical adjusting layer far away from the substrate.
Optionally, the second sub-optical adjustment layer includes: a transparent dielectric layer, and refractive particles distributed in the transparent dielectric layer;
the material of the transparent medium layer is the same as the material of the first sub-optical adjusting layer, and the refractive index of the refractive particles is larger than that of the transparent medium layer.
Optionally, the display panel further includes: and the anti-reflection layer is positioned on one side of the black matrix and the color resistance layer away from the substrate and is used for reducing the reflectivity of external light rays incident into the display panel.
Optionally, the anti-reflection layer includes: a first sub-antireflection layer and a second sub-antireflection layer stacked in a direction perpendicular to and away from the substrate;
wherein the refractive index of the first sub-antireflection layer is greater than the refractive index of the second sub-antireflection layer.
Optionally, the number of layers of the anti-reflection layer is multiple, and multiple layers of the anti-reflection layer are stacked and arranged on one side, away from the substrate, of the black matrix and the color resistance layer.
Optionally, the substrate includes: the display device comprises a substrate and a pixel driving circuit positioned on the substrate, wherein the pixel driving circuit is electrically connected with the light emitting device.
In another aspect, there is provided a method of manufacturing a display panel, the method including:
forming a light emitting device on a substrate;
forming an optical adjustment layer on the light emitting device;
forming a black matrix and a color resist layer on the optical adjustment layer;
the front projection of the black matrix on the substrate is not overlapped with the front projection of the light-emitting device on the substrate, and the front projection of the color resistance layer on the substrate is at least partially overlapped with the front projection of the light-emitting device on the substrate; the optical adjusting layer is used for converging light rays emitted by the light emitting device to the color resistance layer.
In still another aspect, there is provided a display apparatus including: the power supply assembly is used for supplying power to the display panel, and the display panel is any one of the display panels.
The beneficial effects that technical scheme that this application embodiment provided include at least:
a display panel, comprising: a substrate, a light emitting device, an optical adjustment layer, a black matrix, and a color resist layer. In the display panel, the black matrix and the color resistance layer are positioned on one side of the optical adjusting layer, which is far away from the substrate, and the black matrix and the color resistance layer can reduce the emergent quantity of the light entering the display panel from the emergent surface of the display panel after being reflected by the internal structure of the external light back display panel. In addition, the orthographic projection of the color resistance layer on the substrate is at least partially overlapped with the orthographic projection of the light emitting device on the substrate, and the optical adjusting layer can collect part of light blocked by the black matrix in the light emitted by the light emitting device to the color resistance layer and then emit the light. Therefore, the light-emitting efficiency of the light-emitting device in the display panel can be effectively improved, and the display effect of the display panel can be better.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic diagram of a film structure of a display panel provided in the related art;
fig. 2 is a schematic diagram of a film structure of a display panel according to an embodiment of the present disclosure;
FIG. 3 is an effect diagram of the optical adjustment layer shown in FIG. 2 adjusting light;
fig. 4 is a schematic diagram of a film structure of another display panel according to an embodiment of the present disclosure;
FIG. 5 is a graph showing the effect of the optical adjustment layer provided in FIG. 4 on adjusting light;
fig. 6 is a schematic diagram of a film structure of another display panel according to an embodiment of the disclosure;
fig. 7 is a schematic film structure of another display panel according to an embodiment of the disclosure;
fig. 8 is a schematic diagram of a film structure of a display panel according to another embodiment of the present disclosure;
fig. 9 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present disclosure;
fig. 10 is a flowchart of another method for manufacturing a display panel according to an embodiment of the present disclosure;
FIG. 11 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present disclosure;
fig. 12 is a flowchart of a method for manufacturing a display panel according to another embodiment of the present application.
Specific embodiments thereof have been shown by way of example in the drawings and will herein be described in more detail. These drawings and the written description are not intended to limit the scope of the inventive concepts in any way, but to illustrate the concepts of the present application to those skilled in the art by reference to specific embodiments.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present application more apparent, the embodiments of the present application will be described in further detail below with reference to the accompanying drawings.
In the related art, in order to improve the display effect of a display panel, it is generally necessary to replace a circular polarizer in the display panel with a black matrix and a color blocking layer (also commonly referred to as a color filter). For example, referring to fig. 1, fig. 1 is a schematic diagram of a film structure of a display panel provided in the related art. The display panel 00 may include: a substrate 01, a light emitting device 02, a black matrix 03, and a color resist layer 04.
Among them, the light emitting device 02 may be located on the substrate 01, and the black matrix 03 and the color resist layer 04 are generally located at a side of the light emitting device 02 away from the substrate 01.
The black matrix 03 and the color resist 04 can reduce the amount of external light entering the display panel 00 to be emitted from the light emitting surface of the display panel 00 after being reflected by the internal structure of the display panel 00. And, the absorption rate of the black matrix 03 and the color resistance layer 04 to light is lower than that of the circular polarizer, that is, the transmittance of the black matrix 03 and the color resistance layer 04 to light emitted by the light emitting device 02 is higher than that of the circular polarizer to light emitted by the light emitting device 02. Therefore, the light-emitting efficiency of the light-emitting device 02 in the display panel provided with the black matrix 03 and the color resist layer 04 is higher than that in the display panel provided with circularly polarized light.
However, when the black matrix 03 and the color blocking layer 04 are used to directly replace the circular polarizer in the display panel 00, some of the light emitted from the light emitting device 02 in the display panel 00 is directly emitted to the black matrix 03, so that the light is blocked by the black matrix 03. Therefore, although the light-emitting efficiency of the light-emitting device 02 in the display panel 00 provided with the black matrix 03 and the color resist layer 04 is higher than the light-emitting efficiency of the light-emitting device in the display panel provided with the circularly polarized light, there is still room for improvement in the light-emitting efficiency of the light-emitting device 02 in the display panel 00 provided with the black matrix 03 and the color resist layer 04.
For this reason, in the embodiment of the present application, on the basis of the display panel 00 provided with the black matrix 03 and the color resist layer 04, the light-emitting efficiency of the light-emitting device 02 in the display panel 00 is further improved.
Referring to fig. 2, fig. 2 is a schematic diagram of a film structure of a display panel according to an embodiment of the disclosure. The display panel 000 may include: a substrate 100, a light emitting device 200, an optical adjustment layer 300, a black matrix 400, and a color resist layer 500.
The light emitting device 200 in the display panel 000 may be located on the substrate 100, and the optical adjustment layer 300 may be located at a side of the light emitting device 200 remote from the substrate 100.
The black matrix 400 and the color resist layer 500 in the display panel 000 may be located at a side of the optical adjustment layer 300 remote from the substrate 100. The front projection of the black matrix 400 on the substrate 100 does not coincide with the front projection of the light emitting device 200 on the substrate 100. The front projection of the color resist layer 500 onto the substrate 100 at least partially coincides with the front projection of the light emitting device 200 onto the substrate 100. The optical adjustment layer 300 may be used to concentrate light emitted from the light emitting device 200 to the color resist layer 500.
In the present application, please refer to fig. 3, fig. 3 is an effect diagram of the optical adjustment layer shown in fig. 2 to adjust light. Since the front projection of the color blocking layer 500 on the substrate 100 and the front projection of the light emitting device 200 on the substrate 100 are at least partially overlapped, and the optical adjustment layer 300 can collect the portion blocked by the black matrix 400 in the light emitted by the light emitting device 200 to the color blocking layer 500 and then emit the light. Therefore, the light extraction efficiency of the light emitted by the light emitting device 200 in the display panel 000 can be effectively improved, and the display effect of the display panel 000 is better.
In summary, the display panel provided in the embodiment of the present application includes: a substrate, a light emitting device, an optical adjustment layer, a black matrix, and a color resist layer. In the display panel, the black matrix and the color resistance layer are positioned on one side of the optical adjusting layer, which is far away from the substrate, and the black matrix and the color resistance layer can reduce the emergent quantity of the light entering the display panel from the emergent surface of the display panel after being reflected by the internal structure of the external light back display panel. In addition, the orthographic projection of the color resistance layer on the substrate is at least partially overlapped with the orthographic projection of the light emitting device on the substrate, and the optical adjusting layer can collect part of light blocked by the black matrix in the light emitted by the light emitting device to the color resistance layer and then emit the light. Therefore, the light-emitting efficiency of the light-emitting device in the display panel can be effectively improved, and the display effect of the display panel can be better.
Optionally, referring to fig. 4, fig. 4 is a schematic film structure of another display panel according to an embodiment of the present application. The optical adjustment layer 300 in the display panel 000 may include: a first sub-optical conditioning layer 301 and a second sub-optical conditioning layer 302. The first sub-optical adjustment layer 301 and the second sub-optical adjustment layer 302 are stacked in a direction perpendicular to and away from the substrate 100.
The first sub-optical adjustment layer 301 in the optical adjustment layer 300 may have an aperture 3011, and the front projection of the aperture 3011 onto the substrate 100 at least partially coincides with the front projection of the light emitting device 200 onto the substrate 100, and the second sub-optical adjustment layer 302 may cover the first sub-optical adjustment layer 301 and the aperture 3011 in the first sub-optical adjustment layer 301. That is, the side of the opening 3011 in the first sub-optical adjustment layer 301 is the interface where the first sub-optical adjustment layer 301 and the second sub-optical adjustment layer 302 intersect. Wherein the refractive index of the first sub-optical adjustment layer 301 is smaller than the refractive index of the second sub-optical adjustment layer 302.
In this case, since the second sub-optical adjustment layer 302 may cover the opening 3011 in the first sub-optical adjustment layer 301, a portion in the second sub-optical adjustment layer 302 may be filled in the opening 3011 in the first sub-optical adjustment layer 301. Thus, referring to fig. 5, fig. 5 is a graph showing the effect of the optical adjustment layer provided in fig. 4 to adjust light. A portion of the light emitted from the light emitting device 200 may be directed through the second sub-optical adjustment layer 302 filled in the opening 3011 to the color resist layer 500, while another portion of the light emitted from the light emitting device 200 may be directed through the second sub-optical adjustment layer 302 filled in the opening 3011 to the side of the opening 3011.
It should be noted that, when light propagates from an optically dense medium (high refractive index medium) to an optically thin medium (low refractive index medium) according to the law of refraction of light, the refraction angle is larger than the incident angle, wherein a part of light is refracted and then enters the low refractive index medium, and another part of light is reflected and then enters the high refractive index medium. When the incidence angle of the light is gradually increased, the light which is refracted is weaker and the reflected light is stronger. When the incident light increases to a certain angle, the refracted light disappears, only the reflected light remains, and the light is totally reflected back to the high refractive index medium, a phenomenon called total reflection.
For this reason, when the refractive index of the second sub-optical adjustment layer 302 is greater than that of the first sub-optical adjustment layer 301, after the light emitted from the light emitting device 200 passes through the second sub-optical adjustment layer 302 and then is directed to the first sub-optical adjustment layer 301, the light is very easy to be totally reflected at the interface of the first sub-optical adjustment layer 301 intersecting the second sub-optical adjustment layer 302. That is, light passing through the second sub-optical adjustment layer 302 toward the side of the aperture 3011 is highly subject to total reflection. In this case, the portion of the light emitted from the light emitting device 200 reflected by the side surface of the opening 3011 may be directed to the color blocking layer 500, and then, by matching the first sub-optical adjustment layer 301 with the second sub-optical adjustment layer 302, the portion of the light emitted from the light emitting device 200 blocked by the black matrix 400 may be converged to the color blocking layer 500 and then emitted.
In the embodiment of the present application, the area of the opening of the side of the opening 3011, which is close to the substrate 100, in the first sub-optical adjustment layer 301 is smaller than the area of the opening of the side of the opening 3011, which is far from the substrate 100. That is, the side surface of the opening 3011 forms an acute angle with the bottom surface of the first sub-optical adjustment layer 301 facing the substrate 100. In this case, the side of the aperture 3011 may reflect a portion of the light emitted from the light emitting device 200 toward the color resist layer 500 after receiving the portion of the light passing through the second sub-optical adjustment layer 302.
Alternatively, the side surface of the opening 3011 in the first sub-optical adjustment layer 301 may be an inclined plane or an inclined arc surface.
For example, when the side surface of the opening 3011 in the first sub-optical adjustment layer 301 is an inclined arc surface, the side surface of the opening 3011 in the first sub-optical adjustment layer 301 may be a convex surface having an arc shape. In this case, after the light emitted from the light emitting device 200 passes through the second sub-optical adjustment layer 302 and then enters the side surface of the opening 3011, an included angle between the light and a normal line of the side surface of the opening 3011 is larger, so that total reflection of the light is very easy to occur, and further, the probability that the light emitted to the side surface of the opening 3011 is reflected to the color blocking layer 500 is higher can be ensured, and the light emitting efficiency of the light emitting device 200 is further improved.
In an embodiment of the present application, the front projection of the light emitting device 200 in the display panel 000 on the substrate 100 may be located within the front projection of the aperture 3011 in the first sub-optical adjustment layer 301 on the substrate 100. In this way, light emitted from the light emitting device 200 can substantially exit through the opening 3011 in the first sub-optical adjustment layer 301.
In this application, the first sub-optical adjustment layer 301 and the second sub-optical adjustment layer 302 in the optical adjustment layer 300 may each be a film layer made of an organic material. For example, the organic material may be an acrylate or an epoxy, or the like.
Optionally, as shown in fig. 4, further includes: encapsulation layer 800. The encapsulation layer 800 may be located at a side of the optical adjustment layer 300 near the light emitting device 200. The encapsulation layer 800 may be used to encapsulate the light emitting device 200 to isolate the light emitting device 200 from the outside air, and to prevent the light emitting layer in the light emitting device 200 from being corroded by moisture, oxygen, and other components in the air.
Since the encapsulation layer 800 generally comprises two inorganic layers and an organic layer between the two inorganic layers. Thus, when the first sub-optical adjustment layer 301 and the second sub-optical adjustment layer 302 in the optical adjustment layer 300 are each a film layer made of an organic material, the encapsulation layer 800 and the optical adjustment layer 300 may be integrated together, and the optical adjustment layer 300 may serve as an organic layer in the encapsulation layer 800. In this way, the thickness of the display panel 000 can be effectively reduced.
For example, referring to fig. 6, fig. 6 is a schematic film structure of another display panel according to an embodiment of the present application. The display panel 000 may further include: a first inorganic encapsulation layer 600 on a side of the first sub-optical adjustment layer 301 near the substrate 100, and a second inorganic encapsulation layer 700 on a side of the second sub-optical adjustment layer 302 away from the substrate 100. In this way, the first inorganic encapsulation layer 600, the first sub-optical adjustment layer 301, the second sub-optical adjustment layer 302, and the second inorganic encapsulation layer 700 may constitute the encapsulation layer 800 in the display panel 000.
By way of example, both the first inorganic package 600 and the second inorganic package layer 700 may be film layers made of inorganic materials. For example, the inorganic material may include: silicon oxide, silicon nitride, or the like.
Optionally, the second sub-optical adjustment layer 302 in the optical adjustment layer 300 may include: a transparent dielectric layer 3021, and refractive particles 3022 distributed in the transparent dielectric layer. The material of the transparent dielectric layer 3021 is the same as that of the first sub-optical adjustment layer 301, that is, the transparent dielectric layer 3021 may be a film made of an organic material. The refractive index of the refractive particle 3022 is larger than that of the transparent dielectric layer 3021, so that the refractive index of the second sub-optical adjustment layer 302 is larger than that of the first sub-optical adjustment layer 301. For example, the refractive particles 3022 in the second sub-optical adjustment layer 302 may be at least one of high refractive index nanoparticles such as titanium dioxide and barium sulfate.
In an embodiment of the present application, referring to fig. 7, fig. 7 is a schematic diagram of a film structure of another display panel provided in an embodiment of the present application. The display panel 000 may further include: the anti-reflection layer 900 located at a side of the black matrix 400 and the color resist layer 500 remote from the substrate 100 may serve to reduce the reflectivity of external light incident into the display panel 000. In this case, the display panel 000 may reduce the reflectivity of the display panel 000 to external light not only by the cooperation of the color resist layer 500 and the black matrix 400, but also by the anti-reflection layer 900. Therefore, the reflectivity of the display panel to external light can be ensured to be lower.
In this application, the anti-reflection layer 900 may include: a first sub-antireflection layer 901 and a second sub-antireflection layer 902. The first sub-reflection preventing layer 901 and the second sub-reflection preventing layer 902 may be stacked in a direction perpendicular to and away from the substrate 100.
Wherein the refractive index of the first sub-reflection preventing layer 901 is greater than the refractive index of the second sub-reflection preventing layer 902. After the external light passes through the anti-reflection layer 900 and is reflected by the internal structure of the display panel 000, the external light can enter the interface between the first sub-anti-reflection layer 901 and the second sub-anti-reflection layer 902 through the first sub-anti-reflection layer 901, and is very easy to totally reflect on the interface, so that the external light which passes through the anti-reflection layer 900 and is reflected by the internal structure of the display panel 000 can not be emitted from the display panel 000, and the reflectivity of the display panel 000 to the external light can be reduced through the cooperation of the first sub-anti-reflection layer 901 and the second sub-anti-reflection layer 902.
In this application, the material of the first sub-antireflection layer 901 and the material of the second sub-antireflection layer 902 in the antireflection layer 900 may be the same or different. Wherein, the first sub-reflection preventing layer 901 may be a film layer made of an organic material or an inorganic material; the second sub-reflection preventing layer 902 may be a film layer made of an organic material or an inorganic material. The materials of the anti-reflection layer 900 in the embodiments of the present application are schematically described in the following several different cases:
in the first case, the first sub-antireflection layer 901 is a film made of an organic material, and the second sub-antireflection layer 902 is a film made of an organic material.
In the second case, the first sub-antireflection layer 901 is a film made of an organic material, and the second sub-antireflection layer 902 is a film made of an inorganic material.
In the third case, the first sub-antireflection layer 901 is a film made of an inorganic material, and the second sub-antireflection layer 902 is a film made of an inorganic material.
In the fourth case, the first sub-reflection preventing layer 901 is a film made of an inorganic material, and the second sub-reflection preventing layer 902 is a film made of an organic material.
Among them, the organic materials in the above four cases may be acrylate or epoxy, etc., and the inorganic materials may include: silicon oxide, silicon nitride, or the like.
Optionally, referring to fig. 8, fig. 8 is a schematic film structure of a display panel according to another embodiment of the present disclosure. The anti-reflection layer 900 in the display panel 000 may be one or more layers. For example, when the anti-reflection layer 900 is a plurality of layers, the plurality of anti-reflection layers 900 are stacked on a side of the black matrix 400 and the color resist layer 500 away from the substrate 100. Wherein the multiple anti-reflection layers 900 may be made of the same material or the multiple anti-reflection layers may be made of different materials. For example, when there are two anti-reflection layers 900, one anti-reflection layer 900 may be made of an organic material, and the other anti-reflection layer 900 may be made of an organic material; alternatively, one of the anti-reflection layers 900 may be made of an organic material, and the other anti-reflection layer 900 may be made of an inorganic material, which is not limited in the embodiment of the present application.
In this embodiment, when the anti-reflection layer 900 in the display panel 000 is a plurality of layers, for any two adjacent anti-reflection layers in the multi-layer anti-reflection layer 900, the refractive index of the second sub-anti-reflection layer 902 in the anti-reflection layer 900 close to the substrate 100 may be smaller than the refractive index of the first sub-anti-reflection layer 901 in the anti-reflection layer 900 far from the substrate 100, or may be larger than the refractive index of the first sub-anti-reflection layer 901 in the anti-reflection layer 900 far from the substrate 100. When the refractive index of the second sub-antireflection layer 902 in the antireflection layer 900 close to the substrate 100 in any two adjacent antireflection layers is greater than the refractive index of the first sub-antireflection layer 901 in the antireflection layer 900 far from the substrate 100, the refractive index of the multi-layer sub-antireflection layer in the display panel 100 gradually decreases along the direction perpendicular to and far from the substrate 100; when the refractive index of the second sub-antireflection layer 902 in the antireflection layer 900 close to the substrate 100 in any two adjacent antireflection layers is smaller than the refractive index of the first sub-antireflection layer 901 in the antireflection layer 900 far from the substrate 100, the refractive indexes of the multiple sub-antireflection layers in the display panel 100 are staggered.
In the embodiment of the present application, the display panel may further include a planarization layer 1000. The planarization layer 1000 may be located at a side of the color resist layer 500 and the black matrix 400 away from the substrate 100, and the planarization layer 1000 may be used to planarize an light emitting side of the display panel 000.
Optionally, referring to fig. 8, the display panel 000 may further include a touch layer 1100 located on a side of the optical adjustment layer 300 away from the substrate 100. The touch layer 1100 includes: the first touch electrode layer 1103, the first insulating layer 1101, the second touch electrode layer 1104, and the second insulating layer 1102 are stacked in a direction perpendicular to and away from the substrate 100.
The first touch electrode layer 1103 and the second touch electrode layer 1104 are overlapped by a via V1 formed on the first insulating layer 1101.
In the embodiment of the present application, the display panel 000 may further include: the pixel defines a layer 1200. The pixel defining layer has a pixel opening V2, and the light emitting device 200 may be located in the pixel opening V2.
It should be noted that the number of the pixel openings V2 in the pixel defining layer 1200 is generally plural, and one light emitting device 200 may be disposed in each pixel opening V2. Also, the plurality of light emitting devices 200 in the display panel 000 generally include: a plurality of red light emitting devices for emitting red light, a plurality of blue light emitting devices for emitting blue light, and a plurality of green light emitting devices for emitting green light. In this case, the color resist layer 500 may include: a plurality of red color filter blocks corresponding to the plurality of red light emitting devices one by one, a plurality of green color filter blocks corresponding to the plurality of green light emitting devices one by one, and a plurality of blue color filter blocks corresponding to the plurality of blue light emitting devices one by one. The front projection of each red light emitting device on the substrate is positioned in the front projection of the corresponding red color filter block on the substrate, the front projection of each green light emitting device on the substrate is positioned in the front projection of the corresponding green color filter block on the substrate, and the front projection of each blue light emitting device on the substrate is positioned in the front projection of the corresponding blue color filter block on the substrate.
Alternatively, the substrate 100 in the display panel 000 may include: a substrate 101, and a pixel driving circuit 102 on the substrate. The number of the pixel driving circuits 102 in the substrate 100 is generally plural, and the plural pixel driving circuits 102 may correspond to the plural light emitting devices 200 one by one, and each pixel driving circuit 102 may be electrically connected to the corresponding light emitting device 200.
For example, referring to fig. 8, the pixel driving circuit 102 is composed of at least one thin film transistor and at least one storage capacitor. Wherein, the thin film transistor may include: an active layer 102a, a source electrode 102b, a drain electrode 102c, a gate electrode 102d, a gate insulating layer 102e, and a light shielding layer 102f. The light shielding layer 102f and the active layer 102a may be insulated by the third insulating layer 1300, and the orthographic projection of the active layer 102a on the substrate 101 is located in the orthographic projection of the light shielding layer 102f on the substrate 101. Thus, the light shielding layer 102f may shield the active layer 102a to avoid the voltage threshold shift phenomenon of the active layer 102a under the irradiation of light.
The active layer 102a and the gate electrode 102b may be insulated by a gate insulating layer 102e, and the active layer 102a is electrically connected to the source electrode 102b and the drain electrode 102c, respectively.
In the present application, referring to fig. 8, the light emitting device 200 may include: an anode layer 201, a light-emitting layer 202, and a cathode layer 203 are stacked. Among them, the other of the source electrode 102b and the drain electrode 102c in the pixel driving circuit 102 may be electrically connected to the anode layer 1100 in the light emitting device 200. In this application, when a driving voltage is applied to the anode layer 201 through the pixel driving circuit 102 and a cathode voltage is applied to the cathode layer 203, the light emitting layer 202 between the anode layer 201 and the cathode layer 203 can emit light.
In summary, the display panel provided in the embodiment of the present application includes: a substrate, a light emitting device, an optical adjustment layer, a black matrix, and a color resist layer. In the display panel, the black matrix and the color resistance layer are positioned on one side of the optical adjusting layer, which is far away from the substrate, and the black matrix and the color resistance layer can reduce the emergent quantity of the light entering the display panel from the emergent surface of the display panel after being reflected by the internal structure of the external light back display panel. In addition, the orthographic projection of the color resistance layer on the substrate is at least partially overlapped with the orthographic projection of the light emitting device on the substrate, and the optical adjusting layer can collect part of light blocked by the black matrix in the light emitted by the light emitting device to the color resistance layer and then emit the light. Therefore, the light-emitting efficiency of the light-emitting device in the display panel can be effectively improved, and the display effect of the display panel can be better.
The embodiment of the application also provides a manufacturing method of the display panel, as shown in fig. 9, and fig. 9 is a flowchart of the manufacturing method of the display panel provided by the embodiment of the application. The method is used to manufacture the display panel in the above embodiment. For example, the manufacturing method of the display panel is used to manufacture the display panel shown in fig. 2. The manufacturing method may include:
and A1, forming a light-emitting device on the substrate.
And B1, forming an optical adjusting layer on the light emitting device.
And C1, forming a black matrix and a color resistance layer on the optical adjusting layer.
Wherein, the orthographic projection of the black matrix on the base plate is not overlapped with the orthographic projection of the luminescent device on the base plate, and the orthographic projection of the color resistance layer on the base plate is at least partially overlapped with the orthographic projection of the luminescent device on the base plate; the optical adjusting layer is used for converging light rays emitted by the light emitting device to the color resistance layer.
In summary, in the method for manufacturing a display panel according to the embodiments of the present application, a light emitting device is formed on a substrate, an optical adjustment layer is formed on the light emitting device, and a black matrix and a color resist layer are formed on the optical adjustment layer. In the display panel, the black matrix and the color resistance layer are positioned on one side of the optical adjusting layer, which is far away from the substrate, and the black matrix and the color resistance layer can reduce the emergent quantity of the light entering the display panel from the emergent surface of the display panel after being reflected by the internal structure of the external light back display panel. In addition, the orthographic projection of the color resistance layer on the substrate is at least partially overlapped with the orthographic projection of the light emitting device on the substrate, and the optical adjusting layer can collect part of light blocked by the black matrix in the light emitted by the light emitting device to the color resistance layer and then emit the light. Therefore, the light-emitting efficiency of the light-emitting device in the display panel can be effectively improved, and the display effect of the display panel can be better.
The embodiment of the application also provides another manufacturing method of the display panel, as shown in fig. 10, and fig. 10 is a flowchart of another manufacturing method of the display panel provided by the embodiment of the application. The manufacturing method of the display panel is used to manufacture the display panel shown in fig. 4. The method may include:
and A2, sequentially forming an anode layer, a pixel definition layer, a light-emitting layer and a cathode layer on the substrate.
In the embodiment of the present application, the substrate may be a substrate having a pixel driving circuit. The anode layer, the light emitting layer, and the cathode layer formed on the substrate can constitute a light emitting device, and the light emitting device is positioned in the pixel opening in the pixel defining layer, and the anode layer in the light emitting device can be electrically connected with the pixel driving circuit in the substrate.
Alternatively, preparing the anode layer material may include: metallic materials such as metallic molybdenum, metallic copper, metallic aluminum or alloys. The material of the pixel defining layer may include an organic material, for example, may be: at least one polymer selected from polymethyl methacrylate and polystyrene based polymers, phenol group based polymers and derivatives, acryl based polymers, p-xylene based polymers, arylene ether based polymers, amide based polymers, fluoride based polymers, p-xylene based polymers vinyl alcohol polymers. The light emitting layer may be an organic light emitting layer or a quantum dot light emitting layer. Materials for preparing the cathode layer may include: transparent conductive material such as ITO or IZO.
The process of sequentially forming the first electrode, the pixel defining layer, the light emitting layer and the second electrode on the substrate is as follows:
first, a conductive material layer may be formed on a substrate by any one of various methods such as deposition, coating, and sputtering, and a patterning process is performed on the conductive material layer to form an anode layer. Wherein the anode layer may be electrically connected to a pixel driving circuit in the substrate.
Thereafter, an organic material layer may be formed on the substrate on which the anode layer is formed by any one of various means such as deposition, coating, and sputtering, and a patterning process is performed on the organic material layer once to form the pixel defining layer.
Then, a light emitting layer may be formed on the substrate on which the pixel defining layer is formed using an inkjet printing process or an evaporation process.
Finally, a cathode layer is formed on the substrate on which the light emitting layer is formed by any one of various means such as deposition, coating, and sputtering.
It should be noted that, the primary patterning process in the above embodiment may include: photoresist coating, exposure, development, etching, and photoresist stripping.
And B2, forming an encapsulation layer on the cathode layer.
In embodiments of the present application, an encapsulation layer may be formed on the cathode layer. Alternatively, the encapsulation layer may be composed of a plurality of alternately arranged inorganic layers and organic layers. Wherein, the material of the inorganic layer may include: silicon oxide, silicon nitride, or the like, the material of the organic layer may include: acrylate or epoxy resins, and the like.
By way of example, the encapsulation layer may be formed on the substrate on which the cathode layer is formed by any of a variety of means, such as deposition, coating, and sputtering.
And C2, forming an optical adjusting layer on the packaging layer.
In an embodiment of the present application, the optical adjustment layer may include: and the first sub-optical adjusting layer and the second sub-optical adjusting layer are stacked along the direction vertical to and far away from the substrate. Wherein the refractive index of the first sub-optical adjustment layer is smaller than the refractive index of the second sub-optical adjustment layer.
Optionally, the first sub-optical accommodation layer and the second sub-optical accommodation layer are each made of an organic material. Wherein the organic material may include: acrylate or epoxy resins, and the like.
For example, first, an organic material layer may be formed on a substrate on which an encapsulation layer is formed by any one of various means such as deposition, coating, and sputtering, and a patterning process is performed on the organic material layer once to form a first sub-optical adjustment layer.
Then, the second sub-optical adjustment layer may be formed on the substrate on which the first sub-optical adjustment layer is formed by any one of various means such as deposition, coating, and sputtering.
In an embodiment of the present application, the second sub-optical adjustment layer may include: a transparent dielectric layer, and refractive particles distributed in the transparent dielectric layer. The material of the transparent dielectric layer in the second sub-optical adjustment layer may include: a light-transmitting organic material. For example, the light-transmissive organic material may be an acrylate or an epoxy, or the like.
For example, the first sub-optical adjustment layer and the second sub-optical adjustment layer may be sequentially formed on the substrate on which the light emitting device is formed by a solvent printing method and a photolithography preparation.
And D2, forming a black matrix and a color resistance layer on the optical adjusting layer.
By way of example, the process of forming the black matrix and the color resist layer described above is as follows:
first, a light absorbing material thin film is formed on a substrate on which an optical adjustment layer is formed by any one of various means such as deposition, coating, and sputtering, and a patterning process is performed on the light absorbing material thin film once to form a black matrix having openings.
Thereafter, a color resist film is formed on the substrate on which the black matrix is formed by any one of a plurality of methods such as deposition, coating, and sputtering, and a patterning process is performed on the color resist film once to form a color resist layer.
The embodiment of the application also provides a manufacturing method of the display panel, as shown in fig. 11, and fig. 11 is a flowchart of the manufacturing method of the display panel provided by the embodiment of the application. The manufacturing method of the display panel is used to manufacture the display panel shown in fig. 6. The method may include:
and A3, sequentially forming an anode layer, a pixel definition layer, a light-emitting layer and a cathode layer on the substrate.
The step A3 may refer to the aforementioned step A2, and the embodiments of the present application are not repeated here.
And B3, sequentially forming a first inorganic packaging layer, an optical adjusting layer and a second inorganic packaging layer on the cathode layer.
The process of sequentially forming the first inorganic encapsulation layer, the optical adjustment layer, the light emitting layer and the second inorganic encapsulation layer on the substrate is as follows:
first, the first inorganic encapsulation layer may be formed on the substrate on which the cathode layer is formed by any one of various means such as deposition, coating, and sputtering, for example.
Thereafter, an optical adjustment layer is formed on the substrate on which the first inorganic encapsulation layer is formed, and the step of forming the optical adjustment layer may refer to the above-described step C2.
Then, a second inorganic encapsulation layer is formed on the substrate on which the optical adjustment layer is formed by any one of various means such as deposition, coating, and sputtering.
In the application, the first sub-optical adjusting layer, the second sub-optical adjusting layer and the second inorganic packaging layer in the first inorganic packaging layer and the optical adjusting layer can form a packaging layer in the display panel, and the packaging layer can be used for packaging the light-emitting device, isolating the light-emitting device from outside air and avoiding corrosion of the light-emitting layer in the light-emitting device by components such as moisture, oxygen and the like in the air.
And C3, forming a black matrix and a color resistance layer on the second inorganic packaging layer.
The step C3 may refer to the aforementioned step D2, and the embodiments of the present application are not repeated here.
The embodiment of the application also provides a manufacturing method of the display panel, as shown in fig. 12, and fig. 12 is a flowchart of the manufacturing method of the display panel provided in the embodiment of the application. The manufacturing method of the display panel is used to manufacture the display panel shown in fig. 7. The method may include:
step A4, sequentially forming an anode layer, a pixel defining layer, a light emitting layer and a cathode layer on a substrate;
step A4 may refer to the aforementioned step A3, and the embodiments of the present application are not described herein again.
And B4, sequentially forming a first inorganic packaging layer, an optical adjusting layer and a second inorganic packaging layer on the cathode layer.
Step B4 may refer to the aforementioned step B3, and the embodiments of the present application are not described herein again.
And C4, forming a black matrix and a color resistance layer on the second inorganic packaging layer.
Step C4 may refer to the aforementioned step C3, and the embodiments of the present application are not repeated here.
And D4, forming an anti-reflection layer on the color resistance layer.
In the present application, the anti-reflection layer may include: a first sub-antireflection layer and a second sub-antireflection layer. The first sub-reflection preventing layer and the second sub-reflection preventing layer may be stacked in a direction perpendicular to and away from the substrate. Wherein the refractive index of the first sub-antireflection layer is greater than the refractive index of the second sub-antireflection layer.
First, a first sub-antireflection layer is formed on a substrate on which a colored resist layer is formed by any one of various means such as deposition, coating, and sputtering.
Then, a second sub-reflection preventing layer is formed on the substrate on which the first sub-reflection preventing layer is formed by any one of various means such as deposition, coating, and sputtering.
It will be clear to those skilled in the art that, for convenience and brevity, the specific principles of the display panel described above may be referred to the corresponding matters in the foregoing embodiments of the structure of the display panel, and will not be repeated herein.
The embodiment of the application also provides a display device. The display device may be: any product or component with display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like. The display device may include: a power supply assembly (not shown) and a display panel 000, wherein the display panel 000 may be the display panel in the above-described embodiments, and for example, it may be the display panel shown in fig. 2, 4, 6, 7 or 8. The power supply assembly is connected to the display panel 000 for supplying power to the display panel 000 to enable the display panel 000 to display images.
In this application, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. The term "plurality" refers to two or more, unless explicitly defined otherwise.
The foregoing description of the preferred embodiments is merely exemplary in nature and is in no way intended to limit the invention, since it is intended that all modifications, equivalents, improvements, etc. that fall within the spirit and scope of the invention.

Claims (14)

1. A display panel, comprising: a substrate (100), a light emitting device (200), an optical adjustment layer (300), a black matrix (400), and a color resist layer (500);
the light emitting device (200) is located on the substrate (100);
the optical adjustment layer (300) is positioned on one side of the light emitting device (200) away from the substrate (100);
the black matrix (400) and the color resistance layer (500) are both positioned on one side of the optical adjustment layer (300) away from the substrate (100), the orthographic projection of the black matrix (400) on the substrate (100) is not overlapped with the orthographic projection of the light-emitting device (200) on the substrate (100), and the orthographic projection of the color resistance layer (500) on the substrate (100) is at least partially overlapped with the orthographic projection of the light-emitting device (200) on the substrate (100);
The optical adjusting layer (300) is used for converging light rays emitted by the light emitting device (200) to the color resistance layer (500).
2. The display panel according to claim 1, wherein the optical adjustment layer (300) comprises: a first sub-optical adjustment layer (301) and a second sub-optical adjustment layer (302) that are stacked in a direction perpendicular to and away from the substrate (100);
-the first sub-optical adjustment layer (301) has an aperture (3011), and the orthographic projection of the aperture (3011) onto the substrate (100) coincides at least partially with the orthographic projection of the light emitting device (200) onto the substrate (100), the second sub-optical adjustment layer (302) covering the first sub-optical adjustment layer (301) and the aperture (3011);
wherein the refractive index of the first sub-optical adjustment layer (301) is smaller than the refractive index of the second sub-optical adjustment layer (302).
3. The display panel according to claim 2, wherein an opening area of a side of the opening (3011) close to the substrate (100) is smaller than an opening area of a side of the opening (3011) remote from the substrate (100).
4. A display panel according to claim 3, characterized in that the side of the aperture (3011) is a convex surface of circular arc shape.
5. The display panel according to claim 2, characterized in that the front projection of the light emitting device (200) on the substrate (100) is located within the front projection of the aperture (3011) on the substrate (100).
6. A display panel according to any of claims 2 to 5, characterized in that the first sub-optical adjustment layer (301) and the second sub-optical adjustment layer (302) are each a film layer made of an organic material.
7. The display panel of claim 6, further comprising: a first inorganic encapsulation layer (600) on a side of the first sub-optical adjustment layer (301) close to the substrate (100), and a second inorganic encapsulation layer (700) on a side of the second sub-optical adjustment layer (302) remote from the substrate (100).
8. The display panel according to claim 6, wherein the second sub-optical adjustment layer (302) comprises: a transparent dielectric layer (3021), and refractive particles (3022) distributed in the transparent dielectric layer (3021);
wherein the transparent dielectric layer (3021) is made of the same material as the first sub-optical adjustment layer (301), and the refractive index of the refractive particles (3022) is larger than the refractive index of the transparent dielectric layer (3021).
9. The display panel according to any one of claims 1 to 5, further comprising: and an anti-reflection layer (900) positioned on one side of the black matrix (400) and the color resistance layer (500) away from the substrate (100), wherein the anti-reflection layer (900) is used for reducing the reflectivity of external light incident into the display panel.
10. The display panel according to claim 9, wherein the anti-reflection layer (900) comprises: a first sub-antireflection layer (901) and a second sub-antireflection layer (902) which are stacked in a direction perpendicular to and away from the substrate (100);
wherein the refractive index of the first sub-antireflection layer (901) is greater than the refractive index of the second sub-antireflection layer (902).
11. The display panel according to claim 9, wherein the number of the anti-reflection layers (900) is a plurality of layers, and a plurality of layers of the anti-reflection layers (900) are stacked on a side of the black matrix (400) and the color resist layer (500) away from the substrate (100).
12. A display panel according to any of claims 1 to 5, characterized in that the substrate (100) comprises: a substrate (101), and a pixel driving circuit (102) on the substrate, the pixel driving circuit (102) being electrically connected to the light emitting device (200).
13. A method of manufacturing a display panel, the method comprising:
forming a light emitting device on a substrate;
forming an optical adjustment layer on the light emitting device;
forming a black matrix and a color resist layer on the optical adjustment layer;
the front projection of the black matrix on the substrate is not overlapped with the front projection of the light-emitting device on the substrate, and the front projection of the color resistance layer on the substrate is at least partially overlapped with the front projection of the light-emitting device on the substrate; the optical adjusting layer is used for converging light rays emitted by the light emitting device to the color resistance layer.
14. A display device, comprising: a power supply assembly for supplying power to the display panel, and the display panel of any one of claims 1 to 12.
CN202111247461.5A 2021-10-26 2021-10-26 Display panel, preparation method thereof and display device Pending CN116096146A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111247461.5A CN116096146A (en) 2021-10-26 2021-10-26 Display panel, preparation method thereof and display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111247461.5A CN116096146A (en) 2021-10-26 2021-10-26 Display panel, preparation method thereof and display device

Publications (1)

Publication Number Publication Date
CN116096146A true CN116096146A (en) 2023-05-09

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Family Applications (1)

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Country Status (1)

Country Link
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