CN116056493A - Display substrate, preparation method thereof, display panel and display device - Google Patents

Abstract

The embodiment of the disclosure provides a display substrate, a preparation method thereof, a display panel and a display device. Wherein the display substrate includes: a substrate base; a light emitting functional layer comprising: the pixel defining layer comprises a plurality of pixel accommodating holes which are in one-to-one correspondence with the light emitting devices, and the light emitting devices are positioned in the corresponding pixel accommodating holes; the semi-transparent and reflective layer is positioned on one side of the light-emitting device, which is far away from the substrate, and the orthographic projection of the semi-transparent and reflective layer on the substrate at least covers the orthographic projection of the pixel accommodating hole on the substrate, and the light transmittance of the semi-transparent and reflective layer is 30-70%.

Description

Display substrate, preparation method thereof, display panel and display device

Technical Field

The disclosure relates to the technical field of display, in particular to a display substrate, a preparation method thereof, a display panel and a display device.

Background

With the development of display technology, an OLED display device has become the most commonly used display device, which has many advantages of self-luminescence, fast response speed, wide viewing angle, and the like, and thus has been widely used. In the actual use process of the display substrate, due to the material characteristic of the second electrode of the light-emitting device, the material has strong reflectivity, so that part of ambient light is reflected by the second electrode, and the display effect of the display device is poor, especially in the environment of weak ambient light or darkroom, the contrast is reduced, and the color gamut of a display picture is reduced, and the display effect is poor.

Disclosure of Invention

The embodiment of the disclosure provides a display substrate, a preparation method thereof, a display panel and a display device.

In a first aspect, an embodiment of the present disclosure provides a display substrate, including:

a substrate base;

a light emitting functional layer comprising: the pixel defining layer comprises a plurality of pixel accommodating holes corresponding to the light emitting devices one by one, and the light emitting devices are positioned in the corresponding pixel accommodating holes;

the semi-transparent and reflective layer is positioned on one side, far away from the substrate, of the light-emitting device, orthographic projection of the semi-transparent and reflective layer on the substrate at least covers orthographic projection of the pixel accommodating hole on the substrate, and light transmittance of the semi-transparent and reflective layer is 30% -70%.

In some embodiments, the display substrate further comprises an encapsulation layer located on a side of the light emitting device remote from the substrate;

the semi-transparent descending reflecting layer is positioned on one side of the packaging layer far away from the substrate base plate;

alternatively, the semi-transparent and reflective layer is located between the encapsulation layer and the light emitting device;

alternatively, the semi-permeable and reflective layer is located inside the encapsulation layer.

In some embodiments, the semi-permeable drop-off layer comprises: and the front projection of the semi-transparent and reflective patterns on the substrate covers the corresponding light emitting devices, and a spacing area exists between any two adjacent semi-transparent and reflective patterns.

In some embodiments, the display substrate further includes a first light shielding pattern,

the first shading pattern and the semi-transparent descending and reflecting pattern are integrally formed, the first shading pattern fills the interval area, and the thickness of the first shading pattern is larger than that of the semi-transparent descending and reflecting pattern.

In some embodiments, the display substrate further includes a transparent support pattern, where the transparent support pattern is located on a side of the corresponding semi-transparent descending reflective pattern close to the substrate, the transparent support pattern is in contact with the corresponding semi-transparent descending reflective pattern, and a side surface of the semi-transparent descending reflective pattern away from the substrate is flush with a side surface of the first light shielding pattern away from the substrate;

or the surface of one side of the semi-transparent and reflective pattern close to the substrate is flush with the surface of one side of the first shading pattern close to the substrate, and a flattening layer is formed on one side of the semi-transparent and reflective pattern and one side of the shading pattern away from the substrate.

In some embodiments, the semi-permeable, descending, and reflecting layer is a planar membrane layer.

In some embodiments, the light emitting device includes a first electrode, a light emitting layer, and a second electrode disposed in a direction away from the substrate base plate;

the semi-transparent descending and reflecting pattern is in contact with the second electrode, the semi-transparent descending and reflecting pattern is made of metal materials, and metal elements in the semi-transparent descending and reflecting pattern are the same as metal elements in the second electrode.

In some embodiments, the first electrode and the light emitting layer of the light emitting device are located within the corresponding pixel receiving hole, the second electrode is located on a side of the pixel defining layer away from the substrate, the display substrate further includes a suppression pattern located on the spacing region, the suppression pattern is located on a side of the pixel defining layer away from the substrate; the pixel defining layer includes a light shielding material; and/or the number of the groups of groups,

the display substrate further comprises a second shading pattern, wherein the second shading pattern is positioned between any adjacent light emitting devices; and/or the number of the groups of groups,

the display substrate further comprises a touch layer, the touch layer comprises a first conductive layer, an insulating layer and a second conductive layer, the first conductive layer, the insulating layer and the second conductive layer are arranged along the direction away from the substrate, the first conductive layer comprises first transparent conductive patterns corresponding to the light emitting devices and first blackened conductive patterns located between any adjacent first transparent conductive patterns, and the second conductive layer comprises second transparent conductive patterns corresponding to the light emitting devices and second blackened conductive patterns located between any adjacent second transparent conductive patterns.

In a second aspect, an embodiment of the present disclosure provides a method for manufacturing a display substrate, including:

providing a substrate base plate;

forming a light emitting functional layer comprising: the pixel defining layer comprises a plurality of pixel accommodating holes corresponding to the light emitting devices one by one, and the light emitting devices are positioned in the corresponding pixel accommodating holes;

and forming a semi-transparent and reflective layer, wherein the semi-transparent and reflective layer is positioned on one side, far away from the substrate, of the light-emitting device, the orthographic projection of the semi-transparent and reflective layer on the substrate at least covers the orthographic projection of the pixel accommodating hole on the substrate, and the light transmittance of the semi-transparent and reflective layer is 30-70%.

In a third aspect, embodiments of the present disclosure provide a display panel, including the display substrate of the first aspect.

In a fourth aspect, embodiments of the present disclosure provide a display device including the display panel of the third aspect.

Drawings

The accompanying drawings are included to provide a further understanding of the disclosure, and are incorporated in and constitute a part of this specification, illustrate the disclosure and together with the description serve to explain, but do not limit the disclosure. In the drawings:

fig. 1 is a schematic structural diagram of a display substrate provided in the related art;

fig. 2 is a schematic structural diagram of a display substrate according to an embodiment of the disclosure;

fig. 3 is a schematic structural diagram of another display substrate according to an embodiment of the disclosure;

fig. 4 is a schematic structural diagram of another display substrate according to an embodiment of the disclosure;

fig. 5 is a schematic structural diagram of another display substrate according to an embodiment of the disclosure;

fig. 6 is a schematic structural diagram of another display substrate according to an embodiment of the disclosure;

fig. 7 is a schematic flowchart of a method for manufacturing a display substrate according to an embodiment of the disclosure;

reference numerals illustrate:

a substrate 1;

light-emitting functional layer 2: the light emitting device 21: a first electrode 2a, a second electrode 2b, a light-emitting layer 2c, a pixel defining layer 22, a suppression pattern 2d;

semi-transparent and descending reflective layer 3: a semi-transparent descending reflective pattern 30; a first light shielding pattern 41, a second light shielding pattern 42;

a transparent support pattern 51 and a planarization layer 52; an encapsulation layer 6; touch layer 7: a first blackened conductive pattern 71, an insulating layer 72, a second blackened conductive pattern 73;

a light emitting region A and a spacing region B.

Detailed Description

Specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating and illustrating the disclosure, are not intended to limit the disclosure.

For the purpose of making the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. It will be apparent that the described embodiments are some, but not all, of the embodiments of the present disclosure. All other embodiments, which can be made by one of ordinary skill in the art without the need for inventive faculty, are within the scope of the present disclosure, based on the described embodiments of the present disclosure.

Unless defined otherwise, technical or scientific terms used in embodiments of the present disclosure should be given the ordinary meaning as understood by one of ordinary skill in the art to which the present disclosure belongs. The terms "first," "second," and the like, as used in this disclosure, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. Likewise, the word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", etc. are used merely to indicate relative positional relationships, which may also be changed when the absolute position of the object to be described is changed.

With the development of display technology, an OLED display device has become the most commonly used display device, which has many advantages of self-luminescence, fast response speed, wide viewing angle, and the like, and thus has been widely used. Fig. 1 is a schematic structural diagram of a display substrate provided in the related art, and as shown in fig. 1, the display substrate at least includes a substrate 1, a light-emitting functional layer 2 disposed on the substrate 1, and a packaging layer 6 disposed on a side of the light-emitting functional layer 2 away from the substrate 1. The light emitting functional layer 2 includes a pixel defining layer 22 and a plurality of light emitting devices 21, the pixel defining layer 22 includes a plurality of pixel accommodation holes corresponding to the light emitting devices 21 one by one, the light emitting devices 21 include a first electrode 2a, a light emitting layer 2c and a second electrode 2b disposed away from the substrate 1, the first electrode 2a and the light emitting layer 2c of the light emitting devices 21 are located in the corresponding pixel accommodation holes, and the second electrodes 2b of the light emitting devices 21 are connected into an integral structure. In addition, the encapsulation layer is provided with a black matrix and a planarization layer 51 at a position corresponding to the space region on the side away from the substrate.

In the actual use process of the display substrate, since the second electrode 2b of the light emitting device 21 has higher reflectivity, and the light emitting device 21 and the packaging layer 6 are made of different materials, the interface between the two forms fresnel effect, that is, a certain degree of reflection is formed between the second electrode 2b and the packaging layer 6, so that part of ambient light is reflected, the display effect of the display device is poor, especially in the environment of weak ambient light or darkroom, the contrast ratio is reduced, so that the color gamut of the display picture is reduced, and the display effect is poor. Based on this, in the prior art, the anti-reflection film 9 is attached to the side of the planarization layer of the display substrate away from the substrate 1 to improve the display effect of the display substrate, but the above solution increases the manufacturing cost of the display substrate, which is not beneficial to mass production of the display substrate.

In order to solve at least one of the above technical problems, an embodiment of the present disclosure provides a display substrate, which is used for reducing manufacturing cost of the display substrate while improving picture contrast of the display substrate and improving display effect.

Fig. 2 is a schematic structural diagram of a display substrate according to an embodiment of the disclosure, where, as shown in fig. 2, the display substrate includes: a substrate 1, a luminous functional layer 2 and a semi-transparent and reflective layer 3.

Wherein, the luminous functional layer 2 comprises: a pixel defining layer 22 and a plurality of light emitting devices 21, the pixel defining layer 22 including a plurality of pixel receiving holes in one-to-one correspondence with the light emitting devices 21, the light emitting devices 21 being located in the corresponding pixel receiving holes; the semi-transparent and reflective layer 3 is located on one side of the light emitting device 21 away from the substrate 1, and the orthographic projection of the semi-transparent and reflective layer 3 on the substrate 1 at least covers the orthographic projection of the pixel accommodating hole on the substrate 1, and the light transmittance of the semi-transparent and reflective layer 3 is 30% -70%.

According to the display substrate provided by the embodiment of the disclosure, the semi-transparent and reflective layer 3 is arranged on one side, far away from the substrate 1, of the light-emitting functional layer 2, the light transmittance of the semi-transparent and reflective layer 3 is 30% -70%, and the light irradiated to the light-emitting device 21 is reduced in a mode of reducing the light transmittance, so that the reflection of the light-emitting device 21 to ambient light is reduced, and the contrast of a display picture is improved.

In some embodiments, the semi-permeable bottom layer 3 is a planar membrane layer.

Preferably, the light transmittance of the transflective layer 3 is 43% -50%.

Table 1 provides ambient light reflectivity and power consumption benefits of the display substrate at different transmittance of the transflective layer 3 in the embodiments of the present disclosure. The reflectivity is measured by taking reflected light on the surface of a cover plate of the display substrate as a reference, and the power consumption benefit refers to the ratio between the difference value between actual power consumption and reference power consumption of the semi-transparent and reflective layer 3 under the corresponding transmittance, wherein the actual power consumption is a power consumption value required for reaching preset brightness when the semi-transparent and reflective layer 3 is arranged, and the reference power consumption is a power consumption value required for reaching preset brightness when the semi-transparent and reflective layer 3 is not arranged.

TABLE 1

It should be understood that the smaller the light transmittance of the transflective layer 3, the smaller the reflectance to the ambient light, but at the same time, the decrease in the transmittance also affects the light output amount of the display substrate; and, the larger the light transmittance of the transflective layer 3, the more favorable the increase of the light output, and the increase of the power consumption gain, but at this time, more ambient light is transmitted through the transflective layer 3 and reflected out of the display substrate by the second electrode 2b of the light emitting device 21, and based on this, the light transmittance of the transflective layer 3 needs to take a suitable range value, so that the reflectivity of the display substrate to the ambient light can be reduced, and the light output of the display substrate is not affected. In addition, as known by those skilled in the art through experiments, when the reflectivity of the display substrate reaches 7%, the contrast of the display screen is good, and the display effect is not affected by the reflection of ambient light.

Based on this, as can be seen from table 1, when the light transmittance of the transflective layer 3 is 43%, the power consumption gain of the display substrate is 0%, and at this time, the reflectivity of the display substrate is 6.7%, that is, the display substrate can reach the preset brightness at the preset power consumption, and the reflectivity basically meets the preset requirement; when the light transmittance of the transflective layer 3 is 49.5%, the power consumption gain of the display substrate is 15%, and at this time, the reflectivity of the display substrate is 7.4%, that is, the brightness of the display substrate under the preset power consumption exceeds the preset brightness, and the reflectivity can reach the preset requirement. Therefore, the light transmittance of the transflective layer 3 is preferably 43% to 50%.

The light transmittance and the display substrate reflectance of the transflective layer 3 in table 1 were measured on the premise that the aperture ratio of the pixel defining layer 22 was 16.92%.

In addition, the display substrate in the related art may further be provided with a color film layer located on a side of the light emitting device 21 away from the substrate 1, where the color film layer includes a color film pattern corresponding to the light emitting device 21, and the color film pattern is configured to transmit light of a preset wavelength band so as to increase the contrast of the picture. That is, the color film pattern only has certain requirements on the wave band of the transmitted light, but the light transmittance is not limited. Compared with the display substrate in the related art, the color film layer is not arranged in the display substrate provided by the embodiment of the disclosure, the semi-transparent and reflective layer 3 is additionally arranged, and the effect of reducing the ambient light is realized by limiting the light transmittance of the semi-transparent and reflective layer 3.

In some embodiments, the display substrate further comprises an encapsulation layer 6 on a side of the light emitting device 21 remote from the substrate 1; the semi-transparent descending reflecting layer 3 is positioned on one side of the packaging layer 6 far away from the substrate 1; alternatively, the transflective layer 3 is located between the encapsulation layer 6 and the light emitting device 21; alternatively, the transflective layer 3 is located inside the encapsulation layer 6.

In the display substrate provided in the embodiments of the present disclosure, since the second electrode 2b in the light emitting device 21 is far away from the surface of the substrate 1 side, or the interface between the light emitting device 21 and the encapsulation layer 6 may reflect ambient light, the semi-transparent and reflective layer 3 is disposed on the side of the light emitting device 21 far away from the substrate 1, and the reflection of light is reduced by reducing the light transmittance, but there may be various setting manners for the relative position between the semi-transparent and reflective layer 3 and the encapsulation layer 6, which is specifically described in the following embodiments, and is not repeated herein.

Alternatively, in one example, the encapsulation layer 6 may be a stacked structure including a first inorganic encapsulation sub-layer, an organic encapsulation sub-layer, and a second inorganic encapsulation sub-layer stacked in this order in a direction away from the substrate 1. When the transflective layer 3 is located inside the encapsulation layer 6, it may be located between the first inorganic encapsulation sub-layer and the organic encapsulation sub-layer, or may be located between the organic encapsulation sub-layer and the second inorganic encapsulation sub-layer, which is not limited in the embodiment of the present disclosure.

In some embodiments, the semi-permeable and reflective layer 3 comprises: and a plurality of semi-transparent and reflective patterns 30 corresponding to the light emitting devices 21 one by one, wherein the front projection of the semi-transparent and reflective patterns 30 on the substrate 1 covers the corresponding light emitting devices 21, and a spacing area B exists between any two adjacent semi-transparent and reflective patterns 30.

Alternatively, the substrate 1 is divided with light emitting regions a corresponding to the light emitting devices 21 and a spacing region B between adjacent light emitting regions a. The semi-transparent and reflective patterns are arranged on the corresponding light-emitting areas A to reduce the transmittance of light rays on the light-emitting areas A, so that on one hand, enough light-emitting quantity is ensured, and on the other hand, reflected light is reduced, thereby improving the picture contrast and ensuring the display effect of the display substrate.

In some embodiments, the display substrate further includes a first light shielding pattern 41, the first light shielding pattern 41 is integrally formed with the transflective layer 3, and the first light shielding pattern 41 fills the spacing region B, and the thickness of the first light shielding pattern 41 is greater than the thickness of the transflective layer 3. The first light shielding patterns 41 reduce light transmittance by increasing the thickness of the film, and by providing the first light shielding patterns 41 in the interval region B, light crosstalk between adjacent light emitting devices 21 can be avoided, thereby avoiding cross color of the display screen.

It should be understood that the first light shielding pattern 41 is integrally formed with the transflective layer 3, that is, the first light shielding pattern 41 and the transflective layer 3 are made of the same material, and the thickness of the film layer is changed to control the first light shielding pattern 41 and the transflective layer 3 to form different light transmittance.

In one example, the light transmittance Tr 1=10 of the transflective layer 3 ^-ad1 The light transmittance Tr 2=10 of the first light shielding pattern 41 ^-ad2 Wherein a is an optical density value, and the materials of the two are the same, so that the optical density value is the same, for example, the value range of a is 1-3, for example, a=2; d1 is the thickness of the semi-transmissive reflective layer 3, and d2 is the thickness of the first light shielding pattern 41. Taking the optical density value a=2 as an example, d1 may be 1 μm when Tr1 takes a value of 43% -50%; when Tr2 takes a value of 1%, d2 may be 0.15 μm.

In some embodiments, the display substrate further includes a transparent support pattern 51, as shown in fig. 2, where the transparent support pattern 51 is located on a side of the corresponding semi-transparent descending pattern 30 near the substrate 1, and the transparent support pattern 51 contacts with the corresponding semi-transparent descending pattern 30, and a surface of a side of the semi-transparent descending pattern 30 away from the substrate 1 is flush with a surface of a side of the first light shielding pattern 41 away from the substrate 1.

As shown in fig. 2, in the manufacturing process, a transparent supporting layer may be formed on the side of the encapsulation layer 6 away from the substrate 1, and a transparent supporting pattern 51 corresponding to the light emitting device 21 may be formed by an etching process, and further, in the same manufacturing process, a semi-transparent reflective pattern 30 located on the side of the transparent supporting pattern 51 away from the substrate 1 and a first light shielding pattern 41 located between adjacent transparent supporting patterns 51 may be formed at the same time, so as to save the manufacturing process.

Fig. 3 is a schematic structural diagram of another display substrate according to an embodiment of the disclosure, as shown in fig. 3, a surface of a side of the transflective pattern 30, which is close to the substrate 1, is flush with a surface of a side of the first light shielding pattern 41, which is close to the substrate 1, and a planarization layer 52 is formed on a side of the transflective pattern 30 and the light shielding pattern, which is far from the substrate 1.

As shown in fig. 3, in the manufacturing process, the half-mirror pattern 30 and the first light shielding pattern 41 with different thicknesses may be formed on the side of the encapsulation layer 6 away from the substrate 1 by half ton technology under one MASK, or the half-mirror pattern 30 and the first light shielding pattern 41 may be formed by two MASKs respectively, and then the planarization layer 52 on the side of the half-mirror pattern 30 and the light shielding pattern away from the substrate 1 is formed.

It should be noted that, the transparent supporting pattern 51 in fig. 2 and the planarization layer 52 in fig. 3 may be made of the same material, for example, an inorganic material with high compactness such as silicon oxynitride, silicon oxide, silicon nitride, or a polymer material capable of blocking water vapor, and besides the effect of planarizing the film layer, the transparent supporting pattern may be configured to increase the path of external water vapor or oxygen into the display area, so as to prevent water vapor and/or oxygen in the external environment from corroding the light emitting device 21.

As shown in fig. 2 and 3, the transflective layer 3 is integrally connected with the first light shielding pattern, and the transflective layer 3 and the first light shielding pattern may include black matrix materials with different thicknesses. At this time, the transflective layer 3 located in the light emitting region a reduces the ambient light applied to the light emitting device 21 so as to reduce the light transmittance, thereby reducing the reflection of the ambient light by the light emitting device 21 and improving the contrast of the display screen. In other embodiments, the semi-transmissive and reflective layer 3 may also comprise a blackened conductive material, which also has semi-transmissive properties. The semi-transmissive and reflective layer 3 formed of the blackened conductive material will be described in detail with reference to the accompanying drawings.

Fig. 4 is a schematic structural view of another display substrate provided in an embodiment of the present disclosure, and as shown in fig. 4, a light emitting device 21 includes a first electrode 2a, a light emitting layer 2c, and a second electrode 2b disposed in a direction away from a substrate 1; the semi-transmissive and reflective pattern 30 is in contact with the second electrode 2b, the semi-transmissive and reflective pattern 30 is made of a metal material, and the metal elements in the semi-transmissive and reflective pattern 30 are the same as those in the second electrode 2b.

In one example, the first electrode 2a may be an anode and the second electrode 2b a cathode. The preparation of the second electrode 2b (cathode) and the transflective pattern 30 on the side of the light emitting layer 2c away from the substrate 1 in the light emitting device 21 may include the following processes: at the side of the spacing region B, which is far from the substrate 1, of the pixel defining layer 22, a suppression pattern 2d is provided; then, a transparent electrode made of a transparent conductive material (for example, indium tin oxide) is formed on the side of the light-emitting functional layer 2 away from the substrate 1, and at this time, since the space region B is formed with the suppression pattern 2d, indium tin oxide can be deposited only on the light-emitting region a; finally, the side of the transparent electrode far from the substrate 1 is subjected to blackening treatment, wherein the blackened part is used as a semi-transparent part which can be used as a semi-transparent descending reflection pattern 30, and the rest part which is not blackened is used as a cathode. The blackening treatment may be reduction of indium tin oxide by a reducing agent (e.g., hydrogen ions) to form a metal electrode having semi-permeable properties.

In one example, the material of the inhibition pattern 2d may include titanium oxide.

As can be seen from fig. 2 to fig. 4, the transflective layer 3 in the light emitting area a has two embodiments, which may include a black matrix material or a conductive material after blackening treatment; the light shielding material located in the spaced region B may have various embodiments, and is described in detail below with reference to the accompanying drawings.

Embodiment 1,

Optionally, the first electrode 2a and the light emitting layer 2c of the light emitting device 21 are located in the corresponding pixel accommodating hole, the second electrode 2B is located at a side of the pixel defining layer 22 away from the substrate 1, the display substrate further includes a suppressing pattern 2d located at the spacing region B, and the suppressing pattern 2d is located at a side of the pixel defining layer 22 away from the substrate 1; the pixel defining layer 22 includes a light shielding material. In the first embodiment, the light shielding material of the space region B is formed by combining the suppression pattern 2d and the pixel defining layer 22.

The suppression pattern 2d is configured to: in the process of preparing the second electrode 2b by the vapor deposition process, the formation of the conductive material for forming the second electrode 2b is suppressed in the region where the suppression pattern 2d is located.

Embodiment II,

Optionally, the display substrate further includes a second light shielding pattern 42, and the second light shielding pattern 42 is located between any adjacent light emitting devices 21.

In the second embodiment, the second light shielding pattern 42 may include a black matrix material located in the interval region B, and at this time, the second light shielding pattern 42 is located at a position of the light emitting functional layer 2 away from the one of the substrate 1. However, the relative positional relationship between the second light shielding pattern 42, the encapsulation layer 6, and the transparent support pattern 51 is not limited. Meanwhile, the second light shielding patterns 42 are the same as the first light shielding patterns 41 in material and thickness, and will not be described again.

Third embodiment,

Optionally, the display substrate further includes a touch layer 7, the touch layer 7 including a first conductive layer, an insulating layer 72, and a second conductive layer disposed in a direction away from the substrate 1, the first conductive layer including a first transparent conductive pattern corresponding to the light emitting device 21 and a first blackened conductive pattern 71 between any adjacent first transparent conductive patterns, the second conductive layer including a second transparent conductive pattern corresponding to the light emitting device 21 and a second blackened conductive pattern 73 between any adjacent second transparent conductive patterns.

In the third embodiment, the display substrate includes the touch layer 7, and the blackened conductive pattern with the light shielding function is formed by blacking the portions of the two conductive layers in the touch layer 7 corresponding to the interval region B, so as to avoid the phenomenon that crosstalk of light rays occurs between the adjacent light emitting devices 21 to cause crosstalk of the display screen.

The first to third embodiments may be simultaneously implemented in any combination, or may be individually implemented as long as they can function to block light in the space region B, and the present disclosure is not limited to this.

As shown in fig. 4, the semi-transmissive reflective layer 3 on the display substrate light emitting area a may include a blackened conductive material; the light shielding function can be achieved on the spacing region B by the third embodiment described above, that is, the portion of the touch layer 7 corresponding to the spacing region B is subjected to the blackening process to form the first blacked conductive pattern 71 and the second blacked conductive pattern 73 having the light shielding function, so as to enhance the light shielding effect of the spacing region B.

In the embodiment of fig. 4, the transflective layer 3 is located between the encapsulation layer 6 and the light emitting device 21 (the second electrode 2 b).

Fig. 5 is a schematic structural diagram of another display substrate provided in an embodiment of the present disclosure, where, as shown in fig. 5, the display substrate includes a black matrix layer located on a side of the encapsulation layer 6 away from the substrate 1, and at this time, a portion of the black matrix layer corresponding to the light emitting region a is used as the semi-transparent reflection layer 3; meanwhile, the side of the pixel defining layer 22 remote from the substrate 1 is provided with the suppressing pattern 2d, and the pixel defining layer 22 includes a light shielding material, that is, a portion of the black matrix layer corresponding to the spacing region B, and the suppressing pattern 2d and the pixel defining layer 22 including the light shielding material can collectively realize the light shielding effect of the spacing region B.

In the embodiment of fig. 5, the transflective layer 3 is located on the side of the encapsulation layer 6 remote from the substrate base plate 1.

Fig. 6 is a schematic structural diagram of another display substrate provided in an embodiment of the present disclosure, where, as shown in fig. 6, the display substrate includes a black matrix layer located on a side of the encapsulation layer 6 away from the substrate 1, and at this time, a portion of the black matrix layer corresponding to the light emitting region a is used as the semi-transparent reflection layer 3; at this time, the display substrate further includes a second light shielding pattern 42, which is located in the interval region B and is located on a side of the touch layer 7 away from the substrate 1, and the second light shielding pattern 42 and a portion of the black matrix layer located in the interval region B together achieve the light shielding effect of the interval region B.

It should be noted that, in fig. 6, the first conductive layer and the second conductive layer on the touch layer 7 may be blackened in the interval area B as described in embodiment three, or the first conductive layer and the second conductive layer may be configured as transparent electrodes; meanwhile, the pixel defining layer 22 may include a light shielding material or a non-light shielding material, and the embodiment of the present disclosure is not limited thereto.

In some embodiments, as shown in fig. 2-6, the display substrate further includes a driving functional layer 8, where the driving functional layer 8 is located on a side of the light emitting functional layer 2 near the substrate 1, and the driving functional layer includes a pixel circuit corresponding to the light emitting device 21, and the pixel circuit includes a thin film transistor, and a first electrode of the thin film transistor is electrically connected to the first electrode 2a of the corresponding light emitting device 21.

Based on the same inventive concept, the embodiment of the disclosure also provides a preparation method of the display substrate.

Fig. 7 is a schematic flowchart of a method for manufacturing a display substrate according to an embodiment of the disclosure, where, as shown in fig. 7, the method includes:

in step S0, a substrate 1 is provided.

The substrate 1 may be a glass substrate or a flexible substrate made of a flexible material such as Polyimide (PI), which is advantageous for realizing flexible display.

Step S1, forming a light emitting functional layer 2, wherein the light emitting functional layer 2 includes: a pixel defining layer 22 and a plurality of light emitting devices 21, the pixel defining layer 22 including a plurality of pixel receiving holes in one-to-one correspondence with the light emitting devices 21, the light emitting devices 21 being located within the corresponding pixel receiving holes.

And S2, forming a semi-transparent and reflective layer 3, wherein the semi-transparent and reflective layer 3 is positioned on one side of the light-emitting device 21 far away from the substrate 1, the orthographic projection of the semi-transparent and reflective layer 3 on the substrate 1 at least covers the orthographic projection of the pixel accommodating hole on the substrate 1, and the light transmittance of the semi-transparent and reflective layer 3 is 30-70%.

The following describes the manufacturing method of the display substrate in each embodiment in detail with reference to the schematic structural diagram of the display substrate.

As shown in fig. 2, in some embodiments, after step S1, the display substrate preparation method further includes:

in step S11, the encapsulation layer 6 is formed.

In step S12, a transparent supporting pattern is formed on the encapsulation layer 6, where the transparent supporting pattern is located in the light emitting area a.

Step S2 specifically includes step S201 of forming a black matrix material on the transparent support pattern, wherein a portion corresponding to the light emitting region a is used as the semi-transparent reflective layer 3, a portion corresponding to the spacing region B is used as the first light shielding pattern 41, and a surface of the semi-transparent reflective layer 3 on a side away from the substrate 1 is flush with a surface of the first light shielding pattern 41 on a side away from the substrate 1.

As shown in fig. 3, in some embodiments, after step S1, the display substrate preparation method further includes:

in step S11, the encapsulation layer 6 is formed.

Step S2 specifically includes step S202 of forming a black matrix material on the encapsulation layer 6, wherein a portion corresponding to the light emitting region a is used as the semi-transparent reflective layer 3, a portion corresponding to the spacing region B is used as the first light shielding pattern 41, and a surface of the semi-transparent reflective layer 3 on a side close to the substrate 1 is flush with a surface of the first light shielding pattern 41 on a side close to the substrate 1.

It should be noted that, in the step S22, the semi-transmissive reflective layer 3 and the light shielding pattern may be formed by one MASK process, or may be formed by two MASK processes, which is not limited in the embodiment of the disclosure.

In step S31, a planarization layer 52 is formed on the side of the semi-transmissive reflective layer 3 and the light shielding pattern away from the substrate 1.

As shown in fig. 4, in some embodiments, step S1 specifically includes: steps S101-S104, specifically:

in step S101, a pixel defining layer 22 is formed, and the pixel defining layer 22 includes a plurality of pixel accommodating holes corresponding to the light emitting areas a.

In step S102, the first electrode 2a and the light emitting layer 2c are formed in the pixel accommodation hole.

In step S103, a suppression pattern 2d is formed above the pixel defining layer 22 (the spacing region B).

Step S104 (step S2) of forming a transparent conductive layer (for example, indium tin oxide) over the light-emitting layer 2c (light-emitting region a), and blackening the transparent conductive layer. The blackened portion has semi-transparent property, and can be used as the semi-transparent pattern 30, and the remaining portion which is not blackened is used as the second electrode 2b.

The blackening treatment may be a reduction treatment of the transparent conductive layer by a reducing agent (e.g., hydrogen ions) to form an electrode having semi-permeable properties.

In this embodiment, after the transparent conductive layer is blackened in step S104, the second electrode 2b and the semi-transmissive reflective layer 3 in step S2 are simultaneously formed.

After step S2, the preparation method further comprises:

in step S32, the encapsulation layer 6 is formed over the transflective pattern 30.

In step S33, the touch layer 7 is formed above the encapsulation layer 6, and the portions of the two conductive layers in the touch layer 7 corresponding to the spacing region B are blacked out to form a blacked conductive pattern with a shading function.

In step S34, a planarization layer 52 is formed over the touch layer 7.

In the above step S33, the blackout conductive pattern formed at the portion of the two conductive layers in the touch layer 7 corresponding to the interval region B is used as the second light shielding pattern 42.

As shown in fig. 5, in the process of forming the pixel defining layer 22 in step S1, the pixel defining layer 22 includes a light shielding material. And, the method for forming the light emitting device in step S1 in fig. 5 is the same except that the transparent conductive layer is not blackened, and is not repeated here.

After step S1, the display substrate preparation method further includes: in step S11, the encapsulation layer 6 is formed.

Step S2 specifically includes step S203: a black matrix layer is formed over the encapsulation layer 6, and a portion of the black matrix layer corresponding to the light emitting region a is taken as a semi-transmissive reflective pattern.

The display substrate preparation method further comprises the step S35: a planarization layer 52 is formed on the black matrix layer.

In the display substrate shown in fig. 5, the portion of the black matrix layer corresponding to the space region B and the pixel defining layer 22 including the light shielding material may collectively function to shield the space region B from light.

As shown in fig. 6, in the process of forming the pixel defining layer 22 in step S1, the pixel defining layer 22 includes a light shielding material.

After step S1, the display substrate preparation method further includes: in step S11, the encapsulation layer 6 is formed.

The step S2 specifically includes a step S204: a black matrix layer is formed, and a portion of the black matrix layer corresponding to the light emitting region a is taken as the semi-transmissive reflective layer 3.

The encapsulation layer 6 may be a stacked structure including a first inorganic encapsulation sub-layer, an organic encapsulation sub-layer, and a second inorganic encapsulation sub-layer stacked in this order in a direction away from the substrate 1. The black matrix layer may be located above the encapsulation layer 6, may be located between the encapsulation layer 6 and the light emitting device 21, or may be located inside the encapsulation layer 6. When the black matrix layer is located inside the encapsulation layer 6, it may be located between the first inorganic encapsulation sub-layer and the organic encapsulation sub-layer, or may be located between the organic encapsulation sub-layer and the second inorganic encapsulation sub-layer.

After step S2, the preparation method further comprises:

in step S35, the touch layer 7 is formed over the encapsulation layer 6.

In step S36, a second light shielding material 42 is formed above the touch layer 7 at a position corresponding to the spacing region.

In step S37, the planarization layer 52 is formed on the second light-shielding material 42.

In the present embodiment, the pixel defining layer 22 including the light shielding material in the step S1 may be used as the light shielding pattern of the interval region B, or the conductive layer corresponding to the interval region B in the touch layer 7 in the step S35 may be blackened to have the light shielding function, which is not limited in the embodiment of the present disclosure.

The embodiment of the disclosure also provides a display panel, which comprises the display substrate.

The embodiment of the disclosure also provides a display device comprising the display panel.

The display device may be: any product or component with a display function, such as electronic paper, mobile phone, tablet computer, television, display, notebook computer, digital photo frame, navigator, etc., which is not limited in this disclosure.

It is to be understood that the above embodiments are merely exemplary embodiments employed to illustrate the principles of the present disclosure, however, the present disclosure is not limited thereto. Various modifications and improvements may be made by those skilled in the art without departing from the spirit and substance of the disclosure, and are also considered to be within the scope of the disclosure.

Claims (11)

1. A display substrate, comprising:

a substrate base;

a light emitting functional layer comprising: the pixel defining layer comprises a plurality of pixel accommodating holes corresponding to the light emitting devices one by one, and the light emitting devices are positioned in the corresponding pixel accommodating holes;

the semi-transparent and reflective layer is positioned on one side, far away from the substrate, of the light-emitting device, orthographic projection of the semi-transparent and reflective layer on the substrate at least covers orthographic projection of the pixel accommodating hole on the substrate, and light transmittance of the semi-transparent and reflective layer is 30% -70%.

2. The display substrate of claim 1, further comprising an encapsulation layer on a side of the light emitting device remote from the substrate;

the semi-transparent descending reflecting layer is positioned on one side of the packaging layer far away from the substrate base plate;

alternatively, the semi-transparent and reflective layer is located between the encapsulation layer and the light emitting device;

alternatively, the semi-permeable and reflective layer is located inside the encapsulation layer.

3. The display substrate of claim 1, wherein the transflective layer comprises: and the front projection of the semi-transparent and reflective patterns on the substrate covers the corresponding light emitting devices, and a spacing area exists between any two adjacent semi-transparent and reflective patterns.

4. The display substrate according to claim 3, further comprising a first light shielding pattern,

the first shading pattern and the semi-transparent descending and reflecting pattern are integrally formed, the first shading pattern fills the interval area, and the thickness of the first shading pattern is larger than that of the semi-transparent descending and reflecting pattern.

5. The display substrate according to claim 4, further comprising a transparent support pattern, wherein the transparent support pattern is located on a side of the corresponding semi-transparent descending pattern close to the substrate, the transparent support pattern is in contact with the corresponding semi-transparent descending pattern, and a side surface of the semi-transparent descending pattern away from the substrate is flush with a side surface of the first light shielding pattern away from the substrate;

or the surface of one side of the semi-transparent and reflective pattern close to the substrate is flush with the surface of one side of the first shading pattern close to the substrate, and a flattening layer is formed on one side of the semi-transparent and reflective pattern and one side of the shading pattern away from the substrate.

6. The display substrate of claim 1, wherein the transflective layer is a planar film layer.

7. A display substrate according to claim 3, wherein the light emitting device comprises a first electrode, a light emitting layer and a second electrode arranged in a direction away from the substrate;

the semi-transparent descending and reflecting pattern is in contact with the second electrode, the semi-transparent descending and reflecting pattern is made of metal materials, and metal elements in the semi-transparent descending and reflecting pattern are the same as metal elements in the second electrode.

8. The display substrate according to claim 7, wherein the first electrode and the light emitting layer of the light emitting device are located in the corresponding pixel accommodation hole, the second electrode is located at a side of the pixel defining layer away from the substrate, the display substrate further comprises a suppression pattern located at the spacing region, the suppression pattern is located at a side of the pixel defining layer away from the substrate; the pixel defining layer includes a light shielding material; and/or the number of the groups of groups,

the display substrate further comprises a second shading pattern, wherein the second shading pattern is positioned between any adjacent light emitting devices; and/or the number of the groups of groups,

the display substrate further comprises a touch layer, the touch layer comprises a first conductive layer, an insulating layer and a second conductive layer, the first conductive layer, the insulating layer and the second conductive layer are arranged along the direction away from the substrate, the first conductive layer comprises first transparent conductive patterns corresponding to the light emitting devices and first blackened conductive patterns located between any adjacent first transparent conductive patterns, and the second conductive layer comprises second transparent conductive patterns corresponding to the light emitting devices and second blackened conductive patterns located between any adjacent second transparent conductive patterns.

9. A method for manufacturing a display substrate, comprising:

providing a substrate base plate;

forming a light emitting functional layer comprising: the pixel defining layer comprises a plurality of pixel accommodating holes corresponding to the light emitting devices one by one, and the light emitting devices are positioned in the corresponding pixel accommodating holes;

and forming a semi-transparent and reflective layer, wherein the semi-transparent and reflective layer is positioned on one side, far away from the substrate, of the light-emitting device, the orthographic projection of the semi-transparent and reflective layer on the substrate at least covers the orthographic projection of the pixel accommodating hole on the substrate, and the light transmittance of the semi-transparent and reflective layer is 30-70%.

10. A display panel comprising the display substrate according to any one of claims 1-8.

11. A display device comprising the display panel of claim 9.

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