CN116035919A - Photosensitive resin composition, use method and application thereof - Google Patents
Photosensitive resin composition, use method and application thereof Download PDFInfo
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- CN116035919A CN116035919A CN202211736358.1A CN202211736358A CN116035919A CN 116035919 A CN116035919 A CN 116035919A CN 202211736358 A CN202211736358 A CN 202211736358A CN 116035919 A CN116035919 A CN 116035919A
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- photosensitive resin
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/891—Compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/15—Compositions characterised by their physical properties
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
Abstract
The present disclosure relates to a photosensitive resin composition, a method of use and applications thereof. The photosensitive resin composition comprises the following raw materials in parts by weight: 55-75 parts by weight of polyurethane acrylic acid ester oligomer; 5-25 parts by weight of a monofunctional acrylate monomer; 5-15 parts by weight of a multifunctional acrylic monomer; 1-5 parts of initiator. The photosensitive resin composition provided by the disclosure has the advantages of low viscosity, high curing speed, suitability for photocuring 3D printing technology, good toughness after curing and forming, low water absorption, good toughness, stable performance and strong impact resistance.
Description
Technical Field
The disclosure relates to the technical field of materials, and in particular relates to a photosensitive resin composition, a using method and application thereof.
Background
The complete denture consists of two parts, namely an artificial tooth and a denture base. The denture base is covered on the alveolar ridge of the missing tooth, and is used as a base for arranging the artificial teeth, so that all parts of the denture can be connected into a whole, and the force born by the artificial teeth can be uniformly transferred to the oral tissues. Denture bases can be divided into resin base bases and metal base bases according to different materials, and resin base bases are commonly used at present.
Conventional denture base resins include thermosetting denture base resins and self-setting denture base resins. The thermosetting denture base resin comprises a liquid and powder, wherein the liquid consists of methyl methacrylate, a cross-linking agent, a polymerization inhibitor, an ultraviolet light absorber and the like, the powder consists of polymethacrylate homo-or copolymer powder, pigment and the like, and when the thermosetting denture base resin is used, a separating agent is coated on a box, the liquid and the powder are blended to a certain aggregation state, and then the blended liquid and powder are filled into the box and heated for forming. The self-coagulation denture base resin also comprises a liquid agent and powder, wherein the liquid agent consists of methyl methacrylate, a small amount of accelerator, a polymerization inhibitor and an ultraviolet light absorber, and the powder consists of polymethacrylate homo-or copolymer powder, a small amount of initiator and a colorant. When in use, the denture base is similar to a thermosetting denture base, and can be cured and formed at room temperature with less heating process.
However, when the traditional denture base resin is used for preparing the denture base, the process is complex, the steps are more, the period is long, the use is very inconvenient, the photo-curing 3D printing technology is high in precision and fast in printing speed, the process is simple, a great deal of application is available in the field of stomatology at present, if the photo-curing 3D printing technology is used for replacing the traditional denture base preparation process, the manufacturing time can be effectively shortened, the cost is reduced, the labor investment is reduced, the production efficiency is improved, meanwhile, the number of times of the patient's visit before receiving denture restoration treatment can be reduced to a certain extent due to the greatly shortened manufacturing period, and the time and the treatment cost of the patient are reduced.
The liquid photosensitive resin matched with the photo-curing 3D printing technology is required to have low viscosity and high curing speed, and the traditional denture base resin has high viscosity due to the fact that the traditional denture base resin contains a large amount of polymethyl methacrylate with large molecular weight, so that the traditional denture base resin cannot be applied to photo-curing. In addition, the existing photocuring 3D printing photosensitive resin on the market has the defects of poor water absorption or poor toughness when the strength of the resin meets the requirements of the denture base, so that the resin cannot be used in the denture base.
Therefore, it is important to develop a photosensitive resin which is applicable to the photo-curing 3D printing technology, has low water absorption and high toughness and can be applied to denture bases.
Disclosure of Invention
In order to solve the technical problems, the present disclosure provides a photosensitive resin composition, a use method and an application thereof.
In a first aspect, the present disclosure provides a photosensitive resin composition, the raw materials comprising the following components in percentage by mass:
according to the preparation method, the polyurethane acrylic acid ester oligomer is used for providing strength and partial toughness in the main part of the formula, the multifunctional acrylic acid ester monomer serves as a cross-linking agent, the monofunctional acrylic acid ester monomer further reduces the viscosity of the system and keeps the strength, the multifunctional acrylic acid ester monomer is compatible with the polyurethane acrylic acid ester oligomer and matched with other components, the 3D printing photosensitive resin suitable for photocuring is developed, the curing speed is high, the toughness after curing molding is good, the water absorption rate is low, the impact resistance is high, and the preparation method can be applied to 3D printing of denture bases.
In the present disclosure, the urethane acrylate oligomer may be contained in an amount of 55 parts by weight, 60 parts by weight, 65 parts by weight, 70 parts by weight, or the like.
In the present disclosure, the content of the monofunctional acrylate monomer may be 8 parts by weight, 12 parts by weight, 16 parts by weight, 20 parts by weight, 24 parts by weight, or the like.
In the present disclosure, the content of the multifunctional acrylate monomer may be 8 parts by weight, 10 parts by weight, 12 parts by weight, 14 parts by weight, or the like.
In the present disclosure, the initiator may be contained in an amount of 1.5 parts by weight, 2 parts by weight, 2.5 parts by weight, 3 parts by weight, 3.5 parts by weight, 4 parts by weight, 4.5 parts by weight, or the like.
As a preferred embodiment of the present disclosure, the raw material of the photosensitive resin composition further includes 0.01 to 10 parts by weight of hyperbranched oligomer, for example, 1 part by weight, 2 parts by weight, 5 parts by weight, 8 parts by weight, and the like.
The problem that the resin is poor in water absorbability and toughness after curing and molding can be further improved by introducing the hyperbranched oligomer, and the prepared denture base is good in toughness, strong in impact resistance and free from breaking in daily use.
As a preferred embodiment of the present disclosure, the hyperbranched oligomer is selected from hyperbranched acrylates having a functionality of 6-30 and a viscosity of 1500-30000cps, the viscosity being at 25 ℃.
The functionality of the present disclosure is an average functionality, and the 6-30 may be 7, 8, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, etc.
The viscosity is 1500-30000cps, and can be 3000cps, 5000cps, 10000cps, 20000cps, etc.
As a preferred embodiment of the present disclosure, the urethane acrylate oligomer is selected from urethane (meth) acrylate and/or polyester urethane (meth) acrylate.
The polyurethane (meth) acrylate oligomer described in this disclosure may be a polyurethane methacrylate oligomer or a polyurethane acrylate, as well as other "(meth)" s understood as well.
The polyurethane (methyl) acrylate oligomer disclosed by the disclosure is a nonpolar and hydrophobic polyurethane (methyl) acrylate oligomer, provides strength and partial toughness, is matched with a polyfunctional monomer and a monofunctional monomer, has better toughness after curing and forming, has strong impact resistance and is hydrophobic, and the problems of performance reduction or volume expansion and the like caused by water absorption are not easy to occur.
As a preferred embodiment of the present disclosure, the polyurethane (meth) acrylate has a molecular weight of 500 to 7000, for example 600, 800, 1000, 2000, 5000, etc.
As a preferred embodiment of the present disclosure, the molecular weight of the polyester urethane (meth) acrylate is 2000 to 10000, for example, 3000, 4000, 5000, 6000, 8000, etc.
In the present disclosure, the molecular weights all refer to average molecular weights.
As a preferred embodiment of the present disclosure, the monofunctional acrylate monomer is selected from aliphatic monofunctional acrylate monomers containing an aliphatic ring.
As a preferred embodiment of the present disclosure, the monofunctional acrylate monomer is selected from any one or a combination of at least two of isobornyl (meth) acrylate, cyclohexyl acrylate, 3, 5-trimethylcyclohexyl (meth) acrylate, and 4-t-butylcyclohexyl acrylate.
The aliphatic monofunctional acrylate monomer containing the aliphatic ring is introduced, the aliphatic ring can further improve the strength of the resin, and meanwhile, the monofunctional group can reduce the overall functionality of the system and the crosslinking density, so that the brittleness and the viscosity of the resin are reduced, and the toughness is improved.
As a preferred embodiment of the present disclosure, the multifunctional acrylate monomer is selected from a difunctional or trifunctional acrylate monomer containing no benzene ring, preferably any one or a combination of at least two of 1, 6-hexanediol di (meth) acrylate, tripropylene glycol diacrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, dodecyl dimethacrylate, and tricyclodecane dimethanol diacrylate.
The present disclosure introduces bi-functional or tri-functional acrylate monomers containing no benzene ring as a crosslinking agent, which does not increase brittleness of the resin compared with an aromatic structure, and at the same time, can obtain a photosensitive resin composition with better toughness when being used in combination with aliphatic mono-functional acrylate monomers capable of reducing functionality.
As a preferred embodiment of the present disclosure, the initiator is selected from ethyl 2,4, 6-trimethylbenzoyl phenylphosphonate (TPO-L) and/or phenyl bis (2, 4, 6-trimethylbenzoyl) phosphine oxide (819).
Since the photosensitive resin composition prepared by the present disclosure is used in a mouth when applied to a denture base, the initiator is preferably selected from non-toxic initiators.
As a preferred embodiment of the present disclosure, the raw material of the photosensitive resin composition further includes 0.005 to 0.02 parts by weight of an ultraviolet light absorber, for example, 0.008 parts by weight, 0.01 parts by weight, 0.015 parts by weight, 0.018 parts by weight, and the like.
As a preferred embodiment of the present disclosure, the ultraviolet light absorber is selected from the group consisting of ultraviolet light absorber UV-1164, ultraviolet light absorber UV-P, ultraviolet light absorber UV-1990, and ultraviolet light absorber UV-4990.
As a preferred embodiment of the present disclosure, the raw material of the photosensitive resin composition further includes 0.05 to 0.2 parts by weight of a light stabilizer, for example, 0.08 parts by weight, 0.1 parts by weight, 0.15 parts by weight, 0.18 parts by weight, and the like.
As a preferred embodiment of the present disclosure, the light stabilizer is selected from the group consisting of light stabilizer LS-144, hindered amine light stabilizer HS-508 (292) or light stabilizer 770.
As a preferred technical scheme of the present disclosure, the viscosity of the photosensitive resin composition is 500-1200cps, and when the viscosity of the composition provided by the present disclosure is within this range, the requirement of 3D printing can be well satisfied.
As a preferred technical scheme of the present disclosure, the raw materials of the photosensitive resin composition include the following components in percentage by mass:
in the present disclosure, it is preferable that the sum of the amounts of the urethane acrylate oligomer, the monofunctional acrylate monomer, the polyfunctional acrylate monomer, the initiator, and the hyperbranched oligomer is 100 parts by weight.
In a second aspect, the present disclosure provides the use of the photosensitive resin composition of the first aspect for the preparation of a denture or denture base.
The photosensitive resin composition provided by the disclosure has low water absorption rate and good toughness, can be applied to false teeth or false tooth bases, and can not cause the problem of performance reduction or volume expansion discomfort caused by water absorption when worn by a user, and meanwhile, the photosensitive resin composition is not easy to break.
In a third aspect, the present disclosure provides a method for using the photosensitive resin composition of the first aspect, comprising the steps of: the components of the formulation are mixed and photocured.
The photosensitive resin composition provided by the disclosure has low viscosity and high curing speed, and can be prepared into target products such as false teeth or false tooth base by means of photocuring 3D printing.
Compared with the prior art, the technical scheme provided by the embodiment of the disclosure has the following advantages:
(1) The photosensitive resin composition provided by the disclosure has low viscosity, high curing speed, good toughness after curing and molding and low water absorption, and is suitable for the photo-curing 3D printing technology.
(2) The denture base prepared by the photosensitive resin composition provided by the disclosure has the advantages of no water absorption, good toughness, stable performance, strong impact resistance and difficult breaking.
Detailed Description
In order that the above objects, features and advantages of the present disclosure may be more clearly understood, a further description of aspects of the present disclosure will be provided below. It should be noted that, without conflict, the embodiments of the present disclosure and features in the embodiments may be combined with each other.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present disclosure, but the present disclosure may be practiced otherwise than as described herein; it will be apparent that the embodiments in the specification are only some, but not all, embodiments of the disclosure.
The material information for the following examples is shown in table 1:
TABLE 1
| Sample of | Manufacturer' s | Model number |
| Polyurethane (meth) acrylate 1 | Sand-dammar | CN1964 |
| Polyurethane (meth) acrylate 2 | Dai Masi | BR-952 |
| Polyester polyurethane (meth) acrylate 1 | Dai Masi | BR-741MD1 |
| Polyester polyurethane (meth) acrylate 2 | Dai Masi | BR-742S |
| Hyperbranched acrylate 1 (functionality 6, viscosity 1500 cps) | Dai Masi | BDT-1006 |
| Hyperbranched acrylic ester 2 | Dai Masi | BDT-1015 |
Example 1
The present embodiment provides a photosensitive resin composition comprising the following components:
wherein the polyurethane acrylic acid ester oligomer is polyurethane (methyl) acrylic acid ester 1, the monofunctional acrylic acid ester monomer is cyclohexyl acrylic acid ester, the multifunctional acrylic acid ester monomer is 1, 6-hexanediol dimethacrylate, the initiator is TPO-L, the hyperbranched oligomer is hyperbranched acrylic acid ester 1, the light stabilizer is hindered amine light stabilizer HS-508 (292), and the ultraviolet light absorber is UV1990.
Example 2
The present embodiment provides a photosensitive resin composition comprising the following components:
the polyurethane acrylic acid ester oligomer is polyurethane (methyl) acrylic acid ester 2, the monofunctional acrylic acid ester monomer is 3, 5-trimethyl cyclohexyl acrylic acid ester, the multifunctional acrylic acid ester monomer is tricyclodecane dimethanol diacrylate, the initiator is 819, the hyperbranched oligomer is hyperbranched acrylic acid ester 2, the light stabilizer is stabilizer LS-144, and the ultraviolet light absorber is UV4990.
Example 3
The present embodiment provides a photosensitive resin composition comprising the following components:
the polyurethane acrylic acid ester oligomer is polyester polyurethane (methyl) acrylic acid ester 1, the monofunctional acrylic acid ester monomer is 4-tertiary butyl cyclohexyl acrylic acid ester, the multifunctional acrylic acid ester monomer is dodecanediol dimethacrylate, the initiator is 2,4, 6-trimethylbenzoyl ethyl phenylphosphonate, the hyperbranched oligomer is hyperbranched acrylic acid ester 1, the light stabilizer is light stabilizer 770, and the ultraviolet light absorber is UV-P.
Example 4
The present embodiment provides a photosensitive resin composition.
The difference from example 1 is that in this example no hyperbranched oligomer is added.
Example 5
The present embodiment provides a photosensitive resin composition.
The difference from example 1 is that in this example, the polyfunctional acrylate monomer used is ethoxylated bisphenol A dimethacrylate.
Comparative example 1
The present comparative example provides a photosensitive resin composition.
The difference from example 2 is that in this comparative example, the content of the monofunctional polyacrylate monomer was adjusted to 2 parts by weight.
Comparative example 2
The present comparative example provides a photosensitive resin composition.
The difference from example 3 is that in this comparative example, the content of the monofunctional polyacrylate monomer was adjusted to 30 parts by weight.
Comparative example 3
The present comparative example provides a photosensitive resin composition.
The difference from example 2 is that in this comparative example, the content of the polyfunctional polyacrylate monomer was adjusted to 3 parts by weight.
Comparative example 4
The present comparative example provides a photosensitive resin composition.
The difference from example 3 is that in this comparative example, the content of the polyfunctional polyacrylate monomer was adjusted to 19 parts by weight.
Application example 1
The application example provides a denture base and a preparation method thereof.
And mixing the components in the formula amount, and printing the mixed resin composition by using a 3D printing technology to obtain the denture base.
Performance testing
The photosensitive resin compositions provided in examples and comparative examples were mixed, the viscosity of the mixture was tested, and then the water absorption, toughness and impact resistance of the cured product were cured and tested, wherein:
(1) Viscosity: measured according to the standard GBT2794-2013 single cylinder rotational viscometer.
(2) Water absorption rate: measured according to ASTM-D570-98 test method for Water absorption of plastics.
(3) Toughness: the test is carried out according to the breaking elongation measuring method of GBT1040.1-2018 plastic tensile property measuring method.
(4) Impact resistance: the test is carried out according to ISO180-2019 plastic notch impact determination method.
The test results are shown in Table 2:
TABLE 2
| Sample of | Viscosity/cps | Water absorption/% | Toughness/% | Impact resistance (kJ/m) 2 ) |
| Example 1 | 422 | 1.9 | 5.5 | 2.8 |
| Example 2 | 366 | 2.05 | 5.2 | 2.5 |
| Example 3 | 905 | 1.82 | 6 | 2.9 |
| Example 4 | 435 | 1.87 | 4.8 | 2.1 |
| Example 5 | 472 | 1.95 | 4.6 | 1.9 |
| Comparative example 1 | 1280 | 1.85 | 4.1 | 1.7 |
| Comparative example 2 | 260 | 2.15 | 4.5 | 1.9 |
| Comparative example 3 | 663 | 2.2 | 5.4 | 1.8 |
| Comparative example 4 | 382 | 2.06 | 4.3 | 1.7 |
According to the embodiment and the performance test, the photosensitive resin composition disclosed by the invention has the advantages of low viscosity, high curing speed, suitability for a photocuring 3D printing technology, good toughness, stable performance, strong impact resistance and difficult breaking, and the prepared denture base does not absorb water.
From a comparison of examples 1-3 and example 4, it is evident that the introduction of hyperbranched oligomers in the photosensitive resin composition can further increase the toughness of the cured product; as is evident from a comparison of examples 1 to 3 and example 5, the use of the multifunctional polyacrylate monomer without benzene ring can reduce brittleness of the cured product and increase toughness of the cured product. From comparison of examples 1 to 3 and comparative examples 1 to 4, it is understood that the addition amounts of the respective components in the photosensitive resin compositions provided in the present disclosure need to be within the limits of the present disclosure in order to give excellent use effects to the final cured product.
It should be noted that in this document, relational terms such as "first" and "second" and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
The foregoing is merely a specific embodiment of the disclosure to enable one skilled in the art to understand or practice the disclosure. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the disclosure. Thus, the present disclosure is not intended to be limited to the embodiments shown and described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. The photosensitive resin composition is characterized by comprising the following raw materials in parts by weight:
2. the photosensitive resin composition according to claim 1, wherein the raw material of the photosensitive resin composition further comprises 0.01 to 10 parts by weight of a hyperbranched oligomer;
preferably, the hyperbranched oligomer is selected from hyperbranched acrylates having a functionality of 6-30 and a viscosity of 1500-30000 cps.
3. The photosensitive resin composition according to claim 1 or 2, wherein the urethane acrylate oligomer is selected from urethane (meth) acrylate and/or polyester urethane (meth) acrylate;
preferably, the polyurethane (meth) acrylate has a molecular weight of 500 to 7000;
preferably, the polyester urethane (meth) acrylate has a molecular weight of 2000 to 10000.
4. A photosensitive resin composition according to any of claims 1-3, wherein said monofunctional acrylate monomer is selected from aliphatic monofunctional acrylate monomers containing an aliphatic ring, preferably any one or a combination of at least two of isobornyl (meth) acrylate, cyclohexyl acrylate, 3, 5-trimethylcyclohexyl (meth) acrylate, 4-t-butylcyclohexyl acrylate.
5. The photosensitive resin composition according to any of claims 1-4, wherein the multifunctional acrylate monomer is selected from the group consisting of difunctional or trifunctional acrylate monomers containing no benzene ring, preferably any one or a combination of at least two of 1, 6-hexanediol di (meth) acrylate, tripropylene glycol diacrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, 1, 12-dodecyl dimethacrylate, tricyclodecane dimethanol diacrylate.
6. The photosensitive resin composition according to any of claims 1-5, wherein the initiator is selected from ethyl 2,4, 6-trimethylbenzoyl phenylphosphonate and/or phenyl bis (2, 4, 6-trimethylbenzoyl) phosphine oxide.
7. The photosensitive resin composition according to any of claims 1-6, wherein the starting material of the photosensitive resin composition further comprises 0.005-0.02 parts by weight of an ultraviolet light absorber, preferably the ultraviolet light absorber is selected from the group consisting of ultraviolet light absorber UV-1164, ultraviolet light absorber UV-P, ultraviolet light absorber UV-1990, and ultraviolet light absorber UV-4990;
and/or the raw material of the photosensitive resin composition further comprises 0.05 to 0.2 parts by weight of a light stabilizer, preferably the light stabilizer is selected from the group consisting of a light stabilizer LS-144, a hindered amine light stabilizer HS-508, or a light stabilizer 770.
8. The photosensitive resin composition according to any of claims 1-7, wherein the photosensitive resin composition has a viscosity of 500-1200cps.
9. Use of the photosensitive resin composition according to any one of claims 1 to 8 for the preparation of a denture or denture base, preferably for the preparation of a denture base by 3D printing.
10. The method of using a photosensitive resin composition according to any one of claims 1 to 8, comprising the steps of: the components of the formulation are mixed and photocured.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211736358.1A CN116035919A (en) | 2022-12-30 | 2022-12-30 | Photosensitive resin composition, use method and application thereof |
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| CN202211736358.1A CN116035919A (en) | 2022-12-30 | 2022-12-30 | Photosensitive resin composition, use method and application thereof |
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| CN116035919A true CN116035919A (en) | 2023-05-02 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116999334A (en) * | 2023-08-08 | 2023-11-07 | 安徽光理智能科技有限公司 | Photosensitive resin composition with good hiding power and good sedimentation resistance, and preparation method and application thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116999334A (en) * | 2023-08-08 | 2023-11-07 | 安徽光理智能科技有限公司 | Photosensitive resin composition with good hiding power and good sedimentation resistance, and preparation method and application thereof |
| CN116999334B (en) * | 2023-08-08 | 2024-02-13 | 安徽光理智能科技有限公司 | Photosensitive resin composition with good hiding power and good sedimentation resistance, and preparation method and application thereof |
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