CN116013627B - Metal film resistor production and processing equipment - Google Patents
Metal film resistor production and processing equipment Download PDFInfo
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- CN116013627B CN116013627B CN202310288175.6A CN202310288175A CN116013627B CN 116013627 B CN116013627 B CN 116013627B CN 202310288175 A CN202310288175 A CN 202310288175A CN 116013627 B CN116013627 B CN 116013627B
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
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Abstract
The invention provides metal film resistor production and processing equipment, which belongs to the technical field of resistor processing and comprises an adjustment control mechanism, wherein the adjustment control mechanism comprises a painting control assembly and a pre-control assembly, the painting control assembly comprises an upper control piece with a contact surface and a lower receiving piece with a receiving plane, and the upper control piece continuously and circularly passes through the receiving plane and is matched with the receiving plane to form an instant control area for temporarily controlling stable rotation of a resistor. This metal film resistor production and processing equipment, in the painting operation of pipelined, adjust control is carried out to the position of resistance before the resistance gets into the region of painting through adjustment control structure and carries out temporary control to resistance pivoted state after getting into the region of painting, makes the resistance get into the region of painting with stable pivoted device until accomplishing the painting work, has effectively improved the controllability and the stability of painting effect to reduced the inhomogeneous, the insufficient incidence of painting, can not influence the normal transport of resistance simultaneously.
Description
Technical Field
The invention relates to the technical field of resistor processing, in particular to metal film resistor production and processing equipment.
Background
The metal film resistor (hereinafter referred to as resistor) is widely used as resistor, and has the advantages of high precision, stable performance, simple structure and the like.
At present, the processing of varnishing in the resistance production process is mainly to carry out the operation with the mode of assembly line, the process of varnishing carries the resistance through conveyor lasts, make the resistance pass through varnishing device, accomplish the varnishing work under the condition of not stopping, the efficiency of the operation of whole varnishing is high, but in the in-process of assembly line operation, in order to be convenient for get of resistance put, can place the resistance on open recess generally, the pin stick at resistance both ends is horizontal put on the recess, under this state, the accuracy of resistance placement position and the state of motion all hardly with the control, the in-process of varnishing can not stable control resistance rotate also can not effectual control resistance position's accuracy, and then be difficult to control resistance varnishing's effect, the condition that the degree of consistency of varnishing is poor, the varnishing is easy to take place.
Disclosure of Invention
The invention provides a metal film resistor production and processing device, which aims to solve the problem that the resistor position precision and the motion state are difficult to control in the related technology.
The invention provides a metal film resistor production and processing device, which comprises a lacquering device, a feeding device and a processing device, wherein the lacquering device provides a lacquering plane attached with lacquer liquid; the conveying device is used for continuously conveying the resistor and the resistor passes through the painting plane; an adjustment control mechanism; the adjusting control mechanism comprises a painting control assembly and a pre-control assembly, wherein the painting control assembly comprises an upper control piece with a contact surface and a lower receiving piece with a receiving plane, the upper control piece continuously circulates through the receiving plane and is matched with the receiving plane to form a temporary control resistor stably rotating instant control area, when the upper control piece passes through the receiving plane, the contact surface on the upper control piece is parallel to the receiving plane, before the resistor enters a painting plane area in the assembly line painting operation, the pin slides on the receiving plane along with the conveying of the conveying device, at the moment, the pin is clamped between the contact surface and the receiving plane, the contact surface moves in an accelerating mode along the conveying direction of the resistor, the resistor enters the painting plane in a rotating state until the painting operation is completed, and the pre-control assembly is used for controlling the position of the resistor, so that the resistor enters the instant control area in a preset position state.
In one possible implementation manner, the pre-control component comprises a mounting seat and a plurality of adjusting discs, the adjusting discs are rotationally connected to the mounting seat, the adjusting discs are equally divided into two groups and are symmetrically distributed in a front-back mode, each group of adjusting discs is distributed in a step mode along the resistor conveying direction, and the intervals between the symmetrical adjusting discs in the two groups of adjusting discs are gradually reduced along the resistor conveying direction.
In one possible implementation manner, the upper control member comprises a contact belt, a rotating wheel with a groove and a connecting shaft, the connecting shaft is distributed in a bilateral symmetry manner, the rotating wheel is distributed on the connecting shaft in a front-back symmetry manner, and the contact belt is in a waist-hole-shaped closed state and is distributed in a front-back symmetry manner and is arranged on the corresponding rotating wheel.
In one possible implementation manner, the adjusting control mechanism further comprises a secondary position control disc, the secondary position control disc is mounted on the connecting shaft on the right side, the secondary position control disc is located on the left side of the pre-position control assembly and distributed in a front-back symmetrical mode and used for limiting the resistor to be entered into the instant control area, and edges of opposite faces of the secondary position control disc are inclined.
In one possible implementation manner, the painting device comprises a paint liquid tank, a liquid taking belt and a limiting column, wherein the liquid taking belt is in a closed state and circulates through the paint liquid tank to glue the paint liquid, the circulating direction of the liquid taking belt is opposite to the conveying direction of the conveying device, and the limiting column forms a painting plane through limiting the liquid taking belt.
In one possible implementation manner, the conveying device comprises a conveying seat, a conveying belt is arranged on the conveying seat, a placing seat with grooves is uniformly arranged on the conveying belt, and the grooves are in a V shape.
The above technical solutions in the embodiments of the present invention have at least one of the following technical effects: 1. according to the metal film resistor production and processing equipment provided by the embodiment of the invention, in the assembly line type painting operation, the position of the resistor is regulated and controlled before the resistor enters the painting area by adjusting the control structure, and the rotating state of the resistor is temporarily controlled after the resistor enters the painting area, so that the resistor enters the painting area by a device capable of stably rotating until the painting operation is completed, the controllability and the stability of the painting effect are effectively improved, the occurrence rate of uneven painting and insufficient painting is reduced, and meanwhile, the normal conveying of the resistor is not influenced.
2. According to the metal film resistor production and processing equipment provided by the embodiment of the invention, the position of the resistor is regulated and controlled through the regulating disc which is arranged in a stepped manner, so that the accuracy of the position of the resistor when the resistor enters a painting area is improved, the stability and convenience of the painting process are further improved, the purpose of regulating the position of the resistor can be achieved through the regulating disc, the state that the friction force is generated to influence the placement state of the resistor due to relative displacement with the resistor in the regulating process can be effectively avoided, and the stability of the state in the regulating process of the position of the resistor is improved.
3. According to the metal film resistor production and processing equipment provided by the embodiment of the invention, the pins of the resistor are clamped between the contact surface and the bearing plane in the process of painting, and the rotation of the resistor is controlled stably through the friction force of the movable product of the contact surface, so that the stability of the painting process is improved.
4. According to the metal film resistor production and processing equipment provided by the embodiment of the invention, the position of the resistor is regulated and controlled through the pre-control component, and then the position of the resistor is regulated and controlled again by the secondary control position disc immediately before the resistor enters the instant control area, so that the accuracy of the position of the resistor is ensured, and the stability of the subsequent painting work is improved.
5. According to the metal film resistor production and processing equipment provided by the embodiment of the invention, the V-shaped grooves provide moving space for the pins of the resistor, so that errors between the moving speed of the resistor and the moving speed of the conveying device in the process of painting are compensated, and the stability of the resistor in the process of painting is further improved.
Drawings
Fig. 1 is a schematic diagram of a local conveying device of a metal film resistor production and processing device according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a painting control assembly of a metal film resistor production and processing device according to an embodiment of the present invention.
Fig. 3 is a schematic top view of a painting device, a painting control assembly and a pre-positioning control assembly of a metal film resistor production and processing apparatus according to an embodiment of the present invention.
Fig. 4 is a schematic front view of a partial structure of a painting control assembly of a metal film resistor production and processing apparatus according to an embodiment of the present invention.
Fig. 5 is a schematic front view of a painting device and a painting control assembly of a metal film resistor production and processing apparatus according to an embodiment of the present invention.
Fig. 6 is a schematic side view of a secondary control panel of a metal film resistor production and processing apparatus according to an embodiment of the present invention.
Fig. 7 is a schematic side view of a metal film resistor manufacturing apparatus according to an embodiment of the present invention.
Fig. 8 is a schematic structural view of a placement base of a metal film resistor production and processing apparatus according to an embodiment of the present invention.
Reference numerals: 1. a painting device; 2. a conveying device; 3. and adjusting the control mechanism.
101. A lacquer tank; 102. a liquid taking belt; 103. and a limit column.
21. A conveying seat; 22. a conveyor belt; 23. and (5) placing a seat.
31. A paint control assembly; 32. a pre-positioning component; 33. and a secondary position control disc.
311. An upper control member; 312. and a lower receiving member.
3111. A contact belt; 3112. a rotating wheel; 3113. and a connecting shaft.
321. A mounting base; 322. an adjusting disk.
Detailed Description
In order that the above objects, features and advantages of the invention will be readily understood, a more particular description of the invention will be rendered by reference to the appended drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The invention may be embodied in many other forms than described below and similarly modified by those skilled in the art without departing from the spirit or scope of the invention, which is therefore not limited to the specific embodiments disclosed below.
Referring to fig. 1 and 2, a metal film resistor production and processing device comprises a painting device 1, a conveying device 2 and an adjusting control mechanism 3, in the assembly line type painting operation, the painting device 1 provides a painting plane attached with paint liquid, the area where the painting plane is located is a painting area, as shown in fig. 1, the conveying device 2 is used for continuously conveying resistors and the resistors pass through the painting area, the adjusting control mechanism 3 is used for gradually adjusting the positions of the resistors before the resistors enter the painting area, ensuring that the painted positions of the resistors are completely covered by the painting area, and then temporarily controlling the resistors when the resistors are about to enter the painting area, so that the resistors enter the painting area in a stable rotating state until the painting operation is completed, the controllability and stability of the painting effect are effectively improved, and the occurrence rate of uneven painting and insufficient painting is reduced.
Referring to fig. 1, 2, 3 and 4, the adjustment control mechanism 3 includes a painting control component 31 and a pre-control component 32, where the painting control component 31 includes an upper control piece 311 with a contact surface and a lower receiving piece 312 with a receiving plane, where the upper control piece 311 continuously circulates through the receiving plane and cooperates with the receiving plane to form a temporary control area for controlling stable rotation of the resistor, and when the contact surface is parallel to the receiving plane, during the process of painting the resistor, before the resistor enters the area of the painting plane, the pin slides on the receiving plane along with the conveying of the conveying device 2, at this time, the pin is clamped between the contact surface and the receiving plane, and the contact surface moves in an accelerating manner along the direction of conveying the resistor, so that the resistor enters the painting plane in a rotating state until the painting work is completed.
Referring to fig. 2, 3 and 7, the pre-control component 32 includes a mounting seat 321 and a plurality of adjusting discs 322, the adjusting discs 322 are rotationally connected to the mounting seat 321, and the adjusting discs 322 are equally divided into two groups and are symmetrically distributed front and back, each group of adjusting discs 322 is distributed in a step shape along the resistor conveying direction, the distance between the symmetrical adjusting discs 322 in the two groups of adjusting discs 322 is gradually reduced along the resistor conveying direction, as shown in fig. 3, the direction indicated by the corresponding arrow is the rotating direction of the adjusting discs 322, in the resistor conveying process, the right-to-left direction sequentially passes through the symmetrical adjusting discs 322, the position of the resistor is circularly and progressively adjusted until the resistor is at a preset position through the rotating adjusting discs 322, as shown in fig. 3, the contact area between the rotating adjusting discs 322 and the resistor hardly generates relative displacement, not only can achieve the purpose of adjusting the resistor position, but also can effectively avoid the situation that the relative displacement between the adjusting discs and the resistor influences the resistor placing state, wherein the friction force generated by the adjusting discs 322 is smooth, and the friction force is further reduced.
Referring to fig. 2, 3, 4 and 5, the upper control member 311 includes a contact belt 3111, a grooved rotating wheel 3112 and a connecting shaft 3113, the connecting shaft 3113 is symmetrically distributed around the connecting shaft 3113, the contact belt 3111 is in a waist-hole-shaped closed state and symmetrically distributed around and disposed on the corresponding rotating wheel 3112, as shown in fig. 3, the right connecting shaft 3113 is a driving shaft, the rotating wheel 3112 synchronously drives the rotating wheel 3112 thereon, and the rotating wheel 3112 on the left connecting shaft 3113 is rotatably connected to the connecting shaft 3113, the connecting shaft 3113 on the right is rotated, the contact belt 3111 is driven to move by the rotating wheel 3112, as shown in fig. 4, the direction of the black solid arrow is the direction of movement of the contact belt 3111, the direction of the hollow arrow is the manner of resistor conveying, and the moving speed of the contact belt 3111 is greater than that of resistor conveying, the resistor is controlled to rotate by stable friction, and the symmetrical and synchronously disposed contact belt 3111 can balance the resistor stress, further improve the stability of resistor rotation.
Referring to fig. 3 and 6, the adjustment control mechanism 3 further includes a secondary control disc 33, where the secondary control disc 33 is mounted on the right connecting shaft 3113, the secondary control disc 33 is located on the left side of the pre-control assembly 32 and symmetrically distributed around and is used for limiting the resistor that is about to enter the immediate control area, and edges of opposite sides of the secondary control disc 33 are inclined, as shown in fig. 3, after the resistor passes through the pre-control assembly 32 to perform position adjustment control, the position of the resistor is controlled and confirmed again by the secondary control disc 33 immediately before entering the immediate control area, so as to ensure the accuracy of the resistor, and improve the stability of the subsequent painting work.
Referring to fig. 2, 3 and 5, the painting device 1 includes a paint liquid tank 101, a liquid taking belt 102 and a limiting post 103, the liquid taking belt 102 is in a closed state and circulates through the paint liquid tank 101 to adhere the paint liquid, the circulating direction of the liquid taking belt 102 is opposite to the conveying direction of the conveying device 2, the limiting post 103 forms a painting plane by limiting the liquid taking belt 102, as shown in fig. 5, and in the painting process, the resistor passes through the painting plane in a rotating state to finish the painting work.
Referring to fig. 1 and 8, the conveying device 2 includes a conveying seat 21, a conveying belt 22 is disposed on the conveying seat 21, a placement seat 23 with grooves is uniformly disposed on the conveying belt 22, the grooves are V-shaped, as shown in fig. 8, in an initial state, pins of a resistor are located at the bottom of the grooves on the placement seat 23, in a painting process, the pins of the resistor are located on a receiving plane of the lower receiving member 312, and the receiving plane is higher than the bottom of the grooves, so that the bottoms of the grooves where the pins leave are located, as shown in the middle placement seat 23 in fig. 8, at this time, the V-shaped grooves provide a certain movable space for the pins of the resistor, so that errors between the moving speed of the resistor and the moving speed of the conveying device 2 in the painting process can be compensated, and stability of the painting process of the resistor is further improved.
In embodiments of the invention, unless expressly specified and limited otherwise, a first feature "up" or "down" on a second feature may be that the first and second features are in direct contact, or that the first and second features are in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
In the description of the present invention, it should also be noted that, unless explicitly specified and limited otherwise, the terms "disposed," "connected," "mounted," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, integrally connected, or slidably connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
Furthermore, the terms "front," "back," "left," "right," and the like refer to an orientation or positional relationship based on that shown in the drawings, for convenience of description and to simplify the description, and do not denote or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the invention.
The embodiments of the present invention are all preferred embodiments of the present invention, and are not intended to limit the scope of the present invention in this way, therefore: all equivalent changes in structure, shape and principle according to the present invention should be covered in the protection scope of the present invention.
Claims (5)
1. A metal film resistor production and processing device is characterized in that: the device comprises a painting device (1), wherein the painting device (1) provides a painting plane attached with paint liquid;
the conveying device (2) is used for continuously conveying the resistor, and the resistor passes through the painting plane;
the device comprises an adjusting control mechanism (3), wherein the adjusting control mechanism (3) comprises a lacquering control assembly (31) and a pre-control assembly (32), the lacquering control assembly (31) comprises an upper control piece (311) with a contact surface and a lower receiving piece (312) with a receiving plane, the upper control piece (311) continuously circulates through the receiving plane and is matched with the receiving plane to form an instant control area for temporarily controlling the stable rotation of the resistor, and the contact surface on the upper control piece (311) is parallel to the receiving plane when the upper control piece passes through the receiving plane;
when the assembly line is used for painting, before the resistor enters the painting plane area, the pins slide on the bearing plane along with the conveying of the conveying device (2), at the moment, the pins are clamped between the contact surface and the bearing plane, and the contact surface moves in an acceleration way along the conveying direction of the resistor, so that the resistor enters the painting plane in a rotating state until the painting work is completed;
the pre-control component (32) is used for controlling the position of the resistor so that the resistor enters the instant control area in a preset position state;
the pre-control assembly (32) comprises a mounting seat (321) and a plurality of adjusting discs (322), the adjusting discs (322) are rotationally connected to the mounting seat (321), the adjusting discs (322) are equally divided into two groups and are distributed in a front-back symmetrical mode, each group of adjusting discs (322) is distributed in a stepped mode along the resistor conveying direction, and the distance between the symmetrical adjusting discs (322) in the two groups of adjusting discs (322) is gradually reduced along the resistor conveying direction.
2. The metal film resistor production and processing apparatus according to claim 1, wherein: the upper control piece (311) comprises a contact belt (3111), a rotating wheel (3112) with a groove and a connecting shaft (3113), the connecting shaft (3113) is distributed symmetrically left and right, the rotating wheel (3112) is distributed on the connecting shaft (3113) symmetrically front and back, and the contact belt (3111) is in a waist hole-shaped closed state and is distributed symmetrically front and back and arranged on the corresponding rotating wheel (3112).
3. The metal film resistor production and processing apparatus according to claim 2, wherein: the adjusting control mechanism (3) further comprises a secondary position control disc (33), the secondary position control disc (33) is arranged on a connecting shaft (3113) on the right side, the secondary position control disc (33) is located on the left side of the pre-position control component (32) and symmetrically distributed in front-back mode and used for limiting the resistor which is about to enter the instant control area, and edges of opposite faces of the secondary position control disc (33) are inclined.
4. The metal film resistor production and processing apparatus according to claim 1, wherein: the lacquering device (1) comprises a lacquer liquid groove (101), a liquid taking belt (102) and a limiting column (103), wherein the liquid taking belt (102) is in a closed state and circulates to be stuck by the lacquer liquid groove (101), the circulating direction of the liquid taking belt (102) is opposite to the conveying direction of the conveying device (2), and the limiting column (103) forms a lacquering plane through limiting the liquid taking belt (102).
5. The metal film resistor production and processing apparatus according to claim 1, wherein: the conveying device (2) comprises a conveying seat (21), a conveying belt (22) is arranged on the conveying seat (21), a placing seat (23) with grooves is uniformly arranged on the conveying belt (22), and the grooves are in a V shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310288175.6A CN116013627B (en) | 2023-03-23 | 2023-03-23 | Metal film resistor production and processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310288175.6A CN116013627B (en) | 2023-03-23 | 2023-03-23 | Metal film resistor production and processing equipment |
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| Publication Number | Publication Date |
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| CN116013627A CN116013627A (en) | 2023-04-25 |
| CN116013627B true CN116013627B (en) | 2023-06-09 |
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| CN202310288175.6A Active CN116013627B (en) | 2023-03-23 | 2023-03-23 | Metal film resistor production and processing equipment |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111276307A (en) * | 2020-03-04 | 2020-06-12 | 孙文 | Resistor manufacturing method and resistor |
| CN112721401A (en) * | 2021-01-27 | 2021-04-30 | 四川五环石化装备有限公司 | Corrosion-resistant sound insulation aluminium honeycomb panel die mould device that inhales |
| CN113972044A (en) * | 2021-12-07 | 2022-01-25 | 深圳市深益嘉科技有限公司 | Intelligent environment-friendly resistance coating equipment and coating method |
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- 2023-03-23 CN CN202310288175.6A patent/CN116013627B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111276307A (en) * | 2020-03-04 | 2020-06-12 | 孙文 | Resistor manufacturing method and resistor |
| CN112721401A (en) * | 2021-01-27 | 2021-04-30 | 四川五环石化装备有限公司 | Corrosion-resistant sound insulation aluminium honeycomb panel die mould device that inhales |
| CN113972044A (en) * | 2021-12-07 | 2022-01-25 | 深圳市深益嘉科技有限公司 | Intelligent environment-friendly resistance coating equipment and coating method |
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