CN115925252A - Ultra-white amorphous aluminum-silicon oxide material, preparation method thereof and metal coating product - Google Patents
Ultra-white amorphous aluminum-silicon oxide material, preparation method thereof and metal coating product Download PDFInfo
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- CN115925252A CN115925252A CN202310101929.2A CN202310101929A CN115925252A CN 115925252 A CN115925252 A CN 115925252A CN 202310101929 A CN202310101929 A CN 202310101929A CN 115925252 A CN115925252 A CN 115925252A
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- 239000000463 material Substances 0.000 title claims abstract description 107
- -1 aluminum-silicon oxide Chemical compound 0.000 title claims abstract description 65
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 29
- 239000002184 metal Substances 0.000 title claims abstract description 29
- 238000002360 preparation method Methods 0.000 title claims abstract description 19
- 239000011248 coating agent Substances 0.000 title abstract description 11
- 238000000576 coating method Methods 0.000 title abstract description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000002994 raw material Substances 0.000 claims abstract description 15
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 13
- 229910052742 iron Inorganic materials 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 29
- 239000000203 mixture Substances 0.000 claims description 23
- 229910002651 NO3 Inorganic materials 0.000 claims description 13
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 13
- 238000004544 sputter deposition Methods 0.000 claims description 13
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 12
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 claims description 11
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 10
- 238000002844 melting Methods 0.000 claims description 9
- 230000008018 melting Effects 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 7
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052711 selenium Inorganic materials 0.000 claims description 6
- 239000011734 sodium Substances 0.000 claims description 6
- 235000010333 potassium nitrate Nutrition 0.000 claims description 5
- 239000004323 potassium nitrate Substances 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 235000010344 sodium nitrate Nutrition 0.000 claims description 4
- 239000004317 sodium nitrate Substances 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 238000005468 ion implantation Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims description 3
- 229910052939 potassium sulfate Inorganic materials 0.000 claims description 3
- 235000011151 potassium sulphates Nutrition 0.000 claims description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 3
- 235000011152 sodium sulphate Nutrition 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 229910018125 Al-Si Inorganic materials 0.000 claims description 2
- 229910018520 Al—Si Inorganic materials 0.000 claims description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 2
- YAIQCYZCSGLAAN-UHFFFAOYSA-N [Si+4].[O-2].[Al+3] Chemical compound [Si+4].[O-2].[Al+3] YAIQCYZCSGLAAN-UHFFFAOYSA-N 0.000 claims 2
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 1
- 229910021653 sulphate ion Inorganic materials 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 17
- 239000003795 chemical substances by application Substances 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract description 3
- 239000011521 glass Substances 0.000 description 25
- 239000011669 selenium Substances 0.000 description 10
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000075 oxide glass Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 4
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 4
- 238000005303 weighing Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 description 2
- 238000003426 chemical strengthening reaction Methods 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- 239000003712 decolorant Substances 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000012925 reference material Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 230000003137 locomotive effect Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
- C03C3/111—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/40—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal all coatings being metal coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
The application relates to the field of amorphous inorganic oxide materials and metal coating products thereof, and discloses an ultra-white amorphous aluminum-silicon oxide material, a preparation method thereof and a metal coating product. The ultra-white amorphous aluminum silicon oxide material ensures that the light transmittance of the ultra-white amorphous aluminum silicon oxide material is more than 92.0 percent by controlling the iron content in the raw materials to be less than 120ppm and adding a proper chemical decolorizing agent and a proper physical decolorizing agent to ensure that the physical decolorizing agent accords with a certain proportional relation, and ensures that the chromaticity coordinates move towards the direction of a white point (origin 0, 0) according to the a and b values of a uniform chromaticity space standard, so that the material is seen to be white.
Description
Technical Field
The application relates to the field of amorphous inorganic oxide materials and metal coating products thereof, in particular to an ultra-white amorphous aluminum-silicon oxide material, a preparation method thereof and a metal coating product.
Background
The high-alumina glass is one of widely applied materials in amorphous materials, can increase the surface hardness through chemical strengthening, improves the scratch resistance, and greatly increases the bending resistance and the impact strength; in addition, the glass is thinner, can replace thick glass, realizes light weight, and can be widely applied to display screen protective glass (mobile phones, flat plates, pen-electricity, vehicle navigation and the like), transparent parts of vehicles (front windshield glass of high-speed rail locomotives, automobile body glass, airplane transparent parts and the like) and the like. However, these applications require glass with higher transparency and "whiteness", i.e. not only high transmittance, but also better "white" as the chromaticity coordinate values of a and b are closer to the origin "0,0" according to the uniform chromaticity space standard of ICE (international commission on illumination) 1976.
The raw materials used in the production of high-alumina glass inevitably carry impurity iron, the oxide of the iron is valence-variable oxide in the glass, and simultaneously Fe 2+ And Fe 3+ Ferrous iron is present, ferrous iron is green and ferric iron is yellow in the glass.
Reducing the iron oxide content of various raw materials is one of the directly effective methods for increasing the transmittance of the glass and reducing the chromaticity a and b, but it is known that the lower the iron content of the raw materials, the higher the price thereof, for example, silica sand containing 50ppm and 80ppm of iron, the cost is greatly increased, and the like. Therefore, how to provide an ultra-white glass material which has the requirements of production cost, light transmittance and chromaticity is a technical problem which needs to be solved urgently at present.
Disclosure of Invention
In view of the above, an object of the present application is to provide an ultra-white amorphous aluminum silicon oxide material and a method for preparing the same, such that chromaticity coordinate values of a and b of the material are closer to the origin "0,0", chromaticity is whiter, and the material has a higher transmittance;
another object of the present application is to provide a metal-plated article based on the above ultra-white aluminum-silicon oxide material and a method for preparing the same.
To solve the above technical problems/achieve the above object or at least partially solve the above technical problems/achieve the above object, as a first aspect of the present application, there is provided an ultra-white amorphous aluminum silicon oxide material including (1) an inorganic oxide, (2) Se and/or Nd 2 O 3 And (3) Co 2 O 3 (ii) a The Se and/or Nd 2 O 3 0.5-1.5ppm of Co in the total weight of the ultra-white amorphous aluminum-silicon oxide material 2 O 3 0.3-0.9ppm of the total weight of the ultra-white amorphous aluminum-silicon oxide material, wherein the inorganic oxide comprises the following components in percentage by weight:
SiO 2 58wt%-62wt%
Al 2 O 3 13%wt-15wt%
Na 2 O 13%wt-16wt%
K 2 O 4wt%-7wt%
MgO 3wt%-4.9wt%
ZrO 2 0.5wt%-1.2wt%
wherein the content of iron in the inorganic oxide is less than 120ppm of the total weight of the ultra-white amorphous aluminum-silicon oxide material.
Alternatively, the Se or Nd 2 O 3 、Co 2 O 3 The content of (A) satisfies the requirement of formula 1:
0.3≤Co 2 O 3 /(Se+Nd 2 O 3 ) Formula 1 is less than or equal to 1.
As a second aspect of the present application, there is provided a method for preparing the ultra-white amorphous aluminum silicon oxide material, including:
taking various raw materials according to the composition of the ultra-white amorphous aluminum-silicon oxide material, adding sulfate and/or nitrate, mixing to obtain a mixture, melting the mixture, molding, annealing, and slicing to prepare the ultra-white amorphous aluminum-silicon oxide material.
Optionally, the sulfate comprises sodium sulfate and/or potassium sulfate and the nitrate comprises sodium nitrate and/or potassium nitrate; further optionally, the addition amount of the sulfate is 0.4-1.6kg per 100kg of the mixture, and the addition amount of the nitrate is 2.0-4.0kg per 100kg of the mixture.
Optionally, the residual oxygen amount is kept greater than 2% at the side of the discharge port during the preparation process.
As a third aspect of the present application, based on the excellent chemical strengthening performance and efficiency of the ultra-white amorphous aluminum silicon oxide material, the application of the ultra-white amorphous aluminum silicon oxide material or the ultra-white amorphous aluminum silicon oxide material prepared by the preparation method in the preparation of a metal coating product is provided.
As a fourth aspect of the present application, a metal-plated article is provided, which includes the ultra-white amorphous aluminum-silicon oxide material described in the present application or the ultra-white amorphous aluminum-silicon oxide material prepared by the preparation method described in the present application, and a metal film plated on the surface of the article with one or more layers.
Alternatively, the metal film includes one or two or more of a Cr film, a Ni film, a Ti film, an Au film, an Ag film, a Cu film, and an Al film, and the metal film is plated by a chemical vapor deposition method, a vacuum evaporation method, a sputtering method, or an ion implantation method.
Compared with the similar amorphous aluminum silicon oxide material, the ultra-white amorphous aluminum silicon oxide material ensures that the light transmittance of the ultra-white amorphous aluminum silicon oxide material is more than 92.0 percent by controlling the total introduction amount of ferric oxide impurities in the raw materials to be less than 120ppm and adding a proper chemical decolorizing agent and a proper physical decolorizing agent to ensure that the physical decolorizing agent accords with a certain proportion relation, and enables the chromaticity coordinates to move towards the direction of a white point (origin point 0, 0) according to the values a and b of the uniform chromaticity space standard, so that the visual glass is white.
Drawings
FIG. 1 is a flow chart of the preparation process of the ultra-white amorphous Al-Si oxide material of the present application;
FIG. 2 is a diagram of chromaticity coordinates of an embodiment of the present application; namely, the coordinate graphs of a and b values in the chromaticity control area under the reference thickness of the ultra-white amorphous aluminum silicon oxide material in the embodiment of the application are the areas constructed by (b-0.14) × 2/0.0016+ (a + 0.012) × 2/0.000324=2 ″ required by ICE in the graph;
FIG. 3 is a plot of chromaticity coordinates of a comparative example; namely, a graph of a and b values in a chromaticity control area under the reference thickness of the reference material is compared, and an oval area in the graph is an area constructed by (b-0.14) × 2/0.0016+ (a + 0.012) × 2/0.000324= 2' required by ICE.
Detailed Description
The application discloses an ultra-white amorphous aluminum-silicon oxide material and a metal coating product thereof, and a person skilled in the art can use the contents for reference and appropriately improve the process parameters to realize the process. It is expressly intended that all such similar substitutes and modifications apparent to those skilled in the art are deemed to be included in the present application. While the products, processes and applications described herein have been described in terms of preferred embodiments, it will be apparent to those of ordinary skill in the art that variations and modifications in the products, processes and applications described herein, as well as other suitable variations and combinations, may be made to implement and use the techniques of this application without departing from the content, spirit and scope of the application. It should be apparent that the described embodiments are only some of the embodiments of the present application, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It is noted that, in this document, relational terms such as "first" and "second", "step 1" and "step 2", and "(1)" and "(2)" may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrases "comprising a," "8230," "8230," or "comprising" does not exclude the presence of additional like elements in a process, method, article, or apparatus that comprises the element. Meanwhile, the embodiments and features in the embodiments may be combined with each other in the present application without conflict.
In a first aspect of the present application, there is provided an ultra-white amorphous aluminum silicon oxide material comprising (1) an inorganic oxide, (2) Se or Nd 2 O 3 And (3) Co 2 O 3 (ii) a The Se or Nd 2 O 3 0.5-1.5ppm of Co in the total weight of the ultra-white amorphous aluminum-silicon oxide material 2 O 3 0.3-0.9ppm of the total weight of the ultra-white amorphous aluminum-silicon oxide material, wherein the inorganic oxide comprises the following components in percentage by weight:
SiO 2 58wt%-62wt%
Al 2 O 3 13%wt-15wt%
Na 2 O 13%wt-16wt%
K 2 O 4wt%-7wt%
MgO 3wt%-4.9wt%
ZrO 2 0.5wt%-1.2wt%
wherein the inorganic oxide has an iron (as ferric oxide) content of less than 120ppm based on the total weight of the ultra-white amorphous aluminum silicon oxide material.
In certain embodiments of the present application, the SiO 2 58%, 60.5%, 60.7%, 61% or 61.4% by weight of Al 2 O 3 13%, 13.5%, 13.8% or 15% by weight of Na 2 O accounts for 13%, 14%, 15% or 16% by weight, and K is 2 O is 4%, 6%, 6.3% or 7% by weight, mgO is 3%, 4%, 4.5%, 4.8% or 4.9% by weight, and ZrO is provided 2 The weight percentage is 0.5%, 0.6%, 0.8%, 1.0% or 1.2%.
In certain embodiments of the present application, the Se or Nd 2 O 3 0.5ppm, 0.8ppm, 1.0ppm, 1.1ppm, 1.3ppm or 1.5ppm of the total weight of the ultra-white amorphous aluminum-silicon oxide material, and the Co 2 O 3 0.3ppm, 0.5ppm, 0.6ppm, 0.7ppm, 0.8ppm or 0.9ppm of the total weight of the ultra-white amorphous aluminum-silicon oxide material.
In certain embodiments of the present application, the inorganic oxide has an iron (as ferric oxide) content of less than 120ppm, 110ppm, 100pmm, or 90ppm, for example, 82ppm, 85ppm, 90ppm, 100ppm, 112ppm, or 118ppm, based on the total weight of the ultra-white amorphous aluminum silicon oxide material.
In addition, experiments in the application prove that the Se and the Nd are 2 O 3 、Co 2 O 3 The content of (A) satisfies the requirement of formula 1, the light transmittance can be more than 92.0%, and the chromaticity coordinates can be moved to the direction of a white point (origin point of 0, 0) according to the a and b values of a uniform chromaticity space standard:
0.3≤Co 2 O 3 /(Se+Nd 2 O 3 ) Formula 1 is less than or equal to 1.
In certain embodiments of the present application, the parameter value of formula 1 is 0.375, 0.55, 0.6, 0.62, 0.7, or 1.0.
In certain embodiments, the ultra-white amorphous aluminosilicate material described herein has a thickness of 0.8 to 4mm, and may particularly be an aluminosilicate inorganic oxide glass material, such as a high alumina glass material.
In some embodiments of the present application, the ultra-white amorphous aluminum-silicon oxide material is soaked in pure potassium nitrate (or 99% potassium nitrate +1% sodium nitrate) molten salt at 430 ℃ for 150min, wherein the surface stress CS is greater than or equal to 800MPa, and the stress layer depth DOL is greater than or equal to 43 μm. In other embodiments, the ultra-white amorphous aluminum silicon oxide material is shifted to the "white point" and "0,0" according to the a and b values of the uniform chromaticity space standard of ICE (international light emitting illumination commission) 1976, specifically, the thickness of the reference material is 1.10mm, and the a and b values are in the control region constructed by the elliptic equation "(b-0.14) 2/0.0016+ (a + 0.012) 2/0.000324=2" at the reference thickness, while other comparison materials are outside the control region, which shows that the chromaticity of the material is whiter, and the light transmittance higher than 92% is better than that of each comparison material.
In a second aspect of the present application, there is provided a method for preparing the ultra-white amorphous aluminum silicon oxide material, comprising:
taking various raw materials according to the composition of the ultra-white amorphous aluminum silicon oxide material, adding sulfate and nitrate, mixing to obtain a mixture, melting, molding, annealing and slicing the mixture to prepare the ultra-white amorphous aluminum silicon oxide material, wherein the process flow chart is shown in figure 1.
The mixing device comprises a weighing machine, a conveying belt, a furnace, a heating and water adding mixer, a furnace and a heating and melting furnace, wherein the mixing is to convey various raw materials to the weighing machine through the conveying belt, the weighing machine is used for weighing the raw materials and then putting the raw materials into the mixer for heating and water adding mixing, and the conveying belt is used for conveying the raw materials to the furnace for heating and melting after the mixed materials reach preset requirements. Heating natural gas for combustion in a kiln to melt the raw materials and form a feed liquid; after being discharged and clarified, the feed liquid flows into a tin bath from a kiln and is drawn into an amorphous aluminum silicon oxide material plate with a preset thickness by an edge roller. The amorphous aluminum silicon oxide material plate is discharged from the tin bath and then enters an annealing kiln for annealing treatment, and after internal stress is eliminated, the amorphous aluminum silicon oxide material plate is discharged from the annealing kiln and enters a cold end for slicing, subpackaging and packaging; the amorphous aluminum silicon oxide material can specifically belong to a low alkaline earth alkali aluminosilicate glass material, such as a low alkaline earth high alumina glass material.
In certain embodiments herein, the sulfate comprises sodium and/or potassium sulfate and the nitrate comprises sodium and/or potassium nitrate, which is converted to a volatile gas and corresponding K during melting of the materials herein 2 O and Na 2 O, does not influence the composition of the material; in some other embodiments herein, the sulfate is added in an amount of 0.4 to 1.6kg, such as 0.40kg, 0.55kg, 0.72kg, 0.92kg, 1.22kg or 1.52kg per 100kg of mix, and the nitrate is added in an amount of 2.0 to 4.0kg, such as 2.0kg, 2.6kg, 2.9kg, 3.6kg or 4.0kg per 100kg of mix.
In certain embodiments of the present application, the residual oxygen content is maintained by controlling the atmosphere during melting of the material, particularly near the end (exit side) of the furnaceMore than 2 percent, namely keeping oxidizing atmosphere to ensure that Fe in the material 3+ The occupation ratio is higher than that of Fe 2+ The color of the material can be lighter.
In the preparation method, oxidizing raw materials such as nitrate, sulfate and the like are added to improve the redox index of the mixture, so that Fe in the material is enabled to be contained in the material in the melting process 3+ The occupation ratio is higher than that of Fe 2+ Thereby realizing the function of chemical decoloration; sulfates and nitrates have not only an oxidizing action but also other positive or negative effects on the melting of the material, so that the amounts of both have respective upper limits in the material. For example, sulfates are fining agents, and in proper amounts they function to eliminate bubbles in the glass, but in excessive amounts they cause on the one hand an increase in bubbles and on the other hand a corrosive effect on the furnace refractory, and are generally used in amounts of 0.4% to 1.6% in the batch. Nitrate is typically used in an amount of 2.0% to 4.0% of the mix. The sulfate and nitrate are preferably used in a combined amount such that the redox index of the mixed material is adjusted to +25 or more, for example, +25.7, +25.9, +26.8, +27.4, +27.9, etc.
In the preparation method, selenium and/or neodymium oxide is used for counteracting Fe 2+ Ion colour, counteracting Fe by cobalt oxide 3+ Ion color. However, physical decolorants reduce the "brightness" of the glass, i.e., reduce the light transmittance of the glass, while removing the original color of the material, and thus it is necessary to control the amount of the "neutralized" primary color elements and the amount of the physical decolorant added. The iron content (calculated by ferric oxide) in the material is controlled to be less than 120ppm, the added selenium powder is controlled to be 0.8-1.5ppm, the added neodymium oxide is controlled to be 0.5-1.0ppm, the added cobalt oxide is controlled to be 0.3-0.9ppm, and the requirement of the formula 1 is met, so that the light transmittance of the glass can be kept to be more than 92.0 percent, and the purpose of basically offsetting Fe 2+ And Fe 3+ Yellow and green color in the glass.
In a third aspect of the present application, based on the excellent properties of the ultra-white amorphous aluminum silicon oxide material of the present application, the application of the ultra-white amorphous aluminum silicon oxide material or the ultra-white amorphous aluminum silicon oxide material prepared by the preparation method in the preparation of a metal plated product is provided.
In a fourth aspect of the present application, a metal-plated article is provided, which comprises the ultra-white amorphous aluminum-silicon oxide material described in the present application or the ultra-white amorphous aluminum-silicon oxide material prepared by the preparation method described in the present application, and a metal film with one or more than two layers plated on the surface thereof. The amorphous aluminum-silicon oxide material is used as a material, and a metal material is adopted for plating, so that various application purposes such as privacy, sun shading, heat insulation and the like are realized on the basis of excellent performance.
In certain embodiments of the present application, the metal film includes one or more of a Cr film, a Ni film, a Ti film, an Au film, an Ag film, a Cu film, an Al film; the Cr film, the Ni film and the Ti film have better adhesion performance with the amorphous aluminum-silicon oxide material, but the infrared reflectivity is inferior to that of the Au film, the Ag film, the Cu film and the Al film, so in other embodiments of the invention, the amorphous aluminum-silicon oxide material can be plated with one or more than two Cr films, ni films or Ti films, and then plated with one or more than two Au films, ag films, cu films or Al films, thereby realizing better adhesion and heat insulation;
in certain embodiments of the present application, the Cr, ni, or Ti film has a thickness of 1 to 10nm, such as 1nm, 2nm, 3nm, 4nm, 5nm, 6nm, 7nm, 8nm, 9nm, or 10nm, and the Au, ag, cu, or Al film has a thickness of 20 to 50nm, such as 20nm, 25nm, 30nm, 35nm, 40nm, 45nm, or 50nm; in other embodiments of the present application, the amorphous aluminum silicon oxide material is coated with a Ti film having a thickness of 5nm and then with a Cu film having a thickness of 30nm.
In certain embodiments of the present application, the metal film is plated by a chemical vapor deposition method, a vacuum evaporation method, a sputtering method, or an ion implantation method. In other embodiments of the present application, the metal film is plated by magnetron sputtering.
In certain embodiments of the present application, the magnetron sputtering process has a sputtering power of 1.5 to 10kW and a sputtering rate of 1.5 to 5.0nm/s; in other embodiments of the present application, the first Cr film, ni film, or Ti film is plated at a sputtering power of 1.5 to 1.7kW and a sputtering rate of 1.5 to 2.0nm/s; when the second Au film, ag film, cu film or Al film is plated, the sputtering power is 5-10kW, and the sputtering rate is 3.0-5.0nm/s.
In the comparative experiments provided in the present application, unless otherwise specified, the experimental conditions, materials, etc. were kept consistent for comparability, except for the differences indicated in the groups. The test materials and reagents used in the examples are commercially available without specific reference.
The ultra-white amorphous aluminum-silicon oxide material and the metal coating product thereof provided by the present application are further described below.
Examples 1 to 6:
1. preparation method
Taking various raw materials according to the composition of the ultra-white amorphous aluminum silicon oxide material, adding sulfate and nitrate, mixing to obtain a mixture, melting the mixture, forming, annealing and slicing to prepare the ultra-white amorphous aluminum silicon oxide glass material, wherein the preparation process flow is shown in figure 1.
2. Formulation and performance index testing thereof
(1) Method for testing chromaticity coordinate and light transmittance
(1) The thickness of the glass material to be measured is accurately measured and is recorded as d, and the unit is mm.
(2) And testing the full-wave-band light transmittance of the glass material under 190nm-900nm by using a spectrophotometer.
Wherein the light transmittance at 550nm was recorded as the light transmittance "T%" of the glass material.
(3) And (3) obtaining chromaticity coordinate values a and b under the original thickness of the glass material after processing by using color analysis software Coloranalysis of an instrument.
(4) And converting the values of a and b under the original thickness into the values of a and b under the reference thickness of 1.10mm by the following formula:
a*=a÷d×1.10；b*=b÷d×1.10
in the formula: a. b-measured chromaticity coordinate values a, b under the original thickness;
d-actual thickness of glass (mm);
(2) Formulation and test results
TABLE 1
Filling the values a and b into a coordinate graph which is drawn with a chromaticity control area in advance, and referring to fig. 2;
as can be seen from table 1 and fig. 2, the ultra-white amorphous aluminosilicate glass material prepared according to the present application has a transmittance of 92% or more, and a and b values moving in the directions of "white point" and "0,0", and are visually whiter in the control region constructed by the ellipse equation "(b-0.14) × 2/0.0016+ (a + 0.012) × 2/0.000324 =2".
Comparative examples 1 to 6:
referring to the preparation method and the detection method of the example, the preparation and the performance index mapping were performed according to table 2 below;
TABLE 2
Filling the values a and b into a coordinate graph which is drawn with a chromaticity control area in advance, and referring to fig. 3;
as can be seen from table 2 and fig. 3, the transmittance of the comparative amorphous alumino-silica glass material did not reach 92%, and both values of a and b were not in the control region constructed by the elliptic equation "(b-0.14) × 2/0.0016+ (a + 0.012) × 2/0.000324=2", and the chromaticity and transmittance were inferior to those of the examples of the present application.
Example 7:
baking the ultra-white amorphous aluminum silicon oxide glass material at 90 ℃ for 15min before plating a metal film, and then cleaning by using plasma;
putting the ultra-white amorphous aluminum-silicon oxide glass material into a magnetron sputtering coating device for coating, and setting the linear speed of a machine: 50 +/-5 mm/sec, vacuum degree less than 8.0X 10 -6 Pa, using inert gas as working gas, such as argon, krypton, xenon and the like, and the gas flow is 100 +/-10 sccm; firstly, plating a first layer of Ti metal film by using a metal Ti target, wherein the sputtering power is 1.5kW, the sputtering rate is 1.8nm/s, and the thickness of the obtained first layer of Ti metal film is 5nm; then, the product is processedPlating a second layer of Cu metal film by using a metal Cu target, wherein the sputtering power is 7.5kW, the sputtering rate is 4nm/s, and the thickness of the obtained second layer of Cu metal film is 30nm; obtaining the ultra-white amorphous aluminum silicon oxide glass material plated by the double-layer metal material.
The previous description is only an example of the present application, and is provided to enable any person skilled in the art to understand or implement the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. An ultra-white amorphous Al-Si oxide material is characterized by comprising inorganic oxide, se and/or Nd 2 O 3 And Co 2 O 3 (ii) a The Se and/or Nd 2 O 3 0.5-1.5ppm of Co based on the total weight of the ultra-white amorphous aluminum-silicon oxide material 2 O 3 0.3-0.9ppm of the total weight of the ultra-white amorphous aluminum-silicon oxide material, wherein the inorganic oxide comprises the following components in percentage by weight:
SiO 2 58wt%-62wt%
Al 2 O 3 13%wt-15wt%
Na 2 O 13%wt-16wt%
K 2 O 4wt%-7wt%
MgO 3wt%-4.9wt%
ZrO 2 0.5wt%-1.2wt%
wherein the iron content in the inorganic oxide is less than 120ppm of the total weight of the ultra-white amorphous aluminum silicon oxide material.
2. The ultra-white amorphous silicon-aluminum oxide material according to claim 1, wherein the Se, nd 2 O 3 、Co 2 O 3 The content of (A) satisfies the requirement of formula 1:
0.3≤Co 2 O 3 /(Se+Nd 2 O 3 ) Formula 1 is less than or equal to 1.
3. The method for preparing the ultra-white amorphous silicon aluminum oxide material of claim 1, which comprises the following steps:
taking various raw materials according to the composition of the ultra-white amorphous aluminum-silicon oxide material, adding sulfate and/or nitrate, mixing to obtain a mixture, melting the mixture, molding, annealing, and slicing to prepare the ultra-white amorphous aluminum-silicon oxide material.
4. The method according to claim 3, wherein the sulfate comprises sodium sulfate and/or potassium sulfate, and the nitrate comprises sodium nitrate and/or potassium nitrate.
5. The method according to claim 3 or 4, wherein the sulphate is added in an amount of 0.4-1.6kg per 100kg of mix, and the nitrate is added in an amount of 2.0-4.0kg per 100kg of mix.
6. The method according to claim 3, wherein a residual oxygen amount of more than 2% is maintained on the side of the discharge port.
7. Use of the ultra-white amorphous aluminium silicon oxide material according to any one of claims 1 to 2 or the ultra-white amorphous aluminium silicon oxide material prepared by the preparation method according to any one of claims 3 to 6 for preparing a metal-coated article.
8. A metal-plated article comprising the ultra-white amorphous aluminum silicon oxide material according to any one of claims 1 to 2 or the ultra-white amorphous aluminum silicon oxide material produced by the production method according to any one of claims 3 to 6, and one or more metal films plated on the surfaces thereof.
9. The metal-plated article according to claim 8, wherein the metal film comprises one or more of a Cr film, a Ni film, a Ti film, an Au film, an Ag film, a Cu film, and an Al film.
10. The metal-coated article according to claim 8 or 9, wherein the metal film is coated by a chemical vapor deposition method, a vacuum evaporation method, a sputtering method, or an ion implantation method.
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5681782A (en) * | 1996-02-28 | 1997-10-28 | Corning Incorporated | Light pink glassware |
| WO2017185288A1 (en) * | 2016-04-28 | 2017-11-02 | 中国南玻集团股份有限公司 | Aluminosilicate glass and preparation method therefor, and glass plate |
| CN108821566A (en) * | 2016-04-28 | 2018-11-16 | 中国南玻集团股份有限公司 | Alumina silicate glass, preparation method and application |
| US20200002216A1 (en) * | 2018-06-27 | 2020-01-02 | Vitro Flat Glass Llc | High Alumina Low Soda Glass Compositions |
| CN111559875A (en) * | 2020-06-19 | 2020-08-21 | 广东旗滨节能玻璃有限公司 | Coated glass and preparation method thereof |
| EP3872042A1 (en) * | 2020-02-28 | 2021-09-01 | Schott AG | Cooking surface made of a las glass ceramic plate |
| CN115140949A (en) * | 2022-06-29 | 2022-10-04 | 天津旗滨节能玻璃有限公司 | Low-reflectivity LOW-transmittance LOW-E coated glass and manufacturing method thereof |
-
2023
- 2023-02-13 CN CN202310436524.4A patent/CN116693191A/en active Pending
- 2023-02-13 CN CN202310101929.2A patent/CN115925252B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5681782A (en) * | 1996-02-28 | 1997-10-28 | Corning Incorporated | Light pink glassware |
| WO2017185288A1 (en) * | 2016-04-28 | 2017-11-02 | 中国南玻集团股份有限公司 | Aluminosilicate glass and preparation method therefor, and glass plate |
| CN108821566A (en) * | 2016-04-28 | 2018-11-16 | 中国南玻集团股份有限公司 | Alumina silicate glass, preparation method and application |
| US20200002216A1 (en) * | 2018-06-27 | 2020-01-02 | Vitro Flat Glass Llc | High Alumina Low Soda Glass Compositions |
| EP3872042A1 (en) * | 2020-02-28 | 2021-09-01 | Schott AG | Cooking surface made of a las glass ceramic plate |
| CN111559875A (en) * | 2020-06-19 | 2020-08-21 | 广东旗滨节能玻璃有限公司 | Coated glass and preparation method thereof |
| CN115140949A (en) * | 2022-06-29 | 2022-10-04 | 天津旗滨节能玻璃有限公司 | Low-reflectivity LOW-transmittance LOW-E coated glass and manufacturing method thereof |
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