CN115903136A - Method and device for adaptively generating multi-template optical waveguide layout and storage medium - Google Patents
Method and device for adaptively generating multi-template optical waveguide layout and storage medium Download PDFInfo
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- CN115903136A CN115903136A CN202310031939.3A CN202310031939A CN115903136A CN 115903136 A CN115903136 A CN 115903136A CN 202310031939 A CN202310031939 A CN 202310031939A CN 115903136 A CN115903136 A CN 115903136A
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Abstract
The invention discloses a method and a device for adaptively generating a layout of a multi-template optical waveguide and a storage medium. The method comprises the following steps: setting various types of optical waveguide etching templates and technological parameters, and setting a central line point chain for specifying a transmission path and a direction of light of an optical waveguide; and automatically generating an optical waveguide pattern consisting of the plurality of etching templates based on the set plurality of types of optical waveguide etching templates and the process parameters and the central line point chain.
Description
Technical Field
The invention relates to the field of silicon-based photoelectron and EDA design tools, in particular to a method for adaptively generating a layout of a multi-template optical waveguide.
Background
In the silicon optical layout design, optical devices at different positions need to be connected through an optical waveguide (waveguide) to transmit optical signals, however, the existing optical waveguide generation method can only generate a single template mode rapidly, and the optical waveguide in the single template mode generally has the problems of unreasonable layout space size and large optical signal loss. If an optical waveguide composed of multiple templates needs to be generated to solve the above problem, complicated steps are needed to generate the optical waveguide, for example, corresponding bent portions (Bend), adapters (Transition, taper), etc. need to be manually generated and placed, and when a user needs to modify a template, the optical waveguide composed of multiple etching templates needs to be regenerated through complicated steps such as calculation, etc.
Disclosure of Invention
The present invention has been made in view of the above problems, and an object of the present invention is to provide a method and an apparatus for generating an adaptive optical waveguide layout, which can improve the generation efficiency of a silicon optical layout.
One mode of the invention is to provide a method for adaptively generating a layout of a multi-template optical waveguide, which comprises the following steps: setting a plurality of types of optical waveguide etching templates and process parameters, wherein the plurality of types of optical waveguide etching modules comprise an optical waveguide starting part template, an optical waveguide straight part template, an optical waveguide bending part template and an optical waveguide ending part template, and the process parameters of each optical waveguide etching module comprise; layer information, ridge width, platform width,
setting a central line point chain of the multi-template optical waveguide for restraining the optical transmission path and direction of the optical waveguide;
and automatically generating a multi-template optical waveguide pattern consisting of a plurality of etching templates based on the set plurality of types of optical waveguide etching templates and process parameters and the central line point chain.
Preferably, the process parameters of the optical waveguide bending part template further comprise bending type and bending radius.
Preferably, the optical waveguide starting part template and the optical waveguide ending part template are obtained from attribute parameters of port templates of adjacent silicon photonic devices linking the multi-template optical waveguide.
Preferably, the method further comprises the following steps: and regenerating an optimized multi-template optical waveguide pattern by modifying at least one of the layer, the width, the curve type, the minimum bending radius and the central line point chain of each optical waveguide etching module.
Another aspect of the present invention provides an apparatus for adaptively generating a layout of a multi-template optical waveguide, including: the template setting module is used for setting various optical waveguide etching templates and process parameters, wherein the various optical waveguide etching modules comprise an optical waveguide starting part template, an optical waveguide straight line part template, an optical waveguide bending part template and an optical waveguide ending part template, and the process parameters of the optical waveguide etching modules comprise; layer information, ridge width, platform width,
a central line point chain setting module which sets a central line point chain for specifying the optical transmission path and direction of the multi-template optical waveguide;
and the self-adaptive multi-template optical waveguide generation module automatically generates a multi-template optical waveguide pattern consisting of a plurality of etching templates on the basis of the set optical waveguide etching templates and process parameters and the central line point chain.
The invention also provides a computer readable storage medium, which stores computer instructions, and is characterized in that the computer instructions, when executed by a processor, execute the method for adaptively generating the multi-template optical waveguide layout.
ADVANTAGEOUS EFFECTS OF INVENTION
According to the invention, the components such as various bending parts (Bend), adapters (Transition, taper) and the like of the optical waveguide required for realizing various optical transmission characteristics between the optical devices can be automatically generated, thereby accurately generating the optical waveguide required by a user.
The invention can greatly save the workload of generating the optical waveguide in the silicon optical layout, eliminates a large number of complicated intermediate generation processes, and can greatly improve the generation efficiency of the silicon optical layout by a self-adaptive optical waveguide layout generation method.
Drawings
FIG. 1 is a flow chart of a method of adaptively generating a multi-template optical waveguide according to an embodiment of the present invention.
FIG. 2 is a schematic illustration of a multi-template optical waveguide produced in accordance with an embodiment of the present invention.
Fig. 3 is a parameter setting interface according to an embodiment of the present invention.
Fig. 4 (a) - (d) are schematic diagrams of modifying information of layers, widths, etc. of each optical waveguide etching template according to an embodiment of the present invention.
Fig. 5 and 6 are schematic diagrams of modification of the bending type and the bending minimum radius of each optical waveguide etching template according to the embodiment of the invention.
FIG. 7 is a schematic diagram of a centerline point chain of an optical waveguide generated according to a modification of an embodiment of the present invention.
Fig. 8 is a schematic diagram of functional blocks of a processor of an apparatus for adaptively generating a layout of a multi-template optical waveguide according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present application will be described clearly below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some, but not all, embodiments of the present application. All other embodiments that can be derived by one of ordinary skill in the art from the embodiments given herein are intended to be within the scope of the present disclosure.
The terms first, second and the like in the description and in the claims of the present application are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged under appropriate circumstances such that embodiments of the application may be practiced in sequences other than those illustrated or described herein, and that the terms "first," "second," and the like are generally used herein in a generic sense and do not limit the number of terms, e.g., the first term can be one or more than one. In addition, "and/or" in the specification and claims means at least one of connected objects, a character "/" generally means that a preceding and succeeding related objects are in an "or" relationship.
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. The present invention may, however, be embodied in different forms and should not be construed as limited to the embodiments set forth herein.
Optical waveguides are key elements in all photonic integrated circuits and have a very important position in the fields of optical communication, optical sensing and the like. Optical waveguides formed from multiple etched templates are commonly used for optical signal transmission between silicon photonic devices. The invention relates to a technology for quickly generating optical waveguides composed of a plurality of templates among optical devices at different positions in silicon optical layout design.
Fig. 1 is a flow chart of a method for adaptively generating a multi-template optical waveguide in a silicon optical layout design according to an embodiment of the present invention.
The method for adaptively creating a multi-template optical waveguide according to the present invention will be described in detail with reference to fig. 1.
As shown in fig. 1, the method for adaptively generating a multi-template optical waveguide according to an embodiment of the present invention includes the following steps:
and S01, setting the type and the technological parameters of the etching template for generating the multi-template optical waveguide.
The etching template type set by the invention for generating the multi-template optical waveguide comprises the following steps: a light guide starting part template (start _ temp), a light guide straight part template (wg _ temp), a light guide bent part template (bend _ temp), and a light guide ending part template (end _ temp).
The etching templates of the four optical waveguides comprise the following process parameters: layer information, ridge width (core _ width), and land width (clad _ width). The optical waveguide starting portion template (start _ temp) and the optical waveguide ending portion template (end _ temp) may be selected from a pre-stored lithography template library, or may be obtained from attribute parameters of port templates of adjacent silicon photonic devices linking optical waveguides, or obtained from a remote module, such as a server placed on a cloud.
In addition to the above-described process parameters, for the optical waveguide bending portion template (bend _ temp), it is necessary to provide process parameters such as a bending type (circular arc, euler arc, hybrid euler arc, and custom arc CustermBend), a bending radius (radius), and the like.
The optical waveguide straight-line part template (wg _ temp) and the optical waveguide curved-part template (bend _ temp) can be selected from a prestored photoetching template library, can be configured by a user based on the input of a parameter setting interface, or can be acquired from a remote module, such as a server placed on a cloud terminal.
S02, a central line point chain (point chain before bending is not completed) of the multi-template optical waveguide for restricting the optical transmission path, direction, and the like of the optical waveguide is set.
As shown in fig. 2, the coordinates [ (0,0), (50,0), (50,50), (0,50), (0,100), (50,100) ] are used to characterize a centerline point chain of an optical waveguide that is used to guide the growth path of the generated multi-template optical waveguide to determine the final transmission path and direction of the optical signal.
And S03, importing the type and the process parameters of the etching template based on the optical waveguide set in the step S01 and the central line point chain of the optical waveguide set in the step S02 into a self-adaptive multi-template optical waveguide layout generation program, and automatically generating a multi-template optical waveguide pattern consisting of multiple types of etching templates.
The following describes a process of adaptively generating a multi-template optical waveguide according to the present invention by using a specific example, but the embodiments of the present invention are not limited to the following process, and some steps may be modified.
(1) Setting various types of optical waveguide etching templates and technological parameters,
fig. 3 is a parameter setting interface according to the present invention, and a user can set corresponding parameters of the present invention through a mouse, a touch template, and the like.
The specific setting of the multi-type optical waveguide etching template and the technological parameters are as follows:
the optical waveguide start portion template start _ temp = PhFEWGTp (CORE _ layer = FEWG _ CORE, CORE _ width =0.38,
clad_layer＝FEWG_CLAD,clad_width＝3.78)
the optical waveguide end portion template end _ temp = PhSEWGTp (CORE _ layer = SEWG _ CORE, CORE _ width =0.65,
clad_layer＝SEWG_CLAD,clad_width＝4.65)
the light guide straight-line portion template wg _ temp = PhMEWGTp (CORE _ layer = MEWG _ CORE, CORE _ width =0.38,
clad_layer＝MEWG_CLAD,clad_width＝8.88)
the optical waveguide bending part template band _ temp = PhFEWGBendtp (CORE _ layer = FEWG _ CORE, CORE _ width =0.38, clad _layer = FEWG _CLAD, clad _ width =3.78, band _ type = CircleBend, radius =5
.0)
(2) A center line point chain (point chain before incomplete bending) of a multi-template optical waveguide for restricting an optical transmission path, direction, and the like of the optical waveguide is set.
Referring to fig. 2, the center line point chain center _ line = [ (0,0), (50,0), (50,50), (0,50), (0,100), (50,100) ]of the optical waveguide specifically provided by the present invention
(3) And (3) introducing the type and the process parameters of the etching template based on the optical waveguide set in the step (S01) and the central line point chain of the optical waveguide set in the step (S02) into a self-adaptive multi-template optical waveguide layout generation program, and automatically generating a multi-template optical waveguide graph consisting of multiple types of etching templates, as shown in FIG. 2.
In the preferred embodiment of the present invention, in order to meet the design requirements of users, such as reasonably planning layout dimensions, adjusting the propagation direction of light, loss, and the like, the generated multi-template optical waveguide may be optimally adjusted.
In a specific embodiment of the invention, the layout size is adjusted and the light propagation loss is reduced by modifying information such as the layer and the width of each template.
In a specific embodiment, in fig. 4 (a) of the present invention, the layers and widths of the templates of the portions of the generated multi-template optical waveguide are the same;
in fig. 4 (b) of the present invention, the pattern layer and the width of the linear portion of the generated multi-template optical waveguide are different from those of the other portion of the template;
in fig. 4 (c), the patterns and widths of the starting portion template and the ending portion template of the multi-template optical waveguide are different from those of the other portion templates;
in fig. 4 (d) of the present invention, the pattern and width of the curved portion template of the multi-template optical waveguide are different from those of the other portion templates.
In a specific embodiment of the present invention, the present invention can also reduce the propagation loss of light at the bend by modifying the type of bend, the minimum radius of the bend, etc.,
referring to fig. 5, to further reduce the propagation loss of light at bends, the present invention modifies the resulting optical waveguide to a hybrid euler arc, bend minimum radius of 15.0.
In another embodiment of the present invention, the present invention can also adjust the etching process of each template of the multi-template optical waveguide to further increase the constraint on optical signals and reduce the bending loss. The etching process of each template of the multi-template optical waveguide can be set to be deep etching, shallow etching or medium etching respectively through user input.
Referring to fig. 6, for the multi-mode optical waveguide produced in fig. 5, the etching process of the curved template is simultaneously modified to a medium etch on the basis of setting the curved portion template to a hybrid euler arc with a minimum radius of curvature of 15.0.
In another embodiment of the present invention, the present invention can also adjust the centerline point chain in order to change the propagation path, direction, etc. of the light.
As shown in fig. 7, the present invention further adjusts the centerline point chain of the multi-template optical waveguide generated in fig. 2 to [ (0,0), (50,0), (50,50), (100,50), (100 ) ], and the adjusted multi-template optical waveguide is shown in the right-side diagram line of fig. 7, and it can be seen that the propagation path and direction of the light of the generated multi-template optical waveguide are changed by adjusting the centerline point chain of the multi-template optical waveguide.
According to the method for generating the multi-template optical waveguide in the silicon optical layout design in a self-adaptive mode, the following technical effects can be achieved:
(1) An optical waveguide layout composed of a plurality of etching templates can be conveniently and rapidly and automatically generated. And the gradually narrowing, straight line transmission, bending and other components in the optical waveguide can be automatically generated according to the optical transmission characteristics and the waveguide design parameters.
(2) When the information such as the bending radius, the bending type and the like of the corresponding etching template of the generated multi-template optical waveguide is changed, the corresponding optical waveguide layout can be quickly and simply regenerated according to the optical transmission requirement.
(3) The required connecting optical waveguide layout can be conveniently generated between the silicon optical devices, and the design efficiency of the silicon optical layout is greatly improved.
The invention also provides a layout generating device of the self-adaptive multi-template optical waveguide. The layout generating apparatus for the adaptive multi-template optical waveguide according to the present invention is not particularly limited in structure, and the apparatus may be realized by a general computer or computer system having an input device, a display device, an external I/F, a communication I/F, a processor, and a memory. These hardware components are connected to each other so as to be able to communicate via a bus.
The processor is a CPU in the computer or a processing component such as a special CPU, a DSP and the like. The Memory device includes a computer-readable storage medium, such as a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk.
As the input device, a keyboard, a mouse, a joystick, a touch panel, and the like are exemplified,
the memory is stored with a program running on the processor, and the processor executes the method for adaptively generating the multi-template optical waveguide when running the program.
In an embodiment, as shown in fig. 8, the layout generating apparatus for adaptively generating a multi-template optical waveguide according to the present invention specifically includes a processing unit, where the processing unit includes: the device comprises a template setting module 101, a central line point chain setting module 102 and an adaptive optical waveguide generation module 103. Wherein:
the template setting module 101 is used for setting various types of optical waveguide etching templates and process parameters, and the various types of optical waveguide etching templates set by the invention specifically comprise: a light guide starting part template (start _ temp), a light guide straight part template (wg _ temp), a light guide bent part template (bend _ temp), and a light guide ending part template (end _ temp).
The four optical waveguide templates all comprise the following process parameters: layer information, ridge width (core _ width), and land width (clad _ width). In addition to the above process parameters, the optical waveguide bending portion template (bend _ temp) needs to provide process parameters of bending type (circular arc, euler arc, hybrid euler arc, and custom arc CustermBend, etc.), bending radius (radius), etc.
A center line point chain setting module 102 for setting a center line point chain of each optical waveguide etching template for specifying a transmission path, a direction, and the like of light of an optical waveguide;
and the self-adaptive optical waveguide generation module 103 is used for automatically generating a multi-template optical waveguide pattern consisting of multiple etching templates based on the set information of the multiple types of optical waveguide etching templates and the central line point chain of each optical waveguide etching template.
Preferably, the layout generating apparatus for adaptively generating a multi-template optical waveguide according to the present invention further includes an adjusting module 104, which modifies at least one of process references, such as a layer, a width, a bending type, a minimum bending radius, a center line point chain, and the like, of a corresponding optical waveguide etching template according to a design requirement of a user (for example, adjusting a layout size, reducing a light propagation loss, and the like), so as to regenerate an optimized optical waveguide pattern.
Preferably, the invention can also adjust the etching process of each etching template of the multi-template optical waveguide so as to further increase the constraint on optical signals and reduce the bending loss. The etching process of each template of the multi-template optical waveguide can be set to be deep etching, shallow etching or medium etching respectively through user input. The adjustment of the etching process is not limited to the setting mode, and other process parameters of the etching template are adjusted according to the optical signal transmission requirement.
The present invention further provides a readable storage medium, where a program or an instruction is stored, and when the program or the instruction is executed by a processor, the program or the instruction implements each process of the method for adaptively generating a multi-template optical waveguide, and can achieve the same technical effect, and in order to avoid repetition, details are not repeated here.
While the present embodiments have been described with reference to the accompanying drawings, it is to be understood that the invention is not limited to the precise embodiments described above, which are meant to be illustrative and not restrictive, and that various changes may be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (9)
1. A method for adaptively generating a layout of a multi-template optical waveguide is characterized by comprising the following steps:
setting a plurality of types of optical waveguide etching templates and process parameters, wherein the plurality of types of optical waveguide etching modules comprise an optical waveguide starting part template, an optical waveguide straight line part template, an optical waveguide bending part template and an optical waveguide ending part template, and the process parameters of each optical waveguide etching module comprise; layer information, ridge width, platform width,
setting a central line point chain of the multi-template optical waveguide for restraining an optical transmission path and an optical transmission direction;
and automatically generating an optical waveguide pattern consisting of the plurality of etching templates based on the set plurality of types of optical waveguide etching templates and the process parameters and the central line point chain.
2. The method for adaptively generating a layout of a multi-template optical waveguide according to claim 1,
the technological parameters of the optical waveguide bending part template also comprise bending type and bending radius.
3. The method for adaptively generating a layout of a multi-template optical waveguide according to claim 1,
and the optical waveguide starting part template and the optical waveguide ending part template are obtained from the attribute parameters of the port templates of the adjacent silicon photonic devices which link the multi-template optical waveguide.
4. The method for adaptively generating a layout for a multi-template optical waveguide according to any of claims 1-3, further comprising:
and regenerating an optimized optical waveguide pattern by modifying at least one of a layer, a width, a curve type, a minimum radius of curvature and a centerline point chain of an etching template of the multi-template optical waveguide.
5. An apparatus for adaptively generating a layout of a multi-template optical waveguide, comprising:
the template setting module is used for setting various optical waveguide etching templates and technological parameters, wherein the various optical waveguide etching modules comprise an optical waveguide starting part template, an optical waveguide straight line part template, an optical waveguide bending part template and an optical waveguide ending part template, and the technological parameters of the optical waveguide etching modules comprise; layer information, ridge width, platform width,
a center line point chain setting module which sets a center line point chain for specifying an optical transmission path and a direction of the multi-template optical waveguide;
and the self-adaptive multi-template optical waveguide generation module automatically generates a multi-template optical waveguide pattern consisting of a plurality of etching templates based on the set plurality of types of optical waveguide etching templates and process parameters and the central line point chain.
6. The apparatus for adaptively generating a layout of a multi-template optical waveguide according to claim 5,
the technological parameters of the optical waveguide bending part template also comprise bending type and bending radius.
7. The apparatus for adaptively generating a layout of a multi-template optical waveguide according to claim 5,
and the optical waveguide starting part template and the optical waveguide ending part template are obtained from the attribute parameters of the port templates of the adjacent silicon photonic devices which link the multi-template optical waveguide.
8. The apparatus for adaptively generating a layout of a multi-template optical waveguide according to any one of claims 5 to 7, further comprising:
and the adjusting module is used for regenerating an optimized multi-template optical waveguide graph by modifying at least one of a layer, a width, a curve type, a minimum bending radius and a central line point chain of the etching module of the multi-template optical waveguide.
9. A computer-readable storage medium having stored thereon computer instructions, which when executed by a processor, perform the method for adaptively generating a layout of a multi-template optical waveguide according to any one of claims 1 to 4.
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