CN115872404B - Metal intercalation two-dimensional compound and preparation method thereof - Google Patents
Metal intercalation two-dimensional compound and preparation method thereof Download PDFInfo
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Abstract
The invention belongs to the technical field of two-dimensional nano materials, and relates to a metal intercalation two-dimensional compound and a preparation method thereof. The molecular general formula of the metal intercalation two-dimensional compound is M (n+1)m I m‑1 X nm T x M is selected from any one or more than two of III B, IV B, V B, VI B and VII B elements, I is an intercalation element, X is carbon or/and nitrogen element, and T is a surface end group; wherein n is any number of 1 to 3, x is any number of 1 to 3, and m is any number of 2 to 20. The metal intercalation two-dimensional compound has the stable structural characteristics of MAX phase materials and the rich surface chemical characteristics of MXene, and has great application prospect in the fields of energy storage, catalysis and the like.
Description
Technical Field
The invention belongs to the technical field of two-dimensional nano materials, and relates to a metal intercalation two-dimensional compound and a preparation method thereof.
Background
Since 2004 graphene was found, great attention has been paid to other two-dimensional materials by material researchers. Other two-dimensional materials with excellent performance are also developed successively, such as hexagonal boron nitride (h-BN), transition Metal Sulfides (TMDs), black Phosphorus (BP), two-dimensional transition metal carbonitride (MXene) and the like, and have great application prospects in research fields of catalysis, energy storage, photoelectric devices, spintronics devices and the like. The MAX phase is a non-Van der Waals layered material with a hexagonal structure, and has the characteristics of metal and ceramic due to the unique element composition and structural characteristics, and has good thermal shock resistance, oxidation resistance and high electric conductivity and thermal conductivity of the metal. MXene is mainly obtained by selectively etching an A-site element of a non-Van der Waals layered MAX phase precursor material, and the chemical general formula of the MXene is expressed as M n+1 X n T x 。T x Representing the different surface groups that terminate at their surface during etching, which have a significant impact on the surface chemical and physicochemical properties of the MXene material. However, the presence of active transition metals and structural defects in the MXene material makes it susceptible to oxidation in unprotected environments (containing water, oxygen, etc.), resulting in poor stability. Therefore, if the two-dimensional structure with MAX phase structure characteristics and MXene surface end groups can be obtained, the defects of easy oxidation, unstable structure and the like of the MXene material can be effectively avoided, and the two-dimensional structure with excellent physical and chemical properties similar to MXene can be obtained. However, the synthesis of such two-dimensional compounds is currently facing significant challenges.
Disclosure of Invention
The invention aims to provide a metal intercalation two-dimensional compound and a preparation method thereof, aiming at the defects in the prior art.
One object of the invention is achieved by the following technical scheme:
a metal intercalation two-dimensional compound with a molecular general formula of M (n+1)m I m- 1 X nm T x M is selected from any one or more than two of III B, IV B, V B, VI B and VII B elements, I is an intercalation element, X is carbon or/and nitrogen element, and T is a surface end group; wherein n is any number of 1 to 3, x is any number of 1 to 3, and m is any number of 2 to 20.
Preferably, m is any number from 2 to 10.
In the metal intercalation two-dimensional compound, M is a front transition group metal element, including but not limited to any one or any combination of two or more of Ti, V, nb, mn, Y, zr, cr, mo, hf, ta, W.
Preferably, M is any one or a combination of two or more of Ti, nb and Ta.
In the above metal intercalation two-dimensional compound, I includes, but is not limited to, any one or any combination of two or more of Al, ga, ge, in, sn, bi, fe, co, ni, cu, zn, pd, ir, au, cd.
Preferably, I is any one or a combination of two or more of Al, ga, sn, fe, cu, zn, cd.
Preferably, X is C a N b Wherein the sum of a and b is any number from 1 to 3.
In the above-mentioned metal intercalation two-dimensional compound, T includes but is not limited to-Cl, -Br, -I-F, -O, -OH, -S, -Se-any one or any combination of two or more of Te, -P, -Sb.
Preferably, T is any one or a combination of two or more of-Cl, -Br, -I and-F.
Preferably, the metal intercalation two-dimensional compound is M (n+1)m X nm The structural units and the I atomic layers are alternately stacked, wherein M (n+1)m X nm The surface of the structural unit is connected with a surface end group T.
In the metal intercalation two-dimensional compound, the metal intercalation two-dimensional compound is a two-dimensional lamellar, the thickness of the two-dimensional lamellar is 1-50 nm, preferably 1-20 nm, further preferably 1-15 nm, 1-10 nm, 1-5 nm, 2-20 nm, 2-15 nm, 2-10 nm, 3-20 nm, 3-15 nm, 3-10 nm and the like.
Another object of the invention is achieved by the following technical solutions:
the preparation method of the metal intercalation two-dimensional compound comprises the following steps:
s1, etching: etching the MAX phase material through a Lewis acid molten salt method to obtain an MXene material;
s2, intercalation processing: mixing the obtained MXene material, metal 'scissors' element, intercalation element or compound containing intercalation element and inorganic salt, and reacting to obtain a once intercalation MAX phase material;
and S3, repeating the steps of etching treatment and intercalation treatment to obtain the metal intercalation two-dimensional compound.
In the preparation method of the metal intercalation two-dimensional compound, the Lewis acid molten salt method in the step S1 specifically comprises the following steps: and mixing the MAX phase material, the Lewis acid salt and the halide salt, reacting at 400-900 ℃, and then washing, suction filtering and drying to obtain the MXene material.
Lewis acid salts include, but are not limited to FeO, coO, niO, cuO, znO, feCl 2 、CoCl 2 、NiCl 2 、CuCl 2 、ZnCl 2 、CdCl 2 、FeBr 2 、CoBr 2 、NiBr 2 、ZnBr 2 、FeI 2 、CoI 2 、NiI 2 、CdI 2 、AgI、FeSO 4 、CoSO 4 、NiSO 4 、CdSO 4 Any one or any combination of two or more of them.
In the above-mentioned method for producing a metal intercalation two-dimensional compound, preferably, the molar ratio of the MXene material, the metal "scissor" element, the intercalation element or the compound containing the intercalation element, and the inorganic salt is 1: (0.5-3): (0.5-3): (5-50).
In the preparation method of the metal intercalation two-dimensional compound, the general formula of the MXene material is M n+1 X n T' y Wherein M element is the same as M element in the molecular general formula of the metal intercalation two-dimensional compound, X element is the same as X element in the molecular general formula of the metal intercalation two-dimensional compound, n is the same as n in the molecular general formula of the metal intercalation two-dimensional compound, T' is any one or any combination of more than two of-Cl, -Br, -I, -F, -O and OH, and y is any number of 1-3.
In the preparation method of the metal intercalation two-dimensional compound, the metal "scissors" element comprises any one or any combination of more than two of Li, na, K, mg, ca, al, ga, ge, in, sn but is not limited to.
In the preparation method of the metal intercalation two-dimensional compound, the intercalation elements comprise any one or any combination of more than two of Al, ga, ge, in, sn, bi, fe, co, ni, cu, zn, pd, ir, au, cd but not limited to.
In the method for producing a metal intercalation two-dimensional compound, the inorganic salt is preferably a metal halide salt of a halogen element and a metal element, and the metal element is exemplified by Na, K, li, mg, ca. Preferably, the inorganic salts include, but are not limited to NaF, liCl, naCl, KCl, naBr, KBr, KI, naI. In the preparation method of the metal intercalation two-dimensional compound, halogen end groups and M (n+1)m X nm Structural units are linked so as to intercalate M of two-dimensional compound between metals (n+1) m X nm The surface of the structural unit is terminated with any one or more than two of surface end groups-Cl, -Br, -I and-F.
In the preparation method of the metal intercalation two-dimensional compound, the reaction temperature in the step S2 is 400-900 ℃ and the reaction time is 4-15 h.
In the preparation method of the metal intercalation two-dimensional compound, the step S3 is preferably to repeat the steps of etching treatment and intercalation treatment for 2 to 10 times, more preferably for 2 to 5 times.
Because the metal 'scissors' element has stronger reducibility, the metal 'scissors' element can react with the end group of MXene and knock out the end group from the surface of the MXene, after the end group is knocked out, MX layers are opened, and intercalation element atoms can enter the layers of the MX layers through intercalation reaction, so that an intercalation product is obtained, but the surface of a intercalation product sheet layer can be re-terminated with the end group in molten salt, so that a new surface end group is generated on the surface of the intercalation product. The thin-film layer can be gradually thinned by repeating the etching and intercalation processes, and new surface end groups are generated in each thinning process, so that the metal intercalation two-dimensional compound is obtained.
Compared with the prior art, the invention has the following beneficial effects:
1. the invention provides a novel metal intercalation two-dimensional compound for the first time, wherein the two-dimensional compound has rich element composition, and has the stable structural characteristics of MAX phase materials and rich surface chemical characteristics of MXene;
2. the metal intercalation two-dimensional compound is of a two-dimensional lamellar structure, and compared with a two-dimensional MXene material, the two-dimensional structure effectively improves structural stability;
3. the sheet layer is gradually thinned by repeatedly carrying out special etching treatment and special intercalation treatment, so that the metal intercalation two-dimensional compound is obtained;
4. in the intercalation treatment process, metal scissors elements are adopted to remove end groups, so that intercalation elements are promoted to enter MX layers, and the surface of an intercalation product is promoted to be terminated with the end groups in molten salt through the molten salt environment provided by inorganic salt, so that new surface end groups are generated on the surface of the intercalation product;
5. the metal intercalation two-dimensional compound of the invention can perform different structure and element regulation and control, realize the regulation and control of physical and chemical properties, and has great application prospect in the fields of energy storage, catalysis and the like
Drawings
FIG. 1 is a schematic diagram of an etching/intercalation process in embodiment 1 of the present invention;
FIG. 2 is an XRD pattern for the corresponding triple etch/intercalation product of example 1 of the present invention;
FIG. 3 is a one-time intercalation product Ti of example 1 of the present invention 3m’ Al m’-1 C 2m’ T x SEM images of (a);
FIG. 4 is a second intercalation product Ti of example 1 of the present invention 3m’’ Al m’’-1 C 2m’’ T x SEM images of (a);
FIG. 5 is a third etching product Ti in example 1 of the present invention 3 C 2 Cl 2 A TEM image of (a);
FIG. 6 is a tertiary intercalation product Ti in example 1 of the present invention 3m Al m-1 C 2m T x SEM images of (a);
FIG. 7 is a low-power TEM image of the tertiary intercalation product of example 1 of the present invention;
FIG. 8 is a tertiary intercalation product Ti in example 2 of the present invention 3m Sn m-1 C 2m T x An XRD pattern of (b);
FIG. 9 is a tertiary intercalation product Ti in example 2 of the present invention 3m Sn m-1 C 2m T x SEM images of (a);
FIG. 10 is a third intercalation product Ti of example 2 of the present invention 3m Sn m-1 C 2m T x SEM-EDS images of (a);
FIG. 11 is a third intercalation product Ti of example 2 of the present invention 3m Sn m-1 C 2m T x Is a bright field STEM diagram of (2);
FIG. 12 is a third intercalation product Ti of example 2 of the present invention 3m Sn m-1 C 2m T x Atomic resolution STEM diagram and corresponding atomic structure model diagram thereof.
Detailed Description
The technical solution of the present invention will be further described by means of specific examples and drawings, it being understood that the specific examples described herein are only for aiding in understanding the present invention and are not intended to be limiting. And the drawings described herein are for illustration purposes only and are not intended to limit the scope of the present disclosure. Unless otherwise indicated, all materials used in the examples of the present invention are those commonly used in the art, and all methods used in the examples are those commonly used in the art.
Example 1
(1) MAX phase material Ti 3 AlC 2 Powder, cdCl 2 Powder, naCl and KCl according to a mole ratio of 1:3:10:10, fully grinding and mixing to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere (argon), and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and Cd metal simple substance generated by reaction, and finally carrying out suction filtration and drying to obtain primary etched Ti 3 C 2 Cl 2 MXene powder.
(2) Will etch Ti once 3 C 2 Cl 2 MXene powder, al powder, naCl and KCl according to a mole ratio of 1:3:10:10, fully grinding to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere (argon), and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and unreacted Al metal simple substance, and finally carrying out suction filtration and drying to obtain Ti with thicker primary intercalation layer 3m’ Al m’-1 C 2m’ T x And (3) powder. The sheet layer has no two-dimensional sheet layer characteristic due to thicker sheet layer thickness of one-time intercalation, namely, larger m' value.
(3) With one time intercalation of Ti 3m’ Al m’-1 C 2m’ T x The powder is a precursor material, and the second etching treatment is carried out again according to the method in the step (1) to obtain the second etched Ti 3 C 2 Cl 2 mXene powder; then etching Ti with a second time 3 C 2 Cl 2 MXene powder is used as a precursor, and the second intercalation is carried out according to the method in the step (2) to obtain the second intercalation Ti 3m’’ Al m’’-1 C 2m’’ T x And (3) powder. The sheets of the secondary intercalation product are thinned, i.e. m ', compared to the sheets of the primary intercalation product'<m’。
(4) To secondarily intercalate Ti 3m’’ Al m’’-1 C 2m’’ T x The powder is a precursor material, and the third etching treatment is carried out again according to the method in the step (1) to obtain the third etching Ti 3 C 2 Cl 2 mXene powder; then etching Ti three times 3 C 2 Cl 2 The MXene powder is used as a precursor, and the third intercalation is carried out according to the method in the step (2) to obtain a third intercalation product, namely the metal intercalation two-dimensional compound Ti 3m Al m-1 C 2m T x Wherein m is<m’’<m' and m are a certain number of 2-20, and x is a certain number of 1-3.
Etching treatment in step (1) As shown in a to b of FIG. 1, MAX phase material Ti is obtained by a Lewis acid molten salt process 3 AlC 2 Removing Al atoms in the alloy by etching to obtain an MXene material Ti with end group Cl on the surface 3 C 2 Cl 2 The method comprises the steps of carrying out a first treatment on the surface of the The intercalation process of step (2) is as shown in b to c of FIG. 1, al element is diffused into the MXene material Ti 3 C 2 Cl 2 Further reacts with exposed M-site atoms Ti and realizes the healing of the Van der Waals gaps, thereby obtaining Ti 3m’ Al m’-1 C 2m’ T x 。
By X-ray diffractionThe spectra (XRD) were analyzed for the products of the different etches and intercalation of example 1, as shown in fig. 2. (0002) The change of the characteristic peaks of the surface and the (0004) proves the structural evolution of the whole etching/intercalation process, and the decrease of the intensity of the characteristic peaks of the (0002) and the (0004) shows that the sheet layer becomes thinner gradually along with the increase of the whole etching/intercalation frequency. FIG. 3 shows the primary intercalation product Ti 3m’ Al m’-1 C 2m’ T x The particles were observed to exhibit the "accordion" morphology typical of MXene, as shown by Scanning Electron Microscopy (SEM) images of the particles, indicating that Al intercalation only occurred at Ti 3 C 2 Cl 2 In the van der Waals gap of MXene, the large gap generated by once etching MXene cannot heal, and finally the like-MXene's accordion' shape is presented. Fig. 4 is an SEM image of the secondary intercalation product, and it can be observed that the particle surface is further exfoliated compared to the primary intercalation product. FIG. 5 is a third etching product Ti 3 C 2 Cl 2 A TEM image of the MXene particle cross section was observed to form a two-dimensional stack of lamellae after three etches, indicating that significant thinning of the lamellae occurred by the three etches. FIG. 6 is an SEM image of a three-time intercalation product, which shows that the particles produced a significant exfoliation effect compared to one-time intercalation; further TEM observation of the particle cross section (FIG. 7) can observe an obvious two-dimensional lamellar stacking structure, wherein the two-dimensional lamellar is a metal intercalation two-dimensional compound, and the thickness of the metal intercalation two-dimensional compound is about 2-20 nm.
Example 2
(1) MAX phase Ti 3 AlC 2 Powder, cdCl 2 Powder, naCl and KCl according to a mole ratio of 1:3:10:10, fully grinding and mixing to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere (argon), and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and Cd metal simple substance generated by reaction, and finally carrying out suction filtration and drying to obtain primary etched Ti 3 C 2 Cl 2 MXene powder.
(2) Will etch Ti once 3 C 2 Cl 2 MXene powder, al powder, naCl and KCl according to a mole ratio of 1:3:10:10, fully grinding to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere (argon), and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and unreacted Al metal simple substance, and finally performing suction filtration and drying to obtain the primary intercalation Ti 3m’ Al m’-1 C 2m’ T x And (3) powder.
(3) With one time intercalation of Ti 3m’ Al m’-1 C 2m’ T x The powder is a precursor material, and the second etching treatment is carried out again according to the method in the step (1) to obtain the second etched Ti 3 C 2 Cl 2 mXene powder; then etching Ti with a second time 3 C 2 Cl 2 MXene powder is used as a precursor, and the second intercalation is carried out according to the method in the step (2) to obtain the second intercalation Ti 3m’’ Al m’’-1 C 2m’’ T x And (3) powder.
(4) To secondarily intercalate Ti 3m’’ Al m’’-1 C 2m’’ T x The powder is a precursor material, and the third etching treatment is carried out again according to the method in the step (1) to obtain the third etching Ti 3 C 2 Cl 2 MXene powder.
(5) Will etch Ti three times 3 C 2 Cl 2 MXene powder, al powder, sn powder, naCl and KCl according to the mol ratio of 1:2:2:10:10 (molar content of Al is small, and the metal "scissors" element is consumed and does not insert between MX layers) to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere, and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and unreactedFinally carrying out suction filtration and drying to obtain a three-time intercalation product, namely the metal intercalation two-dimensional compound Ti 3m Sn m-1 C 2m T x Wherein m is<m’’<m' and m are a certain number of 2-20, and x is a certain number of 1-3.
FIG. 8 is a three time intercalation product Ti 3m Sn m-1 C 2m T x XRD patterns of the powder, from which Ti can be observed 3m Sn m-1 C 2m T x Corresponding characteristic peaks, prove Ti 3m Sn m-1 C 2m T x Is generated. In addition, higher Al content was also detected 2 O 3 Peaks, indicating that Al was formed during the reaction 2 O 3 This is caused by the oxidation of the Al surface layer used. FIG. 9 is a three time intercalation Ti 3m Sn m-1 C 2m T x The SEM image of the powder can be observed that the morphology of the peeling after multiple etching/intercalation is a two-dimensional lamellar stacking morphology. Analysis of the particulate elements of the reaction product by SEM-EDS (FIG. 10) revealed that the presence of Cl was observed, indicating the formation of-Cl end groups during stripping. The bright field STEM plot (fig. 11) demonstrates the effective delamination of the lamellae, resulting in a two-dimensional structure. Further analysis of the atomic structure by atomic resolution STEM (fig. 12) demonstrates the presence of-Cl end groups on the surface of the metal intercalation two-dimensional compound.
Example 3
(1) MAX phase Ti 2 AlC powder, cdCl 2 Powder, naCl and KCl according to a mole ratio of 1:3:10:10, fully grinding and mixing to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere (argon), and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and Cd metal simple substance generated by reaction, and finally carrying out suction filtration and drying to obtain primary etched Ti 2 CCl 2 MXene powder.
(2) Will etch Ti once 2 CCl 2 MXene powder, al powder, naCl and KCl according to the mole ratio1:3:10:10, fully grinding to obtain mixed powder; loading the mixed powder into an alumina crucible, then placing the alumina crucible into a high-temperature vacuum tube furnace to react for 5 hours at 700 ℃ under the protection of inert atmosphere (argon), and taking out the alumina crucible after the sintering temperature is reduced to room temperature; washing the reaction product with 2mol/L hydrochloric acid solution to remove inorganic salt NaCl, KCl and unreacted Al metal simple substance, and finally performing suction filtration to obtain primary intercalation Ti 2m’ Al m’-1 C m’ T x And (3) powder.
(3) With one time intercalation of Ti 2m’ Al m’-1 C m’ T x The powder is a precursor material, and the second etching treatment is carried out again according to the method in the step (1) to obtain the second etched Ti 2 CCl 2 mXene powder; then etching Ti with a second time 2 CCl 2 MXene powder is used as a precursor, and the second intercalation is carried out according to the method in the step (2) to obtain the second Al intercalation Ti 2m’’ Al m’’-1 C m’’ T x And (3) powder.
(4) To secondarily intercalate Ti 2m’’ Al m’’-1 C m’’ T x The powder is a precursor material, and the third etching treatment is carried out again according to the method in the step (1) to obtain the third etching Ti 2 CCl 2 mXene powder; then etching Ti three times 2 C 2 Cl 2 The MXene powder is used as a precursor, and the third intercalation is carried out according to the method in the step (2) to obtain a third intercalation product, namely the metal intercalation two-dimensional compound Ti 2m Al m-1 C m T x Wherein m is<m’’<m' and m are a certain number of 2-20, and x is a certain number of 1-3.
The various aspects, embodiments, features of the invention are to be considered as illustrative in all respects and not restrictive, the scope of the invention being indicated only by the appended claims. Other embodiments, modifications, and uses will be apparent to those skilled in the art without departing from the spirit and scope of the claimed invention.
In the preparation method of the invention, the sequence of each step is not limited to the listed sequence, and the sequential change of each step is also within the protection scope of the invention without the inventive labor for the person skilled in the art. Furthermore, two or more steps or actions may be performed simultaneously.
Finally, it should be noted that the specific embodiments described herein are merely illustrative of the spirit of the invention and are not limiting of the invention's embodiments. Those skilled in the art to which the invention pertains may make various modifications or additions to the described embodiments or may be substituted in a similar manner, without and without all of the embodiments herein being fully understood. While these obvious variations and modifications, which come within the spirit of the invention, are within the scope of the invention, they are to be construed as being without departing from the spirit of the invention.
Claims (7)
1. A metal intercalation two-dimensional compound is characterized in that the molecular general formula of the metal intercalation two-dimensional compound is M (n+1)m I m-1 X nm T x M is selected from any one or more than two of III B, IV B, V B, VI B and VII B elements, I is an intercalation element, X is carbon or/and nitrogen element, and T is a surface end group; wherein n is any number of 1 to 3, x is any number of 1 to 3, and m is any number of 2 to 20;
i comprises any one or any combination of more than two of Al, ga, ge, in, sn, bi, fe, co, ni, cu, zn, pd, ir, au, cd;
the metal intercalation two-dimensional compound is M (n+1)m X nm The structural units and the I atomic layers are alternately stacked, wherein M (n+1)m X nm The surface of the structural unit is connected with a surface end group T.
2. The metal intercalation two-dimensional compound according to claim 1, wherein the metal intercalation two-dimensional compound is a two-dimensional lamellar layer, and the thickness of the two-dimensional lamellar layer is 1-50 nm.
3. A metal intercalation two-dimensional compound according to claim 1, wherein M comprises any one or any combination of two or more of Ti, V, nb, mn, Y, zr, cr, mo, hf, ta, W.
4. A metal intercalation two-dimensional compound according to claim 1, wherein, T comprises any one or more than two of-Cl, -Br, -I, -F, -O, -OH, -S, -Se, -Te, -P and-Sb.
5. A preparation method of a metal intercalation two-dimensional compound is characterized in that the molecular general formula of the metal intercalation two-dimensional compound is M (n+1)m I m-1 X nm T x M is selected from any one or more than two of III B, IV B, V B, VI B and VII B elements, I is an intercalation element, X is carbon or/and nitrogen element, and T is a surface end group; wherein n is any number of 1 to 3, x is any number of 1 to 3, and m is any number of 2 to 20;
i comprises any one or any combination of more than two of Al, ga, ge, in, sn, bi, fe, co, ni, cu, zn, pd, ir, au, cd;
the preparation method comprises the following steps:
s1, etching: etching the MAX phase material through a Lewis acid molten salt method to obtain an MXene material;
s2, intercalation processing: mixing the obtained MXene material, metal 'scissors' element, intercalation element or compound containing intercalation element and inorganic salt, and reacting to obtain a once intercalation MAX phase material;
s3, repeating the steps of etching treatment and intercalation treatment to obtain a metal intercalation two-dimensional compound;
the metal "scissors" element comprises any one or any combination of more than two of Li, na, K, mg, ca, al, ga, ge, in, sn;
the reaction temperature in the step S2 is 400-900 ℃ and the reaction time is 4-15 h.
6. The method according to claim 5, wherein the molar ratio of the MXene material, the metal "scissors" element, the intercalation element or the compound containing the intercalation element, and the inorganic salt is 1: (0.5-3): (0.5-3): (5-50).
7. The method according to claim 5, wherein in step S3, the steps of etching and intercalation are repeated 2 to 10 times.
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