CN115854653B - Device and production process for producing lean krypton-xenon and ultra-pure oxygen by adopting same heat pump - Google Patents

Device and production process for producing lean krypton-xenon and ultra-pure oxygen by adopting same heat pump Download PDF

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CN115854653B
CN115854653B CN202310168852.0A CN202310168852A CN115854653B CN 115854653 B CN115854653 B CN 115854653B CN 202310168852 A CN202310168852 A CN 202310168852A CN 115854653 B CN115854653 B CN 115854653B
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krypton
liquid
outlet
gas
xenon
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CN115854653A (en
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郑梦杰
崔增涛
闫红伟
渠会丽
何新宾
莫佩
穆非让
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Henan Xinlianxin Shenleng Energy Co ltd
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Henan Xinlianxin Shenleng Energy Co ltd
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04642—Recovering noble gases from air
    • F25J3/04745—Krypton and/or Xenon
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
    • F25J3/04278—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using external refrigeration units, e.g. closed mechanical or regenerative refrigeration units
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00—Processes or apparatus using separation by rectification
    • F25J2200/90—Details relating to column internals, e.g. structured packing, gas or liquid distribution
    • F25J2200/94—Details relating to the withdrawal point
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00—Processes or apparatus using other separation and/or other processing means
    • F25J2205/60—Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2210/00—Processes characterised by the type or other details of the feed stream
    • F25J2210/42—Nitrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00—Processes characterised by the type or other details of the product stream
    • F25J2215/50—Oxygen or special cases, e.g. isotope-mixtures or low purity O2
    • F25J2215/56—Ultra high purity oxygen, i.e. generally more than 99,9% O2
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2220/00—Processes or apparatus involving steps for the removal of impurities
    • F25J2220/50—Separating low boiling, i.e. more volatile components from oxygen, e.g. N2, Ar
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2220/00—Processes or apparatus involving steps for the removal of impurities
    • F25J2220/52—Separating high boiling, i.e. less volatile components from oxygen, e.g. Kr, Xe, Hydrocarbons, Nitrous oxides, O3
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2235/00—Processes or apparatus involving steps for increasing the pressure or for conveying of liquid process streams
    • F25J2235/50—Processes or apparatus involving steps for increasing the pressure or for conveying of liquid process streams the fluid being oxygen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2245/00—Processes or apparatus involving steps for recycling of process streams
    • F25J2245/90—Processes or apparatus involving steps for recycling of process streams the recycled stream being boil-off gas from storage
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00—Details related to the use of reboiler-condensers
    • F25J2250/20—Boiler-condenser with multiple exchanger cores in parallel or with multiple re-boiling or condensing streams
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2270/00—Refrigeration techniques used
    • F25J2270/12—External refrigeration with liquid vaporising loop
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2270/00—Refrigeration techniques used
    • F25J2270/42—Quasi-closed internal or closed external nitrogen refrigeration cycle

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Abstract

The invention belongs to a device and a production process for producing lean krypton-xenon and ultra-pure oxygen by adopting the same heat pump; the device comprises a raw material liquid oxygen pipeline, a raw material liquid oxygen storage tank, an adsorption tower, a krypton-xenon-lean tank, a krypton-lean-xenon-tower gas phase outlet, a krypton-removing tower and an argon-removing tower, wherein the raw material liquid oxygen pipeline is connected with a raw material liquid oxygen storage tank first inlet of the raw material liquid oxygen storage tank; the liquid phase outlet at the bottom of the argon removal tower is connected with an ultrapure oxygen storage tank; the method has the characteristic of being capable of simultaneously producing the lean krypton-xenon liquid and the ultra-pure oxygen product.

Description

Device and production process for producing lean krypton-xenon and ultra-pure oxygen by adopting same heat pump
Technical Field
The invention belongs to the technical field of production of lean krypton-xenon and ultrapure oxygen, and particularly relates to a device and a production process for producing lean krypton-xenon and ultrapure oxygen by adopting the same heat pump.
Background
The ultra-pure oxygen can play a role in removing impurities such as carbon, phosphorus, sulfur, silicon and the like in the welding process, and heat generated in the oxidation process can maintain the temperature required by steelmaking, so that the quality and the yield of welding can be remarkably improved, the ultra-pure oxygen can be widely applied in the aspects of welding, laser beam cutting, photovoltaic, metallurgy and the like of high-precision instruments, the cutting rate can be improved by 50%, and a high-quality cut workpiece can be obtained; on the other hand, ultrapure oxygen is widely used as an oxidation source in the field of electronic information of large-scale integrated circuits such as plasma etching and the like in chemical vapor deposition of silicon dioxide as a reactant for producing high-purity water.
The existing ultra-pure oxygen production generally adopts oxygen or liquid oxygen of an original air separation equipment main tower, an external single tower is used for preparing the ultra-pure oxygen, methane is also concentrated in the rectification process, manual discharge is carried out through periodic analysis in a tower kettle, the liquid level of the tower kettle is unstable, and load adjustment can influence the air separation main tower, so that the ultra-pure oxygen product prepared by the method has low purity, large rectification load and high energy consumption; further, the analysis finds that the methane is concentrated in the rectification process, so that the methane needs to be analyzed and discharged at a tower kettle periodically, the workload is large, and the load adjustment can sometimes affect the space main tower.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a device and a production process for producing lean krypton-xenon and ultra-pure oxygen by adopting the same heat pump.
The purpose of the invention is realized in the following way:
the device for producing the lean krypton-xenon and the ultrapure oxygen by adopting the same heat pump comprises a raw material liquid oxygen pipeline, a lean krypton-xenon storage tank and an ultrapure oxygen storage tank, wherein the raw material liquid oxygen pipeline is connected with a raw material liquid oxygen storage tank first inlet of the raw material liquid oxygen storage tank, an outlet of the raw material liquid oxygen storage tank is connected with an inlet of a lean krypton-xenon tower through an adsorption tower, a liquid phase outlet at the bottom of the lean krypton-xenon tower is connected with the lean krypton-xenon storage tank, a gas phase outlet at the top of the lean krypton-xenon tower is connected with an inlet of a gas-liquid separator I through a top condenser first inlet and a top condenser first outlet of a top condenser, a gas phase outlet at the top of the gas-liquid separator I is connected with an inlet of a krypton-removing tower, and a gas-liquid phase outlet at the top of the krypton-removing tower is connected with a gas-liquid separator II second inlet of the gas-liquid separator II through a top condenser second inlet and a gas-removing argon inlet of the krypton-removing tower respectively; the liquid phase outlet at the bottom of the argon removal tower is connected with an ultrapure oxygen storage tank; and a methane liquid external pumping and exhausting pipeline is arranged in the middle of the krypton-removing tower.
The beneficial effects of the invention are as follows: the method of preparing ultrapure oxygen in a rectification and concentration mode in the prior art is abandoned, and a mode of rectifying and arranging a methane liquid external pumping and discharging pipeline in the middle of the krypton-removing tower is adopted, so that methane separation is realized, and energy consumption is reduced; meanwhile, the invention is provided with an argon removal tower to realize the thorough separation of argon and oxygen, so that the purity of the prepared ultrapure oxygen is not lower than 99.99993 percent of the purity of the ultrapure oxygen product.
Preferably, a first regular packing layer is arranged at the upper part in the krypton-removing tower corresponding to the inlet of the krypton-removing tower, a second regular packing layer is arranged at the upper part in the krypton-removing tower corresponding to the inlet of the krypton-removing tower, a first groove type liquid collecting and distributing device is arranged at the upper part of the first groove type liquid collecting and distributing device, a first temperature sensor is arranged at the top of the first groove type liquid collecting and distributing device, a second groove type liquid collecting and distributing device is arranged at the upper part of the second regular packing layer, a second temperature sensor is arranged at the bottom of the second regular packing layer, and a methane liquid external pumping pipeline is arranged on the krypton-removing tower corresponding to the second regular packing layer and the first regular packing layer.
The invention utilizes the process route that raw material liquid oxygen firstly passes through a lean krypton-xenon tower, analyzes gas phase passing through a gas-liquid separator I, utilizes the structural characteristics of the krypton-removing tower, is based on different temperature distribution of component content on a trough type liquid collecting and distributing device in the rectification process of the krypton-removing tower, and is provided with a methane liquid external pumping and discharging pipeline at a methane gathering place, thereby accurately utilizing the temperature to adjust the opening of a corresponding valve, achieving the effect of periodically discharging methane, avoiding the accumulation of methane in a pure krypton tower kettle, affecting the rectification load and further preparing a qualified ultrapure oxygen product.
Preferably, the top of the lean krypton-xenon storage tank is provided with a vaporization gas outlet, and the vaporization gas outlet is connected with a second inlet of the raw material liquid oxygen storage tank through a twelfth regulating valve and a first inlet and a first outlet of a recooler of the recooler; the liquid phase outlet at the bottom of the krypton-removing tower is connected with the third inlet of the raw material liquid oxygen storage tank through an eleventh regulating valve, a second inlet of the recooler and a second outlet of the recooler; the liquid phase outlet at the bottom of the argon removal tower is connected with an ultrapure oxygen storage tank through a fourteenth regulating valve, a fourth inlet of a back cooler and a fourth outlet of the back cooler.
Preferably, a liquid oxygen pump is arranged between the outlet of the raw material liquid oxygen storage tank and the adsorption tower, a first regulating valve is arranged between the adsorption tower and the inlet of the lean krypton-xenon tower, a second regulating valve is arranged between the gas phase outlet of the gas-liquid separator I and the inlet of the krypton-removing tower, a third regulating valve is arranged between the liquid phase outlet of the gas-liquid separator II and the inlet of the argon-removing tower, and a sixteenth regulating valve is arranged between the liquid phase outlet of the gas-liquid separator II and the circulating liquid inlet of the krypton-removing tower; the methane liquid external pumping and exhausting pipeline is communicated with the atmosphere through a fifteenth regulating valve, a fifth inlet of a main heat exchanger of the main heat exchanger and a fifth outlet of the main heat exchanger; the gas phase outlet of the gas-liquid separator II is communicated with the atmosphere through a fourth regulating valve, a first inlet of the main heat exchanger and a first outlet of the main heat exchanger;
The liquid phase outlet of the gas-liquid separator I is connected with the reflux port of the poor krypton-xenon column at the upper part of the poor krypton-xenon column.
Preferably, the top gas phase outlet of the argon removal tower is connected with the first inlet of the gas-liquid separator II through the third inlet of the top condenser and the third outlet of the top condenser.
Preferably, a tenth regulating valve is arranged between the liquid phase outlet at the bottom of the krypton-xenon-lean tower and the krypton-xenon-lean storage tank.
Preferably, the device further comprises a liquid nitrogen storage tank, wherein a first liquid phase outlet of the liquid nitrogen storage tank is connected with a shell side first inlet of the top condenser through a fifth regulating valve, and a shell side outlet of the top condenser is connected with an inlet of the heat pump through a fourth inlet of the main heat exchanger and a fourth outlet of the main heat exchanger; the outlet of the heat pump is respectively connected with the inlets of a lean krypton-xenon tower kettle reboiler at the bottom of the lean krypton-xenon tower, a krypton-removing tower kettle reboiler at the bottom of the krypton-removing tower and an argon-removing tower kettle reboiler at the bottom of the argon-removing tower through a third inlet of the main heat exchanger and a third outlet of the main heat exchanger, and the outlets of the lean krypton-xenon tower kettle reboiler, the krypton-removing tower kettle reboiler and the argon-removing tower kettle reboiler are respectively connected with a shell side second inlet of the top condenser.
Preferably, the second liquid phase outlet of the liquid nitrogen storage tank is connected with the regenerated gas inlet of the adsorption tower sequentially through the third inlet of the back cooler, the third outlet of the back cooler, the thirteenth regulating valve, the second inlet of the main heat exchanger and the second outlet of the main heat exchanger, and the regenerated gas outlet of the adsorption tower is connected with a nitrogen pipe network.
Preferably, a seventh regulating valve is arranged between the third outlet of the main heat exchanger and the lean krypton-xenon tower kettle reboiler, an eighth regulating valve is arranged between the third outlet of the main heat exchanger and the krypton-removing tower kettle reboiler, and a ninth regulating valve is arranged between the third outlet of the main heat exchanger and the argon-removing tower kettle reboiler.
A process for producing a device for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump, the process comprising the steps of:
step one: the raw material liquid oxygen in the raw material liquid oxygen pipeline is buffered in a raw material liquid oxygen storage tank, is pressurized by a liquid oxygen pump and absorbed by an adsorption tower, enters a krypton-poor xenon tower through a first regulating valve, and is subjected to heat and cold rectification through a krypton-poor xenon tower kettle reboiler and a top condenser respectively, wherein the temperature of the raw material liquid oxygen is as follows: -180 to-183 ℃, the flow is: 3500Nm 3 And (3) gas phase fraction: 0, the krypton content in the raw material liquid oxygen is: 10-200 ppm, wherein the xenon content in the raw material liquid oxygen is as follows: 1 to 50ppm;
step two: enabling a gas phase after the raw material liquid entering the lean krypton-xenon tower in the first step is subjected to primary rectification purification to enter a top condenser for partial liquefaction into a gas-liquid separator I, and enabling a liquid phase of the gas-liquid separator I to flow back into the lean krypton-xenon tower; the bottom liquid of the poor krypton-xenon tower passes through a tenth regulating valve to a poor krypton-xenon storage tank; the vaporized gas in the lean krypton-xenon storage tank enters the raw material liquid oxygen storage tank for caching through a twelve regulating valve, a first inlet of a back cooler and a first outlet of the back cooler; the temperature of the kettle liquid of the lean krypton-xenon tower is as follows: -179.5 to-178.5 ℃, and the mole fraction of krypton and xenon is as follows: 1500-3000 ppm;
Step three: the gas phase of the gas-liquid separator I in the second step enters a krypton-removing tower, after heat and cold energy are respectively provided by a reboiler at the bottom of the krypton-removing tower and a condenser at the top of the krypton-removing tower for rectification, the gas phase at the top of the krypton-removing tower enters a gas-liquid separator II for gas-liquid separation after being liquefied by the condenser at the top of the krypton-removing tower, one part of liquid phase in the gas-liquid separator II flows back into the krypton-removing tower through a circulating liquid inlet of the krypton-removing tower, and the other part of liquid phase enters the argon-removing tower through an inlet of the argon-removing tower; liquid phase outlet temperature of the gas-liquid separator II: the temperature is between 180 ℃ below zero and 181 ℃ below zero, and the liquid oxygen content is between 99.999 and 99.9995 percent;
step four: after the liquid phase entering the argon removing tower in the step three is rectified by providing heat and cold respectively at a reboiler of an argon removing tower kettle and a condenser at the top, the liquid phase of the argon removing tower kettle enters an ultrapure oxygen storage tank through a fourteenth regulating valve, a fourth inlet of a back cooler and a fourth outlet of the back cooler, and the temperature of the ultrapure oxygen liquid at the fourth outlet of the back cooler is as follows: -181 to-182 ℃ and the liquid oxygen content is 99.99993 to 99.99995 percent;
step five: the krypton-removing tower bottom liquid after rectification in the third step enters the raw material liquid oxygen storage tank through a liquid phase outlet at the bottom of the krypton-removing tower, an eleventh regulating valve, a second inlet of a back cooler, a second outlet of the back cooler and a third inlet of the raw material liquid oxygen storage tank; the temperature of the krypton-removing tower bottom liquid at the liquid phase outlet of the krypton-removing tower is as follows: -178 to-179 ℃, and the krypton content is 10-100 ppm; liquid phase temperature of the second outlet of the back cooler: -180 to-181 ℃;
Step six: in the third step, in the rectification process of the krypton-removing tower, a liquid phase at the upper part of the krypton-removing tower enters a first structured packing layer through a first groove type liquid collecting and distributing device, and the liquid phase enters the bottom of the krypton-removing tower through a second groove type liquid collecting and distributing device and a second structured packing layer under the action of gravity; when the average temperature of the first temperature sensor and the second temperature sensor is-160 to-165 ℃, opening a fifteenth regulating valve, and discharging the middle liquid phase of the krypton-removing tower into the atmosphere through a methane liquid external pumping and discharging pipeline, a fifth inlet of the main heat exchanger and a fifth outlet of the main heat exchanger; the gas phase temperature of the fifth outlet of the main heat exchanger is as follows: 35-40 ℃, methane content: 97-99 percent;
step seven: in the fourth step, the gas phase after rectification in the argon removal tower enters a gas-liquid separator II through a top gas phase outlet, a top condenser third inlet, a top condenser third outlet and a gas-liquid separator II first inlet of the argon removal tower; repeating the step three, wherein the gas phase after gas-liquid separation in the gas-liquid separator II is discharged to the atmosphere through a gas phase outlet of the gas-liquid separator II, a fourth regulating valve, a first inlet of the main heat exchanger and a first outlet of the main heat exchanger;
Step eight: circulating gas in the heat pump enters a lean krypton-xenon tower kettle reboiler, a krypton-removing tower kettle reboiler and an argon-removing tower kettle reboiler through a third inlet of the main heat exchanger and a third outlet of the main heat exchanger respectively;
step nine: the gas nitrogen in the eighth step enters a reboiler of the lean krypton-xenon tower kettle through a seventh regulating valve, the liquid nitrogen after heat exchange is sent to a top condenser to provide cold energy, and the flow entering the reboiler of the lean krypton-xenon tower kettle is 6000-7000 Nm 3 And/h, the temperature is as follows: -170 to-172 ℃; the temperature entering the top condenser is minus 175 ℃ to minus 178 ℃;
step ten: the gas nitrogen in the eighth step enters a reboiler of the krypton-removing tower kettle through an eighth regulating valve, the liquid nitrogen after heat exchange is sent to a top condenser to provide cold energy, the temperature of the gas nitrogen entering the top condenser is minus 176 ℃ to minus 178 ℃, and the flow rate of the gas nitrogen entering the reboiler of the krypton-removing tower kettle is as follows: 3500Nm 3 /h；
Step eleven: the gas nitrogen in the eighth step enters a reboiler of an argon removal tower kettle through a ninth regulating valve, and the heat-exchanged liquid nitrogen is transferred to a top condenser to provide cold energy, wherein the temperature of the gas nitrogen entering the top condenser is-177 to-179 ℃, and the flow rate of the gas nitrogen entering the reboiler of the argon removal tower kettle is as follows: 2200-3000 Nm 3 /h；
Step twelve: step nine, step ten, the liquid nitrogen entering the top condenser in step eleven exchanges heat and then becomes gas phase to enter the heat pump through the shell side outlet of the top condenser, the fourth inlet of the main heat exchanger and the fourth outlet of the main heat exchanger; the gas phase temperature of the outlet of the fourth outlet of the main heat exchanger is as follows: at 35-40 deg.C, flow rate is 11000-12000 Nm 3 /h；
Step thirteen: when the shell side of the top condenser needs to be supplemented with cold energy, liquid nitrogen in the liquid nitrogen storage tank is supplemented with liquid nitrogen to the shell side of the top condenser through a first liquid phase outlet of the liquid nitrogen storage tank, a fifth regulating valve and a shell side first inlet of the top condenser; the shell side liquid nitrogen temperature fed into the top condenser is as follows: -181 to-182 ℃;
step fourteen: when the adsorption tower needs to be regenerated, liquid nitrogen in the liquid nitrogen storage tank enters the adsorption tower for regeneration through a second liquid phase outlet of the liquid nitrogen storage tank, a third inlet of the back cooler, a third outlet of the back cooler, a thirteenth regulating valve, a second inlet of the main heat exchanger and a second outlet of the main heat exchanger, and the regenerated nitrogen is sent into a nitrogen pipe network through a regenerated gas outlet of the adsorption tower.
According to the device and the production process for producing the poor krypton-xenon and the ultra-pure oxygen by adopting the same heat pump, the high energy integration is realized by adopting the same heat pump, so that the stable production of the crude krypton-xenon product and the ultra-pure oxygen product is realized, wherein the purity of the ultra-pure oxygen product is not lower than 99.99993%. Compared with the traditional process technology, the invention has the following advantages: 1. the invention can realize the simultaneous production of the lean krypton-xenon liquid and the ultra-pure oxygen product; 2. the invention removes water and carbon dioxide through the adsorption tower, and utilizes the rectification principle and the principle of different component distribution in the krypton-removing tower to arrange a methane liquid external pumping and exhausting pipeline so as to realize the rapid pumping of methane, thereby laying a foundation for realizing the preparation of ultrapure oxygen; by monitoring in the form of temperature and selecting the external pumping time of the methane liquid external pumping and exhausting pipeline, the content of methane impurities in the ultra-pure oxygen product can be stably regulated to be less than or equal to 0.1ppm so as to ensure that the ultra-pure oxygen product meets the GB/T14599-2008 standard. 3. The heat pump energy is highly integrated, and the lean krypton-xenon tower, the lean krypton-removing tower and the lean argon tower all share a top condenser, so that the temperature area is controllable; 4. the produced crude krypton-xenon product is stored in a poor krypton-xenon storage tank, and the gas phase of the poor krypton-xenon is recycled, so that the storage can be carried out according to market price, and the profit maximization of the product is realized; 5. the invention has high integration of energy, specifically, the hot pump outlet gas can enter the reboiler of the lean krypton-xenon tower kettle, the reboiler of the krypton-removing tower kettle and the reboiler of the argon-removing tower kettle at the same time, realizes parallel adjustment of energy, and after uniform liquefaction, the hot pump outlet gas enters the heat pump after the vaporized nitrogen is reheated after the cold energy is provided by a top condenser, thus forming recycling; 6. the invention arranges a back cooler between the gas phase of the lean krypton-xenon storage tank, the liquid phase of the krypton-removing tower bottom and the raw material liquid oxygen storage tank, thereby effectively recovering the krypton in the discharged air liquid and reducing the emptying of the krypton.
Drawings
Fig. 1 is a schematic structural view of the present invention.
FIG. 2 is a schematic diagram of the structure of the krypton-removing column of the present invention.
Fig. 3 is a schematic view of the structure of the top condenser of the present invention.
Fig. 4 is a schematic structural view of the back cooler of the present invention.
Fig. 5 is a schematic view of the structure of the main heat exchanger of the present invention.
Detailed Description
For a clearer understanding of the technical features, objects and effects of the present invention, embodiments of the present invention will now be described with reference to the drawings, in which like reference numerals refer to like parts throughout the various views. For simplicity of the drawing, only the parts relevant to the invention are schematically shown in each drawing, and they do not represent the actual structure thereof as a product.
As shown in fig. 1, 2, 3, 4 and 5, the invention is a device and a production process for producing lean krypton-xenon and ultrapure oxygen by adopting the same heat pump, wherein the device comprises a raw material liquid oxygen pipeline, a lean krypton-xenon storage tank 14 and an ultrapure oxygen storage tank 52, the raw material liquid oxygen pipeline is connected with a raw material liquid oxygen storage tank first inlet 48 of the raw material liquid oxygen storage tank 1, an outlet of the raw material liquid oxygen storage tank 1 is connected with an inlet of a lean krypton-xenon column 4 through an adsorption column 3, a liquid phase outlet at the bottom of the lean krypton-xenon column 4 is connected with the lean krypton-xenon storage tank 14, a gas phase outlet at the top of the lean krypton-xenon column 4 is connected with an inlet of a gas-liquid separator I11 through a top condenser first inlet 33 and a top condenser first outlet 39 of a top condenser 10, a gas phase outlet of the gas-liquid separator I11 is connected with an inlet of a krypton-liquid separator 5, a top gas phase outlet of the krypton-liquid separator 5 is connected with a gas-liquid separator II second inlet of the gas-liquid separator II 12 through a top condenser second inlet 36 and a top condenser second outlet 34, and a liquid phase outlet of the gas-liquid separator 12 is connected with a liquid phase outlet of the krypton-separator II 6 respectively with an inlet of the gas-liquid separator I6; the liquid phase outlet at the bottom of the argon removal tower 6 is connected with an ultrapure oxygen storage tank 52; the middle part of the krypton-removing tower 5 is provided with a methane liquid external pumping and exhausting pipeline 41.
Further, as shown in fig. 2, a first structured packing layer 67 is disposed at the inner upper portion of the krypton-removing column 5 corresponding to the inlet of the krypton-removing column 5, a second structured packing layer 68 is disposed at the inner upper portion of the krypton-removing column 5 corresponding to the inlet of the krypton-removing column 5, a first trough-type liquid collecting and distributing device 69 is disposed at the upper portion of the first structured packing layer 67, a first temperature sensor 70 is disposed at the top of the first trough-type liquid collecting and distributing device 69, a second trough-type liquid collecting and distributing device 71 is disposed at the upper portion of the second structured packing layer 68, a second temperature sensor 72 is disposed at the bottom of the second structured packing layer 68, and a methane liquid external pumping and draining pipeline 41 is disposed on the krypton-removing column 5 corresponding to the first structured packing layer 67.
Further, a top of the lean krypton-xenon storage tank 14 is provided with a vaporization gas outlet, and the vaporization gas outlet is connected with a second inlet 63 of the feed liquid oxygen storage tank through a twelfth regulating valve 28 and a first inlet 57 and a first outlet 60 of the back cooler 15 of the back cooler; the liquid phase outlet at the bottom of the krypton-removing tower 5 is connected with the third inlet 64 of the raw material liquid oxygen storage tank through an eleventh regulating valve 27, a second inlet 45 of the recooler and a second outlet 61 of the recooler; the liquid phase outlet at the bottom of the argon removal tower 6 is connected with an ultrapure oxygen storage tank 52 through a fourteenth regulating valve 47, a fourth inlet 51 of the aftercooler and a fourth outlet 50 of the aftercooler.
Further, a liquid oxygen pump 2 is arranged between the outlet of the raw material liquid oxygen storage tank 1 and the adsorption tower 3, a first regulating valve 17 is arranged between the adsorption tower 3 and the inlet of the poor krypton-xenon tower 4, a second regulating valve 18 is arranged between the gas phase outlet of the gas-liquid separator I11 and the inlet of the krypton-removing tower 5, a third regulating valve 19 is arranged between the liquid phase outlet of the gas-liquid separator II 12 and the inlet of the argon-removing tower 6, and a sixteenth regulating valve 31 is arranged between the liquid phase outlet of the gas-liquid separator II 12 and the circulating liquid inlet 49 of the krypton-removing tower; the methane liquid external pumping and exhausting pipeline 41 is communicated with the atmosphere through a fifteenth regulating valve 44 and a fifth inlet 43 and a fifth outlet 42 of the main heat exchanger 13 of the main heat exchanger; the gas phase outlet of the gas-liquid separator II 12 is communicated with the atmosphere through the fourth regulating valve 20, the first inlet 66 of the main heat exchanger and the first outlet 55 of the main heat exchanger; the liquid phase outlet of the gas-liquid separator I11 is connected with the reflux port of the krypton-xenon-lean tower 4 at the upper part of the krypton-xenon-lean tower.
Further, the top gas phase outlet of the argon removal column 6 is connected to the first inlet of the gas-liquid separator ii 12 through the top condenser third inlet 37 and the top condenser third outlet 35.
Further, a tenth regulating valve 26 is provided between the liquid phase outlet at the bottom of the krypton-xenon-lean column 4 and the krypton-xenon-lean storage tank 14.
Further, the liquid nitrogen storage tank 16 is further included, a first liquid phase outlet of the liquid nitrogen storage tank 16 is connected with a shell side first inlet 32 of the top condenser 10 through a fifth regulating valve 21, and a shell side outlet of the top condenser 10 is connected with an inlet of the heat pump 30 through a sixth regulating valve 22, a main heat exchanger fourth inlet 56 and a main heat exchanger fourth outlet 46; the outlet of the heat pump 30 is respectively connected with the inlets of a lean krypton-xenon tower kettle reboiler 7 at the bottom of the lean krypton-xenon tower 4, a krypton-removing tower kettle reboiler 8 at the bottom of the krypton-removing tower 5 and an argon-removing tower kettle reboiler 9 at the bottom of the argon-removing tower 6 through a main heat exchanger third inlet 58 and a main heat exchanger third outlet 53, and the outlets of the lean krypton-xenon tower kettle reboiler 7, the krypton-removing tower kettle reboiler 8 and the argon-removing tower kettle reboiler 9 are respectively connected with the shell side second inlet 38 of the top condenser 10.
Further, the second liquid phase outlet of the liquid nitrogen storage tank 16 is connected with the regeneration gas inlet of the adsorption tower 3 through the third inlet 59 of the back cooler, the third outlet 62 of the back cooler, the thirteenth regulating valve 29, the second inlet 65 of the main heat exchanger and the second outlet 54 of the main heat exchanger in sequence, and the regeneration gas outlet of the adsorption tower 3 is connected with the nitrogen pipe network 40.
Further, a seventh regulating valve 23 is arranged between the third outlet 53 of the main heat exchanger and the lean krypton-xenon tower kettle reboiler 7, an eighth regulating valve 24 is arranged between the third outlet 53 of the main heat exchanger and the krypton-removing tower kettle reboiler 8, and a ninth regulating valve 25 is arranged between the third outlet 53 of the main heat exchanger and the argon-removing tower kettle reboiler 9.
The invention also provides a production process of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump, which comprises the following steps:
step one: the raw material liquid oxygen in the raw material liquid oxygen pipeline is buffered in a raw material liquid oxygen storage tank 1, is pressurized by a liquid oxygen pump 2 and is absorbed by an adsorption tower 3, then enters a krypton-poor xenon tower 4 through a first regulating valve 17, and is subjected to heat and cold rectification through a krypton-poor xenon tower kettle reboiler 7 and a top condenser 10 respectively, wherein the temperature of the raw material liquid oxygen is as follows: -180 to-183 ℃, the flow is: 3500Nm 3 And (3) gas phase fraction: 0, the krypton content in the raw material liquid oxygen is: 10-200 ppm, wherein the xenon content in the raw material liquid oxygen is as follows: 1 to 50ppm;
step two: enabling a gas phase after the raw material liquid entering the lean krypton-xenon column 4 in the first step is subjected to primary rectification purification to enter a top condenser 10 for partial liquefaction into a gas-liquid separator I11, and enabling a liquid phase of the gas-liquid separator I11 to flow back into the lean krypton-xenon column 4; the bottom liquid of the poor krypton-xenon tower passes through a tenth regulating valve 26 to a poor krypton-xenon storage tank 14; the vaporized gas in the lean krypton-xenon storage tank 14 enters the raw material liquid oxygen storage tank 1 for buffering through the twelve-regulating valve 28, the first inlet 57 of the aftercooler and the first outlet 60 of the aftercooler; the temperature of the kettle liquid of the lean krypton-xenon tower is as follows: -179.5 to-178.5 ℃, and the mole fraction of krypton and xenon is as follows: 1500-3000 ppm;
Step three: in the second step, the gas phase of the gas-liquid separator I11 enters a krypton-removing tower 5, heat and cold energy are respectively provided by a krypton-removing tower kettle reboiler 8 and a top condenser 10 for rectification, the gas phase at the krypton-removing tower top is liquefied by the top condenser 10 and then enters a gas-liquid separator II 12 for gas-liquid separation, one part of the liquid phase in the gas-liquid separator II 12 flows back into the krypton-removing tower 5 through a krypton-removing tower circulating liquid inlet 49, and the other part of the liquid phase enters an argon-removing tower 6 through an inlet of the argon-removing tower 6; liquid phase outlet temperature of the gas-liquid separator ii 12: the temperature is between 180 ℃ below zero and 181 ℃ below zero, and the liquid oxygen content is between 99.999 and 99.9995 percent;
step four: in the third step, after the liquid phase entering the argon removal tower 6 provides heat and cold energy for rectification respectively at the reboiler 9 of the argon removal tower kettle and the condenser 10 at the top, the liquid phase of the argon removal tower kettle enters the ultrapure oxygen storage tank 52 through the fourteenth regulating valve 47, the fourth inlet 51 of the aftercooler and the fourth outlet 50 of the aftercooler, and the temperature of the ultrapure oxygen liquid at the fourth outlet 50 of the aftercooler is as follows: -181 to-182 ℃ and the liquid oxygen content is 99.99993 to 99.99995 percent;
step five: the krypton-removing tower bottom liquid after being rectified by the krypton-removing tower 5 in the third step enters the raw material liquid oxygen storage tank 1 through a liquid phase outlet at the bottom of the krypton-removing tower 5, an eleventh regulating valve 27, a second inlet 45 of a back cooler, a second outlet 61 of the back cooler and a third inlet 64 of the raw material liquid oxygen storage tank; the temperature of the krypton-removing tower bottom liquid at the liquid phase outlet of the krypton-removing tower 5 is as follows: -178 to-179 ℃, and the krypton content is 10-100 ppm; liquid phase temperature of the cryocooler second outlet 61: -180 to-181 ℃;
Step six: in the third step, during the rectification process of the krypton-removing tower 5, the liquid phase at the upper part of the krypton-removing tower 5 enters the first structured packing layer 67 through the first groove-type liquid collecting and distributing device 69, and then enters the bottom of the krypton-removing tower 5 through the second groove-type liquid collecting and distributing device 71 and the second structured packing layer 68 under the action of gravity, and in the process, the first temperature sensor 70 detects the temperature of the liquid phase at the upper part of the first groove-type liquid collecting and distributing device 69, and the second temperature sensor 72 detects the temperature of the liquid phase passing through the second structured packing layer 68; when the average temperature of the first temperature sensor 70 and the second temperature sensor 72 is-160 to-165 ℃, opening a fifteenth regulating valve 44, and discharging the middle liquid phase of the krypton-removing tower 5 into the atmosphere through a methane liquid external pumping and emptying pipeline 41, a main heat exchanger fifth inlet 43 and a main heat exchanger fifth outlet 42 for emptying; the gas phase temperature of the fifth outlet 42 of the main heat exchanger is: 35-40 ℃, methane content: 97-99 percent;
step seven: in the fourth step, the gas phase after rectification in the argon removal tower 6 enters a gas-liquid separator II 12 through a top gas phase outlet, a top condenser third inlet 37, a top condenser third outlet 35 and a gas-liquid separator II first inlet of the argon removal tower 6; the liquid phase after gas-liquid separation in the gas-liquid separator II 12 is repeatedly subjected to the step three, and the gas phase after gas-liquid separation is discharged to the atmosphere through a gas phase outlet of the gas-liquid separator II 12, a fourth regulating valve 20, a first inlet 66 of the main heat exchanger and a first outlet 55 of the main heat exchanger for emptying;
Step eight: circulating gas in the heat pump 30 respectively enters a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9 through a third inlet 58 of the main heat exchanger and a third outlet 53 of the main heat exchanger;
step nine: the gas nitrogen in the eighth step enters a reboiler 7 of the low krypton-xenon column kettle through a seventh regulating valve 23, the liquid nitrogen after heat exchange is sent to a top condenser 10 for providing cold energy, and the flow rate entering the reboiler of the low krypton-xenon column kettle is 6000-7000 Nm 3 And/h, the temperature is as follows: -170 to-172 ℃; the temperature entering the top condenser 10 is-175 to-178 ℃;
step ten: the gas nitrogen in the step eight enters a krypton-removing tower kettle reboiler 8 through an eighth regulating valve 24, and the liquid nitrogen subjected to heat exchange is sent to a top condenser 10 to provide cold energy, wherein the temperature of the gas nitrogen entering the top condenser 10 is minus 176 ℃ to minus 178 ℃;the flow rate of gas nitrogen entering the krypton-removing tower kettle reboiler 8 is as follows: 3500Nm 3 /h；
Step eleven: the gas nitrogen in the step eight enters an argon removal tower kettle reboiler 9 through a ninth regulating valve 25, the heat of the liquid nitrogen subjected to heat exchange is transferred to a top condenser 10 to provide cold energy, and the temperature of the gas nitrogen entering the top condenser 10 is-177 to-179 ℃, and the flow of the gas nitrogen entering the argon removal tower kettle reboiler 9 is as follows: 2200-3000 Nm 3 /h；
Step twelve: step nine, step ten and step eleven, the liquid nitrogen entering the top condenser 10 exchanges heat and then becomes a gas phase, and the gas phase enters the heat pump 30 through the shell side outlet of the top condenser 10, the fourth inlet 56 of the main heat exchanger and the fourth outlet 46 of the main heat exchanger; the gas phase temperature at the outlet of the fourth outlet 46 of the main heat exchanger is: at 35-40 deg.C, flow rate is 11000-12000 Nm 3 /h；
Step thirteen: when the shell side of the top condenser 10 needs to be supplemented with cold energy, the liquid nitrogen in the liquid nitrogen storage tank 16 is supplemented with the liquid nitrogen to the shell side of the top condenser 10 through the first liquid phase outlet of the liquid nitrogen storage tank 16, the fifth regulating valve 21 and the shell side first inlet 32 of the top condenser 10; the shell side liquid nitrogen temperature fed to the top condenser 10 is: -181 to-182 ℃;
step fourteen: when the adsorption tower 3 needs to be regenerated, liquid nitrogen in the liquid nitrogen storage tank 16 enters the adsorption tower 3 for regeneration through a second liquid phase outlet of the liquid nitrogen storage tank 16, a third inlet 59 of a back cooler, a third outlet 62 of the back cooler, a thirteenth regulating valve 29, a second inlet 65 of a main heat exchanger and a second outlet 54 of the main heat exchanger, and the regenerated nitrogen is sent into the nitrogen pipe network 40 through a regenerated gas outlet of the adsorption tower 3.
The invention relates to a process for extracting poor krypton-xenon from liquid oxygen, and simultaneously, further finishing the gas oxygen after the poor krypton-xenon is extracted to produce ultra-pure oxygen, wherein the content of the poor krypton-xenon is more than or equal to 1500ppm, and the purity of the ultra-pure oxygen product is not less than 99.99993%. Wherein the quality of the ultra-pure oxygen product is higher than that of the national standard GB/T14599-2008 pure oxygen, high-purity oxygen and ultra-pure oxygen, and the quality index is more than or equal to 99.9999%; the process method of the invention has the advantages that: 1. realizing the simultaneous production of the lean krypton-xenon liquid and the ultra-pure oxygen product; 2. the middle extraction pipeline is arranged at the middle lower part of the krypton-removing tower by utilizing the rectification principle, so that methane at the part in the krypton-removing tower is automatically extracted; 3. the heat pump energy is highly integrated, and the lean krypton-xenon tower, the lean krypton-removing tower and the lean argon tower all share a top condenser, so that the temperature area is controllable; 4. the first gas-liquid separator at the top of the poor krypton-xenon tower shares a sealing head with the top condenser, and the equipment utilization is maximized; 5. the produced crude krypton-xenon product is stored in a poor krypton-xenon storage tank, and the gas phase of the poor krypton-xenon is recycled, so that the storage can be carried out according to market price, and the profit maximization of the product is realized; 6. the invention has high integration of energy, specifically, the hot pump outlet gas can enter the lean krypton-xenon tower kettle reboiler, the krypton-removing tower kettle reboiler and the argon-removing tower kettle reboiler at the same time, realizes parallel adjustment of energy, provides cold energy to a top condenser after uniform liquefaction, and enters a heat pump after the evaporated nitrogen is reheated to form recycling; 7. the invention arranges a back cooler between the gas phase of the lean krypton-xenon storage tank, the liquid phase of the krypton-removing tower bottom and the raw material liquid oxygen storage tank, thereby effectively recovering the krypton in the discharged air liquid and reducing the emptying of the krypton.
The technical solutions of the embodiments of the present invention will be clearly and completely described in the following in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, are intended to fall within the scope of the present invention.
Example 1
The device for producing the lean krypton-xenon and the ultrapure oxygen by adopting the same heat pump comprises a raw material liquid oxygen pipeline, a lean krypton-xenon storage tank 14 and an ultrapure oxygen storage tank 52, wherein the raw material liquid oxygen pipeline is connected with a raw material liquid oxygen storage tank first inlet 48 of the raw material liquid oxygen storage tank 1, an outlet of the raw material liquid oxygen storage tank 1 is connected with an inlet of a lean krypton-xenon storage tank 4 through an adsorption tower 3, a liquid phase outlet at the bottom of the lean krypton-xenon storage tank 4 is connected with the lean krypton-xenon storage tank 14, a gas phase outlet at the top of the lean krypton-xenon storage tank 4 is connected with an inlet of a gas-liquid separator I11 through a top condenser first inlet 33 and a top condenser first outlet 39 of a top condenser 10, a gas phase outlet of the gas-liquid separator I11 is connected with an inlet of a krypton-liquid separator I5, a top gas phase outlet of the krypton-liquid separator II 12 is connected with a gas-liquid separator II second inlet 36 and a gas-liquid separator II 12 second inlet 49 of the krypton-liquid separator II 12 respectively; the liquid phase outlet at the bottom of the argon removal tower 6 is connected with an ultrapure oxygen storage tank 52; the middle part of the krypton-removing tower 5 is provided with a methane liquid external pumping and exhausting pipeline 41. The upper part in the krypton-removing tower 5 corresponding to the inlet of the krypton-removing tower 5 is provided with a first structured packing layer 67, the upper part in the krypton-removing tower 5 corresponding to the inlet of the krypton-removing tower 5 is provided with a second structured packing layer 68, the upper part of the first structured packing layer 67 is provided with a first groove type liquid collecting and distributing device 69, the top of the first groove type liquid collecting and distributing device 69 is provided with a first temperature sensor 70, the upper part of the second structured packing layer 68 is provided with a second groove type liquid collecting and distributing device 71, the bottom of the second structured packing layer 68 is provided with a second temperature sensor 72, and a methane liquid external pumping and draining pipeline 41 is arranged on the krypton-removing tower 5 corresponding to the second structured packing layer 68 and the first structured packing layer 67. The top of the lean krypton-xenon storage tank 14 is provided with a vaporization gas outlet, and the vaporization gas outlet is connected with a second inlet 63 of the raw material liquid oxygen storage tank through a twelfth regulating valve 28 and a first inlet 57 and a first outlet 60 of the back cooler 15 of the back cooler; the liquid phase outlet at the bottom of the krypton-removing tower 5 is connected with the third inlet 64 of the raw material liquid oxygen storage tank through an eleventh regulating valve 27, a second inlet 45 of the recooler and a second outlet 61 of the recooler; the liquid phase outlet at the bottom of the argon removal tower 6 is connected with an ultrapure oxygen storage tank 52 through a fourteenth regulating valve 47, a fourth inlet 51 of the aftercooler and a fourth outlet 50 of the aftercooler. A liquid oxygen pump 2 is arranged between the outlet of the raw material liquid oxygen storage tank 1 and the adsorption tower 3, a first regulating valve 17 is arranged between the adsorption tower 3 and the inlet of the poor krypton-xenon tower 4, a second regulating valve 18 is arranged between the gas phase outlet of the gas-liquid separator I11 and the inlet of the krypton-removing tower 5, a third regulating valve 19 is arranged between the liquid phase outlet of the gas-liquid separator II 12 and the inlet of the argon-removing tower 6, and a sixteenth regulating valve 31 is arranged between the liquid phase outlet of the gas-liquid separator II 12 and the circulating liquid inlet 49 of the krypton-removing tower; the methane liquid external pumping and exhausting pipeline 41 is communicated with the atmosphere through a fifteenth regulating valve 44 and a fifth inlet 43 and a fifth outlet 42 of the main heat exchanger 13 of the main heat exchanger; the gas phase outlet of the gas-liquid separator ii 12 is in communication with the atmosphere via the fourth regulator valve 20, the primary heat exchanger first inlet 66 and the primary heat exchanger first outlet 55. The top gas phase outlet of the argon removing tower 6 is connected with the first inlet of the gas-liquid separator II 12 through the third inlet 37 of the top condenser and the third outlet 35 of the top condenser. A tenth regulating valve 26 is arranged between the liquid phase outlet at the bottom of the krypton-xenon-lean tower 4 and the krypton-xenon-lean storage tank 14. The liquid phase outlet of the gas-liquid separator I11 is connected with the reflux port of the krypton-xenon-lean tower 4 at the upper part of the krypton-xenon-lean tower. The device also comprises a liquid nitrogen storage tank 16, wherein a first liquid phase outlet of the liquid nitrogen storage tank 16 is connected with a shell side first inlet 32 of the top condenser 10 through a fifth regulating valve 21, and a shell side outlet of the top condenser 10 is connected with an inlet of the heat pump 30 through a sixth regulating valve 22, a main heat exchanger fourth inlet 56 and a main heat exchanger fourth outlet 46; the outlet of the heat pump 30 is respectively connected with the inlets of a lean krypton-xenon tower kettle reboiler 7 at the bottom of the lean krypton-xenon tower 4, a krypton-removing tower kettle reboiler 8 at the bottom of the krypton-removing tower 5 and an argon-removing tower kettle reboiler 9 at the bottom of the argon-removing tower 6 through a main heat exchanger third inlet 58 and a main heat exchanger third outlet 53, and the outlets of the lean krypton-xenon tower kettle reboiler 7, the krypton-removing tower kettle reboiler 8 and the argon-removing tower kettle reboiler 9 are respectively connected with the shell side second inlet 38 of the top condenser 10. The second liquid phase outlet of the liquid nitrogen storage tank 16 is connected with the regeneration gas inlet of the adsorption tower 3 through the third inlet 59 of the back cooler, the third outlet 62 of the back cooler, the thirteenth regulating valve 29, the second inlet 65 of the main heat exchanger and the second outlet 54 of the main heat exchanger in sequence, and the regeneration gas outlet of the adsorption tower 3 is connected with the nitrogen pipe network 40. A seventh regulating valve 23 is arranged between the third outlet 53 of the main heat exchanger and the lean krypton-xenon tower kettle reboiler 7, an eighth regulating valve 24 is arranged between the third outlet 53 of the main heat exchanger and the krypton-removing tower kettle reboiler 8, and a ninth regulating valve 25 is arranged between the third outlet 53 of the main heat exchanger and the argon-removing tower kettle reboiler 9.
The invention also provides a production process of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump, which comprises the following steps:
step one: the raw material liquid oxygen in the raw material liquid oxygen pipeline is buffered in a raw material liquid oxygen storage tank 1, pressurized by a liquid oxygen pump 2 and absorbed by an absorption tower 3, and then enters a lean part through a first regulating valve 17In the krypton-xenon column 4, heat and cold energy rectification are respectively provided through a lean krypton-xenon column kettle reboiler 7 and a top condenser 10, and the temperature of the raw material liquid oxygen is as follows: -180 to-183 ℃, the flow is: 3500Nm 3 And (3) gas phase fraction: 0, the krypton content in the raw material liquid oxygen is: 10-200 ppm, wherein the xenon content in the raw material liquid oxygen is as follows: 1 to 50ppm;
step two: enabling a gas phase after the raw material liquid entering the lean krypton-xenon column 4 in the first step is subjected to primary rectification purification to enter a top condenser 10 for partial liquefaction into a gas-liquid separator I11, and enabling a liquid phase of the gas-liquid separator I11 to flow back into the lean krypton-xenon column 4; the bottom liquid of the poor krypton-xenon tower passes through a tenth regulating valve 26 to a poor krypton-xenon storage tank 14; the vaporized gas in the lean krypton-xenon storage tank 14 enters the raw material liquid oxygen storage tank 1 for buffering through the twelve-regulating valve 28, the first inlet 57 of the aftercooler and the first outlet 60 of the aftercooler; the temperature of the kettle liquid of the lean krypton-xenon tower is as follows: -179.5 to-178.5 ℃, and the mole fraction of krypton and xenon is as follows: 1500-3000 ppm;
Step three: in the second step, the gas phase of the gas-liquid separator I11 enters a krypton-removing tower 5, heat and cold energy are respectively provided by a krypton-removing tower kettle reboiler 8 and a top condenser 10 for rectification, the gas phase at the krypton-removing tower top is liquefied by the top condenser 10 and then enters a gas-liquid separator II 12 for gas-liquid separation, one part of the liquid phase in the gas-liquid separator II 12 flows back into the krypton-removing tower 5 through a krypton-removing tower circulating liquid inlet 49, and the other part of the liquid phase enters an argon-removing tower 6 through an inlet of the argon-removing tower 6; liquid phase outlet temperature of the gas-liquid separator ii 12: the temperature is between 180 ℃ below zero and 181 ℃ below zero, and the liquid oxygen content is 99.999 percent;
step four: in the third step, after the liquid phase entering the argon removal tower 6 provides heat and cold energy for rectification respectively at the reboiler 9 of the argon removal tower kettle and the condenser 10 at the top, the liquid phase of the argon removal tower kettle enters the ultrapure oxygen storage tank 52 through the fourteenth regulating valve 47, the fourth inlet 51 of the aftercooler and the fourth outlet 50 of the aftercooler, and the temperature of the ultrapure oxygen liquid at the fourth outlet 50 of the aftercooler is as follows: -181 to-182 ℃ and 99.99993 percent of liquid oxygen;
step five: the krypton-removing tower bottom liquid after being rectified by the krypton-removing tower 5 in the third step enters the raw material liquid oxygen storage tank 1 through a liquid phase outlet at the bottom of the krypton-removing tower 5, an eleventh regulating valve 27, a second inlet 45 of a back cooler, a second outlet 61 of the back cooler and a third inlet 64 of the raw material liquid oxygen storage tank; the temperature of the krypton-removing tower bottom liquid at the liquid phase outlet of the krypton-removing tower 5 is as follows: -178 to-179 ℃, and the krypton content is 10-100 ppm; liquid phase temperature of the cryocooler second outlet 61: -180 to-181 ℃;
Step six: in the third step, during the rectification process of the krypton-removing tower 5, the liquid phase at the upper part of the krypton-removing tower 5 enters the first structured packing layer 67 through the first groove-type liquid collecting and distributing device 69, and then enters the bottom of the krypton-removing tower 5 through the second groove-type liquid collecting and distributing device 71 and the second structured packing layer 68 under the action of gravity, and in the process, the first temperature sensor 70 detects the temperature of the liquid phase at the upper part of the first groove-type liquid collecting and distributing device 69, and the second temperature sensor 72 detects the temperature of the liquid phase passing through the second structured packing layer 68; when the average temperature of the first temperature sensor 70 and the second temperature sensor 72 is 160 ℃ below zero, the fifteenth regulating valve 44 is opened, and the middle liquid phase of the krypton-removing tower 5 is discharged to the atmosphere through the methane liquid external pumping emptying pipeline 41, the main heat exchanger fifth inlet 43 and the main heat exchanger fifth outlet 42 for emptying; the gas phase temperature of the fifth outlet 42 of the main heat exchanger is: 35-40 ℃, methane content: 97-99 percent;
step seven: in the fourth step, the gas phase after rectification in the argon removal tower 6 enters a gas-liquid separator II 12 through a top gas phase outlet, a top condenser third inlet 37, a top condenser third outlet 35 and a gas-liquid separator II first inlet of the argon removal tower 6; the liquid phase after gas-liquid separation in the gas-liquid separator II 12 is repeatedly subjected to the step three, and the gas phase after gas-liquid separation is discharged to the atmosphere through a gas phase outlet of the gas-liquid separator II 12, a fourth regulating valve 20, a first inlet 66 of the main heat exchanger and a first outlet 55 of the main heat exchanger for emptying;
Step eight: circulating gas in the heat pump 30 respectively enters a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9 through a third inlet 58 of the main heat exchanger and a third outlet 53 of the main heat exchanger;
53 respectively enter a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9;
step nine: in the eighth step, gas nitrogen enters a reboiler 7 of the lean krypton-xenon tower kettle through a seventh regulating valve 23, and the liquid nitrogen after heat exchange is performedTo the top condenser 10 to provide cold energy, the flow rate of the cold water entering the reboiler of the low krypton-xenon tower kettle is 6000Nm 3 And/h, the temperature is as follows: -170 to-172 ℃; the temperature entering the top condenser 10 is-175 to-178 ℃;
step ten: the gas nitrogen in the step eight enters a krypton-removing tower kettle reboiler 8 through an eighth regulating valve 24, the liquid nitrogen after heat exchange is sent to a top condenser 10 to provide cold energy, the temperature of the gas nitrogen entering the top condenser 10 is minus 176 ℃ to minus 178 ℃, and the flow rate of the gas nitrogen entering the krypton-removing tower kettle reboiler 8 is as follows: 3500Nm 3 /h；
Step eleven: the gas nitrogen in the step eight enters an argon removal tower kettle reboiler 9 through a ninth regulating valve 25, the heat of the liquid nitrogen subjected to heat exchange is transferred to a top condenser 10 to provide cold energy, and the temperature of the gas nitrogen entering the top condenser 10 is-177 to-179 ℃, and the flow of the gas nitrogen entering the argon removal tower kettle reboiler 9 is as follows: 3000 Nm 3 /h；
Step twelve: step nine, step ten and step eleven, the liquid nitrogen entering the top condenser 10 exchanges heat and then becomes a gas phase, and the gas phase enters the heat pump 30 through the shell side outlet of the top condenser 10, the fourth inlet 56 of the main heat exchanger and the fourth outlet 46 of the main heat exchanger; the gas phase temperature at the outlet of the fourth outlet 46 of the main heat exchanger is: at 35-40 deg.C, flow rate is 11000-12000 Nm 3 /h；
Step thirteen: when the shell side of the top condenser 10 needs to be supplemented with cold energy, the liquid nitrogen in the liquid nitrogen storage tank 16 is supplemented with the liquid nitrogen to the shell side of the top condenser 10 through the first liquid phase outlet of the liquid nitrogen storage tank 16, the fifth regulating valve 21 and the shell side first inlet 32 of the top condenser 10; the shell side liquid nitrogen temperature fed to the top condenser 10 is: -181 to-182 ℃.
Example 2
The structure of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump is the same as that of the embodiment 1, so that the description is omitted.
The invention also provides a production process of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump, which comprises the following steps:
step one: the raw material liquid oxygen in the raw material liquid oxygen pipeline is buffered in a raw material liquid oxygen storage tank 1 and is added by a liquid oxygen pump 2After being adsorbed by the pressure and adsorption tower 3, the liquid enters the krypton-xenon-lean tower 4 through a first regulating valve 17, heat and cold rectification are respectively provided through a krypton-xenon-lean tower kettle reboiler 7 and a top condenser 10, and the temperature of the liquid oxygen of the raw material is as follows: -180 to-183 ℃, the flow is: 3500Nm 3 And (3) gas phase fraction: 0, the krypton content in the raw material liquid oxygen is: 10-200 ppm, wherein the xenon content in the raw material liquid oxygen is as follows: 1 to 50ppm;
step two: enabling a gas phase after the raw material liquid entering the lean krypton-xenon column 4 in the first step is subjected to primary rectification purification to enter a top condenser 10 for partial liquefaction into a gas-liquid separator I11, and enabling a liquid phase of the gas-liquid separator I11 to flow back into the lean krypton-xenon column 4; the bottom liquid of the poor krypton-xenon tower passes through a tenth regulating valve 26 to a poor krypton-xenon storage tank 14; the vaporized gas in the lean krypton-xenon storage tank 14 enters the raw material liquid oxygen storage tank 1 for buffering through the twelve-regulating valve 28, the first inlet 57 of the aftercooler and the first outlet 60 of the aftercooler; the temperature of the kettle liquid of the lean krypton-xenon tower is as follows: -179.5 to-178.5 ℃, and the mole fraction of krypton and xenon is as follows: 1500-3000 ppm;
step three: in the second step, the gas phase of the gas-liquid separator I11 enters a krypton-removing tower 5, heat and cold energy are respectively provided by a krypton-removing tower kettle reboiler 8 and a top condenser 10 for rectification, the gas phase at the krypton-removing tower top is liquefied by the top condenser 10 and then enters a gas-liquid separator II 12 for gas-liquid separation, one part of the liquid phase in the gas-liquid separator II 12 flows back into the krypton-removing tower 5 through a krypton-removing tower circulating liquid inlet 49, and the other part of the liquid phase enters an argon-removing tower 6 through an inlet of the argon-removing tower 6; liquid phase outlet temperature of the gas-liquid separator ii 12: -180 to-181 ℃, and the liquid oxygen content is 99.9995 percent;
Step four: in the third step, after the liquid phase entering the argon removal tower 6 provides heat and cold energy for rectification respectively at the reboiler 9 of the argon removal tower kettle and the condenser 10 at the top, the liquid phase of the argon removal tower kettle enters the ultrapure oxygen storage tank 52 through the fourteenth regulating valve 47, the fourth inlet 51 of the aftercooler and the fourth outlet 50 of the aftercooler, and the temperature of the ultrapure oxygen liquid at the fourth outlet 50 of the aftercooler is as follows: -181 to-182 ℃, and the liquid oxygen content is 99.99995%;
step five: the krypton-removing tower bottom liquid after being rectified by the krypton-removing tower 5 in the third step enters the raw material liquid oxygen storage tank 1 through a liquid phase outlet at the bottom of the krypton-removing tower 5, an eleventh regulating valve 27, a second inlet 45 of a back cooler, a second outlet 61 of the back cooler and a third inlet 64 of the raw material liquid oxygen storage tank; the temperature of the krypton-removing tower bottom liquid at the liquid phase outlet of the krypton-removing tower 5 is as follows: -178 to-179 ℃, and the krypton content is 10-100 ppm; liquid phase temperature of the cryocooler second outlet 61: -180 to-181 ℃;
step six: in the third step, during the rectification process of the krypton-removing tower 5, the liquid phase at the upper part of the krypton-removing tower 5 enters the first structured packing layer 67 through the first groove-type liquid collecting and distributing device 69, and then enters the bottom of the krypton-removing tower 5 through the second groove-type liquid collecting and distributing device 71 and the second structured packing layer 68 under the action of gravity, and in the process, the first temperature sensor 70 detects the temperature of the liquid phase at the upper part of the first groove-type liquid collecting and distributing device 69, and the second temperature sensor 72 detects the temperature of the liquid phase passing through the second structured packing layer 68; when the average temperature of the first temperature sensor 70 and the second temperature sensor 72 is-165 ℃, opening a fifteenth regulating valve 44, discharging the middle liquid phase of the krypton-removing tower 5 into the atmosphere through a methane liquid external pumping emptying pipeline 41, a main heat exchanger fifth inlet 43 and a main heat exchanger fifth outlet 42 for emptying; the gas phase temperature of the fifth outlet 42 of the main heat exchanger is: 35-40 ℃, methane content: 97-99 percent;
Step seven: in the fourth step, the gas phase after rectification in the argon removal tower 6 enters a gas-liquid separator II 12 through a top gas phase outlet, a top condenser third inlet 37, a top condenser third outlet 35 and a gas-liquid separator II first inlet of the argon removal tower 6; the liquid phase after gas-liquid separation in the gas-liquid separator II 12 is repeatedly subjected to the step three, and the gas phase after gas-liquid separation is discharged to the atmosphere through a gas phase outlet of the gas-liquid separator II 12, a fourth regulating valve 20, a first inlet 66 of the main heat exchanger and a first outlet 55 of the main heat exchanger for emptying;
step eight: circulating gas in the heat pump 30 respectively enters a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9 through a third inlet 58 of the main heat exchanger and a third outlet 53 of the main heat exchanger;
53 respectively enter a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9;
step nine: the gas nitrogen in the step eight passes through a seventh regulating valve23 enter a lean krypton-xenon tower kettle reboiler 7, and the liquid nitrogen after heat exchange is sent to a top condenser 10 for providing cold energy, wherein the flow rate entering the lean krypton-xenon tower kettle reboiler is 7000Nm 3 And/h, the temperature is as follows: -170 to-172 ℃; the temperature entering the top condenser 10 is-175 to-178 ℃;
Step ten: the gas nitrogen in the step eight enters a krypton-removing tower kettle reboiler 8 through an eighth regulating valve 24, the liquid nitrogen after heat exchange is sent to a top condenser 10 to provide cold energy, the temperature of the gas nitrogen entering the top condenser 10 is minus 176 ℃ to minus 178 ℃, and the flow rate of the gas nitrogen entering the krypton-removing tower kettle reboiler 8 is as follows: 3500Nm 3 /h；
Step eleven: the gas nitrogen in the step eight enters an argon removal tower kettle reboiler 9 through a ninth regulating valve 25, the heat of the liquid nitrogen subjected to heat exchange is transferred to a top condenser 10 to provide cold energy, and the temperature of the gas nitrogen entering the top condenser 10 is-177 to-179 ℃, and the flow of the gas nitrogen entering the argon removal tower kettle reboiler 9 is as follows: 2200 Nm 3 /h；
Step twelve: step nine, step ten and step eleven, the liquid nitrogen entering the top condenser 10 exchanges heat and then becomes a gas phase, and the gas phase enters the heat pump 30 through the shell side outlet of the top condenser 10, the fourth inlet 56 of the main heat exchanger and the fourth outlet 46 of the main heat exchanger; the gas phase temperature at the outlet of the fourth outlet 46 of the main heat exchanger is: at 35-40 deg.C, flow rate is 11000-12000 Nm 3 /h；
Step thirteen: when the shell side of the top condenser 10 needs to be supplemented with cold energy, the liquid nitrogen in the liquid nitrogen storage tank 16 is supplemented with the liquid nitrogen to the shell side of the top condenser 10 through the first liquid phase outlet of the liquid nitrogen storage tank 16, the fifth regulating valve 21 and the shell side first inlet 32 of the top condenser 10; the shell side liquid nitrogen temperature fed to the top condenser 10 is: -181 to-182 ℃;
Step fourteen: when the adsorption tower 3 needs to be regenerated, liquid nitrogen in the liquid nitrogen storage tank 16 enters the adsorption tower 3 for regeneration through a second liquid phase outlet of the liquid nitrogen storage tank 16, a third inlet 59 of a back cooler, a third outlet 62 of the back cooler, a thirteenth regulating valve 29, a second inlet 65 of a main heat exchanger and a second outlet 54 of the main heat exchanger, and the regenerated nitrogen is sent into the nitrogen pipe network 40 through a regenerated gas outlet of the adsorption tower 3.
Example 3
The structure of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump is the same as that of the embodiment 1, so that the description is omitted.
The invention also provides a production process of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump, which comprises the following steps:
step one: the raw material liquid oxygen in the raw material liquid oxygen pipeline is buffered in a raw material liquid oxygen storage tank 1, is pressurized by a liquid oxygen pump 2 and is absorbed by an adsorption tower 3, then enters a krypton-poor xenon tower 4 through a first regulating valve 17, and is subjected to heat and cold rectification through a krypton-poor xenon tower kettle reboiler 7 and a top condenser 10 respectively, wherein the temperature of the raw material liquid oxygen is as follows: -180 to-183 ℃, the flow is: 3500Nm 3 And (3) gas phase fraction: 0, the krypton content in the raw material liquid oxygen is: 10-200 ppm, wherein the xenon content in the raw material liquid oxygen is as follows: 1 to 50ppm;
Step two: enabling a gas phase after the raw material liquid entering the lean krypton-xenon column 4 in the first step is subjected to primary rectification purification to enter a top condenser 10 for partial liquefaction into a gas-liquid separator I11, and enabling a liquid phase of the gas-liquid separator I11 to flow back into the lean krypton-xenon column 4; the bottom liquid of the poor krypton-xenon tower passes through a tenth regulating valve 26 to a poor krypton-xenon storage tank 14; the vaporized gas in the lean krypton-xenon storage tank 14 enters the raw material liquid oxygen storage tank 1 for buffering through the twelve-regulating valve 28, the first inlet 57 of the aftercooler and the first outlet 60 of the aftercooler; the temperature of the kettle liquid of the lean krypton-xenon tower is as follows: -179.5 to-178.5 ℃, and the mole fraction of krypton and xenon is as follows: 1500-3000 ppm;
step three: in the second step, the gas phase of the gas-liquid separator I11 enters a krypton-removing tower 5, heat and cold energy are respectively provided by a krypton-removing tower kettle reboiler 8 and a top condenser 10 for rectification, the gas phase at the krypton-removing tower top is liquefied by the top condenser 10 and then enters a gas-liquid separator II 12 for gas-liquid separation, one part of the liquid phase in the gas-liquid separator II 12 flows back into the krypton-removing tower 5 through a krypton-removing tower circulating liquid inlet 49, and the other part of the liquid phase enters an argon-removing tower 6 through an inlet of the argon-removing tower 6; liquid phase outlet temperature of the gas-liquid separator ii 12: the temperature is between 180 ℃ below zero and 181 ℃ below zero, and the liquid oxygen content is 99.9993 percent;
Step four: in the third step, after the liquid phase entering the argon removal tower 6 provides heat and cold energy for rectification respectively at the reboiler 9 of the argon removal tower kettle and the condenser 10 at the top, the liquid phase of the argon removal tower kettle enters the ultrapure oxygen storage tank 52 through the fourteenth regulating valve 47, the fourth inlet 51 of the aftercooler and the fourth outlet 50 of the aftercooler, and the temperature of the ultrapure oxygen liquid at the fourth outlet 50 of the aftercooler is as follows: -181 to-182 ℃, and the liquid oxygen content is 99.99994 percent;
step five: the krypton-removing tower bottom liquid after being rectified by the krypton-removing tower 5 in the third step enters the raw material liquid oxygen storage tank 1 through a liquid phase outlet at the bottom of the krypton-removing tower 5, an eleventh regulating valve 27, a second inlet 45 of a back cooler, a second outlet 61 of the back cooler and a third inlet 64 of the raw material liquid oxygen storage tank; the temperature of the krypton-removing tower bottom liquid at the liquid phase outlet of the krypton-removing tower 5 is as follows: -178 to-179 ℃, and the krypton content is 10-100 ppm; liquid phase temperature of the cryocooler second outlet 61: -180 to-181 ℃;
step six: in the third step, during the rectification process of the krypton-removing tower 5, the liquid phase at the upper part of the krypton-removing tower 5 enters the first structured packing layer 67 through the first groove-type liquid collecting and distributing device 69, and then enters the bottom of the krypton-removing tower 5 through the second groove-type liquid collecting and distributing device 71 and the second structured packing layer 68 under the action of gravity, and in the process, the first temperature sensor 70 detects the temperature of the liquid phase at the upper part of the first groove-type liquid collecting and distributing device 69, and the second temperature sensor 72 detects the temperature of the liquid phase passing through the second structured packing layer 68; when the average temperature of the first temperature sensor 70 and the second temperature sensor 72 is-162 ℃, opening a fifteenth regulating valve 44, discharging the middle liquid phase of the krypton-removing tower 5 into the atmosphere through a methane liquid external pumping emptying pipeline 41, a main heat exchanger fifth inlet 43 and a main heat exchanger fifth outlet 42 for emptying; the gas phase temperature of the fifth outlet 42 of the main heat exchanger is: 35-40 ℃, methane content: 97-99 percent;
Step seven: in the fourth step, the gas phase after rectification in the argon removal tower 6 enters a gas-liquid separator II 12 through a top gas phase outlet, a top condenser third inlet 37, a top condenser third outlet 35 and a gas-liquid separator II first inlet of the argon removal tower 6; the liquid phase after gas-liquid separation in the gas-liquid separator II 12 is repeatedly subjected to the step three, and the gas phase after gas-liquid separation is discharged to the atmosphere through a gas phase outlet of the gas-liquid separator II 12, a fourth regulating valve 20, a first inlet 66 of the main heat exchanger and a first outlet 55 of the main heat exchanger for emptying;
step eight: circulating gas in the heat pump 30 respectively enters a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9 through a third inlet 58 of the main heat exchanger and a third outlet 53 of the main heat exchanger;
53 respectively enter a lean krypton-xenon tower kettle reboiler 7, a krypton-removing tower kettle reboiler 8 and an argon-removing tower kettle reboiler 9;
step nine: the gas nitrogen in the eighth step enters a reboiler 7 of the low krypton-xenon column kettle through a seventh regulating valve 23, the liquid nitrogen after heat exchange is sent to a top condenser 10 for providing cold energy, and the flow rate entering the reboiler of the low krypton-xenon column kettle is 6500Nm 3 And/h, the temperature is as follows: -170 to-172 ℃; the temperature entering the top condenser 10 is-175 to-178 ℃;
Step ten: the gas nitrogen in the step eight enters a krypton-removing tower kettle reboiler 8 through an eighth regulating valve 24, the liquid nitrogen after heat exchange is sent to a top condenser 10 to provide cold energy, the temperature of the gas nitrogen entering the top condenser 10 is minus 176 ℃ to minus 178 ℃, and the flow rate of the gas nitrogen entering the krypton-removing tower kettle reboiler 8 is as follows: 3500Nm 3 /h；
Step eleven: the gas nitrogen in the step eight enters an argon removal tower kettle reboiler 9 through a ninth regulating valve 25, the heat of the liquid nitrogen subjected to heat exchange is transferred to a top condenser 10 to provide cold energy, and the temperature of the gas nitrogen entering the top condenser 10 is-177 to-179 ℃, and the flow of the gas nitrogen entering the argon removal tower kettle reboiler 9 is as follows: 2600 Nm 3 /h；
Step twelve: step nine, step ten and step eleven, the liquid nitrogen entering the top condenser 10 exchanges heat and then becomes a gas phase, and the gas phase enters the heat pump 30 through the shell side outlet of the top condenser 10, the fourth inlet 56 of the main heat exchanger and the fourth outlet 46 of the main heat exchanger; the gas phase temperature at the outlet of the fourth outlet 46 of the main heat exchanger is: at 35-40 deg.C, flow rate is 11000-12000 Nm 3 /h；
Step thirteen: when the shell side of the top condenser 10 needs to be supplemented with cold energy, the liquid nitrogen in the liquid nitrogen storage tank 16 is supplemented with the liquid nitrogen to the shell side of the top condenser 10 through the first liquid phase outlet of the liquid nitrogen storage tank 16, the fifth regulating valve 21 and the shell side first inlet 32 of the top condenser 10; the shell side liquid nitrogen temperature fed to the top condenser 10 is: -181 to-182 ℃;
Step fourteen: when the adsorption tower 3 needs to be regenerated, liquid nitrogen in the liquid nitrogen storage tank 16 enters the adsorption tower 3 for regeneration through a second liquid phase outlet of the liquid nitrogen storage tank 16, a third inlet 59 of a back cooler, a third outlet 62 of the back cooler, a thirteenth regulating valve 29, a second inlet 65 of a main heat exchanger and a second outlet 54 of the main heat exchanger, and the regenerated nitrogen is sent into the nitrogen pipe network 40 through a regenerated gas outlet of the adsorption tower 3.
Comparative example:
the structure of the device for producing the lean krypton-xenon and the ultra-pure oxygen by adopting the same heat pump is the same as that of the embodiment 1, so that the description is omitted. The production process adopts the production process in the embodiment 1, the production process in the comparative example omits the step six, methane and de-components in the krypton-removing tower 5 are heavy components, and the extraction of the lean krypton-xenon is not beneficial to the recovery system (namely, if the lean krypton-xenon is still required to be extracted later, equipment such as a rectifying tower is required to be arranged for purification and separation), and meanwhile, methane is accumulated in the tower bottom of the krypton-removing tower 5 in a comparative example mode, and the rectifying load is 870kw; in the process of embodiment 1 of the present invention, since methane is pumped and exhausted by the methane liquid external pumping and exhausting pipeline 41, the rectification load can be reduced to 840kw, the consumption is saved by 30kw, and the electricity charge is saved by 19 ten thousand yuan per year.
In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "connected," "connected," and the like are to be construed broadly and may be, for example, fixedly connected, integrally connected, or detachably connected; or the communication between the two components is also possible; may be directly connected or indirectly connected through an intermediate medium, and the specific meaning of the above terms in the present invention will be understood by those skilled in the art according to the specific circumstances. The above examples are only specific to practical embodiments of the present invention, and they are not intended to limit the scope of the present invention, but all equivalent embodiments, modifications and adaptations without departing from the technical spirit of the present invention are intended to be included in the scope of the present invention.

Claims (10)

1. A production process of a device for producing lean krypton-xenon and ultra-pure oxygen by adopting the same heat pump is characterized in that: the production process comprises the following steps:
step one: raw material liquid oxygen in the raw material liquid oxygen pipeline is buffered in a raw material liquid oxygen storage tank (1), pressurized through a liquid oxygen pump (2) and absorbed by an adsorption tower (3), enters a krypton-depleted xenon tower (4) through a first regulating valve (17), and is subjected to heat and cold rectification through a krypton-depleted xenon tower kettle reboiler (7) and a top condenser (10) respectively, wherein the temperature of the raw material liquid oxygen is as follows: -180 to-183 ℃, the flow is: 3500Nm 3 And (3) gas phase fraction: 0, the krypton content in the raw material liquid oxygen is: 10-200 ppm, wherein the xenon content in the raw material liquid oxygen is as follows: 1 to 50ppm;
step two: enabling a gas phase after primary rectification purification of the raw material liquid entering the lean krypton-xenon column (4) in the first step to enter a top condenser (10) for partial liquefaction into a gas-liquid separator I (11), and enabling a liquid phase of the gas-liquid separator I (11) to flow back into the lean krypton-xenon column (4); the bottom liquid of the poor krypton-xenon tower passes through a tenth regulating valve (26) to a poor krypton-xenon storage tank (14); the vaporized gas in the lean krypton-xenon storage tank (14) enters the raw material liquid oxygen storage tank (1) for buffering through a twelve-regulating valve (28), a first inlet (57) of a back cooler and a first outlet (60) of the back cooler; the temperature of the kettle liquid of the lean krypton-xenon tower is as follows: -179.5 to-178.5 ℃, and the mole fraction of krypton and xenon is as follows: 1500-3000 ppm;
step three: in the second step, the gas phase of the gas-liquid separator I (11) enters a krypton-removing tower (5), after heat and cold energy are respectively provided by a krypton-removing tower kettle reboiler (8) and a top condenser (10), the gas phase at the top of the krypton-removing tower enters a gas-liquid separator II (12) for gas-liquid separation after being liquefied by the top condenser (10), one part of the liquid phase in the gas-liquid separator II (12) flows back to the krypton-removing tower (5) through a krypton-removing tower circulating liquid inlet (49), and the other part of the liquid phase enters an argon-removing tower (6) through an inlet of the argon-removing tower (6); liquid phase outlet temperature of the gas-liquid separator II (12): the temperature is between 180 ℃ below zero and 181 ℃ below zero, and the liquid oxygen content is between 99.999 and 99.9995 percent;
Step four: in the third step, after the liquid phase entering the argon removing tower (6) is rectified by heat and cold energy provided by an argon removing tower kettle reboiler (9) and a top condenser (10), the argon removing tower kettle liquid enters an ultrapure oxygen storage tank (52) through a fourteenth regulating valve (47), a fourth inlet (51) of a recooler and a fourth outlet (50) of the recooler, and the temperature of the ultrapure oxygen liquid at the fourth outlet (50) of the recooler is as follows: -181 to-182 ℃ and the liquid oxygen content is 99.99993 to 99.99995 percent;
step five: in the third step, the bottom liquid of the krypton-removing tower (5) after rectification enters the raw material liquid oxygen storage tank (1) through a liquid phase outlet at the bottom of the krypton-removing tower (5), an eleventh regulating valve (27), a second inlet (45) of a recooler, a second outlet (61) of the recooler and a third inlet (64) of the raw material liquid oxygen storage tank; the temperature of the krypton-removing tower bottom liquid at the liquid phase outlet of the krypton-removing tower (5) is as follows: -178 to-179 ℃, and the krypton content is 10-100 ppm; liquid phase temperature of the cryocooler second outlet (61): -180 to-181 ℃;
step six: in the rectification process of the krypton-removing tower (5), a liquid phase at the upper part of the krypton-removing tower (5) enters a first regular packing layer (67) through a first groove-type liquid collecting and distributing device (69), the liquid phase enters the bottom of the krypton-removing tower (5) through a second groove-type liquid collecting and distributing device (71) and a second regular packing layer (68) under the action of gravity, and in the process, a first temperature sensor (70) detects the temperature of the liquid phase at the upper part of the first groove-type liquid collecting and distributing device (69), and a second temperature sensor (72) detects the temperature of the liquid phase passing through the second regular packing layer (68); when the average temperature of the first temperature sensor (70) and the second temperature sensor (72) is between 160 ℃ below zero and 165 ℃ below zero, opening a fifteenth regulating valve (44), and discharging the middle liquid phase of the krypton-removing tower (5) into the atmosphere through a methane liquid external pumping emptying pipeline (41), a main heat exchanger fifth inlet (43) and a main heat exchanger fifth outlet (42) for emptying; the gas phase temperature of the fifth outlet (42) of the main heat exchanger is: 35-40 ℃, methane content: 97-99 percent;
Step seven: in the fourth step, the gas phase after rectification in the argon removal tower (6) enters a gas-liquid separator II (12) through a top gas phase outlet, a top condenser third inlet (37), a top condenser third outlet (35) and a gas-liquid separator II first inlet of the argon removal tower (6); the liquid phase after gas-liquid separation in the gas-liquid separator II (12) is repeatedly subjected to the step III, and the gas phase after gas-liquid separation is discharged to the atmosphere through a gas phase outlet of the gas-liquid separator II (12), a fourth regulating valve (20), a first inlet (66) of the main heat exchanger and a first outlet (55) of the main heat exchanger for emptying;
step eight: circulating gas in the heat pump (30) respectively enters a lean krypton-xenon tower kettle reboiler (7), a krypton-removing tower kettle reboiler (8) and an argon-removing tower kettle reboiler (9) through a third inlet (58) of the main heat exchanger and a third outlet (53) of the main heat exchanger;
step nine: in the eighth step, gas nitrogen enters a reboiler (7) of the low krypton-xenon column kettle through a seventh regulating valve (23), the liquid nitrogen after heat exchange is sent to a top condenser (10) to provide cold energy, and the flow entering the reboiler of the low krypton-xenon column kettle is 6000-7000 Nm 3 And/h, the temperature is as follows: -170 to-172 ℃; the temperature of the water entering the top condenser (10) is minus 175 ℃ to minus 178 ℃;
Step ten: the nitrogen in the eighth step enters a krypton-removing tower kettle reboiler (8) through an eighth regulating valve (24), the heat-exchanged liquid nitrogen is sent to a top condenser (10) to provide cold energy, the temperature of the nitrogen entering the top condenser (10) is minus 176 ℃ to minus 178 ℃, and the flow of the nitrogen entering the krypton-removing tower kettle reboiler (8) is as follows: 3500Nm 3 /h；
Step eleven: the gas nitrogen in the eighth step enters an argon removal tower kettle reboiler (9) through a ninth regulating valve (25), the heat of the liquid nitrogen subjected to heat exchange is sent to a top condenser (10) to provide cold energy, and the temperature of the gas nitrogen entering the top condenser (10) is-177 to-179 ℃, and the flow of the gas nitrogen entering the argon removal tower kettle reboiler (9) is as follows: 2200-3000 Nm 3 /h；
Step twelve: step nine, step ten and step eleven, the liquid nitrogen entering the top condenser (10) exchanges heat and becomes gas phase, and then enters the heat pump (30) through the shell side outlet of the top condenser (10), the fourth inlet (56) of the main heat exchanger and the fourth outlet (46) of the main heat exchanger; the gas phase temperature at the outlet of the fourth outlet (46) of the main heat exchanger is: at 35-40 deg.C, flow rate is 11000-12000 Nm 3 /h；
Step thirteen: when the cooling capacity is required to be supplemented in the shell side of the top condenser (10), liquid nitrogen in the liquid nitrogen storage tank (16) is supplemented into the shell side of the top condenser (10) through a first liquid phase outlet of the liquid nitrogen storage tank (16), a fifth regulating valve (21) and a shell side first inlet (32) of the top condenser (10); the shell side liquid nitrogen temperature fed into the top condenser (10) is as follows: -181 to-182 ℃;
Step fourteen: when the adsorption tower (3) needs to be regenerated, liquid nitrogen in the liquid nitrogen storage tank (16) enters the adsorption tower (3) for regeneration through a second liquid phase outlet of the liquid nitrogen storage tank (16), a third inlet (59) of a back cooler, a third outlet (62) of the back cooler, a thirteenth regulating valve (29), a second inlet (65) of the main heat exchanger and a second outlet (54) of the main heat exchanger, and regenerated nitrogen is sent into a nitrogen pipe network (40) through a regenerated gas outlet of the adsorption tower (3).
2. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 1, wherein: the device comprises a raw material liquid oxygen pipeline, a lean krypton-xenon storage tank (14) and an ultrapure oxygen storage tank (52), wherein the raw material liquid oxygen pipeline is connected with a raw material liquid oxygen storage tank first inlet (48) of the raw material liquid oxygen storage tank (1), an outlet of the raw material liquid oxygen storage tank (1) is connected with an inlet of a lean krypton-xenon tower (4) through an adsorption tower (3), a liquid phase outlet at the bottom of the lean krypton-xenon tower (4) is connected with the lean krypton-xenon storage tank (14), a gas phase outlet at the top of the lean krypton-xenon tower (4) is connected with a gas phase outlet of a gas-liquid separator II (12) through a top condenser first inlet (33) and a top condenser first outlet (39) of a top condenser (10), a gas phase outlet of the gas-liquid separator I (11) is connected with an inlet of a krypton-liquid separator I (5), a top gas phase outlet of the krypton-liquid separator I (11) is connected with a gas phase outlet of the krypton-liquid separator II (12) through a top condenser second inlet (36) and a top condenser second outlet (34) of the top condenser, and a gas phase outlet of the krypton-liquid separator II (12) is connected with a gas phase outlet of the krypton-liquid separator I (6) respectively; the liquid phase outlet at the bottom of the argon removal tower (6) is connected with an ultrapure oxygen storage tank (52);
The middle part of the krypton-removing tower (5) is provided with a methane liquid external pumping and exhausting pipeline (41).
3. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 2, wherein: the upper portion is equipped with first regular packing layer (67) in the corresponding krypton-removing tower (5) of import of krypton-removing tower (5), the corresponding krypton-removing tower (5) of import of krypton-removing tower (5) in upper portion be equipped with second regular packing layer (68), the upper portion on first regular packing layer (67) is equipped with first groove type liquid collection distributor (69), the top of first groove type liquid collection distributor (69) is equipped with first temperature sensor (70), the upper portion on second regular packing layer (68) is equipped with second groove type liquid collection distributor (71), the bottom on second regular packing layer (68) is equipped with second temperature sensor (72), be equipped with methane liquid outward pumping pipeline (41) on the corresponding krypton-removing tower (5) between second regular packing layer (68) and first regular packing layer (67).
4. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 2, wherein: the top of the lean krypton-xenon storage tank (14) is provided with a vaporization gas outlet, and the vaporization gas outlet is connected with a second inlet (63) of the feed liquid oxygen storage tank through a twelfth regulating valve (28) and a first inlet (57) and a first outlet (60) of a recooler (15) of the recooler;
The liquid phase outlet at the bottom of the krypton-removing tower (5) is connected with the third inlet (64) of the raw material liquid oxygen storage tank through an eleventh regulating valve (27), a second inlet (45) of the recooler and a second outlet (61) of the recooler;
the liquid phase outlet at the bottom of the argon removal tower (6) is connected with an ultrapure oxygen storage tank (52) through a fourteenth regulating valve (47), a fourth inlet (51) of the aftercooler and a fourth outlet (50) of the aftercooler.
5. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 2, wherein: a liquid oxygen pump (2) is arranged between the outlet of the raw material liquid oxygen storage tank (1) and the adsorption tower (3), a first regulating valve (17) is arranged between the adsorption tower (3) and the inlet of the poor krypton-xenon tower (4), a second regulating valve (18) is arranged between the gas phase outlet of the gas-liquid separator I (11) and the inlet of the krypton-removing tower (5), a third regulating valve (19) is arranged between the liquid phase outlet of the gas-liquid separator II (12) and the inlet of the argon-removing tower (6), and a sixteenth regulating valve (31) is arranged between the liquid phase outlet of the gas-liquid separator II (12) and the circulating liquid inlet (49) of the krypton-removing tower;
the methane liquid external pumping and exhausting pipeline (41) is communicated with the atmosphere through a fifteenth regulating valve (44) and a fifth inlet (43) and a fifth outlet (42) of a main heat exchanger of the main heat exchanger (13);
The gas phase outlet of the gas-liquid separator II (12) is communicated with the atmosphere through a fourth regulating valve (20), a first inlet (66) of the main heat exchanger and a first outlet (55) of the main heat exchanger;
the liquid phase outlet of the gas-liquid separator I (11) is connected with the reflux port of the krypton-xenon-lean tower at the upper part of the krypton-xenon-lean tower (4).
6. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 2, wherein: the top gas phase outlet of the argon removing tower (6) is connected with the first inlet of the gas-liquid separator II (12) through the third inlet (37) of the top condenser and the third outlet (35) of the top condenser.
7. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 4, wherein: a tenth regulating valve (26) is arranged between the liquid phase outlet at the bottom of the poor krypton-xenon tower (4) and the poor krypton-xenon storage tank (14).
8. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 2, wherein: the device further comprises a liquid nitrogen storage tank (16), wherein a first liquid phase outlet of the liquid nitrogen storage tank (16) is connected with a shell side first inlet (32) of the top condenser (10) through a fifth regulating valve (21), and a shell side outlet of the top condenser (10) is connected with an inlet of the heat pump (30) through a sixth regulating valve (22), a main heat exchanger fourth inlet (56) and a main heat exchanger fourth outlet (46);
The outlet of the heat pump (30) is respectively connected with the inlets of a lean krypton-xenon tower kettle reboiler (7) at the bottom of the lean krypton-xenon tower (4), a krypton-removing tower kettle reboiler (8) at the bottom of the krypton-removing tower (5) and an argon-removing tower kettle reboiler (9) at the bottom of the argon-removing tower (6) through a third inlet (58) of the main heat exchanger and a third outlet (53) of the main heat exchanger, and the outlets of the lean krypton-xenon tower kettle reboiler (7), the krypton-removing tower kettle reboiler (8) and the argon-removing tower kettle reboiler (9) are respectively connected with a shell side second inlet (38) of the top condenser (10).
9. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 8, wherein: the second liquid phase outlet of the liquid nitrogen storage tank (16) is connected with the regeneration gas inlet of the adsorption tower (3) sequentially through a third inlet (59) of the back cooler, a third outlet (62) of the back cooler, a thirteenth regulating valve (29), a second inlet (65) of the main heat exchanger and a second outlet (54) of the main heat exchanger, and the regeneration gas outlet of the adsorption tower (3) is connected with a nitrogen pipe network (40).
10. The process for producing an apparatus for producing krypton-xenon-depleted and ultrapure oxygen using the same heat pump according to claim 8, wherein: a seventh regulating valve (23) is arranged between the third outlet (53) of the main heat exchanger and the lean krypton-xenon tower kettle reboiler (7), an eighth regulating valve (24) is arranged between the third outlet (53) of the main heat exchanger and the krypton-removing tower kettle reboiler (8), and a ninth regulating valve (25) is arranged between the third outlet (53) of the main heat exchanger and the argon-removing tower kettle reboiler (9).
CN202310168852.0A 2023-02-27 2023-02-27 Device and production process for producing lean krypton-xenon and ultra-pure oxygen by adopting same heat pump Active CN115854653B (en)

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