CN115790442A - Interferometric measurement method based on large-caliber micro-displacement adjusting frame - Google Patents

Interferometric measurement method based on large-caliber micro-displacement adjusting frame Download PDF

Info

Publication number
CN115790442A
CN115790442A CN202211423301.6A CN202211423301A CN115790442A CN 115790442 A CN115790442 A CN 115790442A CN 202211423301 A CN202211423301 A CN 202211423301A CN 115790442 A CN115790442 A CN 115790442A
Authority
CN
China
Prior art keywords
micro
displacement
movable plate
caliber
adjusting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202211423301.6A
Other languages
Chinese (zh)
Inventor
朱日宏
刘斯靓
韩志刚
马骏
陈磊
郑东晖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanjing University of Science and Technology
Original Assignee
Nanjing University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanjing University of Science and Technology filed Critical Nanjing University of Science and Technology
Priority to CN202211423301.6A priority Critical patent/CN115790442A/en
Publication of CN115790442A publication Critical patent/CN115790442A/en
Pending legal-status Critical Current

Links

Images

Abstract

The invention discloses an interference measurement method based on a large-caliber micro-displacement adjusting frame, which adopts the large-caliber micro-displacement adjusting frame suitable for clamping optical elements with the weight of more than 50kg and the caliber of more than 600mm for the first time, wherein the large-caliber micro-displacement adjusting frame comprises a base, a mirror frame, a dead axle, a first micro-displacement assembly, a movable plate, a pitching adjusting transmission assembly, a yawing adjusting transmission assembly, a first hand wheel and a second hand wheel. The mirror holder and the movable plate are tightly attached to move together, the micro-displacement assembly drives the large-caliber optical element to generate nanoscale stepping, high-precision mechanical phase shifting is achieved, the base is in transmission with the movable plate through the fixed shaft and the two sets of transmission assemblies, the fixed shaft ensures that the relative positions of the base and the movable plate are unchanged, the transmission assemblies can adjust pitching and yawing of the movable plate relative to the base, and the device achieves the functions of two-dimensional yaw adjustment and high-precision mechanical phase shifting during interference measurement of the large-caliber optical element.

Description

Interferometric measurement method based on large-caliber micro-displacement adjusting frame
Technical Field
The invention relates to the technical field of optical detection, in particular to an interferometric method based on a large-caliber micro-displacement adjusting frame.
Background
In recent years, the demand for large-aperture optical elements and optical systems in the national key development fields of very large-scale integrated circuit manufacturing, new energy, aerospace, astronomical optics and the like is increasing, and a series of problems to be solved are brought to the precision optical testing technology. In order to ensure the imaging quality of the optical system, the surface shape of the optical system needs to be checked, so as to confirm whether the manufacturing precision of the system meets the requirement of design indexes. Therefore, it is very necessary to research the detection method of the flat crystal surface shape with high precision and large caliber. Phase Shifting Interferometry (PSI) is one of the commonly used methods. In 1974, bruning et al first proposed the concept of phase-shifting interference. Since the 20 th century and the 70 th century, with the development of the photoelectric technology, the phase-shifting interference technology with the characteristics of high precision, high resolution and the like gradually becomes a standard wavefront measurement technology, and as a non-contact high-precision measurement technology taking wavelength as a unit, the phase-shifting interference technology is widely applied in the optical field, especially in the aspects of optical system imaging evaluation and surface shape detection. Common phase-shifting interference schemes mostly use time phase shifting, such as piezoelectric crystal phase shifting, wavelength tuning phase shifting, and the like. The standard flat crystal and a piezoelectric crystal/ceramic phase shifter (PZT) are fixedly connected in a piezoelectric crystal phase shifting mode, and the piezoelectric crystal is excited by a driving circuit to drive the standard flat crystal to generate optical path change of a fraction of wavelength magnitude, so that a changed interference pattern is generated. The flat crystal aperture used by the large-aperture interferometer is generally larger than 600mm, the weight is close to 100kg, and the heavy load of the adjusting frame causes overlarge phase shift error and even no phase shift can be driven at all. A publication article of 'correction and calibration of an interferometer phase shifter consisting of three piezoelectric ceramic stacks' of Zhuyu in 2001 and the like solves the problems of stripe rotation and interval change caused by uneven bearing of the three piezoelectric ceramic stacks in a horizontal interferometer in practical application. However, when the method is adopted for the overweight large-caliber flat crystal, the front plate of the piezoelectric crystal shell is bent and deformed or even broken due to radial stress when the two-dimensional deflection is adjusted, so that the two-dimensional deflection adjustment cannot be normally carried out by using the piezoelectric crystal to shift the phase under the heavy load condition. Zhaowei et al patent' a large-caliber workbench phase-shifting interference transmissionA low-friction heavy-load workbench with friction resistance close to zero even under heavy load is provided in a wavefront measuring device (CN 212059303U), a large-caliber and heavy-weight optical element is fixed on the low-friction heavy-load workbench, the workbench is driven by piezoelectric ceramics to move along a linear guide rail, and further drives a transmission flat crystal to complete phase shifting, and the device has the advantages of large bearing capacity and high movement precision, and is suitable for large-caliber phase shifting interferometry. In order to solve the problem that mechanical phase shifting is inconvenient to use for large-aperture optical elements, the conventional large-aperture interferometer mostly adopts a wavelength tuning phase shifting scheme, and the phase shifting is realized by changing the wavelength of a laser instead of pushing hardware, so that a series of problems caused by heavy load are effectively avoided. The 4-inch wavelength tuning phase-shifting interferometer was introduced by ZYGO in the United states in 1999, and the test aperture was expanded to 12 inches, 18 inches, 24 inches, 32 inches, 36 inches by a beam expanding system, and the ZYGO 24' interferometer used λ 1 The cavity precision can reach 0.092 lambda by using a tunable laser with the wavelength of 632.8nm as a light source 1 (58 nm). 2011, nanjing university of Rich and technology developed a 600 mm-caliber infrared horizontal Fizeau interferometer with tunable and near-phase wavelength and lambda as light source 2 =1055nm tunable laser, at an interference cavity length of 260mm
Figure BDA0003943663500000021
Is 0.061 lambda 2 (64.4 nm). However, the phase shift amount of the wavelength tuning phase shift mode is not only related to the wavelength tuning amount, but also related to the interference cavity length. The wavelength tuning with high resolution is needed under the condition of a long interference cavity, the wavelength tuning with a large range is needed under the condition of a short interference cavity, and the existing wavelength tuning laser can not meet the requirements of high resolution and large tuning range. In addition, the change in wavelength introduces chromatic aberration, which introduces a difficult to ignore error into the high precision transmitted wavefront measurement. While the repeatability and accuracy of the system is related to the characteristics of the tunable semiconductor laser, such as wavelength modulation drift error due to temperature effects. Therefore, the application range of wavelength tuning and phase shifting is limited, and the precision needs to be improved. And the need to use expensive wavelength-tuned lasers is imported, which is a serious dependence on foreign imported equipment and increases the cost of the interferometer system.
Disclosure of Invention
The invention aims to provide an interference measurement method based on a large-caliber micro-displacement adjusting frame, which adopts the large-caliber micro-displacement adjusting frame suitable for clamping optical elements with the weight of more than 50kg and more than 600mm caliber for the first time. The invention clamps the standard plane mirror on the large-caliber micro-displacement adjusting frame, even under heavy load, because three linear bearings are added in the micro-displacement assembly, the rigidity of the supporting structure is enhanced, the piezoelectric crystal can only move axially but not bend under the action of radial shearing force, and in addition, the self-aligning ball bearing is added, angular deviation movement between the axis of the inner and outer two raceways is met, the radial shearing force generated by two-dimensional deflection is offset by the deflection of the inner and outer raceways of the self-aligning ball bearing, the deformation of the supporting structure caused by the radial shearing force is compensated, the problem that the high-precision mechanical phase shifting is difficult to realize in the existing large-caliber interferometer is effectively solved, and a new thought is developed for the large-caliber optical element and system wave aberration measurement with high precision, low cost and domestic production.
The technical solution for realizing the purpose of the invention is as follows:
the invention relates to an interferometric method based on a large-caliber micro-displacement adjusting bracket, which comprises the following steps:
step 1, building a large-caliber micro-displacement adjusting frame.
And 2, clamping the standard plane mirror on a mirror frame of a large-caliber micro-displacement adjusting frame, and sequentially arranging an interferometer, a beam expanding system, the standard plane mirror and a measured mirror on a common optical axis to form an interference measurement optical path.
And 3, opening the interferometer, enabling the collimated light beam with the small caliber of 100mm to be emitted from the interferometer, and forming the collimated light beam with the large caliber of more than 600mm through the beam expanding system.
Step 4, adjusting the posture of the standard plane mirror by using a hand wheel of the large-caliber micro-displacement adjusting frame;
and 5, adjusting the postures of the standard plane mirror and the measured mirror until three or four clear interference fringes are observed in the computer.
And 6, calibrating the phase shift amount, and under the control of a voltage signal, generating nanoscale stepping by a piezoelectric crystal in the micro-displacement component to realize high-precision mechanical phase shift.
And 7, collecting a plurality of phase-shift interferograms by a computer, and calculating the surface shape information of the measured mirror through analysis processing software.
Compared with the prior art, its obvious advantage lies in:
(1) The large-caliber micro-displacement adjusting frame is suitable for clamping optical elements with the caliber of more than 600mm and the weight of more than 50kg, has strong bearing capacity, can easily realize two-dimensional adjustment and generate high-precision micro-displacement.
(2) The mechanical phase shift is adopted, and the influence of chromatic aberration is avoided compared with a wavelength tuning phase shift method; and the phase shift quantity is irrelevant to the length of the interference cavity, the phase shift quantity does not need to be calibrated in real time, the adjustment precision is high, and an expensive imported wavelength tuning laser does not need to be selected as a light source, so that the system cost is greatly reduced.
Drawings
Fig. 1 is a schematic diagram of the principle of an interferometric method based on a large-caliber micro-displacement adjusting bracket according to the present invention.
Fig. 2 is a schematic three-dimensional structure diagram of a large-caliber micro-displacement adjusting bracket.
Fig. 3 (a) is a schematic three-dimensional structure diagram of the combination of the first micro-displacement assembly, the first self-aligning ball bearing and the fixed shaft.
Fig. 3 (b) is a schematic view of the combination of the first micro-displacement assembly and the first self-aligning ball bearing section and the fixed-axis section.
Fig. 4 (a) is a schematic three-dimensional structure diagram of the first micro-displacement assembly.
Fig. 4 (b) is a front view of the first micro-displacement assembly.
FIG. 4 (c) isbase:Sub>A sectional view taken along the line A-A in FIG. 4 (b).
Fig. 5 (a) is a schematic three-dimensional structure diagram of a pitch adjustment drive assembly.
Fig. 5 (b) is a cross-sectional view of the pitch adjustment drive assembly.
Detailed Description
The invention is further illustrated by the following figures and examples.
Referring to fig. 1, the interferometric method based on the large-caliber micro-displacement adjusting mount according to the present invention includes the following steps:
step 1, building a large-caliber micro-displacement adjusting frame 4;
referring to fig. 2, 3 (a), 3 (b), 4 (a), 4 (b) and 4 (c), the large-diameter fine displacement adjusting bracket 4 according to the present invention includes a base 6, a frame 7, a fixed shaft 8, a first fine displacement assembly 9-1, a movable plate 10, a pitch adjusting transmission assembly 11-1, a yaw adjusting transmission assembly 11-2, a first hand wheel 12-1 and a second hand wheel 12-2. The movable plate 10 is arranged parallel to the front end face of the base 6, the rear end of the fixed shaft 8 is fixedly connected with the base 6, the front end of the fixed shaft 8 is connected with the movable plate 10 through a first micro-displacement assembly 9-1, the rear end of the pitching adjustment transmission assembly 11-1 is fixed in the base 6, and the front end of the pitching adjustment transmission assembly is connected with the movable plate 10; the rear end of the deflection adjusting transmission component 11-2 is fixed in the base 6, and the front end is connected with the movable plate 10; the mirror bracket 7 is fixed on the front end face of the movable plate 10 in parallel through a connecting bracket, and moves along with the movable plate 10. The first hand wheel 12-1 and the second hand wheel 12-2 are arranged on the side surface of the base 6 from top to bottom, the first hand wheel 12-1 is connected with the pitching adjusting transmission component 11-1 through a worm and gear structure, the first hand wheel 12-1 is rotated to drive the pitching adjusting transmission component 11-1 to move so as to realize pitching movement of the movable plate 10, the second hand wheel 12-2 is connected with the deflection adjusting transmission component 11-2 through a worm and gear structure, and the second hand wheel 12-2 is rotated to drive the deflection adjusting transmission component 11-2 to move so as to realize deflection movement of the movable plate 10.
Further, referring to fig. 3, the fixed shaft 8 is connected with the first micro-displacement assembly 9-1 through a first self-aligning ball bearing 13-1.
Referring to fig. 4, the first micro-displacement assembly 9-1 includes a piezoelectric crystal 14, a piezoelectric crystal protection shell 15, a front baffle 16, a first linear bearing 17-1, a second linear bearing 17-2, and a third linear bearing 17-3. The piezoelectric crystal 14 is fixed in a piezoelectric crystal protection shell 15, a front baffle 16 is arranged in front of the piezoelectric crystal protection shell 15 in parallel, a first linear bearing 17-1, a second linear bearing 17-2 and a third linear bearing 17-3 are arranged in parallel and used for connecting the piezoelectric crystal protection shell 15 with the front baffle 16, and a rigid structure formed by the first linear bearing 17-1, the second linear bearing 17-2 and the third linear bearing 17-3 enables the piezoelectric crystal 14 to only do axial motion and not bend and bear radial shearing force, when the piezoelectric crystal 14 is excited by voltage to extend, the first micro-displacement component 9-1 and the movable plate 10 are driven to drive the standard plane mirror 3 to generate nanoscale stepping, so that high-precision mechanical phase shifting is realized.
With reference to fig. 5 (a) and 5 (b), the pitch adjustment transmission assembly 11-1 includes a frame 18, a coupling 19, a stop block 21, a ball screw 22, a second micro-displacement assembly 10-2, a second self-aligning ball bearing 13-2, and two travel switches 20. The frame 18 is used as a supporting piece, a stop block 21 and two travel switches 20 are arranged on the frame, the rear end of a ball screw 22 extends into the frame 18 and is linked with a worm gear structure through a coupler 19, the front end of the ball screw 22 sequentially penetrates through the frame 18 and the base 6 forwards and then is connected with a second micro-displacement assembly 10-2 through a second self-aligning ball bearing 13-2, the second micro-displacement assembly 10-2 is connected with the movable plate 10, and the stop block 21 and the travel switches 20 fixed on the frame 18 respectively play a limiting role in manual and electric adjustment on the ball screw 22.
The second micro-displacement assembly 10-2 is identical in structure to the first micro-displacement assembly 9-1.
The structure of the deflection adjusting transmission assembly 11-2 is the same as that of the pitching adjusting transmission assembly 11-1, and the deflection adjusting transmission assembly is used for realizing the deflection movement of the movable plate 10.
The second self-aligning ball bearing 13-2 is suitable for angular deviation movement between the axis of the inner raceway and the axis of the outer raceway, the second self-aligning ball bearing 13-2 attached to the second micro-displacement assembly 10-2 deflects the outer raceway follower plate 10, when the second self-aligning ball bearing 13-2 is excited by voltage, the piezoelectric crystal 14 can move axially along the movable plate 10, and the ball screw 22 is fixed with the inner raceway of the second self-aligning ball bearing 13-2 and still moves axially along the base 6. After the pitching/yawing angle is adjusted, the radial shearing force generated by the unparallel of the movable plate 10 and the base 6 is transmitted to the second self-aligning ball bearing 13-2 at the rear, and the relative deflection of the inner and outer roller paths of the second self-aligning ball bearing 13-2 counteracts the component force, so that the deformation of the piezoelectric crystal protective shell 15 generated by the radial shearing force is compensated.
The phase-shifting unit of the adjusting frame used in the conventional mechanical phase-shifting interferometry mainly comprises three piezoelectric ceramic stacks, when the caliber of an optical element is more than 600mm and the weight is more than 50kg, the problems of uneven bearing, fringe rotation and interval change can be caused, the interferometric measurement result is influenced, and even the piezoelectric crystal can not be shifted due to damage caused by heavy load. In addition, the self-aligning ball bearing is added behind the micro-displacement assembly, angular deviation movement between the axis of the inner roller path and the axis of the outer roller path is met, the radial shearing force generated during pitching/yawing adjustment is offset by the deflection of the inner roller path and the outer roller path of the self-aligning ball bearing, deformation of the support structure caused by the radial shearing force is compensated, and the functions of two-dimensional adjustment and high-precision mechanical phase shifting are considered.
The stress formula of the protective casing 15 of the piezoelectric transistor in the large-caliber micro-displacement adjusting frame 4 is as follows:
F b =S*k*σ b
F τ =S*k*σ τ
wherein, F b Is an axial tensile force, F, applied to the piezoelectric crystal protective shell 15 τ The radial shear force borne by the piezoelectric crystal protection shell 15, S is the cross-sectional area of the neck at the weakest part of the piezoelectric crystal protection shell 15, and sigma is b Is the tensile strength, σ τ For shear strength, the piezoelectric crystal housing 16 is made of aluminum with a tensile strength σ b =30N/mm 2 Shear strength σ τ =15N/mm 2 K is an influence factor of factors such as impurities in the material, damage of a tool to a workpiece during machining, corrosion of a chemical solution during surface treatment, and the like on the tensile strength of the material in actual production, and is empirically set to 0.1.
The sectional area S of the neck of the piezoelectric crystal protective shell 15 is 50mm 2 Can bear radial shear force F τ The limit of (2) is about 75N, and the radial shearing force generated when the pitch and the yaw are adjusted is measured to be more than 100N and more than a bearable limit, so that the piezoelectric crystal protective shell 15 is seriously damaged. In order to solve the problem, the large-caliber micro-displacement adjusting frame 4 provided by the invention is characterized in that a first linear bearing 17-1, a second linear bearing 17-2 and a third linear bearing 17-3 are horizontally arranged between a piezoelectric crystal protective shell 15 and a front baffle 16 in parallel, so that the rigidity is enhanced. At this timeThe piezoelectric crystal protective shell 15 will only stretch in the axial direction, F b About 150N, which is larger than the actual force.
And the safety factor beta can be expressed as:
Figure BDA0003943663500000061
wherein, F b ' is a tolerable limit, F b The actual force is.
The safety coefficient beta reaches 1.5 after improvement. In addition, a second self-aligning ball bearing 13-2 is added behind the second micro-displacement assembly 10-2, the second self-aligning ball bearing 13-2 is suitable for angular deviation movement between the axis of the inner raceway and the axis of the outer raceway, the second self-aligning ball bearing 13-2 attached to the second micro-displacement assembly 10-2 deflects the outer raceway follow-up plate 10, when the second self-aligning ball bearing is excited by voltage, the piezoelectric crystal 14 can move axially along the movable plate 10, and the ball screw 22 is fixed with the inner raceway of the second self-aligning ball bearing 13-2 and still moves axially along the base 6. After the pitching/yawing is adjusted, the radial shearing force generated due to the unparallel of the movable plate 10 and the base 6 is transmitted to the rear second self-aligning ball bearing 13-2, the inner and outer roller paths of the second self-aligning ball bearing 13-2 relatively deflect to offset the component force, the actual stress of the piezoelectric crystal protective shell 15 is far less than 100N at the moment, the safety coefficient is even higher than 1.5, and the reliability of the large-caliber micro-displacement adjusting frame 4 under the heavy-load condition is met.
And 2, clamping the standard plane mirror 3 on a mirror frame 7 of a large-caliber micro-displacement adjusting frame 4, and sequentially arranging the interferometer 1, the beam expanding system 2, the standard plane mirror 3 and the measured mirror 5 on a common optical axis to form an interference measurement optical path.
And 3, opening the interferometer 1, enabling the 100mm small-caliber collimated light beam to be emitted from the interferometer 1, and forming a large-caliber collimated light beam of more than 600mm through the beam expanding system 2.
And 4, adjusting the posture of the standard plane mirror by using a hand wheel of the large-caliber micro-displacement adjusting frame 4.
And 5, adjusting the postures of the standard plane mirror 3 and the measured mirror 5 until three to four clear interference fringes are observed in the computer.
And 6, calibrating the phase shift amount, and under the control of a voltage signal, generating nanoscale stepping by the piezoelectric crystal 14 in the micro-displacement component to realize high-precision mechanical phase shift.
And 7, collecting a plurality of phase-shifting interferograms by a computer to solve the surface shape information of the measured mirror 5.

Claims (7)

1. An interference measurement method based on a large-caliber micro-displacement adjusting frame is characterized by comprising the following steps:
step 1, constructing a large-caliber micro-displacement adjusting frame (4) which is suitable for clamping optical elements with the weight of more than 50kg and the caliber of more than 600mm;
step 2, clamping a standard plane mirror (3) on a mirror frame (7) of a large-caliber micro-displacement adjusting frame (4), and sequentially arranging an interferometer (1), a beam expanding system (2), the standard plane mirror (3) and a measured mirror (5) on a common optical axis to form an interference measurement light path;
step 3, opening the interferometer (1), emitting collimated light beams with the aperture of 100mm from the interferometer (1), and forming large-aperture collimated light beams with the aperture of more than 600mm through the beam expanding system (2);
step 4, adjusting the posture of the standard plane mirror by using a hand wheel of the large-caliber micro-displacement adjusting frame (4);
step 5, adjusting the postures of the standard plane mirror (3) and the measured mirror (5) until three to four clear interference fringes are observed in the computer;
step 6, calibrating the phase shift amount, and under the control of a voltage signal, generating nanoscale stepping by a piezoelectric crystal (14) in the micro-displacement component to realize high-precision mechanical phase shift;
and 7, collecting a plurality of phase-shift interferograms by a computer to solve the surface shape information of the measured mirror (5).
2. The interferometry method based on the large-caliber micro-displacement adjusting bracket according to claim 1, wherein in step 1, the large-caliber micro-displacement adjusting bracket (4) comprises a base (6), a lens bracket (7), a fixed shaft (8), a first micro-displacement assembly (9-1), a movable plate (10), a pitching adjustment transmission assembly (11-1) and a yawing adjustment transmission assembly (11-2); the movable plate (10) is arranged in parallel to the front end face of the base (6), the rear end of the fixed shaft (8) is fixedly connected with the base (6), the front end of the fixed shaft (8) is connected with the movable plate (10) through a first micro-displacement assembly (9-1), the rear end of the pitching adjustment transmission assembly (11-1) is fixed in the base (6), and the front end of the pitching adjustment transmission assembly is connected with the movable plate (10); the rear end of the deflection adjusting transmission component (11-2) is fixed in the base (6), and the front end is connected with the movable plate (10); the mirror bracket (7) is fixed on the front end surface of the movable plate (10) in parallel through a connecting bracket, and the movable plate (10) moves along with the mirror bracket; the pitching adjusting transmission assembly (11-1) is used for realizing pitching movement of the movable plate (10), and the deflection adjusting transmission assembly (11-2) is used for realizing deflection movement of the movable plate (10).
3. The interferometry method based on the large-caliber micro-displacement adjusting bracket according to claim 2, further comprising a first hand wheel (12-1) and a second hand wheel (12-2) which are arranged on the side surface of the base (6) from top to bottom, wherein the first hand wheel (12-1) is connected with the pitching adjusting transmission assembly (11-1) through a worm and gear structure, the first hand wheel (12-1) is rotated to drive the pitching adjusting transmission assembly (11-1) to move so as to realize pitching movement of the movable plate (10), the second hand wheel (12-2) is connected with the yawing adjusting transmission assembly (11-2) through a worm and gear structure, and the second hand wheel (12-2) is rotated to drive the yawing adjusting transmission assembly (11-2) to move so as to realize yawing movement of the movable plate (10).
4. The interferometry method based on the large-caliber micro-displacement adjusting bracket according to claim 3, wherein the pitch adjusting transmission assembly (11-1) comprises a frame (18), a coupler (19), a stop block (21), a ball screw (22), a second micro-displacement assembly (9-2), a second self-aligning ball bearing (13-2) and two travel switches (20); the frame (18) is used as a supporting piece and is provided with a stop block (21) and two travel switches (20), the rear end of a ball screw (22) extends into the frame (18) and is linked with a worm gear structure through a coupler (19), the front end of the ball screw (22) forwards sequentially penetrates through the frame (18) and a base (6) and then is connected with a second micro-displacement assembly (9-2) through a second self-aligning ball bearing (13-2), the second micro-displacement assembly (9-2) is connected with a movable plate (10), and the stop block (21) and the travel switches (20) fixed on the frame (18) respectively play a role in limiting the ball screw (22) during manual and electric adjustment;
the second self-aligning ball bearing (13-2) is suitable for angular deviation movement between an inner raceway axis and an outer raceway axis, an outer raceway follow-up plate (10) of the second self-aligning ball bearing (13-2) attached to the second micro-displacement assembly (9-2) deflects, when the second self-aligning ball bearing is excited by voltage, the piezoelectric crystal (14) can move axially along the movable plate (10), and the ball screw (22) is fixed with the inner raceway of the second self-aligning ball bearing (13-2) and still moves axially along the base (6); after the pitching angle is adjusted, the radial shearing force generated by the unparallel of the movable plate (10) and the base (6) is transmitted to the rear second self-aligning ball bearing (13-2), and the relative deflection of the inner and outer roller paths of the second self-aligning ball bearing (13-2) counteracts the component force, so that the deformation of the piezoelectric crystal protective shell (15) generated by the radial shearing force is compensated.
5. The interferometry method based on the large-caliber micro-displacement adjusting frame according to claim 2, wherein the structure of the yaw adjusting transmission assembly (11-2) is the same as that of the pitch adjusting transmission assembly (11-1).
6. The interferometry method based on the large-caliber micro-displacement adjusting frame according to claim 2, wherein the second micro-displacement assembly (9-2) has the same structure as the first micro-displacement assembly (9-1).
7. The interferometry method based on the large-caliber micro-displacement adjusting bracket according to claim 2 or 6, wherein the first micro-displacement assembly (9-1) comprises a piezoelectric crystal (14), a piezoelectric crystal protective shell (15), a front baffle (16), a first linear bearing (17-1), a second linear bearing (17-2) and a third linear bearing (17-3); the piezoelectric crystal (14) is fixed in a piezoelectric crystal protection shell (15), a front baffle (16) is arranged in front of the piezoelectric crystal protection shell (15) in parallel, a first linear bearing (17-1), a second linear bearing (17-2) and a third linear bearing (17-3) are arranged in parallel and used for connecting the piezoelectric crystal protection shell (15) with the front baffle (16), a rigid structure formed by the first linear bearing (17-1), the second linear bearing (17-2) and the third linear bearing (17-3) enables the piezoelectric crystal (14) to only do axial motion and not bend to receive radial shearing force, when the piezoelectric crystal (14) is excited by voltage to extend, a first micro-displacement assembly (9-1) and a movable plate (10) are driven to drive a standard plane mirror (3) to generate nanoscale stepping, and therefore high-precision mechanical phase shifting is achieved.
CN202211423301.6A 2022-11-15 2022-11-15 Interferometric measurement method based on large-caliber micro-displacement adjusting frame Pending CN115790442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211423301.6A CN115790442A (en) 2022-11-15 2022-11-15 Interferometric measurement method based on large-caliber micro-displacement adjusting frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211423301.6A CN115790442A (en) 2022-11-15 2022-11-15 Interferometric measurement method based on large-caliber micro-displacement adjusting frame

Publications (1)

Publication Number Publication Date
CN115790442A true CN115790442A (en) 2023-03-14

Family

ID=85437543

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211423301.6A Pending CN115790442A (en) 2022-11-15 2022-11-15 Interferometric measurement method based on large-caliber micro-displacement adjusting frame

Country Status (1)

Country Link
CN (1) CN115790442A (en)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102278940A (en) * 2011-04-27 2011-12-14 南京理工大学 Pre-reference flat crystal interferometer applied to sub-aperture stitching
CN105241393A (en) * 2015-09-24 2016-01-13 南京理工大学 High-precision portable optical surface three-dimensional morphology online detector
CN105241391A (en) * 2015-09-21 2016-01-13 长春设备工艺研究所 Device for interference detection device of surface precision of large-diameter concave aspheric lens
WO2017101557A1 (en) * 2015-12-14 2017-06-22 中国科学院长春光学精密机械与物理研究所 Surface shape detection device and method
CN107036554A (en) * 2017-05-25 2017-08-11 中国科学院上海光学精密机械研究所 The absolute surface shape detection apparatus of planar optical elements
CN208366288U (en) * 2018-07-19 2019-01-11 中国计量科学研究院 A kind of reference planes mirror Error separating device for heavy caliber phase-shift type interferometer
CN110702032A (en) * 2019-11-20 2020-01-17 中国科学院长春光学精密机械与物理研究所 Alignment system and alignment method for detecting and calibrating telescope primary mirror
CN111442740A (en) * 2020-05-20 2020-07-24 北京理工大学 Large-caliber workbench phase-shifting interference surface shape measuring device and method
CN111442909A (en) * 2020-05-20 2020-07-24 北京理工大学 Phase-shifting interference transmission wavefront measuring device and method for large-caliber workbench
CN212059303U (en) * 2020-05-20 2020-12-01 北京理工大学 Large-caliber workbench phase-shifting interference transmission wavefront measuring device

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102278940A (en) * 2011-04-27 2011-12-14 南京理工大学 Pre-reference flat crystal interferometer applied to sub-aperture stitching
CN105241391A (en) * 2015-09-21 2016-01-13 长春设备工艺研究所 Device for interference detection device of surface precision of large-diameter concave aspheric lens
CN105241393A (en) * 2015-09-24 2016-01-13 南京理工大学 High-precision portable optical surface three-dimensional morphology online detector
WO2017101557A1 (en) * 2015-12-14 2017-06-22 中国科学院长春光学精密机械与物理研究所 Surface shape detection device and method
CN107036554A (en) * 2017-05-25 2017-08-11 中国科学院上海光学精密机械研究所 The absolute surface shape detection apparatus of planar optical elements
CN208366288U (en) * 2018-07-19 2019-01-11 中国计量科学研究院 A kind of reference planes mirror Error separating device for heavy caliber phase-shift type interferometer
CN110702032A (en) * 2019-11-20 2020-01-17 中国科学院长春光学精密机械与物理研究所 Alignment system and alignment method for detecting and calibrating telescope primary mirror
CN111442740A (en) * 2020-05-20 2020-07-24 北京理工大学 Large-caliber workbench phase-shifting interference surface shape measuring device and method
CN111442909A (en) * 2020-05-20 2020-07-24 北京理工大学 Phase-shifting interference transmission wavefront measuring device and method for large-caliber workbench
CN212059303U (en) * 2020-05-20 2020-12-01 北京理工大学 Large-caliber workbench phase-shifting interference transmission wavefront measuring device

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
XINYU MIAO等: "《Optical phase-shifting methods based on low coherence laser for large aperture Fizeau interferometer》", 《OPTICS AND LASERS IN ENGINEERING》 *
ZHAODONG LIU等: "《Deformation analysis of lateral support of 600mm aperture interferometer mirrors》", 《APPLIED MECHANICS AND MATERIALS》 *
孟诗,等: "《光学面形绝对测量方法仿真和实验研究》", 《激光与光电子学进展》 *
孟诗,等: "《大口径光学元件瞬态波前检测》", 《光电工程》 *

Similar Documents

Publication Publication Date Title
Clark et al. Laser-based sensing, measurement, and misalignment control of coupled linear and angular motion for ultrahigh precision movement
CN103776388B (en) Aspheric surface non-zero digit interferes part in detection to compensate lens alignment method
CN108873320A (en) A kind of two-dimensional rapid control reflector
CN100535607C (en) Laser phase grating interference displacement sensor
CN115790442A (en) Interferometric measurement method based on large-caliber micro-displacement adjusting frame
US3692413A (en) Systems for accurately positioning an object in a plane by means of translatory movements
CN110133820A (en) The nanoscale precise displacement actuator of large-scale segmented mirror optical telescope
US9025165B2 (en) Normal vector tracing ultra-precision shape measurement method
Schmidt et al. Investigations and calculations into decreasing the uncertainty of a nanopositioning and nanomeasuring machine (NPM-Machine)
Yu et al. Flexible support structure based on spring principle for a high precision reflecting mirror
CN106950673B (en) Unbalanced optical fiber Michelson interferometer arm length adjusting device
CN219572970U (en) Interference profile measuring device
CN1740738A (en) Inner three-directional moire interferometer
EP0702205A2 (en) Interferometer
TWI630975B (en) Active error compensation platform
CN115533675A (en) Optical element time-control grinding surface shape measuring system and surface shape measuring method
Yagüe-Fabra et al. Scalability of precision design principles for machines and instruments
CN115218826A (en) Roll angle measuring system based on auto-collimation principle
Gubarev et al. Calibration of a vertical-scan long trace profiler at MSFC
Lin et al. Alignment and assembly process for primary mirror subsystem of a spaceborne telescope
CN207689751U (en) A kind of quick beat speculum of two dimension
Tang et al. High-precision phase shift method for heavy-load reference mirrors based on nano-precision grating sensor monitoring
Jakstas et al. Software based control techniques for precision line scale calibration
Fujita et al. Radiation pressure measurement for small mass and force standard using voltage balance apparatus developed at NMIJ
CN85101015B (en) Compensation device and method for gravity deformation

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB03 Change of inventor or designer information
CB03 Change of inventor or designer information

Inventor after: Han Zhigang

Inventor after: Liu Sijing

Inventor after: Zhu Rihong

Inventor after: Ma Jun

Inventor after: Chen Lei

Inventor after: Zheng Donghui

Inventor before: Zhu Rihong

Inventor before: Liu Sijing

Inventor before: Han Zhigang

Inventor before: Ma Jun

Inventor before: Chen Lei

Inventor before: Zheng Donghui