CN115741509B - Water-based polyurethane polishing material and preparation method thereof - Google Patents
Water-based polyurethane polishing material and preparation method thereof Download PDFInfo
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Abstract
The application discloses a water-based polyurethane polishing material and a preparation method thereof, and belongs to the field of polyurethane. An aqueous polyurethane polishing material, comprising a sponge and a polyurethane polishing layer, wherein the polyurethane polishing layer comprises: polyether polyol, diisocyanate, silicon carbide, a catalyst, N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, ethylene glycol diglycidyl ether modified acrylic ester and water. The preparation method comprises the following steps: stirring and mixing polyether polyol, diisocyanate and a catalyst, heating for reaction, then adding silicon carbide, continuing the reaction, then adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, continuing the reaction, then adding water and ethylene glycol diglycidyl ether modified acrylic ester, continuing the reaction, coating the obtained aqueous polyurethane dispersoid on the surface of a sponge, drying, forming a polyurethane polishing layer, and obtaining the aqueous polyurethane polishing material. The application has the advantage of improving the mechanical property of the polishing material.
Description
Technical Field
The application relates to the field of polyurethane products, in particular to a water-based polyurethane polishing material and a preparation method thereof.
Background
Polyurethane has wide application fields, and is applied to household industry, building industry, daily necessities industry, traffic industry and electronic product industry, and polyurethane products commonly have foamed plastics, fibers, leather resin, adhesives and coatings, and have good stability and chemical resistance.
With the improvement of environmental protection requirements and health requirements, the application prospect of the aqueous polyurethane is wider, and the aqueous polyurethane is a polyurethane system which takes water as a dispersion medium, so that the damage of an organic solvent to the environment and human body is reduced. The aqueous polyurethane is mainly used in the field of paint, for example, as waterproof paint for engineering projects such as bridges, tunnels and the like, as a paint layer on the surfaces of metal products and ceramic products, and can be used as a surface polishing layer of a sponge grinding block.
The sponge grinding block is made of a grinding material with sponge as a matrix, and a grinding layer is arranged on the surface of the sponge and can grind and polish treatment objects such as leather edge paint, furniture, metal products and the like; the polishing layer is generally made of aqueous polyurethane and abrasive sand, and the addition amount of the abrasive sand is higher than that of the filler of a general polyurethane product, so that the polishing layer can meet the polishing requirements, but the mechanical properties of the polishing layer are greatly reduced, and the service life of polishing materials is influenced.
Disclosure of Invention
In order to improve the mechanical properties of polishing materials, the application provides a waterborne polyurethane polishing material and a preparation method thereof.
In a first aspect, the present application provides a polishing material of aqueous polyurethane, which adopts the following technical scheme:
the water-based polyurethane polishing material comprises a sponge and a polyurethane polishing layer arranged on the surface of the sponge, wherein the polyurethane polishing layer comprises the following raw materials in parts by weight:
60-72 parts of polyether polyol;
45-55 parts of diisocyanate;
42-50 parts of silicon carbide;
0.1 to 0.3 part of catalyst;
15-23 parts of N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine;
10-16 parts of ethylene glycol diglycidyl ether modified acrylic ester;
50-70 parts of water.
By adopting the technical scheme, the silicon carbide has high hardness and good wear resistance, and is added into the polyurethane polishing layer as the polishing sand to enable the polyurethane polishing layer to obtain good polishing capability, but the filling amount of the silicon carbide is excessive, for example, the filling amount exceeds 12%, so that the winding of polyurethane chain segments is hindered, the ordered arrangement of the chain segments is damaged, and the mechanical property of polyurethane is reduced.
According to the application, N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine serving as a chain extender is added to a polyurethane prepolymer and high-silicon carbide content system, the ordered chain extension of the polyurethane system is controlled, the interaction between silicon carbide and a polyurethane interface is improved, after the chain extension of N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, under the cooperation of ethylene glycol diglycidyl ether modified acrylic ester, the ethylene glycol diglycidyl ether modified acrylic ester and a polyurethane chain segment are presumed to form a new winding system, and silicon carbide is tightly combined in the system, so that the interlacing and arrangement between the polyurethane chain segments are promoted, and the polyurethane polishing layer still has good mechanical property under the high-silicon carbide content, and the durability of polishing materials is further improved.
Optionally, the preparation raw materials of the ethylene glycol diglycidyl ether modified acrylic ester comprise hydroxyethyl acrylate, maleic anhydride and ethylene glycol diglycidyl ether, wherein the weight ratio of the hydroxyethyl acrylate, the maleic anhydride and the ethylene glycol diglycidyl ether is 10 (8.2-8.6) to 7.5-8.
Through adopting above-mentioned technical scheme, maleic anhydride is as the connection bridge of hydroxyethyl acrylate and ethylene glycol diglycidyl ether, accomplishes the modification of ethylene glycol diglycidyl ether to acrylic acid ester, and ethylene glycol diglycidyl ether modified acrylic acid ester is good to waterborne polyurethane's cohesiveness, promotes polyurethane polishing layer's mechanical properties to reduce the fracture, further improve polishing material's durability.
Optionally, the polishing layer further comprises 3.5-7 parts by weight of KH560.
By adopting the technical scheme, KH560 can carry out partial end capping on the polyurethane prepolymer, further improve the compatibility of silicon carbide and polyurethane system, reduce the cracking of the polyurethane polishing layer and improve the weather resistance of the polyurethane polishing layer.
Optionally, the polyether polyol is selected from one or two of polytetrahydrofuran glycol and polypropylene glycol.
Optionally, the polyether polyol is selected from polytetrahydrofuran glycol and polypropylene glycol, the weight ratio of polytetrahydrofuran glycol to polypropylene glycol is 1 (0.65-0.85), the molecular weight of polytetrahydrofuran glycol is 250-300, and the molecular weight of polypropylene glycol is 600-700.
By adopting the technical scheme, polytetrahydrofuran glycol and polypropylene glycol are used as a polyether polyol combination system, and the molecular weights of the polytetrahydrofuran glycol and the polypropylene glycol are controlled, so that the stability of the polyurethane system is higher, the polyurethane system is not easy to soften at high temperature, and the application environment of the polyurethane polishing layer is wider.
Optionally, the diisocyanate is isophorone diisocyanate.
By adopting the technical scheme, the reactivity of isophorone diisocyanate is high, and the performance of the polyurethane prepolymer is good.
Optionally, the particle size of the silicon carbide is 20-30 μm.
By adopting the technical scheme, the silicon carbide with the particle size range is selected, so that the silicon carbide can keep good hardness, can be well dispersed in a water-based polyurethane system, and has a better comprehensive effect.
Optionally, the catalyst is selected from one or two of stannous octoate and bismuth iso-octoate.
In a second aspect, the preparation method of the aqueous polyurethane polishing material provided by the application adopts the following technical scheme: the preparation method of the aqueous polyurethane polishing material comprises the following steps:
s1, stirring and mixing polyether polyol, diisocyanate and a catalyst, heating to 55-65 ℃, reacting for 0.2-0.4 h, then adding silicon carbide, continuously reacting for 0.5-1 h, then adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, heating to 75-80 ℃ and continuously reacting for 0.5-1 h, then adding water, cooling to 45-55 ℃, then adding glycol diglycidyl ether modified acrylic ester, and continuously reacting for 0.5-1 h to obtain a water-based polyurethane dispersoid;
s2, coating the aqueous polyurethane dispersion on the surface of the sponge, and drying for 1-1.5 h at the temperature of 70-80 ℃ to form a polyurethane polishing layer, thereby obtaining the aqueous polyurethane polishing material.
By adopting the technical scheme, the adding time of the silicon carbide is controlled, and the silicon carbide is added when the polyurethane prepolymer is not completely molded, so that the silicon carbide is fully dispersed in the polyurethane prepolymer system, and further the improvement of the mechanical property of the polyurethane polishing layer is facilitated.
Optionally, the preparation method of the ethylene glycol diglycidyl ether modified acrylic ester comprises the following steps:
and (3) stirring and mixing hydroxyethyl acrylate and maleic anhydride, heating to 75-80 ℃, reacting for 0.8-1.1 h, then heating to 90-95 ℃ and adding ethylene glycol diglycidyl ether, and continuing to react for 1.5-1.8 h to obtain the ethylene glycol diglycidyl ether modified acrylic ester.
By adopting the technical scheme, the hydroxyethyl acrylate, the maleic anhydride and the ethylene glycol diglycidyl ether can fully react, so that the generation of the ethylene glycol diglycidyl ether modified acrylic ester is facilitated, and the obtained ethylene glycol diglycidyl ether modified acrylic ester can be more suitable for a polyurethane system with high silicon carbide.
Optionally, in the step S1, KH560 is added and reacted for 0.2 to 0.4 hours before adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine.
By adopting the technical scheme, after the polyurethane prepolymer is preliminarily molded, KH560 is added for partial end sealing, so that the cracking resistance of the polyurethane polishing layer is improved.
In summary, the application has the following beneficial effects:
1. according to the application, N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine serving as a chain extender is added on a polyurethane prepolymer and silicon carbide system, the ordered chain extension of the polyurethane system is controlled, the interaction between the silicon carbide and a polyurethane interface is improved, after the chain extension of the N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, under the cooperation of ethylene glycol diglycidyl ether modified acrylic ester, the ethylene glycol diglycidyl ether modified acrylic ester and a polyurethane chain segment are presumed to form a new winding system, and the silicon carbide is tightly combined in the system, so that the interlacing and arrangement between the polyurethane chain segments are promoted to be more ordered, and the polyurethane polishing layer still has good mechanical property under the condition of high silicon carbide content, thereby improving the durability of polishing materials.
2. According to the application, KH560 is added to partially end-cap the polyurethane prepolymer, so that the compatibility of silicon carbide and a polyurethane system is further improved, the cracking of the polyurethane polishing layer is reduced, and the weather resistance of the polyurethane polishing layer is improved.
Drawings
Fig. 1 is a plan view of a polishing material according to embodiment 1 of the present application.
Reference numerals illustrate:
1. a polyurethane polishing layer; 2. and (3) a sponge.
Detailed Description
The present application will be described in further detail with reference to examples and comparative examples.
Preparation example
Preparation example 1
Preparation of ethylene glycol diglycidyl ether modified acrylate:
1kg of hydroxyethyl acrylate, 0.82kg of maleic anhydride and 0.75kg of ethylene glycol diglycidyl ether were weighed.
Adding hydroxyethyl acrylate and maleic anhydride into a reaction bottle, stirring and mixing, heating to 75 ℃, stirring at the speed of 180r/min, reacting for 0.8h, heating to 90 ℃, adding ethylene glycol diglycidyl ether, and continuing to react for 1.5h to obtain the ethylene glycol diglycidyl ether modified acrylic ester.
Preparation example 2
Preparation of ethylene glycol diglycidyl ether modified acrylate:
1kg of hydroxyethyl acrylate, 0.86kg of maleic anhydride and 0.8kg of ethylene glycol diglycidyl ether were weighed.
Adding hydroxyethyl acrylate and maleic anhydride into a reaction bottle, stirring and mixing, heating to 80 ℃, stirring at a speed of 180r/min, reacting for 1.1h, then heating to 95 ℃, adding ethylene glycol diglycidyl ether, and continuing to react for 1.8h to obtain the ethylene glycol diglycidyl ether modified acrylic ester.
Preparation example 3
Preparation of ethylene glycol diglycidyl ether modified acrylate:
1kg of hydroxyethyl acrylate and 0.8kg of ethylene glycol diglycidyl ether were weighed.
Adding hydroxyethyl acrylate into a reaction bottle, stirring and mixing, heating to 95 ℃, adding ethylene glycol diglycidyl ether, stirring at a speed of 180r/min, and reacting for 1.8h to obtain the ethylene glycol diglycidyl ether modified acrylic ester.
Examples
Example 1
An aqueous polyurethane polishing material comprises the following raw materials:
6kg of polyether polyol, 4.5kg of diisocyanate, 4.2kg of silicon carbide, 0.01kg of catalyst, 1.5kg of N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, 1kg of glycol diglycidyl ether modified acrylic ester and 5kg of water are weighed.
Wherein the polyether polyol is polytetrahydrofuran glycol, and the molecular weight of the polytetrahydrofuran glycol is 250.
The diisocyanate is isophorone diisocyanate.
The grain diameter of the silicon carbide is 20-30 mu m.
The catalyst is stannous octoate.
Ethylene glycol diglycidyl ether modified acrylate was prepared from preparation example 1.
The preparation method of the aqueous polyurethane polishing material comprises the following steps:
s1, adding polyether polyol, diisocyanate and a catalyst into a reaction kettle, stirring and mixing, heating to 55 ℃ at the stirring rate of 300r/min, reacting for 0.4h, then adding silicon carbide, continuing to react for 0.5h, then adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, heating to 75 ℃ and continuing to react for 0.5h, then adding water, cooling to 45 ℃, then adding glycol diglycidyl ether modified acrylic ester, and continuing to react for 1h to obtain a water-based polyurethane dispersion;
s2, coating the aqueous polyurethane dispersoid on the surface of the sponge 2, and drying in an oven at 80 ℃ for 1h to form a polyurethane polishing layer 1 with the thickness of 0.4mm, thereby obtaining the aqueous polyurethane polishing material.
Example 2
An aqueous polyurethane polishing material comprises the following raw materials:
7.2kg of polyether polyol, 5.5kg of diisocyanate, 5kg of silicon carbide, 0.03kg of catalyst, 2.3kg of N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, 1.6kg of ethylene glycol diglycidyl ether modified acrylic ester and 7kg of water are weighed.
Wherein the polyether polyol is polytetrahydrofuran glycol, and the molecular weight of the polytetrahydrofuran glycol is 250.
The diisocyanate is isophorone diisocyanate.
The grain diameter of the silicon carbide is 20-30 mu m.
The catalyst is stannous octoate.
Ethylene glycol diglycidyl ether modified acrylate was prepared from preparation 2.
The preparation method of the aqueous polyurethane polishing material comprises the following steps:
s1, adding polyether polyol, diisocyanate and a catalyst into a reaction kettle, stirring and mixing, heating to 65 ℃ at the stirring rate of 300r/min, reacting for 0.2h, then adding silicon carbide, continuing to react for 1h, then adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, heating to 80 ℃ and continuing to react for 1h, then adding water, cooling to 55 ℃, then adding glycol diglycidyl ether modified acrylic ester, and continuing to react for 0.5h to obtain a water-based polyurethane dispersion;
s2, coating the aqueous polyurethane dispersoid on the surface of the sponge 2, and drying for 1.5 hours at the temperature of 70 ℃ to form a polyurethane polishing layer 1 with the thickness of 0.4mm, thereby obtaining the aqueous polyurethane polishing material.
Example 3
This example differs from example 1 in that the raw materials of the aqueous polyurethane polishing material are different.
Specifically, 6.5kg of polyether polyol, 4.9kg of diisocyanate, 4.5kg of silicon carbide, 0.03kg of catalyst, 2.1kg of N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, 1.2kg of ethylene glycol diglycidyl ether modified acrylate and 6.2kg of water.
Example 4
This example differs from example 3 in that in the raw materials of the aqueous polyurethane polishing material, ethylene glycol diglycidyl ether modified acrylate was prepared from preparation example 3.
Example 5
The difference between this example and example 3 is that KH560 is also included in the raw materials of the aqueous polyurethane polishing material, and KH560 is added in an amount of 0.35kg.
In addition, in the preparation method of the water-based polyurethane polishing material, in the step S1, KH560 is added and reacted for 0.2h before N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine is added.
Example 6
The difference between this example and example 3 is that KH560 is also included in the raw materials of the aqueous polyurethane polishing material, and KH560 is added in an amount of 0.7kg.
In addition, in the preparation method of the water-based polyurethane polishing material, in the step S1, KH560 is added and reacted for 0.4h before N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine is added.
Example 7
The difference between this example and example 3 is that KH560 is also included in the raw materials of the aqueous polyurethane polishing material, and KH560 is added in an amount of 1.2kg.
In addition, in the preparation method of the water-based polyurethane polishing material, in the step S1, KH560 is added and reacted for 0.4h before N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine is added.
Example 8
This example differs from example 5 in that the polyether polyol is polytetrahydrofuran diol and polypropylene glycol, the polytetrahydrofuran diol is added in an amount of 3.25kg, the molecular weight of polytetrahydrofuran diol is 250, the polypropylene glycol is added in an amount of 3.25kg, and the molecular weight of polypropylene glycol is 700.
Example 9
This example differs from example 5 in that the polyether polyol is polytetrahydrofuran diol and polypropylene glycol, the polytetrahydrofuran diol is added in an amount of 3.95kg, the polytetrahydrofuran diol has a molecular weight of 700, the polypropylene glycol is added in an amount of 2.55kg, and the polypropylene glycol has a molecular weight of 250.
Example 10
This example differs from example 5 in that the polyether polyol is polytetrahydrofuran diol and polypropylene glycol, the polytetrahydrofuran diol is added in an amount of 3.95kg, the molecular weight of polytetrahydrofuran diol is 250, the polypropylene glycol is added in an amount of 2.55kg, and the molecular weight of polypropylene glycol is 700.
Example 11
This example differs from example 5 in that the polyether polyol is polytetrahydrofuran diol and polypropylene glycol, the amount of polytetrahydrofuran diol added is 3.5kg, the molecular weight of polytetrahydrofuran diol is 300, the amount of polypropylene glycol added is 3kg, and the molecular weight of polypropylene glycol is 600.
Example 12
The difference between this example and example 3 is that in the preparation method of the aqueous polyurethane polishing material, in step S1, polyether polyol, diisocyanate and catalyst are added into a reaction kettle, stirred and mixed for 0.8h, and then silicon carbide is added.
Comparative example
Comparative example 1
This comparative example differs from example 3 in that N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine is replaced by an equivalent amount of 1, 6-hexamethylenediamine.
Comparative example 2
This comparative example differs from example 3 in that the ethylene glycol diglycidyl ether modified acrylate was replaced with an equivalent amount of hydroxyethyl acrylate.
Comparative example 3
This comparative example differs from example 3 in that N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine is replaced by an equivalent amount of 1, 6-hexamethylenediamine and the ethylene glycol diglycidyl ether modified acrylate is replaced by an equivalent amount of water.
Performance test
The polyurethane polishing layers prepared in the examples and comparative examples of the present application were subjected to performance test.
Tensile strength test:
the polyurethane polishing layer was cut into test pieces 150mm long and 25mm wide, and tested by a tensile tester, and tensile strength was measured by a tensile test at a rate of 30mm/min, and the test results are shown in Table 1.
Room temperature cracking test:
the polyurethane polished layer was repeatedly folded in half at 180 ° three times at room temperature, and then whether or not the polyurethane polished layer developed cracks was observed, and the number of cracks exceeding 2mm in length was recorded, and the test results are shown in table 1.
Weather-resistant cracking test:
placing the polyurethane polishing layer in a constant temperature and humidity circulation box, regulating the temperature to 70+/-1 ℃ and the humidity to 85+/-3% RH, standing for 12 hours, taking out and wiping off the surface moisture of the polyurethane polishing layer, standing for 30 minutes at room temperature, repeatedly folding the polyurethane polishing layer for three times by 180 DEG, observing whether the polyurethane polishing layer is cracked, recording the number of cracks with the length exceeding 2mm, and testing the result shown in Table 1.
High temperature softening test:
placing 15 polyurethane polishing layers in a constant temperature and humidity circulation box, adjusting the temperature to 80+/-1 ℃ and the humidity to 45+/-3% RH, standing for 12 hours, taking out and immediately superposing the 15 polyurethane polishing layers, and testing the shore hardness of the superposed polyurethane polishing layers by a shore A durometer, wherein the test results are shown in table 1.
TABLE 1
| Tensile Strength (MPa) | Number of cracks at room temperature | Number of weather-resistant cracks | Shore hardness of | |
| Example 1 | 29.0 | 0 | 8 | 59 |
| Example 2 | 28.5 | 0 | 10 | 50 |
| Example 3 | 29.1 | 0 | 10 | 56 |
| Example 4 | 28.3 | 5 | 15 | 48 |
| Example 5 | 30.0 | 0 | 3 | 52 |
| Example 6 | 30.3 | 0 | 4 | 52 |
| Example 7 | 28.0 | 3 | 14 | 46 |
| Example 8 | 29.5 | 0 | 3 | 48 |
| Example 9 | 29.9 | 0 | 3 | 49 |
| Example 10 | 29.7 | 0 | 1 | 65 |
| Example 11 | 30.1 | 0 | 0 | 64 |
| Example 12 | 27.7 | 5 | 9 | 55 |
| Comparative example 1 | 21.8 | 6 | 17 | 52 |
| Comparative example 2 | 20.7 | 2 | 16 | 48 |
| Comparative example 3 | 21.2 | 8 | 16 | 51 |
By combining the test data of Table 1, examples 1-3 all had higher tensile strength, indicating good mechanical properties of the polyurethane polishing layer. Specifically, compared with comparative examples 1-2, the polyurethane polishing layer has good mechanical properties as the polyurethane system with high silicon carbide is added with N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine and ethylene glycol diglycidyl ether modified acrylate in example 3, so that good tensile strength is obtained, and no cracking condition occurs through bending test.
The tensile strength of example 4 was reduced and cracking occurred compared to example 3, demonstrating the good improvement of polyurethane by the ethylene glycol diglycidyl ether modified acrylate prepared by maleic anhydride.
Examples 5-6 have higher tensile strength than example 3 and the polyurethane polishing layer has less number of cracks after being subjected to high temperature and high humidity environment, while example 7 has reduced tensile strength and increased number of cracks, indicating that the mechanical properties of the polyurethane polishing layer can be further improved and the weatherability can be improved by adding 3.5-7 parts by weight of KH560.
The tensile strength of examples 8-11 was not significantly changed compared to example 5, but the hardness of examples 10-11 was increased, indicating that controlling the weight ratio of polytetrahydrofuran glycol to polypropylene glycol and the choice of molecular weight can improve the high temperature softening resistance of the polyurethane polishing layer, and still maintain good hardness at high temperatures.
The lower tensile strength and increased number of cracks of example 12 compared to example 3 indicate that the timing of the addition of silicon carbide to the polyurethane prepolymer has a more pronounced effect on the shaping effect of the polyurethane polishing layer.
The present embodiment is merely illustrative of the present application and not limiting, and one skilled in the art, after having read the present specification, may make modifications to the embodiment without creative contribution as required, but is protected by patent law within the scope of the claims of the present application.
Claims (7)
1. The utility model provides a waterborne polyurethane polishing material which characterized in that: the polishing sponge comprises a sponge (2) and a polyurethane polishing layer (1) arranged on the surface of the sponge (2), wherein the polyurethane polishing layer (1) comprises the following raw materials in parts by weight:
60-72 parts of polyether polyol;
45-55 parts of diisocyanate;
42-50 parts of silicon carbide;
0.1-0.3 parts of a catalyst;
15-23 parts of N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine;
10-16 parts of ethylene glycol diglycidyl ether modified acrylic ester;
50-70 parts of water;
the preparation raw materials of the ethylene glycol diglycidyl ether modified acrylic ester comprise hydroxyethyl acrylate, maleic anhydride and ethylene glycol diglycidyl ether, wherein the weight ratio of the hydroxyethyl acrylate to the maleic anhydride to the ethylene glycol diglycidyl ether is 10 (8.2-8.6) (7.5-8);
the preparation method of the ethylene glycol diglycidyl ether modified acrylic ester comprises the following steps:
stirring and mixing hydroxyethyl acrylate and maleic anhydride, heating to 75-80 ℃ for reaction for 0.8-1.1 h, then heating to 90-95 ℃ and adding ethylene glycol diglycidyl ether, and continuing to react for 1.5-1.8 h to obtain ethylene glycol diglycidyl ether modified acrylic ester;
the polyurethane polishing layer (1) is characterized by further comprising 3.5-7 parts by weight of KH560.
2. An aqueous polyurethane polishing material according to claim 1, wherein: the polyether polyol is selected from one or two of polytetrahydrofuran glycol and polypropylene glycol.
3. An aqueous polyurethane polishing material according to claim 1, wherein: the polyether polyol is selected from polytetrahydrofuran glycol and polypropylene glycol, the weight ratio of the polytetrahydrofuran glycol to the polypropylene glycol is 1 (0.65-0.85), the molecular weight of the polytetrahydrofuran glycol is 250-300, and the molecular weight of the polypropylene glycol is 600-700.
4. An aqueous polyurethane polishing material according to claim 1, wherein: the diisocyanate is isophorone diisocyanate.
5. An aqueous polyurethane polishing material according to claim 1, wherein: the particle size of the silicon carbide is 20-30 mu m.
6. A preparation method of a water-based polyurethane polishing material is characterized by comprising the following steps: an aqueous polyurethane polishing material for use in preparing the aqueous polyurethane polishing material of any one of claims 1 to 5, comprising the steps of:
s1, stirring and mixing polyether polyol, diisocyanate and a catalyst, heating to 55-65 ℃, reacting for 0.2-0.4 h, then adding silicon carbide, continuously reacting for 0.5-1 h, then adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, heating to 75-80 ℃ and continuously reacting for 0.5-1 h, then adding water, cooling to 45-55 ℃, then adding glycol diglycidyl ether modified acrylic ester, and continuously reacting for 0.5-1 h to obtain an aqueous polyurethane dispersion;
s2, coating the aqueous polyurethane dispersion on the surface of the sponge, and drying for 1-1.5 h at the temperature of 70-80 ℃ to form a polyurethane polishing layer, thereby obtaining the aqueous polyurethane polishing material.
7. The method for preparing the aqueous polyurethane polishing material according to claim 6, wherein the method comprises the following steps: in the step S1, KH560 is added before adding N, N, N ', N' -tetramethyl-1, 6-hexamethylenediamine, and the reaction is carried out for 0.2-0.4 h.
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Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998010896A1 (en) * | 1996-09-11 | 1998-03-19 | Minnesota Mining And Manufacturing Company | Abrasive article and method of making |
| CN102123830A (en) * | 2008-07-24 | 2011-07-13 | 3M创新有限公司 | Abrasive material product, its production method and use method |
| CN103013367A (en) * | 2011-09-22 | 2013-04-03 | 日东电工株式会社 | Acrylic pressure-sensitive adhesive composition, acrylic pressure-sensitive adhesive layer, and acrylic pressure-sensitive adhesive tape |
| CN103612216A (en) * | 2013-12-04 | 2014-03-05 | 江苏锋芒复合材料科技集团有限公司 | Manufacturing method for environment-friendly coated abrasive tool product |
| CN104031228A (en) * | 2014-06-17 | 2014-09-10 | 四川国和新材料有限公司 | Benzene-free and ketone-free modified acrylate resin and preparation method thereof |
| CN109048698A (en) * | 2018-06-22 | 2018-12-21 | 阳江市伟艺抛磨材料有限公司 | A kind of polyurethane rubbing down wheel and preparation method thereof |
| CN110003426A (en) * | 2019-03-08 | 2019-07-12 | 合肥宏光研磨科技有限公司 | A kind of polyurethane sponge composite polishing disk |
| CN110465836A (en) * | 2019-08-22 | 2019-11-19 | 海南亿鑫和科技有限公司 | A kind of clear water abrasive polishing process |
| CN111644989A (en) * | 2020-07-01 | 2020-09-11 | 东莞市亚马电子有限公司 | Polishing material for polishing disc and preparation method thereof |
| CN112300355A (en) * | 2020-10-30 | 2021-02-02 | 徐州永泽新材料科技有限公司 | Two-component waterborne polyurethane, application thereof, polyurethane composite polishing pad formed by two-component waterborne polyurethane and preparation method |
| CN115284165A (en) * | 2022-07-12 | 2022-11-04 | 安徽禾臣新材料有限公司 | Porous polyurethane polishing pad and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7097549B2 (en) * | 2001-12-20 | 2006-08-29 | Ppg Industries Ohio, Inc. | Polishing pad |
-
2022
- 2022-12-03 CN CN202211544657.5A patent/CN115741509B/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998010896A1 (en) * | 1996-09-11 | 1998-03-19 | Minnesota Mining And Manufacturing Company | Abrasive article and method of making |
| CN102123830A (en) * | 2008-07-24 | 2011-07-13 | 3M创新有限公司 | Abrasive material product, its production method and use method |
| CN103013367A (en) * | 2011-09-22 | 2013-04-03 | 日东电工株式会社 | Acrylic pressure-sensitive adhesive composition, acrylic pressure-sensitive adhesive layer, and acrylic pressure-sensitive adhesive tape |
| CN103612216A (en) * | 2013-12-04 | 2014-03-05 | 江苏锋芒复合材料科技集团有限公司 | Manufacturing method for environment-friendly coated abrasive tool product |
| CN104031228A (en) * | 2014-06-17 | 2014-09-10 | 四川国和新材料有限公司 | Benzene-free and ketone-free modified acrylate resin and preparation method thereof |
| CN109048698A (en) * | 2018-06-22 | 2018-12-21 | 阳江市伟艺抛磨材料有限公司 | A kind of polyurethane rubbing down wheel and preparation method thereof |
| CN110003426A (en) * | 2019-03-08 | 2019-07-12 | 合肥宏光研磨科技有限公司 | A kind of polyurethane sponge composite polishing disk |
| CN110465836A (en) * | 2019-08-22 | 2019-11-19 | 海南亿鑫和科技有限公司 | A kind of clear water abrasive polishing process |
| CN111644989A (en) * | 2020-07-01 | 2020-09-11 | 东莞市亚马电子有限公司 | Polishing material for polishing disc and preparation method thereof |
| CN112300355A (en) * | 2020-10-30 | 2021-02-02 | 徐州永泽新材料科技有限公司 | Two-component waterborne polyurethane, application thereof, polyurethane composite polishing pad formed by two-component waterborne polyurethane and preparation method |
| CN115284165A (en) * | 2022-07-12 | 2022-11-04 | 安徽禾臣新材料有限公司 | Porous polyurethane polishing pad and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 中国新型建筑材料公司.《新型建筑材料实用手册》.中国建筑工业出版社,1987,(第1版),1182. * |
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