CN115674943A - Transfer film and method for manufacturing same - Google Patents

Transfer film and method for manufacturing same Download PDF

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Publication number
CN115674943A
CN115674943A CN202110860195.7A CN202110860195A CN115674943A CN 115674943 A CN115674943 A CN 115674943A CN 202110860195 A CN202110860195 A CN 202110860195A CN 115674943 A CN115674943 A CN 115674943A
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layer
photonic crystal
thickness
holographic
transfer film
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CN115674943B (en
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游伴奏
俞朝晖
宋玉
游坚强
兰希
董超
韦志方
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Shenzhen Yuto Packaging Technology Co Ltd
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Shenzhen Yuto Packaging Technology Co Ltd
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Abstract

The application relates to a transfer film and a manufacturing method thereof, the transfer film provided by the embodiment of the application comprises a carrier layer, a release layer, a holographic layer, a photonic crystal layer and a light transmission layer which are sequentially arranged from top to bottom, wherein the photonic crystal layer is used for reflecting light with different wavelengths. Through setting up reasonable transfer membrane structure, simplified manufacturing process, the phenomenon that can not appear hazing and skinning moreover when the thermoprint.

Description

Transfer film and method for manufacturing same
Technical Field
The application relates to the technical field of transfer films, in particular to a transfer film and a manufacturing method thereof.
Background
The transfer film is an intermediate carrier, exists on a base material such as a transfer paper base or a plastic base and the like, bears a printed or printed pattern, and is a layer of chemical elastic film used for being transferred to a printed product (such as a packaging material, a decorative material, cosmetics and the like), wherein, the holographic transfer film has the advantages of clear and vivid image, strong two-dimensional and three-dimensional spatial sense, encryption, difficulty in copying and imitation and the like, and is widely applied to the fields of packaging, decoration, anti-counterfeiting and the like, in particular to anti-counterfeiting packaging and decorative materials. The conventional transfer film is gradually replaced by the holographic transfer film in the above-mentioned field.
At present, the holographic transfer film transfers the patterns on the holographic transfer film to the surface of a product through transfer modes such as hot stamping, in-mold injection molding and the like. However, the problems of color development and adhesion caused by high temperature in the conventional transfer methods, such as hot stamping and in-mold injection, have been the focus of research.
The patent with the application number of CN202011581063.2 provides a thermal transfer film and a preparation method thereof, wherein the thermal transfer film comprises the following components in sequence: the holographic transfer film comprises a base film layer, a release mould pressing layer, a holographic layer, a dielectric layer, a color printing layer, an aluminum coating layer and a hot melt adhesive layer, wherein the dielectric layer with uniform thickness and thinness is arranged by a vacuum evaporation method, and the dielectric layer can protect the holographic layer from being filled with ink, can not cover color pictures and texts of the color printing layer at the back, can not damage the patterns of the holographic layer and improves the aesthetic feeling of the holographic transfer film.
Although the scheme can ensure the integrity of the pattern, the manufacturing process is complex, and the ink in the thermal transfer film is easy to fog and peel during hot stamping.
Disclosure of Invention
To above-mentioned technical problem, this application provides a transfer film to set up reasonable transfer film structure and simplify manufacturing process, and can not appear the phenomenon of hazing and skinning when the thermoprint.
In order to solve the above technical problem, the present application provides a transfer film, including:
a carrier layer;
the release layer is stacked on one side surface of the carrier layer;
the holographic layer is arranged on the surface of the release layer, which is far away from the carrier layer;
the photonic crystal layer is arranged on the surface of the holographic layer far away from the release layer and is used for reflecting light with different wavelengths;
and the light transmitting layer is arranged on the surface of the photonic crystal layer far away from the holographic layer.
Optionally, the light-transmitting layer comprises:
the film coating layer is arranged on the surface of the photonic crystal layer away from the holographic layer;
and the bonding layer is arranged on the surface of the coating layer far away from the photonic crystal layer.
Optionally, the photonic crystal layer comprises nanovesicle polymer particles of various sizes.
Optionally, the nanoparticle polymer particles have a particle size of 190nm to 800nm. More specifically, the particle size of the nanomicrosphere polymer particles is 190nm to 350nm or 350nm to 800nm.
Optionally, the material of the nanoparticle polymer particles includes at least one of polyacrylic acid, polyacrylate, polystyrene, polyacrylamide, polyethylene, polypropylene, polylactic acid, or polyacrylonitrile. More specifically, the material of the nano-microsphere polymer particles comprises polystyrene.
Optionally, the photonic crystal layer has a thickness of 3 μm to 10 μm. More specifically, the thickness of the photonic crystal layer is 3 μm to 7 μm or 7 μm to 10 μm.
And/or the thickness of the carrier layer is 12 μm to 50 μm; more particularly, the support layer has a thickness of 12 μm to 17 μm, 17 μm to 30 μm, or 30 μm to 50 μm.
And/or the thickness of the release layer is 100nm-700nm; more specifically, the thickness of the release layer is 100nm-350nm or 350nm-700nm.
And/or the thickness of the holographic layer is 0-1 μm; more specifically, the holographic layer has a thickness of 0.4 μm to 0.7 μm or 0.7 μm to 1.0 μm.
And/or the thickness of the coating layer is
Figure BDA0003185432240000031
The thickness of the coating layer is
Figure BDA0003185432240000032
Or
Figure BDA0003185432240000033
And/or the thickness of the bonding layer is 0.5-2 μm; more specifically, the adhesive layer has a thickness of 0.5 μm to 1 μm or 1 μm to 2 μm.
Optionally, the coating comprises a metal layer.
Optionally, the material of the metal layer includes aluminum, copper, cobalt, titanium, gold, silver, nickel, platinum or an alloy of these metals. More specifically, the material of the metal layer includes aluminum.
Optionally, the adhesive layer is a hot melt adhesive layer.
The present application also provides a manufacturing method of the above transfer film, the manufacturing method including:
A. providing a carrier layer;
B. applying a release layer to one side surface of the carrier layer;
C. applying a holographic layer on the surface of the release layer away from the carrier layer;
D. applying a photonic crystal layer on the surface of the holographic layer far away from the release layer;
E. a light transmitting layer is applied to the surface of the photonic crystal layer remote from the holographic layer.
Optionally, the photonic crystal layer includes nano microsphere polymer particles with various sizes, and the nano polymer particles are prepared by an emulsion polymerization method.
The present application also provides an article comprising the transfer film described above.
The application provides a transfer film, include the carrier layer that sets gradually from the top down, leave type layer, holographic layer, photonic crystal layer and euphotic layer, wherein, photonic crystal layer is used for reflecting out the light of different wavelength. Through setting up reasonable transfer membrane structure, simplified manufacturing process, can not appear the phenomenon of fogging and skinning moreover when the thermoprint.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and together with the description, serve to explain the principles of the application. In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the description of the embodiments will be briefly described below, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
Fig. 1 is a schematic structural diagram of a transfer film provided in an embodiment of the present application;
FIG. 2 is a flow chart of a process for fabricating a holographic layer in a transfer film according to an embodiment of the present disclosure;
FIG. 3 is a schematic diagram illustrating a mechanism of fabricating nano-microsphere polymer particles contained in a photonic crystal layer according to an embodiment of the present disclosure;
fig. 4 is a Scanning Electron Microscope (SEM) image of polystyrene contained in a photonic crystal layer provided in the first embodiment of the present application;
fig. 5 is a Scanning Electron Microscope (SEM) image of polystyrene contained in a photonic crystal layer provided in a second example of the present application;
fig. 6 is a Scanning Electron Microscope (SEM) image of polystyrene contained in a photonic crystal layer provided in a third example of the present application;
fig. 7 (a) and (b) are 3D scanning microscope images of the transfer film provided in the embodiment of the present application after transfer.
Description of reference numerals:
1-a carrier layer;
2-a release layer;
3-a holographic layer;
a 4-photonic crystal layer;
5-a light-transmitting layer;
51-a film coating layer;
52-bonding layer.
The implementation, functional features and advantages of the object of the present application will be further explained with reference to the embodiments, and with reference to the accompanying drawings. With the above figures, there are shown specific embodiments of the present application, which will be described in more detail below. The drawings and written description are not intended to limit the scope of the inventive concepts in any manner, but rather to illustrate the concepts of the application by those skilled in the art with reference to specific embodiments.
Detailed Description
Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising a … …" does not exclude the presence of additional identical elements in a process, method, article, or apparatus that comprises the element, and further, components, features, elements that have the same designation in different embodiments of the application may have the same meaning or different meanings that are determined by their interpretation in the embodiment or by their further context in the embodiment.
It is to be understood that the terms "or" and/or "as used herein are to be interpreted as being inclusive or meaning any one or any combination. Thus, "A, B or C" or "A, B and/or C" means "any of the following: a; b; c; a and B; a and C; b and C; A. b and C ".
Transfer film
An embodiment of the present application provides a transfer film, a structure of which is shown in fig. 1, and the transfer film includes:
a carrier layer 1;
the release layer 2 is arranged on one side surface of the carrier layer 1;
the holographic layer 3 is arranged on the surface of the release layer 2 far away from the carrier layer 1;
the photonic crystal layer 4 is arranged on the surface of the holographic layer 3 far away from the release layer 2, and the photonic crystal layer 4 is used for reflecting light with different wavelengths;
and the light-transmitting layer 5 is arranged on the surface of the photonic crystal layer 4 far away from the holographic layer 3.
In the embodiment provided by the present application, the carrier layer 1 serves as a substrate of the transfer film for supporting a plurality of layered structures stacked thereon, and also can maintain the bending balance of the transfer film. In some embodiments, the material of the carrier layer 1 comprises at least one of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), orthophenylphenol (OPP), biaxially oriented polypropylene (BOPP), or Polyethylene (PE).
In some specific embodiments, the carrier layer 1 is made of PET through a molding process because PET not only has high tensile strength and thermal stability, but also exhibits high dimensional stability and durability with little change in physical properties even after multiple winding.
In some embodiments, the thickness of the carrier layer 1 is 12-50 μm. Further, the thickness of the support layer 1 may be 12 μm to 17 μm, 17 μm to 30 μm, or 30 μm to 50 μm. In some specific embodiments, the thickness of the support layer 1 may be, but is not limited to, 17 μm, 30 μm, or 50 μm. It should be noted here that the above-mentioned carrier layer 1 can also comprise a plurality of sublayers.
In the embodiment provided by the present application, the release layer 2 is disposed on one side surface of the carrier layer 1, and can be peeled off from the carrier layer 1 after being heated. In some embodiments, the release layer 2 is a transparent release layer, which is made of a copolymer and formed on one side surface of the carrier layer 1 through a coating process. Illustratively, the release layer 2 may be made of cellulose butyrate, acrylate, nitrocellulose, ethyl acetate, butyl acetate, or styrene copolymer.
In some specific embodiments, the release layer 2 is made of acrylate because acrylic acid has a higher affinity with the carrier layer 1 under normal temperature conditions, but exhibits a lower affinity after heating, thereby achieving release of the release layer 2 from the carrier layer 1.
In some embodiments, the release layer 2 has a thickness of 100nm to 700nm. Further, the thickness of the release layer 2 may be 100nm to 350nm or 350nm to 700nm. In some embodiments, the thickness of the release layer 2 may be, but is not limited to, 100nm, 350nm, or 700nm.
In the embodiment provided by the application, the holographic layer 3 arranged on the surface of the release layer 2 utilizes the holographic projection technology, so that the three-dimensional image displayed by the transfer film can change along with different positions when the transfer film is observed from different positions. Specifically, the holographic layer 3 is prepared by preparing a film base, coating photoresist, laser photoetching, developing, erecting a film, spraying silver, electroforming nickel plating, molding a master plate and the like.
In some embodiments, the holographic layer 3 has a thickness of no more than 1 μm. Further, the holographic layer 3 may have a thickness of 0.4 μm to 0.7 μm or 0.7 μm to 1.0 μm. In some specific embodiments, the thickness of the holographic layer 3 may be, but is not limited to, 0.4 μm, 0.7 μm, or 1.0 μm.
In the embodiment that this application provided, photonic crystal layer 4 sets up on holographic layer 3's surface, because the strict monodispersion of particle diameter among photonic crystal layer 4, and coefficient of variation is little, and then can reflect out the light of different wavelength to can not make the transfer film appear the phenomenon of hazing and skinning at the thermoprint in-process. In addition, the particles in the photonic crystal layer 4 have stable physicochemical properties, which enable them to function as a protection for the hologram layer 3.
In some embodiments, the photonic crystal layer 4 comprises a plurality of sizes of nanomicrosphere polymer particles having different refractive indices and forming photonic crystals by periodic arrangement.
In some embodiments, the nanoparticle polymer particles included in the photonic crystal layer 4 have a particle size of 190nm to 800nm, and in this particle size range, reflected light having a wavelength of 440nm to 620nm, i.e., light having different colors such as violet, red, etc., can be obtained. Furthermore, the particle size of the nano microsphere polymer particles can be 190nm-350nm or 350nm-800nm. Illustratively, the particle size of the nanovesicle polymer particles can be, but is not limited to, 190nm, 350nm, or 800nm.
In some embodiments, the material of the nanoparticle polymer particles includes polyacrylic acid, polyacrylate, polystyrene, polyacrylamide, polyethylene, polypropylene, polylactic acid, polyacrylonitrile, or a combination thereof. In some embodiments, the nanoparticulate polymer particles are selected from polystyrene prepared by emulsion polymerization.
In addition, in some embodiments, the thickness of the photonic crystal layer 4 is 3 μm to 10 μm, so that the vividness of the color of the reflected light can be adjusted according to actual needs. Further, the thickness of the photonic crystal layer 4 may be 3 μm to 7 μm or 7 μm to 10 μm. In some specific embodiments, the thickness of the photonic crystal layer 4 may be, but is not limited to, 3 μm, 7 μm, or 10 μm.
In the embodiment provided by the present application, the light-transmitting layer 5 is disposed on the surface of the photonic crystal layer 4 away from the holographic layer 3, and includes a coating layer 51 and an adhesive layer 52. In some embodiments, the coating layer 51 is disposed on the surface of the photonic crystal layer 4 to reflect the color of the holographic layer 3 and the photonic crystal layer 4, thereby showing the brightness and color of the transfer film.
In some embodiments, the coating layer 51 comprises a metal layer. The metal layer is made of aluminum (Al), copper (Cu), cobalt (Co), titanium (Ti), gold (Au), silver (Ag), nickel (Ni), platinum (Pt), or an alloy of these plating films, and specifically, ions of the plating films are adsorbed on the surface of the photonic crystal layer 4 by vacuum evaporation or the like. In some embodiments, the material of the metal layer includes aluminum, because Al has strong strength and excellent temperature resistance, and also has good processing and aging resistance, and if proper corona treatment is adopted, the adhesion between the aluminum layer and the film can be firmer.
In some embodiments, the thickness of the coating 51 is
Figure BDA0003185432240000081
Further, the thickness of the plating layer 51 may be set to
Figure BDA0003185432240000082
Or
Figure BDA0003185432240000083
Illustratively, the thickness of the coating 51 may be, but is not limited to
Figure BDA0003185432240000084
Or
Figure BDA0003185432240000085
Further, an adhesive layer 52 is provided on the surface of the coating film layer 51 to transfer the transfer film to the substrate. In some embodiments, the adhesive layer 52 is a hot melt adhesive layer that can transfer the transfer film to a substrate when the temperature during stamping reaches 180 ℃ to 200 ℃. Further, the hot melt adhesive layer is thermoplastic polyurethane.
In some embodiments, the bonding layer 52 has a thickness of 0.5 μm to 2 μm. Further, the thickness of the adhesive layer 52 may be 0.5 μm to 1 μm or 1 μm to 2 μm. In some specific embodiments, the thickness of the adhesive layer 52 may be, but is not limited to, 0.5 μm, 1 μm, or 2 μm.
The embodiment of the application also provides a manufacturing method of the transfer film, the manufacturing method is simple in process and low in cost, and the yield of the transfer film is improved, and the manufacturing method specifically comprises the following steps:
A. providing a carrier layer;
specifically, at least one of PET, PEN, OPP, BOPP or PE is made into a carrier layer with the thickness of 12-50 μm by adopting a molding processing technology.
In some embodiments, the support layer is selected from PET to make a support layer for the present application, wherein the support layer can have a thickness of 12 μm to 17 μm, 17 μm to 30 μm, or 30 μm to 50 μm. In some embodiments, the support layer may have a thickness of, but not limited to, 17 μm, 30 μm, or 50 μm.
It should be noted here that the carrier layer can also comprise a plurality of sub-layers, which form a carrier layer with a thickness of 12 μm to 50 μm.
B. Applying a release layer to one side surface of the carrier layer;
specifically, the dissolved copolymer is coated on one side surface of the carrier layer to obtain a release layer of 100nm-700nm. Wherein the copolymer can be selected from at least one of cellulose butyrate, acrylate, nitrocellulose, ethyl acetate, butyl acetate or styrene copolymer.
In some embodiments, the copolymer in the release layer is selected from acrylates.
In some embodiments, the release layer may have a thickness of 100nm to 350nm or 350nm to 700nm. In some embodiments, the release layer may have a thickness of, but is not limited to, 100nm, 350nm, or 700nm.
C. Applying a holographic layer on the surface of the release layer away from the carrier layer;
in some embodiments, the holographic layer has a thickness of no more than 1 μm. Further, the holographic layer may have a thickness of 0.4 μm to 0.7 μm or 0.7 μm to 1.0 μm. In some specific embodiments, the thickness of the holographic layer may be, but is not limited to, 0.4 μm, 0.7 μm, or 1.0 μm.
Specifically, the step of applying the hologram layer on the surface of the release layer is as follows:
a. preparation of a substrate: soaking the glass sheet base in an acid solution for about 25min, taking out, washing with running water for 5min-10min, repeatedly washing for 2-3 times, soaking in a neutral solution for about 25min, washing with tap water for 5min-10min, repeatedly washing for 2-3 times, then washing with deionized water, drying in an oven at 100 deg.C for 20min, taking out, and cooling in natural environment for use;
b. coating a photoresist: coating the photoresist on a glass substrate by a centrifugal coating method, wherein the coating thickness is about 0.8-1.0 μm, the drying temperature is 65 ℃, and the drying time is 30min;
c. laser photoetching: adopting an argon ion laser for exposure, recording a hologram by using interference fringes of a reference wave and an object light wave, and implanting special information by using photoetching to form regional local personalized information;
d. and (3) developing: diluting the photoresist by adopting a developing solution according to the proportion of 4:1, controlling the developing temperature to be 20-22 ℃, developing for 40-60 s, quickly washing the photoresist by using deionized water after the development is finished, and naturally drying the photoresist;
e. erecting the film: drying in a baking oven for 28-30 min at 120 deg.C to obtain original holographic mother plate;
f. silver spraying: spraying the sensitizing solution onto the surface of the photoresist through a nozzle to rapidly deposit the reduced silver; while spraying, rotating the coating at high speed to obtain a uniform conductive layer;
g. electroforming nickel plating: placing the mother plate sprayed with silver into an electroforming tank to form a nickel layer with enough strength concave-convex shape, wherein the thickness is generally 50-100 μm; controlling the pH value of the electroforming solution to be between 3 and 5 and the temperature to be 38 ℃ to obtain the laser holographic master plate.
h. Mother plate molding: performing mould pressing on the lower surface of the release layer by using a holographic mould pressing machine roller-to-roller mode, and transferring laser holographic interference information to the surface of the coating to obtain a holographic layer;
D. applying a photonic crystal layer on the surface of the holographic layer far away from the release layer;
in some embodiments, the photonic crystal layer comprises a plurality of sizes of nanomicrosphere polymer particles having different refractive indices and arranged periodically to form a photonic crystal.
In some embodiments, the nanoparticle polymer particles included in the photonic crystal layer have a particle size of 180nm to 800nm, and in this particle size range, reflected light having a wavelength of 440nm to 620nm, i.e., light exhibiting different colors such as violet, red, etc., can be obtained.
In some embodiments, the nanoparticle polymeric particles may have a particle size of 190nm to 350nm or 350nm to 800nm. Illustratively, the particle size of the nanovesicle polymer particles can be, but is not limited to, 190nm, 350nm, or 800nm.
In some embodiments, the material of the nanoparticle polymer particles includes polyacrylic acid, polyacrylate, polystyrene, polyacrylamide, polyethylene, polypropylene, polylactic acid, polyacrylonitrile, or a combination thereof. In some embodiments, the nanoparticulate polymer particles are selected from polystyrene prepared by emulsion polymerization.
Specifically, the nano microsphere polymer particles in the photonic crystal layer can be prepared by methods such as an emulsion polymerization method, and the preparation method comprises the following steps:
a. ultrasonically dispersing a monomer in water to obtain a dispersion liquid;
b. adding a dispersing agent and an initiator into the dispersion liquid for ultrasonic treatment until the dispersing agent and the initiator are dissolved to obtain emulsion-like mixed liquid;
c. under the protection of inert gas, stirring the mixed solution, and simultaneously heating to obtain a primary product;
d. placing the primary product in a centrifuge, separating at low speed to remove agglomerated particles, and drying to obtain nano microsphere polymer particle powder;
e. dispersing the obtained nano microsphere polymer particle powder in water to prepare emulsion with the mass fraction of 0.1%, and sealing for later use.
In some embodiments, the monomer in step a is selected from at least one of acrylic acid, styrene, acrylamide, ethylene, propylene, lactic acid, or acrylonitrile. In some embodiments, the monomer is selected from styrene, and the polystyrene may be present in the bulk feed in a weight fraction of 400 parts to 1200 parts, illustratively, the polystyrene may be present in a weight dispersion of, but not limited to, 480 parts, 484 parts, 800 parts, or 1200 parts.
In some embodiments, the initiator is selected from thermal initiators. For example, the thermal initiator is selected from the group consisting of persulfates, peroxides, azo compounds, and combinations thereof. More specifically, the thermal initiator is selected from the group consisting of ammonium persulfate, potassium persulfate, hydrogen peroxide, azobis (isobutylamidine hydrochloride), azobis (isopropylimidazole hydrochloride), and combinations thereof. In some embodiments, the initiator is selected from ammonium persulfate, where the weight parts of ammonium persulfate in the starting materials may range from 10 parts to 120 parts, and by way of example, the weight parts of ammonium persulfate may be, but is not limited to, 10 parts or 120 parts.
In some embodiments, the dispersant is selected from the group consisting of lignosulfonates, polyvinylpyrrolidone (PVP) polymers, polyvinylpyrrolidone/vinyl acetate (PVP/VA) copolymers, maleic acid/olefin polymers, comb graft copolymers, propylene oxide block copolymers or salts thereof, and combinations thereof. In some embodiments, the dispersant is selected from PVP, which may be exemplified by a weight fraction of 10 parts to 25 parts in the feedstock, and which may be, but is not limited to, 10 parts by weight.
In some embodiments, the emulsifier is selected from at least one of sodium dodecyl sulfate, or sodium dodecyl benzene sulfonate. In some embodiments, the emulsifier is selected from sodium lauryl sulfate, wherein the weight portion of sodium lauryl sulfate in the raw material can be 0 to 5 parts. Illustratively, the part by weight of sodium lauryl sulfate is 0 parts or 5 parts.
The prepared emulsion of the nano microsphere polymer particles is used for manufacturing a photonic crystal layer by a vertical deposition method, and the manufacturing method comprises the following steps:
a. adding 20mL of emulsion of nano microsphere polymer particles with the mass fraction of 0.1% into a beaker, inserting a glass slide into the emulsion and keeping the glass slide in a vertical state; then in a constant temperature environment of 60 ℃, the whole system is in a non-disturbance state until the water in the emulsion is completely evaporated;
b. and taking out the glass slide, and blowing the surface of the glass slide by using nitrogen flow to obtain the photonic crystal structure loaded on the glass slide.
c. Coating on the surface of the holographic layer by using a coating mode of an anilox roller, and drying through a hot air channel to form a photonic crystal layer.
In some embodiments, the photonic crystal layer has a thickness of 3 to 10 μm. Further, the thickness of the photonic crystal layer may be 3 to 7 μm or 7 to 10 μm. In some specific embodiments, the thickness of the photonic crystal layer may be, but is not limited to, 3 μm, 7 μm, or 10 μm.
E. Applying a light-transmitting layer on the surface of the photonic crystal layer away from the holographic layer;
in some embodiments, the transparent layer comprises a coating layer and an adhesive layer.
In some embodiments, a coating layer is applied on the surface of the photonic crystal layer far from the holographic layer, the coating layer comprises a metal layer, the material of the metal layer comprises Al, cu, co, ti, au, ag, ni, pt or alloy of the coatings, and specifically, coating ions are adsorbed on the surface of the photonic crystal layer by vacuum evaporation and the like. In some embodiments, the material of the metal layer includes Al.
In some embodiments, the thickness of the coating is
Figure BDA0003185432240000121
Further, the thickness of the coating layer may be set to
Figure BDA0003185432240000122
Or
Figure BDA0003185432240000123
Illustratively, the thickness of the coating layer may be, but is not limited to
Figure BDA0003185432240000124
Or
Figure BDA0003185432240000125
In some embodiments, a bonding layer is applied to the surface of the film coating layer away from the photonic crystal layer, the bonding layer is a hot melt adhesive layer, and the hot melt adhesive layer can transfer the transfer film to a substrate when the temperature in the hot stamping process reaches 180-200 ℃. Further, the hot melt adhesive layer is thermoplastic polyurethane.
In some embodiments, the bonding layer has a thickness of 0.5 μm to 2 μm. Further, the thickness of the adhesive layer may be 0.5 μm to 1 μm or 1 μm to 2 μm. In some specific embodiments, the thickness of the adhesive layer may be, but is not limited to, 0.5 μm, 1 μm, or 2 μm.
It should be understood that the specific embodiments described herein are for purposes of explanation and are not intended to limit the present application.
Example 1
This embodiment provides a transfer film, and this transfer film contains carrier layer, release layer, holographic layer, photonic crystal layer, aluminize layer, hot melt adhesive layer in proper order. Wherein the carrier layer is made of PET, and the thickness of the carrier layer is 17 μm; the release layer is made of acrylic resin, and the thickness of the release layer is 100nm; the thickness of the holographic layer is 400nm; the photonic crystal layer is formed by assembling polystyrene particles of 190nm-800nm, and the thickness of the photonic crystal layer is 3 mu m; the aluminum-plated layer is made of Al and has a thickness of
Figure BDA0003185432240000131
The hot melt adhesive layer is made of thermoplastic polyurethane and has a thickness of 0.5 mu m.
The embodiment also provides a manufacturing method of the transfer film, which specifically comprises the following steps:
A. processing PET into a carrier layer with the thickness of 17 μm by adopting a molding processing technology;
B. coating the dissolved acrylic acid on the surface of the carrier layer to form a release layer with the thickness of 100nm;
C. applying a holographic layer on the surface of the release layer, and preparing the holographic layer can be seen in fig. 2, which is as follows:
a. preparation of a substrate: soaking the glass sheet base in an acid solution for about 25min, taking out, washing with running water for 5min-10min, repeatedly washing for 2-3 times, soaking in a neutral solution for about 25min, washing with tap water for 5min-10min, repeatedly washing for 2-3 times, then washing with deionized water, drying in an oven at 100 deg.C for 20min, taking out, and cooling in natural environment for use;
b. coating a photoresist: coating the photoresist on a glass substrate by a centrifugal coating method, wherein the coating thickness is about 0.8-1.0 μm, the drying temperature is 65 ℃, and the drying time is 30min;
c. laser photoetching: the method comprises the steps of exposing by adopting an argon ion laser, recording a hologram by utilizing interference fringes of reference waves and object light waves, and implanting special information by utilizing photoetching to form regional local personalized information;
d. and (3) developing: diluting the photoresist by adopting a developing solution according to the proportion of 4:1, controlling the developing temperature to be 20-22 ℃, developing for 40-60 s, quickly washing the photoresist by using deionized water after the development is finished, and naturally drying the photoresist;
e. erecting the film: drying in a baking oven for 28-30 min at 120 deg.C to obtain original holographic master plate;
f. silver spraying: spraying the sensitizing solution onto the surface of the photoresist through a nozzle to rapidly deposit the reduced silver; while spraying, rotating the coating at high speed to obtain a uniform conductive layer;
g. electroforming nickel plating: placing the mother plate sprayed with silver into an electroforming tank to form a nickel layer with enough strength concave-convex shape, wherein the thickness is generally 50-100 μm; controlling the pH value of the electroforming solution to be between 3 and 5 and the temperature to be 38 ℃ to obtain the laser holographic master plate.
h. Mother plate molding: performing mould pressing on the lower surface of the release layer by using a roller-to-roller mode of a holographic mould pressing machine, and transferring laser holographic interference information to the surface of the coating to obtain a holographic layer with the thickness of 0.4 mu m;
D. applying a photonic crystal layer on the surface of the holographic layer, the specific steps are as follows:
a. the mechanism of the preparation of the nanoparticle polymer emulsion is shown in fig. 3, and specifically comprises the following steps:
s1, adding 800 parts of styrene into 11500 parts of water, and performing ultrasonic dispersion for 10min to obtain a dispersion liquid;
s2, adding 10 parts of polyvinylpyrrolidone, 10 parts of ammonium persulfate and 5 parts of lauryl sodium sulfate into the dispersion liquid for ultrasonic treatment until the polyvinylpyrrolidone, the ammonium persulfate and the lauryl sodium sulfate are dissolved to obtain emulsion-like mixed liquid;
s3, under the protection of nitrogen gas, stirring the mixed solution, and simultaneously heating at 80 ℃ for 8 hours to obtain a primary product;
s4, placing the primary product in a centrifuge, separating at a low speed to remove agglomerated particles, and drying to obtain nanoparticle polymer particle powder, wherein the particle size of the nanoparticle polymer particles is concentrated to about 190nm as can be seen in an SEM image shown in figure 3;
and S5, dispersing the obtained nano microsphere polymer particle powder in water to prepare 0.1% emulsion by mass fraction, and sealing for later use.
b. Adding 20mL of emulsion of nano microsphere polymer particles with the mass fraction of 0.1% into a beaker, inserting a glass slide into the emulsion and keeping the glass slide in a vertical state; then in a constant temperature environment of 60 ℃, the whole system is in a non-disturbance state until the water in the emulsion is completely evaporated;
c. and taking out the glass slide, and blowing the surface of the glass slide by using nitrogen flow to obtain the photonic crystal structure loaded on the glass slide.
d. Coating on the surface of the holographic layer by using a coating mode of an anilox roller, and drying through a hot air channel to form a photonic crystal layer with the thickness of 3 mu m.
E. The aluminum ions are uniformly adsorbed on the surface of the photonic crystal layer by adopting a vacuum evaporation process to form a layer with the thickness of
Figure BDA0003185432240000141
The aluminum plating layer of (2);
F. and applying a hot melt adhesive layer on the surface of the aluminum-plated layer, wherein the thickness of the hot melt adhesive layer is 0.5 μm.
Example 2
The embodiment provides a transfer film, and the transfer film comprises a carrier layer, a release layer, a holographic layer, a photonic crystal layer, an aluminum plating layer and a hot melt adhesive layer in sequence. Wherein the carrier layer is made of PET and has a thickness of 30 μm; the release layer is made of acrylic resin, and the thickness of the release layer is 350nm; the thickness of the holographic layer is 0.7 μm; photonic crystal layerIs formed by assembling 190nm-800nm polystyrene particles, and the thickness of the polystyrene particles is 7 mu m; the aluminum-plated layer is made of Al and has a thickness of
Figure BDA0003185432240000151
The hot melt adhesive layer is made of thermoplastic polyurethane and has a thickness of 1.0 μm.
The embodiment also provides a manufacturing method of the transfer film, which specifically comprises the following steps:
A. processing PET into a carrier layer with the thickness of 30 mu m by adopting a molding processing technology;
B. coating the dissolved acrylic acid on the surface of the carrier layer to form a release layer with the thickness of 350nm;
C. applying a hologram layer having a thickness of 0.7 μm on a surface of the release layer, wherein the hologram layer is prepared and applied in the same manner as in example 1;
D. applying a photonic crystal layer on the surface of the holographic layer, the specific steps are as follows:
a. the preparation method of the nano microsphere polymer particle emulsion specifically comprises the following steps:
s1, adding 1200 parts of styrene into 11500 parts of water, and performing ultrasonic dispersion for 10min to obtain a dispersion liquid;
s2, adding 10 parts of polyvinylpyrrolidone, 10 parts of ammonium persulfate and 5 parts of lauryl sodium sulfate into the dispersion liquid for ultrasonic treatment until the polyvinylpyrrolidone, the ammonium persulfate and the lauryl sodium sulfate are dissolved to obtain an emulsion-like mixed liquid;
s3, under the protection of nitrogen gas, stirring the mixed solution, and simultaneously heating at 80 ℃ for 8 hours to obtain a primary product;
s4, placing the primary product in a centrifuge, separating at a low speed to remove agglomerated particles, and drying to obtain nanoparticle polymer particle powder, wherein the SEM picture shown in figure 4 can be seen, and the particles of the nanoparticle polymer particles are concentrated to about 350nm;
and S5, dispersing the obtained nano microsphere polymer particle powder in water to prepare 0.1% emulsion by mass fraction, and sealing for later use.
b. Adding 20mL of emulsion of nano microsphere polymer particles with the mass fraction of 0.1% into a beaker, inserting a glass slide into the emulsion and keeping the glass slide in a vertical state; then in a constant temperature environment of 60 ℃, the whole system is in a non-disturbance state until the water in the emulsion is completely evaporated;
c. and taking out the glass slide, and blowing the surface of the glass slide by using nitrogen flow to obtain the photonic crystal structure loaded on the glass slide.
d. Coating on the surface of the holographic layer by using a coating mode of an anilox roller, and drying through a hot air channel to form a photonic crystal layer with the thickness of 7 mu m.
E. The aluminum ions are uniformly adsorbed on the surface of the photonic crystal layer by adopting a vacuum evaporation process to form a layer with the thickness of
Figure BDA0003185432240000161
The aluminum plating layer of (2);
F. and applying a hot melt adhesive layer on the surface of the aluminum-plated layer, wherein the thickness of the hot melt adhesive layer is 1 μm.
Example 3
The embodiment provides a transfer film, and the transfer film comprises a carrier layer, a release layer, a holographic layer, a photonic crystal layer, an aluminum plating layer and a hot melt adhesive layer in sequence. Wherein the carrier layer is made of PET and has a thickness of 50 μm; the release layer is made of acrylic resin, and the thickness of the release layer is 750nm; the thickness of the holographic layer is 0.7 μm; the photonic crystal layer is formed by assembling polystyrene particles of 190nm-800nm, and the thickness of the photonic crystal layer is 10 mu m; the aluminum-plated layer is made of Al and has a thickness of
Figure BDA0003185432240000162
The hot melt adhesive layer is made of thermoplastic polyurethane and has a thickness of 2.0 mu m.
The embodiment also provides a manufacturing method of the transfer film, which specifically comprises the following steps:
A. processing PET into a carrier layer with the thickness of 50 μm by adopting a molding processing technology;
B. coating the dissolved acrylic acid on the surface of the carrier layer to form a release layer with the thickness of 750nm;
C. applying a hologram layer having a thickness of 0.7 μm on a surface of the release layer, wherein the hologram layer is prepared and applied in the same manner as in example 1;
D. applying a photonic crystal layer on the surface of the holographic layer, the specific steps are as follows:
a. the preparation method of the nano microsphere polymer particle emulsion specifically comprises the following steps:
s1, adding 484 parts of styrene into 4800 parts of water, and performing ultrasonic dispersion for 10min to obtain a dispersion liquid;
s2, adding 10 parts of polyvinylpyrrolidone and 120 parts of ammonium persulfate into the dispersion liquid for ultrasonic treatment until the polyvinylpyrrolidone and the ammonium persulfate are dissolved to obtain emulsion-like mixed liquid;
s3, under the protection of nitrogen gas, stirring the mixed solution, and simultaneously heating at 80 ℃ for 8 hours to obtain a primary product;
s4, placing the primary product in a centrifuge, separating at a low speed to remove agglomerated particles, and drying to obtain nanoparticle polymer particle powder, wherein the SEM image shown in figure 5 shows that the particles of the nanoparticle polymer particles are concentrated to about 800 nm;
and S5, dispersing the obtained nano microsphere polymer particle powder in water to prepare 0.1% emulsion by mass fraction, and sealing for later use.
b. Adding 20mL of emulsion of nano microsphere polymer particles with the mass fraction of 0.1% into a beaker, inserting a glass slide into the emulsion and keeping the glass slide in a vertical state; then in a constant temperature environment of 60 ℃, the whole system is in a non-disturbance state until the water in the emulsion is completely evaporated;
c. and taking out the glass slide, and blowing the surface of the glass slide by using nitrogen flow to obtain the photonic crystal structure loaded on the glass slide.
d. Coating on the surface of the holographic layer by using a coating mode of an anilox roller, and drying through a hot air channel to form a photonic crystal layer with the thickness of 10 mu m.
E. The aluminum ions are uniformly adsorbed on the surface of the photonic crystal layer by adopting a vacuum evaporation process to form a layer with the thickness of
Figure BDA0003185432240000172
The aluminum plating layer of (2);
F. and applying a hot melt adhesive layer on the surface of the aluminum-plated layer, wherein the thickness of the hot melt adhesive layer is 2 μm.
Comparative example 1
The method for preparing the thermal transfer film provided in comparative example 1 includes:
s1, coating a release type mould pressing layer with the thickness of 2 microns on a PET film by using a coating machine, wherein the release type mould pressing layer has peelability, can be separated from the PET base film, and also has moldability and can mould holographic pictures and texts;
s2, pressing the holographic image on a release type mould pressing layer by adopting a stamping nickel plate at the temperature of 180 +/-5 ℃, and simultaneously setting a relief cursor;
s3, setting the thickness of the surface of the die pressing holographic layer to be
Figure BDA0003185432240000171
The ZnS as a dielectric layer;
s4, adopting a flexible printing method, and arranging a color printing layer on the surface of the medium layer, wherein the color printing layer needs to correspond to the holographic layer in position, and the corresponding method comprises the following steps: when in flexo printing, the relief cursor obtained in the step S2 is overprinted; so that the error between the holographic layer obtained in the step S2 and the color printing layer is less than or equal to 0.5mm;
s5, heating aluminum serving as a raw material to 1400 ℃ to form aluminum vapor, and arranging an aluminum plated layer with the thickness of zero on the surface of the color printing layer by using an evaporation method;
s6, arranging a hot melt adhesive layer with the thickness of 0.5 mu m and made of thermoplastic polyurethane on the surface of the aluminum plating layer.
Performance testing of transfer films
The transfer film in the embodiment 1 and the comparative example 1 of the present application is transferred to paper, and the structure after the transfer is observed through a 3D scanning microscope, wherein, fig. 7 (a) and 7 (b) are 3D scanning microscope images of the transfer film after the transfer film in the embodiment 1 of the present application is transferred to paper, and it can be seen from the images that the transfer film has no peeling problem during hot stamping, and the edge is smooth and clear, and has good transfer and adhesion. In addition, it was observed that the nanosphere polymer particles maintained uniformity of their formation and good dispersibility after heat transfer.
The above description is only a preferred embodiment of the present application, and not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings of the present application, or which are directly or indirectly applied to other related technical fields, are included in the scope of the present application.

Claims (10)

1. A transfer film, comprising:
a carrier layer;
the release layer is stacked on one side surface of the carrier layer;
the holographic layer is arranged on the surface of the release layer, which is far away from the carrier layer;
the photonic crystal layer is arranged on the surface of the holographic layer far away from the release layer and is used for reflecting light with various wavelengths;
and the light transmitting layer is arranged on the surface of the photonic crystal layer far away from the holographic layer.
2. The transfer film of claim 1, wherein the light-transmitting layer comprises:
the film coating layer is arranged on the surface of the photonic crystal layer far away from the holographic layer;
and the bonding layer is arranged on the surface of the coating layer far away from the photonic crystal layer.
3. A transfer film as in claim 1, wherein the photonic crystal layer comprises a plurality of sizes of nanomicrosphere polymer particles.
4. The transfer film as claimed in claim 3, wherein the material of the nano-microsphere polymer particles comprises at least one of polyacrylic acid, polyacrylate, polystyrene, polyacrylamide, polyethylene, polypropylene, polylactic acid or polyacrylonitrile.
5. A transfer film as claimed in claim 3, wherein the nanoparticle polymer particles have a particle size of 190nm to 800nm.
6. The transfer film according to any one of claims 2 to 5,
the thickness of the photonic crystal layer is 3-10 μm;
and/or the thickness of the carrier layer is 12-50 μm;
and/or the thickness of the release layer is 100nm-700nm;
and/or the holographic layer has a thickness of 0 μm to 1 μm;
and/or the thickness of the coating layer is
Figure FDA0003185432230000011
And/or the thickness of the bonding layer is 0.5-2 μm.
7. The transfer film of claim 2, wherein the coating layer comprises a metal layer; and/or the bonding layer is a hot melt adhesive layer.
8. The transfer film as claimed in claim 7, wherein the metal layer is made of aluminum, copper, cobalt, titanium, gold, silver, nickel, platinum or an alloy of these metals.
9. A method for manufacturing a transfer film, comprising:
A. providing a carrier layer;
B. applying a release layer to one side surface of the carrier layer;
C. applying a holographic layer on the surface of the release layer away from the carrier layer;
D. applying a photonic crystal layer on the surface of the holographic layer far away from the release layer;
E. a light transmitting layer is applied to the surface of the photonic crystal layer remote from the holographic layer.
10. The method of claim 9, wherein the photonic crystal layer comprises a plurality of sizes of nano-microsphere polymer particles, and the nano-microsphere polymer particles are prepared by an emulsion polymerization method.
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