CN115657182B - Transflective double-sided diffraction optical element and manufacturing method thereof - Google Patents
Transflective double-sided diffraction optical element and manufacturing method thereof Download PDFInfo
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
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- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
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Abstract
A transflective double-sided diffraction optical component and a manufacturing method thereof comprise: the incident surface of the substrate is a first diffraction surface with a relief structure, the emergent surface of the substrate is a second diffraction surface with a relief structure, and a semi-transparent and semi-reflective film is plated on the relief structure of the first diffraction surface; the first diffraction surface forms a first diffraction image through the diffraction light reflected by the semi-transparent semi-reflective film; the light transmitted by the first diffraction surface through the semi-transparent and semi-reflective film is diffracted by the second diffraction surface to form a second diffraction image; the first diffraction image and the second diffraction image are different. Different relief structures are respectively manufactured on the incident surface and the emergent surface of the substrate, and the semi-transparent and semi-reflective film is combined, so that the effect of respectively generating different diffraction patterns on the reflecting screen and the transmitting screen of the diffraction optical element is realized; has great application value in the fields of anti-counterfeiting, display and the like.
Description
Technical Field
The invention relates to the field of optics, in particular to a transflective double-sided diffraction optical element and a manufacturing method thereof.
Background
The diffraction optical element is a device which can realize that each diffraction unit can have specific morphology and refractive index distribution by etching and the like, can finely regulate and control the wave front phase of a laser beam, is widely applied to a plurality of fields such as laser processing, laser cosmetology, information display, scientific research, military and the like, and can be divided into laser shaping, beam splitting, generation of structured light and the like according to functions. For different applications, the design needs to be performed according to the wavelength, the spot shape, the spot size, the working distance, the size of the diffraction pattern and the like of the laser.
The prior art generally produces a surface relief structure on only one side of a diffractive optical element, so that a diffraction pattern can be produced only in the transmissive or reflective areas, or the same diffraction pattern can be produced in both the transmissive and reflective areas.
Disclosure of Invention
In order to solve the problem that a diffraction optical element can only generate diffraction patterns in a transmission area or a reflection area or generate the same diffraction patterns in the transmission area and the reflection area, the application provides a transflective double-sided diffraction optical element and a manufacturing method.
In order to solve the problems, the technical scheme of the invention is as follows:
the present invention provides a transflective double-sided diffractive optical element comprising: the incident surface of the substrate is a first diffraction surface with a relief structure, the emergent surface of the substrate is a second diffraction surface with a relief structure, and a semi-transparent and semi-reflective film is plated on the relief structure of the first diffraction surface;
the first diffraction surface forms a first diffraction image through diffracted light reflected by the semi-transparent semi-reflective film;
the light transmitted by the first diffraction surface through the semi-transparent and semi-reflective film is diffracted by the second diffraction surface to form a second diffraction image;
the first diffraction image and the second diffraction image are different.
Further preferably, the relief structure of the first diffraction surface and the relief structure of the second diffraction surface are both two-step structures.
Further preferably, the relief structure of the first diffraction surface and the relief structure of the second diffraction surface are respectively two-step structures with different structures.
Further preferably, the step height of the relief structure of the first diffraction surface is 150nm to 160nm, and the step height of the relief structure of the second diffraction surface is 710nm to 720nm.
Further preferably, the phase of the second diffraction plane is set according to the phase of the first diffraction plane.
Further preferably, the pixel units of the first diffraction surface and the second diffraction surface are square, and feature sizes are the same.
Further preferably, the first diffraction surface is configured to form the second diffraction image by adding the phase of the light transmitted through the transflective film system to the phase of the light transmitted through the second diffraction surface.
The invention also provides a manufacturing method of the transflective double-sided diffraction optical element, which comprises the following steps:
designing reflection phase distribution of a first diffraction surface according to a first target diffraction image and adopting an IFTA self-adaptive optimization algorithm, and setting a relief structure of the first diffraction surface according to reflection phase distribution information of the first diffraction surface;
designing transmission phase distribution of a second diffraction surface by adopting an IFTA self-adaptive optimization algorithm according to transmission phase distribution of a second target diffraction image and the first diffraction surface, and setting a relief structure of the second diffraction surface according to transmission phase distribution information of the second diffraction surface;
and etching the relief structure of the first diffraction surface on the incident surface of the substrate, etching the relief structure of the second diffraction surface on the emergent surface of the substrate, and plating a semi-transparent and semi-reflective film on the relief structure of the first diffraction surface to form the transflective double-sided diffraction optical element.
Further preferably, the designing the reflection phase distribution of the first diffraction surface according to the first target diffraction image and by adopting an IFTA adaptive optimization algorithm specifically includes the steps of:
generating initial phase distribution of the first diffraction surface at random, generating complex amplitude distribution of the reflected light of the first diffraction surface, and performing iterative computation of the following steps S11-S14 on the complex amplitude distribution to obtain reflection phase distribution of the first diffraction surface:
s11: performing Fourier transform on the current complex amplitude distribution to obtain complex amplitude distribution of the image plane of the reflection area;
s12: replacing the amplitude of the reflection area image plane complex amplitude distribution with the amplitude distribution of the first target diffraction image to obtain a corrected reflection area image plane complex amplitude distribution;
s13: performing inverse Fourier transform on the modified complex amplitude distribution of the image plane of the reflection area to obtain modified complex amplitude distribution of the reflected light of the first diffraction plane;
s14: replacing the corrected complex amplitude distribution of the light reflected by the first diffraction surface with the current complex amplitude distribution, and returning to the step S11 for iterative calculation;
after the preset times of iteration are carried out through the steps S11-S14, the reflection phase distribution of the first diffraction surface is obtained, and the final reflection phase distribution of the first diffraction surface is obtained through step quantization.
Further preferably, the method for designing the transmission phase distribution of the second diffraction plane by using IFTA adaptive optimization algorithm according to the transmission phase distribution of the second target diffraction image and the first diffraction plane specifically includes the steps of:
acquiring a transmission phase of a first diffraction surface;
randomly generating initial phase distribution of the second diffraction surface, and superposing transmission phase distribution of the first diffraction surface to obtain complex amplitude distribution of the transmission light of the second diffraction surface;
the transmission phase distribution of the second diffraction plane is obtained by performing iterative calculation of the complex amplitude distribution as follows in step S21-step S24:
s21: performing Fourier transform on the current complex amplitude distribution to obtain complex amplitude distribution of the image plane of the transmission area;
s22: replacing the amplitude of the transmission area image plane complex amplitude distribution with the amplitude distribution of the second target diffraction image to obtain a corrected transmission area image plane complex amplitude distribution;
s23: performing inverse Fourier transform on the modified complex amplitude distribution of the image plane of the transmission area to obtain a modified complex amplitude distribution of the transmitted light of the second diffraction plane;
s24: replacing the corrected complex amplitude distribution of the transmitted light of the second diffraction surface with the current complex amplitude distribution, and returning to the step S21 for iterative calculation;
after the steps S21-S24 are iterated for a preset number of times, the transmission phase distribution of the second diffraction surface is obtained, the transmission phase distribution of the second diffraction surface is subtracted from the transmission phase distribution of the first diffraction surface, and the phase distribution added by the second diffraction surface is obtained through step quantification.
According to the transflective double-sided diffraction optical element and the manufacturing method of the embodiment, different relief structures are manufactured on the incident surface and the emergent surface of the substrate respectively, and the transflective film is combined, so that the effect of respectively generating different diffraction patterns on the reflective screen and the transmissive screen of the diffraction optical element is realized; has great application value in the fields of anti-counterfeiting, display and the like.
Drawings
FIG. 1 is a schematic diagram of a transflective double-sided diffractive optical element;
FIG. 2 is an application light path diagram of a transflective double-sided diffractive optical element;
FIG. 3 is a transmission diffraction pattern of FIG. 2;
FIG. 4 is a reflection diffraction pattern of FIG. 2;
FIG. 5 is a flow chart of the fabrication of a transflective double-sided diffractive optical element;
FIG. 6 is a first diffraction plane design flow chart;
FIG. 7 is a flow chart of a second diffraction plane design.
Detailed Description
The invention will be described in further detail below with reference to the drawings by means of specific embodiments.
Embodiment one:
the embodiment provides a transflective double-sided diffraction optical element, the structure diagram of which is shown in fig. 1, comprising a substrate 1, wherein the incident surface of the substrate 1 is a first diffraction surface 2 with a relief structure, the emergent surface of the substrate 1 is a second diffraction surface 3 with a relief structure, wherein the relief structure of the first diffraction surface 2 is plated with a transflective film; the first diffraction surface 2 forms a first diffraction image by the diffracted light reflected by the semi-transparent and semi-reflective film, the first diffraction surface 2 diffracts the light transmitted by the semi-transparent and semi-reflective film by the second diffraction surface 3 to form a second diffraction image, and the first diffraction image and the second diffraction image are different.
Specifically, the relief structure of the first diffraction surface 2 and the relief structure of the second diffraction surface are both two-step structures, and preferably, the relief structure of the first diffraction surface 2 and the relief structure of the second diffraction surface are respectively two-step structures with different structures.
In this example, the phase of the second diffraction surface 3 is set according to the phase of the first diffraction surface 2, and the diffracted light transmitted through the transflective film by the first diffraction surface 2 is added to the phase of the second diffraction surface 3 to form a second diffraction image. That is, the first diffraction surface 2 determines the first diffraction pattern exhibited by the reflection region, and the first diffraction surface 2 and the second diffraction surface 3 together determine the second diffraction pattern exhibited by the transmission region.
Further, the substrate 1 in this example is a glass substrate, the homogeneity level of the glass substrate is H5, the thickness of the substrate is t, and the value range is t <1mm.
The structural dimensions of the transflective double-sided diffractive optical element in this example are as follows:
the pixel units of the first diffraction surface and the second diffraction surface are square, the characteristic dimensions are the same, the characteristic dimension variation range is 1.9-2 mu m, the step height of the surface relief structure of the first diffraction surface 2 is 150-160 nm, and the step height of the surface relief structure of the second diffraction surface 3 is 710-720 nm; the semi-transparent and semi-reflective film plated on the first diffraction surface 2 is manufactured by an electron beam evaporation technology and comprises a high refractive index film layer and a low refractive index film layer, the total thickness of the film system is 300-500 nm, and the usable materials of the film system are silicon dioxide, titanium dioxide, sapphire and the like.
In this example, the design of the first diffraction surface 2 includes determining the wavelength of the light source, the beam waist radius, the number of points of the target pattern of the reflection area, the working distance, and the sampling interval; and the design of the second diffraction surface 3 comprises determining the wavelength of the light source, the beam waist radius, the number of points of the target pattern of the transmission area, the working distance and the sampling interval.
In this example, the fabrication of the first diffraction surface 2 and the second diffraction surface 3 includes forming a two-step surface relief structure using laser direct writing, etching, or the like.
The optical path diagram of the application of the transflective double-sided diffractive optical element provided in this example is shown in fig. 2, and the optical path includes: the laser 4, the receiving screen 5 with the hole reflection area, the transflective double-sided diffraction optical element and the receiving screen 6 with the transmission area (the receiving screen 5 and the receiving screen 6 are required to be placed in the fraunhofer diffraction area of the diffraction element).
The light path diagram in fig. 2 works as follows:
(1) Generating a laser beam by a laser 4, wherein the spot diameter of the laser beam is larger than 2mm;
(2) The laser beam is transmitted through the light-passing hole on the receiving screen 5 and is incident on the transflective double-sided diffraction optical element;
(3) The diffracted light transmitted through the transflective double-sided diffractive optical element generates a transmissive diffraction pattern as shown in fig. 3 on the transmissive-area receiving screen 6, and the diffracted light reflected by the transflective double-sided diffractive optical element generates a reflective diffraction pattern as shown in fig. 4 on the perforated reflective-area receiving screen 5. As can be seen from fig. 3 and 4, the transmission diffraction pattern and the reflection diffraction pattern are different diffraction patterns.
According to the transflective double-sided diffraction optical element provided by the embodiment, different relief structures are respectively manufactured on the incident surface and the emergent surface of the substrate, and the effects of respectively generating different diffraction patterns on the reflection screen and the transmission screen of the diffraction optical element are realized by combining the transflective film; has great application value in the fields of anti-counterfeiting, display and the like.
Embodiment two:
based on the transflective double-sided diffractive optical element provided in the first embodiment, the method for manufacturing the transflective double-sided diffractive optical element is provided in the first embodiment, and a flowchart of the method is shown in fig. 5, and specifically includes the following steps.
S100: and designing reflection phase distribution of the first diffraction surface according to the first target diffraction image and adopting an IFTA self-adaptive optimization algorithm, and setting a relief structure of the first diffraction surface according to reflection phase distribution information of the first diffraction surface.
S200: and designing the transmission phase distribution of the second diffraction surface by adopting an IFTA self-adaptive optimization algorithm according to the transmission phase distribution of the second target diffraction image and the first diffraction surface, and setting a relief structure of the second diffraction surface according to the transmission phase distribution information of the second diffraction surface.
S300: etching the relief structure of the first diffraction surface on the incident surface of the substrate, etching the relief structure of the second diffraction surface on the emergent surface of the substrate, and plating a semi-transparent semi-reflective film on the relief structure of the first diffraction surface to form the transflective double-sided diffraction optical element.
In step S100, the reflection phase distribution of the first diffraction plane is designed according to the first target diffraction image and using an IFTA adaptive optimization algorithm. The method specifically comprises the following steps, and the flow chart of the method is shown in fig. 6:
an initial phase distribution of the first diffraction plane is randomly generated, generating a complex amplitude distribution of the light reflected by the first diffraction plane, for example: randomly generating an initial phase distribution of the first diffraction planeLet the incident light be a uniform plane wave a (x, y) =1, the complex amplitude distribution of the light reflected by the first diffraction plane +.>
The complex amplitude distribution is subjected to iterative calculation from the following step S11 to step S14 to obtain a reflection phase distribution of the first diffraction plane:
s11: performing Fourier transform on the current complex amplitude distribution to obtain complex amplitude distribution of the image plane of the reflection area;
for example: complex amplitude distribution f of light reflected from the first diffraction plane 1 (x, y) Fourier transforming to obtain the complex amplitude distribution F of the image plane of the reflection region 1 (u 1 ，v 1 )；
S12: replacing the amplitude of the reflection area image plane complex amplitude distribution with the amplitude distribution of the first target diffraction image to obtain a corrected reflection area image plane complex amplitude distribution;
for example, F 1 (u 1 ，v 1 ) Amplitude |F of (2) 1 (u 1 ，v 1 ) The i is replaced with the amplitude distribution B (u) 1 ，v 1 ) Obtaining the corrected reflection area image plane complex amplitude distribution F 2 (u 1 ，v 1 )；
S13: performing inverse Fourier transform on the modified complex amplitude distribution of the image plane of the reflection area to obtain modified complex amplitude distribution of the reflected light of the first diffraction plane;
for example, to F 2 (u 1 ，v 1 ) The inverse Fourier transform is performed to obtain a complex amplitude distribution f of the reflected light on the first diffraction plane 2 (x，y)；
S14: replacing the corrected complex amplitude distribution of the light reflected by the first diffraction surface with the current complex amplitude distribution, and returning to the step S11 for iterative calculation;
for example, the complex amplitude distribution of the light reflected by the first diffraction planeReplaced by
After the preset times of iteration are carried out through the steps S11-S14, the reflection phase distribution of the first diffraction surface is obtained, and the final reflection phase distribution of the first diffraction surface is obtained through step quantization.
For example, after n iterations through steps S11-S14, n is a positive integer greater than 1, resulting in a first diffraction plane reflection phase distributionObtaining final first diffraction surface reflection phase distribution after step quantization
In step S200, according to the second target diffraction image and the transmission phase distribution of the first diffraction plane, designing the transmission phase distribution of the second diffraction plane by adopting an IFTA adaptive optimization algorithm; specifically, the method comprises the following steps, and the flow chart is shown in fig. 7.
Acquiring a transmission phase of a first diffraction surface;
for example, if the refractive index of the base material is n G The transmission phase of the first diffraction plane can be obtained
Randomly generating initial phase distribution of the second diffraction surface, and superposing transmission phase distribution of the first diffraction surface to obtain complex amplitude distribution of the transmission light of the second diffraction surface;
for example, the initial phase distribution of the second diffraction plane is randomly generatedSuperimposed transmission phase distribution of the first diffraction plane>Obtaining the complex amplitude distribution of the light transmitted by the second diffraction plane +.>
The transmission phase distribution of the second diffraction plane is obtained by performing iterative calculation of the complex amplitude distribution as follows in step S21-step S24:
s21: performing Fourier transform on the current complex amplitude distribution to obtain complex amplitude distribution of the image plane of the transmission area;
s22: replacing the amplitude of the transmission area image plane complex amplitude distribution with the amplitude distribution of the second target diffraction image to obtain a corrected transmission area image plane complex amplitude distribution;
s23: performing inverse Fourier transform on the modified complex amplitude distribution of the image plane of the transmission area to obtain a modified complex amplitude distribution of the transmitted light of the second diffraction plane;
s24: replacing the corrected complex amplitude distribution of the transmitted light of the second diffraction surface with the current complex amplitude distribution, and returning to the step S21 for iterative calculation;
after the steps S21-S24 are iterated for a preset number of times, the transmission phase distribution of the second diffraction surface is obtained, the transmission phase distribution of the second diffraction surface is subtracted from the transmission phase distribution of the first diffraction surface, and the phase distribution added by the second diffraction surface is obtained through step quantification.
For example, by steps S21 to S24, the amplitude distribution C (u 2 ，v 2 ) After m iterations, m is a positive integer greater than 1, and the transmission phase distribution of the second diffraction surface is obtainedSubtracting the transmission phase distribution of the first diffraction plane +.>Then the final distribution of the additional phases of the second diffraction surface is obtained after the step quantization>
In step S300, a relief structure of a first diffraction surface is etched on an incident surface of a substrate, a relief structure of a second diffraction surface is etched on an exit surface of the substrate, and a transflective film is plated on the relief structure of the first diffraction surface to form a transflective double-sided diffractive optical element.
The method comprises the steps of etching a relief structure of a first diffraction surface on an incident surface of a substrate, and plating a semi-transparent and semi-reflective film on the relief structure of the first diffraction surface, wherein the specific process is as follows: spin-coating a layer of photoresist on an incident surface of a glass substrate, and etching a photoresist relief structure of a first diffraction surface by utilizing a laser direct writing technology; transferring the photoresist relief structure of the first diffraction surface onto a substrate through reactive ion beam etching; and plating a semi-transparent and semi-reflective film on the first diffraction surface by electron beam evaporation, and finally forming a first diffraction surface with a relief structure on the incident surface of the substrate.
The relief structure of the second diffraction surface is etched on the emergent surface of the substrate, and the specific process is as follows: spin coating a layer of photoresist on the emergent surface of the glass substrate, and etching a photoresist relief structure of a second diffraction surface by using a laser direct writing technology after alignment; transferring the second diffractive surface photoresist relief structure to a substrate by reactive ion beam etching; finally, a second diffraction surface with a relief structure is formed on the emergent surface of the substrate.
The design of the transflective double-sided diffraction optical element is completed through the steps S100-S300, and as the designed transflective double-sided diffraction optical element is provided with different relief structures on the incident surface and the emergent surface of the substrate respectively, and the effects of respectively generating different diffraction patterns on the reflecting screen and the transmitting screen of the diffraction optical element are realized by combining the transflective film; has great application value in the fields of anti-counterfeiting, display and the like.
The foregoing description of the invention has been presented for purposes of illustration and description, and is not intended to be limiting. Several simple deductions, modifications or substitutions may also be made by a person skilled in the art to which the invention pertains, based on the idea of the invention.
Claims (6)
1. A transflective double-sided diffractive optical element, comprising: the incident surface of the substrate is a first diffraction surface with a relief structure, the emergent surface of the substrate is a second diffraction surface with a relief structure, and a semi-transparent and semi-reflective film is plated on the relief structure of the first diffraction surface; the relief structure of the first diffraction surface is set according to the reflection phase distribution information of the first diffraction surface, and the relief structure of the second diffraction surface is set according to the transmission phase distribution information of the second diffraction surface, wherein the transmission phase distribution of the second diffraction surface is set according to the transmission phase distribution of the first diffraction surface;
the first diffraction surface forms a first diffraction image through diffracted light reflected by the semi-transparent semi-reflective film;
the light transmitted by the first diffraction surface through the semi-transparent and semi-reflective film is added through the transmission phase of the second diffraction surface to form a second diffraction image;
the first diffraction image and the second diffraction image are different.
2. The transflector double sided diffractive optical element according to claim 1, wherein the relief structure of the first diffractive surface and the relief structure of the second diffractive surface are both two-step structures.
3. The transflective double-sided diffractive optical element according to claim 2, wherein the relief structure of the first diffractive surface and the relief structure of the second diffractive surface are each of a two-step structure with a different structure.
4. A transflective double-sided diffractive optical element according to claim 3, wherein the relief structure of the first diffractive surface has a step height of 150nm to 160nm and the relief structure of the second diffractive surface has a step height of 710nm to 720nm.
5. The transflective double-sided diffractive optical element according to claim 1, wherein the pixel units of the first diffractive surface and the second diffractive surface are square and have the same feature size.
6. A method of making a transflective double-sided diffractive optical element, comprising the steps of:
designing reflection phase distribution of a first diffraction surface according to a first target diffraction image and adopting an IFTA self-adaptive optimization algorithm, and setting a relief structure of the first diffraction surface according to reflection phase distribution information of the first diffraction surface; wherein:
the method for designing the reflection phase distribution of the first diffraction surface by adopting the IFTA self-adaptive optimization algorithm according to the first target diffraction image specifically comprises the following steps:
generating initial phase distribution of the first diffraction surface at random, generating complex amplitude distribution of the reflected light of the first diffraction surface, and performing iterative computation of the following steps S11-S14 on the complex amplitude distribution to obtain reflection phase distribution of the first diffraction surface:
s11: performing Fourier transform on the current complex amplitude distribution to obtain complex amplitude distribution of the image plane of the reflection area;
s12: replacing the amplitude of the reflection area image plane complex amplitude distribution with the amplitude distribution of the first target diffraction image to obtain a corrected reflection area image plane complex amplitude distribution;
s13: performing inverse Fourier transform on the modified complex amplitude distribution of the image plane of the reflection area to obtain modified complex amplitude distribution of the reflected light of the first diffraction plane;
s14: replacing the corrected complex amplitude distribution of the light reflected by the first diffraction surface with the current complex amplitude distribution, and returning to the step S11 for iterative calculation;
after iterating the steps S11-S14 for a preset number of times, obtaining the reflection phase distribution of the first diffraction surface, and obtaining the final reflection phase distribution of the first diffraction surface through step quantization;
designing transmission phase distribution of a second diffraction surface by adopting an IFTA self-adaptive optimization algorithm according to transmission phase distribution of a second target diffraction image and the first diffraction surface, and setting a relief structure of the second diffraction surface according to transmission phase distribution information of the second diffraction surface;
wherein:
the method for designing the transmission phase distribution of the second diffraction surface by adopting the IFTA self-adaptive optimization algorithm according to the transmission phase distribution of the second target diffraction image and the first diffraction surface specifically comprises the following steps:
acquiring a transmission phase of a first diffraction surface;
randomly generating initial phase distribution of the second diffraction surface, and superposing transmission phase distribution of the first diffraction surface to obtain complex amplitude distribution of the transmission light of the second diffraction surface;
the transmission phase distribution of the second diffraction plane is obtained by performing iterative calculation of the complex amplitude distribution as follows in step S21-step S24:
s21: performing Fourier transform on the current complex amplitude distribution to obtain complex amplitude distribution of the image plane of the transmission area;
s22: replacing the amplitude of the transmission area image plane complex amplitude distribution with the amplitude distribution of the second target diffraction image to obtain a corrected transmission area image plane complex amplitude distribution;
s23: performing inverse Fourier transform on the modified complex amplitude distribution of the image plane of the transmission area to obtain a modified complex amplitude distribution of the transmitted light of the second diffraction plane;
s24: replacing the corrected complex amplitude distribution of the transmitted light of the second diffraction surface with the current complex amplitude distribution, and returning to the step S21 for iterative calculation;
after iterating the steps S21-S24 for a preset number of times, obtaining the transmission phase distribution of the second diffraction surface, subtracting the transmission phase distribution of the first diffraction surface from the transmission phase distribution of the second diffraction surface, and obtaining the phase distribution added by the second diffraction surface through step quantization;
etching the relief structure of the first diffraction surface on the incident surface of the substrate, etching the relief structure of the second diffraction surface on the emergent surface of the substrate, and plating a semi-transparent semi-reflective film on the relief structure of the first diffraction surface to form the transflective double-sided diffraction optical element.
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07334861A (en) * | 1994-06-08 | 1995-12-22 | Sony Corp | Diffraction element and optical pickup |
| JP2007149249A (en) * | 2005-11-29 | 2007-06-14 | Asahi Glass Co Ltd | Diffraction element for three wavelength, diffraction element for three wavelength with topology plate and optical head apparatus |
| CN104249584A (en) * | 2013-06-28 | 2014-12-31 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element |
| CN105313528A (en) * | 2014-08-01 | 2016-02-10 | 中钞特种防伪科技有限公司 | Whole-parallax diffraction optical-variation-image optical anti-fake component |
| CN106537226A (en) * | 2014-06-30 | 2017-03-22 | 精工爱普生株式会社 | Image display device |
| CN107719851A (en) * | 2017-09-27 | 2018-02-23 | 中国科学院光电技术研究所 | One kind becomes pattern anti-fake relief type security devices |
| CN108254811A (en) * | 2018-01-19 | 2018-07-06 | 电子科技大学 | A kind of infrared optical window with three step anti-reflection structures and preparation method thereof |
| CN111007664A (en) * | 2019-12-18 | 2020-04-14 | 中国科学院光电技术研究所 | Design method of diffractive optical element with high diffraction efficiency and low speckle noise |
| CN112394435A (en) * | 2019-08-19 | 2021-02-23 | 上海鲲游光电科技有限公司 | Diffractive optical element and method for manufacturing same |
-
2022
- 2022-11-11 CN CN202211415142.5A patent/CN115657182B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07334861A (en) * | 1994-06-08 | 1995-12-22 | Sony Corp | Diffraction element and optical pickup |
| JP2007149249A (en) * | 2005-11-29 | 2007-06-14 | Asahi Glass Co Ltd | Diffraction element for three wavelength, diffraction element for three wavelength with topology plate and optical head apparatus |
| CN104249584A (en) * | 2013-06-28 | 2014-12-31 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element |
| CN106537226A (en) * | 2014-06-30 | 2017-03-22 | 精工爱普生株式会社 | Image display device |
| CN105313528A (en) * | 2014-08-01 | 2016-02-10 | 中钞特种防伪科技有限公司 | Whole-parallax diffraction optical-variation-image optical anti-fake component |
| CN107719851A (en) * | 2017-09-27 | 2018-02-23 | 中国科学院光电技术研究所 | One kind becomes pattern anti-fake relief type security devices |
| CN108254811A (en) * | 2018-01-19 | 2018-07-06 | 电子科技大学 | A kind of infrared optical window with three step anti-reflection structures and preparation method thereof |
| CN112394435A (en) * | 2019-08-19 | 2021-02-23 | 上海鲲游光电科技有限公司 | Diffractive optical element and method for manufacturing same |
| CN111007664A (en) * | 2019-12-18 | 2020-04-14 | 中国科学院光电技术研究所 | Design method of diffractive optical element with high diffraction efficiency and low speckle noise |
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