CN115650240A - The preparation method of monochlorosilane - Google Patents
The preparation method of monochlorosilane Download PDFInfo
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- CN115650240A CN115650240A CN202211096720.3A CN202211096720A CN115650240A CN 115650240 A CN115650240 A CN 115650240A CN 202211096720 A CN202211096720 A CN 202211096720A CN 115650240 A CN115650240 A CN 115650240A
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- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims abstract description 66
- 238000002360 preparation method Methods 0.000 title claims description 23
- 239000003054 catalyst Substances 0.000 claims abstract description 60
- 238000006243 chemical reaction Methods 0.000 claims abstract description 56
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 51
- 229910000077 silane Inorganic materials 0.000 claims abstract description 51
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims abstract description 50
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 27
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 25
- 239000000047 product Substances 0.000 claims abstract description 25
- 239000002994 raw material Substances 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 14
- 230000009471 action Effects 0.000 claims abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 27
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 27
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 27
- 239000001257 hydrogen Substances 0.000 claims description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims description 21
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 239000007788 liquid Substances 0.000 claims description 19
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical group [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 11
- 229910052801 chlorine Inorganic materials 0.000 claims description 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 10
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 claims description 10
- 150000002940 palladium Chemical class 0.000 claims description 10
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 8
- 238000001354 calcination Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 4
- 239000002808 molecular sieve Substances 0.000 claims description 4
- 238000000746 purification Methods 0.000 claims description 4
- 230000035484 reaction time Effects 0.000 claims description 4
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 4
- 229910000323 aluminium silicate Inorganic materials 0.000 claims description 3
- 239000007791 liquid phase Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 24
- 238000007323 disproportionation reaction Methods 0.000 abstract description 21
- 230000003197 catalytic effect Effects 0.000 abstract description 14
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 23
- 239000005052 trichlorosilane Substances 0.000 description 23
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 12
- 239000005049 silicon tetrachloride Substances 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 8
- 238000006555 catalytic reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000009835 boiling Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 4
- 239000013543 active substance Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 238000005660 chlorination reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- -1 as preferably Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000003837 high-temperature calcination Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- GPNDARIEYHPYAY-UHFFFAOYSA-N palladium(ii) nitrate Chemical compound [Pd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O GPNDARIEYHPYAY-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 1
- ZBZJXHCVGLJWFG-UHFFFAOYSA-N trichloromethyl(.) Chemical compound Cl[C](Cl)Cl ZBZJXHCVGLJWFG-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
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Abstract
本发明提供了一种一氯硅烷的制备方法,该制备方法包括:步骤S1,在催化剂的作用下,以硅烷和氯化物为原料在反应装置中进行反应,得到反应产物;步骤S2,将反应产物进行分离、提纯,得到一氯硅烷;上述催化剂含有金属钯、氯化铝和氧化铝。本申请采用特定的催化剂通过硅烷和氯化物直接合成一氯硅烷,原料较为易得,不同于二氯二氢硅歧化方法和硅烷与二氯二氢硅对称歧化法,本方法对反应条件要求较为温和,不受平衡反应影响,产物中产品的含量较高,易于提纯得到高纯度的一氯硅烷,而且该催化剂催化效果好,使用寿命长,有效降低了一氯硅烷的生产成本。
The invention provides a method for preparing monochlorosilane, which includes: step S1, under the action of a catalyst, react in a reaction device with silane and chloride as raw materials to obtain a reaction product; step S2, react The product is separated and purified to obtain monochlorosilane; the above-mentioned catalyst contains metal palladium, aluminum chloride and aluminum oxide. This application uses a specific catalyst to directly synthesize monochlorosilane through silane and chloride, and the raw materials are relatively easy to obtain. Different from the disproportionation method of dichlorodihydrosilane and the symmetrical disproportionation method of silane and dichlorodihydrosilane, this method has relatively high requirements for reaction conditions. It is mild and not affected by the equilibrium reaction. The content of the product is relatively high, and it is easy to purify to obtain high-purity monochlorosilane. Moreover, the catalyst has good catalytic effect and long service life, and effectively reduces the production cost of monochlorosilane.
Description
技术领域technical field
本发明涉及一氯硅烷的合成领域,具体而言,涉及一种一氯硅烷的制备方法。The invention relates to the field of synthesis of monochlorosilane, in particular to a preparation method of monochlorosilane.
背景技术Background technique
一氯硅烷是一种硅基前驱体,主要用于与氨反应合成三甲硅烷基氨,三甲硅烷基氨作为半导体制造的硅源,沉积氮化硅等薄膜的硅源材料,因其不含氯,在存储器和逻辑芯片中应用广泛。Monochlorosilane is a silicon-based precursor, which is mainly used to react with ammonia to synthesize trisilyl ammonia. Trisilyl ammonia is used as a silicon source for semiconductor manufacturing and silicon source materials for depositing thin films such as silicon nitride, because it does not contain chlorine , widely used in memory and logic chips.
目前一氯硅烷的合成方法主要有硅烷与二氯二氢硅归中法和二氯二氢硅歧化法。At present, the synthesis methods of monochlorosilane mainly include the neutralization method of silane and dichlorodihydrosilane and the disproportionation method of dichlorodihydrosilane.
申请号为201280008841.6的中国专利申请公开了一氯硅烷制备方法和装置,该制备方法是在催化剂存在下,采用硅烷和二氯二氢硅反应制备一氯硅烷,称为对称歧化反应。实际上是三氯氢硅歧化制备硅烷工艺的第三步反应的逆反应,即硅烷和二氯二氢硅反歧化生成一氯硅烷;催化剂为弱碱性阴离子交换树脂,功能基团主要为叔胺基;最后再利用精馏进行分离纯化。The Chinese patent application with application number 201280008841.6 discloses a method and device for preparing monochlorosilane. The preparation method is to prepare monochlorosilane by reacting silane and dichlorodihydrosilane in the presence of a catalyst, which is called a symmetrical disproportionation reaction. In fact, it is the reverse reaction of the third step reaction of the disproportionation of trichlorosilane to prepare silane, that is, the disproportionation of silane and dichlorodihydrosilane to generate monochlorosilane; the catalyst is a weakly basic anion exchange resin, and the functional group is mainly a tertiary amine base; and finally separated and purified by rectification.
申请号为202011623031.4的中国专利申请公开了一种生产硅烷、一氯硅烷、二氯硅烷和六氯乙硅烷的系统,采用歧化反应精馏塔进行一氯硅烷的制备,以三氯氢硅为原料,经两步歧化制备含一氯硅烷混合物,再通过多级精馏进行纯化,制备得到纯度97%的一氯硅烷。三氯氢硅在催化剂的催化作用下进行歧化反应,同时,体系也存在反歧化反应,通过控制不同物质的量来打破反应平衡,实现制备目标产品的目的。The Chinese patent application with the application number 202011623031.4 discloses a system for producing silane, monochlorosilane, dichlorosilane and hexachlorodisilane. The disproportionation reaction distillation column is used for the preparation of monochlorosilane, and trichlorosilane is used as raw material , the mixture containing monochlorosilane was prepared by two-step disproportionation, and then purified by multi-stage rectification to prepare monochlorosilane with a purity of 97%. Trichlorosilane undergoes a disproportionation reaction under the catalysis of the catalyst, and at the same time, there is an anti-disproportionation reaction in the system, and the reaction balance is broken by controlling the amount of different substances to achieve the purpose of preparing the target product.
上述两种方法本质上是氯硅烷的歧化反应或反歧化反应,涉及的主要反应式如下。The above two methods are essentially disproportionation reactions or anti-disproportionation reactions of chlorosilanes, and the main reaction formulas involved are as follows.
采用歧化反应或反歧化反应,在催化剂的作用下,通过控制不同物质的量来打破反应平衡,实现一氯硅烷的制备。由于过程涉及三个平衡反应,无法针对某一反应进行定向控制,使得反应产物中始终存在三氯氢硅、四氯化硅、二氯二氢硅、一氯硅烷等混合物。因混合物涉及多种组分,需使用多级精馏塔来实现各物质的分离,其主要的缺点是平衡反应不易控制,存在副反应,分离提纯困难,工艺流程复杂。Using disproportionation reaction or anti-disproportionation reaction, under the action of catalyst, the reaction balance is broken by controlling the amount of different substances, and the preparation of monochlorosilane is realized. Since the process involves three equilibrium reactions, it is impossible to conduct directional control for a certain reaction, so that there are always mixtures of trichlorosilane, silicon tetrachloride, dichlorodihydrosilane, and monochlorosilane in the reaction product. Because the mixture involves multiple components, multi-stage rectification towers are required to separate the substances. The main disadvantages are that the equilibrium reaction is not easy to control, there are side reactions, separation and purification are difficult, and the process is complicated.
发明内容Contents of the invention
本发明的主要目的在于提供一种一氯硅烷的合成方法,以解决现有技术中一氯硅烷反应平衡不易控制、工艺流程复杂进而导致生产成本偏高的问题。The main purpose of the present invention is to provide a method for synthesizing monochlorosilane, so as to solve the problems in the prior art that the reaction balance of monochlorosilane is difficult to control, the process flow is complicated, and the production cost is relatively high.
为了实现上述目的,根据本发明的一个方面,提供了一种一氯硅烷的制备方法,该制备方法包括:步骤S1,在催化剂的作用下,以硅烷和氯化物为原料在反应装置中进行反应,得到反应产物;步骤S2,将反应产物进行分离、提纯,得到一氯硅烷;催化剂含有金属钯、氯化铝和氧化铝。In order to achieve the above object, according to one aspect of the present invention, a method for preparing monochlorosilane is provided, the preparation method comprising: step S1, under the action of a catalyst, react in a reaction device with silane and chloride as raw materials , to obtain a reaction product; step S2, separating and purifying the reaction product to obtain monochlorosilane; the catalyst contains metal palladium, aluminum chloride and aluminum oxide.
进一步地,催化剂还包括载体,优选的载体为活性炭、分子筛和铝硅酸盐中的任意一种或者多种;优选的,催化剂中金属钯的含量为0.1~10wt%,氯化铝的含量为1~20wt%,氧化铝的含量为1~20wt%;更优选的,金属钯的含量为1.0~7.0wt%,氯化铝的含量为2.0~5.0wt%,氧化铝的含量为2.0~5.0wt%。Further, the catalyst also includes a carrier, and the preferred carrier is any one or more of activated carbon, molecular sieve and aluminosilicate; preferably, the content of metal palladium in the catalyst is 0.1 to 10wt%, and the content of aluminum chloride is 1~20wt%, the content of alumina is 1~20wt%; more preferably, the content of metal palladium is 1.0~7.0wt%, the content of aluminum chloride is 2.0~5.0wt%, the content of alumina is 2.0~5.0 wt%.
进一步地,催化剂的制备方法包括:将钯盐、氯化铝、氧化铝与载体进行混合,在氢气氛围中煅烧2~10h;优选的,钯盐为醋酸钯;优选的,煅烧的温度为100~500℃,更优选为200~300℃。Further, the preparation method of the catalyst comprises: mixing palladium salt, aluminum chloride, alumina and the carrier, and calcining in a hydrogen atmosphere for 2 to 10 hours; preferably, the palladium salt is palladium acetate; preferably, the calcining temperature is 100 ~500°C, more preferably 200-300°C.
进一步地,氯化物为氯化氢、四氯化碳、氯气中的任意一种或者多种,优选氯化物与硅烷的摩尔比为1~10:1,更优选为1~3:1。Further, the chloride is any one or more of hydrogen chloride, carbon tetrachloride and chlorine, preferably the molar ratio of chloride to silane is 1-10:1, more preferably 1-3:1.
进一步地,步骤S1中反应的温度为10~300℃,时间为10~60min;优选,反应的温度为40~80℃,时间为20~30min。Further, the reaction temperature in step S1 is 10-300° C., and the time is 10-60 minutes; preferably, the reaction temperature is 40-80° C., and the time is 20-30 minutes.
进一步地,步骤S1中反应的压力为10~500kPa;优选反应的压力为200~300kPa。Further, the reaction pressure in step S1 is 10-500 kPa; preferably, the reaction pressure is 200-300 kPa.
进一步地,步骤S2包括:将反应产物通入深冷器,分离出含有产物的液体组分,将液体组分进行提纯,得到一氯硅烷。Further, step S2 includes: passing the reaction product into a deep cooler, separating the liquid component containing the product, and purifying the liquid component to obtain monochlorosilane.
进一步地,深冷器内的温度为-60~0℃,优选为-50~-40℃,压力为10~500kPa。Further, the temperature in the cryocooler is -60 to 0°C, preferably -50 to -40°C, and the pressure is 10 to 500kPa.
进一步地,液相组分通过精馏进行提纯;优选的,精馏通过两级精馏塔串联进行;更优选的,两级精馏塔中的第一精馏塔用以脱除轻组分,两级精馏塔中的第二精馏塔用以脱除重组分,一氯甲烷从第二精馏塔的塔顶馏出。Further, the liquid phase components are purified by rectification; preferably, the rectification is carried out in series through two-stage rectification towers; more preferably, the first rectification tower in the two-stage rectification towers is used to remove light components , the second rectification tower in the two-stage rectification tower is used for removing heavy components, and monochloromethane is distilled from the top of the second rectification tower.
进一步地,第一精馏塔顶的压力为50~800kPa,温度为-50~50℃,优选压力为100~200kPa,温度为-15~5℃;和/或,第二精馏塔顶的压力为50~800kPa,温度-50~50℃,优选压力为50~100kPa,温度为-20~-10℃。Further, the pressure at the top of the first rectification tower is 50 to 800kPa, the temperature is -50 to 50°C, preferably the pressure is 100 to 200kPa, and the temperature is -15 to 5°C; and/or, the top of the second rectification tower The pressure is 50-800kPa, the temperature is -50-50°C, preferably the pressure is 50-100kPa, and the temperature is -20--10°C.
应用本发明的技术方案,采用特定的催化剂通过硅烷和氯化物直接合成一氯硅烷,原料较为易得,不同于二氯二氢硅歧化方法和硅烷与二氯二氢硅对称歧化法,本方法对反应条件要求较为温和,不受平衡反应影响,产物中产品的含量较高,易于提纯得到高纯度的一氯硅烷。本申请的催化剂中含有金属钯、氯化铝和氧化铝,其中的靶、铝是催化剂的活性物质,与硅烷等发生配位使其活化,诱导氯源攻击而发生氯化反应,其中三氯化铝可以直接参与催化反应,氧化铝可以与在反应中提供反应的载体,一定情况下,氧化铝也可反应转化为三氯化铝参与催化反应。而且该催化剂催化效果好,使用寿命长,有效降低了一氯硅烷的生产成本。Applying the technical scheme of the present invention, a specific catalyst is used to directly synthesize monochlorosilane through silane and chloride, and the raw materials are relatively easy to obtain, which is different from the disproportionation method of dichlorodihydrosilane and the symmetrical disproportionation method of silane and dichlorodihydrosilane. The requirements for reaction conditions are relatively mild, and it is not affected by the equilibrium reaction. The content of the product in the product is relatively high, and it is easy to purify to obtain high-purity monochlorosilane. The catalyst of the present application contains metal palladium, aluminum chloride and alumina. The target and aluminum are the active substances of the catalyst, which are activated by coordination with silane, and induce the attack of chlorine source to cause chlorination reaction. Among them, trichloro Alumina can directly participate in the catalytic reaction, and alumina can provide a carrier for the reaction in the reaction. Under certain circumstances, alumina can also be converted into aluminum trichloride to participate in the catalytic reaction. Moreover, the catalyst has good catalytic effect and long service life, and effectively reduces the production cost of monochlorosilane.
附图说明Description of drawings
构成本申请的一部分的说明书附图用来提供对本发明的进一步理解,本发明的示意性实施例及其说明用于解释本发明,并不构成对本发明的不当限定。在附图中:The accompanying drawings constituting a part of the present application are used to provide a further understanding of the present invention, and the schematic embodiments and descriptions of the present invention are used to explain the present invention, and do not constitute an improper limitation of the present invention. In the attached picture:
图1示出了根据本发明实施例1的制备流程示意图。Fig. 1 shows a schematic diagram of the preparation process according to Example 1 of the present invention.
其中,上述附图包括以下附图标记:1、氯化物;2、硅烷;3、反应产物;4、气态组分;5、液态组分;6、轻组分;7、重组分;8、一氯甲烷;9、高沸物;100、催化反应器;200、深冷器;300、精馏1塔;400、精馏2塔。Wherein, the above drawings include the following reference signs: 1. chloride; 2. silane; 3. reaction product; 4. gaseous component; 5. liquid component; 6. light component; 7. heavy component; 8. Chloromethane; 9, high boilers; 100, catalytic reactor; 200, deep cooler; 300, 1 rectification tower; 400, 2 rectification towers.
具体实施方式Detailed ways
需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互组合。下面将参考附图并结合实施例来详细说明本发明。It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and examples.
如本申请背景技术所分析的,现有技术中通过歧化反应制备一氯甲烷,存在平衡不易控制,产物中产品含量较低,分离工艺复杂,导致生产成本较高的问题,为了解决该问题,本申请提供了一种一氯硅烷的制备方法,该制备方法包括:步骤S1,在催化剂的作用下,以硅烷和氯化物为原料在反应装置中进行反应,得到反应产物;步骤S2,将反应产物进行分离、提纯,得到一氯硅烷;上述催化剂含有金属钯、氯化铝和氧化铝。As analyzed in the background technology of the present application, the preparation of monochloromethane by disproportionation reaction in the prior art has the problem that the balance is not easy to control, the product content in the product is low, and the separation process is complicated, resulting in higher production costs. In order to solve this problem, The application provides a method for preparing monochlorosilane, which includes: step S1, under the action of a catalyst, react in a reaction device with silane and chloride as raw materials to obtain a reaction product; step S2, react The product is separated and purified to obtain monochlorosilane; the above-mentioned catalyst contains metal palladium, aluminum chloride and aluminum oxide.
本申请采用特定的催化剂通过硅烷和氯化物直接合成一氯硅烷,原料较为易得,不同于二氯二氢硅歧化方法和硅烷与二氯二氢硅对称歧化法,本方法对反应条件要求较为温和,不受平衡反应影响,产物中产品的含量较高,易于提纯得到高纯度的一氯硅烷。本申请的催化剂中含有金属钯、氯化铝和氧化铝,其中的靶、铝是催化剂的活性物质,与硅烷等发生配位使其活化,诱导氯源攻击而发生氯化反应,其中三氯化铝可以直接参与催化反应,氧化铝可以与在反应中提供反应的载体,一定情况下,氧化铝也可反应转化为三氯化铝参与催化反应。而且该催化剂催化效果好,使用寿命长,有效降低了一氯硅烷的生产成本。This application uses a specific catalyst to directly synthesize monochlorosilane through silane and chloride, and the raw materials are relatively easy to obtain. Different from the disproportionation method of dichlorodihydrosilane and the symmetrical disproportionation method of silane and dichlorodihydrosilane, this method has relatively high requirements for reaction conditions. Mild, not affected by the equilibrium reaction, the content of the product in the product is relatively high, and it is easy to purify to obtain high-purity monochlorosilane. The catalyst of the present application contains metal palladium, aluminum chloride and alumina. The target and aluminum are the active substances of the catalyst, which are activated by coordination with silane, and induce the attack of chlorine source to cause chlorination reaction. Among them, trichloro Alumina can directly participate in the catalytic reaction, and alumina can provide a carrier for the reaction in the reaction. Under certain circumstances, alumina can also be converted into aluminum trichloride to participate in the catalytic reaction. Moreover, the catalyst has good catalytic effect and long service life, and effectively reduces the production cost of monochlorosilane.
为了增加催化剂的比表面积,进一步提高催化效率,上述催化剂还包括载体,将金属钯、氯化铝和氧化铝均匀的负载于载体上。上述催化剂的载体可以从现有技术中进行选择,比如活性炭、分子筛和铝硅酸盐中的任意一种或者多种,载体和各负载组分的含量可根据载体的负载能力确定。In order to increase the specific surface area of the catalyst and further improve the catalytic efficiency, the above-mentioned catalyst also includes a carrier, and metal palladium, aluminum chloride and aluminum oxide are evenly loaded on the carrier. The carrier of the above catalyst can be selected from the prior art, such as any one or more of activated carbon, molecular sieve and aluminosilicate, and the content of the carrier and each supporting component can be determined according to the loading capacity of the carrier.
在本申请的一些优选的实施方式中,为了进一步提高催化剂的催化效率,上述催化剂中金属钯的含量为0.1~10wt%,氯化铝的含量为1~20wt%,氧化铝的含量为1~20wt%;更优选,金属钯的含量为1.0~7.0wt%,氯化铝的含量为2.0~5.0wt%,氧化铝的含量为2.0~5.0wt%,催化效率更佳。上述催化剂的用量可以根据进料量体积确定,能够与反应原料充分接触即可,由于该催化剂结构稳定,可以长时间反复使用。上述催化剂可根据现有技术进行制备,在本申请的一些优选的实施例中,催化剂的制备方法包括:将钯盐、氯化铝、氧化铝与载体进行混合,在氢气氛围中煅烧2~10h,通过高温煅烧,可以使催化剂的有效成分牢固的结合在载体上,行程稳定的孔道结构,另外在氢气氛围中可以将钯盐还原为金属态,通过高温还原制备的催化剂,结构更加稳定、强度更大,金属附着力强,分布均匀,催化效果好,寿命长。其中钯盐可以是氯化钯、硝酸钯、硫酸钯、醋酸钯等常见钯盐,作为优选,钯盐为醋酸钯,醋酸钯是可溶解的钯盐,在制备时更易分散,在催化剂基体中分布更均匀。同时易于分解,分解的碳以二氧化碳气体形式逸出,无残留杂质。作为优选,煅烧的温度为100~500℃,更优选为200~300℃。In some preferred embodiments of the present application, in order to further improve the catalytic efficiency of the catalyst, the content of metal palladium in the above-mentioned catalyst is 0.1-10 wt%, the content of aluminum chloride is 1-20 wt%, and the content of aluminum oxide is 1-20 wt%. 20wt%; more preferably, the content of metal palladium is 1.0-7.0wt%, the content of aluminum chloride is 2.0-5.0wt%, the content of aluminum oxide is 2.0-5.0wt%, and the catalytic efficiency is better. The amount of the above-mentioned catalyst can be determined according to the volume of the feed, as long as it can fully contact with the reaction raw materials, because the catalyst has a stable structure, it can be used repeatedly for a long time. The above-mentioned catalyst can be prepared according to the prior art. In some preferred embodiments of the present application, the preparation method of the catalyst includes: mixing palladium salt, aluminum chloride, aluminum oxide and a carrier, and calcining in a hydrogen atmosphere for 2 to 10 hours , through high-temperature calcination, the active ingredients of the catalyst can be firmly combined on the carrier, and the pore structure is stable. In addition, the palladium salt can be reduced to a metal state in a hydrogen atmosphere. The catalyst prepared by high-temperature reduction has a more stable structure and strength. Larger, strong metal adhesion, uniform distribution, good catalytic effect and long life. Wherein the palladium salt can be common palladium salts such as palladium chloride, palladium nitrate, palladium sulfate, palladium acetate, as preferably, the palladium salt is palladium acetate, and palladium acetate is a soluble palladium salt, which is easier to disperse during preparation, in the catalyst matrix more evenly distributed. At the same time, it is easy to decompose, and the decomposed carbon escapes in the form of carbon dioxide gas without residual impurities. Preferably, the calcination temperature is 100-500°C, more preferably 200-300°C.
上述氯化物可以从现有技术中进行选择,在本申请的一些实施例中,氯化物为氯化氢、四氯化碳、氯气中的任意一种或者多种,其中,当氯化物为氯化氢和/或氯气时,催化剂中的氧化铝可以反应转化为氯化铝参与催化反应。氯化物与硅烷的摩尔比可以参考化学计量比,在本申请的一些实施例中,氯化物与硅烷的摩尔比为1~10:1。示例性的,氯化物与硅烷的摩尔比为1:1、2:1、3:1、4:1、5:1、6:1、7:1、8:1、9:1、10:1,或者任意二者的构成的范围。氯化物与硅烷的摩尔比会影响生成产物的种类,上述摩尔比有利于减少生成物中的二氯硅烷、三氯硅烷以及四氯硅烷的含量,在一些优选的实施例中,氯化物与硅烷的摩尔比为1~3:1。Above-mentioned chloride can be selected from prior art, and in some embodiments of the present application, chloride is any one or more in hydrogen chloride, carbon tetrachloride, chlorine, wherein, when chloride is hydrogen chloride and/or or chlorine gas, the alumina in the catalyst can be converted into aluminum chloride to participate in the catalytic reaction. The molar ratio of chloride to silane can refer to the stoichiometric ratio. In some embodiments of the present application, the molar ratio of chloride to silane is 1˜10:1. Exemplary, the molar ratio of chloride to silane is 1:1, 2:1, 3:1, 4:1, 5:1, 6:1, 7:1, 8:1, 9:1, 10: 1, or any combination of both. The molar ratio of chloride and silane can affect the type of product, and the above molar ratio is conducive to reducing the content of dichlorosilane, trichlorosilane and tetrachlorosilane in the product. In some preferred embodiments, chloride and silane The molar ratio is 1 to 3:1.
上述的反应装置可以是间歇式的,也可以是连续式的,比如盘管式反应器或者固定床反应器,能够使反应物料和催化剂良好接触,有良好的密封性和一定的耐压性能即可。The above-mentioned reaction device can be batch type or continuous type, such as a coil reactor or a fixed bed reactor, which can make the reaction material and the catalyst contact well, and has good sealing and certain pressure resistance. Can.
在本申请的一些实施例中,为了进一步提高产物的收率,上述步骤S1中反应的温度为10~300℃,时间为10~60min,如果是连续式反应装置,则物料在反应装置内的停留时间为10~60min;作为优选,反应的温度为40~80℃,时间为20~30min,能够进一步提高原料的转化率和一氯硅烷的收率。在本申请的一些典型的实施例中,为了提高反应收率,上述催化反应在一定的压力下进行,一般情况下,压力增大,反应器内单位体积内部原料的分子数量多,更易与催化剂接触并反应,反应产率随之升高。受催化剂比表面积的限制,压力的影响会逐步形成平衡,即继续增大压力,对转化率影响变化不大,而且过高的压力对催化剂的结构稳定性会有影响。优选的,步骤S1中反应的压力为10~500kPa,压力为表压,本申请中若不做特殊说明,压力均表示表压;更优选反应的压力为200~300kPa,目标产物收率较高。In some embodiments of the present application, in order to further increase the yield of the product, the temperature of the reaction in the above step S1 is 10-300° C., and the time is 10-60 minutes. If it is a continuous reaction device, the reaction time of the material in the reaction device The residence time is 10-60 min; preferably, the reaction temperature is 40-80° C. and the reaction time is 20-30 min, which can further increase the conversion rate of raw materials and the yield of monochlorosilane. In some typical embodiments of the present application, in order to improve the reaction yield, the above-mentioned catalytic reaction is carried out under a certain pressure. Generally speaking, as the pressure increases, the number of molecules of the raw material per unit volume in the reactor is more, and it is easier to combine with the catalyst. Contact and reaction, the reaction yield increases accordingly. Limited by the specific surface area of the catalyst, the influence of the pressure will gradually form a balance, that is, if the pressure continues to increase, the effect on the conversion rate will not change much, and the excessive pressure will affect the structural stability of the catalyst. Preferably, the reaction pressure in step S1 is 10-500kPa, and the pressure is gauge pressure. Unless otherwise specified in this application, all pressures represent gauge pressure; more preferably, the reaction pressure is 200-300kPa, and the yield of the target product is higher .
反应完毕后,对产物一氯硅烷的分离提纯可以参考现有技术。在本申请的一些实施例中,上述步骤S2包括:将反应产物通入深冷器,得到含有产物的液体组分,将气体组分送入尾气系统集中处理,将液体组分进行提纯,得到一氯硅烷。反应体系中,硅烷、氯化氢、氢气等的沸点较低,一氯硅烷、四氯化碳、三氯化碳等沸点较高,在适宜的温度和压力下,前者为气体,可以方便的与后者分离,分离后的气体组分可以根据现有技术中的方法进行处理,比如送入尾气系统中集中处理,进行物料的分类回收。After the reaction is completed, the separation and purification of the product monochlorosilane can refer to the prior art. In some embodiments of the present application, the above step S2 includes: passing the reaction product into a deep cooler to obtain a liquid component containing the product, sending the gas component to the tail gas system for centralized treatment, and purifying the liquid component to obtain Monochlorosilane. In the reaction system, the boiling points of silane, hydrogen chloride, hydrogen, etc. are relatively low, and the boiling points of monochlorosilane, carbon tetrachloride, and carbon trichloride are relatively high. The separated gas components can be processed according to the methods in the prior art, for example, sent to the tail gas system for centralized treatment, and the classified recovery of materials is carried out.
在本申请的一些实施例中,为了更好的将上述含有原料的气体组分和含有产物的液体组分在深冷器中分离,深冷器内的温度为-60~0℃,优选为-50~-40℃,压力为10~500kPa。深冷器中带压,一方面可以提高物料中一氯硅烷(MCS)\二氯硅烷(DCS)\四氯硅烷(STC)等物质的冷凝温度,使得深冷器可以将温度控制的高一些,节约能耗;另一方面与后续精馏塔保持压力差,依靠压差便于进行物料的传输。In some embodiments of the present application, in order to better separate the above-mentioned gaseous components containing raw materials and liquid components containing products in the cryocooler, the temperature in the cryocooler is -60 to 0°C, preferably -50~-40℃, the pressure is 10~500kPa. With pressure in the cryocooler, on the one hand, it can increase the condensation temperature of monochlorosilane (MCS) \ dichlorosilane (DCS) \ tetrachlorosilane (STC) in the material, so that the cryocooler can control the temperature higher , saving energy consumption; on the other hand, it maintains a pressure difference with the subsequent rectification tower, and relies on the pressure difference to facilitate material transmission.
通过深冷分离出的液体组分可以根据现有技术进一步分离得到一氯硅烷,在本申请的一些实施例中,液相组分通过精馏进行提纯,作为优选,精馏通过两级精馏塔串联进行,可以将两级精馏塔中的第一精馏塔用以脱除轻组分,两级精馏塔中的第二精馏塔用以脱除重组分,一氯甲烷从第二精馏塔的塔顶馏出。The liquid component separated by deep cooling can be further separated to obtain monochlorosilane according to the prior art. In some embodiments of the present application, the liquid component is purified by rectification. As a preference, the rectification is carried out by two-stage rectification The towers are connected in series, the first rectification tower in the two-stage rectification tower can be used to remove light components, the second rectification tower in the two-stage rectification tower is used to remove heavy components, and monochloromethane can be removed from the second rectification tower Distillate from the top of the second distillation column.
两级精馏塔的温度和压力可以根据液体组分中各组分的沸点和含量确定,在本申请的一些实施例中,为了更高效的分离出高纯度的一氯硅烷,所述第一精馏塔顶的压力为50~800kPa,温度为-50~50℃,优选压力为100~200kPa,温度为-15~5℃;和/或,所述第二精馏塔顶的压力为50~800kPa,温度-50~50℃,优选压力为50~100kPa,温度为-20~-10℃。The temperature and pressure of the two-stage rectification tower can be determined according to the boiling point and content of each component in the liquid component. In some embodiments of the present application, in order to separate high-purity monochlorosilane more efficiently, the first The pressure at the top of the rectification tower is 50-800kPa, the temperature is -50-50°C, preferably the pressure is 100-200kPa, and the temperature is-15-5°C; and/or, the pressure at the top of the second rectification tower is 50 ~800kPa, temperature -50~50°C, preferably pressure 50~100kPa, temperature -20~-10°C.
下面将结合实施例和对比例进一步说明本申请的有益效果。The beneficial effects of the present application will be further described below in conjunction with examples and comparative examples.
实施例1Example 1
首先制备催化剂,催化剂中醋酸钯、氯化铝、氧化铝、载体的重量比为1:3:3:93,其中载体为活性炭。催化剂按照如下步骤制备:将1重量份醋酸钯、3重量份氯化铝、3重量份氧化铝和93量份活性炭搅拌混合,混合均匀后,在200℃下,氢气气氛中煅烧5h,得到催化剂。Firstly, the catalyst is prepared. The weight ratio of palladium acetate, aluminum chloride, aluminum oxide and the carrier in the catalyst is 1:3:3:93, wherein the carrier is activated carbon. The catalyst is prepared according to the following steps: Stir and mix 1 part by weight of palladium acetate, 3 parts by weight of aluminum chloride, 3 parts by weight of alumina and 93 parts by weight of activated carbon. After mixing evenly, calcinate at 200 ° C for 5 hours in a hydrogen atmosphere to obtain the catalyst .
本实施例采用如附图1所示的装置制备一氯硅烷。In this embodiment, a device as shown in Figure 1 is used to prepare monochlorosilane.
在直径为DN100、长度为1500mm的催化反应器100内装填上述2500g催化剂,氯化物1为氯化氢,控制进料氯化物1与硅烷2的摩尔比为1:1,进入催化反应器100,进料量为100kg/h,控制反应温度50℃,压力200kPa,停留时间20min,得到反应产物3。使用安捷伦气相色谱7890B,采用气相色谱法对反应产物中的组成进行检测,其中,以摩尔百分含量计,一氯硅烷的含量为18%,硅烷的含量为22%,氯化氢的含量为30%,二氯二氢硅的含量为2%,三氯氢硅的含量为2%,四氯化硅的含量为1%,氢气的含量为25%。In the
将反应产物3通入深冷器200,温度为-50℃,控制压力为200kPa,该条件下反应产物3分成气态组分4和液态组分5,未反应的硅烷、氯化氢和反应生成的氢气主要存在于气态组分4中,一氯硅烷、二氯二氢硅、三氯氢硅、四氯化硅等主要存在于液态组分5中,将气态组分4和液态组分5分离,得到气态组分4中的氢气、硅烷、氯化氢送入尾气系统集中处理。Pass the
将分离出的液态组分5的物料进入两级精馏塔进行精馏纯化。精馏塔采用串联形式,第一精馏塔300脱除轻组分6,第二精馏塔400脱除重组分9,在第二精馏塔400塔顶得到产品一氯硅烷8。第一精馏塔300顶部压力为200kPa,塔顶温度为0~5℃,第一精馏塔300塔顶采出轻组分6氯化氢、硅烷,可以返回至催化反应器100作为反应的原料。塔釜组分为重组分7,含有一氯硅烷、二氯二氢硅、三氯氢硅、四氯化硅混合物,进入第二精馏塔400。第二精馏塔400为脱重塔,压力为50kPa,塔顶温度为-20℃,第二精馏塔400塔顶采出产品一氯硅烷8,纯度为99.5%(GC),塔釜采出二氯二氢硅、三氯氢硅、四氯化硅等高沸物9。The material of the separated
实施例2Example 2
与实施例1的不同之处在于:氯化物为氯化氢,氯化氢与硅烷的摩尔比为3:1。The difference from Example 1 is that the chloride is hydrogen chloride, and the molar ratio of hydrogen chloride to silane is 3:1.
以摩尔百分含量计,反应产物中一氯硅烷的含量为20%,硅烷的含量为15%,氯化氢的含量为39%,二氯二氢硅的含量为4%,三氯氢硅的含量为2%,四氯化硅的含量为1%,氢气的含量为19%。In molar percentage, the content of monochlorosilane in the reaction product is 20%, the content of silane is 15%, the content of hydrogen chloride is 39%, the content of dichlorodihydrosilane is 4%, the content of trichlorosilane The content of silicon tetrachloride is 2%, the content of silicon tetrachloride is 1%, and the content of hydrogen is 19%.
将反应产物通入深冷器,温度为-50℃,控制压力为200kPa,将气态组分和液态组分分离,气态组分中含有未反应的硅烷、氯化氢和反应生成的氢气,液态组分中含有一氯硅烷、二氯二氢硅、三氯氢硅、四氯化硅等。Pass the reaction product into the cryocooler at a temperature of -50°C and control the pressure at 200kPa to separate the gaseous components from the liquid components. The gaseous components contain unreacted silane, hydrogen chloride and hydrogen generated by the reaction, and the liquid components Contains monochlorosilane, dichlorodihydrosilane, trichlorosilane, silicon tetrachloride, etc.
采用和实施例1相同的精馏塔及精馏条件,第一精馏塔塔顶采出氯化氢和硅烷等低沸物,可以返回至催化反应器作为反应的原料;第二精馏塔塔顶采出产品一氯硅烷,纯度为99.5%(GC),塔釜采出二氯二氢硅、三氯氢硅、四氯化硅等高沸点物质。Adopt the rectifying tower identical with embodiment 1 and rectifying condition, the first rectifying tower overhead produces hydrogen chloride and silane etc. low boiler, can be returned to catalytic reactor as the raw material of reaction; The second rectifying tower tower top The extracted product monochlorosilane has a purity of 99.5% (GC), and high boiling point substances such as dichlorodihydrosilane, trichlorosilane, and silicon tetrachloride are extracted from the tower kettle.
实施例3Example 3
与实施例1的不同之处在于:氯化物为氯气,氯气与硅烷的摩尔比为1:1。The difference from Example 1 is that the chloride is chlorine, and the molar ratio of chlorine to silane is 1:1.
以摩尔百分含量计,反应产物中一氯硅烷的含量为16%,硅烷的含量为16%,氯化氢的含量为25%,二氯二氢硅的含量为6%,三氯氢硅的含量为3%,四氯化硅的含量为2%,氢气的含量为3%,氯气的含量为29%。In molar percentage, the content of monochlorosilane in the reaction product is 16%, the content of silane is 16%, the content of hydrogen chloride is 25%, the content of dichlorodihydrosilane is 6%, the content of trichlorosilane The content of silicon tetrachloride is 2%, the content of hydrogen is 3%, and the content of chlorine is 29%.
将反应产物通入深冷器,温度为-40℃,控制压力为300kPa,将气态组分和液态组分分离,气态组分中含有未反应的硅烷、氢气和反应生成的氯化氢,液态组分中含有一氯硅烷、二氯二氢硅、三氯氢硅、四氯化硅等。Pass the reaction product into the cryocooler at a temperature of -40°C and control the pressure at 300kPa to separate the gaseous components from the liquid components. The gaseous components contain unreacted silane, hydrogen and hydrogen chloride produced by the reaction, and the liquid components Contains monochlorosilane, dichlorodihydrosilane, trichlorosilane, silicon tetrachloride, etc.
采用和实施例1相同的精馏塔及精馏条件,第一精馏塔塔顶采出氯化氢、氯气和硅烷,可以返回至催化反应器作为反应的原料;第二精馏塔塔顶采出产品一氯硅烷,纯度为99%(GC),塔釜采出二氯二氢硅、三氯氢硅、四氯化硅等高沸点物质。Using the same rectification tower and rectification conditions as in Example 1, hydrogen chloride, chlorine and silane are produced from the top of the first rectification tower, which can be returned to the catalytic reactor as raw materials for the reaction; The product monochlorosilane has a purity of 99% (GC), and dichlorodihydrosilane, trichlorosilane, silicon tetrachloride and other high boiling point substances are extracted from the tower reactor.
实施例4Example 4
与实施例1的不同之处在于:氯化氢与硅烷的摩尔比为10:1。The difference from Example 1 is that the molar ratio of hydrogen chloride to silane is 10:1.
反应产物中一氯硅烷的含量为9%,硅烷的含量为4%,氯化氢的含量为68%,二氯二氢硅的含量为10%,三氯氢硅的含量为4%,四氯化硅的含量为3%,氢气的含量为2%。The content of monochlorosilane in the reaction product is 9%, the content of silane is 4%, the content of hydrogen chloride is 68%, the content of dichlorodihydrosilane is 10%, the content of trichlorosilane is 4%, tetrachloride The silicon content is 3%, and the hydrogen content is 2%.
实施例5Example 5
与实施例1的不同之处在于:催化剂中醋酸钯、氯化铝、氧化铝、载体的重量比为2:3:5:90。The difference from Example 1 is that the weight ratio of palladium acetate, aluminum chloride, aluminum oxide, and carrier in the catalyst is 2:3:5:90.
反应产物中一氯硅烷的含量为28%,硅烷的含量为16%,氯化氢的含量为21%,二氯二氢硅的含量为3%,三氯氢硅的含量为2%,四氯化硅的含量为1%,氢气的含量为29%。The content of monochlorosilane in the reaction product is 28%, the content of silane is 16%, the content of hydrogen chloride is 21%, the content of dichlorodihydrosilane is 3%, the content of trichlorosilane is 2%, tetrachloride The silicon content is 1%, and the hydrogen content is 29%.
实施例6Example 6
与实施例1的不同之处在于:催化剂中醋酸钯、氯化铝、氧化铝、载体的重量比为5:2:2:91。The difference from Example 1 is that the weight ratio of palladium acetate, aluminum chloride, aluminum oxide, and carrier in the catalyst is 5:2:2:91.
反应产物中一氯硅烷的含量为37%,硅烷的含量为14%,氯化氢的含量为13%,二氯二氢硅的含量为3%,三氯氢硅的含量为2%,四氯化硅的含量为1%,氢气的含量为30%。The content of monochlorosilane in the reaction product is 37%, the content of silane is 14%, the content of hydrogen chloride is 13%, the content of dichlorodihydrosilane is 3%, the content of trichlorosilane is 2%, tetrachloride The silicon content is 1%, and the hydrogen content is 30%.
实施例7Example 7
与实施例1的不同之处在于:催化剂中醋酸钯、氯化铝、氧化铝、载体的重量比为7:10:3:80。The difference from Example 1 is that the weight ratio of palladium acetate, aluminum chloride, aluminum oxide, and carrier in the catalyst is 7:10:3:80.
反应产物中一氯硅烷的含量为30%,硅烷的含量为15%,氯化氢的含量为19%,二氯二氢硅的含量为2%,三氯氢硅的含量为2%,四氯化硅的含量为1%,氢气的含量为31%。The content of monochlorosilane in the reaction product is 30%, the content of silane is 15%, the content of hydrogen chloride is 19%, the content of dichlorodihydrosilane is 2%, the content of trichlorosilane is 2%, tetrachloride The silicon content is 1%, and the hydrogen content is 31%.
实施例8Example 8
与实施例1的不同之处在于:催化剂中醋酸钯、氯化铝、氧化铝、载体的重量比为2:1:10:87。The difference from Example 1 is that the weight ratio of palladium acetate, aluminum chloride, aluminum oxide, and carrier in the catalyst is 2:1:10:87.
反应产物中一氯硅烷的含量为20%,硅烷的含量为24%,氯化氢的含量为26%,二氯二氢硅的含量为1%,三氯氢硅的含量为1%,四氯化硅的含量为0,氢气的含量为28%。The content of monochlorosilane in the reaction product is 20%, the content of silane is 24%, the content of hydrogen chloride is 26%, the content of dichlorodihydrosilane is 1%, the content of trichlorosilane is 1%, tetrachloride The content of silicon is 0, and the content of hydrogen is 28%.
实施例9Example 9
与实施例1的不同之处在于:制备催化剂时用相同重量份的市售的ZSM-5(生产厂家:江苏洁欧康科技有限公司)分子筛代替活性炭。The difference from Example 1 is that when preparing the catalyst, the commercially available ZSM-5 (manufacturer: Jiangsu Jieokang Technology Co., Ltd.) molecular sieve is used instead of activated carbon in the same weight portion.
反应产物中一氯硅烷的含量为19%,硅烷的含量为21%,氯化氢的含量为29%,二氯二氢硅的含量为1%,三氯氢硅的含量为1%,四氯化硅的含量为1%,氢气的含量为28%。The content of monochlorosilane in the reaction product is 19%, the content of silane is 21%, the content of hydrogen chloride is 29%, the content of dichlorodihydrosilane is 1%, the content of trichlorosilane is 1%, tetrachloride The silicon content is 1%, and the hydrogen content is 28%.
对比例1Comparative example 1
与实施例1的不同之处在于:催化剂制备过程中未加入醋酸钯,其他成分及比例不变。The difference from Example 1 is that palladium acetate is not added during the preparation of the catalyst, and other components and ratios remain unchanged.
反应产物中一氯硅烷的含量为12%,硅烷的含量为27%,氯化氢的含量为35%,二氯二氢硅的含量为1%,三氯氢硅的含量为1%,四氯化硅的含量为1%,氢气的含量为23%。The content of monochlorosilane in the reaction product is 12%, the content of silane is 27%, the content of hydrogen chloride is 35%, the content of dichlorodihydrosilane is 1%, the content of trichlorosilane is 1%, tetrachloride The silicon content is 1%, and the hydrogen content is 23%.
对比例2Comparative example 2
与实施例1的不同之处在于:催化剂中不含氧化铝,其他成分的比例不变。The difference from Example 1 is that the catalyst does not contain alumina, and the proportions of other components remain unchanged.
反应产物中一氯硅烷的含量为16%,硅烷的含量为25%,氯化氢的含量为32%,二氯二氢硅的含量为1%,三氯氢硅的含量为1%,四氯化硅的含量为1%,氢气的含量为24%。The content of monochlorosilane in the reaction product is 16%, the content of silane is 25%, the content of hydrogen chloride is 32%, the content of dichlorodihydrosilane is 1%, the content of trichlorosilane is 1%, tetrachloride The silicon content is 1%, and the hydrogen content is 24%.
从以上的描述中,可以看出,本申请采用特定的催化剂通过硅烷和氯化物直接合成一氯硅烷,原料较为易得,不同于二氯二氢硅歧化方法和硅烷与二氯二氢硅对称歧化法,本方法对反应条件要求较为温和,不受平衡反应影响,产物中产品的含量较高,易于提纯得到高纯度的一氯硅烷。本申请的催化剂中含有金属钯、氯化铝和氧化铝,其中的靶、铝是催化剂的活性物质,与硅烷等发生配位使其活化,诱导氯源攻击而发生氯化反应,而且该催化剂催化效果好,使用寿命长,有效降低了一氯硅烷的生产成本。From the above description, it can be seen that this application uses a specific catalyst to directly synthesize monochlorosilane through silane and chloride, and the raw materials are relatively easy to obtain, which is different from the disproportionation method of dichlorodihydrosilane and the symmetry of silane and dichlorodihydrosilane Disproportionation method, this method requires relatively mild reaction conditions, is not affected by equilibrium reaction, and the content of the product in the product is relatively high, and it is easy to purify to obtain high-purity monochlorosilane. The catalyst of the present application contains metal palladium, aluminum chloride and alumina, wherein the target and aluminum are the active substances of the catalyst, which are activated by coordination with silane, and induce the attack of chlorine source to cause chlorination reaction, and the catalyst The catalytic effect is good, the service life is long, and the production cost of monochlorosilane is effectively reduced.
以上仅为本发明的优选实施例而已,并不用于限制本发明,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
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