CN115555129A

CN115555129A - Dust collector and vacuum coating equipment

Info

Publication number: CN115555129A
Application number: CN202211150361.5A
Authority: CN
Inventors: 张鹤; 廖宝臣; 吴兴华
Original assignee: Jiangsu Leadmicro Nano Technology Co Ltd
Current assignee: Jiangsu Leadmicro Nano Technology Co Ltd
Priority date: 2022-09-21
Filing date: 2022-09-21
Publication date: 2023-01-03

Abstract

The application relates to a dust removal device and vacuum coating equipment, wherein the dust removal device comprises a first dust removal assembly; the second dust removal component is opposite to the first dust removal component and is arranged at intervals so as to form a gas circulation channel between the first dust removal component and the second dust removal component; wherein the first and second dedusting assemblies are configured to simultaneously form a temperature field and an electrostatic field having an overlap region within the gas flow channel, both the temperature field and the electrostatic field capable of providing a force that moves the dust toward the second dedusting assembly. When the dust passes through the dust removal device, the dust can be collected on the second dust removal assembly under the dual action of the temperature field and the electrostatic field, the whole gas flow channel cannot be blocked, the effective pumping speed of the vacuum coating equipment is ensured, and the stability of the coating process and the repeatability of large-scale coating quality are improved.

Description

Dust collector and vacuum coating equipment

Technical Field

The application relates to the technical field of dust removing equipment, in particular to a dust removing device and vacuum coating equipment.

Background

Vacuum coating equipment, in particular, several typical process (PECVD, ALD, LPCVD, sputtering and the like) equipment are widely applied to the preparation of functional thin films such as silicon nitride (SiNx) positive films, silicon nitride (SiNx) back films, aluminum oxide, silicon oxide, polysilicon and the like in the photovoltaic industry. The number of vacuum coating equipment on a large-scale production line is increased, so that the problem of equipment maintenance is more and more severe, and the proportion of the equipment maintenance cost is increased continuously.

One of the most important items is the maintenance of vacuum pumps, pump pipes and butterfly and angle valves. The reason is that a large amount of product dust (such as SiNx, alOx and the like) is generated in the vacuum coating process. The dust is generated at the film coating position of the reaction cavity, enters the pump pipe along with the flow line of the reaction gas, flows through the butterfly valve and the angle valve, and finally enters the vacuum pump. Therefore, the adopted valve devices and vacuum pumps are easy to damage and need frequent shutdown maintenance, and the machine utilization rate is obviously influenced.

In order to solve the problem, a filter (or called a catcher) is arranged in front of a vacuum pump or a valve body in the conventional partial vacuum coating equipment, but dust is often captured by increasing a dust flow and a plurality of layers of filter screens, so that the flow resistance of a pump pipe system is increased, and as the working time of the equipment is prolonged, dust is accumulated in the filter, the flow resistance of the filter is continuously increased, so that the effective pumping speed of the pumping position of a reaction cavity is continuously reduced, and the stability of the process and the repeatability of large-scale coating quality are further influenced.

Disclosure of Invention

Therefore, it is necessary to provide a dust removing device and a vacuum coating apparatus, which can ensure the effective pumping speed and improve the stability of the process and the repeatability of the large-scale coating quality, aiming at the problem that the effective pumping speed of the pumping position of the reaction chamber is continuously reduced by a filter used by the existing vacuum coating apparatus, so that the stability of the process and the repeatability of the large-scale coating quality are affected.

The application provides a dust collector, includes:

a first dust removal assembly; and

the second dust removal component is opposite to the first dust removal component and is arranged at intervals so as to form a gas circulation channel between the first dust removal component and the second dust removal component;

wherein the first and second dedusting assemblies are configured to simultaneously form a temperature field and an electrostatic field having an overlap region within the gas flow channel, both the temperature field and the electrostatic field capable of providing a force that moves the dust toward the second dedusting assembly.

In one embodiment, the first dust removal assembly comprises a heating device and a negative electrode, and the second dust removal assembly comprises a cooling device and a positive electrode;

the heating device is used for heating the gas flowing through the gas flow channel, the cooling device is used for cooling the gas flowing through the gas flow channel, and the heating device and the cooling device can form a temperature field in the gas flow channel;

the negative electrode and the positive electrode are capable of forming an electrostatic field within the gas flow channel.

In one embodiment, the heating device is arranged inside the negative electrode; or alternatively

The heating device is covered on the outer surface of the negative electrode.

In one embodiment, the cooling device includes a cold trap and a refrigerator for refrigerating the cold trap.

In one embodiment, the dust removing device further comprises a temperature controller, the temperature controller is in communication connection with the heating device and the cooling device, and is used for controlling the heating temperature of the heating device within a first preset temperature range and controlling the cooling temperature of the cooling device within a second preset temperature range; and/or

The dust removing device also comprises a field intensity controller which is communicated and connected with the positive electrode and the negative electrode and is used for controlling the electric field intensity of the electrostatic field.

In one embodiment, the first dust removing assembly extends along the extending direction of the gas circulation channel; and/or

The second dust removing assembly extends along the extending direction of the gas flow channel.

In one embodiment, the gas flow channel comprises a first sub-channel and a second sub-channel which are communicated in sequence along the extension direction of the gas flow channel, and the first sub-channel is obliquely arranged relative to the second sub-channel.

In one embodiment, the first and second sub-channels each include an inlet and an outlet, the outlet of the first sub-channel is disposed closer to and inclined relative to the second dusting assembly, and the inlet of the second sub-channel is disposed closer to and inclined relative to the second dusting assembly.

In one embodiment, the number of the first sub-channels comprises at least two, and the first sub-channels and the second sub-channels are alternately arranged in sequence; and/or

The number of the second sub-channels comprises at least two, and the first sub-channels and the second sub-channels are sequentially and alternately arranged.

In one embodiment, the airflow passage is arc-shaped along its extension.

In one embodiment, the first dust removal assembly comprises at least two first sub-dust removal assemblies arranged at intervals, the second dust removal assembly comprises at least two second sub-dust removal assemblies arranged at intervals, and the gas circulation channel comprises a plurality of sub-channels arranged at intervals;

each first sub-dedusting component is opposite to and spaced from a corresponding second sub-dedusting component so as to form a corresponding sub-channel between the first sub-dedusting component and the second sub-dedusting component.

In one embodiment, the second dust removal assembly further has a dust collection chamber in communication with the gas flow passage.

In one embodiment, one side of the second dust removing assembly is provided with an opening communicated with the dust collecting cavity, and the opening is arranged towards the first dust removing assembly.

In one embodiment, the dust removing device further comprises an adsorption piece, wherein the adsorption piece is arranged in the dust collecting cavity and used for adsorbing dust entering the dust collecting cavity; and/or

The dust removal device also comprises a filtering piece which is arranged in the dust collection cavity and used for adsorbing dust entering the dust collection cavity.

In one embodiment, the dust removing device further comprises a housing, the housing is provided with a dust removing cavity, the first dust removing assembly is arranged in the dust removing cavity, the second dust removing assembly is arranged on the outer side of the housing, the housing is further provided with a communication hole, and the second dust removing assembly is communicated with the dust removing cavity through the communication hole.

In another aspect of the present application, a vacuum coating apparatus is provided, which includes a reaction chamber, a negative pressure device, and the dust removing device of any of the above embodiments, wherein the negative pressure device is communicated with the reaction chamber and is configured to provide negative pressure to the reaction chamber, and the dust removing device is disposed between the reaction chamber and the negative pressure device.

In one embodiment, the vacuum coating equipment further comprises a communication pipeline, two ends of the communication pipeline are respectively communicated with the reaction chamber and the negative pressure device, and the dust removal device is arranged on the communication pipeline.

In one embodiment, the vacuum coating equipment further comprises a butterfly valve, and the butterfly valve is arranged on a communication pipeline between the dust removal device and the negative pressure device; and/or

The vacuum coating equipment also comprises an angle valve which is arranged on a communication pipeline between the dust removal device and the negative pressure device.

According to the dust removing device and the vacuum coating equipment, when dust passes through the dust removing device, the dust can be collected on the second dust removing assembly under the double effects of the temperature field and the electrostatic field, the whole gas circulation channel cannot be blocked, the effective pumping speed of the vacuum coating equipment is ensured, and the stability of a coating process and the repeatability of large-scale coating quality are improved.

Drawings

Fig. 1 is a schematic structural diagram of a vacuum coating apparatus according to an embodiment of the present application;

FIG. 2 is a schematic structural diagram of a dust removing apparatus according to an embodiment of the present application;

FIG. 3 is a schematic structural diagram of a dust removing apparatus according to another embodiment of the present application;

FIG. 4 is a schematic structural diagram of a dust removing device in another embodiment of the present application;

fig. 5 is a schematic structural diagram of a dust removing device in yet another embodiment of the present application.

Reference numerals are as follows:

the dust removing device 100, the first dust removing assembly 10, the first dust removing sub-assembly 11, the second dust removing assembly 20, the cooling device 21, the positive electrode 22, the second dust removing sub-assembly 23, the dust collecting cavity 24, the opening 25, the gas circulation channel 30, the first sub-channel 31, the second sub-channel 32, the housing 40 and the communication hole 41;

the vacuum coating equipment comprises a vacuum coating device 200, a reaction chamber 210, a negative pressure device 220, a communication pipeline 230, a communication pipeline 231, a communication pipeline 232, a butterfly valve 240 and an angle valve 250.

Detailed Description

In order to make the aforementioned objects, features and advantages of the present application more comprehensible, embodiments accompanying the present application are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is capable of embodiments in many different forms than those described herein and that modifications may be made by one skilled in the art without departing from the spirit and scope of the application and it is therefore not intended to be limited to the specific embodiments disclosed below.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the present application.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or to implicitly indicate the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present application, "plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.

In this application, unless expressly stated or limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can include, for example, fixed connections, removable connections, or integral parts; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through intervening media. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.

Furthermore, the drawings are not 1:1, and the relative sizes of the various elements in the drawings are drawn for illustration only and not necessarily to true scale.

Fig. 1 shows a schematic structural diagram of a vacuum coating apparatus in an embodiment of the present application.

Referring to the drawings, an embodiment of the present application provides a dust removing device 100, which includes a first dust removing assembly 10 and a second dust removing assembly. The dust removing device 100 of the present application can be applied to the vacuum coating apparatus 200, and can also be applied to other apparatuses to which the dust removing device 100 is applied, which is not limited herein.

The first dust removing assembly 10 and the second dust removing assembly 20 are arranged opposite to each other and spaced apart from each other to form a gas flow passage 30 therebetween.

Wherein the first dust removing assembly 10 and the second dust removing assembly 20 are configured to simultaneously form a temperature field and an electrostatic field having an overlapping area in the gas flow channel 30, and the temperature field and the electrostatic field are both capable of providing a force for moving dust toward the second dust removing assembly 20.

It should be noted that the simultaneous formation of the temperature field and the electrostatic field having the overlapping region in the gas flow channel 30 means that the region of the temperature field and the region of the electrostatic field at least partially overlap, rather than being sequentially arranged in the front-back or left-right direction along the flow direction of the gas flow, so that there is no overlapping region therebetween.

In practical applications, after the dust enters the gas flow channel 30 along with the gas flow, the dust is deflected toward the second dust removing assembly 20 under the action of the temperature field according to the thermophoresis principle and is collected.

Also, since the dust generated in the plasma-based coating process tends to be negatively charged, the dust is deflected toward the second dust removing assembly 20 by the electrostatic field to be collected.

Therefore, the dust removing device 100 of the present application can collect dust onto the second dust removing assembly 20 under the dual actions of the temperature field and the electrostatic field, without blocking the whole gas flow channel 30, thereby ensuring the effective pumping speed of the vacuum coating equipment 200, and improving the stability of the coating process and the repeatability of the large-scale coating quality.

In order to increase the action strength of the electrostatic field, in some embodiments, the first dust removing assembly 10 extends along the extending direction of the gas flow channel 30, and the second dust removing assembly 20 may also extend along the extending direction of the gas flow channel 30, and in other embodiments, only one of the first dust removing assembly 10 or the second dust removing assembly 20 may also extend along the extending direction of the gas flow channel 30.

It should be noted that the first dust removing assembly 10 may extend linearly along the extending direction of the gas flow channel 30, may also extend in a curved shape, may also extend in other shapes, and is not limited in particular. Similarly, the second dust-removing assembly 20 extends in a similar manner to the first dust-removing assembly 10, and thus the description thereof is omitted.

Specifically, in the embodiment of the present application, the first dust removing assembly 10 includes a heating device and a negative electrode, and the second dust removing assembly 20 includes a cooling device 21 and a positive electrode 22.

The heating device is used for heating the gas flowing through the gas flow channel 30, the cooling device 21 is used for cooling the gas flowing through the gas flow channel 30, and the heating device and the cooling device 21 can form a temperature field in the gas flow channel 30.

The negative and positive electrodes 22 are capable of creating an electrostatic field within the gas flow channels 30.

In practical application, after the dust enters the gas flowing channel 30 along with the gas flow, the heating device can heat the gas flowing through the gas flowing channel 30, and the cooling device 21 can cool the gas flowing through the gas flowing channel 30, so that a temperature field is formed in the gas flowing channel 30 under the temperature difference between the two, and the dust can be deflected to the cooling device 21 and collected under the action of the thermophoresis principle.

Also, since the dust generated in the plasma-based coating process tends to be negatively charged, an electrostatic field is generated when a potential difference exists between the negative electrode and the positive electrode 22, and thus, the negatively charged dust tends to be deposited on the surface of the positive electrode 22.

In particular to some embodiments, the heating device may be arranged inside the negative electrode, further, the heating device may be laid inside the negative electrode, in particular to another embodiment, the heating device may also be arranged outside the negative electrode, for example, on the outer surface of the negative electrode. Thus, the structure and the manufacturing process can be simplified.

In the embodiments of the present application, the heating device may be at least one of a resistance wire, a heating plate, or a heating film, and is not limited in particular.

In particular, in some embodiments, cooling device 21 can be disposed inside positive electrode 22, in particular, cooling device 21 includes a cooling pipe, which can be laid inside positive electrode 22, and in other embodiments, cooling device 21 can also be disposed outside positive electrode 22, for example, covering the outer surface of positive electrode 22, or spaced from positive electrode 22, so as to provide a cooling medium to the surface of positive electrode 22. Thus, the structure and the manufacturing process can be simplified.

In the embodiment of the present application, the cooling device 21 includes a refrigerator. Specifically, the refrigerator may have a water-cooled refrigerator or an air-cooled refrigerator.

As shown in fig. 2, in some embodiments, the gas flow-through channel 30 includes a first sub-channel 31 and a second sub-channel 32 which are communicated with each other in sequence along the extending direction thereof, and the first sub-channel 31 is disposed obliquely with respect to the second sub-channel 33.

Like this, after the dust gets into air current circulation passageway 30, can pass through first subchannel 31 and second subchannel 32, because first subchannel 31 sets up for the slope of second subchannel 33, the dust can move under the effect of the temperature field in two different directions and electrostatic field, avoids the unidirectional movement to cause the dust difficult skew to second dust removal component 20 simultaneously and is collected completely.

Specifically, the first dust removing assembly 10 includes at least two first dust removing sub-assemblies 11, the second dust removing assembly 20 includes at least two second dust removing sub-assemblies 23, and each first dust removing sub-assembly 11 is opposite to and spaced apart from a corresponding second dust removing sub-assembly 23, so as to form a corresponding sub-channel therebetween.

One of the first sub-dedusting assemblies 11 is inclined with respect to the other first sub-dedusting assembly 11, and the two second sub-dedusting assemblies 23 corresponding to the two first sub-dedusting assemblies 11 may be opposite to and spaced apart from the corresponding first sub-dedusting assemblies 11 to correspondingly form two sub-channels which are inclined with respect to each other, that is, the first sub-channel 31 and the second sub-channel 32. More specifically, two second sub dust removing assemblies 23 may be respectively disposed in parallel with the corresponding first sub dust removing assemblies 11.

Referring to fig. 2, the first sub-channel 31 and the second sub-channel 32 each include an inlet and an outlet, the outlet of the first sub-channel 31 is disposed closer to the second dust removing element 20 and inclined with respect to the second dust removing element 20, and the inlet of the second sub-channel 32 is disposed closer to the second dust removing element 20 and inclined with respect to the second dust removing element 20.

Because the export of first subchannel 31 is more close to second dust removal component 20 and sets up, and relative second dust removal component 20 slope, can make the dust to the in-process that second subchannel 32 gos forward, can be more close to second dust removal component 20 and move, be more favorable to the dust to second dust removal component 20 deflection, in addition, because the import of second subchannel 32 is more close to second dust removal component 20 and sets up, and relative second dust removal component 20 slope, therefore, the dust is when getting into second subchannel 32, can have the condition to the direction climbing difficulty of export, and then make the dust more easily to the second dust removal component 20 deflection of keeping away from the export and collected.

As shown in fig. 3, in some embodiments, the number of the first sub-channels 31 includes at least two, and the first sub-channels 31 and the second sub-channels 32 are alternately arranged in sequence.

Thus, the dust can move under the action of the temperature fields and the electrostatic fields in a plurality of different directions on the flow path of the gas, and the dust collection amount is further improved.

In other embodiments, the number of the second sub-channels 32 includes at least two, and the first sub-channels 31 and the second sub-channels 32 are alternately arranged in sequence.

In other embodiments, the number of the first sub-passages 31 includes at least two, and the number of the second sub-passages 32 includes at least two, and the first sub-passages 31 and the second sub-passages 32 are alternately arranged in sequence.

As shown in fig. 4, in some embodiments, the plurality of first sub dust removing assemblies 11 are disposed to be spaced apart from each other, the second sub dust removing assemblies 23 are disposed to be spaced apart from each other, and the plurality of sub passages are disposed to be spaced apart from each other.

The plurality of sub-channels can form electrostatic fields with different strengths or temperature fields with different temperature differences, and dust enters the electric fields and/or the temperature fields with different strengths, so that the dust collection efficiency is further improved.

As shown in fig. 5, in some embodiments, the airflow passage 30 is arcuate in shape along its extension.

The arc-shaped airflow channel 30 changes the flowing direction of the dust, and can also enable the dust to move under the action of temperature fields and electrostatic fields in different directions, thereby improving the dust collection amount.

Specifically, the first sub-dedusting assembly 10 is arc-shaped, and the second sub-dedusting assembly 20 is also arc-shaped.

Referring to fig. 1, in some embodiments, the dust removing apparatus 100 further includes a housing 40, the housing 40 has a dust removing cavity, the first dust removing assembly 10 is disposed in the dust removing cavity, the second dust removing assembly 20 is disposed outside the housing 40, the housing 40 further has a communication hole 41, and the second dust removing assembly 20 is communicated with the dust removing cavity through the communication hole 41. In this way, the dust can be deflected from the dust removal chamber to the second dust removal assembly 20 through the communication hole 41. Because the dust is concentrated on the second dust removing assembly 20, the second dust removing assembly 20 is arranged outside the shell 40, so that the dust can be conveniently and timely treated, and the air circulation of the air circulation channel 30 is not influenced.

It should be noted that the gas flow channel 30 formed before the first dust-removing assembly 10 and the second dust-removing assembly 20 is at least partially located in the dust-removing chamber, and specifically, the side of the first dust-removing assembly 10 facing the second dust-removing assembly 20 is spaced from the wall of the dust-removing chamber to form at least part of the gas flow channel 30.

In other embodiments, the first dust removing assembly 10 may be disposed outside the housing 40, or the second dust removing assembly 20 may be disposed in the dust removing cavity, which is not limited herein.

Further, the housing 40 has a tubular shape, so that the dust removing device 100 can be integrally connected to the pump tube of the vacuum coating apparatus 200, thereby simplifying the installation process.

Specifically, shell 40 has been seted up import and export, and import and export all are equipped with the flange structure, and shell 40 can dock with the pump line through the flange structure.

Preferably, the inner diameter of the housing 40 may be the same as the inner diameter of the pump tube, so that the introduction of additional flow resistance may be reduced.

In the embodiment of the present application, the second dust removing assembly 20 further has a dust collecting chamber 23, and the dust collecting chamber 23 is communicated with the gas circulation passage 30.

In this way, the dust deflected toward the second dust removing assembly 20 by the temperature field and the electrostatic field is deposited into the dust collecting chamber 23, thereby not affecting the gas flow through the gas flow channel 30.

Specifically, the dust collection chamber 23 is recessed away from the first dust extraction assembly 10.

In order to smoothly introduce the dust into the dust collection chamber 23, the second dust removing assembly 20 further has an opening 24 communicating with the dust collection chamber 23 at one side, and the opening 24 is disposed toward the first dust removing assembly 10.

More specifically, when the second dust removing assembly 20 is disposed outside the housing 40, the side of the second dust removing assembly 20 having the opening 24 is disposed toward the communication hole 41 so that the communication hole 41 communicates with the dust collection chamber 23.

In some embodiments, the cooling device 21 comprises a cold trap with a dust collection chamber 23, and a refrigerator for refrigerating the cold trap.

By providing the cooling means 21 comprising a cold trap, it is possible not only to provide a low temperature surface for condensation capture but also to improve vacuum efficiency.

In particular, the refrigerator may be provided outside the cold trap.

In some embodiments, the dust removing device 100 further includes an adsorbing member disposed in the dust collecting cavity 23 for adsorbing the dust entering the dust collecting cavity 23. Specifically, the adsorbing member may be an activated carbon adsorbing member or the like, and is not particularly limited.

Through set up the absorption piece in dust collection chamber 23, can adsorb the dust, not only can increase the dust absorbed quantity, and can avoid the dust to pour into the pump line and cause secondary pollution.

In other embodiments, the dust removing device 100 further comprises a filter member disposed in the dust collecting chamber 23 for filtering the dust entering the dust collecting chamber 23. Specifically, the filter member includes a filter screen, a filter element, and the like, and is not particularly limited.

Through set up the absorption piece in dust collection chamber 23, can filter the dust, not only can increase the dust absorbed quantity, and can avoid the dust to pour into the pump line and cause secondary pollution.

Preferably, the dust removing device 100 includes an adsorbing member disposed in the dust collecting cavity 23 for adsorbing the dust entering the dust collecting cavity 23, and the dust removing device 100 further includes a filtering member disposed in the dust collecting cavity 23 for filtering the dust entering the dust collecting cavity 23.

In some embodiments, the dust removing device 100 further comprises a temperature controller, which is communicatively connected to the heating device and the cooling device 21, and is used for controlling the heating temperature of the heating device within a first preset range and controlling the cooling temperature of the cooling device 21 within a second preset range.

By arranging the temperature controller, the temperature difference between the heating device and the cooling device 21 can be controlled, the generation of a temperature field is further controlled, and the stability and the reliability of the function of the temperature field are improved.

Specifically, the first preset temperature range is 10-50 degrees higher than the indoor temperature, and the second preset temperature range is 10-50 degrees lower than the indoor temperature.

In some embodiments, the dust removing device 100 further comprises a field strength controller communicatively connected to the negative electrode and the positive electrode 22 for controlling the electric field strength of the electrostatic field.

Through setting up temperature controller, can control the electric field intensity of electrostatic field, and then improve the effect stability and the reliability of electrostatic field.

Specifically, the electric field strength of the electrostatic field can be controlled by controlling the magnitude of the current introduced into at least one of the negative and positive electrodes 22.

Based on the same inventive concept, the present application further provides a vacuum coating apparatus 200, which includes a reaction chamber 210, a negative pressure device 220 and the dust removing device 100 in any of the above embodiments, wherein the negative pressure device 220 is communicated with the reaction chamber 210 and is used for providing negative pressure to the reaction chamber 210, and the dust removing device 100 is disposed between the reaction chamber 210 and the negative pressure device 220.

It should be noted that a large amount of product dust is generated in the reaction chamber 210, and the dust can flow to the negative pressure device 220 under the action of the negative pressure device 220.

By arranging the dust removing device 100 between the reaction chamber 210 and the negative pressure device 220, the dust can be collected on the second dust removing assembly 20 under the dual actions of the temperature field and the electrostatic field without blocking the whole gas flow channel 30, so that the negative pressure device 220 is not affected to provide negative pressure for the reaction chamber 210, the effective pumping speed of the vacuum coating equipment 200 is ensured, and the stability of the coating process and the repeatability of large-scale coating quality are improved.

In the embodiment of the present application, the negative pressure device 220 includes a vacuum pump, a blower, and the like, and is not limited in particular.

Further, the vacuum coating apparatus 200 further includes a communication pipe 230, two ends of the communication pipe 230 are respectively communicated with the reaction chamber 210 and the negative pressure device 220, and the dust removing device 100 is disposed on the communication pipe 230.

Thus, the dust can be effectively removed on the path of the dust flowing to the negative pressure device 220, and the dust is prevented from entering the negative pressure device 220.

Specifically, the communication duct 230 includes a first communication duct 231 and a second communication duct 232, both ends of the first communication duct 231 are respectively connected to the reaction chamber 210 and one end of the dust removing device 100, and both ends of the second communication duct 232 are respectively connected to the other end of the dust removing device 100 and are communicated with the negative pressure device 220. More specifically, the first communication pipe 231 communicates with an inlet of the dust removing device 100, and the second communication pipe 232 communicates with an outlet of the dust removing device 100.

It should be noted that the communication channel 230 is the pump tube.

In some embodiments, the vacuum coating apparatus 200 further comprises a butterfly valve 240, and the butterfly valve 240 is disposed on the communication pipe 230 between the dust removing device 100 and the negative pressure device 220.

By arranging the butterfly valve 240 at the downstream end of the dust removing device 100 along the flowing direction of the airflow, the butterfly valve 240 can be prevented from being damaged, the shutdown maintenance frequency of the vacuum coating equipment 200 is reduced, and the utilization rate of the machine is improved.

In some embodiments, the vacuum coating apparatus 200 further includes an angle valve 250, and the angle valve 250 is disposed on the communication pipe 230 between the dust removing device 100 and the negative pressure device 220.

By arranging the angle valve 250 at the downstream end of the dust removing device 100 in the airflow flowing direction, the damage of the angle valve 250 can be avoided, the shutdown maintenance frequency of the vacuum coating equipment 200 is reduced, and the machine utilization rate is improved.

In some embodiments, the vacuum deposition apparatus 200 may further include a butterfly valve 240 and an angle valve 250, the butterfly valve 240 and the angle valve 250 are disposed on the communication pipe 230 between the dust removing device 100 and the negative pressure device 220, and the butterfly valve 240 is disposed closer to the dust removing device 100 than the angle valve 250.

Compared with the prior art, the dust removal device 100 and the vacuum coating equipment 200 provided by the embodiment of the application have the following beneficial effects:

when the dust passes through the dust removing device 100, the dust can be collected on the second dust removing assembly 20 under the dual actions of the temperature field and the electrostatic field, the whole gas flow passage 30 cannot be blocked, the effective pumping speed of the vacuum coating equipment 200 is ensured, and the stability of the coating process and the repeatability of large-scale coating quality are improved.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims

1. A dust removing device characterized by comprising:

a first dust removal assembly; and

wherein the first and second dedusting assemblies are configured to simultaneously form a temperature field and an electrostatic field having an overlap region within the gas flow channel, the temperature field and the electrostatic field each capable of providing a force that moves dust toward the second dedusting assembly.

2. The dust removing device of claim 1, wherein the first dust removing component comprises a heating device and a negative electrode, and the second dust removing component comprises a cooling device and a positive electrode;

the heating device is used for heating the gas flowing through the gas circulation channel, the cooling device is used for cooling the gas flowing through the gas circulation channel, and the heating device and the cooling device can form the temperature field in the gas circulation channel;

the negative electrode and the positive electrode are capable of forming the electrostatic field within the gas flow channel.

3. The dust removing device according to claim 2, wherein the heating device is provided inside the negative electrode; or

The heating device is covered on the outer surface of the negative electrode.

4. A dust removing apparatus according to claim 2, wherein the cooling apparatus includes a cold trap and a refrigerator for refrigerating the cold trap.

5. The dust removing device of claim 2, further comprising a temperature controller, wherein the temperature controller is in communication with the heating device and the cooling device, and is configured to control the heating temperature of the heating device within a first preset temperature range and control the cooling temperature of the cooling device within a second preset temperature range; and/or

The dust removal device also comprises a field intensity controller, wherein the field intensity controller is in communication connection with the positive electrode and the negative electrode and is used for controlling the electric field intensity of the electrostatic field.

6. The dust removing device according to any one of claims 1 to 5, wherein the first dust removing member extends in an extending direction of the gas flow passage; and/or

The second dust removal assembly extends along the extending direction of the gas flow channel.

7. A dust-removing apparatus according to any one of claims 1 to 5, wherein the gas flow-through passage includes a first sub-passage and a second sub-passage which are communicated with each other in the extending direction, and the first sub-passage is arranged obliquely with respect to the second sub-passage.

8. The dusting apparatus of claim 7 wherein the first and second sub-channels each comprise an inlet and an outlet, the outlet of the first sub-channel being disposed closer to and inclined relative to the second dusting assembly, and the inlet of the second sub-channel being disposed closer to and inclined relative to the second dusting assembly.

9. The dust removing device of claim 8, wherein the number of the first sub-channels comprises at least two, and the first sub-channels and the second sub-channels are alternately arranged in sequence; and/or

10. A dusting apparatus according to any of claims 1-5, characterized in that the air flow channel is arc-shaped in its extension direction.

11. The dust removing apparatus according to any one of claims 1 to 5, wherein the first dust removing assembly comprises at least two first sub-dust removing assemblies arranged at intervals, the second dust removing assembly comprises at least two second sub-dust removing assemblies arranged at intervals, and the gas circulation passage comprises a plurality of sub-passages arranged at intervals;

each first sub-dedusting component is opposite to and arranged at intervals with a corresponding second sub-dedusting component so as to form a corresponding sub-channel between the first sub-dedusting component and the second sub-dedusting component.

12. The dust removing apparatus according to any one of claims 1 to 5, wherein the second dust removing assembly further has a dust collecting chamber, and the dust collecting chamber is communicated with the gas flow passage.

13. The dust extraction apparatus of claim 12, wherein a side of the second dust extraction assembly has an opening in communication with the dust collection chamber, the opening being disposed toward the first dust extraction assembly.

14. The dust removing device of claim 12, further comprising an adsorbing member disposed in the dust collecting chamber for adsorbing the dust entering the dust collecting chamber; and/or

The dust removal device further comprises a filtering piece, wherein the filtering piece is arranged in the dust collection cavity and used for adsorbing dust entering the dust collection cavity.

15. The dust removing device of any one of claims 1 to 5, further comprising a housing, wherein the housing has a dust removing cavity, the first dust removing component is disposed in the dust removing cavity, the second dust removing component is disposed outside the housing, the housing further has a communication hole, and the second dust removing component is communicated with the dust removing cavity through the communication hole.

16. A vacuum coating apparatus comprising a reaction chamber, a negative pressure device and the dust removing device of any one of claims 1 to 15, wherein the negative pressure device is in communication with the reaction chamber for providing negative pressure to the reaction chamber, and the dust removing device is disposed between the reaction chamber and the negative pressure device.

17. The vacuum coating apparatus according to claim 16, further comprising a communication pipe, wherein two ends of the communication pipe are respectively communicated with the reaction chamber and the negative pressure device, and the dust removing device is disposed on the communication pipe.

18. The vacuum coating apparatus according to claim 17, further comprising a butterfly valve disposed on a communication pipe between the dust removing device and the negative pressure device; and/or

The vacuum coating equipment further comprises an angle valve, and the angle valve is arranged on a communication pipeline between the dust removal device and the negative pressure device.