CN115432736A - Ultrathin BiOX nanometer material, solar cell containing material and preparation method of ultrathin BiOX nanometer material - Google Patents
Ultrathin BiOX nanometer material, solar cell containing material and preparation method of ultrathin BiOX nanometer material Download PDFInfo
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Abstract
The invention relates to the technical field of solar cells, and discloses an ultrathin BiOX nanometer material, a solar cell containing the material and a preparation method of the solar cell; the nano material comprises nanosheets which are formed by BiOX and have the diameter of 5-200 nm and the thickness of 1-20 nm, and a layer of thin film is formed by the nanosheets and used as an interface modification layer of a perovskite solar cell. Secondly, due to the hydrophobic property of the exposed face of BiOX (001), applying it to a perovskite solar cell, a perovskite solar cell stable for a long time is obtained. Therefore, the novel ultrathin BiOX nanometer material is used as an interface modification layer to be applied to the perovskite solar cell, and the perovskite solar cell with high efficiency and stability can be obtained.
Description
Technical Field
The invention relates to the technical field of solar cells. And more particularly, to a BiOX (X = F, cl, br, I) nanomaterial, a BiOX interface modification layer, and a solar cell including the interface modification layer and a method of manufacturing the same.
Background
Organic/inorganic hybrid perovskite solar cells are of great interest to the scientific research community and the industrial community because of their high photoelectric conversion efficiency. In a short development period of more than ten years, the photoelectric conversion efficiency of the solar cell breaks through 25%, and the solar cell keeps up with the development of more than sixty years of crystalline silicon solar cells, thereby becoming a novel solar technology with the most industrialized application prospect.
Although perovskite solar cells have high photoelectric conversion efficiency, long-term stability thereof is an important factor that restricts commercialization thereof. Therefore, an interface modification layer needs to be found, which not only has a strong hydrophobic property, but also has a dipole moment capable of increasing the built-in electric field of the device, so that the long-term stability and the open-circuit voltage of the perovskite solar cell are synergistically improved.
Disclosure of Invention
Therefore, in view of the above problems of long-term stability and limited open circuit voltage for solar cells, the present invention aims to provide a novel ultra-thin BiOX nanomaterial, a method for preparing the same, and a solar cell including an interface modification layer of the material, which can solve the problem of long-term stability of the existing perovskite solar cell and obtain a perovskite solar cell that is stable and efficient for a long time on the basis of increasing the open circuit voltage of the perovskite solar cell.
In order to achieve the above object, an aspect of the present invention provides an ultra-thin BiOX nanomaterial comprising nanosheets formed of BiOX having a thickness of 5 to 200nm and a thickness of 1 to 20 nm.
Another aspect of the present invention provides a method for preparing an ultra-thin BiOX nanomaterial, the method comprising the steps of:
adding sodium oleate into deionized water, and stirring for 0.5-2 h to obtain a uniformly mixed solution (1);
adding Bi (NO) 3 ) 3 ·5H 2 Adding O into the solution (1) and stirring for 1-3 h to obtain a uniformly mixed solution (2);
adding KX (X = F, cl, br and I) into the solution (2), and stirring for 0.5-3 h to obtain a uniformly mixed solution (3);
carrying out hydrothermal reaction on the obtained solution at 120-200 ℃ for 0.5-2 d, and then cleaning and drying to obtain a product;
dispersing the obtained product in an ethanol solution of tetrabutylammonium tetrafluoroborate, carrying out ultrasonic treatment for 0.5-3 h, and then cleaning and drying.
Another aspect of the present invention provides a method for preparing the BiOX thin film, the method comprising the steps of:
dispersing a BiOX nano material in an organic solvent to obtain a dispersion liquid, wherein the nano material comprises nanosheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm;
and forming a film from the dispersion by spraying or spin coating.
In another aspect, the present invention provides a solar cell, which includes, from bottom to top: the electron source comprises a transparent conductive substrate, an electron blocking layer, a perovskite layer, an interface modification layer, an electron transmission layer, a buffer layer and an electrode layer, wherein the interface modification layer is a thin film layer containing a BiOX nanometer material, and the nanometer material contains 5-200 nm nanosheets formed by BiOX and 1-20 nm in thickness.
Preferably, the perovskite light absorbing material is ABX 3 ，A＝CH 3 NH 3 、NH 2 CHNH 2 Cs, or mixtures thereof; b = Pb or Sn or mixtures thereofA compound; x = I, br, cl, CN, SCN, or mixtures thereof.
In another aspect, the present invention provides a method for manufacturing the solar cell, including the steps of: preparing a transparent conductive substrate;
forming an electron blocking layer on the transparent conductive substrate;
forming a perovskite layer on the electron blocking layer;
forming an interface modification layer on the perovskite layer;
forming an electron transport layer on the interface modification layer;
forming a buffer layer on the electron transport layer;
and forming an electrode layer on the buffer layer.
The interface modification layer is a film layer containing a BiOX nanometer material, and the nanometer material contains nanosheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm.
In another aspect, the present invention provides a solar cell, which includes, from bottom to top: the hole-transporting solar cell comprises a transparent conductive substrate, a hole blocking layer, a perovskite layer, an interface modification layer, a hole transporting layer and an electrode layer, wherein the interface modification layer is a thin film layer containing a BiOX nanometer material, and the nanometer material contains 5-200 nm nanosheets formed by BiOX and 1-20 nm in thickness.
Preferably, the perovskite light absorbing material is ABX 3 ，A＝CH 3 NH 3 、NH 2 CHNH 2 Cs, or mixtures thereof; b = Pb or Sn or mixtures thereof; x = I, br, cl, CN, SCN, or mixtures thereof.
In another aspect, the present invention provides a method for manufacturing the solar cell, including the steps of: preparing a transparent conductive substrate;
forming a hole blocking layer on the transparent conductive substrate;
forming a perovskite layer on the hole blocking layer;
forming an interface modification layer on the perovskite layer;
forming a hole transport layer on the interface modification layer; and
forming an electrode layer on the hole transport layer,
the interface modification layer is a film layer containing a BiOX nanometer material, and the nanometer material contains nanosheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm.
Advantageous effects
The application regulates and controls sodium oleate and Bi (NO) 3 ) 3 ·5H 2 O and KX (X = F, cl, br and I) are used for preparing a multilayer BiOX nanosheet, and then a single-layer ultrathin BiOX nanometer material is prepared by adjusting the concentration of tetrabutylammonium tetrafluoroborate and the ultrasonic time, wherein the BiOX nanometer material can form a thin film and is used for a perovskite solar cell. Due to the dipole effect of the BiOX, the interface modification layer increases the built-in electric field of the perovskite solar cell, so that the open-circuit voltage of the device is improved. Due to the hydrophobic property of the exposed face of BiOX (001), it is applied to perovskite solar cells to obtain long-term stable perovskite solar cells. Therefore, the novel ultrathin BiOX nanometer material is used as an interface modification layer to be applied to the perovskite solar cell, and the perovskite solar cell which is efficient and stable can be obtained.
Drawings
The above and other objects, features and other advantages of the present invention will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which,
figure 1 shows an atomic force microscopy image and corresponding heights of BiOX ultrathin nanoplates prepared in example 1;
fig. 2 shows a schematic structural diagram of a solar cell device in embodiment 2 of the present invention, in which 1 a transparent conductive substrate, 2 a hole blocking layer, 3 a perovskite layer, 4 an interface modification layer, 5 a hole transport layer, and 6 an electrode layer;
fig. 3 shows a schematic structural diagram of a solar cell device in embodiment 3 of the present invention, wherein 1 is a transparent conductive substrate, 2 is an electron blocking layer, 3 is a perovskite layer, 4 is an interface modification layer, 5 is an electron transport layer, 6 is a buffer layer, and 7 is an electrode layer.
Detailed Description
The existing perovskite solar cell has high photoelectric conversion efficiency, but the long-term stability and potential lead ion leakage are important factors for restricting the commercialization of the perovskite solar cell. The application provides a novel ultrathin BiOX ultrathin nanosheet material which is used as an interface modification layer of a perovskite solar cell.
The ultrathin BiOX nanometer material BiOX provided by the application forms nanosheets with the diameter of 5-200 nm and the thickness of 1-20 nm. By controlling the size of the nanosheets within the range, the thin film interface modification layer prepared from the BiOX nanomaterial can be suitable for perovskite solar cells.
The BiOX nanometer material is prepared by firstly mixing sodium oleate with Bi (NO) 3 ) 3 ·5H 2 O and KX (X = F, cl, br and I) react to generate multilayer blocky BiOX, and then the blocky BiOX and tetrabutylammonium tetrafluoroborate are subjected to ultrasonic cleaning to obtain the ultrathin BiOX nanosheet, and the method specifically comprises the following steps:
adding sodium oleate into deionized water, and stirring for 0.5-2 h to obtain a uniformly mixed solution (1);
adding Bi (NO) 3 ) 3 ·5H 2 Adding O into the solution (1) and stirring for 1-3 h to obtain a uniformly mixed solution (2);
adding KX (X = F, cl, br and I) into the solution (2), and stirring for 0.5-3 h to obtain a uniformly mixed solution (3);
carrying out hydrothermal reaction on the obtained solution (3) at 120-200 ℃ for 0.5-2 d, and then cleaning and drying to obtain a product;
dispersing the obtained product in an ethanol solution of tetrabutylammonium tetrafluoroborate, carrying out ultrasonic treatment for 0.5-3 h, and then cleaning and drying to obtain the final product.
Specifically, first, sodium oleate is mixed with Bi (NO) 3 ) 3 ·5H 2 O is stirred for 0.5 to 2 hours, preferably the reaction can be carried out under the condition of vigorous stirring, and a white suspension solution (1) is obtained after the reaction, more specifically, 20mg of sodium oleate is added into 30mL of deionized water and is stirred vigorously for 1 hour. KX is added into the solution (1) and stirred for 1-3 h to obtain a uniformly mixed solution (2), and more specifically, 30mg of KX is added into the solution (1) and stirred vigorously for 1h. Then subjecting the obtained solution to hydrothermal reaction, concretelyThe solution can be put into a reaction kettle, hydrothermal reaction is carried out at 120-200 ℃ for 0.5-2 d, after which a product can be obtained, and then the obtained product is washed and dried, preferably, the product can be washed by deionized water and absolute ethyl alcohol respectively for 1-3 times and then placed in a drying box for drying, and BiOX powder can be obtained. And finally, dispersing the powder in an ethanol solution of tetrabutylammonium tetrafluoroborate, and carrying out ultrasonic treatment for 0.5-3 h to obtain a transparent orange BiOX solution.
A novel BiOX thin film can be prepared by utilizing the ultrathin BiOX nanometer material, and the thin film electrode contains the BiOX nanometer material and is applied to a perovskite solar cell as an interface modification layer. Preferably, the thickness of the BiOX interface modification layer is 3-100 nm, preferably 10-15 nm. The thickness of the interface modification layer is controlled within the range, so that effective extraction of charges in the device can be ensured. Due to the dipole effect of the BiOX, the interface modification layer increases the built-in electric field of the perovskite solar cell, so that the open-circuit voltage of the device is improved. Secondly, due to the hydrophobic property of the BiOX (001) exposed surface, it is applied to perovskite solar cells to obtain long-term stable perovskite solar cells. Therefore, the novel ultrathin BiOX nanometer material is used as an interface modification layer to be applied to the perovskite solar cell, and the perovskite solar cell with high efficiency and stability can be obtained.
According to some embodiments of the present application, the BiOX interface modification layer may be prepared by dispersing a BiOX nanomaterial in an organic solvent to obtain a dispersion, and forming the dispersion into a thin film by spray coating or spin coating. Preferably, one or more organic solvents selected from chlorobenzene, isopropanol or ethanol may be used to form the dispersion. The preparation method of the interface modification layer has simple process, does not need expensive equipment and complex conditions, is convenient for the assembly of devices, and is beneficial to the commercial production of perovskite solar cells.
Using an interface modification layer of ultra-thin BiOX nanomaterials, some embodiments of the present application provide a solar cell, the structure of which comprises, from bottom to top: the hole transport layer is arranged on the transparent conductive substrate and comprises a transparent conductive substrate, a hole blocking layer, a perovskite layer, an interface modification layer, a hole transport layer and an electrode layer, wherein the interface modification layer is a thin film layer containing a BiOX nanometer material.
Preferably, the perovskite light absorbing material is ABX 3 ，A＝CH 3 NH 3 、NH 2 CHNH 2 Cs, or mixtures thereof; b = Pb or Sn or mixtures thereof; x = I, br, cl, CN, SCN, or mixtures thereof.
Preferably, the transparent conductive substrate is FTO conductive glass or ITO conductive glass.
Preferably, the hole blocking layer is dense TiO 2 Layer, more preferably, the dense TiO 2 The layer thickness is 40-100 nm.
Preferably, the thickness of the perovskite layer is 300 to 500nm.
Preferably, the interface modification layer is a thin layer of BiOX, more preferably, the thickness of the interface modification layer is 10-15 nm.
Preferably, the hole blocking layer is Spiro-OMeTAD or PTAA, more preferably, the hole transport layer has a thickness of 60 to 100nm.
Preferably, the electrode layer is Au or Ag, more preferably, the electrode layer has a thickness of 60 to 100nm.
The solar cell containing the BiOX ultrathin nanosheet interface modification layer can be prepared by the following method:
preparing a transparent conductive substrate;
forming a hole blocking layer on the transparent conductive substrate;
forming a perovskite layer on the hole blocking layer;
forming an interface modification layer on the perovskite layer;
forming a hole transport layer on the interface modification layer; and
forming an electrode layer on the hole transport layer,
the interface modification layer is a film layer containing a BiOX nanometer material, and the nanometer material contains nanosheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm.
More specifically, the preparing of the transparent conductive substrate may be a step of cleaning the transparent conductive substrate. For example, the FTO or ITO conductive glass substrate may be washed in an ultrasonic washer, and more preferably, may be washed with weak alkaline liquid detergent having PH =8 to 10, deionized water, absolute ethyl alcohol, acetone, each for 5 to 20 minutes in sequence. The cleaning of the transparent conductive substrate may be performed by other methods available in the art.
The step of forming the hole blocking layer on the transparent conductive substrate may be performed by spraying and heating a solution of an organic titanium source, such as isopropyl titanate, on the transparent conductive substrate, and more particularly, for example, a cleaned FTO conductive glass substrate may be heated at 400 to 600 ℃, 0.01 to 0.05mol/L isopropyl titanate solution may be sprayed on the substrate, and heated for 20 to 60 minutes to form a dense TiO solution with a thickness of 40 to 100nm 2 A hole blocking layer.
The perovskite layer, preferably a perovskite material as described above, may be ABX 3 Wherein A = CH 3 NH 3 、NH 2 CHNH 2 Cs, or mixtures thereof; b = Pb or Sn or mixtures thereof; x = I, br, cl, CN, SCN, or mixtures thereof. More specifically, 1.0-1.5 mol/L of perovskite solution is deposited on a substrate through a one-step or two-step spin coating method, and is heated for 0.5-1 h at the temperature of 100-150 ℃ to form a perovskite active layer with the thickness of 200-1000 nm;
and the interface modification layer is prepared by spin-coating or spray-coating the BiOX dispersion liquid on the perovskite layer and heating the perovskite layer at the temperature of between 40 and 200 ℃ for 10 to 70 minutes. As described previously, the BiOX dispersion liquid can be obtained by dispersing the BiOX nanomaterial of the present application in an organic solvent. Preferably, one or more organic solvents selected from chlorobenzene, isopropanol or ethanol may be used to form the dispersion.
The hole transport layer may be heated by dissolving Spiro-OMeTAD or PTAA in chlorobenzene or toluene solvent and spin-coating on the interface modification layer. More specifically, a chlorobenzene solution of Spiro-OMeTAD or PTAA with the concentration of 80mg/mL is coated on the interface modification layer in a spinning mode, and the interface modification layer is heated for 10-60 minutes at the temperature of 50-100 ℃ to form a Spiro-OMeTAD or PTAA hole transport layer with the thickness of 40-200 nm.
The electrode layer can be formed by evaporating Au or Ag on the hole transport layer through a vacuum coating method. More specifically, the thickness of the electrode is controlled by regulating Au or Ag, the evaporation speed and the evaporation time, so that an electrode layer with the thickness of 40-200 nm is formed.
Further embodiments of the present application also provide a solar cell using the BiOX interface modification layer, the structure of which includes, from bottom to top: the electron-transporting layer comprises a transparent conductive substrate, an electron blocking layer, a perovskite layer, an interface modification layer, an electron transporting layer, a buffer layer and an electrode layer.
Among them, the transparent conductive substrate, the electron blocking layer, the perovskite layer, the interface modification layer and the electrode layer, the preparation of which has been described in detail previously, are omitted.
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. The examples, where specific techniques or conditions are not indicated, are to be construed according to the techniques or conditions described in the literature in the art or according to the product specifications. The reagents or instruments used are conventional products which are commercially available, and are not indicated by manufacturers. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Example 1: preparation of BiOI nano material
BiOI powder was prepared as follows:
(1) 30mg of sodium oleate is added into 40mL of deionized water, and the mixture is vigorously stirred for 1 hour at normal temperature.
(2) 35mg of KI is added into the solution, and the solution is vigorously stirred for 2 hours at normal temperature.
(3) And (3) putting the solution into a reaction kettle, and carrying out hydrothermal reaction for 4 hours at the temperature of 150 ℃ to obtain a brick red product.
(4) And washing the brick red product with cyclohexane and absolute ethyl alcohol for 3 times respectively to obtain brick red powder.
(5) The brick-red product was dispersed in a concentration of 2mg mL -1 And performing ultrasonic treatment on the tetrabutylammonium tetrafluoroborate in ethanol for 10min to obtain a light yellow solution.
(6) The light yellow product is washed by absolute ethyl alcohol and deionized water for 3 times respectively to obtain light yellow powder, and the obtained light yellow powder is dispersed in organic solvent chlorobenzene for atomic force microscope test, as shown in figure 1.
Example 2: preparation of BiOBr nano material
BiOBr powder was prepared as follows:
(1) 25mg of sodium oleate is added into 40mL of deionized water, and the mixture is stirred vigorously for 1 hour at normal temperature.
(2) To the above solution was added 30mg of KBr and stirred vigorously at room temperature for 2h.
(3) And (3) putting the solution into a reaction kettle, and carrying out hydrothermal reaction for 3h at the temperature of 170 ℃ to obtain a white product.
(4) The white product was washed with cyclohexane and absolute ethanol 3 times to obtain a white powder.
(5) The white product was dispersed in 8mg mL -1 And performing ultrasonic treatment for 30min in ethanol of tetrabutylammonium tetrafluoroborate to obtain a white solution.
(6) The white product was washed with absolute ethanol and deionized water 5 times to obtain white powder.
Example 3: preparation of BiOCl nano material
BiOCl powder was prepared as follows:
(1) 60mg of sodium oleate is added into 50mL of deionized water, and the mixture is vigorously stirred for 2 hours at normal temperature.
(2) To the above solution was added 45mg of KCl, and the mixture was vigorously stirred at room temperature for 1 hour.
(3) And (3) putting the solution into a reaction kettle, and carrying out hydrothermal reaction for 2h at 160 ℃ to obtain a white product.
(4) The white product was washed with cyclohexane and absolute ethanol for 4 times to obtain white powder.
(5) The white product was dispersed in 10mg mL -1 Four butyl ofPerforming ultrasonic treatment for 40min in ethanol based on ammonium tetrafluoroborate to obtain a white solution.
(6) The white product was washed with absolute ethanol and deionized water 5 times to obtain white powder.
Example 4: preparation of perovskite solar cell SC-1
The perovskite solar cell SC-1 with the device structure shown in the figure 2 is prepared according to the following steps, and comprises a transparent conductive substrate, a hole blocking layer, a perovskite layer, an interface modification layer, a hole transmission layer and an electrode layer which are sequentially distributed from bottom to top:
(1) Cleaning, namely putting the FTO conductive glass substrate in an ultrasonic cleaner, and sequentially cleaning the FTO conductive glass substrate for 5 minutes by respectively using weak alkaline liquid detergent with the pH =8, deionized water, absolute ethyl alcohol and acetone;
(2) Preparing a hole blocking layer: heating cleaned FTO conductive glass substrate at 500 deg.C, spraying 0.05mol/L isopropyl titanate isopropyl alcohol solution on the substrate, and heating for 20min to obtain 60nm dense TiO 2 A hole blocking layer;
(3) Preparing a perovskite layer: weighing 50uL of prepared perovskite solution, dripping the perovskite solution on the hole blocking layer, rotating the hole blocking layer for 30s under the condition that the rotating speed is 5000rpm/s, dripping an anti-solvent chlorobenzene when the last 5s is reached, and heating the hole blocking layer for 40 minutes at 100 ℃ to volatilize the perovskite material solvent to obtain a perovskite active layer;
(4) Preparing an interface modification layer: spin-coating the prepared isopropanol solution of the BiOI with the concentration of 5mg/mL on the hole transport layer, and heating the hole transport layer on a heating table at the temperature of 100 ℃ for 10min to obtain a 10nm interface modification layer;
(5) Preparing a cavity layer: spin-coating the prepared 80mg/mL Spiro-OMeTAD chlorobenzene solution on the perovskite active layer, and heating the perovskite active layer on a heating table at 100 ℃ for 10min to obtain an 80nm hole layer;
(6) Preparing an electrode layer: and (4) placing the half cell prepared in the steps (1) - (5) in an evaporator, and adjusting the evaporation rate to obtain an Au electrode layer with the thickness of 100nm to finally prepare the perovskite solar cell SC-1.
Example 5: preparation of perovskite solar cell SC-2
The perovskite solar cell SC-2 with the device structure shown in FIG. 3 is prepared according to the following steps, wherein the structure comprises the following components from bottom to top: transparent conductive substrate, electron barrier layer, perovskite layer, interface modification layer, electron transport layer, buffer layer and electrode layer:
(1) Cleaning: placing the FTO transparent conductive glass substrate in an ultrasonic cleaner, and sequentially cleaning the FTO transparent conductive glass substrate for 10 minutes by respectively using weak alkaline liquid detergent with the pH of =10, deionized water, absolute ethyl alcohol and acetone;
(2) Preparing an electron blocking layer: heating a cleaned FTO conductive glass substrate at 500 ℃, spraying a prepared 4mg/mL acetonitrile solution of nickel acetylacetonate on the substrate, and heating for 20min to form a compact NiO electronic barrier layer with the thickness of about 30 nm;
(3) Preparing a perovskite active layer: spin coating 100 μ L of perovskite solution on the compact NiO electron barrier layer, and heating on a heating table at 100 deg.C for 60min to obtain 500nm perovskite active layer;
(4) Preparing an interface modification layer: spin-coating the prepared 5mg/mL isopropanol solution of BiOBr on the hole transport layer, and heating on a heating table at 100 ℃ for 10min to obtain a 10nm interface modification layer;
(5) Preparing an electron transport layer: spin-coating the prepared PCBM chlorobenzene solution with the concentration of 20mg/mL on the perovskite active layer, and heating the perovskite active layer on a heating table at the temperature of 100 ℃ for 10min to obtain an electron transport layer with the thickness of 60 nm;
(6) Preparing a buffer layer: spin-coating the prepared saturated solution of BCP on the electron transport layer, and heating on a heating table at 70 ℃ for 10min to obtain a buffer layer with the thickness of 20 nm;
(7) Preparing an electrode layer: and (3) placing the half cell prepared in the steps (1) to (6) in an evaporation machine, and adjusting the evaporation rate to obtain an Ag electrode layer with the thickness of 100nm to obtain the perovskite solar cell SC-2.
The SC-1 is placed under a standard sunlight simulator for testing, the voltage range of scanning is-0.1-1.1V, and the scanning speed is 50mv/s. The open-circuit voltage V of the perovskite solar cell SC-1 is found through tests oc 1.14V, short-circuit current density J sc Is 23.51mA cm -2 Fill factor FF of 0.79 and photoelectric conversion efficiency of21.16 percent. The open-circuit voltage V of SC-1 is compared with the open-circuit voltage of 1.10V of the perovskite solar cell without BiOI interface modification oc Higher. Meanwhile, the SC-1 is aged for 500 hours under the condition that the humidity is 85%, the initial 92% of the device can be still maintained, and the performance of the device is attenuated to 60% of the initial value by aging the reference device under the same condition, which shows that the SC-1 has better long-term stability.
The above description is intended to describe in detail the preferred embodiments of the present invention, but the embodiments are not intended to limit the scope of the claims of the present invention, and all equivalent changes and modifications made within the technical spirit of the present invention should fall within the scope of the claims of the present invention.
Claims (10)
1. A novel ultrathin BiOX (X = F, cl, br, I) nanomaterial is characterized in that: the nano material comprises nano sheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm.
2. A method for preparing the ultra-thin BiOX nanomaterial of claim 1, wherein: the method comprises the following steps:
adding sodium oleate into deionized water, and stirring for 0.5-2 h to obtain a uniformly mixed solution;
adding Bi (NO 3) 3.5H 2O into the solution, and stirring for 1-3H to obtain a uniformly mixed solution;
adding KX (X = F, cl, br and I) into the solution, and stirring for 0.5-3 h to obtain a uniformly mixed solution;
carrying out hydrothermal reaction on the obtained solution at 120-200 ℃ for 0.5-2 d, and then cleaning and drying to obtain a product;
and putting the obtained product into an ethanol solution of tetrabutylammonium tetrafluoroborate, carrying out ultrasonic treatment for 0.5-3 h, and then cleaning and drying.
3. A BiOX interface modification layer is characterized in that: the interface modification layer comprises the ultrathin BiOX nanometer material as claimed in claim 1, and the thickness of the interface modification layer is 1-100 nm.
4. A method of producing a BiOX interface-modifying layer according to claim 3, characterized in that: the method comprises the following steps:
dispersing the BiOX nanometer material in an organic solvent to obtain a dispersion liquid;
and forming a film from the dispersion by spraying or spin coating.
5. A solar cell, characterized by: the structure of the solar cell comprises from bottom to top: the electron conduction substrate comprises a transparent conduction substrate, an electron blocking layer, a perovskite layer, an interface modification layer, an electron transmission layer, a buffer layer and an electrode layer, wherein the interface modification layer is a thin film layer containing a BiOX nanometer material, and the nanometer material contains nanometer sheets which are formed by BiOX and have the thickness of 5-200 nm and the thickness of 1-20 nm.
6. The solar cell of claim 5, wherein: the perovskite light absorption material is ABX3, A = CH3NH3, NH2CHNH2, cs or a mixture thereof; b = Pb or Sn or mixtures thereof; x = I, br, cl, CN, SCN, or mixtures thereof.
7. A method of manufacturing a solar cell according to claim 6, characterized in that: the method comprises the following steps: preparing a transparent conductive substrate;
forming an electron blocking layer on the transparent conductive substrate;
forming a perovskite layer on the electron blocking layer;
forming an interface modification layer on the perovskite layer;
forming an electron transport layer on the interface modification layer;
forming a buffer layer on the electron transport layer;
and forming an electrode layer on the buffer layer.
The interface modification layer is a film layer containing a BiOX nanometer material, and the nanometer material contains nanosheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm.
8. A solar cell, characterized by: the structure of the solar cell comprises from bottom to top: the hole transport layer is arranged on the transparent conducting substrate, and the hole transport layer is arranged on the transparent conducting substrate and is used for transporting a hole to the outside, wherein the hole transport layer is arranged on the transparent conducting substrate and is used for transporting a hole to the outside, the hole transport layer is arranged on the transparent conducting substrate, the hole blocking layer is arranged on the perovskite layer, the interface modification layer is a thin film layer containing a BiOX nanometer material, and the nanometer material contains nanometer sheets which are formed by BiOX and have the thickness of 5-200 nm and the thickness of 1-20 nm.
9. The solar cell of claim 8, wherein: the perovskite light absorbing layer is formed of an ABX3 material, a = CH3NH3, NH2CHNH2, cs, or mixtures thereof; b = Pb or Sn or mixtures thereof; x = I, br, cl, CN, SCN, or mixtures thereof.
10. A method of manufacturing a solar cell according to claim 9, characterized in that: the method comprises the following steps: preparing a transparent conductive substrate;
forming a hole blocking layer on the transparent conductive substrate;
forming a perovskite layer on the hole blocking layer;
forming an interface modification layer on the perovskite layer;
forming a hole transport layer on the interface modification layer; and
forming an electrode layer on the hole transport layer;
the interface modification layer is a film layer containing a BiOX nanometer material, and the nanometer material contains nanosheets which are formed by BiOX and have the thickness of 5-200 nm and 1-20 nm.
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