CN1153448A - Device for producing plasma, enabling microwave propagation and absorption zones to be dissociated - Google Patents
Device for producing plasma, enabling microwave propagation and absorption zones to be dissociated Download PDFInfo
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- CN1153448A CN1153448A CN 95118742 CN95118742A CN1153448A CN 1153448 A CN1153448 A CN 1153448A CN 95118742 CN95118742 CN 95118742 CN 95118742 A CN95118742 A CN 95118742A CN 1153448 A CN1153448 A CN 1153448A
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Abstract
The invention relates to a distribution device for distributing microwave power to excite a plasma inside an enclosure. According to the invention, the distribution device includes at least one second applicator of microwave energy to co-operate with a first applicator and an exciter to form at least one excitation triplet in which firstly the first applicator and the second applicator are mounted substantially parallel to each other and are spaced apart by a given amount to define between them a propagation zone for microwave energy, and secondly the exciter is disposed inside the enclosure by being placed relative to the first and second applicators in such a manner that the trajectories of the electrons do not cross the propagation zone, thereby dissociating the propagation zone and the absorption zone.
Description
The present invention relates to use microwave to produce the general technology field of plasma from the gas medium of any kind of.
More precisely, the present invention relates to or in the magnetic field of electron cyclotron resonace or to the high pressure plasma in no magnetic field, utilize microwave to produce the field of plasma.
Particularly advantageous purposes of the present invention is field of surface treatment (etching, deposition, cleaning, sterilization, pollution abatement, sputter, ion injection, chemistry or hot chemical treatment) or produces by plasma to extract the ion beam that obtains, perhaps under general situation, the present invention is used for other purposes that needs produce dense plasma.
In technical field, known the device of many generation plasmas.For example, a kind of plasma exciatiaon technology under electron cyclotron resonace of French Patent (FRP) FR85/08836 explanation.When the gyrofrequency of electronics in static or the quasi-static magnetic field equals to add the frequency of accelerating field with regard to the electron gain cyclotron resonance.For obtaining resonance by following relationship given magnetic field B and stimulating frequency f:
In B=(2 π mf)/e formula, m and e are respectively the quality and the electric charge of electronics.As an example, at frequency 2.45GHz, need 0.0875 tesla in order to obtain resonance.
For plasma exciatiaon, electron cyclotron resonace only when electronics can fully quicken by this process just may, just, only can in phase place, enough rotate for a long time and just possible when making electric field obtain the required end-point energy of ionized gas at electronics.In order to reach this point, at first require the radius of gyration enough little, particularly remain in the unified area of space of each condition of resonance, promptly wherein extra electric field and intensity are in the simultaneous zone, magnetic field of B at one; Secondly requirement and electronics and neutral elementary particle are that elastic collision frequency between atom and/or the molecule is compared, and it is big that gyrofrequency remains.In other words, when gas pressure enough low and simultaneously the enough height of electric field frequency be that magnetic field intensity B is same when high, the optimum condition of the cyclotron resonant plasma exciatiaon of electron gain.In practice, in a conventional plasma, for frequency f for being about 10 approximately or greater than the 500MHz gas pressure
-1Handkerchief (is generally 10
-3Handkerchief to 10 handkerchief depends on gas property) time, the cyclotron resonant condition that helps exciting of electron gain.Yet, needing very high magnetic field intensity greater than the microwave frequency of 10GHz, can not obtain with conventional magnetic structure and permanent magnet.When frequency f=2.45GHz, intensity B is 0.0876 tesla, and at frequency f=10GH
2The time, intensity surpasses 0.35 tesla.
As being more clearly visible in Fig. 1, permanent magnet 1 is used in the specification requirement that illustrates in the above-mentioned French Patent (FRP), and each permanent magnet 1 produces the surface 2 of at least one intensity corresponding to the stationary magnetic field of electron cyclotron resonace.Electromagnetic power is sent to resonance region 2 by antenna 3 or each by the plasma exciatiaon device that wire elements constitutes.Each exciter 3 is placed in the top of permanent magnet 1, and permanent magnet 1 is installed on the wall of stuffing box 4.
The electromagnetic field of the value that intensity equals to resonate and magnetic field be localization and be substantially limited in the space between exciter 3 and the magnet top sealing tank wall part.When having the low-pressure gas medium, electronics quickens in resonance region, and they are around the magnetic field line 5 that forms the plasma limiting surface.These magnetic field lines 5 form the vertical chain of extremely going up that the utmost point of a magnet is connected to adjacent magnets.Along its path, electronics makes with the molecule of its collision and atom disassociation and ionization takes place, and plasma produces and form from the magnetic field line diffusion subsequently then that high energy electron still is captured in the vertical chain the cold plasma that does not in fact have high energy electron along magnetic field line.An a kind of like this major defect of device is that microwave energy is propagated and the resonance region of absorption microwave energy is overlapping.Therefore to propagate and do not take place simultaneously to absorb be impossible to microwave shape applicator along the line.Therefore, plasma intensity and microwave electric field intensity reduce gradually along antenna.As a result, the plasma that obtains is inhomogeneous along the intensity of antenna, thereby is not suitable for most of industrial uses.
In order to remedy this shortcoming, patent FR91/00 894 proposes, and antenna 3 is placed in the zone 6 between magnet, and zone 6 is at the sealing tank wall and connect between the magnetic field line 5 of consecutive roots of two opposed polarities.Zone 6 is particularly suitable for microwave propagation owing in fact it does not have plasma because plasma diffusion perpendicular to magnetic field line when magnetic field intensity increases plasma diffusion greatly reduce.Therefore the total length along microwave applicator obtains the constant standing wave of wave amplitude, and every half wavelength obtains the minimum value and the maximum of microwave power.But, even therefore the microwave power along applicator evenly distributes by mean value, have electron drift owing to what the field gradients of contiguous magnetic field applicator and curvature caused along applicator, plasma source is actually uniformly, therefore along uniform plasma of applicator generation.
The major defect of this technology is, the zone of microwave electric field maximum is that the zone between applicator and the sealing tank wall does not meet consistent with the resonance region that magnetic field intensity equals electron cyclotron resonace.In order to produce plasma exciatiaon, must or increase the intensity that adds microwave electric field, perhaps increase the intensity in magnetic field, to extend resonance region.In this case, must use can the carry electrode high magnetic field intensity permanent magnet, this intensity is significantly greater than only for satisfying the intensity of resonance condition needs.
In addition, also there is following shortcoming in all technology by above-mentioned two patent descriptions:
The percentage of the working volume in the magnetic field that is produced by permanent magnet is low;
Requirement very accurately settles microwave to apply body with respect to magnet;
Requirement provides wall extremely thin and reduce the case that is exceedingly fast as the magnetic field intensity of the function of distance magnet surface distance;
Requiring to use can be along the magnetic field applicator of microwave applicator travelling magnetic field, and this microwave applicator is even as far as possible, so that avoid for propagate the extremely disadvantageous impedance fracture of microwave along applicator;
Hardly may be by the plasma exciatiaon mechanism gas that pumps and provide and deliver; And
Launching efficiency is very low, and owing to the fragmentation that the ion that spreads with fast electronics produces wall, the electron drift that these fast electron production plasmas cause owing to field gradients and curvature faces toward wall disappear (magnetron effect).
Therefore the present invention is conceived to remedy the various shortcomings of prior art, and method is to propose a kind of device of guaranteeing that microwave power is propagated minimumly and provided and delivered along the loss of magnetic field applicator length direction of being suitable for.Thereby the acquisition maximum microwave power makes to obtain in fact constant plasma density (at least on average).
The present invention is conceived to provide a kind of plasma generating device, can improve microwave power and does not have the restriction of any pure physics aspect, thereby can improve the density of this plasma simultaneously.
In order to reach these purposes, the dispensing microwave power comprises to excite the dispenser that plasma is used in the stuffing box:
A source of microwave energy;
At least one microwave energy first applicator; And
At least one linear plasma exciatiaon device is placed in apart from microwave first applicator a distance, and between forms a uptake zone, and electronics is subjected to the acceleration of microwave field along the track of determining.
According to the present invention, this dispenser comprises at least one microwave energy second applicator, cooperate with one first applicator and an exciter, form at least one and excite triple combination, wherein, at first, first applicator and second applicator are mounted to parallel to each other substantially and spatially spaced apart, form a microwave energy propagation zone betwixt, secondly, exciter is placed in stuffing box inside, settles with respect to first and second applicators in such a way, make the track of electronics not intersect, thereby separate propagation zone and uptake zone with propagation zone.
Can know other various features from following with reference to the description of the drawings, they show each embodiment of the present invention and are implemented as nonrestrictive example.
Fig. 1 is the schematic section of the prior art device used of a kind of microwave energy of providing and delivering;
Fig. 2 is the mechanical device figure that a kind of generation plasma of implementing the embodiment of dispensing microwave energy device of the present invention is used;
Fig. 3 is substantially along the sectional view of Fig. 2 III-III line;
Fig. 4 is the larger scale map of expression a kind of cell distribution device of the present invention;
Fig. 5 represents the embodiment that excites applicator that is suitable for implementing in apparatus of the present invention;
Fig. 6 to 8 expression can be implemented the various combinations of excitation apparatus of the present invention;
Fig. 9 and 10 is schematic diagrams of implementing excitation apparatus of the present invention in second variant embodiment.
As from Fig. 2 and 3 as seen, mechanical device I is suitable for producing purposes plasma very widely from the gas medium of any kind of, as is used for surface treatment or produces ion beam.This mechanical device comprises a nonmagnetic stuffing box 7, device 8 that at least one injecting gas uses is housed and at least one pumps the device 9 that gas is used, make treat ionized gas can remain on pass lasing region under the pressure of wanting, this pressure for example can be about 10
-2Handkerchief is to several handkerchiefs.Mechanical device I also comprises a device that activated plasma is used of the present invention, and this plasma is limited in the center of stuffing box.For example, in the service area, this plasma is used for being placed on the support 12 and utilizing generator 13 to carry out surface treatment with respect to biased sample of the current potential of plasma or object 11.
Excitation apparatus of the present invention comprises at least one plasma exciatiaon device e, and the latter constitutes in first embodiment and utilizes permanent magnet or utilize the element that comes externally-applied magnetic field to use along the electric current of conductor or superconductor conduction.In illustrated embodiment, excitation apparatus comprises a series of exciter e, and each is made of the permanent magnet that lumping together of wire forms the multi-polar magnetic structure.As can more clearly seeing from Fig. 2 and 4, magnetic peeler e article on plasma body parallel to each other substantially presents the alternating polarity that continues, thereby constitutes the magnetic surface 5 of shape such as magnetic field line vertical chain.Magnetic peeler e settles in such a way, makes the magnetic field line of vertical chain form that the utmost point of a magnet is connected on its relative antipode of extremely going up or be connected to adjacent magnet.Therefore, the generation of plasma is limited in the zone 10 in the magnetic field line vertical chain 5.
In a preferred embodiment, the multi-polar magnetic structure is made like this, makes that can obtain the enough magnetic field of intensity guarantees electron cyclotron resonace.As can seeing more accurately from Fig. 4, each exciter e is suitable for producing the surface 2 of the constant and magnetic field intensity in magnetic field corresponding to electron cyclotron resonace.This surface 2 partly or wholly surrounds each magnet e, as shown in phantom in Figure 4.For example, for the stimulating frequency of 2.45GHz, magnetic field is necessary for 0.0875 tesla, and for the stimulating frequency of 5.8GHz, magnetic field intensity is necessary for 0.207 tesla.
Exciter e is to be placed in the stuffing box 7 apart from sealing tank wall certain distance, gas can be pumped from above-mentioned tank wall, next makes electronics can accelerate to electron cyclotron resonace, thereby drifts about along magnetic field line vibration and perpendicular to magnetic field with perpendicular to magnetic field gradient or curvature.Therefore exciter e settles like this, makes not intersect with the sealing tank wall around the electron orbit of magnetic field line.
Excitation apparatus of the present invention also comprises at least one (and being a series of) first applicator P1 in illustrative example, be used to apply the energy of microwave range, and these applicators are placed in certain regional area.The first applicator P1 is connected on the microwave energy generator 20 through impedance matching box 21 by any suitable device.Each first applicator P1 is positioned to apart from exciting preset distance of e, makes to form a uptake zone A betwixt, electronics takes place in the district quicken.For this reason, plasma exciatiaon requires electronics to be subjected to fully quickening therefore to require microwave electric field and magnetic field to have abundant intensity with activated plasma in this uptake zone A.The electronics of Jia Suing produces plasma along magnetic field line 5 along its track by this way.In example shown in Figure 4, plasma exciatiaon carries out with electron cyclotron resonace.
Each first applicator P1 preferably includes first line elements in the input of one end, perhaps by the coaxial channel of vacuum or by waveguide-coaxial transmission, perhaps by cavity-coaxial transmission.When the first applicator P1 when the line elements, each uptake zone A along applicator P1 between applicator and the magnet e that correspondingly settles.
According to the present invention, excitation apparatus also comprises at least one (and being a series of) microwave energy second applicator P2 in illustrative example, and each is placed in preset distance apart from the first applicator P1.Taking place under the situation of coupling between first and second adjacent applicator P1 and the P2,, forming a microwave power propagation zone P so each second applicator P2 cooperates with settling the first applicator P1 in its vicinity.In illustrated embodiment, each exciter e is positioned to and is parallel to applicator P1 and P2 extension substantially.Should observe, exciter e can be placed in respect to applying in the P1 position different with P2.For example, exciter e can be positioned to perpendicular to applicator P1 and P2.In mode more generally, can take to retouch the array of executing an exciter e and be positioned to array perpendicular to applicator P1 and P2.Excitation apparatus of the present invention comprises at least one and is the element that excites of a series of triple combination generally speaking that each triple combination comprises an exciter e, first an applicator P1 and one second applicator P2.In each triple combination, the second applicator P2 and the first applicator P1 settle like this with respect to exciter e, make the track of excitation electron not intersect with microwave power propagation zone P.In usual manner, excitation electron is around magnetic field line 5.The applicator P1 of each triple combination and P2 must settle like this, make the track 5 of excitation electron not intersect with propagation zone P.By this way, might from relevant uptake zone A, separate each propagation zone P, propagate thereby make it possible to obtain good microwave energy all the time along exciter.
Exciter e settles like this, and the feasible track that centers on the electronics of magnetic field line does not run into obstacle and do not stopped, is not particularly sealed stopping of tank wall.For this reason, exciter e must be positioned at along its length and at least the one end thereof place apart from sealing tank wall distance, particularly when as shown in Figure 3 diametrical magnetization of use.In the embodiment of this modification, the limited length of exciter e is shorter than the size of stuffing box 7, thereby stays non-lasing region N between the wall of best two ends, at least one end of exciter e and stuffing box 7.For the big exciter e of length, each magnet e extends a section 24 at its two ends, is used for magnet is installed in the wall of stuffing box.
As can be as can be seen from Figure 3, by exciter e is installed in stuffing box inside, can be by one or more position with respect to the lasing region dispensing with pump gas.A kind of like this configuration makes can have a kind of excitation structure that can be suitable for processed object 11 shapes (plane or cylindrical shape).Particularly, as if exciter e can be placed in apart from object distance arbitrarily.
In order to strengthen the microwave propagation of lasing region A outside, the first applicator P1 and the second applicator P2 must be close fully in each triple combination, make maximum power propagate and preferentially take place between them.Usually, the applicator P1 of each triple combination, the distance between the P2 must and the exciter e of each applicator P1, P2 between the same order of magnitude of distance, if possible, last distance should be equal to or less than back one distance.
In illustrated embodiment, should observe, microwave source 20 is connected on the first applicator P1.Nature can be directly connected to microwave source 20 the second applicator P2 or excites on the applicator e, makes maximum power propagate the assurance that is subjected to applicator P1, P2 all the time.Microwave source 20 preferably is connected on one of two applicator P1, P2, and generation preferentially excites and produces uniform plasma along the exciter total length on the end that excites applicator e to avoid.Should consider that also applicator P1, P2 always have one can be made of the part of the wall of closed chamber 7.
In addition, when exciting applicator e to take the permanent magnet form, can use various permanent magnet structures.Therefore (for example) can consider to use linear magnetic applicator (Fig. 3) or the linear applicator (Fig. 5) with alternation magnetic texure of the magnet that uses the axial magnetized effect with continuous warp-wise magnetization.Usually, exciter e and applicator P1, P2 can have any shape and section, and if desired, they can utilize the passage that transmits the circulating cooling liquid body and function to carry out the inside cooling, and these passages are arranged on the inside of exciter and/or applicator.
Should observe, applicator and/or exciter also can be used to provide and deliver gas, photon, additional electron, radiation etc.Equally, may be favourable with a nonconducting chest around applicator P1, P2, so that with respect to outside and on electricity or calorifics, make device isolated or avoid the risk of metallic pollution, or even guarantee to propagate better when not losing plasma simultaneously and existing microwave power along applicator.
Excitation apparatus of the present invention can be used for the purposes that the independent triple combination of needs excites element.It can certainly use together with a series of relevant triple combination elements, so that produce large-area size and dimension plasma (planar shaped very inequality, cylindrical shape, headtotail shape ...), perhaps with cooperate by the magnetic field that excites applicator to produce and form a kind of multi-polar magnetic restraining structure, as shown in Figure 2.As nonrestrictive example, Fig. 6 to 9 expression wherein propagate applicator P1, P2 or exciter e can with contiguous device or the public various combinations of device that continue.In all cases, propagation zone P and uptake zone A must spatially separate, and illustrate as top.
Second variant embodiment of Fig. 9 and 10 expressions excitation apparatus of the present invention is used for high pressure or high microwave power.
Under high pressure or high microwave power, to catch fire in order in the highest particular propagation district P of electric field, to avoid discharge or plasma, suggestion is filled propagation zone P with presenting low-loss dielectric material 25.Then in so-called lasing region A, discharge.The too frequent and no longer possible occasion of electron cyclotron resonace of elastic collision when high pressure because on neutral object, its validity can be lost in magnetic field, becomes the simple wire-form applicator of propagating applicator for being similar to and excite applicator e to dwindle.
In the advantage that the present invention produces, should be mentioned that those can solve the advantage of the problem that proposes in the prior art, particularly solve all and propagate relevant problem along excitation device with microwave.In the present invention, use three linear applicators make can microwave propagation and exciting of plasma will in the space, separate.Thereby avoid with magnetic field and plasma in the big relevant impedance discontinuity of local inhomogeneities.In addition, the present invention in use can have greater flexibility, and particularly the pressure limit in choice reaction heap configuration, magnetic texure and permission (is generally 10
-3Handkerchief to 10
3Handkerchief or more than) aspect.Another conclusive advantage is the validity of device, because increasing the restriction that does not have pure physical property aspect microwave power that applicator propagates and the density that therefore increases plasma simultaneously along propagating.Another advantage of the present invention is that the size that can be proportional to pending object 11 increases pumping rate, and this point can be found out from the example shown in Fig. 3.Secondly, be placed in the inner magnet that holds in knitting of stuffing box by use and can obtain very high launching efficiency, each magnet is on itself or be adjacent magnet together, can form three-dimensional magnetron.
The invention is not restricted to illustrate and illustrated embodiment, because can carry out many variations and not exceed its scope to it.
Claims (13)
- One kind be used to provide and deliver microwave power in case in stuffing box the dispenser of activated plasma, this device comprises:A source of microwave energy (20);At least one microwave energy first applicator (P1) (21);At least one linear plasma exciatiaon device (e) is placed in apart from microwave first applicator (P1) a distance, is used for forming between them a uptake zone (A), and electronics is subjected to the acceleration of this microwave field along the track of determining (5);It is characterized in that, this dispenser comprises at least one microwave energy second applicator (P2), be used for cooperating with one first applicator (P1) and an exciter (e), form at least one and excite triple combination, wherein, at first, first applicator (P1) and second is executed device (P2) and is mounted to parallel to each other substantially and spatially spaced apart, form a microwave energy propagation zone (P) betwixt, secondly, exciter (e) is placed in stuffing box (7) inside, in such a way with respect to the first and second applicator (P1, P2) settle, make the track (5) of electronics not intersect, thereby separate propagation zone (P) and uptake zone (A) with propagation zone (P).
- 2. device according to claim 1, it is characterized in that (P1 P2) settles first and second applicators in the same triple combination in such a way, make between the two distance be equal to or less than each applicator (P1, P2) and the distance between the relevant exciter.
- 3. the device according to claim 1 is characterized in that, plasma exciatiaon device (e) produces a magnetic field in electron cyclotron resonance frequency.
- 4. device according to claim 1, it is characterized in that, (P1, the microwave energy propagation zone (P) that forms between P2) has been filled a kind of dielectric material, discharges under high pressure or high microwave power in this zone to prevent plasma in first and second applicators.
- 5. the device according to claim 1 is characterized in that, (P1 P2) is made of a line elements each applicator.
- 6. the device according to claim 1 is characterized in that, (P1 is that a wall by stuffing box constitutes P2) at least one applicator in the triple combination.
- 7. the device according to claim 1 and 5 is characterized in that, source of microwave energy (20) be connected to form any line elements that excites triple combination (P1, P2) on.
- 8. the device according to claim 1 is characterized in that, (P1 P2) is installed in stuffing box (7) inside to two applicators.
- 9. the device according to claim 1 is characterized in that, exciter (e) be mounted to be parallel to substantially applicator (P1, P2).
- 10. the device according to claim 1 is characterized in that, the limited length of exciter (e) is shorter than the size of stuffing box (7), thereby stays next non-lasing region between at least one end of stuffing box and exciter.
- 11. the device according to claim 1 is characterized in that, plasma exciatiaon device (e) has one by the magnetized structure of magnetization that is radial, axial or radially, continuous or alternation.
- 12. the device according to claim 1 is characterized in that, it comprise a series of settle relative to one another in such a way excite body (e), promptly form a multipole magnetic structure.
- 13. the mechanical device of the generation plasma of a following type, comprise that is connected the stuffing box (7) that at least one pumps the device (8) of a device (9) and a conveying gas medium, so that in stuffing box, keep certain pressure, this mechanical device is characterised in that it comprises at least one device according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 95118742 CN1153448A (en) | 1994-11-04 | 1995-11-03 | Device for producing plasma, enabling microwave propagation and absorption zones to be dissociated |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9413499 | 1994-11-04 | ||
| CN 95118742 CN1153448A (en) | 1994-11-04 | 1995-11-03 | Device for producing plasma, enabling microwave propagation and absorption zones to be dissociated |
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| Publication Number | Publication Date |
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| CN1153448A true CN1153448A (en) | 1997-07-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 95118742 Pending CN1153448A (en) | 1994-11-04 | 1995-11-03 | Device for producing plasma, enabling microwave propagation and absorption zones to be dissociated |
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| CN (1) | CN1153448A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101248707B (en) * | 2005-08-24 | 2011-08-31 | 陶氏康宁公司 | Method and apparatus for creating a plasma |
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1995
- 1995-11-03 CN CN 95118742 patent/CN1153448A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101248707B (en) * | 2005-08-24 | 2011-08-31 | 陶氏康宁公司 | Method and apparatus for creating a plasma |
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