CN115339195A - Copper-clad plate with low thermal expansion coefficient suitable for PCB lead-free process and preparation method thereof - Google Patents
Copper-clad plate with low thermal expansion coefficient suitable for PCB lead-free process and preparation method thereof Download PDFInfo
- Publication number
- CN115339195A CN115339195A CN202210883560.0A CN202210883560A CN115339195A CN 115339195 A CN115339195 A CN 115339195A CN 202210883560 A CN202210883560 A CN 202210883560A CN 115339195 A CN115339195 A CN 115339195A
- Authority
- CN
- China
- Prior art keywords
- copper
- clad plate
- thermal expansion
- expansion coefficient
- low thermal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 24
- 238000003756 stirring Methods 0.000 claims description 53
- 239000003822 epoxy resin Substances 0.000 claims description 51
- 229920000647 polyepoxide Polymers 0.000 claims description 51
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 42
- 239000003960 organic solvent Substances 0.000 claims description 28
- 239000007787 solid Substances 0.000 claims description 27
- 229920001568 phenolic resin Polymers 0.000 claims description 25
- 239000004744 fabric Substances 0.000 claims description 22
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 21
- 239000003365 glass fiber Substances 0.000 claims description 21
- 239000000853 adhesive Substances 0.000 claims description 20
- 230000001070 adhesive effect Effects 0.000 claims description 20
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 20
- 229910052794 bromium Inorganic materials 0.000 claims description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 19
- 239000011889 copper foil Substances 0.000 claims description 18
- 239000005011 phenolic resin Substances 0.000 claims description 18
- 239000012745 toughening agent Substances 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 16
- 239000011256 inorganic filler Substances 0.000 claims description 15
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 15
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims description 10
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 9
- 238000003825 pressing Methods 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 238000005303 weighing Methods 0.000 claims description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 5
- NFIDBGJMFKNGGQ-UHFFFAOYSA-N 2-(2-methylpropyl)phenol Chemical compound CC(C)CC1=CC=CC=C1O NFIDBGJMFKNGGQ-UHFFFAOYSA-N 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- 238000004026 adhesive bonding Methods 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 238000007598 dipping method Methods 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 claims description 4
- GJYCVCVHRSWLNY-UHFFFAOYSA-N ortho-butylphenol Natural products CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 230000000704 physical effect Effects 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 claims description 2
- CRBJBYGJVIBWIY-UHFFFAOYSA-N 2-isopropylphenol Chemical compound CC(C)C1=CC=CC=C1O CRBJBYGJVIBWIY-UHFFFAOYSA-N 0.000 claims description 2
- LCHYEKKJCUJAKN-UHFFFAOYSA-N 2-propylphenol Chemical compound CCCC1=CC=CC=C1O LCHYEKKJCUJAKN-UHFFFAOYSA-N 0.000 claims description 2
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 claims description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000004927 clay Substances 0.000 claims description 2
- 229910052570 clay Inorganic materials 0.000 claims description 2
- 239000000498 cooling water Substances 0.000 claims description 2
- 239000011258 core-shell material Substances 0.000 claims description 2
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 229920001971 elastomer Polymers 0.000 claims description 2
- 230000001804 emulsifying effect Effects 0.000 claims description 2
- 238000001879 gelation Methods 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 238000010008 shearing Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 claims description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 6
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims 1
- 230000009477 glass transition Effects 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000011342 resin composition Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 238000005476 soldering Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000000113 differential scanning calorimetry Methods 0.000 description 6
- 238000009472 formulation Methods 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000003889 chemical engineering Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 3
- 230000032798 delamination Effects 0.000 description 2
- DATWNUNJGBZECY-UHFFFAOYSA-N formaldehyde;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;phenol Chemical compound O=C.OC1=CC=CC=C1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 DATWNUNJGBZECY-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229920006061 Kelon® Polymers 0.000 description 1
- DDNCQMVWWZOMLN-IRLDBZIGSA-N Vinpocetine Chemical compound C1=CC=C2C(CCN3CCC4)=C5[C@@H]3[C@]4(CC)C=C(C(=O)OCC)N5C2=C1 DDNCQMVWWZOMLN-IRLDBZIGSA-N 0.000 description 1
- PQIJHIWFHSVPMH-UHFFFAOYSA-N [Cu].[Ag].[Sn] Chemical compound [Cu].[Ag].[Sn] PQIJHIWFHSVPMH-UHFFFAOYSA-N 0.000 description 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000012824 chemical production Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005007 epoxy-phenolic resin Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229910000969 tin-silver-copper Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229960000744 vinpocetine Drugs 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/14—Layered products comprising a layer of metal next to a fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/06—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0036—Heat treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/08—Impregnating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
- B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
- B32B2037/243—Coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/02—Coating on the layer surface on fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/10—Inorganic fibres
- B32B2262/101—Glass fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/306—Resistant to heat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/732—Dimensional properties
- B32B2307/734—Dimensional stability
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Thermal Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Fluid Mechanics (AREA)
- Laminated Bodies (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
The invention discloses a copper-clad plate with low thermal expansion coefficient suitable for a PCB lead-free process and a preparation method thereof. The copper-clad plate prepared by the invention has the advantages of common glass transition temperature (Tg ≧ 135 ℃), excellent heat resistance and low thermal expansion coefficient, and can be suitable for the production of lead-free process printed circuit boards in the PCB industry.
Description
Technical Field
The invention relates to the technical field of copper-clad plate preparation, in particular to a copper-clad plate with low thermal expansion coefficient suitable for a PCB lead-free process and a preparation method thereof.
Background
With the high density and high performance of the PCB, the HDI/BUM board, the embedded component multilayer board, the high-density multilayer board, and the like are rapidly developed, and the number of layers, thickness, and area of the PCB are increased, and when the high-temperature soldering is performed, particularly the lead-free soldering is performed, in order to ensure the reliability of the soldering, the high-temperature soldering temperature or the longer soldering time is required to be endured, so that higher requirements are made on the substrate material, and compared with the conventional material, the board material has higher glass transition temperature and heat resistance.
Beginning at 7/1 in 2006, the official implementation of two directives (directive on the restriction of the use of hazardous substances in electrical and electronic products and directive on the scrapping of electrical and electronic products) in the european union indicates that the global electronics industry will enter the lead-free soldering era. Because the welding temperature is high, the thermal reliability of the copper-clad plate is correspondingly improved, the traditional lead-tin solder can not be reused, and the welding temperature required by the existing tin-silver-copper and other alternative solders is greatly improved. While the traditional FR-4 copper-clad plate has low heat resistance, the glass transition temperature is only 130-140 ℃, the thermal decomposition temperature is generally only 300-310 ℃, although the traditional FR-4 copper-clad plate is widely applied to general electronic products, the traditional FR-4 copper-clad plate cannot be applied to the field of high-density interconnection and integrated circuits, the development of the electronic products is rapid, and along with the lightening and thinning of printed circuits, multilayering and the development of semiconductor mounting technology, a substrate is required to have good heat resistance and PCB processing performance so as to improve the interconnection and mounting reliability.
At present, market competition is more and more severe, most of lead-free products developed in the industry have Tg of 150 ℃ or above, the copper-clad plate materials are various and are more and more mature, and the development of a common Tg copper-clad plate based on cost consideration also becomes a trend of materials with low thermal expansion coefficient and good heat resistance.
Disclosure of Invention
In view of the above problems, the invention aims to provide a copper-clad plate with low thermal expansion coefficient suitable for a PCB lead-free manufacturing process and a preparation method thereof. The copper-clad plate material prepared by the invention has low thermal expansion coefficient, good heat resistance and lower material cost.
In order to realize the purpose of the invention, the technical scheme of the invention is as follows:
the copper-clad plate is suitable for a PCB lead-free process and has a low thermal expansion coefficient, the copper-clad plate is prepared from an adhesive, glass fiber cloth and a copper foil, the adhesive consists of a solid matter and an organic solvent, wherein the weight percentage content of the solid matter is 50-75%, the balance is the organic solvent,
the solid comprises the following components in percentage by weight:
in a preferred embodiment of the present invention, the physical properties of the base epoxy resin are required to have an epoxy equivalent EEW (g/eq) in the range of 160 to 210;
the hydrolysable chlorine is in the range of 300MAX.
In a preferred embodiment of the present invention, the base epoxy resin is preferably, but not limited to, BE188 resin of chemical engineering corporation of taiwan vinpocetine.
In a preferred embodiment of the present invention, the physical properties of the low-bromine epoxy resin are required to have an epoxy equivalent EEW (g/eq) in the range of 380 to 450;
hydrolyzable chlorine in the range of 300MAX;
the bromine content (wt%) is 17-24.
In a preferred embodiment of the present invention, the low-bromine epoxy resin is GEBR454a80 epoxy resin manufactured by marchand electronics, guangzhou, but is not limited thereto.
In a preferred embodiment of the present invention, the toughening agent is a core shell rubber based toughening agent.
In a preferred embodiment of the present invention, the phenol-formaldehyde resin is phenol-formaldehyde crosslinked phenol-formaldehyde, and the phenol is phenol, xylenol, ethylphenol, n-propylphenol, isopropylphenol, n-butylphenol, isobutylphenol, tert-butylphenol, or bisphenol a phenol-formaldehyde crosslinked phenol-formaldehyde resin, or a mixture of phenol-formaldehyde resin and bisphenol a phenol-formaldehyde resin.
In a preferred embodiment of the present invention, the phenol resin is preferably KPH-2003 resin of korea-kresome chemical.
In a preferred embodiment of the present invention, the curing accelerator is any one or more of 2-ethyl-4-methylimidazole, 2-methylimidazole or 1-benzyl-2-methylimidazole. 2-methylimidazole is preferred.
In a preferred embodiment of the invention, the inorganic filler is any one or more of talc powder, quartz powder, ceramic powder, aluminum hydroxide or metal oxide particles,
the metal oxide particles are any one or more of silicon dioxide, clay and boron nitride.
Preferably any one or more of silica, aluminium hydroxide or talc.
The resin composition of the invention is added with proper filler to reduce the expansion coefficient of the resin composition for manufacturing a copper clad plate material, and the inorganic filler can improve the chemical property and the electrical property of the cured resin, such as reducing the Coefficient of Thermal Expansion (CTE), increasing the modulus, accelerating the heat transfer, assisting the flame retardance and the like.
In a preferred embodiment of the present invention, the organic solvent is one or a mixture of two or more of acetone, methyl ethyl ketone, methyl isobutyl ketone, or propylene glycol methyl ether.
A preparation method of a copper-clad plate with low thermal expansion coefficient suitable for a PCB lead-free process comprises the following steps:
the preparation method of the adhesive comprises the following steps:
1) Adding part of organic solvent, phenolic resin curing agent and toughening agent into a stirring tank according to the formula amount, starting a stirrer, rotating at 800-1000 rpm, continuously stirring for 2-2.5 hours to ensure that all solids in the tank are completely dissolved, and simultaneously controlling the temperature of the tank body to be 20-45 ℃;
then adding inorganic filler, and continuously stirring for 90-120 minutes after the addition is finished;
2) Sequentially adding basic epoxy resin and low-bromine epoxy resin according to the formula amount in a stirring tank, stirring at the rotating speed of 1000-1400 rpm in the feeding process, starting high-efficiency shearing and emulsifying for 1-3 hours after the addition is finished, and simultaneously performing cooling water circulation to keep the temperature of the tank body controlled at 20-45 ℃;
3) Weighing the epoxy resin curing accelerator according to the formula amount, adding the epoxy resin curing accelerator into the rest organic solvent, adding the solution into a stirring tank after the epoxy resin curing accelerator is completely dissolved, and continuously stirring for 4-12 hours at 1000-1500 rpm to obtain the adhesive;
a prepreg preparation step:
1) The adhesive is circulated to a gluing machine, is evenly coated on the glass fiber cloth through pre-dipping and main dipping,
2) Baking the glass fiber cloth coated with the adhesive in a drying oven at 110-250 ℃ to volatilize the solvent, and primarily reacting and curing the adhesive to obtain a prepreg; wherein the linear speed of gluing is controlled to be 8-25m/min,
controlling physical parameters of the prepreg: the gelation time is 80-175 seconds, the mass percent of resin components in the prepreg is 35-78%, the resin fluidity is 15-45%, and the volatile component is less than 0.75%;
typesetting and pressing:
1) Cutting the prepreg into a group of 1-18 sheets with the same size, overlapping the prepreg with copper foil, and pressing;
2) The pressing parameters were controlled as follows:
a. pressure: 100-550psi;
b. temperature of the hot plate: 80-200 ℃;
c. vacuum degree: 0.030-0.080Mpa;
d. pressing time: 150-180 minutes;
e. curing time: and keeping the temperature of 190 ℃ for 40-100 minutes.
In a preferred embodiment of the present invention, the glass fiber cloth in the prepreg preparation step is grade E, and the specification is 101, 104, 106, 1078, 1080, 1086, 2113, 2313, 2116, 1506 or 7628.
In a preferred embodiment of the present invention, the copper foil is 1/3oz, hoz, 1oz, 2oz, 3oz, 4oz, or 5oz.
The specification of the copper-clad plate prepared by the invention is 36 × 48 inches, 36.5 × 48.5 inches, 37 × 49 inches, 40 × 48 inches, 40.5 × 48.5 inches, 41 × 49 inches, 42 × 48 inches, 42.5 × 48.5 inches or 43 × 49 inches, and the thickness of the copper-clad plate is 0.05-3.2mm.
The invention has the beneficial effects that:
the copper-clad plate prepared by the invention has the advantages of common glass transition temperature (Tg is larger than or equal to 135 ℃), excellent heat resistance and low coefficient of thermal expansion (CTE (50-260 ℃) is smaller than or equal to 3.2%), and can be suitable for manufacturing the lead-free process printed circuit board in the PCB industry.
Detailed Description
The invention is further illustrated by the following examples and comparative examples.
The characteristics of the copper-clad plates of examples 1 to 4 and comparative example were measured by the following method (refer to IPC-TM-650).
(1) Glass transition temperature (Tg)
Glass transition temperature
The detection method comprises the following steps: differential Scanning Calorimetry (DSC) is used to refer to the temperature (. Degree. C.) at which the sheet changes from a glassy state to a highly elastic (rubbery) state when heated.
(2) Thermal stratification time (T-288)
The T-288 thermal delamination time is the time during which the sheet delaminates due to heat at a set temperature of 288 ℃ before it lasts.
The detection method comprises the following steps: thermomechanical analysis (TMA) was used.
(3) Strength of peel resistance
According to IPC-TM-650-2.4.8C method.
(4) Solder heat resistance
Solder heat resistance refers to the duration of time during which the sheet is immersed in molten solder at 288 ℃ without delamination and blistering.
The detection method comprises the following steps: cutting the etched substrate into 5.0cm × 5.0cm, sequentially polishing the edges of the substrate with 120-mesh and 800-mesh abrasive paper, cooking for a certain time with a pressure cooker, putting into a tin melting furnace at 288 ℃, and observing whether layering occurs or not.
(5) Water absorption rate
The test was carried out according to the IPC-TM-650-2.6.2.1 method.
The present invention will BE described in detail with reference to the following examples, which are intended to refer to the basic epoxy resin BE188 resin from the chemical production of Taiwan Changchun, china, unless otherwise specified;
the low-bromine epoxy resin is GEBR454A80 epoxy resin produced by Guangzhou Macrochang electronic material company;
the phenolic resin curing agent is KPH-2003 resin of Korea Kelon chemical engineering, and the flexibilizer is STR-8330 of Seitv chemical engineering.
The glass fiber cloth can be selected from E grade, and the specification can be selected from 101, 104, 106, 1078, 1080, 1086, 2113, 2313, 2116, 1506 or 7628. The copper foil can be selected from 1/3oz, hoz, 1oz, 2oz, 3oz, 4oz or 5oz.
Example 1
1. The resin composition of this example contains 66.8% by weight of solids, and the balance of organic solvent (methyl ethyl ketone), wherein the formulation of solids is shown in table 1 below (by weight).
TABLE 1
Raw material | Solid weight (g) |
Basic epoxy resin | 4.2 |
Low bromine epoxy resins | 41 |
Phenolic resin curing agent | 13.5 |
Toughening agent | 3 |
Epoxy resin curing accelerator | 0.008 |
Inorganic filler | 42 |
2. The preparation method of the epoxy resin composition comprises the following steps:
(1) Adding 50 g of organic solvent methyl ethyl ketone and a toughening agent into a stirring tank according to the weight, starting a stirrer, rotating at 900 rpm, continuously stirring for 120 minutes until the toughening agent is completely dissolved, then adding an inorganic filler, and continuously stirring for 100 minutes after the addition is finished;
(2) Adding a phenolic resin curing agent, basic epoxy resin and low-bromine epoxy resin into a stirring tank in sequence according to the formula amount, and stirring at the rotating speed of 1000 revolutions per minute in the feeding process;
(3) Weighing 2-methylimidazole according to the formula ratio of 1:10 and the organic solvent methyl ethyl ketone are completely dissolved, the solution is added into a stirring tank, and stirring is continuously carried out for 2 hours at 1200 rpm, so as to prepare the resin composition.
3. Preparation of copper-clad plate
The resin adhesive prepared by the method is continuously coated or impregnated with glass fiber cloth, the glass fiber cloth is dried under the baking condition of 170 ℃ to obtain prepregs, 8 prepregs are overlapped, 1 piece of high-temperature extending copper foil with the thickness of 35 mu m is respectively placed on the prepregs and placed on the prepregs, and the prepregs are heated and pressurized for 60 minutes under the pressure of 190 ℃ and 350PSI to obtain the copper-clad plate with the thickness of 1.5 mm.
4. The performance parameters of the copper-clad plate prepared in this example are shown in table 2 below:
TABLE 2
Item | Test results |
Glass transition temperature (DSC,. Degree.C.) | 138 |
Copper foil peel strength (1oz, lb/in) | 8.5 |
T288(TMA,min) | 25 |
Solder heat resistance (288 ℃ tin immersion, min) | >10 |
CTE(%) | 3.1 |
Td(℃,5%wt loss) | 332 |
Water absorption (%) | 0.13 |
Example 2
1. The resin composition of this example contains 63% by weight of solids, and the balance of organic solvent (methyl ethyl ketone), wherein the formulation of solids is shown in table 3 below (by weight).
TABLE 3
Raw material | Solid weight (g) |
Basic epoxy resin | 5 |
Low bromine epoxy resins | 31 |
Phenolic resin curing agent | 11 |
Toughening agent | 5 |
Epoxy resin curing accelerator | 0.01 |
Inorganic filler | 48 |
2. The preparation method of the epoxy resin composition comprises the following steps:
(1) Adding 58 g of organic solvent methyl ethyl ketone and a toughening agent into a stirring tank according to the weight, starting a stirrer at the rotating speed of 1000 rpm, continuously stirring for 120 minutes until the toughening agent is completely dissolved, then adding an inorganic filler, and continuously stirring for 100 minutes after the addition is finished;
(2) Adding a phenolic resin curing agent, basic epoxy resin and low-bromine epoxy resin into a stirring tank in a formula ratio in sequence, and stirring at the rotating speed of 1000 revolutions per minute in the feeding process;
(3) Weighing 2-methylimidazole according to the formula ratio of 1:10 and the organic solvent methyl ethyl ketone are completely dissolved, the solution is added into a stirring tank, and stirring is continuously carried out for 2 hours at 1200 rpm, so as to prepare the resin composition.
3. Preparation of copper-clad plate
The resin adhesive prepared by the method is continuously coated or impregnated with glass fiber cloth, the glass fiber cloth is dried under the baking condition of 170 ℃ to obtain prepregs, 8 prepregs are overlapped, 1 piece of high-temperature extending copper foil with the thickness of 35 mu m is respectively placed on the prepregs and the prepregs, and the copper-clad plate with the thickness of 1.5mm is obtained by heating and pressurizing the prepregs under the pressure of 190 ℃ and 350PSI for 60 minutes.
4. The performance parameters of the copper-clad plate prepared in this example are shown in table 4 below:
TABLE 4
Example 3
1. The resin composition of this example contains 60% by weight of solids, and the balance of organic solvent (methyl ethyl ketone), wherein the formulation of solids is shown in table 5 below (by weight).
TABLE 5
Raw material | Solid weight (g) |
Basic epoxy resin | 6 |
Low bromine epoxy resins | 44 |
Phenolic resin curing agent | 15 |
Toughening agent | 4 |
Epoxy resin curing accelerator | 0.01 |
Inorganic filler | 32 |
2. The preparation method of the epoxy resin composition comprises the following steps:
(1) Adding 67 g of organic solvent methyl ethyl ketone and a toughening agent into a stirring tank according to the weight, starting a stirrer, rotating at 1000 r/min, continuously stirring for 120 minutes until the toughening agent is completely dissolved, then adding an inorganic filler, and continuously stirring for 100 minutes after the addition is finished;
(2) Adding a phenolic resin curing agent, basic epoxy resin and low-bromine epoxy resin into a stirring tank in a formula ratio in sequence, and stirring at the rotating speed of 1000 revolutions per minute in the feeding process;
(3) Weighing 2-methylimidazole according to the formula ratio of 1:10 and the organic solvent methyl ethyl ketone are completely dissolved, the solution is added into a stirring tank, and stirring is continuously carried out for 2 hours at 1200 rpm, so as to prepare the resin composition.
3. Preparation of copper-clad plate
The resin adhesive prepared by the method is continuously coated or impregnated with glass fiber cloth, the glass fiber cloth is dried under the baking condition of 170 ℃ to obtain prepregs, 8 prepregs are overlapped, 1 piece of high-temperature extending copper foil with the thickness of 35 mu m is respectively placed on the prepregs and the prepregs, and the copper-clad plate with the thickness of 1.5mm is obtained by heating and pressurizing the prepregs under the pressure of 190 ℃ and 350PSI for 60 minutes.
4. The performance parameters of the copper-clad plate prepared in this example are shown in table 6 below:
TABLE 6
Item | Test results |
Glass transition temperature (DSC,. Degree.C.) | 138 |
Peel strength of copper foil (1oz, lb/in) | 8.0 |
T288(TMA,min) | 29 |
Solder heat resistance (288 ℃ tin immersion, min) | >10 |
CTE(%) | 3.2 |
Td(℃,5%wt loss) | 338 |
Water absorption (%) | 0.11 |
Comparative example 1
1. The resin composition had a solids content of 66.4% by weight and the balance organic solvent (e.g., dimethylformamide), wherein the solids formulation is shown in table 7 below (by weight).
TABLE 7
Raw material | Solid weight (g) |
Low bromine epoxy resins | 100 |
Dicyandiamide | 2.5 |
2-methylimidazole (2-MI) | 0.09 |
2. The preparation method of the epoxy resin composition comprises the following steps:
(1) Adding 52 g of dicyandiamide and an organic solvent dimethylformamide into a stirring tank according to the weight, starting a stirrer, rotating at 600 revolutions per minute, and continuously stirring for 30 minutes until dicyandiamide solid is completely dissolved;
(2) Adding the low-bromine epoxy resin into a stirring tank according to the formula amount, and stirring at the rotating speed of 1000 revolutions per minute in the feeding process;
(3) Weighing 2-methylimidazole according to the formula ratio of 1:10 and the organic solvent propylene glycol methyl ether are completely dissolved, and then the solution is added into a stirring tank and is continuously stirred for 2 hours at 1200 rpm, thus obtaining the resin composition.
3. Preparation of copper-clad plate
The resin adhesive prepared by the method is continuously coated or impregnated with glass fiber cloth, the glass fiber cloth is dried under the baking condition of 170 ℃ to obtain prepregs, 8 prepregs are overlapped, 1 piece of high-temperature extending copper foil with the thickness of 35 mu m is respectively placed on the prepregs and the prepregs, and the copper-clad plate with the thickness of 1.5mm is obtained by heating and pressurizing the prepregs under the pressure of 190 ℃ and 350PSI for 40 minutes.
4. The performance parameters of the copper-clad plate prepared in this example are shown in table 8 below:
TABLE 8
Item | Test results |
Glass transition temperature (DSC,. Degree.C.) | 135 |
Copper foil peel strength (1oz, lb/in) | 10.5 |
T288(TMA,min) | 1 |
Solder heat resistance (288 ℃ tin immersion, min) | 0.5 |
CTE(%) | 3.85 |
Td(℃,5%wt loss) | 308 |
Water absorption (%) | 0.14 |
Comparative example 2
1. The mass percentage of the solid content in the resin composition is 63 percent, and the balance is an organic solvent (such as propylene glycol methyl ether),
the formulation of solids, among others, is shown in table 9 below (by weight).
TABLE 9
Raw material | Solid weight (g) |
Low bromine epoxy resins | 48 |
Phenolic resin curing agent | 13 |
Epoxy resin curing accelerator | 0.015 |
Inorganic filler | 40 |
2. The preparation method of the epoxy resin composition comprises the following steps:
(1) Adding 60 g of organic solvent propylene glycol methyl ether into a stirring tank according to the weight, starting a stirrer, rotating at 800 rpm, continuously stirring for 30 minutes, then adding inorganic filler, and continuously stirring for 100 minutes after the addition is finished;
(2) Sequentially adding low-bromine epoxy resin and phenolic resin curing agent into a stirring tank according to the formula amount, and stirring at the rotating speed of 1000 revolutions per minute in the feeding process;
(3) Weighing propylene glycol methyl ether according to the formula ratio of 1:10 and the organic solvent propylene glycol methyl ether are completely dissolved, and then the solution is added into a stirring tank and is continuously stirred for 2 hours at 1200 rpm, thus obtaining the resin composition.
3. Preparation of copper-clad plate
The resin adhesive prepared by the method is continuously coated or impregnated with glass fiber cloth, the glass fiber cloth is dried under the baking condition of 170 ℃ to obtain prepregs, 8 prepregs are overlapped, 1 piece of high-temperature extending copper foil with the thickness of 35 mu m is respectively placed on the prepregs and placed on the prepregs, and the prepregs are heated and pressurized for 90 minutes under the pressure of 190 ℃ and 350PSI to obtain the copper-clad plate with the thickness of 1.5 mm.
4. The performance parameters of the copper-clad plate prepared in this example are shown in table 10 below:
watch 10
Item | Test results |
Glass transition temperature (DSC,. Degree.C.) | 131 |
Copper foil peel strength (1oz, lb/in) | 7.5 |
T288(TMA,min) | 29 |
Soldering tin heat resistance (288 ℃ tin immersion, min) | >10 |
CTE(%) | 3.50 |
Td(℃,5%wt loss) | 338 |
Water absorption (%) | 0.11 |
Comparative example 3
1. The resin composition of this example contains 65% by weight of solids, and the balance of organic solvent (methyl ethyl ketone), wherein the formulation of solids is shown in table 5 below (by weight).
TABLE 5
Raw material | Solid weight (g) |
Basic epoxy resin | 25 |
Low bromine epoxy resins | 20 |
Phenolic resin curing agent | 25 |
Toughening agent | 0.5 |
Epoxy resin curing accelerator | 0.001 |
Inorganic filler | 25 |
2. The preparation method of the epoxy resin composition comprises the following steps:
(1) Adding 49 g of organic solvent methyl ethyl ketone and the toughening agent into a stirring tank according to the weight, starting a stirrer, rotating at 1000 r/min, continuously stirring for 120 minutes until the toughening agent is completely dissolved, then adding the inorganic filler, and continuously stirring for 90 minutes after the addition is finished;
(2) Adding a phenolic resin curing agent, basic epoxy resin and low-bromine epoxy resin into a stirring tank in a formula ratio in sequence, and stirring at the rotating speed of 1000 revolutions per minute in the feeding process;
(3) Weighing 2-methylimidazole according to the formula ratio of 1:10 and the organic solvent methyl ethyl ketone are completely dissolved, the solution is added into a stirring tank, and stirring is continuously carried out for 2 hours at 1200 rpm, so as to prepare the resin composition.
3. Preparation of copper-clad plate
The resin adhesive prepared by the method is continuously coated or impregnated with glass fiber cloth, the glass fiber cloth is dried under the baking condition of 170 ℃ to obtain prepregs, 8 prepregs are overlapped, 1 piece of high-temperature extending copper foil with the thickness of 35 mu m is respectively placed on the prepregs and the prepregs, and the copper-clad plate with the thickness of 1.5mm is obtained by heating and pressurizing the prepregs under the pressure of 190 ℃ and 350PSI for 60 minutes.
4. The performance parameters of the copper-clad plate prepared in this example are shown in table 6 below:
TABLE 6
Item | Test results |
Glass transition temperature (DSC,. Degree.C.) | 143 |
Copper foil peel strength (1oz, lb/in) | 7.2 |
T288(TMA,min) | 35 |
Solder heat resistance (288 ℃ tin immersion, min) | >10 |
CTE(%) | 3.9 |
Td(℃,5%wt loss) | 339 |
Water absorption (%) | 0.11 |
The prepared epoxy glass cloth-based copper-clad laminate has the advantages of common glass transition temperature (Tg ≧ 135 ℃), excellent heat resistance and low coefficient of thermal expansion (CTE (50-260 ℃) is less than or equal to 3.2%), and can be suitable for manufacturing lead-free process printed circuit boards in the PCB industry.
The material has low thermal expansion coefficient, so that the material has good heat resistance and dimensional stability, and the heat resistance problems such as board explosion and the like are not easy to generate in the use process of the PCB.
Claims (10)
1. The copper-clad plate with low thermal expansion coefficient suitable for the lead-free process of the PCB is characterized in that the copper-clad plate is prepared by adhesive, glass fiber cloth and copper foil, the adhesive consists of solid and organic solvent, wherein the weight percentage content of the solid is 50-75 percent, the rest is the organic solvent,
the solid comprises the following components in percentage by weight:
2. the copper-clad plate suitable for the lead-free process of PCB with low thermal expansion coefficient of claim 1, wherein the physical property requirement of the basic epoxy resin is that the epoxy equivalent EEW (g/eq) range is 160-210;
the range of hydrolyzable chlorine is 300MAX.
3. The copper-clad plate suitable for the lead-free process of PCB with low thermal expansion coefficient as claimed in claim 1, wherein the physical property requirement of the low bromine epoxy resin is that the epoxy equivalent EEW (g/eq) range is 380-450;
hydrolyzable chlorine in the range of 300MAX;
the bromine content (wt%) is 17-24.
4. The copper-clad plate suitable for the lead-free PCB process with low thermal expansion coefficient according to claim 1, wherein the toughening agent is a core-shell rubber toughening agent;
the phenolic resin is phenol-formaldehyde cross-linked phenolic resin, and the phenol is phenol, xylenol, ethyl phenol, n-propyl phenol, isopropyl phenol, n-butyl phenol, isobutyl phenol, tert-butyl phenol or bisphenol A phenolic resin cross-linked by bisphenol A and formaldehyde, or a mixture of phenol phenolic resin and bisphenol A phenolic resin.
5. The copper-clad plate with low thermal expansion coefficient suitable for the lead-free process of PCB according to claim 1, wherein the curing accelerator is any one or more of 2-ethyl-4-methylimidazole, 2-methylimidazole or 1-benzyl-2-methylimidazole.
6. The copper-clad plate with low thermal expansion coefficient suitable for PCB lead-free process according to claim 1, wherein the inorganic filler is any one or more of talcum powder, quartz powder, ceramic powder, aluminum hydroxide or metal oxide particles,
the metal oxide particles are any one or more of silicon dioxide, clay and boron nitride.
7. The copper-clad plate with low thermal expansion coefficient suitable for the lead-free process of PCB according to claim 1, wherein the organic solvent is one or a mixture of more than two of acetone, methyl ethyl ketone, methyl isobutyl ketone or propylene glycol methyl ether.
8. The method for preparing the copper-clad plate with low thermal expansion coefficient suitable for the lead-free PCB process according to any one of claims 1 to 7, wherein the method comprises the following steps:
the preparation method of the adhesive comprises the following steps:
1) Adding part of organic solvent, phenolic resin curing agent and toughening agent into a stirring tank according to the formula amount, starting a stirrer, rotating at 800-1000 rpm, continuously stirring for 2-2.5 hours to ensure that all solids in the tank are completely dissolved, and simultaneously controlling the temperature of the tank body to be 20-45 ℃;
then adding inorganic filler, and continuously stirring for 90-120 minutes after the addition is finished;
2) Sequentially adding basic epoxy resin and low-bromine epoxy resin according to the formula amount in a stirring tank, stirring at the rotating speed of 1000-1400 rpm in the feeding process, starting high-efficiency shearing and emulsifying for 1-3 hours after the addition is finished, and simultaneously performing cooling water circulation to keep the temperature of the tank body controlled at 20-45 ℃;
3) Weighing the epoxy resin curing accelerator according to the formula amount, adding the epoxy resin curing accelerator into the rest organic solvent, adding the solution into a stirring tank after the epoxy resin curing accelerator is completely dissolved, and continuously stirring for 4-12 hours at 1000-1500 rpm to obtain the adhesive;
a step of preparing a prepreg:
1) The adhesive is circulated to a gluing machine, is evenly coated on the glass fiber cloth through pre-dipping and main dipping,
2) Baking the glass fiber cloth coated with the adhesive in a drying oven at 110-250 ℃ to volatilize the solvent, and primarily reacting and curing the adhesive to obtain a prepreg; wherein the linear speed of gluing is controlled to be 8-25m/min,
controlling physical parameters of the prepreg: the gelation time is 80-175 seconds, the mass percent of resin components in the prepreg is 35-78%, the resin fluidity is 15-45%, and the volatile component is less than 0.75%;
typesetting and pressing:
1) Cutting the prepreg into a group of 1-18 pieces with the same size, overlapping the prepreg with copper foil, and pressing;
2) The pressing parameters were controlled as follows:
a. pressure: 100-550psi;
b. temperature of the hot plate: 80-200 ℃;
c. vacuum degree: 0.030-0.080Mpa;
d. pressing time: 150-180 minutes;
e. curing time: and keeping the temperature of more than 190 ℃ for 40-100 minutes.
9. The method for preparing the copper-clad plate with low thermal expansion coefficient suitable for the lead-free process of the PCB according to claim 8, wherein the glass fiber cloth in the prepreg preparation step is E-grade with specification of 101, 104, 106, 1078, 1080, 1086, 2113, 2313, 2116, 1506 or 7628;
the copper foil is 1/3oz, hoz, 1oz, 2oz, 3oz, 4oz or 5oz.
10. The method for preparing the copper-clad plate with low thermal expansion coefficient suitable for the lead-free process of the PCB according to claim 8, wherein the specification of the copper-clad plate is 36 x 48 inches, 36.5 x 48.5 inches, 37 x 49 inches, 40 x 48 inches, 40.5 x 48.5 inches, 41 x 49 inches, 42 x 48 inches, 42.5 x 48.5 inches or 43 x 49 inches, and the thickness of the copper-clad plate is 0.05-3.2mm.
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Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020089071A1 (en) * | 2000-11-17 | 2002-07-11 | Kazuaki Sumita | Liquid epoxy resin composition and semiconductor device |
CN103044858A (en) * | 2012-12-21 | 2013-04-17 | 上海南亚覆铜箔板有限公司 | Thermosetting resin composition, preparation method and use thereof |
CN103642446A (en) * | 2013-12-10 | 2014-03-19 | 上海南亚覆铜箔板有限公司 | Lead-free high heat-resisting copper-clad board and preparation method thereof |
CN103788576A (en) * | 2013-12-02 | 2014-05-14 | 上海南亚覆铜箔板有限公司 | Epoxy resin composition and preparation method thereof |
CN103802394A (en) * | 2013-12-02 | 2014-05-21 | 上海南亚覆铜箔板有限公司 | Copper-clad plate suitable for lead-free process and preparation method of copper-clad laminate |
CN104559888A (en) * | 2014-12-23 | 2015-04-29 | 上海南亚覆铜箔板有限公司 | Copper-clad plate applicable to production of high multi-layer PCB (printed circuit board) and preparation method of copper-clad plate |
CN104559068A (en) * | 2014-12-23 | 2015-04-29 | 上海南亚覆铜箔板有限公司 | Thermosetting resin composition as well as preparation method and application thereof |
CN105667012A (en) * | 2016-01-15 | 2016-06-15 | 广德龙泰电子科技有限公司 | Lead-free copper clad laminate with CAF resistance and high Tg |
CN106967270A (en) * | 2016-12-16 | 2017-07-21 | 上海南亚覆铜箔板有限公司 | A kind of halogen-free resin composition copper coated foil plate and preparation method thereof |
WO2019156326A1 (en) * | 2018-02-09 | 2019-08-15 | 주식회사 케이씨씨 | Solvent-free coating composition |
CN110317433A (en) * | 2019-07-15 | 2019-10-11 | 山东金宝电子股份有限公司 | A kind of prepreg and preparation method thereof |
CN110328914A (en) * | 2019-06-17 | 2019-10-15 | 吉安市宏瑞兴科技有限公司 | A kind of copper-clad plate and preparation method thereof suitable for PCB processing procedure with good flame-retardance |
CN112848559A (en) * | 2020-12-31 | 2021-05-28 | 江西省宏瑞兴科技股份有限公司 | Lead-free compatible copper-clad plate and preparation method thereof |
-
2022
- 2022-07-26 CN CN202210883560.0A patent/CN115339195B/en active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020089071A1 (en) * | 2000-11-17 | 2002-07-11 | Kazuaki Sumita | Liquid epoxy resin composition and semiconductor device |
CN103044858A (en) * | 2012-12-21 | 2013-04-17 | 上海南亚覆铜箔板有限公司 | Thermosetting resin composition, preparation method and use thereof |
CN103788576A (en) * | 2013-12-02 | 2014-05-14 | 上海南亚覆铜箔板有限公司 | Epoxy resin composition and preparation method thereof |
CN103802394A (en) * | 2013-12-02 | 2014-05-21 | 上海南亚覆铜箔板有限公司 | Copper-clad plate suitable for lead-free process and preparation method of copper-clad laminate |
CN103642446A (en) * | 2013-12-10 | 2014-03-19 | 上海南亚覆铜箔板有限公司 | Lead-free high heat-resisting copper-clad board and preparation method thereof |
CN104559068A (en) * | 2014-12-23 | 2015-04-29 | 上海南亚覆铜箔板有限公司 | Thermosetting resin composition as well as preparation method and application thereof |
CN104559888A (en) * | 2014-12-23 | 2015-04-29 | 上海南亚覆铜箔板有限公司 | Copper-clad plate applicable to production of high multi-layer PCB (printed circuit board) and preparation method of copper-clad plate |
CN105667012A (en) * | 2016-01-15 | 2016-06-15 | 广德龙泰电子科技有限公司 | Lead-free copper clad laminate with CAF resistance and high Tg |
CN106967270A (en) * | 2016-12-16 | 2017-07-21 | 上海南亚覆铜箔板有限公司 | A kind of halogen-free resin composition copper coated foil plate and preparation method thereof |
WO2019156326A1 (en) * | 2018-02-09 | 2019-08-15 | 주식회사 케이씨씨 | Solvent-free coating composition |
CN110328914A (en) * | 2019-06-17 | 2019-10-15 | 吉安市宏瑞兴科技有限公司 | A kind of copper-clad plate and preparation method thereof suitable for PCB processing procedure with good flame-retardance |
CN110317433A (en) * | 2019-07-15 | 2019-10-11 | 山东金宝电子股份有限公司 | A kind of prepreg and preparation method thereof |
CN112848559A (en) * | 2020-12-31 | 2021-05-28 | 江西省宏瑞兴科技股份有限公司 | Lead-free compatible copper-clad plate and preparation method thereof |
Non-Patent Citations (2)
Title |
---|
陕西生益科技有限公司,张济明: "适用于"无铅"CEM-3覆铜箔层压板研发", 第八届中国覆铜板市场•技术研讨会文集, pages 162 - 165 * |
韩勇等: "高玻璃化转变温度高韧性挠性覆铜板用环氧树脂胶黏剂的研究", 云南化工, vol. 47, no. 4, pages 103 - 104 * |
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