CN115326276A - Temperature compensation method and equipment for Pirani vacuum gauge and calculation method and equipment for environmental vacuum degree - Google Patents

Temperature compensation method and equipment for Pirani vacuum gauge and calculation method and equipment for environmental vacuum degree Download PDF

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Publication number
CN115326276A
CN115326276A CN202211026105.5A CN202211026105A CN115326276A CN 115326276 A CN115326276 A CN 115326276A CN 202211026105 A CN202211026105 A CN 202211026105A CN 115326276 A CN115326276 A CN 115326276A
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pressure
temperature
resistance value
pirani
interval
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陈天佑
范继
肖成林
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Huazhong University of Science and Technology
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G01L21/10—Vacuum gauges by measuring variations in the heat conductivity of the medium, the pressure of which is to be measured
    • G01L21/12—Vacuum gauges by measuring variations in the heat conductivity of the medium, the pressure of which is to be measured measuring changes in electric resistance of measuring members, e.g. of filaments; Vacuum gauges of the Pirani type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L27/00—Testing or calibrating of apparatus for measuring fluid pressure

Abstract

The invention discloses a method and equipment for calculating temperature compensation and environmental vacuum degree of a Pirani vacuum gauge, and belongs to the field of Pirani vacuum gauges. The method comprises the following steps: in [10 ] ‑5 Pa,10 5 Pa]Determining a pressure working interval of the target Pirani vacuum gauge in the interval; measuring a reference temperature T0 and the resistance value of the target Pirani vacuum gauge under each discrete pressure, measuring a reference pressure P0 and the resistance value of the target Pirani vacuum gauge under each discrete temperature, wherein the discrete pressure is obtained in a sampling pressure working interval; interpolation fitting is carried out on a function of the resistance value of the Pirani vacuum gauge under P0 along with temperature change to obtain a temperature coefficient alpha of resistivity, and a proportional relation k (T) =1+ alpha (T-T0) is constructed; for the temperatures T andand repeatedly selecting the pressure P to cover the whole working interval, and predicting the resistance values of the Pirani vacuum gauges under the selected T and P: r (T, P) = R (T, P0) + k (T) · [ R (T0, P) -R (T0, P0)]. The invention calculates the difference of the resistance values in the same pressure interval at different temperatures and presents the difference in the resistance values in proportion, thereby reducing a large number of parameters, simplifying the calibration process and saving a large amount of manpower and material resources.

Description

Temperature compensation method and equipment for Pirani vacuum gauge and calculation method and equipment for environmental vacuum degree
Technical Field
The invention belongs to the field of Pirani vacuum gauges, and particularly relates to a method and equipment for calculating temperature compensation and environmental vacuum degree of a Pirani vacuum gauge.
Background
Nowadays, a vacuum environment is required in parts of fields of daily life and scientific research, and thus, it is important to accurately measure the vacuum degree of the environment. The Pirani vacuum gauge is a common vacuum measuring device, and reflects the magnitude of real-time air pressure by the resistance value of a resistance wire by utilizing the principle that the heat dissipation efficiency of the heating resistance wire under low air pressure is related to the ambient air pressure. The resistance value of the resistance wire of the Pirani vacuum gauge can change along with the change of the ambient temperature, so that the detection accuracy of the Pirani vacuum gauge on the ambient pressure can be influenced. Therefore, temperature effects during measurement need to be solved to enable the device to respond more accurately to pressure information.
The existing solutions include three types: the first method is to control the ambient temperature to be stable within a certain error range in the process of measuring the pressure; the second is to introduce an ambient temperature dependent resistance on one arm of the wheatstone bridge as compensation; the third is to find out the relation of the resistance varying with the pressure under different environmental temperatures (i.e. different resistance-pressure curves, R-P curves), and to estimate the R-P curve under the temperature by measuring the environmental temperature and the calibration curve under the known temperature.
For both the first and second solutions, supporting circuitry is required, and even if a MEMS pirani vacuum gauge is used, the volume of the finished device is generally large due to the presence of the circuitry, which is not advantageous in specific applications, such as pressure monitoring in narrow spaces and pipelines. The third scheme is software temperature compensation in the conventional sense. For the calibration of the device, generally speaking, the calibration of the device can be completed by collecting a large amount of data and following the relation between the pressure and the ambient temperature of the pirani vacuum gauge in the whole interval, but the method needs a large amount of manpower and physics and has no advantage in the application field.
Patent CN101608962a discloses a micro pirani vacuum gauge, which is small in size and does not need a dedicated circuit, but does not provide a temperature compensation scheme, and the pirani vacuum gauge is greatly affected by the fluctuation of the ambient temperature. Patent CN104931193A discloses an MEMS pirani vacuum gauge with a reference vacuum chamber, which is manufactured by making two identical micro pirani vacuum gauges, one of which is vacuum-sealed in the reference chamber. The two Pirani vacuometers are placed in a test environment together, wherein the vacuum-packaged Pirani vacuometers are not influenced by the vacuum degree of the tested environment, and the resistance value change is completely caused by the environment temperature, so that the output signals tested by the two Pirani vacuometers are used as vacuum degree measuring signals, and the reading error of the Pirani vacuometers caused by the environment temperature can be eliminated. The scheme requires that the two vacuum gauges have good consistency and equal sensitivity to temperature; also, since there are two pirani vacuum gauges in the device, the volume of the device becomes larger.
However, the above solution has the following drawbacks and disadvantages: the design of a single pirani vacuum gauge has no good compensation scheme aiming at the temperature effect, or the design of double pirani vacuum gauges is provided for solving the temperature effect of the pirani vacuum gauge, but the volume and the power consumption of the device are greatly improved, and the problem of process consistency is solved. The Wheatstone bridge solution needs an additional temperature compensation circuit, different devices need to be matched with different temperature compensation resistors for zero adjustment, and the volume of the devices is greatly improved.
Disclosure of Invention
Aiming at the defects of the prior art, the invention aims to provide a method and equipment for calculating the temperature compensation and the environmental vacuum degree of a Pirani vacuum gauge, aims to solve the defect that the influence of temperature factors cannot be eliminated by using the structure of a single Pirani vacuum gauge when vacuum measurement is carried out, and simultaneously solves the problem that a large amount of data acquisition is needed in a software compensation scheme by utilizing a data calibration device.
To achieve the above object, in a first aspect, the present invention provides a temperature compensation method for a pirani vacuum gauge, the method comprising:
s1. In [10 ] -5 Pa,10 5 Pa]Determining a pressure working interval of the target Pirani vacuum gauge in the interval;
s2, measuring a reference temperature T0 and a resistance value of the target Pirani vacuum gauge under each discrete pressure, and measuring a reference pressure P0 and a resistance value of the target Pirani vacuum gauge under each discrete temperature, wherein the discrete pressure is obtained by sampling a pressure working interval by adopting a preset step length which is set according to the requirement of compensation resolution;
s3, carrying out interpolation fitting on a function of the resistance value of the Pirani gauge under the reference pressure P0 along with the temperature change to obtain a resistivity temperature coefficient alpha, and constructing a proportional relation k (T) =1+ alpha (T-T0);
s4, repeatedly selecting the temperature T and the pressure P to enable the temperature T and the pressure P to cover the whole range of the working temperature and the pressure of the target Pirani vacuum gauge, predicting the resistance value of the Pirani vacuum gauge under the selected temperature T and the selected pressure P, and completing the calibration of the Pirani vacuum gauge along with the changes of the pressure and the temperature:
R(T,P)＝R(T,P0)+k(T)·[R(T0,P)-R(T0,P0)]
wherein, R (T, P0), R (T0, P0) are the resistance value of the Pirani vacuum gauge measured under the corresponding environment.
It should be noted that, step S1 can ensure the wide applicability of the compensation method proposed by the present invention. Step S2 may customize the compensation accuracy.
Preferably, when said reference pressure P0 is lower than 10 -4 And when Pa, obtaining a linear function through interpolation fitting, and taking the ratio of the slope of the linear function to the intersection point of the y axis as a resistivity temperature coefficient alpha.
It should be noted that, when the reference pressure is low pressure, the function of the resistance value of the Pirani gauge under the reference pressure P0 changing with the temperature is a linear function, and the intersection point of the y-axis is theoretically
Figure BDA0003815801220000031
Slope ofTheoretically is
Figure BDA0003815801220000032
The ratio of the slope of the first order function to the intersection of the y-axis is taken as the temperature coefficient of resistivity α.
Preferably, in step S1, the respective measurement is at 10 -5 Pa and 10 -5 Resistance values at Pa are R1 and R2, defining resistance values in the interval [ R2+ 0.2X (R1-R2), R2+ 0.8X (R1-R2)]The corresponding pressure intensity interval is the pressure intensity working interval of the Pirani gauge.
Preferably, the pressure working interval of the target pirani vacuum gauge is determined by a binary search method, which specifically comprises the following steps:
taking interval [10 ] -5 Pa,10 5 Pa]Initializing a binary search range [ P1, P2]Firstly, measuring the resistance value under the pressure of (P1 + P2)/2;
if the measured resistance value is smaller than the lower limit of the target resistance value interval, adjusting the two-division searching range to be [ P1, (P1 + P2)/2 ];
if the measured resistance value is larger than the upper limit of the target resistance value interval, adjusting the binary search range to [ (P1 + P2)/2, P2];
if the measured resistance value is within the target resistance value interval, determining that the lower limit of the pressure intensity interval is positioned in [ P1, (P1 + P2)/2 ], and the upper limit of the pressure intensity interval is positioned in [ (P1 + P2)/2, P2], and performing binary search on the upper limit and the lower limit;
and repeating the search until the pressure intensity interval meets the corresponding resistance value interval.
It should be noted that the compensation speed can be further increased by using binary search, and the workload is reduced.
Preferably, the reference temperature T0 does not exceed the operating temperature range of the pirani vacuum gauge.
Preferably, the method is applied to a pirani vacuum gauge without a supporting circuit and a pirani vacuum gauge integrated with a thermometer.
In order to achieve the above object, in a second aspect, the present invention provides a method for calculating an ambient vacuum degree, the method including:
t1, obtaining a mapping relation between each temperature and pressure and the resistance value of the Pirani vacuum gauge by adopting the method in the first aspect;
t2, obtaining the resistance value of the Pirani vacuum gauge in the target environment, and obtaining the temperature of the target environment;
and T3, inverting to obtain the pressure of the target environment according to the mapping relation.
To achieve the above object, in a third aspect, the present invention provides a computing device comprising: comprises a processor and a memory;
the processor is used for storing computer execution instructions;
the processor is used for executing the computer-executable instructions so as to execute the method.
To achieve the above object, in a fourth aspect, the present invention provides a computer-readable storage medium for storing a computer program which, when executed, performs the above method.
Generally, compared with the prior art, the technical scheme conceived by the invention has the following beneficial effects:
(1) Compared with the existing soft compensation method which needs a large amount of data to calibrate and wastes time and labor, the temperature compensation method of the Pirani vacuum gauge provided by the invention has the advantages that a large amount of parameters are reduced by calculating the difference of the resistance values of the same pressure interval at different temperatures and presenting the difference according to the proportion of the resistance value difference, so that a large amount of data is collected and simplified into two sets of data collection under specific pressure and specific temperature, the calibration of a device in the whole test interval can be completed, the calibration process is simplified, and a large amount of manpower and material resources are saved. The method is suitable for a Pirani vacuum gauge device system without a matched circuit and a Pirani vacuum gauge integrated with a thermometer, and has very good compatibility. The method avoids temperature compensation on hardware, simplifies the manufacturing process, reduces the volume of the device and has lower power consumption. The design is beneficial to the integration of the Pirani vacuum gauge unit and other devices. The smaller device size and lower power consumption enable easy integration of the device into an engineered device.
(2) The invention provides a method for calculating the environmental vacuum degree, and the calculation of the environmental vacuum degree can be completed only by acquiring the environmental temperature by means of the temperature compensation method of the Pirani vacuum gauge. And the ambient temperature is obtained by the temperature sensing unit.
Drawings
Fig. 1 is a flowchart of a temperature compensation method of a pirani vacuum gauge according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of the change of the measured resistance value of the pirani vacuum gauge with the measured temperature under a fixed pressure according to the embodiment of the present invention.
Fig. 3 is a schematic diagram of the resistance value of the pirani vacuum gauge measured at a fixed temperature according to the variation of the pressure measured according to the embodiment of the present invention.
Fig. 4 is a schematic diagram of a device calibration process of the whole test interval according to the embodiment of the present invention.
Fig. 5 is a schematic diagram of a pressure-resistance curve according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not limit the invention.
Fig. 1 is a flowchart of a temperature compensation method for a pirani vacuum gauge according to an embodiment of the present invention. As shown in fig. 1, the method includes:
step S1. In [10 ] -5 Pa,10 5 Pa]And determining the pressure working interval of the target Pirani vacuum gauge in the interval.
Preferably, in step S1, the range of binary search is set to [10 ] -5 Pa,10 5 Pa]During the search, the values are respectively determined at 10 -5 Pa and 10 -5 The resistance values at Pa are R1 and R2, defining resistance values in the interval [ R2+ 0.2X (R1-R2), R2+ 0.8X (R1-R2)]The corresponding pressure intensity interval is the pressure intensity working interval of the Pirani gauge. Taking interval [10 ] -5 Pa,10 5 Pa]Is defined as [ P1, P2]]First, the voltage at (P1 + P2)/2 is measuredIf the measured resistance value is less than the lower limit of the target resistance value interval, the binary search range is adjusted to be [ P1, (P1 + P2)/2]If the measured resistance value is larger than the upper limit of the target resistance value interval, the binary search range is adjusted to [ (P1 + P2)/2]If the measured resistance value is within the target resistance value interval, determining that the lower limit of the pressure intensity interval is [ P1, (P1 + P2)/2]The upper limit of the pressure interval is [ (P1 + P2)/2, P2]And performing binary search according to the upper limit and the lower limit, and performing binary search according to the upper limit and the lower limit. And repeating the search until the pressure intensity interval meets the corresponding resistance value interval.
S2, measuring a reference temperature T0 and the resistance value of the target Pirani vacuum gauge under each discrete pressure, and measuring a reference pressure P0 and the resistance value of the target Pirani vacuum gauge under each discrete temperature, wherein the discrete pressure is obtained by sampling a pressure working interval by adopting a preset step length, and the preset step length is set according to the requirement of compensation resolution.
Preferably, the reference temperature T0 does not exceed the operating temperature range of the pirani vacuum gauge.
S3, carrying out interpolation fitting on a function of the resistance value of the Pirani gauge under the reference pressure P0 along with the temperature change to obtain a temperature coefficient alpha of the resistivity, and constructing a proportional relation k (T) =1+ alpha (T-T0).
When the reference pressure is low pressure, the function of the resistance value of the Pirani gauge under the reference pressure P0 along with the temperature is a linear function, and the y-axis intersection point is theoretically
Figure BDA0003815801220000071
The slope is theoretically
Figure BDA0003815801220000072
The ratio of the slope of the first order function to the intersection of the y-axis is taken as the temperature coefficient of resistivity α.
Preferably, when said reference pressure P0 is lower than 10 -4 And when Pa, obtaining a linear function through interpolation fitting, and taking the ratio of the slope of the linear function to the intersection point of the y axis as the temperature coefficient alpha of resistivity.
S4, repeatedly selecting the temperature T and the pressure P to enable the temperature T and the pressure P to cover the whole range of the working temperature and the pressure of the target Pirani vacuum gauge, predicting the resistance value of the Pirani vacuum gauge under the selected temperature T and the selected pressure P, and completing the calibration of the Pirani vacuum gauge along with the changes of the pressure and the temperature:
R(T,P)＝R(T,P0)+k(T)·[R(T0,P)-R(T0,P0)]
wherein, R (T, P0), R (T0, P0) are the resistance value of the Pirani vacuum gauge measured under the corresponding environment.
Preferably, the method is applied to a pirani vacuum gauge without a supporting circuit and a pirani vacuum gauge integrated with a thermometer.
The invention provides a method for calculating the environmental vacuum degree, which comprises the following steps:
t1, obtaining a mapping relation between each temperature and pressure and the resistance value of the Pirani vacuum gauge by adopting the temperature compensation method of the Pirani vacuum gauge;
t2, obtaining the resistance value of the Pirani vacuum gauge in the target environment, and obtaining the temperature of the target environment;
and T3, inverting to obtain the pressure of the target environment according to the mapping relation.
Examples
Fig. 2 is a schematic diagram of the resistance value of the pirani vacuum gauge measured at a fixed pressure according to the embodiment of the present invention, as a function of the measured temperature. As shown in FIG. 2, the data is derived from the resistance value when the pressure is set at 0.1Pa, and interpolation fitting is performed on the data by using 0.1Pa as a reference pressure to obtain the temperature coefficient of resistance α and the initial resistance R of the Pirani gauge resistor ref 。
Fig. 3 is a schematic diagram of the resistance value of the pirani vacuum gauge measured at a fixed temperature according to the variation of the pressure measured according to the embodiment of the present invention. As shown in fig. 3, the data is derived from the resistance value when the temperature is determined to be 25 c, using 25 c as the reference temperature. Fitting and substituting the set of data gives the difference R (25 ℃, P) -R (25 ℃,0.1 Pa) between the arbitrary pressure P and the reference pressure 0.1Pa at a temperature of 25 ℃.
Fig. 4 is a schematic diagram of a device calibration process of the whole test interval according to the embodiment of the present invention. As shown in FIG. 4, the black solid line shows the experimental result R (25 ℃ C., P) of the change of the resistance value of the pirani gauge with the pressure at a constant temperature of 25 ℃ and the black circle scatter point shows the experimental result R (T, 0.1 Pa) of the change of the resistance value of the pirani gauge with the temperature at a constant pressure of 0.1 Pa. Thus, at any temperature T, and at any pressure P, the resistance of the Pirani gauge is:
R(T,P)＝R(T,0.1Pa)+k(T)·[R(25℃,P)-R(25℃,0.1Pa)]。
fig. 5 is a schematic diagram of a pressure-resistance curve according to an embodiment of the present invention. As shown in fig. 5, the black solid line shows the experimental result of the change of the resistance value of the pirani vacuum gauge with the pressure at a fixed temperature of 25 ℃, and the black circle scatter point shows the experimental result of the change of the resistance value of the pirani vacuum gauge with the temperature at a fixed pressure of 0.1 Pa. The black dashed line is the predicted pressure-resistance curve at temperature T, obtained by steps S1-S4. The experimental results show that: the predicted pressure-resistance curve corresponds well with the actual results. And (5) for more temperatures T, completing pressure-resistance curve prediction at each working temperature through steps S1-S4, and completing the calibration of the Pirani vacuum gauge in the working environment and the whole region of the working pressure.
In the prior art, software temperature compensation of the Pirani gauge is completed through function fitting, and a large amount of data acquisition is performed, including data of the resistance value of the Pirani gauge changing along with pressure at different temperatures, so that a complete analytic expression of the resistance value of the Pirani vacuum gauge along with the temperature and the pressure is obtained through function fitting. The amount of data required is large and the fitting process is complex. Taking the calibration process of a Pirani vacuum gauge with a working temperature interval of [20 ℃,60 ℃), a working pressure interval of [1Pa,100Pa and a resolution of 1Pa as an example, in order to ensure higher accuracy and lower standard deviation, more than 10 sets of data acquisition at different temperatures are needed, and if the data volume is too small, the risk of overfitting exists, and the prediction precision of the Pirani vacuum gauge is influenced. Each group of data is required by resolution of Pirani meter, and is 100, and 10 groups of data need to be measured, namely 1000 resistance value measurement data are required. The method of the invention calculates the difference of the resistance values in the same pressure interval at different temperatures, presents the difference according to the ratio of the resistance value difference, and reduces a large amount of parameters, thereby collecting a large amount of data, simplifying the data into 40 data of the resistance changing along with the temperature under specific pressure and 100 data of the resistance changing along with the pressure under specific temperature, collecting 140 data in total, completing the calibration of the device in the whole test interval, simplifying the calibration process and saving a large amount of manpower and material resources.
It will be understood by those skilled in the art that the foregoing is only an exemplary embodiment of the present invention, and is not intended to limit the invention to the particular forms disclosed, since various modifications, substitutions and improvements within the spirit and scope of the invention are possible and within the scope of the appended claims.

Claims (9)

1. A method of temperature compensation in a pirani vacuum gauge, the method comprising:
s1. In [10 ] -5 Pa,10 5 Pa]Determining a pressure working interval of the target Pirani vacuum gauge in the interval;
s2, measuring a reference temperature T0 and the resistance value of the target Pirani vacuum gauge under each discrete pressure, measuring a reference pressure P0 and the resistance value of the target Pirani vacuum gauge under each discrete temperature, wherein the discrete pressure is obtained by sampling a pressure working interval by adopting a preset step length, and the preset step length is set according to the requirement of compensation resolution;
s3, carrying out interpolation fitting on a function of the resistance value of the Pirani gauge under the reference pressure P0 along with the temperature change to obtain a resistivity temperature coefficient alpha, and constructing a proportional relation k (T) =1+ alpha (T-T0);
s4, repeatedly selecting the temperature T and the pressure P to enable the temperature T and the pressure P to cover the whole range of the working temperature and the pressure of the target Pirani vacuum gauge, predicting the resistance value of the Pirani vacuum gauge under the selected temperature T and the selected pressure P, and completing the calibration of the Pirani vacuum gauge along with the changes of the pressure and the temperature:
R(T,P)＝R(T,P0)+k(T)·[R(T0,P)-R(T0,P0)]
wherein, R (T, P0), R (T0, P0) are the resistance value of the Pirani vacuum gauge measured under the corresponding environment.
2. The method of claim 1, wherein when the reference pressure P0 is less than 10 -4 And when Pa, obtaining a linear function through interpolation fitting, and taking the ratio of the slope of the linear function to the intersection point of the y axis as the temperature coefficient alpha of resistivity.
3. The method of claim 1, wherein in step S1, the respective determinations are at 10 -5 Pa and 10 -5 The resistance values at Pa are R1 and R2, defining resistance values in the interval [ R2+ 0.2X (R1-R2), R2+ 0.8X (R1-R2)]The corresponding pressure intensity interval is the pressure intensity working interval of the Pirani gauge.
4. The method of claim 3, wherein the pressure operating region of the target pirani gauge is determined by a binary search method as follows:
taking interval [10 ] -5 Pa,10 5 Pa]Initializing a binary search range [ P1, P2]First, the resistance value under the pressure of (P1 + P2)/2 is measured;
if the measured resistance value is smaller than the lower limit of the target resistance value interval, adjusting the binary search range to be [ P1, (P1 + P2)/2 ];
if the measured resistance value is larger than the upper limit of the target resistance value interval, adjusting the binary search range to [ (P1 + P2)/2, P2];
if the measured resistance value is within the target resistance value interval, determining that the lower limit of the pressure intensity interval is positioned in [ P1, (P1 + P2)/2 ], and the upper limit of the pressure intensity interval is positioned in [ (P1 + P2)/2, P2], and performing binary search on the upper limit and the lower limit;
and repeating the search until the pressure intensity interval meets the corresponding resistance value interval.
5. The method of claim 1, wherein the reference temperature T0 does not exceed an operating temperature range of a pirani vacuum gauge.
6. A method according to any one of claims 1 to 5, characterized in that it is applied to a pirani gauge without a supporting circuit and to a pirani gauge with an integrated thermometer.
7. A method for calculating ambient vacuum, the method comprising:
t1, obtaining a mapping relation between each [ temperature, pressure ] and the resistance value of a Pirani vacuum gauge by adopting the method of any one of claims 1 to 6;
t2, obtaining the resistance value of the Pirani vacuum gauge in the target environment, and obtaining the temperature of the target environment;
and T3, inverting to obtain the pressure of the target environment according to the mapping relation.
8. A computing device, comprising: comprises a processor and a memory;
the processor is used for storing computer execution instructions;
the processor is configured to execute the computer-executable instructions to cause the method of any of claims 1 to 7 to be performed.
9. A computer-readable storage medium, characterized in that the computer-readable storage medium is used to store a computer program, which when executed, performs the method of any of claims 1 to 7.
CN202211026105.5A 2022-08-25 2022-08-25 Temperature compensation method and equipment for Pirani vacuum gauge and calculation method and equipment for environmental vacuum degree Pending CN115326276A (en)

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