CN115283422A - Treatment method of glass etching waste residue - Google Patents
Treatment method of glass etching waste residue Download PDFInfo
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- CN115283422A CN115283422A CN202210860676.2A CN202210860676A CN115283422A CN 115283422 A CN115283422 A CN 115283422A CN 202210860676 A CN202210860676 A CN 202210860676A CN 115283422 A CN115283422 A CN 115283422A
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- waste residue
- glass etching
- etching waste
- acid
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- 239000002699 waste material Substances 0.000 title claims abstract description 140
- 239000011521 glass Substances 0.000 title claims abstract description 93
- 238000005530 etching Methods 0.000 title claims abstract description 92
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000002253 acid Substances 0.000 claims abstract description 46
- 238000004090 dissolution Methods 0.000 claims abstract description 21
- 238000006243 chemical reaction Methods 0.000 claims abstract description 17
- 235000008733 Citrus aurantifolia Nutrition 0.000 claims description 40
- 235000011941 Tilia x europaea Nutrition 0.000 claims description 40
- 239000004571 lime Substances 0.000 claims description 40
- 239000008267 milk Substances 0.000 claims description 32
- 210000004080 milk Anatomy 0.000 claims description 32
- 235000013336 milk Nutrition 0.000 claims description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 24
- 239000000706 filtrate Substances 0.000 claims description 21
- 239000010802 sludge Substances 0.000 claims description 21
- 238000003756 stirring Methods 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 17
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 16
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 238000000926 separation method Methods 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 229940104869 fluorosilicate Drugs 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 230000003472 neutralizing effect Effects 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- 238000000967 suction filtration Methods 0.000 claims description 5
- 239000006071 cream Substances 0.000 claims description 4
- 238000010907 mechanical stirring Methods 0.000 claims description 4
- 238000001914 filtration Methods 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 238000010992 reflux Methods 0.000 claims description 3
- 238000005119 centrifugation Methods 0.000 claims description 2
- 238000007796 conventional method Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000006386 neutralization reaction Methods 0.000 abstract description 12
- 238000010790 dilution Methods 0.000 abstract description 6
- 239000012895 dilution Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 8
- 238000012545 processing Methods 0.000 description 4
- 239000002920 hazardous waste Substances 0.000 description 3
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000036632 reaction speed Effects 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
- B09B—DISPOSAL OF SOLID WASTE
- B09B3/00—Destroying solid waste or transforming solid waste into something useful or harmless
- B09B3/70—Chemical treatment, e.g. pH adjustment or oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
- B09B—DISPOSAL OF SOLID WASTE
- B09B3/00—Destroying solid waste or transforming solid waste into something useful or harmless
- B09B3/40—Destroying solid waste or transforming solid waste into something useful or harmless involving thermal treatment, e.g. evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
- B09B—DISPOSAL OF SOLID WASTE
- B09B5/00—Operations not covered by a single other subclass or by a single other group in this subclass
Abstract
The invention discloses a treatment method of glass etching waste residue, which comprises the steps of adding waste acid into a glass etching waste residue dissolution neutralization reaction system, raising the temperature of the reaction system by utilizing waste acid dilution heat and neutralization reaction heat, and accelerating the dissolution reaction of the glass etching waste residue by raising the temperature. The method can obviously improve the dissolution rate of the glass etching waste residue, does not need an external heating source, is simple and energy-saving, can synchronously treat high-concentration waste acid, and greatly improves the production efficiency.
Description
Technical Field
The invention belongs to the technical field of environmental protection, and particularly relates to a treatment method of glass etching waste residue.
Background
With the development of modern technologies, electronic display devices are becoming thinner and lighter, and the thickness of display glass is reduced to below 0.3 mm. Ultra-thin glass is difficult to directly produce, and the glass is usually subjected to thinning treatment. Acid treatment is the most common surface thinning treatment, using hydrofluoric acid (HF) and ammonium bifluoride (NH) 4 HF 2 ) And etching and thinning treatment by using the mixed acid as the main component. During acid treatment, hydrofluoric acid reacts with glass to enable the surface of the glass to be stripped layer by layer. But the etching process can form silicon dioxide, fluosilicate and the like which are insoluble in waterSubstances are separated out, and a large amount of etching waste residues are generated after the etching waste liquid is subjected to solid-liquid separation, belong to dangerous waste, and need to be processed by a qualification unit with dangerous waste disposal, code HW 32.
In recent years, with the rapid development of industries such as TFT-LCD and the like in China, new glass thinning plants are gradually built, and the amount of waste residues generated by etching is greatly increased, so that the treatment of the waste residues becomes a serious problem. The main treatment method in the industry at present is a lime neutralization treatment method, wherein the method utilizes the reaction of lime emulsion added in excess and glass etching waste residue to neutralize acid components in the waste residue and convert fluorine into calcium fluoride (CaF) 2 ) Precipitating, and performing landfill or resource treatment after solid-liquid separation. However, in the treatment process, the reaction speed of the glass etching waste residue dissolved in the lime milk is low, and the solid-liquid separation feeding condition can be met only by stirring for more than 3 hours, so that the production capacity of the treatment process is greatly limited. Meanwhile, for a common hazardous waste disposal unit, high-concentration waste acid (hazardous waste code HW 34) can be treated, in order to avoid overflowing due to bumping caused by overhigh temperature in the treatment process, the high-concentration waste acid needs to be diluted and cooled and then undergoes neutralization reaction, and the process is time-consuming and does not well utilize heat energy released by dilution.
In conclusion, the existing glass etching waste residue treatment has the problems of low efficiency and difficult capacity meeting the requirement.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a treatment method for improving the treatment efficiency of glass etching waste residue.
The purpose of the invention can be realized by the following technical scheme:
a treatment method of glass etching waste residue comprises the following steps:
(1) Mixing the glass etching waste residue with lime milk for dissolving and neutralizing reaction;
(2) Adding a certain amount of waste acid into the reaction system in the step (1), and fully stirring for reaction to quickly raise the temperature of the system to a certain temperature so as to completely dissolve the glass etching waste residue;
(3) After the glass etching waste residue is completely dissolved, carrying out solid-liquid separation to obtain dehydrated sludge and filtrate;
(4) Further processing the dewatered sludge and the filtrate obtained in the step (3);
further, the glass etching waste residue contains H 2 SiF 6 、NH 4 HF 2 、HF、HNO 3 、H 2 SO 4 Fluorosilicate, siO 2 And water; further, the glass etching waste residue contains 1-15% by mass of H 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluorosilicate and 10% -75% of SiO 2 And water;
further, in the step (1), the mass concentration of the lime milk is 1-30%;
further, in the step (1), the mass ratio of the lime milk to the glass etching waste residue is 1-100: 1; furthermore, in the step (1), the mass ratio of the lime milk to the glass etching waste residue is (1-20): 1;
further, in the step (2), the waste acid contains at least any two of hydrofluoric acid, sulfuric acid, hydrochloric acid, nitric acid and phosphoric acid, and H in the waste acid + The concentration of (A) is 0.001 mol/L-30 mol/L;
further, in the step (2), the mass ratio of the waste acid to the glass etching waste residue is 0.01-100: 1; furthermore, in the step (2), the mass ratio of the waste acid to the glass etching waste residue is 0.1-50: 1; further, in the step (2), the mass ratio of the waste acid to the glass etching waste residue is 0.1-10: 1;
further, in the step (2), the temperature of the system is rapidly increased to 30-100 ℃;
further, in the step (2), the stirring manner is selected from any one or more of mechanical stirring, liquid reflux stirring or gas stirring;
further, in the step (2), the time for complete dissolution is 60-240 min; furthermore, the dissolving time is 80-220 min; furthermore, the dissolving time is 100-160 min;
further, in the step (3), the solid-liquid separation method is selected from filter pressing, suction filtration or filtration after centrifugation;
further, in the step (4), the dewatered sludge is treated by landfill or other resource treatment methods;
further, in the step (4), the filtrate is continuously used for lime milk preparation or is treated by other conventional methods.
Advantageous effects
The invention utilizes the heat released by waste acid dilution and neutralization reaction to increase the temperature of the system, and the temperature increase can obviously improve the dissolution rate of the glass etching waste residue in the lime milk, thereby effectively improving the production efficiency.
Compared with the prior art, the invention has the following advantages:
1. the process method is simple and the process efficiency is high. The glass etching waste residue is a solid acidic mixture, and the dissolution time of the glass etching waste residue is considered to be equivalent to the neutralization reaction time, but under the general treatment condition, the dissolution time is longer because the silicon dioxide hydrate in the waste residue is wrapped and can not be effectively crushed. The dissolution temperature is increased by using the dilution heat and the neutralization reaction heat added by waste acid, and the dissolution of waste residues is accelerated, so that the reaction speed is increased. The temperature of a reaction system is raised by utilizing the heat released by neutralization reaction and dilution of waste acid and lime cream, the dissolution reaction rate of the glass etching waste residue is obviously improved, the reaction time is shortened, and the heat energy is saved;
2. the adding amount of lime needs to meet the requirements of glass etching waste residue and sulfuric acid, and the waste acid and the glass etching waste residue are respectively liquid and solid acid mixtures and are typical processing objects of physicochemical processing units of hazardous waste disposal units, so that the waste acid is easy to obtain.
Detailed Description
Specific implementation ProcessThe scaling calculation process is as follows: the lime is added in an amount which is required to be subjected to neutralization reaction with the glass etching waste residue and the sulfuric acid, the final pH value is 6-9, the waste acid is added in an amount which is required to enable the temperature of a reaction system to be raised to a specified temperature, and heat for raising the temperature is derived from dilution heat of the waste acid and neutralization reaction heat. Heat of neutralization H + And OH - The reaction exotherm was 57.4kJ/mol and the temperature rise was calculated approximately as the water temperature rise in the system.
The present invention is further illustrated by the following examples. The present embodiment is implemented on the premise of the technical solution of the present invention, and a detailed implementation manner and a specific operation flow are given, but the scope of the present invention is not limited to the following embodiments.
Comparative example 1
Adding glass etching waste residue with the mass of 3.3 times and the concentration of 15wt% into the beakers 1, 2, 3, 4 and 5 respectively; 2.5 times of the mass and 20wt% of the concentration; lime milk with the mass of 2 times and the concentration of 25 percent; lime milk with the mass of 3.8 times and the concentration of 20 percent; lime milk with mass of 3.53 times and concentration of 20%. Mechanically stirring at room temperature of 25 deg.C, and dissolving completely for 275min, 308min, 350min, 320min, and 330min.
Example 1
A treatment method of glass etching waste residue comprises the following steps:
(1) Adding the glass etching waste residue into the lime milk, mixing, dissolving and neutralizing, wherein the content of the glass etching waste residue is 1-15 percent 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluorosilicate and 10% -75% of SiO 2 And water, wherein the mass ratio of the lime milk to the glass etching waste residue is 4.7:1, the mass concentration of the lime milk is 15 percent; (2) Adding a certain amount of waste acid into the reaction system in the step (1), wherein the waste acid contains hydrofluoric acid, sulfuric acid and hydrochloric acid, and H in the waste acid + The concentration of (b) is 15.3mol/L; the mass ratio of waste acid to glass etching waste residue is 0.4:1; fully stirring by a mechanical stirring mode to quickly raise the temperature of the system to 42 ℃ so as to finish the glass etching waste residueThe dissolution is completed, the time for complete dissolution is 220min, and the dissolution time is accelerated by 20%; (3) After the glass etching waste residue is completely dissolved, carrying out solid-liquid separation by adopting a suction filtration mode to obtain dewatered sludge and filtrate; (4) And (4) further treating the dehydrated sludge and the filtrate obtained in the step (3), wherein the dehydrated sludge is buried, and the filtrate is continuously used for preparing lime milk.
Example 2
A treatment method of glass etching waste residue comprises the following steps:
(1) Adding the glass etching waste residue into the lime milk, mixing, dissolving and neutralizing, wherein the content of the glass etching waste residue is 1-15 percent 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluorosilicate and 10% -75% of SiO 2 And water, wherein the mass ratio of the lime milk to the glass etching waste residue is 8.1:1, the mass concentration of the lime milk is 15 percent; (2) Adding a certain amount of waste acid into the reaction system in the step (1), wherein the waste acid contains sulfuric acid, hydrochloric acid, nitric acid and phosphoric acid, and H in the waste acid + The concentration of (b) is 25.1mol/L; the mass ratio of waste acid to glass etching waste residue is 1:1; fully stirring in a gas stirring mode to quickly raise the temperature of the system to 79 ℃ so as to completely dissolve the glass etching waste residues, wherein the complete dissolution time is 80min, and the dissolution time is accelerated by 70.1%; (3) After the glass etching waste residue is completely dissolved, performing solid-liquid separation by adopting a centrifugal post-filtration mode to obtain dewatered sludge and filtrate; (4) And (4) further treating the dehydrated sludge and the filtrate obtained in the step (3), wherein the dehydrated sludge is buried, and the filtrate is continuously used for preparing lime milk.
Example 3
A treatment method of glass etching waste residue comprises the following steps:
(1) Adding the glass etching waste residue into the lime milk, mixing, dissolving and neutralizing, wherein the content of the glass etching waste residue is 1-15 percent 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluorosilicate and 10% -75% of SiO 2 And water, wherein the mass ratio of the lime cream consumption to the glass etching waste residue is 8.1:1, the mass concentration of lime milk is 15 percent; (2) Adding a certain amount of waste acid into the reaction system in the step (1), wherein the waste acid contains sulfuric acid, hydrofluoric acid, nitric acid and phosphoric acid, and H in the waste acid + The concentration of (2) is 30mol/L; the mass ratio of waste acid to glass etching waste residue is 0.8:1; fully stirring in a mechanical stirring mode to quickly raise the temperature of the system to 79 ℃ so as to completely dissolve the glass etching waste residues, wherein the complete dissolution time is 120min, and the dissolution time is accelerated by 63.2%; (3) After the glass etching waste residue is completely dissolved, carrying out solid-liquid separation by adopting a suction filtration mode to obtain dehydrated sludge and filtrate; (4) And (4) further treating the dehydrated sludge and the filtrate obtained in the step (3), wherein the dehydrated sludge is buried, and the filtrate is continuously used for preparing lime milk.
Example 4
A treatment method of glass etching waste residue comprises the following steps:
(1) Adding the glass etching waste residue into the lime milk, mixing for dissolution neutralization reaction, wherein the glass etching waste residue is calculated by 1-15% 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluorosilicate and 10% -75% of SiO 2 And water, wherein the mass ratio of the lime cream consumption to the glass etching waste residue is 3.8:1, the mass concentration of the lime milk is 20 percent; (2) Adding a certain amount of waste acid into the reaction system in the step (1), wherein the waste acid contains hydrofluoric acid, nitric acid and phosphoric acid, and H in the waste acid + The concentration of (A) is 24.4mol/L; the mass ratio of waste acid to glass etching waste residue is 0.33:1; fully stirring in a gas stirring mode to quickly raise the temperature of the system to 60 ℃ so that the glass etching waste residue is completely dissolved, wherein the complete dissolution time is 120min, and the dissolution time is accelerated by 64.1%; (3) After the glass etching waste residue is completely dissolved, carrying out solid-liquid separation by adopting a suction filtration mode to obtain dewatered sludge and filtrate; (4) Further processing the dewatered sludge and filtrate obtained in the step (3)And (4) burying the dewatered sludge, and continuously using the filtrate for preparing lime milk.
Example 5
A treatment method of glass etching waste residue comprises the following steps:
(1) Adding the glass etching waste residue into the lime milk, mixing, dissolving and neutralizing, wherein the content of the glass etching waste residue is 1-15 percent 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluorosilicate and 10% -75% of SiO 2 And water, wherein the mass ratio of the lime milk to the glass etching waste residue is 3.53:1, the mass concentration of the lime milk is 20 percent; (2) Adding a certain amount of waste acid into the reaction system in the step (1), wherein the waste acid contains sulfuric acid, hydrofluoric acid, nitric acid and phosphoric acid, and H in the waste acid + The concentration of (A) is 14.9mol/L; the mass ratio of waste acid to glass etching waste residue is 0.41:1; fully stirring in a liquid reflux stirring mode to quickly raise the temperature of the system to 60 ℃ so as to completely dissolve the glass etching waste residues, wherein the time for completely dissolving is 120min, and the dissolving time is accelerated by 62.5%; (3) After the glass etching waste residue is completely dissolved, performing solid-liquid separation in a filter pressing mode to obtain dehydrated sludge and filtrate; (4) And (4) further treating the dehydrated sludge and the filtrate obtained in the step (3), wherein the dehydrated sludge is buried, and the filtrate is continuously used for preparing lime milk.
Claims (12)
1. A treatment method of glass etching waste residue is characterized by comprising the following steps:
(1) Mixing the glass etching waste residue with lime cream for dissolving and neutralizing reaction;
(2) Adding a certain amount of waste acid into the reaction system in the step (1), fully stirring and reacting to ensure that the temperature of the system is quickly raised to a certain temperature, and completely dissolving the glass etching waste residue;
(3) After the glass etching waste residue is completely dissolved, carrying out solid-liquid separation to obtain dehydrated sludge and filtrate;
(4) And (4) further treating the dewatered sludge and the filtrate obtained in the step (3).
2. The method for treating glass etching waste residue according to claim 1, wherein the glass etching waste residue contains H 2 SiF 6 、NH 4 HF 2 、HF、HNO 3 、H 2 SO 4 Fluorosilicate, siO 2 And water; further, the glass etching waste residue contains 1-15% by mass of H 2 SiF 6 、1％～10％NH 4 HF 2 、5％～20％HF、1％～5％HNO 3 、1％～5％H 2 SO 4 5% -25% of fluosilicate and 10% -75% of SiO 2 And water.
3. The method for treating glass etching waste residue according to claim 1, wherein in the step (1), the mass concentration of lime milk is 1-30%.
4. The method for treating glass etching waste residue according to claim 1, wherein in the step (1), the mass ratio of the amount of lime milk to the glass etching waste residue is 1-100: 1; furthermore, in the step (1), the mass ratio of the lime milk to the glass etching waste residue is 1-20: 1.
5. the method for treating glass etching waste residue according to claim 1, wherein in the step (2), the waste acid contains at least any two of hydrofluoric acid, sulfuric acid, hydrochloric acid, nitric acid and phosphoric acid, and H in the waste acid + The concentration of (B) is 0.001mol/L to 30mol/L.
6. The method for treating glass etching waste residue according to claim 1, wherein in the step (2), the mass ratio of waste acid to glass etching waste residue is 0.01-100: 1; furthermore, in the step (2), the mass ratio of the waste acid to the glass etching waste residue is 0.1-50: 1; further, in the step (2), the mass ratio of the waste acid to the glass etching waste residue is 0.1-10: 1.
7. the method for treating glass etching waste residue according to claim 1, wherein in the step (2), the temperature of the system is rapidly raised to 30 to 100 ℃.
8. The method for treating glass etching waste residue according to claim 1, wherein in the step (2), the stirring manner is any one or more selected from mechanical stirring, liquid reflux stirring or gas stirring.
9. The method for treating glass etching waste residue according to claim 1, wherein in the step (2), the time for complete dissolution is 60-240 min; furthermore, the dissolving time is 80-220 min; furthermore, the dissolving time is 100-160 min.
10. The method for treating glass etching waste residue according to claim 1, wherein in the step (3), the solid-liquid separation method is selected from filter pressing, suction filtration or filtration after centrifugation.
11. The method for treating glass etching waste residue according to claim 1, wherein in the step (4), the dehydrated sludge is treated by landfill or other resource treatment.
12. The method for treating glass etching waste residue according to claim 1, wherein in the step (4), the filtrate is continuously used for lime milk preparation or other conventional methods.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210860676.2A CN115283422B (en) | 2022-07-21 | 2022-07-21 | Treatment method of glass etching waste residues |
| PCT/CN2023/107190 WO2024017129A1 (en) | 2022-07-21 | 2023-07-13 | Method for treating waste residues from glass etching |
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| CN202210860676.2A CN115283422B (en) | 2022-07-21 | 2022-07-21 | Treatment method of glass etching waste residues |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2024017129A1 (en) * | 2022-07-21 | 2024-01-25 | 上海市政工程设计研究总院（集团）有限公司 | Method for treating waste residues from glass etching |
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| CN111547885B (en) * | 2020-05-14 | 2022-07-01 | 浙江艾摩柯斯环境科技有限公司 | Process for removing fluorine, controlling salt and recovering fluorine from silicon solar cell production wastewater |
| CN115283422B (en) * | 2022-07-21 | 2023-10-31 | 上海市政工程设计研究总院（集团）有限公司 | Treatment method of glass etching waste residues |
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| WO2024017129A1 (en) * | 2022-07-21 | 2024-01-25 | 上海市政工程设计研究总院（集团）有限公司 | Method for treating waste residues from glass etching |
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