CN115274503A - Semiconductor process chamber and semiconductor process equipment - Google Patents

Semiconductor process chamber and semiconductor process equipment Download PDF

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Publication number
CN115274503A
CN115274503A CN202210914514.2A CN202210914514A CN115274503A CN 115274503 A CN115274503 A CN 115274503A CN 202210914514 A CN202210914514 A CN 202210914514A CN 115274503 A CN115274503 A CN 115274503A
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China
Prior art keywords
driving
rotating
piece
rotation
vertical direction
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Pending
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CN202210914514.2A
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Chinese (zh)
Inventor
王宏伟
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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Priority to CN202210914514.2A priority Critical patent/CN115274503A/en
Publication of CN115274503A publication Critical patent/CN115274503A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The application discloses semiconductor process chamber and semiconductor process equipment belongs to semiconductor technical field. The semiconductor process cavity comprises a cavity body, a plugging piece, a thimble, a driving mechanism and a transmission mechanism, wherein the cavity body is provided with an opening for the conveying device to pass through, a process base is arranged in the cavity body, and the process base is provided with a plurality of through holes penetrating along the thickness direction of the process base; the blocking piece is movably arranged in the cavity body so as to open or block the opening; the thimble movably penetrates through the through hole; the transmission mechanism is in transmission connection with the driving mechanism, the transmission mechanism is respectively connected with the plugging piece and the ejector pin, and the driving mechanism drives the plugging piece and the ejector pin to synchronously move in opposite directions in the vertical direction through the transmission mechanism. The semiconductor processing equipment comprises a conveying device and the semiconductor processing chamber. By the arrangement, the problem of time delay in software logic control is avoided, time loss is avoided, and the process time is shortened and the productivity is improved.

Description

Semiconductor process chamber and semiconductor process equipment
Technical Field
The application belongs to the technical field of semiconductors, and particularly relates to a semiconductor process chamber and semiconductor process equipment.
Background
With the development of technology, integrated circuits have become the core of the information industry. In the process of producing integrated circuits, how to improve the processing capability of wafers becomes a focus of attention.
In the field of semiconductor technology, a wafer is usually processed by using semiconductor processing equipment, which includes a chamber, an opening is formed in a wall of the chamber, a conveying device conveys the wafer between the outside of the chamber and the inside of the chamber through the opening, an inner door is arranged in the chamber, and the opening is closed in the process of the process to restrain an electromagnetic field and a flow field. A base and a thimble are arranged in the cavity, the thimble can move in the vertical direction relative to the cavity, when the thimble rises, the thimble conveys the etched wafer or needs to receive the wafer to be etched conveyed by the conveying device, and at the moment, the inner door opens the opening; when the thimble descends, the thimble finishes conveying the etched wafer or conveys the wafer to be etched to the base, and the inner door closes the opening.
In the related technology, the inner door and the ejector pin are independent drive control systems, so that the actions of the inner door, the ejector pin and the conveying device are logically controlled by software and are interlocked by adding the software, and further the transfer process of the wafer is realized. However, such a solution is complicated in structure, has many execution components, performs logic control by software programming, and requires a corresponding condition judgment before the component operates, and then operates according to the judgment result. Therefore, the whole process takes a long time, which results in a prolonged process time and affects the productivity of the semiconductor processing equipment.
Disclosure of Invention
An embodiment of the present invention provides a semiconductor process chamber and a semiconductor process apparatus, which can solve the problems of prolonged process time and capacity influence caused by long time consumption of the semiconductor process apparatus in the processing process in the related art.
In a first aspect, an embodiment of the present application provides a semiconductor process chamber, including:
the conveying device comprises a cavity body, a plurality of conveying rollers and a plurality of processing units, wherein the cavity body is provided with an opening for the conveying device to pass through, a process base is arranged in the cavity body, and the process base is provided with a plurality of through holes penetrating along the thickness direction of the process base;
a closure movably disposed within the chamber body to open or close the opening;
the ejector pin movably penetrates through the through hole;
the driving mechanism is in transmission connection with the driving mechanism, the driving mechanism is respectively connected with the plugging piece and the ejector pin, and the driving mechanism drives the plugging piece and the ejector pin to synchronously move in the vertical direction along the opposite direction.
In a second aspect, embodiments of the present application further provide a semiconductor processing apparatus, which includes a conveying device and the semiconductor processing chamber in the foregoing embodiments.
In the embodiment of the application, the driving mechanism can simultaneously drive the plugging piece and the thimble to move in opposite directions in the vertical direction through the transmission mechanism. Therefore, the thimble and the plugging piece are controlled by using the mechanical structure, one of the thimble and the plugging piece acts while the other acts, so that the actions of the thimble and the plugging piece are synchronous, the time delay problem existing in software logic control is avoided, the time loss is avoided, the process time is favorably shortened, and the productivity is favorably improved.
Drawings
FIG. 1 is a cross-sectional view of a semiconductor processing chamber disclosed in an embodiment of the present application;
FIG. 2 is a schematic structural diagram of a transmission mechanism and a driving mechanism disclosed in an embodiment of the present application;
fig. 3 is a partial structural schematic view of a third rotating shaft and a rotating rod disclosed in the embodiment of the present application.
Description of reference numerals:
100-chamber body, 110-opening, 120-process base,
200-plugging piece,
300-a thimble,
400-driving mechanism, 410-driving piece, 420-connecting rod, 430-rocker,
500-a transmission mechanism,
510-a fixed bracket, 511-a first chute, 512-a second chute,
520-rotating rod, 521-first strip-shaped groove, 522-second strip-shaped groove, 523-third strip-shaped groove, b-scale mark,
530-the first rotating shaft, 540-the second rotating shaft, 550-the third rotating shaft, a-the anti-loose marked line,
560-the first elastic member, 570-the second elastic member,
580-first driving member, 590-second driving member,
600-wafer.
Detailed Description
The technical solutions in the embodiments of the present application will be described clearly below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some, but not all, embodiments of the present application. All other embodiments that can be derived by one of ordinary skill in the art from the embodiments given herein are intended to be within the scope of the present disclosure.
The terms first, second and the like in the description and in the claims of the present application are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged under appropriate circumstances such that embodiments of the application may be practiced in sequences other than those illustrated or described herein, and that the terms "first," "second," and the like are generally used herein in a generic sense and do not limit the number of terms, e.g., the first term can be one or more than one. In addition, "and/or" in the specification and claims means at least one of connected objects, a character "/" generally means that a preceding and succeeding related objects are in an "or" relationship.
The semiconductor processing chamber and the semiconductor processing apparatus provided in the embodiments of the present application are described in detail with reference to the accompanying drawings.
Referring to fig. 1 to 3, a semiconductor processing chamber disclosed in an embodiment of the present application includes a chamber body 100, a block piece 200, an ejector 300, a driving mechanism 400, and a transmission mechanism 500. The chamber body 100 provides a place for a process of the wafer 600, the chamber body 100 is provided with an opening 110 for a conveying device to pass through, and the blocking piece 200 is used for opening or blocking the opening 110; also, a process pedestal 120 is provided in the chamber body 100, the wafer 600 may be placed on the process pedestal 120 to perform a processing process, and the lift pins 300 are used to support the wafer 600 and to transfer the wafer 600 between the process pedestal 120 and a transfer device; the driving mechanism 400 is coupled with the transmission mechanism 500 to drive the block-off piece 200 and the thimble 300 to move simultaneously.
The blocking member 200 is movably disposed in the chamber body 100 to open or close the opening 110. Alternatively, the blocking member 200 may be slidably disposed in the chamber body 100, in which case, the inner wall of the chamber body 100 may be provided with a guide groove in which the blocking member 200 is disposed, and the blocking member 200 may be slidable in a vertical direction with respect to the guide groove.
The chamber body 100 is provided with a process pedestal 120, the process pedestal 120 is provided with a plurality of through holes penetrating along the thickness direction of the process pedestal 120, and the thimble 300 is movably disposed in the through holes, wherein the thickness direction of the process pedestal 120 is a vertical direction, and the thimble 300 can move in the vertical direction relative to the process pedestal 120. Alternatively, the wafer 600 may be placed on the top of the thimble 300, and the wafer 600 may be supported by the thimble 300 so as to move the wafer 600 in a vertical direction, such that the wafer 600 is close to the process pedestal 120 and placed on the process pedestal 120, or separated from the process pedestal 120 away from the process pedestal 120. Therefore, the wafer 600 can be transferred between the transfer device and the process base 120 by moving the ejector pins 300 in the vertical direction with respect to the process base 120.
In an alternative embodiment, the block-out piece 200 is vertically movable with respect to the chamber body 100 and the lift pin 300 is vertically movable with respect to the process pedestal 120. Optionally, in a case where the thimble 300 is raised in the vertical direction, a distance between the upper end of the thimble 300 and the process base 120 is increased, which indicates that the thimble 300 is transporting the processed wafer 600 or is about to receive the wafer 600 to be processed transported by the transporting device; in the case where the lift pin 300 is lowered in the vertical direction, the distance between the upper end of the lift pin 300 and the process base 120 is decreased, indicating that the lift pin 300 has delivered the processed wafer 600 completely or is delivering the wafer 600 to be processed onto the process base 120. Alternatively, the opening 110 is opened in the case where the plug 200 is raised in the vertical direction, and the opening 110 is blocked in the case where the plug 200 is lowered in the vertical direction; alternatively, the opening 110 is opened when the plug 200 is lowered in the vertical direction, and the opening 110 is closed when the plug 200 is raised in the vertical direction.
The transmission mechanism 500 is in transmission connection with the driving mechanism 400, the transmission mechanism 500 is respectively connected with the plugging piece 200 and the thimble 300, and the driving mechanism 400 drives the plugging piece 200 and the thimble 300 to synchronously move in opposite directions in the vertical direction through the transmission mechanism 500. Specifically, in the case where the thimble 300 moves in the first direction with respect to the chamber body 100, the block piece 200 moves in the second direction with respect to the chamber body 100, wherein the first direction and the second direction are opposite and both parallel to the vertical direction. Alternatively, the driving mechanism 400 may be directly connected to the chamber body 100, or the driving mechanism 400 may be provided separately from the chamber body 100; the transmission mechanism 500 may include a gear, a first rack and a second rack, wherein the gear is disposed between the first rack and the second rack, the first rack and the second rack are respectively engaged with the gear, the first rack is connected to the plugging member 200, the second rack is connected to the thimble 300, the driving mechanism 400 may be a motor, an output shaft of the motor is connected to the gear, the motor may drive the gear to rotate when operating, the gear may drive the first rack and the second rack to move in a vertical direction, and the first rack and the second rack may drive the plugging member 200 and the thimble 300 to synchronously move respectively.
In the embodiment of the present application, the driving mechanism 400 can simultaneously drive the block piece 200 and the thimble 300 to synchronously move in opposite directions in the vertical direction through the transmission mechanism 500. Therefore, the thimble 300 and the plugging piece 200 are controlled by using a mechanical structure, and one of the thimble 300 and the plugging piece 200 acts while the other one acts, so that the actions of the thimble 300 and the plugging piece 200 are synchronous, the time delay problem existing in software logic control is avoided, the time loss is avoided, the process time is shortened, and the productivity is improved.
In an alternative embodiment, as shown in fig. 2, the transmission mechanism 500 includes a fixed bracket 510, a rotating lever 520, a first driving member 580, and a second driving member 590. Wherein the fixing bracket 510 is connected to the chamber body 100, and the fixing bracket 510 serves as a mounting base of the rotating lever 520. Alternatively, in order to prevent the transmission mechanism 500 from occupying too much the inner space of the chamber body 100, the transmission mechanism 500 may be disposed outside the chamber body 100, and the fixing bracket 510 may be connected to the outer wall surface of the chamber body 100. The rotating rod 520 is provided with a rotating fulcrum, the rotating fulcrum is located between the first end and the second end of the rotating rod 520, and the rotating rod 520 is rotatably connected with the fixed bracket 510 around the rotating fulcrum. Alternatively, a cylindrical protrusion may be provided at a rotation fulcrum of the rotation lever 520, a cylindrical groove may be provided in the fixing bracket 510, the cylindrical protrusion may extend into the cylindrical groove, and the cylindrical protrusion may rotate with respect to the fixing bracket 510.
The first driving member 580 is connected to the thimble 300, the second driving member 590 is connected to the plugging member 200, the first end of the rotating rod 520 is rotatably connected to the first driving member 580, the second end of the rotating rod 520 is rotatably connected to the second driving member 590, and both the first driving member 580 and the second driving member 590 are slidably connected to the rotating rod 520 along the extending direction of the rotating rod 520, so as to allow the rotating rod 520 to rotate on the basis that the first driving member 580 and the second driving member 590 move in the vertical direction. Alternatively, the first end of the rotating rod 520 may be provided with a first guide rail and a first slider, which are matched with each other, the guiding direction of the first guide rail is the same as the extending direction of the rotating rod 520, the first slider may slide relative to the first guide rail, and the first slider and the first driving member 580 may be rotatably connected through a hinge or other method, so that the first driving member 580 can move in the vertical direction, and the rotating rod 520 can rotate around the rotation fulcrum. Likewise, the second end of the rotating rod 520 may be provided with a second guide rail and a second slider, which are matched with each other, the guiding direction of the second guide rail is the same as the extending direction of the rotating rod 520, the second slider may slide relative to the second guide rail, and the second slider and the second driving member 590 may be rotatably connected through a hinge or other method, so that the second driving member 590 can move along the vertical direction, and the rotating rod 520 can rotate.
Alternatively, the driving mechanism 400 may be connected to the rotating rod 520 to drive the rotating rod 520 to rotate around the rotating fulcrum with respect to the fixed bracket 510, in this case, the driving mechanism 400 may be a telescopic cylinder, one end of the telescopic cylinder is hinged to the fixed bracket 510, the other end of the telescopic cylinder is directly hinged to the rotating rod 520, and the joint of the telescopic cylinder and the rotating rod 520 deviates from the rotating fulcrum, so that the rotating rod 520 is driven to rotate through the telescopic motion of the telescopic cylinder; alternatively, the driving mechanism 400 may be connected to one of the first and second driving members 580 and 590 to drive one of the first and second driving members 580 and 590 to move in the vertical direction, i.e., to drive one of the block piece 200 and the thimble 300 to move in the vertical direction, and at the same time, when one of the first and second driving members 580 and 590 moves, the rotating rod 520 is driven to rotate about the rotating fulcrum, and the rotating rod 520 drives the other of the first and second driving members 580 and 590 to move in the vertical direction, i.e., to drive the other of the block piece 200 and the thimble 300 to move in the vertical direction.
With the present embodiment, the transmission mechanism 500 utilizes the lever principle to realize the reverse movement of the plugging piece 200 and the thimble 300, which is more beneficial for the driving mechanism 400 to drive one of the plugging piece 200 and the thimble 300 to move through the transmission mechanism 500.
In an alternative embodiment, in order to prevent the blocking piece 200 and the thimble 300 from deviating in the moving process, the fixing bracket 510 is provided with a first sliding slot 511 and a second sliding slot 512, the first sliding slot 511 and the second sliding slot 512 extend in the vertical direction, a part of the first driving piece 580 extends into the first sliding slot 511, the first driving piece 580 is in sliding fit with the first sliding slot 511 in the vertical direction, a part of the second driving piece 590 extends into the second sliding slot 512, and the second driving piece 590 is in sliding fit with the second sliding slot 512 in the vertical direction; or, the transmission mechanism 500 further includes a first sliding member and a second sliding member, the first sliding member is connected to the first driving member 580, the second sliding member is connected to the second driving member 590, the first sliding member extends into the first sliding slot 511, the second sliding member extends into the second sliding slot 512, the first sliding member is in sliding fit with the first sliding slot 511 in the vertical direction, and the second sliding member is in sliding fit with the second sliding slot 512 in the vertical direction. With such arrangement, under the guiding action of the first sliding groove 511, the thimble 300 accurately moves in the vertical direction, so that the moving direction of the thimble 300 is prevented from being deviated; likewise, the plugging member 200 is accurately moved in the vertical direction by the guiding action of the second sliding slot 512, so that the moving direction of the plugging member 200 is prevented from being deviated.
In an alternative embodiment, the drive mechanism 400 includes a drive member 410, a connecting rod 420, and a rocker 430. Wherein the driving member 410 is connected to the first end of the connecting rod 420, and the driving member 410 drives the connecting rod 420 to rotate around the first end of the connecting rod 420, alternatively, the driving member 410 may be a rotary cylinder, an output shaft of the rotary cylinder is connected to the first end of the connecting rod 420, and by using the connecting rod 420 and the rocker 430 with suitable length, the maximum rotation angle of the rotary cylinder can be 180 °. Of course, the driving member 410 may be a motor or the like capable of driving the connecting rod 420 to rotate. The fixing bracket 510 may serve as a base for mounting the driving mechanism 400, and the driving member 410 may be mounted to the fixing bracket 510; the second end of the connecting rod 420 is rotatably connected to the first end of the rocker 430, the second end of the rocker 430 is rotatably connected to the first driving member 580 or the second driving member 590, and the connecting rod 420 drives the first driving member 580 or the second driving member 590 to move in the vertical direction through the rocker 430 when rotating. Alternatively, the second end of the connecting rod 420 and the first end of the rocker 430 may be rotatably connected through a fourth rotating shaft, the second end of the rocker 430 and the first driving member 580 may be rotatably connected through the first rotating shaft 530, or the second end of the rocker 430 and the second driving member 590 may be rotatably connected through the second rotating shaft 540.
By adopting the present embodiment, the driving element 410, the connecting rod 420 and the rocker 430 form a crank-slider mechanism, which converts the rotational driving force of the driving element 410 into a power for driving the first driving element 580 or the second driving element 590 to move linearly, so as to drive the transmission mechanism 500, and further drive the plugging element 200 and the thimble 300 to move. Moreover, compared to the solution that the driving mechanism 400 directly drives the rotating rod 520 to rotate, the driving mechanism 400 directly drives the first driving element 580 or the second driving element 590 (i.e. the end position of the rotating rod 520) to move, so as to increase the moment arm, i.e. increase the distance between the second end of the rocker 430 and the rotation fulcrum, which is beneficial to reducing the driving force of the driving mechanism 400 on the first driving element 580 or the second driving element 590.
In an alternative embodiment, the transmission mechanism 500 further comprises a first rotating shaft 530 and a second rotating shaft 540, the first driving member 580 is rotatably connected with the first end of the rotating rod 520 through the first rotating shaft 530, and the second driving member 590 is rotatably connected with the second end of the rotating rod 520 through the second rotating shaft 540; the first end and the second end of the rotating rod 520 are respectively provided with a first strip-shaped groove 521 and a second strip-shaped groove 522, the extending direction of the first strip-shaped groove 521 and the extending direction of the second strip-shaped groove 522 are the same as the extending direction of the rotating rod 520, the first rotating shaft 530 penetrates through the first strip-shaped groove 521, the second rotating shaft 540 penetrates through the second strip-shaped groove 522, the first rotating shaft 530 can slide relative to the first strip-shaped groove 521, so that a condition is provided for the rotation of the rotating rod 520, the rotating rod 520 is prevented from being blocked and cannot rotate, the second rotating shaft 540 can slide relative to the second strip-shaped groove 522, a condition is provided for the rotation of the rotating rod 520, and the rotating rod 520 is prevented from being blocked and cannot rotate.
So, first pivot 530 and second pivot 540 both can rotate for dwang 520, can slide on the extending direction of dwang 520 along the corresponding bar groove again, consequently, through pivot and bar groove matched with structure, when can realize that first driving piece 580 and second driving piece 590 remove along vertical direction, dwang 520 revolutes and moves the fulcrum and rotates, moreover, the connection structure of first driving piece 580 and dwang 520 has been simplified and the connection structure of second driving piece 590 and dwang 520 has been simplified.
In an alternative embodiment, in the case that the rocker 430 drives the first driving member 580 to move, the connection point of the rocker 430 and the first driving member 580 is a first connection point, and the first connection point is at a certain distance from the first rotating shaft 530; or, in a case that the rocking bar 430 drives the second driving element 590 to move, a connection between the rocking bar 430 and the second driving element 590 is a second connection, and a certain distance is provided between the second connection and the second rotating shaft 540. Thus, the rocker 430 and the rotating rod 520 are connected to different positions of the first driving member 580 or the second driving member 590, so that the process of driving the rotating rod 520 by the rocker 430 is more complicated, and the connection stability among the rocker 430, the rotating rod 520, the first driving member 580 or the second driving member 590 is not ensured.
Therefore, in another embodiment, as shown in fig. 2, a first end of the first rotating shaft 530 is connected to the rocker 430, and a second end of the first rotating shaft 530 is connected to the first driving member 580, i.e. the rocker 430 and the rotating shaft 520 are connected to the same position of the first driving member 580; alternatively, the first end of the second rotating shaft 540 is connected to the rocking bar 430, and the second end of the second rotating shaft 540 is connected to the second driving element 590, i.e. the rocking bar 430 and the rotating bar 520 are connected to the same position of the second driving element 590. So set up, rocker 430 and dwang 520 connect the same position of first driving piece 580 or second driving piece 590, reduce the transmission distance between rocker 430 and the dwang 520, simplify transmission process, are favorable to promoting the stability of being connected between rocker 430, dwang 520, first driving piece 580 or the second driving piece 590 three.
In an alternative embodiment, the second end of the rocker 430 is rotatably connected to the first driving member 580 through the first rotating shaft 530, and the first driving member 580 is provided with a horizontal sliding slot, the first rotating shaft 530 extends into the horizontal sliding slot, and the first rotating shaft 530 can slide relative to the horizontal sliding slot; alternatively, the second end of the rocker 430 is rotatably connected to the second driving element 590 through a second rotating shaft 540, the second driving element 590 is provided with a horizontal sliding slot, the second rotating shaft 540 extends into the horizontal sliding slot, and the second rotating shaft 540 can slide relative to the horizontal sliding slot. The horizontal runners here extend in the horizontal direction. In the process that the driving member 410 drives the rocker 430 to rotate through the connecting rod 420, the second end of the rocker 430 applies a force to the first driving member 580 or the second driving member 590, and the force includes a component force in the horizontal direction and a component force in the vertical direction, wherein the component force in the vertical direction can drive the first driving member 580 or the second driving member 590 to move in the vertical direction, and the component force in the horizontal direction causes the first driving member 580 or the second driving member 590 to have a tendency to move horizontally, but the first driving member 580 and the second driving member 590 can only move in the vertical direction and cannot move in the horizontal direction. Therefore, by providing the horizontal sliding slot, the second end of the rocking bar 430 can directly slide relative to the first driving member 580 or the second driving member 590, and the process is utilized to release the component force applied by the rocking bar 430 in the horizontal direction, so as to prevent the rocking bar 430 from being locked, and further ensure that the first driving member 580 or the second driving member 590 can move more smoothly in the vertical direction.
In an alternative embodiment, the transmission mechanism 500 further includes a third rotating shaft 550, and the rotating fulcrum of the rotating rod 520 is rotatably connected to the fixed bracket 510 through the third rotating shaft 550, and the rotating fulcrum may be set to be one, so that the connecting position of the rotating rod 520 and the fixed bracket 510 cannot be adjusted, that is, the distance from the first end of the rotating rod 520 to the third rotating shaft 550 and the distance from the second end of the rotating rod 520 to the third rotating shaft 550 are fixed, so that the sliding stroke of the first driving member 580 or the second driving member 590 is constant. Therefore, in another embodiment, at least two rotation fulcrums are provided in the extending direction of the rotation lever 520, and the third rotation shaft 550 may be connected to different rotation fulcrums. Alternatively, the rotation fulcrum may be an opening opened at a middle region of the rotation lever 520, and the third rotation shaft 550 may be inserted into a different opening.
With this arrangement, the rotation fulcrum to which the third rotation shaft 550 is connected is changed, and then, the distance from the first end of the rotation shaft 520 to the third rotation shaft 550 and the distance from the second end of the rotation shaft 520 to the third rotation shaft 550 are changed, since the driving mechanism 400 drives one of the first driving member 580 and the second driving member 590 to move in the vertical direction, the sliding stroke of one of the first driving member 580 and the second driving member 590 in the vertical direction is constant, and by adjusting the connection position of the rotation shaft 520 and the fixed bracket 510, the sliding stroke of the other of the first driving member 580 and the second driving member 590 in the vertical direction can be changed, thereby adapting to different process requirements.
In this embodiment, the rocker 430 is rotatably connected to the first driving member 580, so that the sliding stroke of the first driving member 580 and the thimble 300 in the vertical direction is constant, and the sliding stroke of the second driving member 590 and the blocking member 200 in the vertical direction can be changed by adjusting the connection position of the rotating rod 520 and the fixed bracket 510 as required.
In an alternative embodiment, the rotating rod 520 is provided with a third strip-shaped groove 523, the third strip-shaped groove 523 is located between the first end and the second end of the rotating rod 520, the extending direction of the third strip-shaped groove 523 is the same as the extending direction of the rotating rod 520, and each position of the third strip-shaped groove 523 in the extending direction thereof can be used as a rotating fulcrum. The third rotating shaft 550 penetrates through the third strip-shaped groove 523, and the third rotating shaft 550 can slide relative to the third strip-shaped groove 523 to be connected with different rotating fulcrums. It should be noted that, during the rotation of the rotation rod 520 relative to the fixed bracket 510, the position of the third rotation shaft 550 relative to the third strip-shaped groove 523 is fixed, that is, the third rotation shaft 550 does not slide in the third strip-shaped groove 523. With such an arrangement, compared with a scheme that at least two openings are arranged on the rotating rod 520 to serve as rotating fulcrums, the positions of the rotating fulcrums included in the third strip-shaped groove 523 are more, which is beneficial to expanding the adjusting range of the connecting position of the rotating rod 520 and the fixed support 510, and further expanding the adjustable range of the sliding stroke of the second driving piece 590 in the vertical direction; also, the third strip groove 523 facilitates processing.
In an alternative embodiment, as shown in fig. 3, the circumference of the third rotating shaft 550 is provided with a locking mark line a, and the portion of the rotating rod 520 provided with the third strip-shaped groove 523 is provided with a plurality of scale marks b at intervals along the extending direction thereof, and the locking mark line a may correspond to one of the scale marks b. Alternatively, the third shaft 550 includes a cylindrical body connected to the fixing bracket 510, and an outer ring body that is fitted around the outer circumference of the cylindrical body and is rotatable with respect to the cylindrical body, and the locking mark a is disposed on the outer ring body. During the rotation of the rotation rod 520, the outer ring body rotates with respect to the cylindrical body, and the position of the outer ring body with respect to the rotation rod 520 is fixed. So, utilize locking marking a and scale mark b, can know the position that third pivot 550 was located in third bar groove 523, after the rotation of dwang 520, can further inspect whether the position that third pivot 550 was located in third bar groove 523 changes, and then judge whether third pivot 550 appears becoming flexible, if third pivot 550 appears becoming flexible, the user can further fix third pivot 550.
It should be noted that, in the embodiment of the present application, the first rotating shaft 530, the second rotating shaft 540, the third rotating shaft 550, and the fourth rotating shaft may all adopt a locking shaft.
In the embodiment of the present application, as shown in fig. 2, the transmission mechanism 500 further includes a first elastic member 560 and/or a second elastic member 570, one end of the first elastic member 560 is connected to the rotation rod 520, the other end of the first elastic member 560 is connected to the first driving member 580, one end of the second elastic member 570 is connected to the rotation rod 520, and the other end of the second elastic member 570 is connected to the second driving member 590. Alternatively, neither the first elastic member 560 nor the second elastic member 570 is limited to a spring; the first elastic member 560 may be connected between one end thereof and the rotation lever 520, and the other end thereof and the first driving member 580 by fasteners such as screws, and the second elastic member 570 may be connected between one end thereof and the rotation lever 520, and the other end thereof and the second driving member 590 by fasteners such as screws.
The first elastic member 560 is used for buffering the motion process of the first driving member 580 and the first end of the rotating rod 520, so as to reduce the acceleration of the first driving member 580 and the first end of the rotating rod 520, and avoid the too fast speed change of the first driving member 580 and the first end of the rotating rod 520; through the second elastic member 570, the motion process of the second ends of the second driving member 590 and the rotating rod 520 is buffered, so as to reduce the acceleration of the second ends of the second driving member 590 and the rotating rod 520, and avoid the too fast speed change of the second ends of the second driving member 590 and the rotating rod 520, which is favorable for improving the stability of the transmission mechanism 500 in the motion process.
In this embodiment, the transmission mechanism 500 may include both the first elastic member 560 and the second elastic member 570. In the case where the rocking bar 430 and the rotating bar 520 are connected to the same position of the first driving member 580, one end of the first elastic member 560 may be connected to the rocking bar 430, and the other end of the first elastic member 560 is connected to the first driving member 580, thereby achieving indirect connection of the first elastic member 560 to the rotating bar 520. So set up, through first elastic component 560, can not only cushion the motion process of the first end of first driving piece 580 and dwang 520, can also cushion the motion process of rocker 430 to reduce the acceleration of rocker 430, avoid the speed change of rocker 430 too fast, be favorable to further promoting the stability of drive mechanism 500 in the motion process.
In an alternative embodiment, the first and second elastic members 560 and 570 may be damping springs. Because damping spring has the characteristic of universal atress, so damping spring can cushion the motion that corresponds the part in all directions, avoids the part to change at all directions velocity at the excessive speed, is favorable to promoting transmission stability.
Based on the semiconductor process chamber disclosed by the application, the embodiment of the application also discloses semiconductor process equipment, and the disclosed semiconductor process equipment comprises a conveying device and the semiconductor process chamber in the embodiment.
While the present embodiments have been described with reference to the accompanying drawings, it is to be understood that the invention is not limited to the precise embodiments described above, which are meant to be illustrative and not restrictive, and that various changes may be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (12)

1. A semiconductor processing chamber, comprising:
the chamber comprises a chamber body (100), wherein the chamber body (100) is provided with an opening (110) for a conveying device to pass through, a process base (120) is arranged in the chamber body (100), and the process base (120) is provided with a plurality of through holes penetrating along the thickness direction of the process base (120);
a blocking piece (200), wherein the blocking piece (200) is movably arranged in the chamber body (100) to open or block the opening (110);
the thimble (300) is movably arranged in the through hole in a penetrating manner;
actuating mechanism (400) and drive mechanism (500), drive mechanism (500) with actuating mechanism (400) transmission is connected, just drive mechanism (500) respectively with shutoff piece (200) with thimble (300) link to each other, actuating mechanism (400) pass through drive mechanism (500) drive shutoff piece (200) with thimble (300) are in vertical direction along opposite direction synchronous movement.
2. The semiconductor process chamber of claim 1, wherein the transmission mechanism (500) comprises a fixed support (510), a rotating rod (520), a first drive member (580), and a second drive member (590), wherein:
fixed bolster (510) with cavity body (100) link to each other, dwang (520) are equipped with the rotation fulcrum, the rotation fulcrum is located between the first end and the second end of dwang (520), dwang (520) with fixed bolster (510) wind the rotation fulcrum is rotated and is connected, first driving piece (580) with thimble (300) link to each other, second driving piece (590) with shutoff piece (200) links to each other, the first end of dwang (520) with first driving piece (580) rotate and connect, the second end of dwang (520) with second driving piece (590) rotate and connect, just first driving piece (580) with second driving piece (590) all are followed the extending direction of dwang (520) with dwang (520) sliding connection.
3. The semiconductor processing chamber of claim 2, wherein the fixed support (510) defines a first runner (511) and a second runner (512), the first runner (511) and the second runner (512) both extending in a vertical direction,
the first driving piece (580) is in sliding engagement with the first sliding chute (511) in the vertical direction, and the second driving piece (590) is in sliding engagement with the second sliding chute (512) in the vertical direction; or, the transmission mechanism (500) further comprises a first sliding part and a second sliding part, the first sliding part is connected with the first driving part (580), the second sliding part is connected with the second driving part (590), the first sliding part is in sliding fit with the first sliding groove (511) in the vertical direction, and the second sliding part is in sliding fit with the second sliding groove (512) in the vertical direction.
4. The semiconductor processing chamber of claim 2, wherein the drive mechanism (400) comprises a drive member (410), a connecting rod (420), and a rocker (430), wherein:
the driving piece (410) is connected with a first end of the connecting rod (420), the driving piece (410) drives the connecting rod (420) to rotate around the first end of the connecting rod (420), a second end of the connecting rod (420) is connected with a first end of the rocker (430) in a rotating mode, a second end of the rocker (430) is connected with the first driving piece (580) or the second driving piece (590) in a rotating mode, and the connecting rod (420) drives the first driving piece (580) or the second driving piece (590) to move in the vertical direction through the rocker (430) when rotating.
5. The semiconductor process chamber of claim 4, wherein the transmission mechanism (500) further comprises a first rotation shaft (530) and a second rotation shaft (540), the first driving member (580) is rotatably connected with the first end of the rotation shaft (520) through the first rotation shaft (530), the second driving member (590) is rotatably connected with the second end of the rotation shaft (520) through the second rotation shaft (540),
the first end and the second end of dwang (520) are equipped with first bar groove (521) and second bar groove (522) respectively, the extending direction of first bar groove (521) with the extending direction of second bar groove (522) all with the extending direction of dwang (520) is the same, just first pivot (530) wear to locate first bar groove (521), second pivot (540) wear to locate second bar groove (522), first pivot (530) can be for first bar groove (521) slide, second pivot (540) can be for second bar groove (522) slide.
6. The semiconductor process chamber of claim 5, wherein a first end of the first rotation shaft (530) is connected to the rocker (430), and a second end of the first rotation shaft (530) is connected to the first driving member (580); or, the first end of the second rotating shaft (540) is connected with the rocking bar (430), and the second end of the second rotating shaft (540) is connected with the second driving element (590).
7. The semiconductor processing chamber of claim 5, wherein the second end of the rocker (430) is rotatably connected to the first driving member (580) via the first rotating shaft (530), and the first driving member (580) is provided with a horizontal sliding slot, the first rotating shaft (530) extends into the horizontal sliding slot, and the first rotating shaft (530) can slide relative to the horizontal sliding slot;
or, the second end of the rocker (430) is rotatably connected with the second driving element (590) through the second rotating shaft (540), the second driving element (590) is provided with a horizontal sliding slot, the second rotating shaft (540) extends into the horizontal sliding slot, and the second rotating shaft (540) can slide relative to the horizontal sliding slot.
8. The semiconductor process chamber according to claim 2, wherein the transmission mechanism (500) further comprises a third rotation shaft (550), the rotation fulcrum of the rotation shaft (520) is rotatably connected with the fixed support (510) through the third rotation shaft (550), and at least two rotation fulcrums are arranged in the extending direction of the rotation shaft (520), and the third rotation shaft (550) can be connected with different rotation fulcrums.
9. The semiconductor processing chamber according to claim 8, wherein the rotating rod (520) is provided with a third strip-shaped groove (523), the third strip-shaped groove (523) is located between the first end and the second end of the rotating rod (520), the extending direction of the third strip-shaped groove (523) is the same as the extending direction of the rotating rod (520), the third rotating shaft (550) is inserted into the third strip-shaped groove (523), and the third rotating shaft (550) can slide relative to the third strip-shaped groove (523) to be connected with different rotating pivots.
10. The semiconductor processing chamber according to claim 9, wherein a locking mark (a) is disposed on an outer circumference of the third shaft (550), and a plurality of scale marks (b) are disposed at intervals along an extending direction of the rotating rod (520) where the third stripe-shaped groove (523) is disposed, wherein the locking mark (a) may correspond to one of the scale marks (b).
11. The semiconductor process chamber of claim 2, wherein the transmission mechanism (500) further comprises a first elastic member (560) and/or a second elastic member (570), one end of the first elastic member (560) is connected to the rotation rod (520), the other end of the first elastic member (560) is connected to the first driving member (580), one end of the second elastic member (570) is connected to the rotation rod (520), and the other end of the second elastic member (570) is connected to the second driving member (590).
12. A semiconductor processing apparatus comprising a transport device and a semiconductor processing chamber according to any one of claims 1 to 11.
CN202210914514.2A 2022-08-01 2022-08-01 Semiconductor process chamber and semiconductor process equipment Pending CN115274503A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210914514.2A CN115274503A (en) 2022-08-01 2022-08-01 Semiconductor process chamber and semiconductor process equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210914514.2A CN115274503A (en) 2022-08-01 2022-08-01 Semiconductor process chamber and semiconductor process equipment

Publications (1)

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CN115274503A true CN115274503A (en) 2022-11-01

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CN202210914514.2A Pending CN115274503A (en) 2022-08-01 2022-08-01 Semiconductor process chamber and semiconductor process equipment

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117790397A (en) * 2024-02-26 2024-03-29 湖南酷牛存储科技有限公司 Multilayer memory chip packaging equipment and working method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117790397A (en) * 2024-02-26 2024-03-29 湖南酷牛存储科技有限公司 Multilayer memory chip packaging equipment and working method thereof
CN117790397B (en) * 2024-02-26 2024-05-10 湖南酷牛存储科技有限公司 Multilayer memory chip packaging equipment and working method thereof

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