CN115261811A - Angle-adjustable magnetron sputtering substrate assembly and magnetron sputtering equipment - Google Patents
Angle-adjustable magnetron sputtering substrate assembly and magnetron sputtering equipment Download PDFInfo
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- CN115261811A CN115261811A CN202211113039.5A CN202211113039A CN115261811A CN 115261811 A CN115261811 A CN 115261811A CN 202211113039 A CN202211113039 A CN 202211113039A CN 115261811 A CN115261811 A CN 115261811A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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Abstract
The invention discloses an angle-adjustable magnetron sputtering substrate assembly and magnetron sputtering equipment, the scheme ingeniously connects a support ring on the outer side of a substrate, so that the support ring is connected with a carrying component of the magnetron sputtering equipment, and the support ring is connected with the substrate through a connecting piece, so that the substrate and the support ring have a first state and a second state which are mutually matched; during the first state, the base plate can be in the upset of the intra-annular activity of support, during the second state, the base plate is fixed in the support ring through the coupling assembling restraint, and operating personnel can adjust the contained angle of base plate and support ring according to actual need, then lock the back through the connecting piece, and the repacking is carried into and is processed in the magnetron sputtering equipment to this film product or the film sample of processing out different sputtering angles, and this scheme subassembly not only implements convenience and subassembly multiplexibility is good, can improve operating personnel's experimental flexibility, has better application prospect.
Description
Technical Field
The invention relates to the technical field of accessories of magnetron sputtering equipment, in particular to a magnetron sputtering substrate assembly with an adjustable angle and magnetron sputtering equipment.
Background
Magnetron sputtering is one type of Physical Vapor Deposition (PVD). The general sputtering method can be used for preparing multi-materials such as metal, semiconductor, insulator and the like, and has the advantages of simple equipment, easy control, large coating area, strong adhesive force and the like. Generally, when a magnetron sputtering device is used, a stainless steel circular substrate for fixing a sputtering substrate is generally fixed horizontally and cannot rotate, and the sputtering can be performed only from a single angle in an experiment, so that the influence of different sputtering angles on a sputtering result cannot be researched; at present, some researchers modify the magnetron sputtering apparatus in order to study other sputtering angles, for example, adjust the structure of a carrying component or a target mounting component of the magnetron sputtering apparatus to make it have angle adjustability, for example, chinese patent application 202122520831.x (a multi-angle rotating platform for thin film sputtering deposition), also obtain other angle sputtering effects by adjusting the angle of a target accommodating component, for example, chinese patent application 202121592014.9 (a magnetron sputtering coating machine capable of adjusting the sputtering angle), however, most of these modification methods are only solidified in a single magnetron sputtering apparatus, and the reusability thereof is weak, and at present, there is no prior document related to directly modifying the structure of the substrate, and the substrate has advantages of strong reusability, low modification cost and low risk, and if it can be modified, it will have positive practical significance and market value.
Disclosure of Invention
In view of the above, the present invention is directed to provide an angle-adjustable magnetron sputtering substrate assembly and a magnetron sputtering apparatus, which are reliable in implementation, convenient to use and operate, low in cost, and good in reusability.
In order to achieve the technical purpose, the technical scheme adopted by the invention is as follows:
an angularly adjustable magnetron sputtering substrate assembly, comprising:
the support ring is of a circular ring structure and is used for being connected with a carrying component of the magnetron sputtering instrument;
the substrate is of a circular platy structure and is arranged in a circular ring structure of the support ring, one end face of the substrate is used for placing a magnetron sputtering film sample, the support ring is connected with the substrate through the connecting component, so that the substrate and the support ring have a first state and a second state which are matched with each other,
in the first state, the substrate can be movably turned over in the supporting ring,
and in the second state, the substrate is restrained and fixed in the supporting ring through the connecting assembly.
As a possible implementation manner, further, the connection assembly of the present disclosure includes a first connection member and a second connection member, where the first connection member and the second connection member are disposed opposite to each other and respectively penetrate into the circular ring structure from the outer peripheral side of the support ring and are connected to the side surface of the substrate in a matching manner, so that the substrate and the support ring have a first state and a second state in which they are matched with each other;
the support ring is provided with a first connecting hole and a second connecting hole which are corresponding to the first connecting piece and the second connecting piece and used for the first connecting piece and the second connecting piece to penetrate through.
As one of the preferable implementation structures of the connection assembly of the present disclosure, preferably, the first connection member and the second connection member of the present disclosure are both first screws, and a pair of the first screws are oppositely disposed and respectively penetrate into the circular ring structure of the support ring through the outer peripheral side threads of the support ring and are in threaded connection with the side surface of the substrate, so that the substrate is locked in the support ring by the threads;
the virtual axes of the pair of first screws are overlapped and penetrate through the virtual circle centers of the substrate and the support ring;
in addition, the first connecting hole and the second connecting hole in the support ring are both first threaded holes, the first threaded holes are threaded through holes, the substrate is provided with second threaded holes corresponding to the pair of first screws, and the second threaded holes are threaded blind holes.
As a second preferred embodiment of the connecting assembly of the present invention, preferably, the first connecting member of the present invention includes:
the first connecting shaft is of a rod-shaped structure with a polygonal section, penetrates through the first connecting hole of the support ring, and is provided with a first gear at the end close to the substrate, the substrate is provided with a first constraint hole opposite to the first connecting hole corresponding to the first connecting hole, the peripheral side of the end part of the first constraint hole far away from the first connecting hole is provided with a meshing tooth matched with the first gear, and the inner diameters of the first constraint hole and the first connecting hole are larger than the outer diameter of the first gear;
the guide sleeve is fixed at one end of the first connecting hole, which is far away from the base plate, the end part of the first connecting shaft, which is far away from the base plate, can slidably penetrate through the guide sleeve, and the guide sleeve is provided with a guide hole of which the structure is matched with the guide sleeve corresponding to the section profile of the first connecting shaft;
the connecting block is fixedly connected with the end, far away from the substrate, of the first connecting shaft;
the spring is sleeved on the first connecting shaft, one end of the spring abuts against the guide sleeve, and the other end of the spring abuts against the first gear, so that the first gear is meshed with the meshing teeth, and the substrate and the support ring are relatively fixed;
when the connecting block is pulled along the direction far away from the substrate, the first connecting shaft drives the first gear to be disengaged from the meshing teeth and the spring is compressed, so that the substrate and the supporting ring are released from relative fixation, and when the connecting block is released, the spring resets and drives the first gear to reset and to be meshed with the meshing teeth;
the substrate is provided with a second constraint hole opposite to the second connection hole corresponding to the second connection hole, and the second connecting piece is connected with the second connection hole and the second constraint hole respectively.
As a further structural optimization of the second preferred implementation structure of the connection assembly of this solution, preferably, in this solution, the guide sleeve is a tubular structure with an open end, and is fixedly inserted into one end of the first connection hole, which is far away from the base plate, and the open end of the guide sleeve faces into the support ring circular structure, and the guide hole is arranged at the closed end of the guide sleeve.
As a further structural optimization of the second preferred implementation structure of the connecting assembly in the present scheme, preferably, the connecting block is an arc-shaped structure adapted to the profile on the outer periphery of the support ring, and the support ring is provided with an avoiding notch adapted to the structural profile corresponding to the connecting block.
As one of preferable implementation structures of the second connecting member of the connecting assembly of the present invention, preferably, the second connecting member of the present invention includes:
one end of the second connecting shaft sequentially penetrates through a second connecting hole of the supporting ring and a second constraint hole of the substrate and is rotatably connected with the substrate, a first threaded connector is arranged at the other end of the second connecting shaft and is in threaded connection with the second connecting hole, and a first threaded sunken groove matched with the first threaded connector is formed in the end, far away from the substrate, of the second connecting hole.
As a second preferred embodiment of the second connecting member of the connecting assembly of this aspect, preferably, the second connecting member further includes:
the connecting sleeve is made of plastic and is rotatably connected to the end part of the second connecting shaft penetrating into the second constraint hole;
the constraint screw is in threaded connection with the end, penetrating into the second constraint hole, of the second connecting shaft and is used for preventing the connecting sleeve from falling out of the second connecting shaft;
and the clamping ring is clamped on the second connecting shaft corresponding to one end, far away from the constraint screw, of the connecting sleeve and is used for limiting the connecting sleeve to axially slide on the second connecting shaft.
As a third preferred embodiment structure of the second connecting member of the connecting assembly of this aspect, preferably, the second connecting member of this aspect includes:
one end of the round-head bolt penetrates through the second connecting hole and the second constraint hole and is in threaded connection with the second constraint hole, the head of the round-head bolt is positioned in the second connecting hole and is in rotary connection with the second connecting hole, the second constraint hole is a threaded blind hole adaptive to the round-head bolt, a necking part is further arranged on the end part, close to the base plate, of the second connecting hole, and the inner diameter of the necking part is smaller than the diameter of the head of the round-head bolt;
the plug is of a cylindrical structure, one end of the plug penetrates into the second connecting hole and abuts against the head of the round-head bolt, the other end of the plug is provided with an external thread structure and is in threaded connection with the end part of the second connecting hole, far away from the base plate, of the second connecting hole, and a second thread sinking groove is formed in the end part of the second connecting hole, far away from the base plate.
Based on the above, the invention further provides a magnetron sputtering device, which comprises the magnetron sputtering substrate assembly with the adjustable angle.
By adopting the technical scheme, compared with the prior art, the invention has the beneficial effects that: the scheme ingeniously connects the support ring on the outer side of the substrate, so that the support ring is connected with a carrying component of the magnetron sputtering equipment, and the support ring is connected with the substrate through a connecting piece, so that the substrate and the support ring have a first state and a second state which are matched with each other; during the first state, the base plate can be in the upset of support intra-annular activity, during the second state, the base plate is fixed in the support intra-annular through the coupling assembling restraint, and operating personnel can adjust the contained angle of base plate and support ring according to actual need, then locks the back through the connecting piece, and the repacking is carried into and is processed in the magnetron sputtering equipment to this film product or the film sample of processing different sputtering angles, and this scheme not only implements conveniently and the subassembly reusability is good, can improve operating personnel's experimental flexibility, has better application prospect.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic three-dimensional view of a schematic structure according to embodiment 1 of the present invention;
FIG. 2 is a schematic three-dimensional view diagram of a simplified structure according to embodiment 1 of the present invention;
FIG. 3 is a schematic three-dimensional perspective exploded view of a schematic structure according to example 1 of the present invention;
FIG. 4 is a schematic view of a sectional view of a schematic structure of example 1 of the present invention;
FIG. 5 is an enlarged view of a portion of the structure at A in FIG. 4;
FIG. 6 is a schematic view of embodiment 1 of the present invention showing a scale being further provided at a position where a threaded hole is provided in a substrate;
FIG. 7 is a schematic three-dimensional view of a simplified structure according to example 2 of the present invention;
FIG. 8 is a partial structural sectional view of a substrate in embodiment 2 of the present invention;
FIG. 9 is a three-dimensional perspective exploded view of a schematic implementation structure of embodiment 2 of the present invention;
FIG. 10 is a partially schematic sectional view showing a first connecting member according to embodiment 2 of the present invention mounted on a base plate and a support ring;
FIG. 11 is a schematic three-dimensional perspective view of a first connecting member according to embodiment 2 of the present invention;
FIG. 12 is a schematic partial sectional view showing a structure in which a second connecting member according to embodiment 2 of the present invention is mounted on a base plate and a support ring;
FIG. 13 is a schematic view showing a state in which the structure of embodiment 2 of the present invention is pulled to pull the connecting block;
FIG. 14 is a schematic view showing a state where the connecting block is pulled and the substrate is turned over in the structure of embodiment 2 of the present invention;
FIG. 15 is a schematic view showing a state where the connection block is released to relatively fix the substrate and the support ring in the structure of embodiment 2 of the present invention;
FIG. 16 is a schematic sectional view showing a part of a second coupling member according to embodiment 3 of the present invention mounted on a base plate and a support ring;
fig. 17 is a partially schematic sectional view showing a structure in which a second connector according to embodiment 4 of the present invention is mounted on a base plate and a support ring.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be noted that the following examples are only illustrative of the present invention, and do not limit the scope of the present invention. Similarly, the following examples are only some but not all examples of the present invention, and all other examples obtained by those skilled in the art without any inventive work are within the scope of the present invention.
Example 1
As shown in one of fig. 1 to 6, the present embodiment provides an angularly adjustable magnetron sputtering substrate assembly, which includes:
the support ring 1 is of a circular ring structure and is used for being connected with a carrying component of the magnetron sputtering instrument;
the substrate 2 is of a circular plate-shaped structure and is arranged in a circular ring structure of the support ring 1, one end face of the substrate 2 is used for placing a magnetron sputtering film sample, and the support ring 1 is connected with the substrate 2 through a connecting assembly, so that the substrate 2 and the support ring 1 have a first state and a second state which are matched with each other;
in the first state, the substrate 2 can be movably turned inside the support ring 1, and a gap formed between the outer side wall of the substrate 2 and the inner side wall of the support ring 1 can allow the substrate 2 to turn 360 degrees;
in the second state, the substrate 2 is constrained and fixed in the support ring 1 by the connecting assembly.
Specifically, this scheme the coupling assembling includes first connecting piece 31 and second connecting piece 32, first connecting piece 31 with second connecting piece 32 sets up relatively and respectively by the periphery side of support ring 1 penetrates in its ring structure and is connected with base plate 2 side cooperation, makes base plate 2 and support ring 1 have the first state and the second state of mutually supporting.
The support ring 1 is provided with a first connecting hole 11 and a second connecting hole 12 corresponding to the first connecting piece 31 and the second connecting piece 32 for the support ring to pass through.
In this embodiment, the first connecting member 31 and the second connecting member 32 are both first screws, and a pair of first screws are oppositely arranged and respectively threaded into the circular ring structure of the support ring 1 by the outer peripheral side threads of the support ring and are in threaded connection with the side surface of the substrate 2, so that the substrate 2 is screwed and locked in the support ring 1;
the virtual axes of the pair of first screws are overlapped and pass through the virtual circle centers of the substrate 2 and the support ring 1;
in addition, the first connecting hole 11 and the second connecting hole 12 on the support ring 1 are both first threaded holes, the first threaded holes are threaded through holes, the substrate 2 is provided with second threaded holes 21 corresponding to a pair of first screws, and the second threaded holes 21 are threaded blind holes.
Adopt this scheme of implementing the structure, the user is when using, can adjust the relative angle of support ring 1 and base plate 2 in advance as required, then attach a pair of first screw through the lock respectively, make support ring 1 and base plate 2 relatively fixed can accomplish the installation, then carry out the normal connection with the year thing subassembly of support ring 1 and magnetron sputtering appearance or place the cooperation can, and carry out the ration or judge to the contained angle of support ring 1 and base plate 2 in order to make things convenient for, can be equipped with second screw hole 21 and/or the position week side of first screw hole at base plate 2 and set up angle scale sign and conveniently judge the contained angle of base plate 2 and support ring 1.
Example 2
As shown in one of fig. 7 to fig. 15, the structure of the present embodiment is substantially the same as that of embodiment 1, and the difference is that the structure of the connection assembly between the base plate 2 and the support ring 1 of the present embodiment is different, and meanwhile, the structure of the part of the base plate 2 and the support ring 1 that is engaged with the connection assembly is different, specifically, the first connection member 31 of the present embodiment includes:
the first connecting shaft 311 is of a rod-shaped structure (or other polygons) with a quadrangular cross section, and is inserted into the first connecting hole 11 of the support ring 1, and the end of the first connecting shaft, which is close to the substrate 2, is provided with a first gear 312, the substrate 2 is provided with a first constraining hole 21 opposite to the first connecting hole 11, the circumferential side of the end part of the first constraining hole 21, which is far away from the first connecting hole 11, is provided with engaging teeth 211 matched with the first gear 312, and the inner diameters of the first constraining hole 21 and the first connecting hole 11 are both greater than the outer diameter of the first gear 312;
the guide sleeve 313 is fixed at one end of the first connecting hole 11 far away from the substrate 2, the end part of the first connecting shaft 311 far away from the substrate 2 can slidably penetrate through the guide sleeve 313, and the guide sleeve 313 is provided with a guide hole with a structure matched with the guide sleeve 313 corresponding to the cross-sectional profile of the first connecting shaft 311;
the connecting block 314 is fixedly connected with the end of the first connecting shaft 311 far away from the substrate 2;
a spring 315, which is sleeved on the first connecting shaft 311, one end of which abuts against the guide sleeve 313, and the other end of which abuts against the first gear 312, so that the first gear 312 is engaged with the engaging teeth 211, and the substrate 2 and the support ring 1 are relatively fixed;
the substrate 2 is provided with a second constraint hole 22 opposite to the second connection hole 12 corresponding to the second connection hole 12, and the second connecting piece 32 is connected with the second connection hole 12 and the second constraint hole 22 respectively.
Specifically, the second connecting member 32 includes:
one end of the second connecting shaft 321 sequentially passes through the second connecting hole 12 of the support ring 1 and the second constraint hole 22 of the substrate 2 and is rotatably connected with the substrate 2, the other end of the second connecting shaft 321 is provided with a first threaded joint 322 and is in threaded connection with the second connecting hole 12, and the end part, far away from the substrate 2, of the second connecting hole 12 is provided with a first threaded sinking groove 121 matched with the first threaded joint 322.
In order to facilitate the installation of the guide sleeve 313 and improve the matching effect of the guide sleeve 313 and the spring 315, the guide sleeve 313 is a tubular structure with an open end, and is fixedly inserted into one end of the first connection hole 11 away from the base plate 2, the open end of the guide sleeve is toward the circular structure of the support ring 1, the guide hole is arranged at the closed end of the guide sleeve 313, and the end of the spring 315 matching with the guide sleeve 313 penetrates into the tubular structure of the guide sleeve 313 and abuts against the inner wall of the closed end of the guide sleeve 313.
In order to avoid the influence of the connecting block 314 on the overall profile of the support ring 1, the connecting block 314 is an arc-shaped structure adapted to the profile of the outer periphery of the support ring 1, and the support ring 1 is provided with an avoidance notch 13 corresponding to the connecting block in structure profile.
With particular emphasis on fig. 13, 14 and 15, the structure of the present embodiment includes the following operating states:
when the first connector 31 and the second connector 32 are mounted in place, the base plate 2 and the support ring 1 are constrained to rotate relative to each other mainly by the first connector 31 because the second connecting shaft 321 of the second connector 32 is rotatably connected to the base plate 2.
When the connecting block 314 is pulled along the direction away from the substrate 2, the first connecting shaft 311 drives the first gear 312 to be disengaged from the engaging teeth 211 and the spring 315 is compressed, so that the substrate 2 and the support ring 1 are released from being relatively fixed, and an operator can fix the support ring 1 at this time and then push the substrate 2 to turn over the substrate 2 until reaching a preset angle, release the connecting block 314, so that the first connecting shaft 311 and the first gear 312 are reset by the restoring force of the spring 315 to be matched with the engaging teeth 211, specifically, when the connecting block 314 is released, the spring 315 resets to drive the first gear 312 to reset and be engaged with the engaging teeth 211, so that the substrate 2 and the support ring 1 are relatively fixed.
In order to facilitate fine adjustment and reduction of the angle between the support ring 1 and the substrate 2, in this scheme, the number of the meshing teeth on the first gear 312 may be 36, the angular span between each meshing tooth is 10 °, the number of the meshing teeth 211 in the first constraint hole 21 is correspondingly 36, and certainly, the number of the meshing teeth on the first gear 312 may also be flexibly adjusted as needed, but the meshing teeth 211 in the first constraint hole 21 need to correspond to the first constraint hole, and in order to improve the accuracy of the first gear 312 reset by the restoring force of the spring 315 and avoid the first connecting shaft 311 from deviating, a guide blind hole 316 having an inner diameter smaller than that of the first constraint hole 21 is further provided in the first constraint hole 21, and a guide rod 316 matched with the guide blind hole 316 is correspondingly provided in the center of the end surface of the first gear 312, which is far away from the first connecting shaft 311.
Compare in embodiment 1, the advantage of this embodiment lies in when the relative contained angle of adjustment base plate 2 and support ring 1, need not to carry out whole dismantlements with first connecting piece 31 and second connecting piece 32, treat base plate 2 and support ring 1 contained angle adjustment and install after targetting in place, only need through pulling connecting block 314, can rotate base plate 2 and come angle regulation, and the adjustment after targetting in place, release connecting block 314 make its reset can, this scheme makes the angle modulation of base plate 2 and support ring 1 more nimble convenient and high-efficient, high accuracy.
Example 3
As shown in fig. 16, this embodiment is substantially the same as embodiment 2, except that the second connecting member according to this embodiment further includes:
the connecting sleeve 323 is made of plastic and is rotatably connected to the end part of the second connecting shaft 321 penetrating into the second constraint hole 22;
a constraining screw 324 threadedly coupled to the end of the second coupling shaft 321 penetrating into the second constraining hole 22 and for preventing the coupling sleeve 323 from coming off the second coupling shaft 321;
and the snap ring 325 is clamped on the second connecting shaft 321 corresponding to one end, away from the constraint screw 324, of the connecting sleeve 323 and is used for limiting the axial sliding of the connecting sleeve 323 on the second connecting shaft 321.
Compared with embodiment 2, the present embodiment has the advantages that the hardness of the connecting sleeve 323 is lower than that of the substrate 2 by introducing the connecting sleeve 323 and adopting a plastic material, in this case, after the assembly is used for a long time, the abrasion of the inner wall of the second constraint hole 22 of the substrate 2 can be delayed, the connecting sleeve 323 becomes a loss part, and after the abrasion reaches a certain degree, the loss part can be directly replaced, and the second connecting shaft 321, the constraint screw 324 and the snap ring 325 can be reused continuously, so that the maintenance convenience of the device is improved, and the maintenance cost is reduced.
In the structure of this embodiment, the method for adjusting the angles of the substrate 2 and the supporting ring 1 is almost the same as that of embodiment 2, and thus the description thereof is omitted.
Example 4
As shown in fig. 17, this embodiment is substantially the same as embodiment 2, except that the second connecting member of the embodiment includes:
one end of the round head bolt 326 passes through the second connecting hole 12 and the second constraint hole 22 and is in threaded connection with the second constraint hole 22, the head of the round head bolt 326 is positioned in the second connecting hole 12 and is in rotational connection with the second connecting hole 12, the second constraint hole 22 is a threaded blind hole adapted to the round head bolt 316, a necking part 123 is further arranged at the end part of the second connecting hole 12 close to the substrate 2, and the inner diameter of the necking part 123 is smaller than the diameter of the head of the round head bolt 326;
the plug 327 has a cylindrical structure, one end of which penetrates into the second connecting hole 12 and abuts against the head of the round-head bolt 326, the other end of which has an external thread structure and is in threaded connection with the end of the second connecting hole 12 far away from the substrate 2, and the end of the second connecting hole 12 far away from the substrate 2 is provided with a second thread sinking groove 122.
Compared with embodiment 2, the present embodiment has an advantage that the round head bolt 326 is introduced and the screw end of the round head bolt 326 is in threaded connection with the second restriction hole 22 of the substrate 2, therefore, when the substrate 2 rotates, the round head bolt 326 can rotate along with the rotation, the head of the round head bolt 326 is rotationally connected with the second connection hole 12 of the support ring 1, and meanwhile, the plug 327 and the constriction part 123 are matched, so that no matter an operator pulls or releases the connection block of the first connection piece, the substrate 1 can be relatively fixed by the first connection piece without slight displacement along with the first connection piece, the structure can improve the positioning coincidence stability of the virtual centers of the substrate 2 and the support ring 1, and avoid the problem that the substrate 2 deviates from the center of the support ring 1 due to multiple operations of the first connection piece.
In the structure of this embodiment, the method for adjusting the angles of the substrate 2 and the supporting ring 1 is almost the same as that of embodiment 2, and thus the description thereof is omitted.
The above description is only a part of the embodiments of the present invention, and not intended to limit the scope of the present invention, and all equivalent devices or equivalent processes performed by the present invention through the contents of the specification and the drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. An angularly adjustable magnetron sputtering substrate assembly, comprising:
the support ring is of a circular ring structure and is used for being connected with a carrying component of the magnetron sputtering instrument;
the substrate is of a circular platy structure and is arranged in a circular ring structure of the support ring, one end face of the substrate is used for placing a magnetron sputtering film sample, the support ring is connected with the substrate through the connecting component, so that the substrate and the support ring have a first state and a second state which are matched with each other,
in the first state, the substrate can be movably turned over in the support ring,
and in the second state, the substrate is restrained and fixed in the supporting ring through the connecting component.
2. The angularly adjustable magnetron sputtering substrate assembly of claim 1 wherein said coupling assembly comprises a first coupling member and a second coupling member, said first coupling member and said second coupling member being disposed opposite to each other and penetrating into the annular structure of said support ring from the outer peripheral side thereof and being engaged with the side surface of the substrate, respectively, such that the substrate and the support ring have a first state and a second state in engagement with each other;
the support ring is provided with a first connecting hole and a second connecting hole which are corresponding to the first connecting piece and the second connecting piece and used for the first connecting piece and the second connecting piece to penetrate through.
3. The angularly adjustable magnetron sputtering substrate assembly of claim 2 wherein the first and second connectors are first screws, a pair of first screws being disposed opposite each other and threaded into the annular structure of the support ring from the outer peripheral side of the support ring and threaded into engagement with the side of the substrate, respectively, such that the substrate is threadedly locked within the support ring;
the virtual axes of the pair of first screws are superposed and pass through the virtual circle centers of the substrate and the support ring;
in addition, the first connecting hole and the second connecting hole in the support ring are both first threaded holes, the first threaded holes are threaded through holes, the substrate is provided with second threaded holes corresponding to the pair of first screws, and the second threaded holes are threaded blind holes.
4. The angularly adjustable magnetron sputtering substrate assembly of claim 2 wherein the first connection member comprises:
the first connecting shaft is of a rod-shaped structure with a polygonal section, penetrates through the first connecting hole of the support ring, and is provided with a first gear at the end close to the substrate, the substrate is provided with a first constraint hole opposite to the first connecting hole corresponding to the first connecting hole, the peripheral side of the end part of the first constraint hole far away from the first connecting hole is provided with a meshing tooth matched with the first gear, and the inner diameters of the first constraint hole and the first connecting hole are larger than the outer diameter of the first gear;
the guide sleeve is fixed at one end of the first connecting hole, which is far away from the base plate, the end part of the first connecting shaft, which is far away from the base plate, can slidably penetrate through the guide sleeve, and the guide sleeve is provided with a guide hole of which the structure is matched with the guide sleeve corresponding to the section profile of the first connecting shaft;
the connecting block is fixedly connected with the end, far away from the substrate, of the first connecting shaft;
the spring is sleeved on the first connecting shaft, one end of the spring is abutted against the guide sleeve, and the other end of the spring is abutted against the first gear, so that the first gear is meshed with the meshing teeth to ensure that the substrate and the support ring are relatively fixed;
when the connecting block is pulled along the direction far away from the base plate, the first connecting shaft drives the first gear to be separated from the meshing teeth and the spring is compressed, so that the base plate and the supporting ring are released from relative fixation, and when the connecting block is released, the spring is reset to drive the first gear to reset and is meshed with the meshing teeth;
and a second constraint hole opposite to the second connection hole is formed in the substrate corresponding to the second connection hole.
5. The angularly adjustable magnetron sputtering substrate assembly of claim 4 wherein the guide sleeve is a tubular structure with an open end and is fixedly inserted into an end of the first connection hole remote from the substrate, the open end facing into the annular structure of the support ring, the guide hole being disposed at a closed end of the guide sleeve.
6. The angularly adjustable magnetron sputtering substrate assembly of claim 4 wherein the connecting blocks are arc-shaped structures conforming to the contour of the outer periphery of the support ring, the support ring corresponding to the connecting blocks being provided with relief notches conforming to the contour of the support ring corresponding to the connecting blocks.
7. The angularly adjustable magnetron sputtering substrate assembly of any of claims 4 to 6 wherein the second connector comprises:
one end of the second connecting shaft sequentially penetrates through a second connecting hole of the supporting ring and a second constraint hole of the substrate and is rotatably connected with the substrate, a first threaded connector is arranged at the other end of the second connecting shaft and is in threaded connection with the second connecting hole, and a first threaded sinking groove matched with the first threaded connector is formed in the end portion, far away from the substrate, of the second connecting hole.
8. The angularly adjustable magnetron sputtering substrate assembly of claim 7 wherein said second connector further comprises:
the connecting sleeve is made of plastic and is rotationally connected to the end part of the second connecting shaft penetrating into the second constraint hole;
the constraint screw is in threaded connection with the end, penetrating into the second constraint hole, of the second connecting shaft and is used for preventing the connecting sleeve from falling out of the second connecting shaft;
and the clamping ring is clamped on the second connecting shaft corresponding to one end, far away from the constraint screw, of the connecting sleeve and is used for limiting the connecting sleeve to axially slide on the second connecting shaft.
9. The angularly adjustable magnetron sputtering substrate assembly of any of claims 4 to 6 wherein the second connector comprises:
one end of the round-head bolt penetrates through the second connecting hole and the second constraint hole and is in threaded connection with the second constraint hole, the head of the round-head bolt is positioned in the second connecting hole and is in rotary connection with the second connecting hole, the second constraint hole is a threaded blind hole adaptive to the round-head bolt, a necking part is further arranged on the end part, close to the base plate, of the second connecting hole, and the inner diameter of the necking part is smaller than the diameter of the head of the round-head bolt;
the plug is of a cylindrical structure, one end of the plug penetrates into the second connecting hole and abuts against the head of the round-head bolt, the other end of the plug is provided with an external thread structure and is in threaded connection with the end part of the second connecting hole, far away from the base plate, of the second connecting hole, and a second thread sinking groove is formed in the end part of the second connecting hole, far away from the base plate.
10. A magnetron sputtering apparatus characterized in that: comprising the angularly adjustable magnetron sputtering substrate assembly of one of claims 1 to 9.
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CN202211113039.5A CN115261811A (en) | 2022-09-14 | 2022-09-14 | Angle-adjustable magnetron sputtering substrate assembly and magnetron sputtering equipment |
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CN202211113039.5A CN115261811A (en) | 2022-09-14 | 2022-09-14 | Angle-adjustable magnetron sputtering substrate assembly and magnetron sputtering equipment |
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CN115261811A true CN115261811A (en) | 2022-11-01 |
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CN202211113039.5A Pending CN115261811A (en) | 2022-09-14 | 2022-09-14 | Angle-adjustable magnetron sputtering substrate assembly and magnetron sputtering equipment |
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CN (1) | CN115261811A (en) |
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2022
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