CN115186623B - Design analysis method and system of precise mask - Google Patents
Design analysis method and system of precise mask Download PDFInfo
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Abstract
The invention provides a design analysis method and a system of a precision mask, which relate to the technical field of digital processing, and the method comprises the following steps: collecting target mask design drawing information, and analyzing to obtain analysis data; carrying out drawing constraint tolerance analysis to obtain a drawing grading area; setting an auxiliary positioning detection point; constructing a three-dimensional fitting model, and performing manufacturing fitting by combining with the set auxiliary positioning detection points to obtain a first fitting result; acquiring an image of a production target mask plate through an image acquisition device, and acquiring a first feedback result based on an image acquisition result; and generating optimized feedback data by combining the first fitting result, and performing optimized distribution of the auxiliary positioning detection points. The mask plate processing device solves the technical problem that the mask plate processing process cannot be accurately positioned, so that the precision cannot be accurately controlled, and achieves the technical effects of improving the key size identification and positioning precision and realizing the accurate positioning and production of the key size.
Description
Technical Field
The invention relates to the technical field of digital processing, in particular to a design analysis method and a system of a precision mask.
Background
The mask plate is an optical mask plate, the application scene is wide and common, and the mask plate can be applied to IC integrated circuits, FPDs (Flat Panel displays) and PCB (printed circuit boards), but the design front end and the quality inspection rear end of the precise mask plate are independent, so that repeated unnecessary labor is brought to the positioning and the quality inspection of the precise mask plate, the convenience of the design analysis method of the precise mask plate is reduced, an auxiliary positioning detection scheme is urgently needed, and auxiliary positioning optimization is carried out on detection points of the design front end and the quality inspection rear end of the precise mask plate.
The technical problem that the mask plate processing process cannot be accurately positioned and the precision cannot be accurately controlled exists in the prior art.
Disclosure of Invention
The application provides a design analysis method and a system of a precise mask, solves the technical problem that the mask cannot be accurately positioned in the processing process, so that the precision cannot be accurately controlled, and achieves the technical effects of improving the key size identification and positioning precision and realizing the accurate positioning and production of the key size.
In view of the above problems, the present application provides a method and a system for designing and analyzing a precision mask.
In a first aspect, the present application provides a method for designing and analyzing a precision mask, where the method is applied to an optimization analysis system, the optimization analysis system is in communication connection with an image acquisition device, and the method includes: collecting target mask design drawing information, and analyzing the target mask design drawing information to obtain analysis data; carrying out drawing constraint tolerance analysis based on the analytic data, and obtaining a drawing grading area according to an analysis result; setting auxiliary positioning detection points through the drawing classification area, wherein the auxiliary positioning detection points comprise positioning detection points and positioning verification points; constructing a three-dimensional fitting model through the target mask design drawing information, and performing manufacturing fitting based on the three-dimensional fitting model and the set auxiliary positioning detection points to obtain a first fitting result; acquiring an image of a production target mask plate through the image acquisition device, and acquiring a first feedback result based on an image acquisition result; and generating optimized feedback data according to the first fitting result and the first feedback result, and performing optimized distribution of the auxiliary positioning detection points based on the optimized feedback data.
In a second aspect, the present application provides a system for designing and analyzing a precision mask, wherein the system comprises: the data acquisition unit is used for acquiring target mask design drawing information and analyzing the target mask design drawing information to obtain analysis data; the constraint tolerance analysis unit is used for carrying out drawing constraint tolerance analysis based on the analytic data and obtaining a drawing grading area according to an analysis result; the drawing classification area setting unit is used for setting an auxiliary positioning detection point through the drawing classification area, wherein the auxiliary positioning detection point comprises a positioning detection point and a positioning verification point; the manufacturing fitting unit is used for constructing a three-dimensional fitting model through the target mask design drawing information, and performing manufacturing fitting on the basis of the three-dimensional fitting model and the set auxiliary positioning detection points to obtain a first fitting result; the image acquisition unit is used for acquiring an image of the production target mask plate through the image acquisition device and obtaining a first feedback result based on the image acquisition result; and the optimization feedback unit is used for generating optimization feedback data according to the first fitting result and the first feedback result, and performing optimization distribution on the auxiliary positioning detection points based on the optimization feedback data.
One or more technical solutions provided in the present application have at least the following technical effects or advantages:
the method comprises the steps of collecting target mask design drawing information, analyzing to obtain analytic data, carrying out drawing constraint tolerance analysis to obtain a drawing grading area, setting auxiliary positioning detection points, constructing a three-dimensional fitting model through the target mask design drawing information, carrying out manufacturing fitting by combining with the setting of the auxiliary positioning detection points to obtain a first fitting result, carrying out image collection of a production target mask through an image collection device, obtaining a first feedback result based on the image collection result, generating optimized feedback data by combining with the first fitting result, and optimizing distribution of the auxiliary positioning detection points. The embodiment of the application achieves the technical effects of improving the key size identification and positioning precision and realizing the accurate positioning and production of the key size.
Drawings
FIG. 1 is a schematic flow chart of a design analysis method for a precision mask according to the present application;
FIG. 2 is a schematic flow chart of a method for analyzing a design of a precision mask for obtaining a first feedback result according to the present application;
FIG. 3 is a schematic flow chart of the method for designing and analyzing a precision mask for generating optimized feedback data according to the present application;
fig. 4 is a schematic structural diagram of a design analysis system of a precision mask according to the present application.
Description of reference numerals: the device comprises a data acquisition unit 11, a constraint tolerance analysis unit 12, an auxiliary positioning detection point setting unit 13, a manufacturing fitting unit 14, an image acquisition unit 15 and an optimization feedback unit 16.
Detailed Description
According to the method and the system for designing and analyzing the precise mask, the technical problem that the accuracy cannot be controlled due to the fact that the mask cannot be accurately positioned in the processing process is solved, the key size identification and positioning accuracy is improved, and the key size is accurately positioned and produced.
Example one
As shown in fig. 1, the present application provides a design analysis method for a precision mask, wherein the method is applied to an optimization analysis system, the optimization analysis system is in communication connection with an image acquisition device, and the method includes:
s100: collecting target mask design drawing information, and analyzing the target mask design drawing information to obtain analysis data;
s200: carrying out drawing constraint tolerance analysis based on the analytic data, and obtaining a drawing grading area according to an analysis result;
specifically, the target mask is also called a photolithographic mask, an information storage module is integrated in the optimization analysis system, such as a register, based on the register, relevant data information of the mask design drawing is recorded, information retrieval and extraction are performed through a marker, and the target mask design drawing information is obtained, the target mask design drawing information includes but is not limited to manufacturing material information and structural shape information of the target mask, the target mask design drawing information is analyzed through a processor to obtain analytic data, the processor can be a CPU, a microprocessor and an ASIC, the analytic data includes other relevant data information such as point location coordinate information and performance index parameters of the target mask, the drawing constraint tolerance is the drawing tolerance of the target mask determined by theoretical data restrictive constraint, based on the analytic data, the drawing constraint tolerance of the target mask is analyzed to obtain a tolerance analysis result, the target mask design drawing information is subjected to region classification based on the tolerance analysis result, and a drawing classification region is obtained, the drawing classification region includes multiple precision classification regions, and the corresponding precision of the target mask satisfies the same standard constraint tolerance in the same classification region. And (4) carrying out drawing constraint tolerance analysis and providing data theoretical support for assisting in determining the positioning accuracy.
S300: setting auxiliary positioning detection points through the drawing classification area, wherein the auxiliary positioning detection points comprise positioning detection points and positioning verification points;
further, the step S300 includes:
s310: dividing the drawing area according to the drawing grading area, and obtaining a precision control area based on an area dividing result;
s320: obtaining size demand information of a positioning graph based on the precision control area and the target mask design drawing information;
s330: and setting the auxiliary positioning detection point based on the size requirement information.
Specifically, auxiliary positioning detection points are set through the drawing classification area, the auxiliary positioning detection points comprise positioning detection points and positioning verification points, the positioning detection points are used for performing positioning detection, in the positioning detection process, in order to guarantee the reliability of data information, the positioning verification points are required to perform verification detection, the data types (data types comprise a plurality of parameter indexes such as data formats and data dimensions) of the positioning detection points and the positioning verification points are consistent, the drawing area is divided according to the drawing classification area, the drawing area division is consistent with the precision division, area division results are obtained, a precision control area is obtained based on the area division results, the precision control area comprises but is not limited to a precision control area (the precision digit of a positioning coordinate is high), a precision association area (the precision digit of the positioning coordinate is low compared with the precision control area, the precision digit of the positioning coordinate is high compared with that of a common positioning area) and a common positioning area (the precision digit of the positioning coordinate is low), the drawing information is designed through the precision control area and the target mask, the size requirement information of the positioning graph is obtained, the size requirement information comprises but is not limited to absolute position requirements, the size requirement precision of the size requirement information, the mask is set corresponding to the precision of the positioning graph, the positioning accuracy requirement information, and the positioning accuracy requirement information can be improved based on the positioning accuracy of the auxiliary positioning graph. The drawing is subjected to regional classification, the accurate positioning is realized by combining the size requirement auxiliary graph of the positioning graph, and the accuracy of graph positioning is effectively ensured.
Further, the step S330 further includes:
s331: determining a precision associated region according to the region division result;
s332: determining the associated positioning size requirement information through the precision associated region and the target mask design drawing information;
s333: performing set interval constraint on the auxiliary positioning detection points through big data and the size requirement information to obtain a set of combined auxiliary positioning detection points;
s334: and screening the set of combined auxiliary positioning detection points according to the associated positioning size requirement information, and acquiring the auxiliary positioning detection points based on a screening result.
Specifically, the precision associated region is used for representing a precision consistent region with consistent precision but separated from a drawing grading region, and the precision associated region is determined according to the region division result; extracting the size precision through the precision associated region and the target mask design drawing information, determining associated positioning size requirement information based on the size precision extraction result, wherein the associated positioning size requirement information comprises but is not limited to size requirement precision and associated positioning coordinate information, setting interval constraint of auxiliary positioning detection points is carried out through big data and the size requirement information, a combined auxiliary positioning detection point setting set is obtained based on the set interval constraint result, the set interval constraint comprises multiple sections of interval constraints, the interval threshold of the multiple sections of interval constraints corresponds to the precision of a plurality of precision associated regions, data binding is carried out on the precision correspondence through the interval threshold of the multiple sections of interval constraints and the precision of the plurality of precision associated regions, and the combined auxiliary positioning detection point setting set comprises combined precision limit data of the auxiliary positioning detection points; and screening the combined auxiliary positioning detection point set through the associated positioning size demand information to obtain a screening result, and obtaining the auxiliary positioning detection points based on the screening result to further ensure the accuracy of the auxiliary positioning detection points.
And setting the size requirement information as a search symbol based on a data search engine, performing data search on the big data, acquiring set interval constraints (the set interval constraints are interval positions of the big data record which need to be processed by automatic production equipment) corresponding to the mask production process of the big data record, performing set interval constraints of the auxiliary positioning detection points, and performing double limitation on the auxiliary positioning detection points to obtain a combined auxiliary positioning detection point set.
S400: constructing a three-dimensional fitting model through the target mask design drawing information, and performing manufacturing fitting based on the three-dimensional fitting model and the set auxiliary positioning detection points to obtain a first fitting result;
s500: acquiring an image of a production target mask plate through the image acquisition device, and acquiring a first feedback result based on an image acquisition result;
further, as shown in fig. 2, the step S500 further includes:
s510: checking the size of the production target mask according to the image acquisition result to obtain a checking process data set;
s520: carrying out verification convenience analysis on the verification process data set to generate convenience constraint parameters;
s530: and obtaining the first feedback result based on the convenience constraint parameter.
Specifically, the positioning graph is structurally restored through the target mask design drawing information, a three-dimensional fitting model is built based on three-dimensional modeling software, the three-dimensional fitting model is a three-dimensional model, manufacturing fitting is carried out based on the three-dimensional fitting model and the set auxiliary positioning detection points, the manufacturing fitting can be carried out through big data, manufacturing data of the target mask with the same specification parameters are extracted, a clustering relation of indexes of related manufacturing fitting parameters is determined through a clustering analysis algorithm based on the extracted data, manufacturing fitting is carried out based on the clustering relation, a first fitting result is obtained, and the first fitting result is index parameter information obtained through mask production and processing scene fitting restoration (namely digital production simulation); the image acquisition device can be a camera and other related image acquisition equipment, and the image acquisition device is used for acquiring images in the actual production of the target mask plate, acquiring an image acquisition result, and acquiring a first feedback result through the image acquisition result, wherein the first feedback result comprises image information related to the actual production flow of the target mask plate, simulating theoretical data, acquiring practical operation data and providing comprehensive and reliable data support for subsequent data analysis.
Based on three-dimensional modeling simulation software, the information of the target mask design drawing is imported into the three-dimensional modeling simulation software, simulation reduction is carried out (multiple simulation operations can be completed in a short time through the three-dimensional modeling simulation software, the mask design analysis and verification efficiency is improved, production resource waste caused by direct processing is avoided), and a three-dimensional fitting model (a model commonly used in digital twin visual production) is generated, wherein the three-dimensional fitting model is a digital virtual fitting model in the mask production process.
Particularly, the production equipment of the mask is automatic production equipment, the automatic production equipment runs a numerical control production program, and the self-defined parameters of the numerical control production program are auxiliary positioning detection points (common technical means for digital production).
After the model is built, the set auxiliary positioning detection points are led in, a numerical control production program carried by automatic production equipment in the three-dimensional fitting model is subjected to digital production simulation operation, after the simulation operation is completed, the set auxiliary positioning detection points are subjected to simulation verification screening, a first fitting result is obtained, the first fitting result is the positioning detection points obtained by the set auxiliary positioning detection points through simulation screening, and under the condition that actual production verification is not carried out, double evidence support is carried out for subsequent combination of actual production information through digital simulation.
The method comprises the steps of carrying out actual production and processing, synchronously carrying out image information acquisition based on an image acquisition device in the processing process of producing a target mask to obtain an image acquisition result, wherein the image acquisition result is the image information in the production and processing process of the target mask, comparing the sizes of the processed mask and the target mask after production and processing, and expressing the size comparison result through auxiliary positioning points to obtain a first feedback result, wherein the first feedback result is the comparison result of the size positioning points of the processed mask and the target mask.
Specifically, size verification of the production target mask is carried out according to the image acquisition result through the positioning verification point to obtain a verification process data set, wherein the size verification can be expressed by setting an auxiliary positioning detection point through the image acquisition result, size verification is carried out based on the positioning detection point and the positioning verification point in the auxiliary positioning detection point to obtain a verification process data set, the verification process data set is obtained by analyzing practical operation data image information, and the verification process data set comprises data information of a whole verification process from before verification to after verification; the method comprises the steps of carrying out calibration convenience analysis on a calibration process data set, specifically, carrying out calibration time length and auxiliary positioning detection point positioning time length statistics in a calibration process, carrying out hierarchical clustering analysis on indexes subjected to calibration convenience analysis and evaluation including calibration time length, auxiliary positioning detection point positioning time length and other convenience related parameter indexes, obtaining a first characteristic information entropy through the calibration time length, taking the auxiliary positioning detection point positioning time length as a second classification characteristic, carrying out calibration convenience analysis from different dimensions, and generating a convenience constraint parameter, wherein the convenience constraint parameter includes but is not limited to the calibration time length constraint parameter and the auxiliary positioning detection point positioning time length constraint parameter, obtaining a first feedback result based on the convenience constraint parameter, and providing technical support for reducing the specificity of the first feedback result, improving the universality of the first feedback result and ensuring the stability of the first feedback result.
S600: and generating optimized feedback data according to the first fitting result and the first feedback result, and performing optimized distribution of the auxiliary positioning detection points based on the optimized feedback data.
Further, the step S600 includes:
s610: performing positioning direction determination evaluation based on the first fitting result to generate a positioning direction determination feedback constraint parameter;
s620: evaluating the positioning complexity according to the first fitting result to generate a positioning complexity feedback adjustment parameter;
s630: and determining a feedback constraint parameter and the positioning complexity feedback adjustment parameter according to the positioning direction to generate the optimized feedback data.
Specifically, the first fitting result is theoretical analysis data, the first feedback result is data obtained by practical operation verification, data comparison is performed according to the first fitting result and the first feedback result, optimization feedback data is generated based on the data comparison result, the optimization feedback data comprises point location distribution optimization directions of auxiliary positioning detection points, namely other related feedback data, and the distribution of the auxiliary positioning detection points is optimized based on the optimization feedback data, so that the distribution accuracy of the auxiliary positioning detection points is improved.
Performing double evidence evaluation according to the first fitting result and the first feedback result, and determining the coordinate information of the size positioning point to be optimized according to the comparison result of the size positioning points of the processed mask and the target mask (the actual production processing process has system processing error and random processing error) and the precision control area, the precision association area and the common positioning area based on the first feedback result;
performing double evidence evaluation according to the first fitting result and the first feedback result, wherein in the first aspect, based on the first fitting result, the first fitting result is a positioning detection point obtained by setting auxiliary positioning detection points for simulation screening, in the screening process, coordinate points which do not meet the limitation of a precision control area, a precision association area and a common positioning area in the simulation process are deleted, coordinate information of the deleted dimension positioning points is integrated, and the coordinate information of the dimension positioning points which need to be optimized is determined;
and performing double verification evaluation according to the first fitting result and the first feedback result, in the second aspect, performing double comparison verification on coordinate information of the size positioning point which is determined by the first feedback result and needs to be optimized and coordinate information of the size positioning point which is determined by the first fitting result and needs to be optimized, and integrating the corresponding coordinate information of the size positioning point to generate optimized feedback data under the condition that the comparison verification coordinate information is consistent, wherein the optimized feedback data comprises the coordinate information of the size positioning point which is consistent with the comparison verification coordinate information, and technical support is provided for point location optimization.
Determining coordinate information of a size positioning point to be optimized according to the first fitting result, determining and evaluating a positioning direction by combining the first fitting result, obtaining a first short-distance positioning detection point (meeting a preset distance precision limit, and taking the preset distance precision limit as a preset precision limit index) with a spatial position distance in a positioning detection point corresponding to simulation screening of the first fitting result and determining the closest size positioning point coordinate information to be optimized according to the first fitting result, determining the size positioning point coordinate information to be optimized according to the first fitting result as a direction vector starting point, taking the first short-distance positioning detection point as a direction vector terminal point, determining and evaluating the positioning direction by taking the reciprocal of the spatial position distance according to the spatial position distance, synthesizing direction vectors after the evaluation is finished, generating the positioning direction, and setting a direction vector synthesis result as a feedback constraint parameter.
Performing positioning complexity evaluation, in brief, in a three-dimensional coordinate system, synthesizing at least three direction vectors, that is, uniquely determining optimized feedback data (optimized feedback data skull optimization direction and optimized quantity), correspondingly determining the coordinate information of a size positioning point to be optimized based on the first fitting result, and counting the number of the direction vectors one by one, wherein the number of correspondingly set auxiliary positioning detection points of the points with high positioning complexity is less than 3 (the possibility of repeatedly performing feedback optimization adjustment exists); at least 3 auxiliary positioning detection points are correspondingly set at the points with low positioning complexity (the corresponding feedback adjustment parameter of the positioning complexity is set to be 1); and the positioning complexity feedback adjustment parameters, namely the times of feedback optimization adjustment, are subjected to feedback optimization adjustment statistics to generate the positioning complexity feedback adjustment parameters.
Specifically, based on the first fitting result, the positioning direction determination evaluation is performed, and the positioning direction determination feedback constraint parameter is generated by determining the evaluation result through the positioning direction, and includes the positioning direction constraint parameter and other related constraint parameters for evaluating the reliability of the positioning direction. Performing positioning complexity evaluation through the first fitting result, wherein the number of correspondingly set auxiliary positioning detection points of the points with high positioning complexity is less than 3, the number of correspondingly set auxiliary positioning detection points of the points with low positioning complexity is not less than 3, and positioning complexity feedback adjustment parameters are generated, wherein the positioning complexity feedback adjustment parameters comprise complexity feedback adjustment data of the points with high positioning complexity, and the positioning complexity feedback adjustment parameters are generated, so that the execution efficiency of distribution optimization of the auxiliary positioning detection points is further ensured; and determining a feedback constraint parameter and a positioning complexity feedback adjustment parameter according to the positioning direction to generate the optimized feedback data, and acquiring the optimized feedback data from theoretical data to provide technical support for ensuring the execution efficiency of the optimized feedback data.
Further, as shown in fig. 3, the step S600 further includes:
and S640: performing production size optimization evaluation on the production target mask according to the image acquisition result to obtain a size optimization evaluation result;
s650: performing auxiliary performance evaluation on the auxiliary positioning detection point based on the size optimization evaluation result and the convenience constraint parameter to generate an auxiliary performance evaluation result;
s660: generating the optimized feedback data based on the auxiliary performance evaluation result.
Specifically, according to the image acquisition result, data extraction is performed on the production size of the production target mask to obtain the production size of the production target mask, optimization evaluation is performed on the production size by combining the size information of the first fitting result to obtain a size optimization evaluation result, the size optimization evaluation result can be cross-section size optimization information and thickness optimization information, the production size of the mask comprises functional graph size information made on a base material of the mask, auxiliary performance evaluation of the auxiliary positioning detection points is performed based on the size optimization evaluation result and the convenience constraint parameter (the mask is that functional graphs are made on various base materials to be accurately positioned, performance evaluation is performed by performing auxiliary positioning functions of the mask, the use angle of the mask is estimated), the rationality set by the auxiliary positioning detection points is evaluated (the density of auxiliary positioning detection points corresponding to an auxiliary positioning structure is greater than that of auxiliary positioning detection points corresponding to a standard structure), an auxiliary performance evaluation result is generated, the auxiliary performance evaluation result has a corresponding relationship with the auxiliary positioning detection points, the auxiliary performance evaluation result includes auxiliary performance evaluation information of all the auxiliary positioning points, exemplary detection points, the first auxiliary positioning detection point performs size optimization in the size optimization process, and the auxiliary positioning detection point is generated based on the auxiliary positioning data, and the auxiliary positioning data, the first auxiliary positioning detection point is irrelevant, and the auxiliary performance evaluation result is generated on the auxiliary positioning data, and the auxiliary positioning data, the first auxiliary positioning data, and the auxiliary positioning data, the auxiliary positioning point is generated auxiliary performance evaluation result, the optimization feedback data is obtained from the practical operation data, so that the reasonability of setting the auxiliary positioning detection points can be effectively ensured, unnecessary setting of the auxiliary positioning points is reduced, excessive operation is avoided, and the execution efficiency of the optimization feedback data is further ensured.
It is further explained that the assisted localization detection points need three assisted localization detection points with irrelevant positions in the process of localization direction, where the irrelevant positions indicate that the assisted localization detection points of the three positions are not on the same straight line, and the three assisted localization detection points on the same straight line cannot determine the direction in the three-dimensional fitting model.
Further, the embodiment of the present application further includes:
s661: setting an auxiliary performance optimization evaluation threshold;
s662: judging whether the auxiliary performance evaluation result meets the auxiliary performance optimization evaluation threshold value;
s663: when the auxiliary performance evaluation result does not meet the auxiliary performance optimization evaluation threshold, obtaining an optimization instruction;
s664: and controlling the optimization of the auxiliary positioning detection point corresponding to the auxiliary performance evaluation result according to the optimization instruction.
Specifically, a person skilled in the relevant art may set the auxiliary performance optimization evaluation threshold by himself, where the auxiliary performance optimization evaluation threshold may be set to 95%, and the auxiliary performance optimization evaluation threshold is not unique and needs to be specifically limited by combining with relevant data of target mask design analysis; judging whether the auxiliary performance evaluation result meets the auxiliary performance optimization evaluation threshold value or not; when the auxiliary performance evaluation result meets the auxiliary performance optimization evaluation threshold, indicating that an auxiliary positioning detection point can meet the requirement corresponding to the auxiliary performance; when the auxiliary performance evaluation result does not meet the auxiliary performance optimization evaluation threshold, indicating that the auxiliary positioning detection points cannot meet the requirement corresponding to the auxiliary performance, obtaining an optimization instruction, wherein the optimization instruction is used for adding necessary auxiliary positioning detection points; and controlling the optimization of the auxiliary positioning detection points corresponding to the auxiliary performance evaluation result according to the optimization instruction, and further ensuring the effectiveness and rationality of the set auxiliary positioning detection points by combining an auxiliary performance optimization evaluation threshold value.
It is further explained that, reducing the setting of unnecessary auxiliary positioning points requires optimization within the range where the auxiliary performance evaluation result satisfies the auxiliary performance optimization evaluation threshold, and if the setting of unnecessary auxiliary positioning points is excessively reduced, the positioning accuracy of the auxiliary positioning points may be reduced.
In summary, the method and system for analyzing the design of the precise mask provided by the present application have the following technical effects:
the method comprises the steps of acquiring design drawing information of a target mask, analyzing to obtain analytic data, carrying out drawing constraint tolerance analysis to obtain a drawing classification area, setting auxiliary positioning detection points, constructing a three-dimensional fitting model through the design drawing information of the target mask, carrying out manufacturing fitting by combining with the setting of the auxiliary positioning detection points to obtain a first fitting result, carrying out image acquisition for producing the target mask through an image acquisition device, obtaining a first feedback result based on the image acquisition result, generating optimized feedback data by combining with the first fitting result, and optimizing distribution of the auxiliary positioning detection points. The application provides a design analysis method and a system of a precise mask, and achieves the technical effects of improving the key size identification and positioning precision and realizing the accurate key size positioning and production.
The method comprises the steps of carrying out size verification on a production target mask according to an image acquisition result to obtain a verification process data set, carrying out verification convenience analysis, generating convenience constraint parameters and obtaining a first feedback result. And technical support is provided for reducing the specificity of the first feedback result, improving the universality of the first feedback result and ensuring the stability of the first feedback result.
The method comprises the steps of performing production size optimization evaluation on a production target mask according to an image acquisition result to obtain a size optimization evaluation result, performing auxiliary performance evaluation on auxiliary positioning detection points by combining convenience constraint parameters, generating an auxiliary performance evaluation result, and generating optimization feedback data. The optimization feedback data is obtained from the practical operation data, so that the reasonability of setting the auxiliary positioning detection points can be effectively ensured, the setting of unnecessary auxiliary positioning points is reduced, excessive operation is avoided, and the execution efficiency of the optimization feedback data is further ensured.
Example two
Based on the same inventive concept as the method for designing and analyzing a precision mask in the previous embodiment, as shown in fig. 4, the present application provides a system for designing and analyzing a precision mask, wherein the system includes:
the data acquisition unit 11 is used for acquiring target mask design drawing information and analyzing the target mask design drawing information to obtain analysis data;
the constraint tolerance analysis unit 12 is used for carrying out drawing constraint tolerance analysis based on the analytic data and obtaining a drawing grading area according to an analysis result;
an auxiliary positioning detection point setting unit 13, wherein the auxiliary positioning detection point setting unit 13 is configured to set an auxiliary positioning detection point through the drawing classification area, and the auxiliary positioning detection point includes a positioning detection point and a positioning verification point;
the manufacturing fitting unit 14 is used for constructing a three-dimensional fitting model through the target mask design drawing information, and performing manufacturing fitting on the basis of the three-dimensional fitting model and the set auxiliary positioning detection points to obtain a first fitting result;
the image acquisition unit 15 is used for acquiring an image of the production target mask plate through an image acquisition device and obtaining a first feedback result based on an image acquisition result;
an optimization feedback unit 16, where the optimization feedback unit 16 is configured to generate optimization feedback data according to the first fitting result and the first feedback result, and perform optimal distribution of the auxiliary positioning detection points based on the optimization feedback data.
Further, the system comprises:
the direction determination evaluation unit is used for performing positioning direction determination evaluation based on the first fitting result and generating a positioning direction determination feedback constraint parameter;
the adjustment parameter generating unit is used for evaluating the positioning complexity through the first fitting result to generate a positioning complexity feedback adjustment parameter;
and the feedback data generation unit is used for determining a feedback constraint parameter and the positioning complexity feedback adjustment parameter according to the positioning direction to generate the optimized feedback data.
Further, the system comprises:
the drawing area dividing unit is used for dividing the drawing area according to the drawing grading area and obtaining a precision control area based on an area dividing result;
the size requirement acquisition unit is used for acquiring size requirement information of a positioning graph based on the precision control area and the target mask design drawing information;
an auxiliary positioning detection unit for setting the auxiliary positioning detection point based on the size requirement information.
Further, the system comprises:
an associated region determining unit configured to determine a precision associated region according to the region division result;
the size requirement information determining unit is used for determining the associated positioning size requirement information through the precision associated region and the target mask design drawing information;
the interval constraint unit is used for carrying out interval constraint setting on the auxiliary positioning detection points through big data and the size requirement information to obtain a set of combined auxiliary positioning detection points;
and the detection point setting and screening unit is used for screening the combined auxiliary positioning detection point setting set through the associated positioning size requirement information and obtaining the auxiliary positioning detection points based on a screening result.
Further, the system comprises:
the size checking unit is used for checking the size of the production target mask according to the image acquisition result to obtain a checking process data set;
the convenience analysis unit is used for carrying out verification convenience analysis on the verification process data set to generate a convenience constraint parameter;
a feedback result obtaining unit, configured to obtain the first feedback result based on the convenience constraint parameter.
Further, the system comprises:
the size optimization evaluation unit is used for performing production size optimization evaluation on the production target mask according to the image acquisition result to obtain a size optimization evaluation result;
the auxiliary performance evaluation unit is used for carrying out auxiliary performance evaluation on the auxiliary positioning detection point based on the size optimization evaluation result and the convenience constraint parameter to generate an auxiliary performance evaluation result;
an optimized feedback data generation unit for generating the optimized feedback data based on the auxiliary performance evaluation result.
Further, the system comprises:
an optimization evaluation threshold setting unit for setting an auxiliary performance optimization evaluation threshold;
an evaluation threshold determination unit configured to determine whether the auxiliary performance evaluation result satisfies the auxiliary performance optimization evaluation threshold;
an optimization instruction obtaining unit, configured to obtain an optimization instruction when the auxiliary performance evaluation result does not satisfy the auxiliary performance optimization evaluation threshold;
and the detection point optimization unit is used for controlling the optimization of the auxiliary positioning detection points corresponding to the auxiliary performance evaluation result according to the optimization instruction.
The specification and drawings are merely exemplary of the application and various modifications and combinations can be made thereto without departing from the spirit and scope of the application. Such modifications and variations of the present application are within the scope of the claims of the present application and their equivalents, and the present application is intended to include such modifications and variations.
Claims (7)
1. A design analysis method of a precision mask is characterized in that the method is applied to an optimization analysis system which is in communication connection with an image acquisition device, and the method comprises the following steps:
collecting target mask design drawing information, and analyzing the target mask design drawing information to obtain analysis data;
carrying out drawing constraint tolerance analysis based on the analytic data, and obtaining a drawing grading area according to an analysis result;
setting auxiliary positioning detection points through the drawing classification area, wherein the auxiliary positioning detection points comprise positioning detection points and positioning verification points;
constructing a three-dimensional fitting model through the target mask design drawing information, and performing manufacturing fitting based on the three-dimensional fitting model and the set auxiliary positioning detection points to obtain a first fitting result;
acquiring an image of a production target mask plate through the image acquisition device, and acquiring a first feedback result based on an image acquisition result;
generating optimized feedback data according to the first fitting result and the first feedback result, and performing optimized distribution of the auxiliary positioning detection points based on the optimized feedback data;
performing positioning direction determination evaluation based on the first fitting result to generate a positioning direction determination feedback constraint parameter;
performing positioning complexity evaluation according to the first fitting result to generate a positioning complexity feedback adjustment parameter;
and determining a feedback constraint parameter and the positioning complexity feedback adjustment parameter according to the positioning direction to generate the optimized feedback data.
2. The method of claim 1, wherein the method further comprises:
dividing the drawing area according to the drawing grading area, and obtaining a precision control area based on an area dividing result;
obtaining size requirement information of a positioning graph based on the precision control area and the target mask design drawing information;
and setting the auxiliary positioning detection point based on the size requirement information.
3. The method of claim 2, wherein the method further comprises:
determining a precision correlation region according to the region division result;
determining the associated positioning size requirement information through the precision associated region and the target mask design drawing information;
performing setting interval constraint on the auxiliary positioning detection points through big data and the size requirement information to obtain a combined auxiliary positioning detection point setting set;
and screening the set of combined auxiliary positioning detection points according to the associated positioning size requirement information, and acquiring the auxiliary positioning detection points based on a screening result.
4. The method of claim 1, wherein the method further comprises:
checking the size of the production target mask according to the image acquisition result to obtain a checking process data set;
carrying out verification convenience analysis on the verification process data set to generate convenience constraint parameters;
and obtaining the first feedback result based on the convenience constraint parameter.
5. The method of claim 4, wherein the method further comprises:
performing production size optimization evaluation on the production target mask according to the image acquisition result to obtain a size optimization evaluation result;
performing auxiliary performance evaluation on the auxiliary positioning detection point based on the size optimization evaluation result and the convenience constraint parameter to generate an auxiliary performance evaluation result;
generating the optimized feedback data based on the auxiliary performance evaluation result.
6. The method of claim 5, wherein the method further comprises:
setting an auxiliary performance optimization evaluation threshold;
judging whether the auxiliary performance evaluation result meets the auxiliary performance optimization evaluation threshold value;
when the auxiliary performance evaluation result does not meet the auxiliary performance optimization evaluation threshold, obtaining an optimization instruction;
and controlling the optimization of the auxiliary positioning detection points corresponding to the auxiliary performance evaluation result according to the optimization instruction.
7. A system for design analysis of a precision reticle, the system comprising:
the data acquisition unit is used for acquiring target mask design drawing information and analyzing the target mask design drawing information to obtain analysis data;
the constraint tolerance analysis unit is used for carrying out drawing constraint tolerance analysis based on the analytic data and obtaining a drawing grading area according to an analysis result;
the auxiliary positioning detection point setting unit is used for setting auxiliary positioning detection points through the drawing classification area, wherein the auxiliary positioning detection points comprise positioning detection points and positioning verification points;
the manufacturing fitting unit is used for constructing a three-dimensional fitting model through the target mask design drawing information, and performing manufacturing fitting on the basis of the three-dimensional fitting model and the set auxiliary positioning detection points to obtain a first fitting result;
the image acquisition unit is used for acquiring an image of the production target mask plate through the image acquisition device and obtaining a first feedback result based on the image acquisition result;
the optimization feedback unit is used for generating optimization feedback data according to the first fitting result and the first feedback result and carrying out optimization distribution on the auxiliary positioning detection points based on the optimization feedback data;
the direction determination evaluation unit is used for performing positioning direction determination evaluation based on the first fitting result and generating a positioning direction determination feedback constraint parameter;
the adjustment parameter generating unit is used for evaluating the positioning complexity through the first fitting result to generate a positioning complexity feedback adjustment parameter;
and the feedback data generation unit is used for determining a feedback constraint parameter and the positioning complexity feedback adjustment parameter according to the positioning direction to generate the optimized feedback data.
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| CN114757517A (en) * | 2022-04-07 | 2022-07-15 | 苏州双德锐精密机械有限公司 | Intelligent production management method and system for equipment parts |
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