CN115181953B - 表面等离激元薄膜的制备方法和制备多层膜超材料的方法 - Google Patents
表面等离激元薄膜的制备方法和制备多层膜超材料的方法 Download PDFInfo
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- CN115181953B CN115181953B CN202211099082.0A CN202211099082A CN115181953B CN 115181953 B CN115181953 B CN 115181953B CN 202211099082 A CN202211099082 A CN 202211099082A CN 115181953 B CN115181953 B CN 115181953B
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- film
- sputtering
- surface plasmon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202211099082.0A CN115181953B (zh) | 2022-09-09 | 2022-09-09 | 表面等离激元薄膜的制备方法和制备多层膜超材料的方法 |
Applications Claiming Priority (1)
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CN202211099082.0A CN115181953B (zh) | 2022-09-09 | 2022-09-09 | 表面等离激元薄膜的制备方法和制备多层膜超材料的方法 |
Publications (2)
Publication Number | Publication Date |
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CN115181953A CN115181953A (zh) | 2022-10-14 |
CN115181953B true CN115181953B (zh) | 2022-12-06 |
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Family Applications (1)
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CN202211099082.0A Active CN115181953B (zh) | 2022-09-09 | 2022-09-09 | 表面等离激元薄膜的制备方法和制备多层膜超材料的方法 |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107267940A (zh) * | 2017-06-09 | 2017-10-20 | 中国科学院合肥物质科学研究院 | 一种Au‑Cu/Ag‑Al纳米多层膜表面增强荧光基底及其应用 |
CN110468376A (zh) * | 2019-08-27 | 2019-11-19 | 吉林大学 | 一种碳包覆的银纳米棒阵列及其制备方法和应用 |
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2022
- 2022-09-09 CN CN202211099082.0A patent/CN115181953B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107267940A (zh) * | 2017-06-09 | 2017-10-20 | 中国科学院合肥物质科学研究院 | 一种Au‑Cu/Ag‑Al纳米多层膜表面增强荧光基底及其应用 |
CN110468376A (zh) * | 2019-08-27 | 2019-11-19 | 吉林大学 | 一种碳包覆的银纳米棒阵列及其制备方法和应用 |
Non-Patent Citations (7)
Title |
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Integrated Optical Components Utilizing Long-Range Surface Plasmon Polaritons;Boltasseva等;《Journal of lightwave technology》;20050131;第413-422页 * |
易泰民等.磁控溅射制备纳米厚度连续金膜.《原子能科学技术》.2010,(第04期), * |
沉积速率对直流脉冲溅射钼薄膜微结构与光学性能的影响;赵娇玲等;《光学学报》(第09期);全文 * |
磁控溅射制备Au纳米颗粒及其局域表面等离激元共振特性研究;董大银等;《浙江理工大学学报》;20151110(第11期);全文 * |
磁控溅射制备纳米厚度连续金膜;易泰民等;《原子能科学技术》;20100420(第04期);第479-483页 * |
超薄金属透明导电膜及其应用研究进展;许君君等;《材料导报》;20190610(第11期);全文 * |
金纳米颗粒在石英基片上的表面等离子激元效应研究;王素杰等;《贵金属》;20180628(第02期);第49-53页 * |
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Inventor after: Liu Fang Inventor after: Li Tianchang Inventor after: Huang Yidong Inventor after: Cui Kaiyu Inventor after: Feng Xue Inventor after: Zhang Wei Inventor before: Liu Fang Inventor before: Li Tianchang Inventor before: Cui Kaiyu Inventor before: Feng Xue Inventor before: Zhang Wei Inventor before: Huang Yidong |
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