CN115180807A - Manufacturing device for opaque quartz weight - Google Patents
Manufacturing device for opaque quartz weight Download PDFInfo
- Publication number
- CN115180807A CN115180807A CN202210685127.6A CN202210685127A CN115180807A CN 115180807 A CN115180807 A CN 115180807A CN 202210685127 A CN202210685127 A CN 202210685127A CN 115180807 A CN115180807 A CN 115180807A
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- quartz
- burner
- main burner
- target
- melting
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 122
- 239000010453 quartz Substances 0.000 title claims abstract description 110
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 33
- 238000002844 melting Methods 0.000 claims abstract description 50
- 230000008018 melting Effects 0.000 claims abstract description 50
- 239000000843 powder Substances 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 26
- 238000003723 Smelting Methods 0.000 claims abstract description 18
- 230000007246 mechanism Effects 0.000 claims abstract description 12
- 239000011521 glass Substances 0.000 claims abstract description 6
- 239000005350 fused silica glass Substances 0.000 claims abstract description 5
- 238000001816 cooling Methods 0.000 claims description 13
- 238000002485 combustion reaction Methods 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 238000007493 shaping process Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims 1
- 239000007787 solid Substances 0.000 abstract description 4
- 238000009413 insulation Methods 0.000 abstract description 3
- 239000001301 oxygen Substances 0.000 description 14
- 229910052760 oxygen Inorganic materials 0.000 description 14
- 229910052581 Si3N4 Inorganic materials 0.000 description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 241001504664 Crossocheilus latius Species 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 241000217776 Holocentridae Species 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002303 thermal reforming Methods 0.000 description 2
- 239000011449 brick Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/235—Heating the glass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
The invention provides a manufacturing device of an opaque quartz mound, which comprises: the device comprises a smelting furnace, a main burner, an auxiliary burner, a target holder and a driving mechanism; the top of the furnace chamber of the smelting furnace is arc-shaped, and a main burner and an auxiliary burner are arranged; the main burner is provided with a feed opening for feeding the quartz powder; the main burner vertically penetrates through the center of the top of the smelting furnace and is used for melting quartz powder in a melting high-temperature area to form glass state quartz; two or more auxiliary burners are arranged, obliquely penetrate through the periphery of the main burner and are used for assisting the fused quartz powder; the target support is positioned under the main burner and is used for stacking vitreous state quartz materials to form a quartz weight; and the driving mechanism is connected with the target holder and is used for controlling the target holder to horizontally rotate and lift at a constant speed. The solid quartz mound prepared by the device has the advantages of large diameter, uniform micro-bubble distribution and relatively few transparent areas, and can be widely applied to opaque quartz products in the field of heat insulation.
Description
Technical Field
The invention relates to the field of quartz manufacturing production, in particular to a manufacturing device of an opaque quartz lead.
Background
The opaque quartz glass is used for the purpose needing thermal blocking, because the opaque quartz glass has the characteristics of very high pore density and small pore diameter, can shield infrared light in a wide wavelength region, has excellent thermal blocking performance, can be used as various furnace core pipes, flange parts, heat insulation sheets and other heat insulation materials used in the field of semiconductor manufacturing, and has more and more requirements on opaque quartz materials with large diameters along with the updating of the field of semiconductors.
Disclosure of Invention
The invention provides a manufacturing device of an opaque quartz stone roller, which is characterized in that a main burner and an auxiliary burner are arranged, and optimal gas parameters are set for the main burner and the auxiliary burner, so that the prepared opaque quartz stone roller has the advantages of large diameter, uniform micro-bubble distribution and relatively less transparent area, and can be widely applied to opaque quartz products in the field of heat insulation.
According to the disclosed embodiment of the invention, a manufacturing device of an opaque quartz mound is provided, which comprises: the device comprises a smelting furnace, a main burner, an auxiliary burner, a target holder and a driving mechanism; wherein, the top of the furnace chamber of the smelting furnace is arc-shaped, and a main burner and an auxiliary burner are arranged; the main burner is provided with a feed opening for feeding the quartz powder; the main burner vertically penetrates through the center of the top of the smelting furnace and is used for melting quartz powder in a melting high-temperature area to form glass state quartz; two or more auxiliary burners are arranged, obliquely penetrate through the periphery of the main burner and are used for assisting the fused quartz powder; the target support is positioned under the main burner and is used for stacking vitreous state quartz materials to form quartz mounds; and the driving mechanism is connected with the target holder and is used for controlling the target holder to horizontally rotate and lift at a constant speed.
Further, the melting high-temperature zone is positioned between the bottom of the main burner and the top of the quartz mound.
Furthermore, the constant-speed lifting of the target holder keeps the distance of the melting high-temperature area constant.
Furthermore, the auxiliary burner is inclined towards the high-temperature melting zone, so that the combustion flame of the auxiliary burner is sprayed to the high-temperature melting zone.
Furthermore, the auxiliary burners are arranged in two or more numbers, and are uniformly distributed around the main burner by taking the main burner as the center.
Further, the main burner or the auxiliary burner is one of a plasma burner, an oxyhydrogen flame burner and a laser.
Furthermore, during operation, the target holder rotates around the vertical central shaft at a constant speed horizontally and vertically lifts.
Furthermore, the target holder comprises a target rod and a target surface, and the target surface is arranged at the top of the target rod and is used for stacking vitreous silica materials; the target rod is connected with a driving mechanism to drive the target surface to move. .
Furthermore, the device is also provided with an observation port, and the observation ports are respectively arranged at the bottom of the melting high-temperature zone and the diameter edge level of the quartz stone.
Furthermore, the bottom of the smelting furnace is also provided with a cooling device for cooling and shaping the quartz mound.
By adopting the embodiment, the technical effects are as follows: the auxiliary burner solves the problems that quartz powder doped with silicon nitride is not sufficiently melted and cannot form a large-diameter opaque quartz mound after accumulation due to insufficient heating temperature, effectively solves the problem that quartz powder at the lamp holder opening and the lamp wick air outlet of a main burner is accumulated to cause material blockage and cannot be continuously melted to cause a relatively large transparent area with unevenly distributed microbubbles inside the opaque quartz mound, realizes that the large-diameter opaque quartz mound is directly melted by air refining, does not need to pass through a thermal reforming process, and reduces the production cost and the production period of the large-diameter opaque quartz mound.
It should be understood that the statements herein reciting aspects are not intended to limit the critical or essential features of any embodiment of the invention, nor are they intended to limit the scope of the invention. Other features of the present invention will become apparent from the following description.
Drawings
The above and other features, advantages and aspects of the disclosed embodiments will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings. In the drawings, like or similar reference characters denote like or similar elements, and wherein:
fig. 1 is a schematic structural diagram of a manufacturing apparatus of an opaque quartz mound provided by the invention;
wherein, the corresponding relationship between the reference numbers and the component names in fig. 1 is:
the method comprises the following steps of 1 main burner, 2 auxiliary burners, 3 quartz weights, 4 target supports, 5 observation ports and 6 cooling devices.
Detailed Description
To make the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be described in detail and completely with reference to the accompanying drawings in the embodiments of the present disclosure. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any creative effort, shall fall within the scope of the present disclosure.
In addition, the term "and/or" herein is only one kind of association relationship describing an associated object, and means that there may be three kinds of relationships, for example, a and/or B, which may mean: a exists alone, A and B exist simultaneously, and B exists alone. In addition, the character "/" herein generally indicates that the former and latter related objects are in an "or" relationship.
The invention provides a manufacturing device of a non-transparent quartz stone, which is used for preparing a solid non-transparent quartz stone by arranging a main burner and an auxiliary burner and setting optimal gas parameters for the main burner and the auxiliary burner.
As shown in fig. 1, the apparatus for manufacturing an opaque quartz mound disclosed in this embodiment includes: the device comprises a smelting furnace, a main burner 1, an auxiliary burner 2, a target holder 4 and a driving mechanism; wherein, the top of the furnace chamber of the melting furnace is arc-shaped, is provided with a main burner 1 and an auxiliary burner 2, and is used for melting quartz powder to form glass state quartz material; a feed opening is formed in the main burner 1 and used for feeding quartz powder; the main burner 1 vertically penetrates through the top center of the furnace and is used for melting quartz powder in a melting high-temperature area to form glass state quartz material; two or more auxiliary burners 2 are obliquely arranged around the main burner 1 in a penetrating way and are used for assisting the fused quartz powder; the target surface of the target holder 4 is round, is positioned right below the main burner 1 and is used for stacking vitreous state quartz materials to form a quartz weight 3; and the driving mechanism is connected with the target holder 4 and is used for controlling the target holder 4 to horizontally rotate and lift at a constant speed.
In the above embodiment, the melting high-temperature zone is located between the bottom of the main burner 1 and the top of the quartz mound 3. The temperature of the melting high-temperature area is set according to opaque quartz powder, such as 1800-2500 ℃, so that the melting standard of the quartz powder is ensured, and the requirement of forming a quartz block 3 is met.
In the above embodiment, the uniform raising and lowering of the target holder 4 keeps the distance of the molten high-temperature zone constant. The target holder 4 is driven by a driving mechanism to move vertically, and the distance between the top of the quartz weight 3 and the main burner 1 is kept between 250 and 300mm. The constant distance ensures that the vitreous state quartz material formed by melting the quartz material is uniform, and the structure which is consistent up and down is formed in the whole manufacturing process of the quartz mound 3, so that the quality of the quartz mound 3 is improved.
In the above embodiment, the auxiliary burner 2 is installed at the crown of the melting furnace obliquely toward the high-temperature zone of melting, ensuring that the combustion flame of the auxiliary burner 2 is injected into the high-temperature zone of melting. The auxiliary burner 2 is arranged obliquely to ensure that the combustion flame can be sprayed to the position right below the main burner 1, and the inclination angle is related to the distance of the main burner 1 according to the spraying distance of the combustion flame of the auxiliary burner 2 and the position of the auxiliary burner on the top of the furnace. In practical application, a plurality of inclined openings for placing the auxiliary burner 2 are arranged at the top of the smelting furnace in advance, the openings are opened when the smelting furnace is used, the burner is placed in the smelting furnace, and the unused openings are blocked by materials such as insulating bricks, so that the temperature in the smelting furnace is kept.
In the above embodiment, two or more auxiliary burners 2 are provided. The main burner 1 is used as the center and is evenly distributed around the main burner 1. The auxiliary burner 2 is adopted because the melting temperature and the melting time required by the opaque quartz mound are much higher than those of the transparent quartz powder due to the increase of the opaque powder such as silicon nitride powder contained in the opaque quartz mound; general transparent quartz powder can reach molten glass state only by the main burner 1, and the quartz powder of the opaque quartz mound doped with opaque powder needs higher temperature, so the auxiliary burner 2 is added on the basis of the main burner 1 to assist the melting of the opaque quartz powder, and the problems of higher production cost, longer production period, low material utilization rate and the like caused by longer melting time or secondary thermal reshaping in the manufacturing process are solved. The amount of the auxiliary burner 2 to be used is determined according to the falling rate of the opaque quartz powder and the ratio amount of the opaque quartz powder.
In the above embodiment, in the operation, the quartz material is fed from the main burner, and melted at the lamp cap at the bottom of the main burner 1 and the air outlet of the wick, and only in the main burner, when the opaque quartz powder is melted, the powder is insufficiently melted, and the phenomenon of material blockage caused by accumulation at the place can occur, if the feeding speed of the quartz material is reduced, the melting time is increased, and the cost is increased and the production efficiency is reduced. Through the use of the auxiliary burner 2, the auxiliary burner is obliquely arranged, the melting temperature of the auxiliary burner is increased, so that the quartz powder is fully melted, the phenomenon of material blockage caused by accumulation of the quartz powder is effectively solved, the problems of uneven distribution of microbubbles in the opaque quartz block and relatively large transparent area caused by continuous melting are solved, and the internal quality of the opaque quartz block is improved.
In the embodiment, the uniform blanking speed of the quartz powder can reach 6-9 kg/h. The specific blanking speed is determined according to the actual life and the product quality requirement.
In the above embodiment, the main burner 1 or the auxiliary burner 2 is one of a plasma burner, an oxyhydrogen flame burner, and a laser. The hydrogen-oxygen flame burner is selected in the embodiment, and the product specification is as follows: the hydrogen-oxygen mixed combustion of the main hydrogen-oxygen flame burner has the stoichiometric ratio of 2 to 1, the hydrogen pressure of 0.5-0.6 Mpa and the flow of 30-45 m 3 H, oxygen pressure of 0.8-0.9 Mpa and flow rate of 10-20 m 3 H, the diameter of the main burner is 150-200 mm; the auxiliary hydrogen-oxygen flame burner has the stoichiometric ratio of 2 to 1 during hydrogen-oxygen mixed combustion, the hydrogen pressure of 0.1-0.2 Mpa and the flow of 10-15 m 3 H, oxygen pressure of 0.2-0.3 Mpa, flow rate of 5-10 m 3 The diameter of the auxiliary burner is 50-60 mm.
In the above embodiment, the main burner 1 and the auxiliary burner 2 are detachably installed on the top of the melting furnace, and a heat insulating material is provided between the gaps, and the sealing state between the burner and the melting furnace is maintained on the detachable structure.
In the above embodiment, during operation, the target holder 4 rotates horizontally around the vertical central axis at a constant speed and vertically ascends and descends. The design is that the fused quartz material is uniformly distributed on the target holder 4 by utilizing the centrifugal force of uniform rotation, and the diameter of the quartz weight is increased. In this embodiment, the target holder 4 is set to rotate at a constant speed of 4-10 r/min and to descend at a constant speed of 0.2-2 mm/min.
In the above embodiment, the target holder 4 further comprises a target rod and a target surface, the target surface is arranged on the top of the target rod and used for stacking vitreous silica materials; the target rod is connected with the driving mechanism to drive the target surface to move. In the embodiment, the diameter of the target surface of the target holder 4 is 550-650mm, and the length of the target rod is 100-200 mm;
in the above embodiment, the furnace body of the furnace is provided with the viewing port 5 at the bottom of the high-temperature zone of melting and at the level of the diameter edge of the quartz mound 3. The observation port 5 is arranged for conveniently observing the generation condition of the quartz mound 3 in the furnace: an observation port 5 is arranged at the bottom of the melting high-temperature region, so as to observe the melting state and distribution condition of the top of the quartz mound 3 and conveniently adjust the melting speed of the main burner and the auxiliary burner in time; an observation port 5 is arranged at the diameter edge of the quartz mound 3 so as to know the diameter condition and the growth condition of the quartz mound 3 in real time.
In the above embodiment, the bottom of the furnace further comprises a cooling device 6 for cooling and shaping the quartz mound 3. And cooling devices such as water cooling devices and air cooling devices can be adopted, the temperature is controlled to be below 500 ℃, and the effect of quickly cooling and shaping the quartz mound 3 is achieved.
In the above embodiment, the diameter of the furnace throat is larger than the diameter of the target holder 4. During the uniform rotation of the target holder 4, the diameter of the quartz mound 3 formed on the target holder 4 is larger than that of the target holder 4, so in order to ensure that the stacked quartz mound 3 can be smoothly moved out of the smelting furnace, the diameter of the smelting furnace is larger than that of the quartz mound 3, and is further larger than that of the target holder 4. The design can be as follows: the diameter of a furnace mouth at the bottom of the smelting furnace is 800-1000mm, and the diameter of the target holder is 550-650mm.
In the above embodiment, when the manufacturing apparatus is used to produce the opaque quartz mound 3, a certain proportion of silicon nitride powder is doped into natural crystal powder with a particle size of 100-200 meshes as a raw material: wherein the raw materials with the granularity of 100-150 meshes account for more than 80w percent of the total raw materials; the silicon nitride is doped in a proportion of 0.05-0.5w%.
By adopting the quartz stone roller manufacturing device, before operation, natural crystal powder with the granularity of 100-200 meshes is doped with silicon nitride powder in a certain proportion as a raw material, wherein the quartz powder with the granularity of 100-150 meshes is more than 80w% as a base material, and the silicon nitride is doped in a proportion of 0.05w%.
Preparing operation: adopting oxyhydrogen flame burners as a heat source for melting quartz glass, wherein the diameter of a main oxyhydrogen flame burner is 180mm, the main oxyhydrogen flame burner is placed at the top of a melting furnace, the diameters of two auxiliary oxyhydrogen burners are 50mm, and the two auxiliary oxyhydrogen burners are placed at two sides of the main oxyhydrogen flame burner; hydrogen and oxygen mixed combustion of hydrogen and oxygen flame burnerThe stoichiometric ratio is 2 3 H, oxygen pressure 0.8Mpa, flow 15m 3 H; the hydrogen-oxygen mixed combustion of the auxiliary hydrogen-oxygen flame burner has the stoichiometric ratio of 2 to 1, the hydrogen pressure of 0.15Mpa and the flow of 12m 3 H, oxygen pressure 0.2Mpa, flow 5m 3 H; the temperature of the melting high-temperature zone, namely the temperature of the top of the quartz block is 1800-2500 ℃; the diameter of a furnace mouth at the bottom of the smelting furnace is 900mm; the diameter of the target holder is 600mm, and the length of the target holder is 150mm; the distance between the melting high-temperature zone, namely the distance between the target surface of the target holder and the main hydrogen-oxygen flame burner is 260-280mm; the constant speed of rotation of the target holder is 7.5r/min, and the constant speed of descent is 0.8mm/min; the cooling temperature of the cooling device is set to be below 500 degrees; the blanking speed of the quartz powder is set to be 9kg/h; the melting time was about 65 hours.
During operation, quartz powder is fed into the main burner 1 from a feed opening of the main burner 1, or is uniformly fed into the main burner 1 through hydrogen flow, preliminary melting is carried out in a melting high-temperature area under the heating of main oxyhydrogen flame, meanwhile, auxiliary heating is carried out on the auxiliary burners 2 on the two sides together, the quartz powder is continuously melted to form vitreous quartz material, after the vitreous quartz material is sprayed on a target surface, melting and accumulating are carried out in the melting high-temperature area to form quartz mounds, the target support 4 rotates at a constant speed and moves downwards at a constant speed to ensure the distance of the melting high-temperature area to be constant, after the target support 4 drives the quartz mounds to leave the melting high-temperature area, the quartz mounds are gradually cooled to form columnar solid opaque quartz mounds 3, along with the gradual descending of the target support 4, the length of the solid opaque quartz mounds 3 is increased, so that the columnar opaque quartz mounds are continuously smelted through gas, the maximum diameter of the columnar opaque quartz mounds is larger than 700mm, and the maximum height is larger than 500mm.
By adopting the embodiment, the technical effects are as follows: the auxiliary burner is used, the problems that the quartz powder doped with silicon nitride is not sufficiently melted and poor in fluidity due to insufficient heating temperature, and therefore a large-diameter opaque quartz mound cannot be formed after accumulation are solved, the problems that micro bubbles in the opaque quartz mound cannot be uniformly distributed and a transparent area is relatively large due to the fact that the quartz powder at the lamp holder opening and the lamp wick air outlet of the main burner is accumulated to cause blocking and cannot be continuously melted are solved, the large-diameter opaque quartz mound can be directly melted through air refining, a thermal reforming process is not needed, and the production cost and the production period of the large-diameter opaque quartz mound are reduced.
In the description of the present specification, the terms "connect", "mount", "fix", and the like are to be understood in a broad sense, for example, "connect" may be a fixed connection, a detachable connection, or an integral connection; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as the case may be.
In the description of the present application, the description of the terms "one embodiment," "some embodiments," or the like, means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the application. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. An apparatus for manufacturing an opaque quartz mound, comprising: the device comprises a smelting furnace, a main burner, an auxiliary burner, a target holder and a driving mechanism; wherein the content of the first and second substances,
the top of the furnace chamber of the smelting furnace is arc-shaped, and the main burner and the auxiliary burner are installed;
the main burner is provided with a feed opening for feeding quartz powder;
the main burner vertically penetrates through the top center of the furnace and is used for melting quartz powder in a melting high-temperature area to form glass state quartz material;
the auxiliary burners are arranged in two or more numbers, obliquely penetrate through the periphery of the main burner and are used for assisting the fused quartz powder;
the target support is positioned right below the main burner and is used for stacking the glassy state quartz material to form a quartz mound;
and the driving mechanism is connected with the target holder and is used for controlling the target holder to horizontally rotate and lift at a constant speed.
2. The manufacturing apparatus of claim 1, wherein the high-temperature zone of melting is located between the main burner bottom and the quartz mound top.
3. The manufacturing apparatus according to claim 1, wherein the constant speed of the target holder is raised and lowered to keep a distance of the molten high-temperature zone constant.
4. The manufacturing apparatus according to claim 1, wherein the auxiliary burner is inclined toward the high-temperature melting zone so that a combustion flame of the auxiliary burner is jetted to the high-temperature melting zone.
5. The manufacturing apparatus according to claim 1, wherein two or more auxiliary burners are provided, centered on the main burner, uniformly distributed around the main burner.
6. The manufacturing apparatus of claim 1, wherein the primary or secondary burner is one of a plasma burner, an oxy-hydrogen flame burner, a laser.
7. The manufacturing apparatus of claim 1, wherein the target holder is adapted to rotate horizontally and vertically about a vertical central axis at a constant speed during operation.
8. The manufacturing apparatus as claimed in claim 1, wherein the target holder comprises a target rod and a target surface, the target surface is disposed on top of the target rod for the glass quartz material to be stacked; the target rod is connected with the driving mechanism to drive the target surface to move.
9. The manufacturing device according to claim 1, characterized in that observation ports are further provided, and the observation ports are respectively provided at the bottom of the melting high-temperature zone and at the level of the diameter edge of the quartz mound.
10. The manufacturing device of claim 1, wherein the bottom of the furnace is further provided with a cooling device for cooling and shaping the quartz mound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210685127.6A CN115180807A (en) | 2022-06-14 | 2022-06-14 | Manufacturing device for opaque quartz weight |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210685127.6A CN115180807A (en) | 2022-06-14 | 2022-06-14 | Manufacturing device for opaque quartz weight |
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| CN115180807A true CN115180807A (en) | 2022-10-14 |
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| CN202210685127.6A Pending CN115180807A (en) | 2022-06-14 | 2022-06-14 | Manufacturing device for opaque quartz weight |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002356335A (en) * | 2001-06-01 | 2002-12-13 | Tosoh Corp | Method for producing composite quarts glass containing zirconium and apparatus therefor |
| JP2004142997A (en) * | 2002-10-25 | 2004-05-20 | Nikon Corp | Method and apparatus for manufacturing synthetic quartz glass |
| CN104926088A (en) * | 2015-07-16 | 2015-09-23 | 中国建筑材料科学研究总院 | Method for preparing highly-uniform synthetic quartz glass weight |
| JP2019172563A (en) * | 2018-03-29 | 2019-10-10 | Ａｇｃ株式会社 | Method for producing silica glass containing TiO2 |
| CN113683291A (en) * | 2021-07-30 | 2021-11-23 | 江苏亨通智能科技有限公司 | Method for producing large-size and high-uniformity synthetic quartz glass weight |
-
2022
- 2022-06-14 CN CN202210685127.6A patent/CN115180807A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002356335A (en) * | 2001-06-01 | 2002-12-13 | Tosoh Corp | Method for producing composite quarts glass containing zirconium and apparatus therefor |
| JP2004142997A (en) * | 2002-10-25 | 2004-05-20 | Nikon Corp | Method and apparatus for manufacturing synthetic quartz glass |
| CN104926088A (en) * | 2015-07-16 | 2015-09-23 | 中国建筑材料科学研究总院 | Method for preparing highly-uniform synthetic quartz glass weight |
| JP2019172563A (en) * | 2018-03-29 | 2019-10-10 | Ａｇｃ株式会社 | Method for producing silica glass containing TiO2 |
| CN113683291A (en) * | 2021-07-30 | 2021-11-23 | 江苏亨通智能科技有限公司 | Method for producing large-size and high-uniformity synthetic quartz glass weight |
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| Title |
|---|
| 魏忠诚: "光纤材料制备技术", 北京邮电大学出版社, pages: 134 - 135 * |
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