CN115174637B - Deposition equipment control system based on industrial Ethernet - Google Patents
Deposition equipment control system based on industrial Ethernet Download PDFInfo
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- CN115174637B CN115174637B CN202211081968.2A CN202211081968A CN115174637B CN 115174637 B CN115174637 B CN 115174637B CN 202211081968 A CN202211081968 A CN 202211081968A CN 115174637 B CN115174637 B CN 115174637B
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
- H04L67/00—Network arrangements or protocols for supporting network services or applications
- H04L67/01—Protocols
- H04L67/12—Protocols specially adapted for proprietary or special-purpose networking environments, e.g. medical networks, sensor networks, networks in vehicles or remote metering networks
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/05—Programmable logic controllers, e.g. simulating logic interconnections of signals according to ladder diagrams or function charts
- G05B19/058—Safety, monitoring
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
- H04L49/00—Packet switching elements
- H04L49/30—Peripheral units, e.g. input or output ports
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
- H04L49/00—Packet switching elements
- H04L49/35—Switches specially adapted for specific applications
- H04L49/351—Switches specially adapted for specific applications for local area network [LAN], e.g. Ethernet switches
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Abstract
The invention provides a deposition equipment control system based on industrial Ethernet, which comprises an upper computer, a terminal, a communication transmission link module and a cavity control system, wherein the upper computer is connected with the terminal; the terminal comprises a first switch and terminal equipment; based on the traditional Ethernet, the upper computer is in communication link with the terminal equipment through the first switch; one end of the communication transmission link module is connected with the first switch, and the other end of the communication transmission link module is connected with the cavity control system; realizing communication link between the terminal and the cavity control system based on industrial Ethernet; the cavity control system is in communication link with the communication transmission link module through an industrial Ethernet; and the cavity control system independently completes the access in the cavity control system based on the industrial Ethernet. The control system of the deposition equipment has high communication transmission efficiency and higher data transmission reliability and hot plug connection flexibility, thereby improving the convenience of equipment production.
Description
Technical Field
The invention relates to the field of manufacturing of semiconductor high-end equipment, in particular to a deposition equipment control system based on industrial Ethernet.
Background
EtherNET (traditional Ethernet) is the most widely applied computer local area network technology, and switched EtherNET is a widely applied Ethernet, and a switch is used for network connection and organization, so that the network speed is increased, the use efficiency is maximized, and meanwhile, the conflict generated by high-speed concurrent transmission is reduced. With the application of integrated circuits in a wider field, semiconductor manufacturing equipment is required to have better flexibility to meet the design requirements of diversified products.
The process of vapor deposition of a base film requires precise time control. When a process node below 10nm is manufactured corresponding to a logic chip, a PVD-sputtered AlOx (aluminum oxide) etching stop layer is needed, the AlOx of the layer is very thin and has the thickness of about 2nm-3nm, the total time of a sputtering process flow is about 10s, and at the moment, the sputtering time needs to be controlled by process time accurate to within 10ms so as to further realize film thickness control of atomic-level precision. While for the fabrication of magnetic memories the deposition of non-magnetic insulating layers (including magnesium oxide and aluminum oxide) is critical, with thicknesses of less than 1nm, even thickness variations of only a fraction of the atomic diameter will have a great impact on the reliable performance of the magnetic memory device; when a non-magnetic insulating layer in a magnetic memory is sputtered by adopting PVD equipment, the PVD sputtering time is required to be about 5s, and very accurate process time control is also required to realize the film thickness control with atomic-scale accuracy.
At present, the deposition equipment is mostly designed in a modularized mode, and a control system of the deposition equipment also needs to meet the requirement, so that the flexible configuration of a process cavity is met, the rapid connection is realized, and the market requirement is met. However, the system architecture of the current deposition equipment control system based on EtherNET and DeviceNet fieldbus standards and cooperating with a general purpose PC computer for remote IO control is shown in fig. 1, the response time is usually more than 200ms, therefore, the system architecture cannot meet the control requirements of the process node below 10nm corresponding to the logic chip manufacture and the vapor deposition of the nonmagnetic insulating layer in the magnetic memory, and the system architecture also needs to be reconfigured for control when the equipment configuration changes, which limits the flexible configuration of the process chamber of the vapor deposition equipment.
Disclosure of Invention
In view of the above-mentioned shortcomings of the prior art, the present invention aims to provide a deposition apparatus control system based on industrial ethernet, which is used for solving the problems of the prior art that the deposition apparatus control system has long response time, cannot meet certain control requirements, and has poor flexible configuration.
In order to achieve the above objects and other related objects, the present invention provides a deposition apparatus control system based on industrial ethernet, which is characterized in that the deposition apparatus control system comprises an upper computer, a terminal, a communication transmission link module and a cavity control system;
the terminal comprises a first switch and terminal equipment; based on the traditional Ethernet, the upper computer is in communication link with the terminal equipment through the first switch;
one end of the communication transmission link module is connected with the first switch, and the other end of the communication transmission link module is connected with the cavity control system; realizing communication link between the terminal and the cavity control system based on industrial Ethernet;
the cavity control system is in communication link with the communication transmission link module through an industrial Ethernet; and the cavity control system independently completes the access in the cavity control system based on the industrial Ethernet.
Preferably, the terminal equipment comprises an equipment front end module and a wafer transmission manipulator; the equipment front end module is used for loading wafers and is matched with the wafer transmission manipulator to transmit the wafers to the equipment machine.
Preferably, the upper computer comprises a main control industrial personal computer and an operation industrial personal computer, and the upper computer controls the front-end module of the equipment, the wafer transmission manipulator and the main control PLC and acquires data.
Preferably, the communication transmission link module comprises a master PLC and a second switch; the master control PLC is in communication link with the second switch based on industrial Ethernet; the master control PLC is configured with a safety unit for implementing safety interlock logic for the deposition apparatus.
Preferably, the system further comprises a remote power distribution cabinet, and the remote power distribution cabinet communicates with the first switch through the communication transmission link module.
Preferably, the communication transmission link module establishes a communication link with the first switch based on a conventional ethernet, and the communication link transmission module establishes a communication link with the remote power distribution cabinet and the cavity control system based on an industrial ethernet.
Preferably, the cavity control system comprises a plurality of cavity control subsystems, and each cavity control subsystem comprises a sub-control PLC and an intra-cavity field layer module; the sub-control PLC is configured with a safety unit, and realizes the safety interlocking logic of the in-cavity field layer module based on the industrial Ethernet; and the sub-control PLC is used for carrying out process treatment on the wafer transmitted to the in-cavity field layer module.
Preferably, the chamber control system comprises a pre-cleaning chamber subsystem, a pre-vacuumizing chamber subsystem, a water vapor removing chamber subsystem, a transmission chamber subsystem and a main body process chamber subsystem.
Preferably, the security unit comprises a security CPU, a security input subunit and a security output subunit;
the safety input subunit is responsible for monitoring safety state signals;
the safety output subunit generates permission conditions for equipment operation;
the safety CPU determines the output of the safety unit according to the monitored safety state signal.
As described above, the industrial ethernet-based deposition apparatus control system of the present invention has the following advantages:
the invention utilizes the industrial Ethernet (EtherCAT) to be higher than the data communication capacity of DeviceNet bus system by tens of times, under the condition of not increasing the cost, collect more process parameter data and equipment operation data, provide more abundant basis for process analysis and equipment development, lay a foundation for the intelligent control and predictive maintenance of the equipment; and the quick and flexible combination of the cavity is realized by utilizing the flexible network topology structure and the automatic link detection function of the industrial Ethernet (EtherCAT), and the cavity with the independent control subsystem based on the industrial Ethernet (EtherCAT) can be freely separated from and accessed to the main control system under the condition of no power failure without the need of system reconfiguration. The control system of the deposition equipment has higher data transmission reliability and hot plug connection flexibility, thereby improving the convenience of equipment production.
Drawings
Fig. 1 is a schematic structural diagram of a control system of a deposition apparatus in the prior art.
Fig. 2 is a schematic structural diagram of the industrial ethernet-based deposition equipment control system according to the present invention.
Fig. 3 is a schematic structural diagram of the chamber control system according to the present invention.
Detailed Description
The embodiments of the present invention are described below with reference to specific embodiments, and other advantages and effects of the present invention will be easily understood by those skilled in the art from the disclosure of the present specification. The invention is capable of other and different embodiments and of being practiced or of being carried out in various ways, and its several details are capable of modification in various respects, all without departing from the spirit and scope of the present invention.
Please refer to fig. 2-3. It should be noted that the drawings provided in this embodiment are only for schematically illustrating the basic idea of the present invention, and the components related to the present invention are only shown in the drawings and not drawn according to the number, shape and size of the components in actual implementation, and the form, quantity and proportion of each component in actual implementation may be arbitrarily changed, and the component layout may be more complicated.
With the development of the technology, etherCAT (EtherNET control automation technology, namely industrial EtherNET) is an industrial EtherNET with an open architecture and determinacy and conforming to SEMI standard, and is a fieldbus system based on EtherNET, which has a faster transmission speed and a larger data capacity; etherCAT supports almost any topology type, including linear, tree, star, etc.; a bus structure or a line structure named by a field bus can also be used for EtherCAT, and is not limited to the number of cascaded switches or hubs; the physical layer of fast ethernet (100 BASE-TX) allows a maximum cable length between two devices of 100 meters, and since the number of devices connected can be as high as 65535, the capacity of an industrial ethernet (EtherCAT) high-speed network is almost unlimited; etherCAT is one of the fastest industrial Ethernet technologies in modern industrial control, and the development purpose of the EtherCAT is to apply the Ethernet technology to automatic control, and the industrial Ethernet (EtherCAT) has the synchronization capability of nanosecond precision at the same time, and can fully meet the rigorous requirements of advanced deposition processes and equipment on time control.
Therefore, when the technical problems of the existing control system of the deposition equipment are solved, the technology of combining the industrial Ethernet (EtherCAT) is adopted, and the industrial Ethernet with higher transmission speed, higher data capacity and nanosecond precision synchronization capability is applied to the control of the deposition equipment so as to improve the control precision of the control system of the deposition equipment. Namely, the deposition equipment control system of the invention adopts a traditional Ethernet (EtherNET) network and an industrial Ethernet (EtherCAT) high-speed network.
Based on the technical concept, in order to achieve the above object and other related objects, the invention provides a deposition equipment control system based on industrial ethernet (EtherCAT), as shown in fig. 2, comprising an upper computer, a terminal, a transmission link module and a cavity control system; the terminal comprises a first switch and terminal equipment; based on a traditional Ethernet (EtherNET), the upper computer is in communication link with the terminal equipment through the first switch; one end of the communication transmission link module is connected with the first switch, and the other end of the communication transmission link module is connected with the cavity control system; realizing communication link between a terminal and the cavity control system based on an industrial Ethernet (EtherCAT); the cavity control system is in communication link with the communication transmission link module through an industrial Ethernet (EtherCAT); and the cavity control system independently completes the access in the cavity control system based on the industrial Ethernet.
Compared with the prior art that the upper computer accesses each field device through the DeviceNET through the traditional Ethernet (EtherNet), because a small amount of high frequency of field device data is not matched with an EtherNet network mechanism, the high-capacity characteristic of an EtherNet data packet cannot be exerted, and because too many field devices are provided, the network load is heavy, the acquisition of high-frequency data is influenced, and the coating device cannot be applied to the short-time technological process; the invention utilizes the industrial Ethernet (EtherCAT) to be higher than the data communication capacity of DeviceNet bus system by tens of times, under the condition of not increasing the cost, collect more process parameter data and equipment operating data, provide more sufficient basis for process analysis and equipment development, lay a foundation for the intelligent control and predictive maintenance of the equipment; and the quick and flexible combination of the cavity is realized by utilizing the flexible network topology structure and the automatic link detection function of the industrial Ethernet (EtherCAT), and the cavity with the independent control subsystem based on the industrial Ethernet (EtherCAT) can be freely separated from and accessed to the main control system under the condition of no power failure without the need of system reconfiguration.
In the invention, the terminal equipment comprises an equipment front end module and a wafer transmission manipulator; the equipment front end module is used for loading wafers and is matched with the wafer transmission manipulator to transmit the wafers to the equipment machine.
The first switch of the terminal sends a control instruction generated by the upper computer to the equipment front-end module, the equipment front-end module executes the control instruction, and controls the wafer transmission manipulator to transmit the wafer to the equipment machine table for manufacturing the wafer.
The upper computer comprises a main control industrial personal computer and an operation industrial personal computer, and the upper computer realizes control and data acquisition of the equipment front-end module, the wafer transmission manipulator and the main control PLC.
Specifically, the host computer leads to RJ45 interface electricity with first switch and is connected, first switch passes through RJ45 interface connection with equipment front end module, the main control industrial computer or the operative employee control machine of host computer send control command through the RJ45 interface, then send control command for equipment front end module and wafer transmission manipulator based on traditional ethernet (etherCAT), make equipment front end module cooperation wafer transmission manipulator work together in coordination, convey the wafer to the equipment board and produce manufacturing, more specific wafer transmission manipulator snatchs the wafer of placing in the equipment front end module and moves to each cavity of equipment board and handle in order to realize producing manufacturing.
The equipment front-end module and the wafer transmission manipulator are market standard components, and due to the requirement on high-capacity and high-bandwidth data transmission, common EtherNET interfaces and communication protocols are provided; meanwhile, safety interlocking circuits are independently arranged in the front-end module of the equipment and the wafer machine transmission manipulator, so that the correct and reliable execution of the transmission action can be ensured; in addition, a first switch adopting an EtherNET communication protocol is used as a medium for exchanging and transmitting traditional Ethernet data between the upper computer and the terminal, so that interconnection of EtherNET transmission protocol equipment and data transmission are realized, and a network formed by an equipment front-end module and a wafer transmission manipulator, which are connected with the first switch based on the EtherNET communication protocol, is a traditional Ethernet (EtherNET) network.
The deposition equipment control system based on the industrial Ethernet (EtherCAT) further comprises a remote power distribution cabinet, and the remote power distribution cabinet is communicated with the first switch through the communication transmission link module.
Specifically, the remote power distribution cabinet is electrically connected with the first switch through an RJ45 interface; the remote power distribution cabinet comprises a sputtering power supply, a heat exchange unit, a vacuum pump set and other functional modules; the remote power distribution cabinet is responsible for power supply and distribution of the whole system and comprehensively controls the heat exchange unit and the vacuum pump set; each functional module of the remote power distribution cabinet belongs to field equipment, the data volume is small, quick response is required, reliable control is required, the EtherCAT high-speed network can realize quick data interaction, and the EtherNET traditional network cannot meet the data requirement; the heat exchange unit and the vacuum pump unit are accessory equipment of the whole system equipment. The heat exchange unit is used for heat exchange to ensure that the equipment is in a proper temperature range; a vacuum pump set is used to obtain vacuum conditions.
The communication transmission link module comprises a master control PLC and a second switch; the master control PLC is in communication link with the second switch based on the industrial Ethernet; the master control PLC is configured with a safety unit for implementing safety interlock logic for the deposition apparatus.
According to the invention, the master control PLC accesses and controls each cavity control system through the industrial Ethernet (EtherCAT), and as each cavity control system encapsulates the field equipment controlled by the cavity control system, the number of EtherCAT slave station equipment accessed by the master control PLC is greatly reduced, the time performance of the whole system is greatly improved, and the control requirements of the existing and future coating processes are fully met. And data of all the cavity control systems are gathered to the master control PLC, the master control PLC abstracts the data into data description of the coating equipment, and the data description is communicated with an upper computer through the EtherNet. The method makes full use of the EtherNet network large-capacity data packet, and avoids network delay and even blockage caused by conflict competition due to the fact that an upper computer directly accesses each field device.
The deposition equipment control system adopts industrial Ethernet (EtherCAT) with a star topology structure, and uses the hot connection technology and the grouping technology thereof to realize the hot plug of each cavity control subsystem by utilizing the automatic link detection function of the industrial Ethernet (EtherCAT). Specifically, when one cavity control subsystem is removed, the corresponding port on the second switch based on the industrial ethernet (EtherCAT) is automatically closed, and the rest of the network continues to operate. On the contrary, when the cavity control subsystem is accessed, the corresponding port on the second switch based on the industrial ethernet (EtherCAT) is automatically opened, and the network keeps normal operation. Namely, each cavity control subsystem corresponds to two data structures (input data and output data) of the master control PLC, a data model of each cavity control subsystem always exists in the master control PLC, only when each cavity control subsystem is offline, the cavity control subsystem is marked to be in an offline state, the data is not updated, and when the cavity control subsystem is accessed again, the equipment type is identified through ID coding, the cavity control subsystem is connected to the corresponding data model, the data is updated again, and the upper computer controls the subsystems again. Therefore, the upper computer has no influence of one wire when each cavity control subsystem is connected or disconnected. By means of the design characteristics, the online combination configuration of the process chamber is realized, the limitation that the traditional control architecture cannot combine the process chamber online is broken through (when a certain field device is disconnected, a control system of the traditional EtherNet plus Dnet architecture causes the data address in the Scanner to change, and the device needs to be reconfigured), and the convenience of production can be greatly met.
The communication transmission link module establishes a communication link with the first switch based on a traditional Ethernet (EtherNET), and the communication link transmission module establishes a communication link with the remote power distribution cabinet and the cavity control system based on an industrial Ethernet (EtherCAT).
The invention is based on the industrial Ethernet (EtherCAT) deposition equipment control system, a master control PLC is added in a communication transmission link module between an upper computer and a cavity control system, and advanced industrial Ethernet (EtherCAT) is adopted as a field layer network in the cavity control system; the master control PLC accesses the remote power distribution cabinet and the cavity control system through a second switch based on an industrial Ethernet (EtherCAT) and a high-speed network control of the industrial Ethernet (EtherCAT), and realizes rapid data exchange and control with each EtherCAT sub-device (namely the remote power distribution cabinet and the cavity control subsystem). In addition, the master PLC is electrically connected to a first switch based on a conventional EtherNET (EtherNET) and a second switch based on an industrial EtherNET (EtherCAT) via RJ45 interfaces.
The invention is based on the second exchanger of the industrial Ethernet (EtherCAT) and regarded as the media of the fast industrial Ethernet data exchange transmission, realize the interconnection of EtherCAT transmission protocol apparatus and transmission of the data, the network formed between main control PLC and every EtherCAT subdevice (namely said remote switch board and cavity control subsystem) that the second exchanger based on industrial Ethernet (EtherCAT) connects is the industrial Ethernet (EtherCAT) high-speed network;
the cavity control system comprises a plurality of cavity control subsystems as shown in fig. 3, wherein each cavity control subsystem comprises a sub-control PLC and an intra-cavity field layer module, the sub-control PLC is provided with a safety unit, and the safety interlocking logic of the intra-cavity field layer module is realized based on an industrial Ethernet; specifically, the sub-control PLC is used for carrying out process treatment on the wafer in the cavity transferred to the in-cavity field layer module, and the in-cavity field layer module comprises a control unit, a corresponding cavity for completing the process treatment of the wafer and structural equipment comprising the corresponding cavity.
Specifically, the cavity control system comprises a pre-cleaning cavity subsystem, a pre-vacuumizing chamber subsystem, a water vapor removing cavity subsystem, a transmission cavity subsystem and a main body process cavity subsystem; the pre-cleaning cavity subsystem is used for cleaning impurities attached to the surface of the wafer and has the functions of heating control, lifting control, radio frequency control and molecular pump control; the pre-vacuumizing cavity subsystem is used for controlling pre-vacuumizing operation in the cavity and has the functions of vacuum pump signal control and vacuum degree measurement; the water vapor removing cavity subsystem is used for removing water vapor adsorbed on the surface of the wafer and has the functions of lifting and heating control of the wafer; the transmission cavity subsystem and the wafer transmission manipulator form a wafer transmission system together, and the wafer transmission system has wafer lifting control and vacuum valve control functions; the main body process cavity subsystem is used as a main body working cavity control system for PVD coating and mainly completes coating tasks of various processes.
The in-cavity field layer module of the main body process cavity subsystem comprises a vacuum gauge, a mass flow meter, a cavity baking driver, a wafer heating controller, a wafer heating plate lifting motor driver, a wafer shielding mechanism driver, a magnetic field rotating mechanism driver and the like; compared with the in-cavity field layer modules such as a vacuum gauge, a mass flow meter, a controller and a driver which directly control and access the cavity through an EtherNET switch by an upper computer in the prior art, the deposition equipment control system scheme based on the industrial Ethernet (EtherCAT) realizes independent and efficient control of each cavity control subsystem, and has higher data transmission reliability and hot plug connection flexibility.
The sub-control PLC of each cavity control subsystem is also provided with a safety module for realizing the safety interlocking logic of the in-cavity field layer module; and the sub-control PLC uses the distributed clock function of the industrial Ethernet (EtherCAT), the sub-control PLC collects and abstracts the process data and the equipment state data of each cavity into a cavity Digital mapping (Digital Twin) with data description, and after the cavity Digital mapping (Digital Twin) is transmitted to the main control PLC through a second switch based on the industrial Ethernet (EtherCAT), the main control PLC further collects and transmits the collected data to an upper computer through a first switch based on the traditional Ethernet (EtherNET) to realize the uniform configuration and control of the process operation. Therefore, the bandwidth of the network is fully utilized, and the communication efficiency is improved.
The invention adopts the distributed clock function of the industrial Ethernet (EtherCAT) to realize the accurate time control of the field device, and can even realize the deterministic synchronization error time which is less than 1 microsecond for the process application with strict time requirement.
The communication period between the upper computer and the master control PLC is 20ms, the communication period from the master control PLC to the field device of the cavity control subsystem is 2ms, and the time synchronization precision reaches 1 microsecond. Compared with the architecture with uncertain time precision of at least 200ms of the EtherNet + DNet architecture shown in FIG. 1, the method has obvious control advantages.
In each cavity control system, cavity control subsystems formed by a sub-control PLC and an in-cavity field layer module respectively and independently operate and acquire and process data, and the cavity control system is electrically connected with a second switch based on an industrial Ethernet (EtherCAT) through an RJ45 interface. The cavity control subsystem comprises an ID coding sequence with 16 bits, different cavities are coded, the types of the cavities with the number of 6 or more can be distinguished, when the cavity control subsystem is connected to a deposition equipment control system based on an industrial Ethernet (EtherCAT), specific configuration of the connected cavities can be quickly identified and online configuration access can be carried out, manual offline configuration equipment is not needed, and meanwhile, the possibility of errors in the process of manual configuration equipment is avoided.
The small-batch high-frequency data of the intra-cavity field layer module are summarized to the master control PLC through a high-speed network of an industrial Ethernet (EtherCAT), and the master control PLC transmits the summarized data to an upper computer for further processing by utilizing the high-capacity data throughput capacity of the traditional network (EtherNET); the transmission process of the data uses the high transmission bandwidth of the traditional network (EtherNET), and the communication efficiency of the whole transmission process is improved; in the data transmission process, accurate time synchronization and data acquisition between equipment are realized by using a Distributed Clock (DC) of an industrial Ethernet (EtherCAT) high-speed network, the data exchange mechanism of the Distributed Clock (DC) is realized based on hardware, the whole network jitter is less than 1us, data are exchanged by a master device and a slave device according to the system time of a uniform distributed clock, and the interaction of data of each frame can be ensured to have determined time; therefore, compared with the traditional control system, the control system has the obvious advantage of data transmission efficiency, and the technical development requirements of semiconductors on deposition equipment are better met; and the master control PLC, the cavity control system and the remote power distribution cabinet form a star topology network through a second switch (such as Beifu CU 1128) based on an industrial Ethernet (EtherCAT) to be conveniently detached, and hot plug connection of each subsystem and each module inside the subsystem can be realized.
The master control PLC and the sub-control PLC are both provided with a safety unit, and the safety unit comprises a safety CPU, a safety input subunit and a safety output subunit. The safety input subunit is responsible for monitoring the safety state signal, the safety output subunit generates the permission condition of equipment operation, and the safety CPU determines the output of the safety unit according to the monitored safety state signal, namely whether the equipment operation condition is met. The logic processing function block called in the safety CPU is a specific function block that satisfies safety specifications, unlike the function block of a general PLC. The safety input subunit and the safety output subunit adopt double-loop superposed pulse detection, and a higher safety level can be achieved. The circuits of the safety input subunit and the safety output subunit are the prior art, and detailed description thereof is omitted in the present invention.
The deposition equipment control system based on the industrial Ethernet (EtherCAT) has the following beneficial effects:
(1) The deposition equipment control system based on the industrial Ethernet (EtherCAT) adopts the EtherCAT high-speed network with a star topology structure, uses the Hot Connect technology and the packet switching technology, and can realize the Hot plug of each cavity control subsystem and the field layer composition module in each cavity inside by utilizing the automatic link detection function of the EtherCAT high-speed network; by introducing the EtherCAT high-speed network, the online combined configuration of each cavity on the semiconductor equipment is realized, the limitation that the traditional control framework cannot be used for online combination of the cavities is broken through, and the convenience of equipment production is improved;
(2) The master control PLC and each sub-control PLC are respectively provided with a safety unit, so that the safety interlocking logic of the vapor deposition equipment is realized;
the invention is based on the industrial Ethernet (EtherCAT) deposition equipment control system, a master control PLC is added between an upper computer and an intracavity field layer module, and advanced industrial Ethernet (EtherCAT) is adopted as an intracavity field layer network; the master control PLC accesses the remote power distribution cabinet and the cavity control subsystem through the second switch and the EtherCAT high-speed network control, and realizes the rapid data exchange and control with each EtherCAT sub-device (namely the remote power distribution cabinet and the cavity control subsystem); the data transmission process not only uses the Distributed Clock (DC) of the EtherCAT high-speed network to realize accurate time synchronization and data acquisition between devices, the DC data exchange mechanism is realized based on hardware, the whole network jitter is less than 1us, and the master device and the slave device exchange data according to the system time of a uniform distributed clock, so that the interaction of each frame of data can be ensured to have determined time, and the characteristics of high transmission speed and high data capacity of the EtherCAT high-speed network can meet the rigorous requirement (microsecond level) of the small-batch high-frequency data transmission of the in-cavity field layer module on the time accuracy of a special process and the device; the data transmission process also utilizes the high transmission bandwidth of the EtherNET traditional network, and the communication efficiency of the whole transmission process is improved; compared with the existing deposition equipment control system, the system has the obvious advantage of data transmission efficiency, and the technical development requirements of semiconductors on deposition equipment are better met;
(3) When the cavity is accessed into the deposition equipment control system based on the EtherCAT, the specific configuration of the accessed cavity can be quickly identified through the ID coding sequence of the field layer module in each cavity, and online configuration access is performed, so that the possibility of errors in the process of manually configuring equipment is avoided while manual offline configuration equipment is not needed;
(4) Compared with the in-cavity field layer modules such as a vacuum gauge, a mass flow meter, a controller and a driver, wherein an upper computer directly controls access to a cavity through an EtherNET switch in the prior art, the deposition equipment control system scheme based on the industrial Ethernet (EtherCAT) forms a star-shaped convenient dismounting network with the cavity control subsystem and the remote power distribution cabinet through the EtherCAT switch through a master control PLC, further realizes hot plug connection of each subsystem and each module in the subsystem on the basis of realizing self-independent and efficient control of each cavity control subsystem, and has higher data transmission reliability and hot plug connection flexibility.
In summary, the control system of the present invention uses advanced industrial ethernet (EtherCAT) as the intra-cavity field layer network to realize the fast transmission of data; the Hot plug of each cavity control subsystem and each internal component module on the network can be realized by adopting an EtherCAT high-speed network with a star topology structure, using a Hot Connect technology and a packet switching technology and utilizing an automatic link detection function of the EtherCAT high-speed network; by introducing the EtherCAT high-speed network, the online combined configuration of each cavity on the semiconductor equipment is realized, the limitation that the traditional control framework cannot be used for online combination of the cavities is broken through, and the convenience of equipment production is improved. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial utilization value.
The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (8)
1. A deposition equipment control system based on industrial Ethernet is characterized by comprising an upper computer, a terminal, a communication transmission link module and a cavity control system;
the terminal comprises a first switch and terminal equipment; based on the traditional Ethernet, the upper computer is in communication link with the terminal equipment through the first switch;
one end of the communication transmission link module is connected with the first switch, and the other end of the communication transmission link module is connected with the cavity control system; realizing communication link between the terminal and the cavity control system based on industrial Ethernet;
the cavity control system is in communication link with the communication transmission link module through an industrial Ethernet; the cavity control system independently completes access in the cavity control system based on the industrial Ethernet;
the cavity control system comprises a plurality of cavity control subsystems, and each cavity control subsystem comprises a sub-control PLC and an in-cavity field layer module; the sub-control PLC is configured with a safety unit, and realizes the safety interlocking logic of the in-cavity field layer module based on the industrial Ethernet; and the sub-control PLC is used for carrying out process treatment on the wafer transmitted to the in-cavity field layer module.
2. The industrial ethernet-based deposition apparatus control system of claim 1, wherein the terminal apparatus comprises an apparatus front end module and a wafer transfer robot; the equipment front end module is used for loading wafers and is matched with the wafer transmission manipulator to transmit the wafers to the equipment machine.
3. The industrial ethernet-based deposition apparatus control system according to claim 1, wherein the upper computer comprises a master control industrial personal computer and an operation industrial personal computer, and the upper computer realizes control and data acquisition of the apparatus front-end module, the wafer transmission robot and the master control PLC.
4. The industrial ethernet-based deposition apparatus control system of claim 1, wherein the communications transmission link module comprises a master PLC and a second switch; the master control PLC is in communication link with the second switch based on industrial Ethernet; the master control PLC is configured with a safety unit for implementing safety interlock logic of the deposition apparatus.
5. The industrial ethernet-based deposition apparatus control system of claim 1, further comprising a remote power distribution cabinet in communication with the first switch via the communication transmission link module.
6. The industrial ethernet-based deposition apparatus control system of claim 5, wherein the communication link module establishes a communication link with the first switch based on conventional ethernet, and the communication link module establishes a communication link with the remote power distribution cabinet and the chamber control system based on industrial ethernet.
7. The industrial ethernet-based deposition apparatus control system of claim 1, wherein the chamber control system comprises a pre-clean chamber subsystem, a pre-evacuation chamber subsystem, a moisture removal chamber subsystem, a transport chamber subsystem, and a main body process chamber subsystem.
8. The industrial ethernet-based deposition apparatus control system according to claim 4 or 1, wherein the safety unit comprises a safety CPU, a safety input subunit and a safety output subunit;
the safety input subunit is responsible for monitoring a safety state signal;
the safety output subunit generates permission conditions for equipment operation;
the safety CPU determines the output of the safety unit according to the monitored safety state signal.
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| CN202211081968.2A CN115174637B (en) | 2022-09-06 | 2022-09-06 | Deposition equipment control system based on industrial Ethernet |
| PCT/CN2023/102154 WO2024051276A1 (en) | 2022-09-06 | 2023-06-25 | Deposition device control system based on industrial ethernet |
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| CN202211081968.2A CN115174637B (en) | 2022-09-06 | 2022-09-06 | Deposition equipment control system based on industrial Ethernet |
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| CN111262796A (en) * | 2019-12-31 | 2020-06-09 | 南昌大学 | Ethernet communication system and method based on time sensitivity |
| CN111427319A (en) * | 2020-04-02 | 2020-07-17 | 蚌埠凯盛工程技术有限公司 | Intelligent MCC centralized control system of glass factory and control method thereof |
| TW202041106A (en) * | 2019-01-31 | 2020-11-01 | 美商鷹港科技股份有限公司 | Precise plasma control system and method thereof |
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| CN106181007A (en) * | 2016-08-26 | 2016-12-07 | 天津七所高科技有限公司 | A kind of spot-welded standard parameter automatic switchover system |
| JP7444787B2 (en) * | 2018-05-07 | 2024-03-06 | ラム リサーチ コーポレーション | Configurable distributed interlock system |
| KR102180626B1 (en) * | 2019-03-18 | 2020-11-18 | 유근재 | Method and apparatus for detecting fault of FOUP control board in semiconductor stoker system using EtherCAT, and FOUP control board using it |
| US11545346B2 (en) * | 2020-03-06 | 2023-01-03 | Applied Materials, Inc. | Capacitive sensing data integration for plasma chamber condition monitoring |
| CN114135526A (en) * | 2021-11-25 | 2022-03-04 | 上海勃傲自动化系统有限公司 | 5G industrial Ethernet bus vacuum generator |
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| TW202041106A (en) * | 2019-01-31 | 2020-11-01 | 美商鷹港科技股份有限公司 | Precise plasma control system and method thereof |
| CN111262796A (en) * | 2019-12-31 | 2020-06-09 | 南昌大学 | Ethernet communication system and method based on time sensitivity |
| CN111427319A (en) * | 2020-04-02 | 2020-07-17 | 蚌埠凯盛工程技术有限公司 | Intelligent MCC centralized control system of glass factory and control method thereof |
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