CN115142113B - Electrolytic polishing solution additive for nickel-based alloy, polishing solution and polishing method - Google Patents
Electrolytic polishing solution additive for nickel-based alloy, polishing solution and polishing method Download PDFInfo
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- CN115142113B CN115142113B CN202210946393.XA CN202210946393A CN115142113B CN 115142113 B CN115142113 B CN 115142113B CN 202210946393 A CN202210946393 A CN 202210946393A CN 115142113 B CN115142113 B CN 115142113B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
Abstract
An electrochemical polishing solution additive, polishing solution and polishing method for nickel-based alloys belong to the field of electrochemical polishing, and the specific scheme is as follows: an electrolytic polishing solution additive for nickel-based alloys, comprising basic red 12, basic red 2 or basic red 5. An electrolytic polishing solution for nickel-based alloys comprises the electrolytic polishing solution additive. A method of surface polishing a nickel-based alloy, comprising the steps of: preprocessing the surface of a nickel-based alloy workpiece; placing the pretreated nickel-based alloy workpiece into electrolytic polishing solution, wherein the nickel-based alloy workpiece is used as an anode connected with the positive electrode of a power supply, the titanium mesh is used as a cathode connected with the negative electrode of the power supply, and performing electrochemical polishing treatment on the surface of the nickel-based alloy workpiece; and cleaning the polished workpiece, and then drying the workpiece by cold air. The polishing solution has the advantages of high efficiency and low cost, and the treated workpiece can achieve the effect of a mirror surface and improve the corrosion resistance of the alloy.
Description
Technical Field
The invention relates to the field of electrochemical polishing, in particular to an electrochemical polishing solution additive, polishing solution and polishing method for nickel-based alloys.
Background
The nickel-based alloy is prepared by adding other elements based on nickel, has good mechanical property, corrosion resistance and high temperature property, and is widely applied to the fields of pressure vessels, energy development, chemical industry, nuclear industry, petroleum engineering, aerospace and the like.
Smooth and flat surfaces are required to improve the fatigue strength of mechanical parts, but parts made of nickel-based alloys have high hardness and strength and have great difficulty in precision machining. In order to complete the surface of the processed part and meet the requirements of surface roughness and size of the process, the polishing process of the workpiece is particularly important. With the development of metal processing technology, the polishing process is greatly promoted. Traditional mechanical polishing is a polishing technology widely applied, and utilizes a flexible polishing tool and abrasive particles to carry out finishing processing on the surface of a workpiece. But the surface after the mechanical polishing treatment is easily deformed by stress and scratch and residual stress layer are inevitably introduced. In addition, mechanical polishing has certain requirements on the shape of the workpiece and causes defects such as damage to the metal lattice structure. Another polishing method used in industry is chemical polishing, which is a method for eliminating abrasion marks and leveling etching by using chemical agents to perform chemical etching on a workpiece and selectively dissolving uneven areas on the surface of a sample. Although the chemical polishing is not limited by the surface shape of the part, pitting phenomenon is easy to occur after the chemical polishing treatment, and higher polishing precision is difficult to achieve. Furthermore, the combined chemical mechanical polishing method is considered as the best process for meeting the requirements of surface quality and smoothness, but introduces interference of rigid cutters in the polishing process, and is difficult to meet the polishing requirements of metal parts with small and complex characteristics. Electrochemical polishing is a finishing process based on anodic dissolution. Because it has the advantages of high efficiency, capability of processing materials with complex shapes, no tool wear, small stress, etc., it is widely used for polishing metals.
Disclosure of Invention
Based on the problems encountered in the polishing process of the nickel-based alloy, the invention provides an electrochemical polishing solution additive, a polishing solution and a polishing method for the nickel-based alloy. The polishing solution has the advantages of high efficiency and low cost, and the treated workpiece can achieve the effect of a mirror surface and improve the corrosion resistance of the alloy.
The invention adopts the following technical scheme:
an electrolytic polishing solution additive for nickel-based alloys, comprising basic red 12, basic red 2 or basic red 5.
An electrolytic polishing solution for nickel-based alloys comprises the electrolytic polishing solution additive, wherein the concentration of the additive is 0.5-1 g/L.
A method of surface polishing a nickel-based alloy, comprising the steps of:
firstly, preprocessing the surface of a nickel-based alloy workpiece;
step two, placing the pretreated nickel-based alloy workpiece into the electrolytic polishing solution, wherein the nickel-based alloy workpiece is used as an anode to be connected with the positive electrode of the direct-current voltage-stabilizing power supply, the titanium mesh is used as a cathode to be connected with the negative electrode of the direct-current voltage-stabilizing power supply, and electrolytic polishing treatment is carried out on the surface of the nickel-based alloy workpiece;
and step three, cleaning the polished workpiece, and carrying out cold air drying treatment on the workpiece.
Compared with the prior art, the invention has the beneficial effects that:
compared with mechanical polishing, the invention can treat workpieces with complex shape and structure by electrolytic polishing; no cutting forces are caused and no scratches and residual stress layers are introduced on the workpiece. Compared with chemical polishing, the electrochemical polishing reduces the occurrence probability of pitting corrosion and can achieve higher polishing precision.
The invention obtains the mirror surface workpiece with the roughness Ra less than 30nm by an electrochemical polishing method. The electrolytic polishing solution is phosphoric acid and sulfuric acid, has the advantages of simple formula, low cost, small loss, high stability and the like, and is suitable for processing complex parts. And tests prove that the leveling capacity of the polishing solution can be effectively improved by adding the nitrogenous heterocyclic organic dye (alkaline red 12, alkaline red 2 or alkaline red 5), and the surface roughness and the corrosion resistance of the polishing solution are obviously improved by adding the additive.
Drawings
FIG. 1 is a field emission scanning electron microscope SEM (a) and an optical microscope (b) of an unpolished nickel-base alloy workpiece;
FIG. 2 shows that the current density is 0.5A/cm at 80℃without additives 2 SEM image (a) and optical microscope image (b) of 270s polished nickel-base alloy workpiece;
FIG. 3 shows that the current density is 0.5A/cm at 80℃with additive basic red 20.5g/L 2 SEM image (a) and optical microscope image (b) of 270s polished nickel-base alloy workpiece;
FIG. 4 shows that the current density at 80℃of 50.5g/L of additive basic red was 0.5A/cm 2 SEM image (a) and optical microscope image (b) of 270s polished nickel-base alloy workpiece.
FIG. 5 shows anodic polarization curve (a) at 1mol/L H for various examples 2 SO 4 The electrochemical impedance test plot (b) below;
FIG. 6 is a graph comparing roughness of nickel-base alloy workpieces prior to polishing, after polishing without additives, and after polishing with additives;
FIG. 7 is a chemical structural formula of basic Red 2;
FIG. 8 is a chemical formula of basic Red 5;
fig. 9 shows the chemical structural formula of basic red 12.
Detailed Description
The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the invention, but not all embodiments, and all other embodiments obtained by those skilled in the art without making creative efforts based on the embodiments of the present invention are all within the protection scope of the present invention.
Detailed description of the preferred embodiments
An electrolytic polishing solution additive for nickel-based alloys comprises basic red 12 (2- [3- (1, 3-dihydro-1, 3-trimethyl-2H-indol-2-ylidene) -1-propenyl ] -1, 3-trimethyl-3H-indolium chloride salt), basic red 2 (3, 7-diamino-2, 8-dimethyl-5-phenylphenol oxazin-yl chloride) or basic red 5 (2-methyl-3-amino-6-dimethylamino-diaza-anthracene hydrochloride salt) with a nitrogen-containing heterocyclic organic dye. The dipole moment of the three additives is larger, so that the adsorption to the metal surface can be enhanced, the HOMO energy level of electrons is reduced, the reaction barrier of the metal is reduced, and the dissolution of the metal is promoted.
Detailed description of the preferred embodiments
An electrolytic polishing solution for nickel-based alloys, comprising the electrolytic polishing solution additive according to the first embodiment, wherein the concentration of the additive is 0.5-1 g/L.
Further, the electrolytic polishing solution also comprises 85% of phosphoric acid, 98% of sulfuric acid and deionized water, wherein the 85% of phosphoric acid accounts for 50-70% of the electrolytic polishing solution by weight, the 98% of sulfuric acid accounts for 10-20% of the electrolytic polishing solution by weight, and the balance is deionized water.
Sulfuric acid is an inorganic strong acid, and plays a role of an oxidant in the electrolytic polishing solution, and simultaneously improves the conductivity of the polishing solution. Phosphoric acid is ternary medium strong acid, has great viscosity, is favorable for forming a stable mucous membrane layer between the surface of the nickel-based alloy and electrolyte, can play a role in dissolving and forming a phosphate protective film on the surface of a workpiece in the polishing process, and has a vital role in leveling and brightness of electrochemical polishing.
Detailed description of the preferred embodiments
A method of surface polishing a nickel-based alloy, comprising the steps of:
firstly, preprocessing the surface of a nickel-based alloy workpiece to remove an oil layer, an oxide layer and surface impurities;
step two, placing the pretreated nickel-based alloy workpiece into the electrolytic polishing solution in the step two, wherein the nickel-based alloy workpiece is used as an anode to be connected with a positive electrode (a current output end) of a direct-current voltage-stabilizing power supply, a titanium mesh is used as a cathode to be connected with a negative electrode (a current input end) of the direct-current voltage-stabilizing power supply, and the current density applied between the cathode and the anode is 0.4-0.65A/cm 2 Carrying out electrolytic polishing treatment on the surface of the nickel-based alloy workpiece; the distance between the cathode and the anode is controlled to be 30-50 mm, the polishing temperature is controlled to be 60-90 ℃ in a water bath constant temperature mode, and the polishing time is controlled to be 3-5min; the electrolyte is stirred in the polishing process, and the rotating speed is 30-50r/min.
And thirdly, cleaning the polished workpiece by ultrapure water, and drying the workpiece by cold air by a blower.
Further, in the first step, the method for removing the oil layer is that the nickel-based alloy workpiece is put into oil removing liquid for ultrasonic cleaning for 3 to 10 minutes and then is washed by ultrapure water, and the oil removing liquid comprises 60 to 80g/L of sodium hydroxide, 20 to 60g/L of sodium carbonate, 15 to 30g/L of trisodium phosphate dodecahydrate and 5 to 10g/L of sodium silicate; the method for removing the oxide layer comprises the following steps: mechanically polishing the surface of the deoiled nickel-base alloy workpiece by using 600# water sand paper; the method for removing the surface impurities comprises the following steps: and respectively carrying out ultrasonic treatment on the nickel-base alloy workpiece after removing the oxide layer in ultrapure water and absolute ethyl alcohol for 5-10 minutes, and drying by using cold air of a blower after each ultrasonic treatment.
Furthermore, the nickel-based alloy is Inconel 718, the main components are nickel, chromium and iron elements, and the nickel-based alloy is prepared by a laser melting method.
Example 1
The invention provides an electrolytic polishing method of nickel-based alloy, which takes electrolytic polishing of Inconel 718 alloy as an example and comprises the following steps:
(1) The pretreatment process comprises the following steps: the composition of the oil removal liquid is as follows: 70g/L of sodium hydroxide, 40g/L of sodium carbonate, 20g/L of trisodium phosphate dodecahydrate and 8g/L of sodium silicate, and the workpiece is placed into a degreasing liquid for ultrasonic cleaning for 3 minutes and then rinsed with ultrapure water.
(2) And mechanically polishing the workpiece by using 600# water sand paper for 3min until no obvious bulge exists on the surface of the workpiece.
(3) And (3) placing the polished workpiece into ultrapure water for ultrasonic cleaning for 10 minutes, and taking out cold air for drying after cleaning. And then placing the workpiece into absolute ethyl alcohol for ultrasonic cleaning for 10 minutes, and drying the workpiece with cold air after the ultrasonic cleaning is completed.
(4) Preparation of polishing solution: and 20mL of ultrapure water is measured and placed in the electrolytic tank, 65mL of phosphoric acid solution with the mass fraction of 85% is continuously measured and placed in the electrolytic tank, the phosphoric acid solution forms metal phosphate with metal in the reaction process, and a layer of mucous membrane is formed on the surface of a workpiece, so that the effects of corrosion inhibition and buffering are achieved. And then continuously measuring 15mL of sulfuric acid solution with the mass fraction of 98%, pouring the sulfuric acid solution into an electrolytic cell, and finally, placing the electrolytic cell solution into a magnetic stirrer for stirring for 5min, thereby finishing the preparation of the polishing solution.
(5) And placing the processed Inconel 718 alloy workpiece into an electrolytic tank containing polishing solution, selecting a direct-current stabilized power supply, connecting the Inconel 718 alloy workpiece with the anode, connecting the titanium net with the cathode of the power supply, and fixing the titanium net with an insulating clamp respectively.
(6) The electrolytic cell limits the distance between the two electrodes to 50mm, and the current density is 0.5A/cm 2 。
(7) The temperature of the polishing solution is controlled to be 90 ℃ in a water bath constant temperature mode, the electrolyte is stirred in the polishing process, the rotating speed is 30r/min, and the Inconel 718 alloy workpiece is polished for 4.5 min.
(8) And (3) polishing post-treatment: the polished workpiece was rinsed with ultrapure water and dried with a cold air using a blower.
An SEM and optical microscope image of the unpolished workpiece is shown in fig. 1, and an SEM and optical microscope image of the polished workpiece surface is shown in fig. 3.
Example 2
The difference between this embodiment and embodiment 1 is that: to the polishing liquid, 0.5g/L of basic red 2 was added, and the other was the same as in example 1.
SEM and optical microscopy images of the surface of the polished workpiece are shown in fig. 3.
Example 3
The difference between this embodiment and embodiment 1 is that: to the polishing liquid, 0.5g/L of basic red 5 was added, and the other was the same as in example 1.
SEM and optical microscopy images of the surface of the polished workpiece are shown in fig. 4.
The anode polarization curve test is carried out on the Inconel 718 alloy workpieces polished in the examples 1, 2 and 3 in polishing solution, and test results show that basic red 2 and basic red 5 have promotion effect on polishing, and the plateau area current of the basic red 2 is larger than that of the basic red 5, which indicates that the promotion effect of the basic red 2 is stronger than that of the basic red 5. In addition, electrochemical Impedance (EIS) tests were performed in a 1mol/L sulfuric acid solution, and the results are shown in FIG. 5. As can be seen, addAfter basic Red 2, the nickel-based alloy workpiece reacted in sulfuric acid solution to a charge transfer resistance (R ct ) Increase, and after adding basic red 5, R ct The value increases further. The addition of the alkaline red 2 and the alkaline red 5 can obviously improve the polishing effect of the electrochemical polishing solution on the nickel-based alloy, greatly enhance the corrosion resistance of the nickel-based alloy workpiece, and has more obvious improvement effect by the alkaline red 5.
The polished Inconel 718 alloy is respectively washed by absolute ethyl alcohol and deionized water, and after drying, the surface roughness is measured by using a white light interferometer, and as can be seen from fig. 6, the roughness after electrochemical polishing is sharply reduced from 112.32nm to 49.84nm, and the surface roughness of the workpiece polished by adding the additive is 27.18nm, so that the mirror effect can be achieved.
Furthermore, it should be understood that although the present disclosure describes embodiments, not every embodiment is provided with a separate embodiment, and that this description is provided for clarity only, and that the disclosure is not limited to the embodiments described in detail below, and that the embodiments described in the examples may be combined as appropriate to form other embodiments that will be apparent to those skilled in the art.
Claims (8)
1. An electrolytic polishing solution for nickel-based alloys, which is characterized in that: comprises an electrolytic polishing solution additive, wherein the electrolytic polishing solution additive comprises alkaline red 12, alkaline red 2 or alkaline red 5; the concentration of the electrolyte polishing solution additive is 0.5-1 g/L, the electrolyte polishing solution further comprises 85% of phosphoric acid, 98% of sulfuric acid and deionized water, the 85% of phosphoric acid accounts for 50-70% of the electrolyte polishing solution, the 98% of sulfuric acid accounts for 10-20% of the electrolyte polishing solution, and the balance is deionized water.
2. A method for polishing a surface of a nickel-based alloy, comprising the steps of:
firstly, preprocessing the surface of a nickel-based alloy workpiece;
step two, placing the pretreated nickel-based alloy workpiece into the electrolytic polishing solution according to claim 1, wherein the nickel-based alloy workpiece is used as an anode to be connected with the positive electrode of the direct-current voltage-stabilizing power supply, the titanium mesh is used as a cathode to be connected with the negative electrode of the direct-current voltage-stabilizing power supply, and performing electrolytic polishing treatment on the surface of the nickel-based alloy workpiece;
and step three, cleaning the polished workpiece, and carrying out cold air drying treatment on the workpiece.
3. The polishing method according to claim 2, characterized in that: in the second step, the distance between the cathode and the anode is controlled to be 30-50 mm, the polishing temperature is 60-90 ℃, and the polishing time is 3-5 min.
4. The polishing method according to claim 2, characterized in that: in the second step, the current density applied between the cathode and the anode is 0.4-0.65A/cm 2 。
5. The polishing method according to claim 2, characterized in that: in the second step, the electrolyte is stirred in the polishing process, and the rotating speed is 30-50r/min.
6. The polishing method according to claim 2, characterized in that: in a first step, the preprocessing includes: removing oil layer, oxidation layer and surface impurity.
7. The polishing method as recited in claim 6, wherein: the method for removing the oil layer comprises the steps of placing a nickel-based alloy workpiece into oil removing liquid, ultrasonically cleaning for 3-10 min, and then flushing with ultrapure water, wherein the oil removing liquid comprises 60-80 g/L of sodium hydroxide, 20-60 g/L of sodium carbonate, 15-30 g/L of trisodium phosphate dodecahydrate and 5-10 g/L of sodium silicate; the method for removing the oxide layer comprises the following steps: mechanically polishing the surface of the deoiled nickel-base alloy workpiece by using abrasive paper; the method for removing the surface impurities comprises the following steps: and respectively carrying out ultrasonic treatment on the nickel-base alloy workpiece after removing the oxide layer in ultrapure water and absolute ethyl alcohol for 5-10 minutes, and carrying out cold air drying treatment after each ultrasonic treatment.
8. The polishing method according to claim 2, characterized in that: the nickel-based alloy is Inconel 718.
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6544321B1 (en) * | 2001-11-07 | 2003-04-08 | Xerox Corporation | Nanoscopic pigments |
| CN102051665A (en) * | 2011-01-04 | 2011-05-11 | 安徽工业大学 | Polishing solution for electrochemical mechanical polishing of hard disk NiP |
| CN102778812A (en) * | 2011-05-11 | 2012-11-14 | Jsr株式会社 | Coloring composition, colour filter and dispaly element |
| JP2013028821A (en) * | 2010-11-18 | 2013-02-07 | Chiracol Co Ltd | Electrolytic copper plating bath for semiconductor and electrolytic copper plating method |
| CN106757299A (en) * | 2016-12-15 | 2017-05-31 | 上海电气核电设备有限公司 | The electrobrightening corrosive agent and its application method of a kind of nickel-base alloy metallographic structure |
| CN111295468A (en) * | 2017-11-09 | 2020-06-16 | 安美特德国有限公司 | Electroplating composition for electrolytic copper deposition, use thereof and method for electrolytic deposition of a copper or copper alloy layer on at least one surface of a substrate |
| CN113832533A (en) * | 2021-11-03 | 2021-12-24 | 江阴佩尔科技有限公司 | Nickel-titanium alloy material electrochemical polishing solution and preparation method thereof |
| CN114808094A (en) * | 2022-04-19 | 2022-07-29 | 中国刑事警察学院 | Method and electrolyte for displaying damaged steel frame number |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2609905A1 (en) * | 2011-12-29 | 2013-07-03 | KPSS-Kao Professional Salon Services GmbH | Hair dyeing composition |
| US20200147214A1 (en) * | 2017-07-19 | 2020-05-14 | Klox Technologies Inc. | Tissue filler compositions for photo-biomodulation and methods for achieving same |
-
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- 2022-08-08 CN CN202210946393.XA patent/CN115142113B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6544321B1 (en) * | 2001-11-07 | 2003-04-08 | Xerox Corporation | Nanoscopic pigments |
| JP2013028821A (en) * | 2010-11-18 | 2013-02-07 | Chiracol Co Ltd | Electrolytic copper plating bath for semiconductor and electrolytic copper plating method |
| CN102051665A (en) * | 2011-01-04 | 2011-05-11 | 安徽工业大学 | Polishing solution for electrochemical mechanical polishing of hard disk NiP |
| CN102778812A (en) * | 2011-05-11 | 2012-11-14 | Jsr株式会社 | Coloring composition, colour filter and dispaly element |
| CN106757299A (en) * | 2016-12-15 | 2017-05-31 | 上海电气核电设备有限公司 | The electrobrightening corrosive agent and its application method of a kind of nickel-base alloy metallographic structure |
| CN111295468A (en) * | 2017-11-09 | 2020-06-16 | 安美特德国有限公司 | Electroplating composition for electrolytic copper deposition, use thereof and method for electrolytic deposition of a copper or copper alloy layer on at least one surface of a substrate |
| CN113832533A (en) * | 2021-11-03 | 2021-12-24 | 江阴佩尔科技有限公司 | Nickel-titanium alloy material electrochemical polishing solution and preparation method thereof |
| CN114808094A (en) * | 2022-04-19 | 2022-07-29 | 中国刑事警察学院 | Method and electrolyte for displaying damaged steel frame number |
Non-Patent Citations (1)
| Title |
|---|
| 化学工业出版社组织编写.中国化工产品大全.化学工业出版社,2005,(第3版),451. * |
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