CN115113313A - Method for modifying groove shape of blazed grating by ion beam etching - Google Patents
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- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 101
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- G—PHYSICS
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- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
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Abstract
The invention provides a method for modifying a groove shape of a blazed grating by ion beam etching, which comprises the following steps: (1) manufacturing a relief blazed grating on the surface of quartz by a holographic-ion beam etching method; (2) determining the influence of the anti-blaze angle of the transmission type or reflection type blazed grating on the diffraction efficiency by a strict coupled wave analysis method, and finding out the optimal interval of the anti-blaze angle; (3) and determining the change direction of the anti-blaze angle according to the difference between the anti-blaze angle of the manufactured blazed grating and the optimal interval, and modifying the anti-blaze angle by utilizing ion beam etching. The invention adopts the ion beam etching mode to change the anti-blaze angle of the blazed grating, thereby expanding the effective working area of the blazed surface and increasing the diffraction efficiency.
Description
Technical Field
The invention belongs to the field of diffractive optical element preparation, and particularly relates to a method for modifying a groove shape of a blazed grating by ion beam etching, so that the diffraction efficiency of the blazed grating is improved.
Background
Blazed grating as a typeThe essential diffractive optical element is widely applied to the fields of substance analysis, resource detection, astronomical observation and the like. The groove shape is usually sawtooth-shaped, the diffracted light energy is moved from zero-order main maximum to required order through an asymmetric groove-shaped structure to form a blaze effect, and the angle between the long edge and the substrate is generally defined as a blaze angle theta b (blazing angle), the angle between the short side and the substrate being defined as the anti-flare angle θ a (anti-blazing angle)。
The mainstream means for manufacturing blazed gratings include a mechanical scribing method and a holographic-ion beam etching method. The mechanical scribing method is a process of forming a grating groove by extruding and polishing a substrate plated with a metal film through a diamond scribing knife, the blaze angle of the grating groove is controlled by adjusting the bevel angle of a diamond cutting edge, the anti-blaze angle is the angle formed after the metal film is extruded, and the mechanical scribing method is long in time consumption and is not suitable for manufacturing high linear density blazed gratings; the holographic-ion beam etching method can overcome the difficulties, a photoresist grating mask is manufactured through holographic interference photoetching, then the groove shape is transferred to a substrate through ion beam etching to form a blazed grating, the blazed grating is subdivided into an ion beam inclined etching photoresist grating mask and an ion beam inclined etching homogeneous mask according to the difference of masks to be etched, and the blazed grating manufactured through the process has the characteristics of no ghost line and low stray light level.
The size of the blaze angle in the holographic-ion beam etching method is comprehensively determined by the ion beam incident angle and the etching rate ratio of the mask layer and the substrate layer under the angle, and the same is true of the anti-blaze angle. Therefore, it is very difficult to independently control the magnitude of the anti-blaze angle. Wherein, the blaze angle mainly determines the position of the blaze wavelength in the diffraction efficiency curve; the anti-blaze angle mainly determines the length of the long side (blaze surface) in the sawtooth groove shape, thereby directly influencing the diffraction efficiency level of the blazed grating.
Therefore, the invention provides a method for improving the diffraction efficiency of the blazed grating by modifying the size of the anti-blazed angle through ion beam etching, which has the advantages of low process cost, simple and effective manufacturing method, high controllability and great significance for manufacturing the blazed grating with high diffraction efficiency.
Disclosure of Invention
The invention provides a method for modifying a groove shape of a blazed grating by ion beam etching, aiming at solving the problem that the anti-blazed angle is not easy to control in the manufacturing of the blazed grating.
In order to achieve the purpose, the invention adopts the technical scheme that:
a method for modifying a blazed grating groove by ion beam etching comprises the following steps:
(1) manufacturing a blazed grating on a quartz substrate by utilizing a holographic-ion beam etching method;
(2) determining the influence of the anti-blaze angle of the transmission type or reflection type blazed grating on the diffraction efficiency by a strict coupled wave analysis method, and finding out the optimal interval of the anti-blaze angle;
(3) the incident direction of the ion beam is determined according to the relation between the ion beam etching rate and the incident angle, so that the anti-blaze angle is modified, and the diffraction efficiency is improved.
Further, the step (1) comprises the steps of:
a. coating photoresist on the quartz substrate by using a high-speed spin coating method;
b. utilizing holographic interference photoetching to manufacture a photoresist grating with the period d;
c. selecting a photoresist grating or an ion beam vertical etching to transfer a pattern to a homogeneous grating formed on the quartz substrate as a mask;
d. c, obliquely etching the mask in the step c by using an ion beam, and enabling different parts of the groove bottom to be subjected to different ion beam bombardment fluxes by using the shielding effect of the mask on the ion beam so as to form a blazed surface;
e. when the width and the height of the mask are simultaneously contracted into a point, a sawtooth groove-shaped blazed grating is formed, in actual etching, the anti-blazed surface can present a certain radian due to bombardment of divergent ion beams and the action of secondary sputtering, and at the moment, the anti-blazed angle can be represented by an included angle between a connecting line of the top end A and the bottom end B of an arc line and the quartz substrate.
Further, the optimal interval of the anti-blaze angle of the step (2) comprises:
anti-blaze angle theta of transmission type blazed grating a Close to 90 °;
anti-blaze angle theta of reflective blazed grating a ∈[90°，180°-θ b )；
Wherein, theta b Is the blaze angle.
Further, the anti-blaze angle is close to 90 °.
Further, the ion beam of step (3) may be selected from CHF 3 Or Ar as the working gas.
Further, for a blazed grating of a quartz substrate, the working gas is CHF 3 The ion beam is mainly etched in a mode of combining physical sputtering and chemical reaction, and the etching rate of the ion beam is reduced along with the increase of the incident angle of the ion beam; the ion beam with Ar as working gas adopts pure physical sputtering etching, the etching rate of the ion beam tends to increase and then decrease along with the increase of the incident angle of the ion beam, and the etching rate reaches the maximum near 45 degrees.
Further, the anti-blaze angle modification in the step (3) comprises the following steps:
(1) increasing the blaze angle: when the working gas is CHF 3 When the ion beam is irradiated, the incident direction of the ion beam is vertical to the tangential direction of the bottom end B of the anti-blazed surface with radian; when the working gas is Ar, an included angle of about 45 degrees is kept between the incident direction of the ion beam and the tangential direction of the bottom end B of the anti-blaze surface with radian, so that the etching rate of the bottom end B is higher than that of the top end A of the anti-blaze surface;
(2) reduction of the anti-blaze angle: when the anti-blazed angle of the transmission blazed grating is an obtuse angle, the diffraction efficiency can be improved by decreasing the value. Firstly, coating a sacrificial layer on the groove shape of the existing blazed grating, wherein the sacrificial layer can be made of polymer materials such as photoresist and the like; reducing the thickness of the sacrificial layer to expose the groove-shaped top by ashing and the like; then, a working gas with a high etching selectivity (substrate etching rate: sacrificial layer etching rate) is selected for ion beam vertical etching, for example, CHF is passed here 3 Vertically etching a blazed grating with a photoresist sacrificial layer on a quartz substrate by using an ion beam as working gas; slot top A quilt without sacrificial layer protectionAnd the fast bombardment is carried out, the blazed surface and the bottom end B are not etched by the ion beam due to the existence of the sacrificial layer, and finally the anti-blazed angle is modified by the ion beam.
Has the advantages that:
(1) the invention adds an ion beam modification method in the existing blazed grating manufacturing process, and solves the problem that the anti-blazed angle is uncontrollable.
(2) The ion beam modification method is simple and reliable, has low cost, can further improve the diffraction efficiency of the grating, and has important significance for manufacturing blazed gratings with high diffraction efficiency.
(3) The method for modifying the anti-blaze angle by ion beam etching is carried out on the premise of not sacrificing the blaze angle, so that the blaze wavelength position of the diffraction efficiency curve is not changed.
Drawings
FIG. 1 is a schematic view of a geometric model of a single period of a blazed grating;
FIG. 2 is a diagram showing a simulation result of diffraction efficiency under different radians of an anti-blaze surface; fig. 2(a) shows (please supplement) three kinds of anti-blaze surface conditions with different radians and straight states, and fig. 2(b) shows (please supplement) blazed grating diffraction efficiency conditions in four states obtained by strict coupled wave analysis;
FIG. 3 is a diagram showing an inverse blaze angle θ of a transmission type blazed grating a The change of diffraction efficiency at increasing time with a period d of 3003nm, θ b A blazed grating of 13.5 ° is taken as an example, in which fig. 3(a) shows a change in diffraction efficiency when the blaze angle is increased to the complementary angle of the blaze angle, and fig. 3(b) shows a change in diffraction efficiency when the blaze angle is increased from the complementary angle of the blaze angle to 90 ° to an obtuse angle;
FIG. 4 shows the change of diffraction efficiency of a blazed grating with a period of 3003nm and a blazed angle of 30 ° during the increase of the anti-blazed angle from the complementary angle of the blazed angle to an obtuse angle;
FIG. 5(a) is a schematic diagram of the blazed grating's anti-blaze angle increasing from the complement of the blazed angle to 90 °; FIG. 5(b) is a graph showing the relationship between the ratio of the blaze surface length increasing portion to the whole and the blaze angle in this process;
FIG. 6 shows the anti-blaze angle θ of a reflective blazed grating a The change of the diffraction efficiency when the diffraction efficiency is gradually increased takes the period 833nm and the blaze angle of 9 degrees as examples, the substrate is fused quartz, and an Al film is coated on the substrate; fig. 6(a) shows a change in diffraction efficiency when the blaze angle increases to the complementary angle of the blaze angle, and fig. 6(b) shows a change in diffraction efficiency when the blaze angle increases from the complementary angle of the blaze angle to 90 ° to an obtuse angle;
FIG. 7 shows two different working gases (CHF) 3 And Ar) is shown in the graph of ion beam etching rate;
FIG. 8 is a schematic diagram of ion beam etching to increase the anti-blaze angle and thus improve diffraction efficiency;
FIG. 9 is a schematic illustration of ion beam etching to reduce the anti-blaze angle and thereby improve diffraction efficiency;
FIG. 10 is a comparison graph of ion beam before and after etching slots obtained by atomic force test;
FIG. 11 shows diffraction efficiency measurements before and after ion beam etching to modify the anti-blaze angle.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the respective embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
The method for modifying the groove shape of the blazed grating by ion beam etching adopts the ion beam etching mode to change the anti-blazed angle of the blazed grating, thereby expanding the effective working area of the blazed surface and increasing the diffraction efficiency. A geometric model of a single period of a blazed grating as shown in FIG. 1, where the period is d and the blaze angle is θ b The anti-flare angle (theta) a . The method comprises the following steps:
(1) a blazed grating is manufactured on a quartz substrate by utilizing a holographic-ion beam etching method, and the method comprises the following steps:
a. coating photoresist on the quartz substrate by using a high-speed spin coating method;
b. utilizing holographic interference photoetching to manufacture a photoresist grating with the period d;
c. selecting the photoresist grating obtained in the step b or ion beam vertical etching to transfer the graph obtained in the step b to a homogeneous grating formed on the quartz substrate as a mask;
d. c, obliquely etching the mask in the step c by using an ion beam, and enabling different parts of the groove bottom to be subjected to different ion beam bombardment fluxes by using the shielding effect of the mask on the ion beam so as to form a blazed surface;
e. when the width and the height of the mask are simultaneously contracted into a point, a sawtooth groove-shaped blazed grating is formed, in actual etching, a certain radian can be presented by an anti-blazed surface due to bombardment of divergent ion beams and a secondary sputtering effect, at the moment, an anti-blazed angle can be represented by an included angle between a connecting line of a top end A and a bottom end B of an arc line and a quartz substrate, and the radian has little influence on the diffraction efficiency of the blazed grating, as shown in a simulation result of fig. 2 (B).
(2) Determining the change mode of the anti-blaze angle:
the magnitude of the anti-blaze angle affects the effective working area of the blazed surface, generally, the larger the effective working area, the higher the diffraction efficiency. Transmission and reflection blazed gratings were simulated using Rigorous Coupled Wave Analysis (RCWA). Fig. 3 is a graph showing the influence of the change of the counter-blaze angle on the diffraction efficiency in the transmission type blazed grating, in the blazed grating with the period of 3003nm and the blaze angle of 13.5 °, the level of the corresponding diffraction efficiency is gradually increased when the counter-blaze angle is increased from 40 ° to 76.5 ° (the complementary angle of the blaze angle), as shown in fig. 3 (a); when the blaze angle is increased to 90 degrees, the diffraction efficiency is not changed greatly, and when the blaze angle is increased to an obtuse angle from 90 degrees, the diffraction efficiency has a remarkable descending trend, as shown in fig. 3 (b); in order to further understand the influence of the change of the counter-blaze angle from the residual angle of the blaze angle to 90 degrees on the diffraction efficiency and simulate the situation of the blaze angle of 30 degrees, as shown in fig. 4, it is easy to know that the counter-blaze angle is increased in the interval, and the diffraction efficiency is improved to a certain extent but the amplitude is not obvious; as shown in fig. 5, when the blaze angle is small, the proportion of the blaze surface increase portion to the whole is small in the process of increasing the blaze angle from the complementary angle of the blaze angle to 90 °, and therefore the influence on the diffraction efficiency is not obvious enough.
Anti-blaze angle theta of reflective blazed grating a ∈[90°，180°-θ b ) When the groove-shaped structure is manufactured, the manufacturing difficulty of the groove-shaped structure is considered, and when the anti-blaze angle is close to 90 degrees, the diffraction efficiency is good. As shown in fig. 6, taking a blazed grating with a period 833nm and a blazed angle of 9 ° as an example, the base material is fused quartz, the surface of the blazed grating is coated with an Al film, the working order is + 1-order reflection, and the diffraction efficiency is gradually improved in the process of increasing the anti-blazed angle to the complementary angle of the blazed angle; when the complementary angle of the blaze angle is increased to 90 degrees, the diffraction efficiency is improved to a certain extent; when the diffraction efficiency increases to the obtuse angle, the diffraction efficiency increases only slightly and is considered to be unchanged.
(3) Determining an ion beam incident angle, and performing anti-blaze angle modification:
under two different working gases (CHF) as shown in FIG. 7 3 And Ar), wherein the abscissa represents the ion beam incidence angle, namely the included angle between the ion beam incidence direction and the normal direction of the surface to be etched, and the ordinate represents the relative etching rate and is characterized by the ratio of the etching depth under different inclination angles to the etching depth under the condition of vertical incidence. CHF 3 The ion beam mainly adopts a mode of combining physical sputtering and chemical reaction, and the etching rate of the ion beam shows a monotonous decreasing trend along with the increase of an incident angle; the Ar ion beam is mainly pure physical sputtering etching, the etching rate of the Ar ion beam shows a trend of increasing and then decreasing along with the increase of the incident angle, and the etching rate reaches the maximum near 45 degrees.
a. When the anti-blaze angle needs to be increased, the corresponding ion beam incident direction is selected according to the ion beam etching rate curve shown in fig. 7, such as the first or the second shown in fig. 8. I.e. when the working gas is CHF 3 When the ion beam is incident, the incident direction of the ion beam is vertical to the tangential direction of the bottom end B; when the working gas is Ar, an included angle of about 45 degrees is kept between the incident direction of the ion beam and the tangential direction of a point B, and the etching rate of a bottom end B is ensured to be higher than that of a top end A. The blaze surface is completely exposed in the bombardment of the ion beam, and is relatively straight, and the general blaze angle cannot be changed.
b. When the anti-blaze angle needs to be reduced, a method as shown in fig. 9 can be adopted, firstly, a sacrificial layer is coated on the groove shape of the existing blazed grating, and the sacrificial layer can be made of polymer materials such as photoresist; reducing the thickness of the sacrificial layer to expose the groove-shaped top by ashing and the like; then, the ion beam vertical etching is performed by using working gas with high etching selectivity (substrate etching rate: sacrificial layer etching rate), for example, CHF is passed here 3 Vertically etching a blazed grating with a photoresist sacrificial layer on a quartz substrate by using an ion beam as working gas; the groove top A without the protection of the sacrificial layer is quickly bombed, the blaze surface and the bottom B are not etched by the ion beam due to the existence of the sacrificial layer, and finally the anti-blaze angle is reduced by the ion beam etching.
The invention is further illustrated by reference to fig. 8 and examples.
Fig. 8 generally shows a case where the ion beam etching increases the anti-blaze angle by: CHF 3 Incident direction or ±: a. the r The incident direction is used as the incident direction of the ion beam to modify the anti-blaze surface, and the diffraction efficiency result is improved.
Specifically, in the method for modifying the groove shape of the blazed grating by ion beam etching according to the embodiment of the present invention, the ion beam etching is adopted to increase the anti-blazed angle of the blazed grating, so as to improve the diffraction efficiency, and the specific method and the implementation parameters are as follows:
(a) the photoresist was coated on a 60mm x 60mm quartz substrate.
(b) A photoresist grating mask with a period of 3003nm was obtained by holographic exposure development.
(c) The ion beam etching obtains a blazed grating with a blazed angle of 11.2 degrees, and the anti-blazed angle of the blazed grating is 55 degrees.
(d) The atomic force test is carried out on the groove shape of the blazed grating,the angle of the normal of the tangent near the bottom end B to the substrate normal is 30 deg., so CHF is selected 3 The incident angle of the ion beam as the working gas is set to be 30 degrees, so that the etching rate of the bottom end is accelerated, and the etching rate of the top end is slightly slower; the etched groove shape was measured by atomic force, and as shown in fig. 10, the anti-flare angle was greatly improved.
(e) By establishing a diffraction efficiency measuring light path, the peak diffraction efficiency can be increased by 4.9% and the average diffraction efficiency can be improved by 3% when the diffraction efficiency measuring light path is tested, as shown in fig. 11.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (7)
1. A method for modifying a groove shape of a blazed grating by ion beam etching is characterized by comprising the following steps:
(1) manufacturing a blazed grating on a quartz substrate by utilizing a holographic-ion beam etching method;
(2) determining the influence of the anti-blaze angle of the transmission type or reflection type blazed grating on the diffraction efficiency by a strict coupled wave analysis method, and finding out the optimal interval of the anti-blaze angle;
(3) the incident direction of the ion beam is determined according to the relation between the ion beam etching rate and the incident angle, so that the anti-blaze angle is modified, and the diffraction efficiency is improved.
2. The method of claim 1, wherein: the step (1) comprises the following steps:
a. coating photoresist on the quartz substrate by using a high-speed spin coating method;
b. utilizing holographic interference photoetching to manufacture a photoresist grating with the period d;
c. selecting a photoresist grating or an ion beam vertical etching to transfer a pattern to a homogeneous grating formed on the quartz substrate as a mask;
d. c, obliquely etching the mask in the step c by using an ion beam, and enabling different parts of the groove bottom to be subjected to different ion beam bombardment fluxes by using the shielding effect of the mask on the ion beam so as to form a blazed surface;
e. when the width and the height of the mask are simultaneously contracted into a point, a sawtooth groove-shaped blazed grating is formed, in actual etching, the anti-blazed surface presents a certain radian due to bombardment of divergent ion beams and the action of secondary sputtering, and at the moment, the anti-blazed angle is represented by an included angle between a connecting line of the top end A and the bottom end B of an arc line and the quartz substrate.
3. The method of claim 1, wherein: the optimal interval of the anti-blaze angle in the step (2) comprises:
anti-blaze angle theta of transmission type blazed grating a Close to 90 °;
anti-blaze angle theta of reflective blazed grating a ∈[90°，180°-θ b )；
Wherein, theta b Is the blaze angle.
4. The method of claim 3, wherein: the blazed grating has high diffraction efficiency when the anti-blazed angle is close to 90 degrees.
5. The method of claim 1, wherein: the ion beam selection CHF of the step (3) 3 Or Ar as the working gas.
6. The method of claim 5, wherein: for a blazed grating of a quartz substrate, the working gas is CHF 3 The ion beam is etched in a mode of combining physical sputtering and chemical reaction, and the etching rate of the ion beam is reduced along with the increase of the incident angle of the ion beam; the ion beam with Ar as working gas adopts pure physical sputtering etching, the etching rate of the ion beam tends to increase and then decrease along with the increase of the incident angle of the ion beam, and the etching rate reaches the maximum near 45 degrees.
7. The method of claim 6, wherein: the anti-blaze angle modification in the step (3) comprises the following steps:
(1) increasing the blaze angle: when the working gas is CHF 3 When the ion beam is irradiated, the incident direction of the ion beam is vertical to the tangential direction of the bottom end B of the anti-blazed surface with radian; when the working gas is Ar, an included angle of about 45 degrees is kept between the incident direction of the ion beam and the tangential direction of the bottom end B of the anti-blaze surface with radian, so that the etching rate of the bottom end B is higher than that of the top end A of the anti-blaze surface;
(2) reduction of the anti-blaze angle: when the anti-blaze angle of the transmission blazed grating is an obtuse angle, the diffraction efficiency is improved by reducing the value, firstly, a sacrificial layer is coated on the groove shape of the existing blazed grating, and the sacrificial layer is made of a polymer material; reducing the thickness of the sacrificial layer to expose the groove-shaped top in an ashing manner; then selecting working gas with high etching selectivity ratio to carry out ion beam vertical etching, namely, passing through CHF 3 Vertically etching a blazed grating with a photoresist sacrificial layer on a quartz substrate by using an ion beam as working gas; the groove top A without the protection of the sacrificial layer is quickly bombed, the blaze surface and the bottom B are not etched by the ion beam due to the existence of the sacrificial layer, and finally the anti-blaze angle is modified by the ion beam; the etching selection ratio is the ratio of the etching rate of the substrate to the etching rate of the sacrificial layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210780810.8A CN115113313B (en) | 2022-07-04 | 2022-07-04 | Method for modifying blazed grating groove shape by utilizing ion beam etching |
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| CN202210780810.8A CN115113313B (en) | 2022-07-04 | 2022-07-04 | Method for modifying blazed grating groove shape by utilizing ion beam etching |
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