CN115113128A - Electromagnetic field near-field probe calibration compensation method - Google Patents
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Abstract
The invention discloses a calibration compensation method of an electromagnetic field near-field probe, which comprises the steps of firstly recording environmental noise data received by the electromagnetic field near-field probe in a measurement environment, placing the electromagnetic field probe at a fixed position above a calibration piece or an electronic piece with known magnetic field distribution, recording data received by the electromagnetic field near-field probe, establishing a probe simulation model according to a probe structure, establishing a simulation model of the calibration piece, placing the probe model at a fixed position above the calibration piece model in full-wave simulation software, recording data received by a probe port, independently calculating electric field or magnetic field data of the calibration piece at the fixed position by using full-wave simulation software or an analysis method, and calibrating and compensating the probe by considering three factors of transmission loss of a measurement device, environmental noise and disturbance of the probe to an electromagnetic field. The method is suitable for various measuring instruments, is less limited by calibration pieces, improves the measuring accuracy of the electromagnetic field near-field probe, and can be widely applied to the field of electromagnetic field near-field measurement.
Description
Technical Field
The invention belongs to the technical field of electromagnetic field detection, and particularly relates to an electromagnetic field near-field probe calibration compensation method.
Background
In recent years, with the continuous development of automation and intellectualization, modern electronic devices are gradually developing towards miniaturization, multiple functions and high integration level. In view of such an integration trend of electronic devices, the requirement of various EMC standards on the EMI of electronic products is gradually increased, and the problem of electromagnetic compatibility of PCBs draws more and more attention. In order to support the EMC design of high-integration electronic products, an electromagnetic field near-field probe is required to perform electromagnetic field near-field scanning on various important components (such as integrated circuits and chips) and local areas of a PCB, so as to obtain the electromagnetic field distribution condition when the electromagnetic field near-field probe works, and provide verification and test for the electromagnetic compatibility design. The near-field probe is used as an important ring in the near-field scanning of the electromagnetic field, and how to calibrate the transmission loss of the near-field probe, avoid the influence of environmental noise on the near-field probe and the disturbance of the near-field probe to the electromagnetic field directly relate to the accuracy of the near-field scanning of the electromagnetic field.
In the existing calibration and compensation method for the electromagnetic field near-field probe, for example, CN104569888A published in 4/29/2015 uses a microstrip line as a calibration component, and is assisted by devices such as a spectrometer, and a correction factor of the near-field probe at each calibration frequency point is calibrated by using a near field generated by the microstrip line close to that of an actual test. The method effectively makes up the defects of the method for calibrating the correction factor of the near-field probe by using the standard field of the TEM cell, and meets the measurement guarantee requirement of the near-field probe. However, the calibration piece used in the method is a specific microstrip line structure, the disturbance of the probe to the electromagnetic field is not compensated, and the method is only suitable for the situation that the spectrometer uses the near-field probe to measure the electromagnetic field data, and has large limitation.
The CN114509714A uses devices such as a calibration module, a probe module and a measuring instrument to calibrate the near-field probe of the oscilloscope, and can effectively eliminate drift of gain and bias of an active amplifier in the active probe, which is generated along with temperature or time aging. The method avoids the condition that only specific types of measuring instruments can calibrate the probe module, and can solve the problem that the existing active probe cannot be suitable for all measuring instruments. However, the method still has some disadvantages, such as the need of a specific calibration module, and the influence of environmental noise on calibration and the disturbance of the probe to the electromagnetic field.
Disclosure of Invention
In order to solve the technical problems, the invention provides an electromagnetic field near-field probe calibration compensation method, which is characterized in that field intensity distribution above a calibration piece is calculated by using an analytic method or a mode of establishing an equivalent model in full-wave simulation software, and voltage measured by a probe corresponds to field intensity, so that a calibration factor of the probe is calculated, and disturbance of the magnetic field of the probe on the actual field intensity is eliminated.
The technical scheme of the invention is as follows: a calibration compensation method for an electromagnetic field near-field probe comprises the following specific steps:
s1, under the measuring environment, recording the environmental noise data received by the electromagnetic field near-field probe,
s2, placing the electromagnetic field probe at a fixed position above the calibration piece or the electronic piece with known magnetic field distribution, recording data received by the electromagnetic field near-field probe,
s3, establishing a probe simulation model according to the probe structure, establishing a simulation model of the calibration piece at the same time,
s4, in the full wave simulation software, the probe model is placed at the same position above the calibration piece model in the step S2, the data received by the probe port are recorded,
s5, using full-wave simulation software or using analytic method, separately calculating the electric field or magnetic field data of the calibration piece at the fixed position proposed by step S2,
and S6, calibrating and compensating the probe by considering three factors of transmission loss of a measuring device, environmental noise and disturbance of the probe to an electromagnetic field.
Further, the electromagnetic field probe comprises an electric field near-field probe and a magnetic field near-field probe.
Further, the received data in steps S1 and S2 includes voltage, magnetic field, electric field, and other types of data obtained by using a probe connected spectrometer scan, a vector network analyzer, and an oscilloscope.
Further, the calibration piece described in steps S2, S3, S4 includes a standard piece for calibration, an electronic component whose specific field distribution is known.
Further, in steps S3 and S4, the full-wave simulation software is specifically simulation software such as CST, HFSS, FEKO, and the like.
Further, the loss of the measuring device described in step S6 includes the loss of the preamplifier, the probe itself, and the connection cable.
Further, in step S6, when calibrating and compensating the magnetic field near-field probe, it is necessary to obtain the calibration factor of the magnetic field probe of the simulation model:
wherein H si For simulated field strength, V si Obtaining the port voltage, r, of the magnetic field probe for simulation HV Is the calibration factor of the magnetic field probe of the simulation model.
Further, when calibrating and compensating the magnetic field near field probe, the voltage measured by the magnetic field near field probe and r need to be measured HV Multiplying to obtain the reference field intensity H above the calibration piece ref I.e. H ref ＝r HV ·V mea 。
Further, after the reference field strength is obtained when the magnetic field near-field probe is calibrated and compensated, a final calculation method of a calibration factor (PF) of the whole measurement system when the magnetic field near-field probe is calibrated and compensated is as follows: PF ═ H ref /V probe 。
The invention has the beneficial effects that: the method comprises the steps of firstly, recording environmental noise data received by an electromagnetic field near-field probe in a measuring environment, placing the electromagnetic field probe at a fixed position above a calibration piece or an electronic piece with known magnetic field distribution, recording the data received by the electromagnetic field near-field probe, establishing a probe simulation model according to a probe structure, establishing a simulation model of the calibration piece, placing the probe model at a fixed position above the calibration piece model in full-wave simulation software, recording data received by a probe port, using the full-wave simulation software or an analysis method, independently calculating the electric field or magnetic field data of the calibration piece at the fixed position, and calibrating and compensating the probe by considering three factors of transmission loss of a measuring device, environmental noise and disturbance of the probe to the electromagnetic field. The method is suitable for various measuring instruments, is less limited by calibration pieces, improves the measuring accuracy of the electromagnetic field near-field probe, and can be widely applied to the field of electromagnetic field near-field measurement.
Drawings
FIG. 1 is a flow chart of a method for calibrating and compensating an electromagnetic field near-field probe according to the present invention.
Fig. 2 is a schematic diagram of a circular patch antenna measured by connecting a spectrometer with a magnetic field near-field probe according to embodiment 1 of the present invention.
Fig. 3 is a simulation model of the magnetic field probe in the CST provided in embodiment 1 of the present invention.
Fig. 4 is a simulation model of the circular patch antenna in CST provided in embodiment 1 of the present invention.
Fig. 5 is a schematic diagram of the positions of the magnetic field probe and the prototype patch antenna in the CST provided in embodiment 1 of the present invention.
Fig. 6 is a schematic diagram of the position of the magnetic field amplitude point in embodiment 1 of the present invention.
Fig. 7 is a graph comparing the field strength obtained from the test of the probe calibrated according to the invention in example 1 of the present invention with the standard field strength of a circular patch antenna.
Fig. 8 is a schematic diagram of a vector network analyzer connected to a magnetic field near-field probe to measure a standard microstrip line calibration piece in embodiment 2 of the present invention.
Fig. 9 is a schematic structural diagram of a standard microstrip line calibration piece in embodiment 2 of the present invention.
Fig. 10 is a schematic diagram of a probe simulation model and a standard microstrip line calibration model in embodiment 2 of the present invention.
Fig. 11 is a schematic diagram of the position of the magnetic field amplitude point in embodiment 2 of the present invention.
Fig. 12 is a comparison graph of the field strength obtained by the probe test after the calibration of the invention in embodiment 2 of the invention and the standard field strength of the standard microstrip line calibration piece.
Detailed Description
The technical scheme of the invention is further explained by combining the attached drawings.
As shown in fig. 1, a flowchart of a calibration and compensation method for an electromagnetic field near-field probe according to the present invention includes the following steps:
example 1:
s1, under the measuring environment, recording the environmental noise data received by the electromagnetic field near-field probe,
as shown in fig. 2, in the present embodiment, the magnetic field probe (S103) is calibrated, a circular patch antenna (S104) with a simple structure and known standard field strength is used as a calibration member, the magnetic field probe (S103) is connected with the preamplifier (S102) through a cable (S105), and the preamplifier (S102) is connected with the spectrometer through the cable (S102).
Under a measuring environment, a spectrometer (S101) is used as a receiving device, a circular patch antenna (S104) is moved out, and environmental noise data received by a magnetic field near-field probe is recorded. Calculating and recording the voltage signal V measured at 2GHz probe 。
S2, placing the electromagnetic field probe at a fixed position above the calibration piece or the electronic piece with known magnetic field distribution, recording data received by the electromagnetic field near-field probe,
placing the magnetic field near-field probe (S103) in S1 at a fixed position above the circular patch antenna (S104), recording data received by the magnetic field near-field probe at 2GHz by using a spectrometer (S101), and calculating to obtain the voltage V of the circular patch measured by the magnetic field probe mea 。
S3, establishing a probe simulation model according to the probe structure, establishing a simulation model of a calibration piece at the same time,
as shown in fig. 3, a probe simulation model is built according to the magnetic field probe structure, and as shown in fig. 4, a simulation model of a circular patch antenna is built.
S4, in the full-wave simulation software, the probe model is placed above the calibration piece model at the same position as the position in the step S2, the data received by the probe port is recorded,
as shown in fig. 5, in the full-wave simulation software CST, the probe model is placed above the calibration piece model at the same position as in step S2, and the calculation is performed using the frequency domain solver, and the data received by the probe port is recorded, so as to obtain the voltage V measured by the probe model port si 。
S5, using full-wave simulation software CST in this embodiment, separately calculates the electric field or magnetic field data of the calibration piece at the fixed position proposed in step S2,
calculating the electric field or magnetic field data and the magnetic field intensity H of the circular patch antenna at the fixed position (the center of the probe) proposed in the step S2 by using a full-wave simulation software CST method and a frequency domain solver si 。
S6, taking into account three factors of transmission loss of the measuring device, environmental noise and disturbance of the probe to the electromagnetic field, calibrating and compensating the probe,
order to
Wherein r is HV Is the calibration factor of the magnetic field probe of the simulation model in CST. Voltage measured by magnetic field near-field probe and r HV Multiplying to obtain the reference field intensity H above the circular patch antenna ref I.e. H ref ＝r HV ·V mea . After the reference field intensity is obtained, the final calculation method of the calibration factor (PF) of the whole measurement system is as follows: PF ═ H ref /V probe At this time, the calibration factor of the magnetic field near field probe in this embodiment is calculated. Due to V probe For the voltage received by the magnetic field probe under the experimental environment independently, the conditions of the magnetic field probe and the magnetic field probe are considered and compared in CST simulation, so the calibration factor takes the transmission loss of a measuring device, the environmental noise and the compensation of the probe into account.
And after the calibration step is finished, verifying the calibration result. As shown in fig. 6, a magnetic field probe is used to measure the magnetic field 10mm above the circular patch antenna at 11 points, and after data processing, the measurement result of the magnetic field probe is compared with the standard field strength of the known circular patch antenna. As shown in FIG. 7, it can be seen that the field strength measured by the probe is very small after the probe is calibrated and compensated by the method of the present invention.
Example 2:
to illustrate the utility of the present invention in more detail, a standard microstrip line calibration piece is used to calibrate the probe, and the specific steps are as follows:
s1, under the measuring environment, recording the environmental noise data received by the electromagnetic field near-field probe,
as shown in fig. 8, in this embodiment, the magnetic field probe (S203) is calibrated, a standard microstrip line calibration device (S204) is used as the current calibration device, the magnetic field probe (S203) is connected to the preamplifier (S202) through the cable (S205), the preamplifier (S202) is connected to the vector grid analyzer through the cable 1(S202), and the microstrip line is fed from the port of the vector grid through the cable 2 (S206).
S2, placing the magnetic field probe in a fixed position over the calibration piece or the electronic piece with known magnetic field distribution, recording the data received by the electromagnetic field near-field probe,
at this time, S parameter information is obtained, and measurement is performed using a standard microstrip line calibration piece, as shown in fig. 9, the size of the standard microstrip line calibration piece is 80mm × 50mm × 1.5mm, the middle layer is an FR4 board, the center of the upper surface is a 40mm × 2mm microstrip, the bottom surface is a ground plane, one end of the microstrip line is connected to the ground plane through a 50 Ω load, and the other end is a feed port.
Placing the magnetic field near-field probe (S203) in the step S1 at a fixed position above the standard microstrip line calibration piece (S204), and recording S parameter data received by the magnetic field near-field probe at 1GHz by using a vector grid analysis instrument (S201), wherein the S parameter data is the data received by the magnetic field near-field probe at the position of 1GHz
V i The voltage V of the standard microstrip line calibration piece measured by the magnetic field probe can be obtained by calculation for the voltage of the excitation port of the vector grid analyzer mea 。
S3, establishing a probe simulation model according to the probe structure, establishing a simulation model of the calibration piece at the same time,
as shown in fig. 10, a probe simulation model is established according to the magnetic field probe structure, and a standard microstrip line calibration piece model is introduced.
S4, in the full-wave simulation software, the probe model is placed above the calibration piece model at the same position as the position in the step S2, the data received by the probe port is recorded,
as shown in FIG. 10, the probe model has been placed in the simulation software FEKO at the same position above the calibration piece model as in step S2, and the feed voltage is V the same as that of the vector grid analysis instrument i The simulation environment is the same as the reference voltage used for measurement of an actual vector grid analyzer, the MOM (moment of mass) method is used for calculation, data received by a probe port are recorded, and the voltage V measured by a probe model port is obtained si 。
S5, in this embodiment, the transmission line matrix method is used to solve the magnetic field of the standard microstrip line calibration piece, and the data of the magnetic field at the fixed position and the field intensity H of the magnetic field of the calibration piece proposed in step S2 are calculated si 。
S6, taking into account three factors of transmission loss of the measuring device, environmental noise and disturbance of the probe to the electromagnetic field, calibrating and compensating the probe,
order to
Wherein r is HV Is the calibration factor of the magnetic field probe of the simulation model in FEKO. Voltage measured by magnetic field near-field probe and r HV Multiplying to obtain the reference field intensity H above the standard microstrip line calibration piece ref I.e. H ref ＝r HV ·V mea . After the reference field intensity is obtained, the final calculation method of the calibration factor (PF) of the whole measurement system is as follows: PF ═ H ref /V probe At this time, the calibration factor of the magnetic field near field probe in this embodiment is calculated. Due to V probe The voltage received by the magnetic field probe under the experimental environment independently is compared by taking the conditions of the magnetic field probe and the magnetic field probe into account in the simulation of the FEKO, so the calibration is carried outThe quasi-factors have taken into account the transmission losses of the measuring device, the ambient noise and the compensation of the probe.
And after the calibration step is finished, verifying the calibration result. As shown in fig. 11, a magnetic field probe is used to measure a magnetic field 15mm above the standard microstrip line calibration piece at 11 points, and after data processing, the measurement result of the magnetic field probe is compared with the standard field intensity of the known standard microstrip line calibration piece. As shown in fig. 12, it can be seen that the field strength measured by the probe is very small after the probe is calibrated and compensated by using the method of the present invention.
According to the embodiments, compared with the prior art, the calibration compensation method for the electromagnetic field near-field probe has the following advantages.
First, the method of the invention requires less calibration elements, including standard elements for calibration (e.g. standard microstrip line calibration elements) and electronic components whose specific field distributions are known.
Secondly, the method is applicable to more scenes, instruments used for measuring the existing electromagnetic field comprise a frequency spectrograph scanning instrument, a vector network analyzer, an oscilloscope and the like, and the method is different from the existing methods which are only applicable to certain instruments and is applicable to the frequency spectrograph scanning instrument, the vector network analyzer and the oscilloscope in the calibration of the electromagnetic field probe.
Thirdly, the method comprehensively considers three factors of transmission loss of a measuring device, environmental noise and disturbance of the probe to the electromagnetic field, the probe is compensated while being calibrated, and the measuring accuracy of the electromagnetic field near-field probe is further improved.
It will be appreciated by those of ordinary skill in the art that the embodiments described herein are intended to assist the reader in understanding the principles of the invention and are to be construed as being without limitation to such specifically recited embodiments and examples. Various modifications and alterations to this invention will become apparent to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.
Claims (9)
1. A calibration compensation method for an electromagnetic field near-field probe comprises the following specific steps:
s1, under the measuring environment, recording the environmental noise data received by the electromagnetic field near-field probe,
s2, placing the electromagnetic field probe at a fixed position above the calibration piece or the electronic piece with known magnetic field distribution, recording data received by the electromagnetic field near-field probe,
s3, establishing a probe simulation model according to the probe structure, establishing a simulation model of the calibration piece at the same time,
s4, in the full-wave simulation software, the probe model is placed at the same fixed position above the calibration piece model in the step S2, the data received by the probe port is recorded,
s5, using full-wave simulation software or using analytic method, separately calculating the electric field or magnetic field data of the calibration piece at the fixed position proposed by step S2,
and S6, calibrating and compensating the probe by considering three factors of transmission loss of a measuring device, environmental noise and disturbance of the probe to an electromagnetic field.
2. The method of claim 1, wherein the electromagnetic field near field probe comprises a magnetic field near field probe and an electric field near field probe.
3. The method of claim 1, wherein the received data of steps S1 and S2 includes voltage, magnetic field, electric field, and other types of data obtained by using a probe-connected spectrometer scan, a vector network analyzer, and an oscilloscope.
4. The calibration compensation method for the electromagnetic field near-field probe according to claim 1, wherein the calibration piece of the steps S2, S3 and S4 comprises a standard piece for calibration and an electronic component with known specific field distribution.
5. The method of claim 1, wherein the full wave simulation software in steps S3 and S4 is selected from simulation software such as CST, HFSS, FEKO, etc.
6. The method for calibrating and compensating an electromagnetic field near-field probe according to claim 4, wherein the loss of the measuring device in step S6 includes loss of the preamplifier, the probe itself and the connecting cable.
7. The method for calibrating and compensating the electromagnetic field near-field probe according to claim 1, wherein in step S6, when calibrating and compensating the magnetic field near-field probe, it is necessary to obtain a calibration factor of the magnetic field probe of the simulation model:
wherein H si For simulated field strength, V si Obtaining the port voltage, r, of the magnetic field probe for simulation HV Is a calibration factor of the magnetic field probe of the simulation model.
8. The calibration and compensation method for the electromagnetic field near-field probe according to claim 7, wherein the voltage and r measured by the magnetic field near-field probe are required to be measured when the magnetic field near-field probe is calibrated and compensated HV Multiplying to obtain the reference field intensity H above the calibration piece ref I.e. H ref ＝r HV ·V mea 。
9. The method for calibrating and compensating the electromagnetic field near-field probe according to claim 7, wherein after the reference field strength is obtained during the calibration and compensation of the magnetic field near-field probe, the final calculation method of the calibration factor (PF) of the whole measuring system comprises the following steps: PF ═ H ref /V probe 。
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