CN115074668B - Blisk coating and preparation method and application thereof - Google Patents
Blisk coating and preparation method and application thereof Download PDFInfo
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- CN115074668B CN115074668B CN202211002297.6A CN202211002297A CN115074668B CN 115074668 B CN115074668 B CN 115074668B CN 202211002297 A CN202211002297 A CN 202211002297A CN 115074668 B CN115074668 B CN 115074668B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
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- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
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- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
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Abstract
The invention provides a blisk coating and a preparation method and application thereof, belonging to the technical field of aero-engines. According to the invention, the substrate is subjected to metal element injection, so that the substrate has good film-substrate binding force, and meanwhile, through metal ion injection, compressive stress can be formed on the surface of the blisk, the influence of an ultra-thick film layer on the fatigue performance of the blisk is reduced, and the diffraction capability of plasma is improved by adopting a negative pressure device, so that the film coating capability of narrow slits in the blisk is improved, and the method is suitable for preparing a small multi-narrow-slit axial-flow blisk coating; the invention adopts a magnetic filtration deposition system, is provided with a first magnetic field control device and a second magnetic field control device at the same time, and can conveniently realize multi-angle and multi-dimensional uniform film coating through the coupling of an electric field and a magnetic field; according to the invention, uniform plating of narrow slits can be realized through mutual cooperation of metal ion injection, magnetic filtration and deposition and a magnetic field, and the ultra-thick coating can be plated on the axial-flow blade disc through circulating magnetic filtration and deposition.
Description
Technical Field
The invention relates to the technical field of aero-engines, in particular to a blisk coating and a preparation method and application thereof.
Background
Flying a helicopter close to the ground causes dust and, in general, the dust concentration in the air in the vicinity of the helicopter depends on the structural strength of the soil, the dispersion composition of the minerals, the local climatic conditions and the intensity of the air flow raised by the rotation of the rotor. If the distance between the helicopters is less than 50 m on a landing, the dust lifted by one helicopter can have a significant effect on the operation of the other helicopter engine due to the movement of the air flow. When sand and dust enter the air inlet passage of the engine, abrasion of all parts in the air and gas passages of the engine can be caused, and particularly, the rotor blades are seriously abraded by the sand and dust. When the rice-8 helicopter hovers near the ground above a sand dust field and the engines are in the maximum working state, each engine sucks about 3kg of heavy sand dust every minute. Although some improvements are made to the intake protection device of the turboshaft eight-engine adopted on the straight-9 helicopter, when the helicopter continuously flies in a sand-dust environment, a large amount of sand and dust still enters the inside of the engine, and the consequences are that: 1. the compressor inside the engine is subjected to severe wear: for an axial-flow compressor, the most serious abrasion is usually generated on the air inlet edge of a blade, the neck of a working blade and the root of a rectifying blade, and a sealing coating on the inner wall of a casing of the compressor is also abraded; for a centrifugal compressor, because a working impeller of the centrifugal compressor has a large windward area and is worn most seriously, the performance of an engine is deteriorated due to the damage, the power of the engine is reduced, and the oil consumption rate is increased; 2. fine dust enters a cooling channel of the working blade of the turbine to block the channel, so that the working blade is over-heated and even burnt; 3. when larger dust enters the engine at high wind speeds, the compressor blades may be damaged.
The research in the field of preparing the erosion-resistant coating on the surface of the blisk is carried out later in China, no relevant special equipment for depositing the coating on the blisk exists at present, and the existing method for preparing the blisk coating has the following defects: coating of a workpiece sample with a narrow slit cannot be realized; deposition of ultra-thick ceramic coatings is difficult to achieve; the compactness of the film layer is poor, the holes are more, and the bonding force between the film layer and the substrate is deviated.
Disclosure of Invention
The invention aims to provide a blisk coating, a preparation method and application thereof, wherein the blisk coating can realize film coating of a narrow-slit blisk sample, and the prepared blisk coating has high film compactness and strong binding force with a blisk substrate.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides a preparation method of a blisk coating, which comprises the following steps:
injecting metal ions into the substrate of the integral blade disc by using a metal vacuum vapor ion source system, and forming a metal pinning layer on the surface of the substrate;
performing first magnetic filtration deposition on the metal pinning layer by using a first magnetic filtration deposition system to form a metal stress release layer;
under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a second magnetic filtration deposition system to form a single-layer ceramic film layer;
sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition on the single-layer ceramic membrane layer by taking the time t for introducing nitrogen as a cycle period to obtain a blisk coating;
the calculation formula of the nitrogen gas input is
sccm, wherein t represents the time of introducing nitrogen in minutes; s represents the air inflow, and the unit is sccm;
the magnetic filtering bent pipes of the first magnetic filtering system and the second magnetic filtering system are respectively provided with a first magnetic field control device;
a second magnetic field control device is arranged around the blisk in the blisk coating;
and a negative pressure device is arranged on the blisk.
Preferably, the substrate is a TC4 or TC11 titanium alloy.
Preferably, in the metal vacuum vapor ion source system, the included angle between the direction of the ion beam and the blade tip of the blisk is 25 to 45 o 。
Preferably, the metal used for the metal ion implantation is Zr or Mo, the implantation voltage of the metal ion implantation is 10 to 45 kV, the beam intensity is 1 to 10 mA, and the implantation dosage is 1 x (1015 to 1016)/cm 2 The implantation depth is 100 to 320nm.
Preferably, the first magnetic filtration system is a magnetic filtration cathode vacuum arc FCVA system; the included angle between the ion beam current direction and the blade tip of a blisk in the magnetic filtering cathode vacuum arc FCVA system is 10 to 90 DEG o (ii) a The arcing current of the first magnetic filtration deposition is 90 to 120A, the magnetic field intensity is 20 to 100A, and the frequency is 20 to 100Hz.
Preferably, the metal element in the metal stress release layer is Zr or Mo, and the thickness of the metal stress release layer is 10 to 1000 nm.
Preferably, the second magnetic filtration system is a magnetic filtration cathode vacuum arc FCVA system; the negative bias voltage of the second magnetic filtration deposition is 1 to 25kV, and the duty ratio is 0.0001 to 20 percent; the arcing current of the second magnetic filtration deposition is 90 to 120A, the magnetic field intensity is 20 to 100A, and the frequency is 20 to 100Hz; the thickness of the ceramic film layer is 1 to 20 mu m.
Preferably, a positive and negative alternating coil is arranged in the diameter range of the blisk, and the magnetic field strength of the positive and negative alternating coil is-10 to +10mT.
The invention provides a blisk coating prepared by the preparation method in the technical scheme, the blisk coating comprises a blisk substrate layer, a metal pinning layer, a metal stress release layer and a ceramic film layer which are sequentially and circularly stacked, and the outermost layer of the blisk coating is the metal stress release layer.
The invention provides an application of the blisk coating in the technical scheme in an axial-flow blisk engine.
The invention provides a preparation method of a blisk coating, which comprises the following steps: injecting metal ions into the substrate by using a metal vacuum vapor ion source system, and forming a metal pinning layer on the surface of the substrate; performing first magnetic filtration deposition on the metal pinning layer by using a first magnetic filtration deposition system to form a metal stress release layer; under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a second magnetic filtration deposition system to form a single-layer ceramic film layer; sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition on the single-layer ceramic membrane layer by taking the time t for introducing nitrogen as a cycle period to obtain a blisk coating;
the formula of the nitrogen gas input is
sccm, wherein t represents the time of introducing nitrogen in minutes; s represents the air inflow, and the unit is sccm;
the magnetic filtering bent pipes of the first magnetic filtering system and the second magnetic filtering system are respectively provided with a first magnetic field control device; a second magnetic field control device is arranged around the blisk in the blisk coating; and a negative pressure device is arranged on the blisk.
According to the method, metal elements are injected into the substrate of the integral leaf disc, so that the substrate has good film-substrate binding force, meanwhile, through metal ion injection, compressive stress can be formed on the surface of the leaf disc, the influence of an ultra-thick film layer on the fatigue performance of the leaf disc is reduced, the diffraction capability of plasma is improved by adopting a negative pressure device, and the film coating capability of narrow slits in the integral leaf disc is improved.
Compared with PVD (physical vapor deposition) deposition methods such as magnetron sputtering and electron beam evaporation, the method has the advantages that the atom ionization rate is high (more than 90%), the plasma density can be increased, large particles are reduced during film forming, and the hardness, the wear resistance, the compactness and the film-substrate binding force of the coating are improved.
The traditional multi-arc equipment is only suitable for coating the surface of a low-shielding base body, but for a high-shielding blisk, the uniformity of the coating is very poor, the bonding strength of the position with serious shielding is not high, the blisk is easy to fall off, and the overall performance of the blisk is greatly influenced; the invention adopts a magnetic filtration deposition system, can realize multi-angle coupling, is provided with a first magnetic field control device and a second magnetic field control device, and can conveniently realize multi-angle and multi-dimensional uniform film coating through the coupling of an electric field and a magnetic field.
According to the invention, uniform plating of narrow slits can be realized through mutual cooperation of metal ion injection, magnetic filtration and deposition and a magnetic field, and the ultra-thick coating can be plated on the axial-flow blade disc through circulating magnetic filtration and deposition.
Drawings
FIG. 1 is a graph showing the bonding force between the blisk coating and the blisk substrate prepared in examples 1 to 3 and comparative example 1;
FIG. 2 is a schematic view of a blisk coating;
FIG. 3 is a thickness test chart of the blisk coatings prepared in examples 1 to 3 and comparative example 1 on the air inlet edge of the blisk.
Detailed Description
The invention provides a preparation method of a blisk coating, which comprises the following steps:
injecting metal ions into the substrate of the integral blade disc by using a metal vacuum vapor ion source system, and forming a metal pinning layer on the surface of the substrate;
performing first magnetic filtration deposition on the metal pinning layer by using a first magnetic filtration deposition system to form a metal stress release layer;
under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a second magnetic filtration deposition system to form a single-layer ceramic film layer;
sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition on the single-layer ceramic film layer by taking the time t of introducing nitrogen as a cycle period to obtain a blisk coating;
the calculation formula of the nitrogen gas input is
sccm, wherein t represents the time of introducing nitrogen in minutes;
the magnetic filtering bent pipes of the first magnetic filtering system and the second magnetic filtering system are respectively provided with a first magnetic field control device;
a second magnetic field control device is arranged around the blisk in the blisk coating;
and a negative pressure device is arranged on the blisk.
In the present invention, unless otherwise specified, all the starting materials required for the preparation are commercially available products well known to those skilled in the art.
The invention utilizes a metal vacuum vapor ion source system to inject metal ions into the substrate of the integral blade disc, and a metal pinning layer is formed on the surface of the substrate. The present invention is not limited to the metal vacuum vapor ion source system, and any apparatus known in the art may be used. In the present invention, the material of the blisk base is preferably TC4 or TC11 titanium alloy. The composition or source of the TC4 or TC11 titanium alloy is not particularly limited in the present invention, and commercially available products known in the art may be used.
In the metal vacuum vapor ion source system, the included angle between the direction of ion beam current and the blade tip of a blisk is preferably 25-45 DEG o More preferably from 30 to 35 o 。
In the invention, the metal used for the metal ion implantation is preferably Zr or Mo, and the implantation voltage of the metal ion implantation is preferably 10 to 45 kV, more preferably 25 to 40 kV, and further oneThe step is preferably 30 to 35kV; the beam intensity is preferably 1 to 10 mA, more preferably 2 to 8 mA, and further preferably 5 to 6 mA; the implantation dose is preferably 1 × (10) 15 ~10 16 ）/cm 2 More preferably 2X 10 15 /cm 2 (ii) a The implantation depth is preferably 100 to 320nm, and more preferably 150 to 200nm. In the present invention, the depth of the metal pinning layer is preferably 170 to 320nm, more preferably 200 to 300nm, and still more preferably 230 to 260nm. The time for injecting the metal ions is not particularly limited, and the depth range can be reached.
According to the invention, by injecting metal into the substrate, the surface compressive stress of the substrate can be improved by 20%, and the oxidation resistance can be improved by 10-20%.
After a metal pinning layer is formed on the surface of a substrate, a first magnetic filtering and depositing system is utilized to perform first magnetic filtering and depositing on the metal pinning layer to form a metal stress release layer. In the invention, the first magnetic filtration system is preferably a magnetic filtration cathode vacuum arc FCVA system; the magnetic filtered cathode vacuum arc FCVA system is not particularly limited in the present invention and may be any known in the art. In the invention, the arc starting current of the first magnetic filtration deposition is preferably 90 to 120A, and more preferably 100 to 110A; the magnetic field strength is preferably 20 to 100A, more preferably 30 to 80A, and further preferably 50 to 60A; the frequency is preferably 20 to 100Hz, more preferably 30 to 80Hz, and still more preferably 50 to 60Hz.
In the invention, a positive and negative alternating coil is preferably arranged in the diameter range of the blisk, and the magnetic field strength of the positive and negative alternating coil is preferably-10 to +10mT. The source of the positive and negative alternating solenoid is not particularly limited in the invention, and the positive and negative alternating solenoid can be any one known in the art. According to the invention, the current generated by the positive and negative alternating coil and the first magnetic field control device is 10-100 times larger than that of a traditional magnetic filtering pipeline, so that the magnetic filtering deposition speed can be obviously increased, the coating preparation efficiency is improved, and the prepared coating can be applied to a blisk.
In the invention, the metal element in the metal stress release layer is preferably Zr or Mo (namely, the target material used for the first magnetic filtration deposition is Zr or Mo), and the thickness of the metal stress release layer is preferably 10 to 1000 nm, more preferably 100 to 800 nm, and further preferably 300 to 500nm. The time for depositing the first magnetic filter is not specially limited, and can be adjusted according to actual requirements.
The preparation method of the metal stress release layer can improve the bonding strength of the coating and the blade disc matrix by more than or equal to 50 percent, and simultaneously improve the low cycle fatigue resistance of the coating by more than or equal to 10 percent.
After the metal stress release layer is formed, under the condition of introducing nitrogen, a second magnetic filtration and deposition system is utilized to perform second magnetic filtration and deposition on the metal stress release layer to form a single-layer ceramic film layer. In the present invention, the second magnetic filtration system is preferably a magnetic filtration cathode vacuum arc FCVA system; in the invention, the included angle between the ion beam direction and the blade tip of the blisk in the magnetic filtration cathode vacuum arc FCVA system is preferably 10 to 90 o More preferably 45 to 54 o 。
In the invention, the negative bias voltage of the second magnetic filtration deposition is preferably 1 to 25kV, more preferably 5 to 20kV, and further preferably 10 to 15kV; the duty ratio is preferably 0.0001 to 20%, more preferably 0.001 to 15%, and still more preferably 0.1 to 10%; the arcing current of the second magnetic filtration deposition is preferably 90 to 120A, more preferably 100A, and the magnetic field strength is preferably 20 to 100A, more preferably 50A; the frequency is preferably 20 to 100Hz, more preferably 100Hz.
In the invention, the target material used for the second magnetic filtration deposition is preferably Ti, tiAl, tiAlCr or TiAlCrSi; the single-layer ceramic film layer preferably comprises TiN, tiAlN, tiAlCrN or TiAlCrSiN; the thickness of the single-layer ceramic film layer is preferably 1 to 20 μm, more preferably 5 to 15 μm, and even more preferably 8 to 12 μm.
The time for depositing the second magnetic filter is not specially limited, and the second magnetic filter can be adjusted according to actual requirements.
After the single-layer ceramic film layer is formed, sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition on the single-layer ceramic film layer by taking the time t of introducing nitrogen as a cycle period to obtain a blisk coating;
the calculation formula of the nitrogen gas input is
sccm, wherein t represents the time in minutes for introducing nitrogen.
In the invention, the time t for introducing the nitrogen is preferably 0 to 100min, and more preferably 5min; the amount of nitrogen gas introduced is preferably-60 to 60sccm. The invention changes the air input of nitrogen by controlling the introduction time of the nitrogen, carries out gradient deposition of the ceramic film layer and further influences the composition of each formed ceramic film layer. In the present invention, the number of times the first and second magnetic filter depositions are cycled is preferably adjusted according to the subsequent requirements of the final blisk coating.
According to the invention, the metal stress release layer and the ceramic film layer are deposited by circulating magnetic filtration, compared with a single-layer ceramic film, the internal stress of the coating can be reduced by 20%, the hardness is reduced by 5-8%, and the ratio H3/E2 of the hardness H to the elastic modulus E is 1-2 times lower than that of the single-layer ceramic film.
According to the invention, the 135-degree magnetic filtration bent pipe is adopted for depositing the ceramic film layer, and the mass of the obtained ceramic layer is better than that of the film layer obtained by PVD (physical vapor deposition) methods such as 90-degree magnetic filtration deposition, magnetron sputtering, electron beam evaporation and the like, and the film layer has higher film layer quality and higher microhardness. The magnetic filter elbow is not particularly limited by the invention, and the magnetic filter elbow can be a corresponding pipeline well known in the field.
In the invention, the magnetic filtering bent pipes of the first magnetic filtering system and the second magnetic filtering system are respectively provided with a first magnetic field control device. In the present invention, the first magnetic field control device is preferably a pulsed magnetic field coil. According to the invention, the first magnetic field control device is used for controlling the transport of the plasma in the magnetic filtration and deposition process, so that the transport efficiency and the direction consistency of the plasma are improved.
In the invention, a second magnetic field control device is arranged around the blisk in the blisk coating; the second magnetic field control means is preferably a pulsed magnetic field coil. In the invention, the distance between the second magnetic field control device and the blade tip of the blisk is preferably 50-200mm, and more preferably 100mm. The invention utilizes the second magnetic field control device to guide and control the deposition direction of the plasma in the magnetic filtration deposition process, and improves the controllability of the direction of the plasma deposition film layer.
The pulsed magnetic field coil is not particularly limited in the present invention, and corresponding devices well known in the art may be used.
In the invention, the blisk is provided with a negative pressure device for improving the energy of plasma deposition to the blisk; the negative pressure device is preferably coupled with direct current negative pressure and high-power pulse negative pressure, so that the diffraction capability of the plasma can be greatly improved, and the film coating capability of a narrow slit in the blisk can be improved.
In the invention, the blisk is provided with three sets of magnetic filtration and deposition systems, two sets of metal vacuum vapor ion implantation systems (two sets of magnetic filtration and deposition systems at the air inlet side and one set of ion implantation system at the air outlet side), two sides of the blisk are used simultaneously and implanted with ions, and the two sides are deposited simultaneously after implantation; and the two sets of ion implantation systems form an angle of 45 degrees with the blade tip; the beam direction of the magnetic filtering deposition system forms an angle of 30 degrees with the blade tip; and a high-power pulse bias system is also arranged, so that the diffraction of the plasma can be greatly improved.
The invention provides a blisk coating prepared by the preparation method in the technical scheme, the blisk coating comprises a blisk substrate layer, a metal pinning layer, a metal stress release layer and a ceramic film layer which are sequentially stacked in a laminating manner, and the outermost layer of the blisk coating is the metal stress release layer. In the invention, the composition of each ceramic film layer presents gradient change according to the air inflow change rule of nitrogen, the whole structure of the coating is a gradient structure, and no obvious boundary layer exists. In the present invention, the thickness of the blisk coating is preferably 5 to 20 μm, and more preferably 15 μm.
The invention provides an application of the blisk coating in the technical scheme in an axial-flow blisk engine. The method of the present invention is not particularly limited, and the method may be applied according to a method known in the art.
The technical solution of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the following embodiment, a positive and negative alternating coil is arranged in the diameter range of the blisk, and the magnetic field intensity of the positive and negative alternating coil is-10 to +10mT;
the first magnetic field control device and the second magnetic field control device are pulse magnetic field coils; the distance between the second magnetic field control device and the blade tip of the blisk is 100mm.
Example 1
Injecting Zr element on a substrate (TC 4 titanium alloy) by using a metal vacuum vapor ion source system and taking metal Zr as a target material; the included angle between the direction of the ion beam flow and the blade tip of the blisk is 35 o The injection voltage is 30 kV, the beam intensity is 2 mA, and the injection dosage is 2 multiplied by 10 15 /cm 2 The implantation depth is 200nm, and a metal pinning layer is formed on the substrate;
performing first magnetic filtration deposition on the metal pinning layer by using a magnetic filtration cathode vacuum arc FCVA system and taking metal Zr as a target, wherein the arcing current is 100A, the magnetic field intensity is 20A, and the frequency is 20Hz to form a metal stress release layer (namely a metal Zr film layer with the thickness of 500 nm);
under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a magnetic filtration cathode vacuum arc FCVA system and a 135-degree magnetic filtration bent pipe, wherein the target material is preferably TiAl, and the included angle between the direction of the ion beam and the blade tip of the blisk is 45 DEG o Setting negative bias voltage as 10kV, duty ratio as 0.1%, arcing current as 100A, magnetic field intensity as 50A and frequency as 100Hz; forming a single-layer ceramic film layer (the component is TiAlN, and the thickness is 15 mu m);
the time of introducing nitrogen for 5min is taken as the cycle periodSequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition, and calculating nitrogen gas inflow
sccm is-60 to 60sccm to obtain a blisk coating (thickness is 15 μm).
Example 2
Injecting Zr element on a blisk substrate (TC 4 titanium alloy) by using a metal vacuum vapor ion source system and taking metal Zr as a target material; the included angle between the direction of the ion beam current and the blade tip of the blisk is 35 o The injection voltage is 20kV, the beam intensity is 2 mA, and the injection dosage is 2 multiplied by 10 15 /cm 2 The implantation depth is 150nm, and a metal pinning layer is formed on the substrate;
performing first magnetic filtration deposition on the metal pinning layer by using a magnetic filtration cathode vacuum arc FCVA system and taking metal Zr as a target, wherein the arcing current is 100A, the magnetic field intensity is 30A, and the frequency is 30Hz to form a metal stress release layer (namely a metal Zr film layer with the thickness of 500 nm);
under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a magnetic filtration cathode vacuum arc FCVA system and a 135-degree magnetic filtration bent pipe, wherein the target material is preferably TiAl, and the included angle between the direction of an ion beam and the tip of a blisk is 45 o Setting negative bias voltage to be 20kV, duty ratio to be 0.1%, arcing current to be 100A, magnetic field intensity to be 50A and frequency to be 100Hz; forming a single-layer ceramic film layer (the component is TiAlN, and the thickness is 15 mu m);
taking the time of introducing nitrogen gas for 5min as a cycle period, sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition, and calculating the nitrogen gas inflow
sccm is-60 to 60sccm to obtain a blisk coating (thickness is 15 μm).
Example 3
Injecting Zr element on a substrate (TC 4 titanium alloy) by using a metal vacuum vapor ion source system and taking metal Zr as a target material;the included angle between the direction of the ion beam flow and the blade tip of the blisk is 30 o The injection voltage is 10kV, the beam intensity is 2 mA, and the injection dosage is 2 multiplied by 10 15 /cm 2 Forming a metal pinning layer on the substrate with an implantation depth of 100 nm;
performing first magnetic filtration deposition on the metal pinning layer by using a magnetic filtration cathode vacuum arc FCVA system and taking metal Zr as a target, wherein the arc starting current is 100A, the magnetic field intensity is 30A, and the frequency is 30Hz, so as to form a metal stress release layer (namely a metal Zr film layer with the thickness of 100 nm);
under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a magnetic filtration cathode vacuum arc FCVA system, wherein the included angle between the ion beam direction and the blade tip of the blisk is 54 o Setting negative bias voltage to be 25kV, duty ratio to be 0.1%, arcing current to be 100A, magnetic field intensity to be 50A and frequency to be 100Hz; forming a single-layer ceramic film layer (the component is TiAlN, and the thickness is 15 mu m);
taking the time of introducing nitrogen gas for 5min as a cycle period, sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition, and calculating the nitrogen gas inflow
sccm is-60 to 60sccm to obtain a blisk coating (thickness is 15 μm).
Comparative example 1
Injecting Zr element on a substrate (TC 4 titanium alloy) by using a metal vacuum steam ion source system and taking metal Zr as a target material; the included angle between the direction of the ion beam flow and the blade tip of the blisk is 30 o The injection voltage is 20kV, the beam intensity is 2 mA, and the injection dosage is 2 multiplied by 10 15 /cm 2 The implantation depth is 150nm, and a metal pinning layer is formed on the substrate;
performing first magnetic filtration deposition on the metal pinning layer by using a magnetic filtration cathode vacuum arc FCVA system and taking metal Zr as a target, wherein the arcing current is 100A, the magnetic field intensity is 30A, and the frequency is 30Hz to form a metal stress release layer (namely a metal Zr film layer with the thickness of 500 nm);
under the introduction of nitrogenUnder the condition of gas, a magnetic filtration cathode vacuum arc FCVA system is utilized to carry out second magnetic filtration deposition on the metal stress release layer, and the included angle between the ion beam direction and the blade tip of the blisk is 45 degrees o Setting negative bias voltage to be 0kV, duty ratio to be 0.1%, magnetic field intensity to be 50A and frequency to be 100HZ; forming a single-layer ceramic film layer (the component is TiAlN, and the thickness is 15 mu m);
taking the time of introducing nitrogen gas for 5min as a cycle period, sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition, and calculating the nitrogen gas inflow
sccm is-60 to 60sccm to obtain a blisk coating (thickness is 15 μm).
Performance testing
1) The bonding force between the blisk coatings prepared in examples 1 to 3 and comparative example 1 and the blisk substrate is tested by the method described in GB/T30707-2014, and the result is shown in figure 1; as can be seen from FIG. 1, as the negative bias voltage in examples 1 to 3 increases, the bonding strength between the blisk substrate and the coating tends to increase; in contrast, in comparative example 1, there was no negative pressure, and the bonding strength between the blisk substrate and the coating was significantly deviated.
2) The thicknesses (as shown in fig. 2) of the blisk coatings prepared in examples 1 to 3 and comparative example 1 on the air inlet side of the blisk were measured, and the results are shown in fig. 3; as can be seen from FIG. 3, the thickness of the gas entry edge is significantly less than the planar thickness by 15 μm; the thickness of the air inlet edge is increased along with the increase of the negative pressure, but the thickness is only 12.5 mu m at most, which shows that the narrow slit coating capability can be improved; in comparative example 1, the thickness of the inlet edge was only 7.6 μm and only half of the planar thickness without negative pressure, and the plasma diffraction ability was weak.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. A preparation method of a blisk coating is characterized by comprising the following steps:
injecting metal ions into the substrate of the integral bladed disk by using a metal vacuum vapor ion source system, and forming a metal pinning layer on the surface of the substrate;
performing first magnetic filtration deposition on the metal pinning layer by using a first magnetic filtration deposition system to form a metal stress release layer; the metal element in the metal stress release layer is Zr or Mo;
under the condition of introducing nitrogen, performing second magnetic filtration deposition on the metal stress release layer by using a second magnetic filtration deposition system to form a single-layer ceramic film layer; the single-layer ceramic film layer comprises TiN, tiAlN, tiAlCrN or TiAlCrSiN;
sequentially and circularly performing first magnetic filtration deposition and second magnetic filtration deposition on the single-layer ceramic membrane layer by taking the time t for introducing nitrogen as a cycle period to obtain a blisk coating;
the calculation formula of the nitrogen gas input is
sccm, wherein t represents the time of introducing nitrogen in minutes; s represents the air input and has the unit of sccm;
the magnetic filtering bent pipes of the first magnetic filtering system and the second magnetic filtering system are respectively provided with a first magnetic field control device;
a second magnetic field control device is arranged around the blisk in the blisk coating;
and a negative pressure device is arranged on the blisk.
2. The method of claim 1, wherein the substrate is a TC4 or TC11 titanium alloy.
3. The preparation method of claim 1, wherein in the metal vacuum vapor ion source system, an included angle between the direction of ion beam current and the tip of a blisk is 25-45% o 。
4. The method according to claim 1, wherein the metal used for the metal ion implantation is Zr or Mo, the implantation voltage of the metal ion implantation is 10 to 45 kV, the beam intensity is 1 to 10 mA, and the implantation dose is 1 x (10) 15 ~10 16 ）/cm 2 The implantation depth is 100 to 320nm.
5. The method of claim 1, wherein the first magnetic filtration system is a magnetic Filtration Cathode Vacuum Arc (FCVA) system; the included angle between the ion beam direction in the magnetic filtration cathode vacuum arc FCVA system and the blade tip of the blisk is 10-90 DEG o (ii) a The arcing current of the first magnetic filtration deposition is 90 to 120A, the magnetic field intensity is 20 to 100A, and the frequency is 20 to 100Hz.
6. The production method according to claim 1 or 5, wherein the thickness of the metal stress release layer is 10 to 1000 nm.
7. The method of claim 1, wherein the second magnetic filtration system is a magnetic Filtration Cathode Vacuum Arc (FCVA) system; the negative bias voltage of the second magnetic filtration deposition is 1 to 25kV, and the duty ratio is 0.0001 to 20 percent; the arcing current of the second magnetic filtration deposition is 90 to 120A, the magnetic field intensity is 20 to 100A, and the frequency is 20 to 100Hz; the thickness of the ceramic film layer is 1 to 20 mu m.
8. The preparation method according to claim 1, wherein an alternating current coil is arranged in the diameter range of the blisk, and the magnetic field strength of the alternating current coil is-10 to +10mT.
9. The blisk coating prepared by the preparation method according to any one of claims 1 to 8, wherein the blisk coating comprises a blisk base layer, a metal pinning layer and a metal stress release layer and a ceramic film layer which are sequentially stacked in a laminating manner, the metal stress release layer and the ceramic film layer are sequentially stacked in a circulating manner, and the outermost layer of the blisk coating is the metal stress release layer.
10. Use of the blisk coating of claim 9 in an axial flow blisk engine.
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| JP2001087628A (en) * | 1999-09-27 | 2001-04-03 | Sintokogio Ltd | Filter having photocatalytic capacity |
| CN105779958A (en) * | 2015-12-10 | 2016-07-20 | 北京师范大学 | Method and device for depositing sand erosion-resisting nano composite film on blade of helicopter |
| CN107326361A (en) * | 2017-07-13 | 2017-11-07 | 西安交通大学 | Gradient multi-layer composite coatings structure with high-impact corrosion energy and preparation method thereof |
| CN107326360A (en) * | 2017-07-13 | 2017-11-07 | 西安交通大学 | A kind of erosion resistant coating structure of nanometer multilayer graded composite and preparation method thereof |
| CN109097744A (en) * | 2018-09-19 | 2018-12-28 | 北京师范大学 | A kind of pulsed magnetic filter deposition device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
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|---|---|---|---|---|
| JP2001087628A (en) * | 1999-09-27 | 2001-04-03 | Sintokogio Ltd | Filter having photocatalytic capacity |
| CN105779958A (en) * | 2015-12-10 | 2016-07-20 | 北京师范大学 | Method and device for depositing sand erosion-resisting nano composite film on blade of helicopter |
| CN107326361A (en) * | 2017-07-13 | 2017-11-07 | 西安交通大学 | Gradient multi-layer composite coatings structure with high-impact corrosion energy and preparation method thereof |
| CN107326360A (en) * | 2017-07-13 | 2017-11-07 | 西安交通大学 | A kind of erosion resistant coating structure of nanometer multilayer graded composite and preparation method thereof |
| CN109097744A (en) * | 2018-09-19 | 2018-12-28 | 北京师范大学 | A kind of pulsed magnetic filter deposition device |
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