CN115044871B - NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and preparation method thereof - Google Patents

NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and preparation method thereof Download PDF

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CN115044871B
CN115044871B CN202210727363.XA CN202210727363A CN115044871B CN 115044871 B CN115044871 B CN 115044871B CN 202210727363 A CN202210727363 A CN 202210727363A CN 115044871 B CN115044871 B CN 115044871B
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王鹏
张弘
白小刚
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Lanzhou Institute of Chemical Physics LICP of CAS
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
    • C22C19/055—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 20% but less than 30%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
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    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C22C30/02—Alloys containing less than 50% by weight of each constituent containing copper
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

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Abstract

The invention provides a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and a preparation method thereof, and relates to the technical field of lubricating materials. The invention provides a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material which comprises an Inconel-718 alloy transition layer and a NiCrFeMoNbAg high-entropy alloy layer which are sequentially arranged on the surface of a base material. The Inconel-718 alloy is used as a transition layer, so that the bonding force of the lubricating film and the base material at high temperature is optimized, and the bearing capacity and the abrasion resistance of the film are improved; the invention takes the NiCrFeMoNbAg high-entropy alloy layer as the lubricating layer, improves the bearing capacity of the film, reduces friction and abrasion, simultaneously inhibits the high-temperature diffusion of Ag and other elements, and ensures the high-temperature stability of the components and the structure of the film.

Description

NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and preparation method thereof
Technical Field
The invention relates to the technical field of lubricating materials, in particular to a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and a preparation method thereof.
Background
The industry has a great demand for solid lubricating materials in high-temperature environments and alternating-temperature environments. Silver is an important tribological material in a wide range of applications, being used as a coating material for motion mechanisms to provide normal/high temperature lubrication functions due to its excellent ductility, low shear, thermo-chemical stability (especially high temperature oxidation resistance) and high temperature diffusion coefficient.
In practical applications, silver and harder metals are often used to form non-uniform alloys to optimize the bonding strength of pure silver to the substrate and the load-bearing capacity of the coating. However, the high temperature environment can greatly promote the diffusion of silver in the coating to the surface layer, thereby leading to rapid failure of the lubricating coating and reducing the life of the coating.
Disclosure of Invention
The invention aims to provide a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and a preparation method thereof, and the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material provided by the invention has excellent lubricating property at room temperature to 600 ℃ and has a long service life.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material which comprises an Inconel-718 alloy transition layer and a NiCrFeMoNbAg high-entropy alloy layer which are sequentially arranged on the surface of a substrate.
Preferably, the thickness of the Inconel-718 alloy transition layer is 200-250 nm; the thickness of the NiCrFeMoNbAg high-entropy alloy layer is 800-1200 nm.
Preferably, the content of each element in the NiCrFeMoNbAg high-entropy alloy layer is as follows by atomic percentage: 20 to 30 percent of nickel, 10 to 15 percent of chromium, 8 to 15 percent of iron, 10 to 20 percent of molybdenum, 10 to 20 percent of niobium, 20 to 30 percent of silver, and the total content of aluminum and copper is less than 0.4 percent.
The invention provides a preparation method of a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material in the technical scheme, which comprises the following steps:
preparing an Inconel-718 alloy transition layer on the surface of a base material by using an Inconel-718 alloy target as a magnetron sputtering target and adopting a magnetron sputtering technology;
and (3) taking the Inconel-718 alloy target, the MoNb target and the Ag target as magnetron sputtering targets, and preparing a NiCrFeMoNbAg high-entropy alloy layer on the surface of the Inconel-718 alloy transition layer by adopting a magnetron sputtering technology to obtain the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material.
Preferably, before the Inconel-718 alloy transition layer is prepared, the method further comprises the following steps: the substrate is preheated and surface cleaned in sequence.
Preferably, the preheating temperature is 100 to 300 ℃.
Preferably, the surface cleaning comprises: adjusting the air pressure of the chamber to 3-5 Pa, applying a bias voltage of-400-500V, and cleaning the surface of the substrate by using high-energy argon ions.
Preferably, when the Inconel-718 alloy transition layer is prepared, a direct-current power supply is adopted to sputter an Inconel-718 alloy target, and the power of the direct-current power supply is 100-200W; and applying a bias voltage of-50V to-200V on the substrate by using a bias power supply.
Preferably, when the NiCrFeMoNbAg high-entropy alloy layer is prepared, an Inconel-718 alloy target, a MoNb target and an Ag target are sputtered simultaneously by adopting a direct-current power supply, wherein the power of the direct-current power supply corresponding to the Inconel-718 alloy target, the MoNb target and the silver target is 150-200W, 100-200W and 30-60W respectively; and applying a bias voltage of-50V to-200V on the substrate by using a bias power supply.
Preferably, in the process of preparing the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material, the substrate keeps rotating at the speed of 5-15 r/min.
The invention provides a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material which comprises an Inconel-718 alloy transition layer and a NiCrFeMoNbAg high-entropy alloy layer which are sequentially arranged on the surface of a substrate. The Inconel-718 alloy is used as a transition layer, so that the tensile stress between the base material and the NiCrFeMoNbAg high-entropy alloy layer due to lattice mismatch and thermal mismatch is relieved, the bonding force between the lubricating film and the base material at high temperature is optimized, and the high-temperature bearing capacity and the abrasion resistance of the film are improved; meanwhile, compared with the traditional chromium and titanium transition layer, the Inconel-718 alloy transition layer reduces the number of target heads, reduces the requirements on equipment and improves the process adaptability of different magnetron sputtering equipment for preparing the film. The invention takes the NiCrFeMoNbAg high-entropy alloy layer as the lubricating layer, improves the bearing capacity of the film, reduces friction and abrasion, simultaneously inhibits the high-temperature diffusion of Ag and other elements, and ensures the high-temperature stability of the components and the structure of the film.
The invention also provides a preparation method of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material in the technical scheme, the invention uses an easily-purchased Inconel-718 alloy target to provide Ni, cr, fe and partial Mo and Nb elements for the NiCrFeMoNbAg high-entropy alloy layer, simplifies the preparation process of the target and reduces the production cost of the lubricating film material; the preparation method provided by the invention is simple and feasible, the thickness of the lubricating film material is controllable, the process reproducibility is good, and the method has good process reliability and feasibility of batch production.
Drawings
FIG. 1 is a crystal structure diagram of a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in examples 1-2 of the present invention;
FIG. 2 is a surface and cross-sectional profile of a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in example 1 of the present invention;
FIG. 3 is a graph showing the film-based bonding force of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in examples 1 to 2 of the present invention and a comparison with a pure silver film;
FIG. 4 is a graph showing the average friction coefficient of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in examples 1-2 of the present invention at 25-600 ℃ and the comparison with a pure silver film;
FIG. 5 is a graph showing the wear rate of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in examples 1-2 of the present invention at 25-600 ℃ and the comparison with a pure silver film;
FIG. 6 is a surface and cross-sectional profile of a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in example 2 of the present invention.
Detailed Description
The invention provides a NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material which comprises an Inconel-718 alloy transition layer and a NiCrFeMoNbAg high-entropy alloy layer which are sequentially arranged on the surface of a substrate.
The NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material provided by the invention comprises an Inconel-718 alloy transition layer arranged on the surface of a base material. In the invention, the atomic percentage content of each element in the Inconel-718 alloy transition layer is preferably as follows: 50.1% of nickel, 24.5% of chromium, 18.8% of iron, 2.4% of molybdenum, 3.5% of niobium, 0.65% of aluminum and 0.05% of copper.
In the invention, the thickness of the Inconel-718 alloy transition layer is preferably 200-250 nm.
The NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material provided by the invention comprises a NiCrFeMoNbAg high-entropy alloy layer arranged on the surface of the Inconel-718 alloy transition layer. In the invention, the content of each element in the NiCrFeMoNbAg high-entropy alloy layer is preferably as follows by atomic percentage: 20 to 30 percent of nickel, 10 to 15 percent of chromium, 8 to 15 percent of iron, 10 to 20 percent of molybdenum, 10 to 20 percent of niobium, 20 to 30 percent of silver, and the total content of aluminum and copper is less than 0.4 percent. In a specific embodiment of the present invention, the content of each element in the NiCrFeMoNbAg high-entropy alloy layer is, in atomic percentage: 22 to 28 percent of nickel, 12 to 14 percent of chromium, 10 to 11 percent of iron, 11 to 17 percent of molybdenum, 11 to 17 percent of niobium and 22 to 25 percent of silver. In the invention, the thickness of the NiCrFeMoNbAg high-entropy alloy layer is preferably 800-1200 nm.
In the invention, the friction coefficient of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material is preferably lower than 0.4, more preferably lower than 0.32 at the temperature of between room temperature and 600 ℃; the wear rate is preferably less than 17.5X 10 -5 mm 3 N -1 m -1 . In the invention, the film-based bonding force between the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and the base material is preferably greater than 30N, and more preferably 32-37N.
The invention also provides a preparation method of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material in the technical scheme, which comprises the following steps:
preparing an Inconel-718 alloy transition layer on the surface of a base material by using an Inconel-718 alloy target as a magnetron sputtering target and adopting a magnetron sputtering technology;
the Inconel-718 alloy target, the MoNb target and the Ag target are used as magnetron sputtering targets, and a NiCrFeMoNbAg high-entropy alloy layer is prepared on the surface of the Inconel-718 alloy transition layer by adopting a magnetron sputtering technology, so that the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material is obtained.
The invention takes an Inconel-718 alloy target as a magnetron sputtering target and adopts a magnetron sputtering technology to prepare an Inconel-718 alloy transition layer on the surface of a base material. Before the Inconel-718 alloy transition layer is prepared, the invention preferably further comprises the following steps: the substrate is preheated and surface cleaned in sequence. In the present invention, the temperature of the preheating is preferably 100 to 300 ℃, more preferably 200 ℃. In the present invention, the preheating is preferably performed in a magnetron sputtering chamber; the preheating is preferably carried out under vacuum conditions; the pressure of the magnetron sputtering chamber during preheating is preferably lower than 1.5X 10 -3 Pa. In the present invention, the surface cleaning preferably comprises: adjusting the air pressure of the chamber to 3-5 Pa, applying a bias voltage of-400-500V, and cleaning the surface of the substrate by using high-energy argon ions. In the present invention, the time for the surface cleaning is preferably 5 to 10min.
In the present invention, the base material is preferably a high-temperature resistant material, more preferably a high-temperature alloy, and particularly preferably W18Cr4V steel. In the process of preparing the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material, the substrate preferably keeps rotating; the rotation rate is preferably 5 to 15r/min.
In the invention, when the Inconel-718 alloy transition layer is prepared, a direct-current power supply is preferably adopted to sputter the Inconel-718 alloy target, and the power of the direct-current power supply is preferably 100-200W; the bias voltage power supply is preferably used for applying a bias voltage of-50V to-200V, more preferably-150V, to the substrate. In the invention, the Inconel-718 alloy transition layer is preferably prepared in an argon atmosphere; the flow rate of argon gas is preferably 40sccm. When the Inconel-718 alloy transition layer is prepared, the air pressure of a magnetron sputtering chamber is preferably 0.6-0.8 Pa, and more preferably 0.65-0.7 Pa. In the invention, when the Inconel-718 alloy transition layer is prepared, the deposition time is preferably 15-20 min.
After the Inconel-718 alloy transition layer is obtained, the invention takes an Inconel-718 alloy target, a MoNb target and an Ag target as magnetron sputtering targets, and prepares a NiCrFeMoNbAg high-entropy alloy layer on the surface of the Inconel-718 alloy transition layer by adopting a magnetron sputtering technology to obtain the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material. In the present invention, the atomic percent of Mo to Nb in the MoNb target is preferably 1:1.
In the invention, when the NiCrFeMoNbAg high-entropy alloy layer is prepared, a direct-current power supply is preferably adopted to simultaneously sputter an Inconel-718 alloy target, an MoNb target and an Ag target, wherein the power of the direct-current power supply corresponding to the Inconel-718 alloy target, the MoNb target and the silver target is preferably 150-200W, 100-200W and 30-60W respectively; the bias power supply is preferably used for applying a bias voltage of-50V to-200V, more preferably-100V to the substrate. In the invention, the Inconel-718 alloy target, the MoNb target and the Ag target are respectively connected with an independent direct-current power supply. In the present invention, the dc power of the silver target is more preferably 40 to 50W. In the invention, when the NiCrFeMoNbAg high-entropy alloy layer is prepared, the deposition time is preferably 40-60 min. In the invention, the NiCrFeMoNbAg high-entropy alloy layer is preferably prepared in an argon atmosphere; the flow rate of argon gas is preferably 40sccm. When the NiCrFeMoNbAg high-entropy alloy layer is prepared, the gas pressure of the magnetron sputtering chamber is preferably 0.6-0.8 Pa, and more preferably 0.65-0.7 Pa.
The NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared by the invention has excellent normal-temperature/high-temperature lubricity. The target materials adopted by the invention are all easy-to-prepare materials, the film preparation process is simple and feasible, the components of the prepared film materials are controllable, the process reproducibility is good, and the mass production can be realized.
The technical solution of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. It should be apparent that the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The base material adopted in the embodiment is W18Cr4V steel; the purity of argon is more than 99.999 percent; in the film coating process, the air pressure of the cavity is adjusted by utilizing a valve of the turbo molecular pump.
Example 1
The film preparation equipment is a commercial magnetron sputtering coating device provided with three independent targets, the target head is positioned above the equipment chamber, and each target is provided with an independent direct current power supply. Inconel-718 alloy targets, moNb targets (Mo: nb =1:1 in atomic percent) and silver targets were mounted on the three targets, respectively. Placing a substrate cleaned in advance in a sample disc of a cavity of a magnetron sputtering device, vacuumizing and heating the substrate to 200 ℃; when the air pressure of the cavity is lower than 1.0 multiplied by 10 -3 Introducing argon (the flow rate is 40 sccm) after Pa, adjusting the pressure of the cavity to 3Pa by adjusting a molecular pump gate valve, applying a bias voltage of-400V to the substrate, and bombarding the surface of the substrate by ionized argon ions to achieve the purpose of cleaning the surface of the substrate, wherein the process lasts for 10 minutes; adjusting the air pressure of the cavity to 0.65Pa, and utilizing a direct-current power supply to sputter an Inconel-718 alloy target to deposit a transition layer, wherein the power of the direct-current power supply is 200W, the deposition time is 20 minutes, and the bias voltage applied to the base material in the process is-150V; then, the power supply power of the Inconel-718 alloy target is kept unchanged at 200W, and a direct current power supply is usedRespectively exciting the MoNb target and the Ag target to deposit an Ag-containing high-entropy alloy layer (NiCrFeMoNbAg high-entropy alloy layer), wherein the power of the MoNb target is 100W, the power of the Ag target is 40W, the bias voltage of the substrate is reduced to-100V in the process, and the deposition time is 60 minutes, so that the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material is obtained.
The NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in this example is a double-layer structure, and is composed of an Inconel-718 alloy transition layer and a NiCrFeMoNbAg high-entropy alloy layer, which are sequentially deposited on the surface of a substrate, wherein the Inconel-718 alloy transition layer is 250nm thick, and the NiCrFeMoNbAg high-entropy alloy layer is 1200nm thick. The NiCrFeMoNbAg high-entropy alloy layer comprises the following elements in percentage by atom: 28% Ni,14% Cr,11% Fe,11% Mo,11% Nb,25% Ag. As shown in fig. 1, the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in this example is a face-centered cubic crystal, and the surface and cross-sectional morphologies are shown in fig. 2, as can be seen from fig. 2, the prepared NiCrFeMoNbAg high-entropy alloy layer is an equiaxial crystal, and the grain size is less than 100nm; the Inconel-718 alloy transition layer is of a columnar crystal structure.
The performance of the film is as follows: the film-based binding force of the prepared film material is tested by using a scratch tester, as shown in fig. 3, the film-based binding force of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and the substrate is 32N. The tribological performance of the prepared film material is evaluated by using a HT-3000 ball-disc high-temperature friction and abrasion tester, and the dual is Si with the diameter of 3 mm 3 N 4 The ball load is 2N, the friction radius is 5mm, the sliding linear velocity is 8.93cm/s, the friction test is carried out in the atmospheric environment, the ambient temperature is 25-600 ℃, the total friction stroke is 157m, the results are shown in tables 1-2, 4 and 5, the average friction coefficient of the prepared film material is lower than 0.32 in the environment of 25-600 ℃, and the wear rate is lower than 17.5 multiplied by 10 -5 mm 3 N -1 m -1 And has excellent lubricating performance.
Example 2
The equipment, target and bias cleaning process were the same as in example 1. Putting a substrate cleaned in advance into a sample disc of a cavity of a magnetron sputtering device, vacuumizing to 200 ℃, and heating the substrate; waiting cavityAir pressure lower than 1.5X 10 -3 Introducing argon (with the flow rate of 40 sccm) after Pa, and performing a bias cleaning process for 10 minutes; then, carrying out Inconel-718 transition layer deposition under the environment that the air pressure of a chamber is 0.65Pa, selecting a direct-current power supply as a power supply, applying a bias voltage of-150V to the substrate, and carrying out deposition for 20 minutes; and then keeping the Inconel-718 alloy target open, simultaneously opening the MoNb target and the Ag target (a direct-current power supply with power of 200W and 50W respectively) to deposit the NiCrFeMoNbAg high-entropy alloy layer, adjusting the bias voltage of the substrate to-100V in the process, and obtaining the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material after 60 minutes of deposition.
The thickness of the Inconel-718 alloy transition layer in the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared by the embodiment is 250nm, and the thickness of the NiCrFeMoNbAg high-entropy alloy layer is 1200nm. The NiCrFeMoNbAg high-entropy alloy layer comprises the following elements in percentage by atom: 22% Ni,12% Cr,10% Fe,17% Mo,17% Nb,22% Ag. As shown in FIG. 1, the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared in this example is a face-centered cubic crystal, and the surface and cross-sectional morphology is shown in FIG. 6.
Film performance: as shown in FIG. 3, the film-based bonding force between the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and the substrate is 37N. The results of the tribological performance evaluation of the film materials prepared in the same manner as in example 1 are shown in tables 1-2, FIG. 4 and FIG. 5, and the average friction coefficient of the film materials is less than 0.4 and the wear rate is less than 17X 10 at room temperature-600 deg.C -5 mm 3 N -1 m -1 。
Comparative example 1
The preparation process of the base material and the transition layer is the same as that of the example 1, the Inconel-718 is used as the transition layer, the silver film is deposited on the Inconel-718 used as the transition layer, the thickness of the silver film is 1200nm, and the silver film is marked as a pure silver film.
The performance of the film is as follows: as shown in fig. 3, the pure silver film had a film-based bonding force of 8.5N with the substrate. The results of the evaluation of tribological properties are shown in tables 1 to 2, fig. 4 and fig. 5 in the same manner as in example 1.
TABLE 1 average coefficient of friction of films prepared in examples 1-2 and comparative example 1
Figure BDA0003711360440000081
TABLE 2 abrasion rates of the thin films prepared in examples 1 to 2 and comparative example 1
Figure BDA0003711360440000082
As can be seen from the test results of the above examples and comparative examples, the film-base binding force, the friction coefficient and the wear rate of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material prepared by the method are superior to those of a pure Ag film.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

Claims (10)

1. A NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material comprises an Inconel-718 alloy transition layer and a NiCrFeMoNbAg high-entropy alloy layer which are sequentially arranged on the surface of a substrate;
the preparation method of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material comprises the following steps:
preparing an Inconel-718 alloy transition layer on the surface of a base material by using an Inconel-718 alloy target as a magnetron sputtering target and adopting a magnetron sputtering technology;
and (3) taking the Inconel-718 alloy target, the MoNb target and the Ag target as magnetron sputtering targets, and preparing a NiCrFeMoNbAg high-entropy alloy layer on the surface of the Inconel-718 alloy transition layer by adopting a magnetron sputtering technology to obtain the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material.
2. The NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material as claimed in claim 1, wherein the thickness of the Inconel-718 alloy transition layer is 200-250 nm; the thickness of the NiCrFeMoNbAg high-entropy alloy layer is 800-1200 nm.
3. The NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material as claimed in claim 1, wherein the content of each element in the NiCrFeMoNbAg high-entropy alloy layer is as follows by atomic percentage: 20 to 30 percent of nickel, 10 to 15 percent of chromium, 8 to 15 percent of iron, 10 to 20 percent of molybdenum, 10 to 20 percent of niobium, 20 to 30 percent of silver, and the total content of aluminum and copper is less than 0.4 percent.
4. The preparation method of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material as claimed in any one of claims 1 to 3, which comprises the following steps:
preparing an Inconel-718 alloy transition layer on the surface of a base material by using an Inconel-718 alloy target as a magnetron sputtering target and adopting a magnetron sputtering technology;
and (3) taking the Inconel-718 alloy target, the MoNb target and the Ag target as magnetron sputtering targets, and preparing a NiCrFeMoNbAg high-entropy alloy layer on the surface of the Inconel-718 alloy transition layer by adopting a magnetron sputtering technology to obtain the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material.
5. The method of making according to claim 4, further comprising, prior to making the Inconel-718 alloy transition layer: the substrate is preheated and surface cleaned in sequence.
6. The method of claim 5, wherein the pre-heating temperature is 100 to 300 ℃.
7. The method of manufacturing according to claim 5, wherein the surface cleaning comprises: adjusting the air pressure of the chamber to 3-5 Pa, applying a bias voltage of-400-500V, and cleaning the surface of the substrate by using high-energy argon ions.
8. The preparation method according to claim 4, wherein when the Inconel-718 alloy transition layer is prepared, a direct-current power supply is adopted to sputter an Inconel-718 alloy target, and the power of the direct-current power supply is 100-200W; and applying a bias voltage of-50V to-200V on the substrate by using a bias power supply.
9. The preparation method of claim 4, wherein when the NiCrFeMoNbAg high-entropy alloy layer is prepared, an Inconel-718 alloy target, a MoNb target and an Ag target are sputtered simultaneously by using a direct-current power supply, and the power of the direct-current power supply corresponding to the Inconel-718 alloy target, the MoNb target and the silver target is 150-200W, 100-200W and 30-60W respectively; and applying a bias voltage of-50V to-200V on the substrate by using a bias power supply.
10. The preparation method of claim 4, wherein the substrate is kept rotating at a speed of 5-15 r/min during the preparation of the NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material.
CN202210727363.XA 2022-06-24 2022-06-24 NiCrFeMoNbAg high-entropy alloy wide-temperature-range lubricating film material and preparation method thereof Active CN115044871B (en)

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