CN114959592A - 一种自相似碗中半壳金属纳米结构以及制备方法 - Google Patents
一种自相似碗中半壳金属纳米结构以及制备方法 Download PDFInfo
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- CN114959592A CN114959592A CN202210545787.4A CN202210545787A CN114959592A CN 114959592 A CN114959592 A CN 114959592A CN 202210545787 A CN202210545787 A CN 202210545787A CN 114959592 A CN114959592 A CN 114959592A
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- 239000002184 metal Substances 0.000 title claims abstract description 81
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 81
- 239000002086 nanomaterial Substances 0.000 title claims abstract description 53
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 239000004793 Polystyrene Substances 0.000 claims abstract description 108
- 229920002223 polystyrene Polymers 0.000 claims abstract description 76
- 239000010410 layer Substances 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 29
- 239000010931 gold Substances 0.000 claims description 19
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 17
- 229910052737 gold Inorganic materials 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000002356 single layer Substances 0.000 claims description 14
- 239000000243 solution Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 238000001020 plasma etching Methods 0.000 claims description 8
- 239000000725 suspension Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 238000007865 diluting Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 3
- 238000010790 dilution Methods 0.000 claims description 2
- 239000012895 dilution Substances 0.000 claims description 2
- 238000003491 array Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000002131 composite material Substances 0.000 abstract description 2
- 238000012545 processing Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 51
- 238000004611 spectroscopical analysis Methods 0.000 description 11
- 230000005684 electric field Effects 0.000 description 7
- 230000005672 electromagnetic field Effects 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 230000008033 biological extinction Effects 0.000 description 5
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 3
- 238000000479 surface-enhanced Raman spectrum Methods 0.000 description 3
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- VYXSBFYARXAAKO-WTKGSRSZSA-N chembl402140 Chemical compound Cl.C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-WTKGSRSZSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
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- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
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- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
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CN202210545787.4A CN114959592B (zh) | 2022-05-19 | 2022-05-19 | 一种自相似碗中半壳金属纳米结构以及制备方法 |
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CN202210545787.4A CN114959592B (zh) | 2022-05-19 | 2022-05-19 | 一种自相似碗中半壳金属纳米结构以及制备方法 |
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CN114959592A true CN114959592A (zh) | 2022-08-30 |
CN114959592B CN114959592B (zh) | 2024-03-26 |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050224779A1 (en) * | 2003-12-11 | 2005-10-13 | Wang Zhong L | Large scale patterned growth of aligned one-dimensional nanostructures |
CN101691207A (zh) * | 2009-09-28 | 2010-04-07 | 中山大学 | 一种微纳结构的制备方法 |
CN102565024A (zh) * | 2012-01-13 | 2012-07-11 | 中国科学技术大学 | 基于表面等离子体激元局域场耦合效应的表面增强拉曼散射基底及其制备方法 |
CN104707992A (zh) * | 2014-12-01 | 2015-06-17 | 中国科学院合肥物质科学研究院 | 一种超结构Au/Ag@Al2O3@Ag纳米球阵列的制备方法及其SERS性能 |
US20160377549A1 (en) * | 2015-06-24 | 2016-12-29 | Industry-University Cooperation Foundation Sogang University | Nanogap structure having ultrasmall void between metal cores and molecular sensing apparatus and method using the same, and method for preparing the nanogap structure by selective etching |
CN109592635A (zh) * | 2019-01-22 | 2019-04-09 | 杭州电子科技大学 | 一种可控制备复合型纳米图纹阵列的方法 |
CN112924436A (zh) * | 2021-01-29 | 2021-06-08 | 山东师范大学 | 一种银包裹的碗状二硫化钼复合金纳米颗粒sers基底及其制备方法和应用 |
-
2022
- 2022-05-19 CN CN202210545787.4A patent/CN114959592B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050224779A1 (en) * | 2003-12-11 | 2005-10-13 | Wang Zhong L | Large scale patterned growth of aligned one-dimensional nanostructures |
CN101691207A (zh) * | 2009-09-28 | 2010-04-07 | 中山大学 | 一种微纳结构的制备方法 |
CN102565024A (zh) * | 2012-01-13 | 2012-07-11 | 中国科学技术大学 | 基于表面等离子体激元局域场耦合效应的表面增强拉曼散射基底及其制备方法 |
CN104707992A (zh) * | 2014-12-01 | 2015-06-17 | 中国科学院合肥物质科学研究院 | 一种超结构Au/Ag@Al2O3@Ag纳米球阵列的制备方法及其SERS性能 |
US20160377549A1 (en) * | 2015-06-24 | 2016-12-29 | Industry-University Cooperation Foundation Sogang University | Nanogap structure having ultrasmall void between metal cores and molecular sensing apparatus and method using the same, and method for preparing the nanogap structure by selective etching |
CN109592635A (zh) * | 2019-01-22 | 2019-04-09 | 杭州电子科技大学 | 一种可控制备复合型纳米图纹阵列的方法 |
CN112924436A (zh) * | 2021-01-29 | 2021-06-08 | 山东师范大学 | 一种银包裹的碗状二硫化钼复合金纳米颗粒sers基底及其制备方法和应用 |
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Effective date of registration: 20240710 Address after: 423000. Left half of Room 401, Building 2, Xiangshan Standard Factory, Chenzhou Nonferrous Metals Industrial Park, Fuyuan Road, Bailutang Town, Suxian District, Chenzhou City, Hunan Province, China Patentee after: Chenzhou Rongyu Environmental Protection Technology Co.,Ltd. Country or region after: China Address before: 410221 Hunan First Normal University, No. 1015, Fenglin Third Road, Yuelu District, Changsha City, Hunan Province Patentee before: HUNAN FIRST NORMAL University Country or region before: China |
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