CN114927106A - Multi-gray-scale pixel pattern generation method, storage medium and computer equipment - Google Patents
Multi-gray-scale pixel pattern generation method, storage medium and computer equipment Download PDFInfo
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- CN114927106A CN114927106A CN202210574463.3A CN202210574463A CN114927106A CN 114927106 A CN114927106 A CN 114927106A CN 202210574463 A CN202210574463 A CN 202210574463A CN 114927106 A CN114927106 A CN 114927106A
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- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
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- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/3433—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
- G09G3/344—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on particles moving in a fluid or in a gas, e.g. electrophoretic devices
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Abstract
The invention discloses a multi-gray-scale pixel pattern generation method, a storage medium and computer equipment, belonging to the technical field of display equipment and comprising the following steps: s1: designing the following formula to calculate the side length of the image pixel; s2: generating a full light-shielding region by using a developing medium; step S3: generating a base pattern using a developing medium; step S4: carrying out reduction processing on the basic pattern; step S5: adjusting the position of the reduced pattern; step S6: superposing the 0 gray scale and the pattern obtained after the position adjustment in the step S5, wherein all the areas for inputting the pattern figure are set as light-transmitting areas to obtain gray scale pixel patterns; step S7: and repeating the steps S4 to S6 to obtain a first multi-gray-scale pixel pattern, and then, reversing the light shading and light passing areas to obtain a second multi-gray-scale pixel pattern. The invention can generate a multi-gray-scale image with more expressive force and obtain a softer display effect.
Description
Technical Field
The present invention relates to the field of display device technologies, and in particular, to a method for generating a multi-gray-scale pixel pattern, a storage medium, and a computer device.
Background
The two-state development means that the two states can be presented, such as monochrome ink printing, any ink drop is the same black, and the visual effect of gray scale is generated by adjusting the distribution density of the ink drop on the paper surface. Similarly, the transmission/non-transmission is a two-state image, and the visual effect of gray scale display can be realized by using a similar principle.
However, if the above method is used to realize n-order gray scale (e.g. 64-order gray scale), n-type droplet distribution density, e.g. 64-type droplet distribution density, needs to be made in a unit area of the imaging medium. For a density distribution near full black and white, i.e., "very close to white" or "very close to black", fine features are created (e.g., when the media substrate is "white", each droplet that is "black" must be very fine and very sparsely distributed to achieve a gray scale very close to full white).
The generation of the microstructure is not favorable for the adhesion of the microstructure and the medium substrate, and the microstructure is easy to fall off and wear and is expressed as macro pattern gray scale deletion, defect and the like. In addition, more sophisticated and expensive equipment is required to produce fine and delicate structures, and in practical applications, it is difficult to generate more expressive multi-gray scale images due to scarcity of high-end equipment and high application cost.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a multi-gray-scale pixel pattern generation method, a storage medium and computer equipment, which can generate a multi-gray-scale image with more expressive force and obtain a softer display effect.
The purpose of the invention is realized by the following scheme:
a method of multi-gray scale pixel pattern generation, comprising:
step S1: the following formula is designed to calculate the side length L of the image pixel:
wherein a is the minimum line width which can be realized by equipment and technology, and n is the gray scale number;
step S2: generating a full shading area, namely a 0 gray scale pixel pattern, by using a developing medium;
step S3: generating a base pattern using a developing medium;
step S4: reducing the basic pattern to make the area of the basic pattern equal to L × i/(n-1), wherein i is the serial number of the ith gray scale pattern;
step S5: adjusting the position of the reduced pattern;
step S6: subtracting the position-adjusted pattern in the step S5 from the 0 th gray-scale pixel pattern generated in the step S2, that is, overlapping the 0 th gray-scale pattern with the position-adjusted pattern in the step S5, and setting all regions where the pattern is input as light-transmitting regions to obtain the i-th gray-scale pixel pattern;
step S7: and repeating the steps S4 to S6 to obtain No. 0 to m gray scale pixel patterns, wherein m is a gray scale value corresponding to a 50% light-passing pattern, and the light-shielding and light-passing regions are inverted to obtain No. m to n-1 gray scales, and after the i-th gray scale in the No. 0 to m gray scales is inverted, the No. k gray scale pixel patterns are obtained.
Further, in step S3, the basic pattern fills the entire pixel region with a zigzag shape along the pixel region.
Further, in step S4, the reduction process is embodied as shortening the pattern by the same length from both end points so that the area of the shortened pattern reaches a given value.
Further, in step S5, the position adjustment is specifically to calculate the centroid of the shortened pattern first, and then to coincide the centroid with the center point of the pixel region.
Further, before step S1, the number of gray levels n and the minimum line width a that can be realized by the device process are predetermined.
Further, the side length of the pixel region is L.
Further, the pixel region includes a black region and a white region, and the widths of the black region and the white region are both the minimum line width a.
Further, in step S7, k ═ n-1) -i.
A storage medium storing a program for performing a method as claimed in any one of the preceding claims when loaded by a processor.
A computer device comprising a memory and a processor, in which memory a program is stored which, when loaded by the processor, is adapted to carry out the method of any of the preceding claims.
The beneficial effects of the invention include:
the n gray scale pixel pattern system realized by the invention has the advantages that the passing area on the 0 to 50 percent light passing pattern and the shading area from the 50 percent light passing pattern to the n-1 gray scale pattern meet the minimum line width constraint which can be realized by the process, and the details are more difficult to distinguish by human eyes and a softer display effect can be obtained by dividing the n gray scale pixel pattern system into a plurality of independent areas or a finer structure. Especially in the field of enlarged projection, even if a fine structure is enlarged, human eyes cannot distinguish details of a pattern, and a more uniform and soft gray scale feeling is formed.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a diagram of a pattern generated by a method according to an embodiment of the present invention.
Detailed Description
All features disclosed in all embodiments of the present specification, or all methods or process steps implicitly disclosed, may be combined and/or expanded, or substituted, in any way, except for mutually exclusive features and/or steps.
Interpretation of terms
Gbase is a self-naming symbol representing a base pattern generated using a visualization medium
Determining the minimum line width which can be realized by the equipment process as a when the number of the gray scales to be generated is n, and setting the gray scale value corresponding to the 50% light-transmitting pattern as m; then, in the 0 to 50% light-transmitting pixel pattern, the flow of the i-th gray scale pattern generation method is as follows:
step 1: the image pixel side length L is calculated using the following formula:
step 2: generating a full shading area, namely a 0 gray scale pixel pattern, by using a developing medium;
and 3, step 3: generating a basic pattern Gbase by using a developing medium;
and 4, step 4: performing a Gbase reduction to make the Gbase pattern area equal to L x L i/(n-1);
and 5: performing Gbase position adjustment;
and 6: subtracting the Gbase pattern from the gray scale pattern No. 0 generated in the step 2, namely overlapping the gray scale No. 0 and the Gbase pattern obtained in the step 5, wherein all areas where Gbase patterns are input are set as light-passing areas; obtaining the i-th gray scale pattern.
Wherein, the Gbase pattern involved in step 3 is shown in fig. 1, where the black area is the Gbase pattern, and it fills the whole pixel area along one side of the pixel area (the dotted line area, the side length is L calculated in step 1); the black and white region widths are the minimum line width a.
And (4) reducing Gbase involved in the step 4, and reducing the Gbase pattern by the same length from the 2 end point, so that the area of the shortened pattern reaches a given value.
And 5, adjusting the Gbase position, namely calculating the centroid of the shortened Gbase pattern, and then overlapping the centroid with the center point of the pixel region.
After obtaining the gray scales from 0 to m, the light-shading and light-passing areas are inverted, so that the gray scales from m to n-1 are obtained, wherein the gray scale from the i th gray scale from the 0 to m is inverted to obtain the gray scale from k, and k is (n-1) -i.
Example 1
A method of multi-gray scale pixel pattern generation, comprising:
step S1: the following formula is designed to calculate the side length L of the image pixel:
wherein a is the minimum line width which can be realized by equipment and process, and n is the number of gray scales;
step S2: generating a full shading area, namely a 0 gray scale pixel pattern, by using a developing medium;
step S3: generating a base pattern using a developing medium;
step S4: reducing the basic pattern to make the area of the basic pattern equal to L × i/(n-1), wherein i is the serial number of the ith gray scale pattern;
step S5: adjusting the position of the reduced pattern;
step S6: subtracting the position-adjusted pattern in the step S5 from the 0 th gray-scale pixel pattern generated in the step S2, that is, overlapping the 0 th gray-scale and the position-adjusted pattern in the step S5, and setting all regions of the pattern input as light-transmitting regions to obtain the i th gray-scale pixel pattern;
step S7: and repeating the steps S4 to S6 to obtain No. 0 to m gray scale pixel patterns, wherein m is a gray scale value corresponding to the 50% light-passing pattern, and the m to n-1 gray scales are obtained by inverting the light-shielding and light-passing regions of the gray scale pixel patterns, and the No. 0 to m gray scales are inverted to obtain the No. k gray scale pixel patterns.
Example 2
Based on embodiment 1, in step S3, the base pattern fills the entire pixel area with zigzags along the pixel area.
Example 3
On the basis of embodiment 1, in step S4, the reduction processing is specifically to shorten the pattern by the same length from both end points so that the shortened pattern area reaches a given value.
Example 4
On the basis of embodiment 1, in step S5, the position adjustment is specifically to calculate the centroid of the shortened pattern first, and then to coincide the centroid with the center point of the pixel region.
Example 5
On the basis of embodiment 1, before step S1, the number n of gray levels is predetermined and the minimum line width a that can be realized by the device process is determined.
Example 6
On the basis of embodiment 2, the side length of the pixel region is L.
Example 7
On the basis of embodiment 2, the pixel region includes a black region and a white region, and both the black region and the white region have a minimum line width a.
Example 8
In step S7, k is (n-1) -i in addition to example 1.
Example 9
A storage medium storing a program for performing the method of any one of embodiments 1 to 8 when the program is loaded by a processor.
Example 10
A computer apparatus comprising a memory and a processor, in which memory a program is stored which, when loaded by the processor, is adapted to carry out the method of any one of embodiments 1 to 8.
The parts not involved in the present invention are the same as or can be implemented using the prior art.
The above-described embodiment is only one embodiment of the present invention, and it will be apparent to those skilled in the art that various modifications and variations can be easily made based on the application and principle of the present invention disclosed in the present application, and the present invention is not limited to the method described in the above-described embodiment of the present invention, so that the above-described embodiment is only preferred, and not restrictive.
In addition to the foregoing examples, those skilled in the art, having the benefit of this disclosure, may derive other embodiments from the teachings of the foregoing disclosure or from modifications and variations utilizing knowledge or skill of the related art, which may be interchanged or substituted for features of various embodiments, and such modifications and variations may be made by those skilled in the art without departing from the spirit and scope of the present invention as set forth in the following claims.
Claims (10)
1. A method for generating a multi-gray-scale pixel pattern, comprising:
step S1: the following formula is designed to calculate the side length L of the image pixel:
wherein a is the minimum line width which can be realized by equipment and technology, and n is the gray scale number;
step S2: generating a full shading area, namely a 0 # gray scale pixel pattern by using a developing medium;
step S3: generating a base pattern using a developing medium;
step S4: carrying out reduction processing on the basic pattern to enable the area of the basic pattern to be equal to L x L i/(n-1), wherein i is the serial number of the ith gray scale pattern;
step S5: adjusting the position of the reduced pattern;
step S6: subtracting the position-adjusted pattern in the step S5 from the 0 th gray-scale pixel pattern generated in the step S2, that is, overlapping the 0 th gray-scale pattern with the position-adjusted pattern in the step S5, and setting all regions where the pattern is input as light-transmitting regions to obtain the i-th gray-scale pixel pattern;
step S7: and repeating the steps S4 to S6 to obtain No. 0 to m gray scale pixel patterns, wherein m is a gray scale value corresponding to a 50% light-passing pattern, and the light-shielding and light-passing regions are inverted to obtain No. m to n-1 gray scale pixel patterns, and the No. i gray scale in the No. 0 to m gray scales is inverted to obtain the No. k gray scale pixel patterns.
2. The method for generating a multi-gray-scale pixel pattern according to claim 1, wherein in step S3, the base pattern fills the entire pixel region with a zigzag pattern along the pixel region.
3. The method of claim 1, wherein in step S4, the reduction process is to shorten the pattern by the same length from two end points so that the shortened pattern area reaches a given value.
4. The method as claimed in claim 1, wherein in step S5, the position adjustment is performed by first calculating a centroid of the shortened pattern and then coinciding the centroid with the center point of the pixel region.
5. The method of claim 1, wherein before step S1, the number of gray levels n and the minimum line width a that can be realized by the equipment process are predetermined.
6. The method according to claim 2, wherein the pixel region has a side length of L.
7. The method as claimed in claim 2, wherein the pixel region comprises a black region and a white region, and the widths of the black region and the white region are the minimum line width a.
8. The multi-gray scale pixel pattern generation method according to claim 1, wherein in step S7, k ═ n-1) -i.
9. A storage medium storing a program for performing the method of any one of claims 1 to 8 when loaded by a processor.
10. A computer device comprising a memory and a processor, in which memory a program is stored which, when loaded by the processor, is adapted to carry out the method of any one of claims 1 to 8.
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101088144A (en) * | 2004-12-24 | 2007-12-12 | 株式会社半导体能源研究所 | Exposure apparatus and semiconductor device manufacturing method using it |
TW201723746A (en) * | 2015-10-12 | 2017-07-01 | 半導體能源硏究所股份有限公司 | Display device and driving method of the same |
KR101767174B1 (en) * | 2016-06-13 | 2017-08-11 | 한국생산기술연구원 | The pattern search method in controlling a mixed color light source for improving quality of wide images |
CN107632480A (en) * | 2017-09-25 | 2018-01-26 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, control method |
CN108831405A (en) * | 2018-09-13 | 2018-11-16 | 重庆惠科金渝光电科技有限公司 | Driving method, device, equipment and the storage medium of display panel |
CN210349260U (en) * | 2019-11-15 | 2020-04-17 | 京东方科技集团股份有限公司 | Display panel and display device |
CN211786373U (en) * | 2020-03-30 | 2020-10-27 | 哈雷医用(广州)智能技术有限公司 | Portable AR wears display device |
CN112820204A (en) * | 2019-11-15 | 2021-05-18 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
CN113763503A (en) * | 2021-01-29 | 2021-12-07 | 北京沃东天骏信息技术有限公司 | Graph generation method, device and computer readable storage medium |
WO2022088660A1 (en) * | 2020-10-29 | 2022-05-05 | 长鑫存储技术有限公司 | Method and apparatus for improving wafer detection sensitivity, and storage medium |
-
2022
- 2022-05-25 CN CN202210574463.3A patent/CN114927106A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101088144A (en) * | 2004-12-24 | 2007-12-12 | 株式会社半导体能源研究所 | Exposure apparatus and semiconductor device manufacturing method using it |
TW201723746A (en) * | 2015-10-12 | 2017-07-01 | 半導體能源硏究所股份有限公司 | Display device and driving method of the same |
KR101767174B1 (en) * | 2016-06-13 | 2017-08-11 | 한국생산기술연구원 | The pattern search method in controlling a mixed color light source for improving quality of wide images |
CN107632480A (en) * | 2017-09-25 | 2018-01-26 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, control method |
CN108831405A (en) * | 2018-09-13 | 2018-11-16 | 重庆惠科金渝光电科技有限公司 | Driving method, device, equipment and the storage medium of display panel |
CN210349260U (en) * | 2019-11-15 | 2020-04-17 | 京东方科技集团股份有限公司 | Display panel and display device |
CN112820204A (en) * | 2019-11-15 | 2021-05-18 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
CN211786373U (en) * | 2020-03-30 | 2020-10-27 | 哈雷医用(广州)智能技术有限公司 | Portable AR wears display device |
WO2022088660A1 (en) * | 2020-10-29 | 2022-05-05 | 长鑫存储技术有限公司 | Method and apparatus for improving wafer detection sensitivity, and storage medium |
CN113763503A (en) * | 2021-01-29 | 2021-12-07 | 北京沃东天骏信息技术有限公司 | Graph generation method, device and computer readable storage medium |
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