CN114923939A - Peak searching method, system and device for X-ray diffraction sample position alignment - Google Patents
Peak searching method, system and device for X-ray diffraction sample position alignment Download PDFInfo
- Publication number
- CN114923939A CN114923939A CN202210555964.7A CN202210555964A CN114923939A CN 114923939 A CN114923939 A CN 114923939A CN 202210555964 A CN202210555964 A CN 202210555964A CN 114923939 A CN114923939 A CN 114923939A
- Authority
- CN
- China
- Prior art keywords
- angle
- diffraction signal
- diffraction
- sample
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 45
- 238000002441 X-ray diffraction Methods 0.000 title claims abstract description 39
- 238000012360 testing method Methods 0.000 abstract description 8
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
The invention discloses a peak searching method, a peak searching system and a peak searching device for X-ray diffraction sample position alignment, and relates to the technical field of X-ray diffraction tests. The method comprises the following steps: respectively emitting scanning light to a target alignment sample at three adjacent angles, and acquiring corresponding diffraction signals as a first diffraction signal, a second diffraction signal and a third diffraction signal; comparing the intensity of the three diffraction signals; if the intensity of the second diffraction signal is not the maximum, rotating the three angles uniformly to the direction corresponding to the diffraction signal with the maximum intensity by a stepping angle, updating the diffraction signal correspondingly, returning to the step of comparing the intensities of the three diffraction signals until the intensity of the second diffraction signal is the maximum, and rotating the target alignment sample to a second angle along the target alignment axis to realize the alignment of the target alignment sample in the direction of the target alignment axis. The invention can reduce the scanning times and the operation data quantity and improve the efficiency of sample position alignment.
Description
Technical Field
The invention relates to the technical field of X-ray diffraction testing, in particular to a peak searching method, a peak searching system and a peak searching device for aligning the position of an X-ray diffraction sample.
Background
X-ray diffraction is a commonly used method of characterizing the crystalline structure of materials. For some special samples, such as thin film samples coated on flat substrates such as glass, the position of the sample needs to be aligned first during testing, so that the surface of the sample is in the light path and parallel to the through light. The alignment process involves the Z axis in the height direction, the ω axis and the χ axis in the horizontal direction, and the Φ axis in the vertical direction, and generally uses a straight-through light or a light with a small incident angle for alignment. For the ω axis and the χ axis in the horizontal direction and the φ axis in the vertical direction, the conventional alignment method scans each axial direction within a certain positive and negative range, and the peak/maximum value is an ideal position, which is called a scanning peak-finding method. Since the respective axial directions are not completely independent of each other, when adjustment is performed in one axial direction, the position of the sample in the other axial direction changes, and therefore, alignment needs to be repeated several times in each axial direction. However, repeated and multiple alignments may take a long time, sometimes even exceeding the time required for testing the sample, especially by using a scanning peak-finding method, which requires a large scanning range, a small step angle, and a large number of steps. Based on this, the traditional scanning peak searching method occupies a long time and cannot well meet the requirement of high-throughput testing.
Disclosure of Invention
The invention aims to provide a peak searching method, a system and a device for aligning the position of an X-ray diffraction sample so as to improve the efficiency of sample position alignment and save time.
In order to achieve the purpose, the invention provides the following scheme:
a peak finding method for X-ray diffraction sample position alignment, the method comprising:
determining any one to-be-aligned axis of the target alignment sample as a target alignment axis, and determining the angle range to be adjusted and the stepping angle of the scanning light according to the target alignment axis;
taking any angle in the angle range to be adjusted as a second angle, subtracting a stepping angle from the second angle to be used as a first angle, and adding a stepping angle to the second angle to be used as a third angle; setting a direction from the second angle to the first angle as a negative direction; taking a direction from the second angle to the third angle as a positive direction;
respectively emitting scanning light to the target alignment sample at the first angle, the second angle and the third angle, and acquiring corresponding diffraction signals as a first diffraction signal, a second diffraction signal and a third diffraction signal;
comparing the intensity magnitudes of the first, second, and third diffraction signals;
if the first diffraction signal is the maximum diffraction signal or the third diffraction signal is the maximum diffraction signal, rotating the first angle, the second angle and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal, updating the first diffraction signal, the second diffraction signal and the third diffraction signal, and returning to the step of comparing the intensities of the first diffraction signal, the second diffraction signal and the third diffraction signal; the maximum diffraction signal is the diffraction signal with the maximum intensity among the first diffraction signal, the second diffraction signal and the third diffraction signal;
and if the second diffraction signal is the maximum diffraction signal, rotating the target alignment sample to the second angle along the target alignment axis to achieve alignment of the target alignment sample in the direction of the target alignment axis.
Optionally, if the first diffraction signal is a maximum diffraction signal or the third diffraction signal is a maximum diffraction signal, the step of rotating the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal, updating the first diffraction signal, the second diffraction signal, and the third diffraction signal, and then returning to compare the intensities of the first diffraction signal, the second diffraction signal, and the third diffraction signal specifically includes:
if the first diffraction signal is the maximum diffraction signal, updating the third diffraction signal by the second diffraction signal, updating the second diffraction signal by the first diffraction signal, simultaneously rotating the first angle, the second angle and the third angle to a negative direction by a stepping angle, controlling the scanning light to be emitted to the target alignment sample at the rotated first angle, updating the first diffraction signal by the diffraction signal acquired after rotation, and returning to the step of comparing the intensities of the first diffraction signal, the second diffraction signal and the third diffraction signal;
if the third diffraction signal is the maximum diffraction signal, the third diffraction signal is updated by the second diffraction signal, the second diffraction signal is updated by the first diffraction signal, the first angle, the second angle and the third angle are simultaneously rotated by a stepping angle to the positive direction, the scanning light is controlled to be emitted to the target alignment sample by the first angle after rotation, the first diffraction signal is updated by the diffraction signal acquired after rotation, and the intensity of the first diffraction signal, the intensity of the second diffraction signal and the intensity of the third diffraction signal are returned and compared.
Optionally, the method further comprises:
and reducing the range of the stepping angle and the angle to be adjusted, and aligning the target alignment sample once again in the direction of the target alignment axis.
Optionally, the initial angle value of the second angle is a central angle of the angle range to be adjusted.
Optionally, the axis to be aligned comprises: the rotation axis chi of the X axis in the horizontal direction, the rotation axis omega of the Y axis in the horizontal direction and the rotation axis phi of the Z axis in the vertical direction.
Optionally, the step angle is one twentieth of the angle range to be adjusted.
Optionally, the step angle after reduction is one fifth of the step angle before reduction.
The invention also provides a peak searching system for the position alignment of the X-ray diffraction sample, which corresponds to the method, and the system comprises:
the device comprises an initialization unit, a scanning unit and a control unit, wherein the initialization unit is used for determining any one to-be-aligned axis of a target alignment sample as a target alignment axis and determining the to-be-adjusted angle range and the stepping angle of scanning light according to the target alignment axis;
a third angle determining unit, configured to use any one of the angles in the angle range to be adjusted as a second angle, use a step angle subtracted from the second angle as a first angle, and use a step angle added to the second angle as a third angle; setting a direction from the second angle to the first angle as a negative direction; taking a direction from the second angle to the third angle as a positive direction;
the scanning unit is used for respectively emitting scanning light to the target alignment sample at the first angle, the second angle and the third angle, and acquiring corresponding diffraction signals as a first diffraction signal, a second diffraction signal and a third diffraction signal;
a comparison unit for comparing the intensity of the first diffraction signal, the second diffraction signal and the third diffraction signal;
a step unit configured to, when the first diffraction signal is a maximum diffraction signal or the third diffraction signal is a maximum diffraction signal, rotate the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal at the same time, update the first diffraction signal, the second diffraction signal, and the third diffraction signal, and then return the updated first diffraction signal, second diffraction signal, and third diffraction signal to the comparison unit; the maximum diffraction signal is the diffraction signal with the maximum intensity among the first diffraction signal, the second diffraction signal and the third diffraction signal;
a sample position alignment unit, configured to rotate the target alignment sample to the second angle along the target alignment axis when the second diffraction signal is a maximum diffraction signal, so as to achieve alignment of the target alignment sample in the direction of the target alignment axis.
The present invention also provides a peak searching device for X-ray diffraction sample position alignment, the device comprising: the X-ray diffraction sample position alignment peak searching system comprises a sample stage, a light source, a detector and the X-ray diffraction sample position alignment peak searching system;
the sample stage is used for placing a target alignment sample; the light source is positioned on one side of the sample stage and used for emitting scanning light to the target alignment sample; the detector is positioned on the other side of the sample stage and used for receiving a diffraction signal generated when the scanning light irradiates the surface of the target alignment sample; the peak searching system for X-ray diffraction sample position alignment is respectively connected with the sample stage, the light source and the detector.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects:
the peak searching method for X-ray diffraction sample position alignment provided by the invention can complete the position alignment work only by scanning a few positions in a large range and in a large step length, does not need to scan all the positions in the angular range, reduces the scanning times and the calculation data quantity, and improves the efficiency of sample position alignment.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a flow chart of a peak finding method for X-ray diffraction sample position alignment according to the present invention;
FIG. 2 is a block diagram of a peak finding system for X-ray diffraction sample position alignment according to the present invention;
FIG. 3 is a schematic diagram of a sample position alignment process;
FIG. 4 is a schematic diagram of the positional relationship of the axes to be aligned;
FIG. 5 is a flow chart of a conventional scanning peak-finding method;
FIG. 6 is a flowchart of a peak finding method according to an embodiment of the present invention.
Description of the symbols: an initialization unit-201, a triangulation unit-202, a scanning unit-203, a comparison unit-204, a stepping unit-205, and a sample position alignment unit-206.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention aims to provide a peak searching method, a peak searching system and a peak searching device for X-ray diffraction sample position alignment, so that the efficiency of sample position alignment is improved, and the time is saved.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
FIG. 1 is a flow chart of a peak searching method for X-ray diffraction sample position alignment according to the present invention. As shown in fig. 1, the method includes:
step 101: and determining any one axis to be aligned of the target alignment sample as a target alignment axis, and determining the angle range to be adjusted and the stepping angle of the scanning light according to the target alignment axis.
Step 102: taking any angle in the angle range to be adjusted as a second angle, subtracting a stepping angle from the second angle to be adjusted to be a first angle, and adding a stepping angle to the second angle to be adjusted to be a third angle; setting a direction from the second angle to the first angle as a negative direction; the direction from the second angle to the third angle is taken as a positive direction.
Step 103: and respectively emitting scanning light to the target alignment sample at the first angle, the second angle and the third angle, and acquiring corresponding diffraction signals as a first diffraction signal, a second diffraction signal and a third diffraction signal.
Step 104: comparing the intensity magnitudes of the first, second, and third diffraction signals.
Step 105: if the first diffraction signal is the maximum diffraction signal or the third diffraction signal is the maximum diffraction signal, rotating the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal, updating the first diffraction signal, the second diffraction signal, and the third diffraction signal, and returning to step 104; the maximum diffraction signal is the diffraction signal with the maximum intensity among the first diffraction signal, the second diffraction signal and the third diffraction signal.
Step 106: and if the second diffraction signal is the maximum diffraction signal, rotating the target alignment sample to the second angle along the target alignment axis to achieve alignment of the target alignment sample in the direction of the target alignment axis.
In this embodiment, the axis to be aligned includes: a rotation axis χ axis of an X axis in a horizontal direction, a rotation axis ω axis of a Y axis in a horizontal direction, and a rotation axis Φ axis of a Z axis in a vertical direction.
Preferably, the initial angle value of the second angle is a central angle of the angle range to be adjusted. The stepping angle is one twentieth of the range of the angle to be adjusted. However, the present invention is not limited to this, and may be adjusted according to the length, width, thickness, diffraction performance, and the like of the target alignment sample.
Further, step 105 specifically includes:
step 1051: if the first diffraction signal is the maximum diffraction signal, updating the third diffraction signal with the second diffraction signal, updating the second diffraction signal with the first diffraction signal, simultaneously rotating the first angle, the second angle and the third angle to a negative direction by a stepping angle, controlling the scanning light to be emitted to the target alignment sample at the rotated first angle, updating the first diffraction signal with the diffraction signal acquired after rotation, and returning to step 104.
Step 1052: if the third diffraction signal is the maximum diffraction signal, the third diffraction signal is updated by the second diffraction signal, the second diffraction signal is updated by the first diffraction signal, the first angle, the second angle and the third angle are simultaneously rotated by a stepping angle in the positive direction, the scanning light is controlled to be emitted to the target alignment sample at the rotated first angle, the first diffraction signal is updated by the diffraction signal acquired after rotation, and the step 104 is returned.
As a specific embodiment, after the target alignment sample is aligned once in the target alignment axis direction, the method further includes: and reducing the range of the stepping angle and the angle to be adjusted, and aligning the target alignment sample once again in the direction of the target alignment axis. The coarse alignment is carried out once by adopting a larger step angle, and then the fine alignment is carried out by adopting a smaller step angle, so that a more accurate alignment position of the target alignment sample can be obtained, and the test effect is further improved. In this embodiment, the step angle after the reduction is one fifth of the step angle before the reduction.
The invention also provides a peak searching system for the position alignment of the X-ray diffraction sample, which corresponds to the method. FIG. 2 is a block diagram of a peak finding system for X-ray diffraction sample position alignment according to the present invention. As shown in fig. 2, the system includes:
the initialization unit 201 is configured to determine any one to-be-aligned axis of the target alignment sample as a target alignment axis, and determine an angle range to be adjusted and a stepping angle of the scanning light according to the target alignment axis.
A triangle determining unit 202, configured to use any one angle in the angle range to be adjusted as a second angle, use a step angle subtracted from the second angle as a first angle, and use a step angle added to the second angle as a third angle; setting a direction from the second angle to the first angle as a negative direction; the direction from the second angle to the third angle is taken as a positive direction.
The scanning unit 203 is configured to emit scanning light to the target alignment sample at the first angle, the second angle, and the third angle, respectively, and acquire corresponding diffraction signals as a first diffraction signal, a second diffraction signal, and a third diffraction signal.
A comparing unit 204, configured to compare intensities of the first diffraction signal, the second diffraction signal, and the third diffraction signal.
A step unit 205, configured to, when the first diffraction signal is a maximum diffraction signal or the third diffraction signal is a maximum diffraction signal, rotate the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal, update the first diffraction signal, the second diffraction signal, and the third diffraction signal, and then return to the comparison unit 204; the maximum diffraction signal is the diffraction signal with the maximum intensity among the first diffraction signal, the second diffraction signal, and the third diffraction signal.
A sample position alignment unit 206, configured to rotate the target alignment sample along the target alignment axis to the second angle when the second diffraction signal is a maximum diffraction signal, so as to achieve alignment of the target alignment sample in the direction of the target alignment axis.
Further, the stepping unit 205 includes: a first stepping subunit and a second stepping subunit.
The first stepping subunit is configured to, when the first diffraction signal is the maximum diffraction signal, update the third diffraction signal with the second diffraction signal, update the second diffraction signal with the first diffraction signal, simultaneously rotate the first angle, the second angle, and the third angle in the negative direction by one stepping angle, control the scanning light to be emitted to the target alignment sample at the rotated first angle, update the first diffraction signal with the diffraction signal acquired after rotation, and then return to the comparing unit 204.
The second step subunit is configured to update the second diffraction signal when the third diffraction signal is the maximum diffraction signal, with the second diffraction signal is updated the third diffraction signal, with the first diffraction signal is updated the second diffraction signal, and will the first angle, the second angle and the third angle rotate a step angle to the positive direction simultaneously, control the scanning light is emitted to the target with the first angle after rotation, so as to update the first diffraction signal with the diffraction signal acquired after rotation, and then return to the comparison unit 204.
The invention also provides a peak searching device for the position alignment of the X-ray diffraction sample, which is used for realizing the method, and the device comprises: the system comprises a sample stage, a light source, a detector and the peak searching system for aligning the X-ray diffraction sample position.
Specifically, the sample stage is used for placing a target alignment sample; the light source is positioned at one side of the sample stage and used for emitting scanning light to the target alignment sample; the detector is positioned on the other side of the sample stage and is used for receiving a diffraction signal generated when the scanning light irradiates the surface of the target alignment sample; the peak searching system for X-ray diffraction sample position alignment is respectively connected with the sample stage, the light source and the detector.
The alignment process of the peak searching device for the X-ray diffraction sample position alignment is shown in figure 3, wherein a white square represents a light source, a black square represents a detector, and a black rectangle represents a target alignment sample placed on a sample table.
The sample alignment work before the X-ray diffraction test mainly comprises two parts, namely, the sample is positioned at the center of a light path, namely, the sample is aligned in the Z-axis direction of the height direction; secondly, the diffraction signal generated by irradiating the scanning light to the surface of the sample at a certain incident angle is received by the detector, namely the peak searching alignment is carried out on the sample in the direction of the omega axis and the X axis in the horizontal direction and the phi axis in the vertical direction. The above-mentioned positional relationship of the axes to be aligned is schematically shown in fig. 4.
The peak finding method for X-ray diffraction sample position alignment provided by the present invention is further discussed in detail in a specific embodiment below.
Assuming that the range of the angle to be adjusted is-10 degrees to 10 degrees, a conventional scanning peak searching method is as shown in fig. 5, scanning a target alignment sample every 0.2 degrees within the range of-10 degrees to 10 degrees, acquiring data once to obtain the intensity of a corresponding diffraction signal under the angle, then comparing all intensity values, wherein the angle corresponding to the maximum value is the alignment angle in the axial direction, rotating the target alignment sample to the axial angle, and finishing the alignment in the axial direction.
The peak searching method for aligning the X-ray diffraction sample position specifically adopts a stepping peak searching mode, as shown in fig. 6, scanning is started from the central position in the angle range to be adjusted to obtain intensities a1, a2 and a3 corresponding to three points of-1 degree, 0 degree and 1 degree, the three values are compared, if a1 is the largest, the value of a2 is assigned to a3, the value of a1 is assigned to a2, the intensity value obtained by stepping-1 degree is assigned to a1, and comparison is carried out again; if a3 is maximum, the value of a2 is assigned to a1, the value of a3 is assigned to a2, the intensity value obtained by stepping 1 degree is assigned to a3, and comparison is carried out again; and rotating the sample to an axial angle corresponding to a2 until the comparison size of the three is the maximum of a2, and jumping out of the cycle to finish the alignment of the target alignment sample in the axial direction. If finer alignment is required, the step value 1 is only changed to be smaller, for example, adjusted to 0.2 degrees, and the above steps are repeated around the position corresponding to a 2.
The step peak searching method provided by the invention can finish the position alignment work only by scanning a few positions in a large range and in a large step length; if the precision requirement is very high, the intensity corresponding to a plurality of positions can be scanned in a small range and in a small step length near the position, and the fine alignment of the sample position is completed. Repeated experiments prove that the method provided by the invention can reduce the scanning times and the operation data amount, improve the efficiency of sample position alignment, quickly find the diffraction peak value of the sample and well finish the sample position alignment. Compared with the traditional scanning peak searching method, the method provided by the invention is efficient, quick and time-saving, and can meet the requirement of high-throughput testing.
The embodiments in the present description are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. For the system disclosed by the embodiment, the description is relatively simple because the system corresponds to the method disclosed by the embodiment, and the relevant points can be referred to the description of the method part.
The principles and embodiments of the present invention have been described herein using specific examples, which are provided only to assist in understanding the core concepts of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, the specific embodiments and the application range may be changed. In view of the above, the present disclosure should not be construed as limiting the invention.
Claims (9)
1. A peak finding method for X-ray diffraction sample position alignment, the method comprising:
determining any one axis to be aligned of the target alignment sample as a target alignment axis, and determining the angle range to be adjusted and the stepping angle of the scanning light according to the target alignment axis;
taking any angle in the angle range to be adjusted as a second angle, subtracting a stepping angle from the second angle to be adjusted to be a first angle, and adding a stepping angle to the second angle to be adjusted to be a third angle; setting a direction from the second angle to the first angle as a negative direction; taking a direction from the second angle to the third angle as a positive direction;
respectively emitting scanning light to the target alignment sample at the first angle, the second angle and the third angle, and acquiring corresponding diffraction signals as a first diffraction signal, a second diffraction signal and a third diffraction signal;
comparing the intensity magnitudes of the first, second, and third diffraction signals;
if the first diffraction signal is the maximum diffraction signal or the third diffraction signal is the maximum diffraction signal, rotating the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal, updating the first diffraction signal, the second diffraction signal, and the third diffraction signal, and returning to the step of comparing the intensities of the first diffraction signal, the second diffraction signal, and the third diffraction signal; the maximum diffraction signal is the diffraction signal with the maximum intensity among the first diffraction signal, the second diffraction signal and the third diffraction signal;
and if the second diffraction signal is the maximum diffraction signal, rotating the target alignment sample to the second angle along the target alignment axis to achieve alignment of the target alignment sample in the direction of the target alignment axis.
2. The peak finding method for X-ray diffraction sample position alignment according to claim 1, wherein if the first diffraction signal is the maximum diffraction signal or the third diffraction signal is the maximum diffraction signal, the step of returning and comparing the intensity levels of the first diffraction signal, the second diffraction signal, and the third diffraction signal after simultaneously rotating the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to the angle corresponding to the maximum diffraction signal and updating the first diffraction signal, the second diffraction signal, and the third diffraction signal comprises:
if the first diffraction signal is the maximum diffraction signal, updating the third diffraction signal with the second diffraction signal, updating the second diffraction signal with the first diffraction signal, simultaneously rotating the first angle, the second angle and the third angle to a negative direction by a stepping angle, controlling the scanning light to be emitted to the target alignment sample at the rotated first angle, updating the first diffraction signal with the diffraction signal acquired after rotation, and returning to the step of comparing the intensities of the first diffraction signal, the second diffraction signal and the third diffraction signal;
if the third diffraction signal is the maximum diffraction signal, the third diffraction signal is updated by the second diffraction signal, the second diffraction signal is updated by the first diffraction signal, the first angle, the second angle and the third angle are simultaneously rotated by a stepping angle in the positive direction, the scanning light is controlled to be emitted to the target alignment sample by the rotated first angle, the first diffraction signal is updated by the diffraction signal acquired after rotation, and the intensity of the first diffraction signal, the intensity of the second diffraction signal and the intensity of the third diffraction signal are compared in a returning mode.
3. The peak finding method for X-ray diffraction sample position alignment according to claim 1, further comprising:
and reducing the range of the stepping angle and the angle to be adjusted, and aligning the target alignment sample once again in the direction of the target alignment axis.
4. The peak finding method for X-ray diffraction sample position alignment according to claim 1, wherein the initial angle value of the second angle is a central angle of the angle range to be adjusted.
5. The peak finding method for X-ray diffraction sample position alignment according to claim 1, wherein the axis to be aligned comprises: the rotation axis chi of the X axis in the horizontal direction, the rotation axis omega of the Y axis in the horizontal direction and the rotation axis phi of the Z axis in the vertical direction.
6. The peak finding method for X-ray diffraction sample position alignment according to claim 1, wherein the step angle is one twentieth of the angle range to be adjusted.
7. The peak finding method for X-ray diffraction sample position alignment according to claim 3, wherein the step angle after reduction is one fifth of the step angle before reduction.
8. A peak finding system for X-ray diffraction sample position alignment, the system comprising:
the device comprises an initialization unit, a scanning unit and a control unit, wherein the initialization unit is used for determining any one to-be-aligned axis of a target alignment sample as a target alignment axis and determining the to-be-adjusted angle range and the stepping angle of scanning light according to the target alignment axis;
a third angle determining unit, configured to use any one of the angles in the angle range to be adjusted as a second angle, use the second angle minus a step angle as a first angle, and use the second angle plus a step angle as a third angle; setting a direction from the second angle to the first angle as a negative direction; taking a direction from the second angle to the third angle as a positive direction;
the scanning unit is used for respectively emitting scanning light to the target alignment sample at the first angle, the second angle and the third angle, and acquiring corresponding diffraction signals as a first diffraction signal, a second diffraction signal and a third diffraction signal;
a comparison unit for comparing the intensity of the first diffraction signal, the second diffraction signal and the third diffraction signal;
a step unit configured to, when the first diffraction signal is a maximum diffraction signal or the third diffraction signal is a maximum diffraction signal, rotate the first angle, the second angle, and the third angle by a step angle in a direction from the second angle to an angle corresponding to the maximum diffraction signal at the same time, update the first diffraction signal, the second diffraction signal, and the third diffraction signal, and then return the updated first diffraction signal, second diffraction signal, and third diffraction signal to the comparison unit; the maximum diffraction signal is the diffraction signal with the maximum intensity in the first diffraction signal, the second diffraction signal and the third diffraction signal;
a sample position alignment unit, configured to rotate the target alignment sample to the second angle along the target alignment axis when the second diffraction signal is a maximum diffraction signal, so as to achieve alignment of the target alignment sample in the direction of the target alignment axis.
9. A peak finder apparatus for X-ray diffraction sample position alignment, the apparatus comprising: a sample stage, a light source, a detector and the peak finding system for X-ray diffraction sample position alignment of claim 8;
the sample stage is used for placing a target alignment sample; the light source is positioned at one side of the sample stage and used for emitting scanning light to the target alignment sample; the detector is positioned on the other side of the sample stage and is used for receiving a diffraction signal generated when the scanning light irradiates the surface of the target alignment sample; the peak searching system for X-ray diffraction sample position alignment is respectively connected with the sample stage, the light source and the detector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210555964.7A CN114923939A (en) | 2022-05-19 | 2022-05-19 | Peak searching method, system and device for X-ray diffraction sample position alignment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210555964.7A CN114923939A (en) | 2022-05-19 | 2022-05-19 | Peak searching method, system and device for X-ray diffraction sample position alignment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114923939A true CN114923939A (en) | 2022-08-19 |
Family
ID=82810988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210555964.7A Withdrawn CN114923939A (en) | 2022-05-19 | 2022-05-19 | Peak searching method, system and device for X-ray diffraction sample position alignment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114923939A (en) |
-
2022
- 2022-05-19 CN CN202210555964.7A patent/CN114923939A/en not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103250232B (en) | Surface examining device and method thereof | |
| CN108982452B (en) | Multi-focus scanning three-dimensional imaging method and system based on double-spiral point spread function | |
| JP3610569B2 (en) | Active confocal imaging device and three-dimensional measurement method using the same | |
| JP2002310929A (en) | Defect inspecting device | |
| TWI810527B (en) | System for wafer inspection, defect review tool and associated controllers | |
| JP2000346618A (en) | Method and apparatus for precise alignment for rectangular beam | |
| CN108572063A (en) | A kind of lens of car light solar light focusing point detection device and its application method | |
| CN115219426B (en) | Method for adjusting verticality of semiconductor detection light path relative to wafer surface | |
| CN116754565B (en) | Automatic focusing detection method for optical element full-caliber surface micro-defect photo-induced fluorescence detection | |
| WO2023070283A1 (en) | Wafer bonding device and method | |
| CN114923939A (en) | Peak searching method, system and device for X-ray diffraction sample position alignment | |
| US6576902B2 (en) | Correction method of scanning electron microscope | |
| US9903705B2 (en) | Apparatus for focus control and method for manufacturing semiconductor device | |
| JPH11326229A (en) | Foreign matter inspection apparatus | |
| JP2964137B2 (en) | X-ray fluorescence analyzer that can detect the center of a sample | |
| CN111399204B (en) | Annular scanning imaging system correction method based on back pupil surface imaging | |
| CN216599866U (en) | Lens mounting structure for image chip test and image chip test device | |
| CN117727610B (en) | Reset control method, device and system for sample stage scanning site and storage medium | |
| JP2002310625A (en) | Three-dimensional measuring method and instrument thereof | |
| CN111256816B (en) | Scattered light signal intensity acquisition method and device | |
| JP2007292683A (en) | Sample measuring apparatus and sample stage adjusting method of sample measuring apparatus | |
| CN117233977A (en) | Method for adjusting perpendicularity between motion plane of translation stage and longitudinal axis of optical objective | |
| US9464884B2 (en) | Method for determining the position of a rotation axis | |
| CN117690770A (en) | Centering method of lens system | |
| JP2023544275A (en) | Aligning specimens for inspection and other processes |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20220819 |