CN114921118A - Photocatalytic self-cleaning coating and preparation method and application thereof - Google Patents
Photocatalytic self-cleaning coating and preparation method and application thereof Download PDFInfo
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- CN114921118A CN114921118A CN202210778290.7A CN202210778290A CN114921118A CN 114921118 A CN114921118 A CN 114921118A CN 202210778290 A CN202210778290 A CN 202210778290A CN 114921118 A CN114921118 A CN 114921118A
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- 238000000576 coating method Methods 0.000 title claims abstract description 116
- 239000011248 coating agent Substances 0.000 title claims abstract description 115
- 238000004140 cleaning Methods 0.000 title claims abstract description 79
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 69
- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 67
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 47
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 39
- 239000010937 tungsten Substances 0.000 claims abstract description 39
- 229910052738 indium Inorganic materials 0.000 claims abstract description 34
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 34
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims abstract description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002216 antistatic agent Substances 0.000 claims abstract description 12
- 239000005543 nano-size silicon particle Substances 0.000 claims abstract description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 60
- 239000002244 precipitate Substances 0.000 claims description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 33
- 239000012266 salt solution Substances 0.000 claims description 30
- 239000000243 solution Substances 0.000 claims description 29
- 239000002243 precursor Substances 0.000 claims description 24
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 21
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 21
- 239000011247 coating layer Substances 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 18
- 238000005507 spraying Methods 0.000 claims description 16
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 claims description 15
- 150000002471 indium Chemical class 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- 150000003657 tungsten Chemical class 0.000 claims description 8
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 claims description 6
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims description 4
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 claims description 4
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 3
- 229910001923 silver oxide Inorganic materials 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 4
- 239000000463 material Substances 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 2
- 238000003756 stirring Methods 0.000 description 18
- 239000008367 deionised water Substances 0.000 description 17
- 229910021641 deionized water Inorganic materials 0.000 description 17
- 239000000428 dust Substances 0.000 description 7
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 239000000084 colloidal system Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002957 persistent organic pollutant Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000001132 ultrasonic dispersion Methods 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 2
- 238000003917 TEM image Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 244000005700 microbiome Species 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 241000588724 Escherichia coli Species 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
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- 230000003628 erosive effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
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- 150000003568 thioethers Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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Abstract
The invention provides a photocatalytic self-cleaning coating, which comprises the following components in percentage by mass: nano titanium dioxide: 0.5 to 1.0 percent; nano silicon dioxide: 0.1 to 0.5 percent; at least one of an indium-containing oxide, a tungsten-containing oxide, and a tin-containing oxide: 0.1 to 0.5 percent; antistatic agent: 0.5 to 1.0 percent; water: 97.5 to 98.8 percent. The coating formed by curing the photocatalytic self-cleaning coating has the functions of self-cleaning, antistatic property, wear resistance, ultraviolet absorption and hardening. The invention also provides a preparation method of the photocatalytic self-cleaning coating and application of the photocatalytic self-cleaning coating in solar cell backboard coating.
Description
Technical Field
The invention relates to the technical field of self-cleaning coatings, in particular to a photocatalytic self-cleaning coating and a preparation method and application thereof.
Background
In recent years, photovoltaic modules such as solar cells have been rapidly developed. Meanwhile, the influence of contaminants such as dust on the solar cell is also receiving increasing attention.
The shielding of dust reduces the generated energy of the solar cell, causes hot spot effect and even causes the solar cell to lose efficacy, and the dust itself has certain electrical property and magnetism, and simultaneously the soil property of each region presents different pH values, and this series of dust deposition characteristics can produce very big influence to the normal work of solar cell. In order to maintain the power generation efficiency of the solar cell, regular manual cleaning is required, which requires enormous cleaning costs. Under the background, the self-cleaning technology of the solar cell is developed.
In western or northern China and other areas, the wind is high all the year round, and in addition, in the ground soil environment, the particles have the problems of abrasive wear, adhesive wear and erosive wear on the solar cell back plate, and the coating on the solar cell back plate is worn off quickly after long-time impact, even falls off from the surface of the solar cell back plate, so that the actual effect of the coating is influenced.
Disclosure of Invention
Based on the above, there is a need to provide a photocatalytic self-cleaning coating, so that the coating formed by the photocatalytic self-cleaning coating after curing has the functions of self-cleaning, antistatic, wear-resisting, ultraviolet ray absorbing and hardening.
In addition, a preparation method and application of the photocatalytic self-cleaning coating are also needed to be provided.
The invention provides a photocatalytic self-cleaning coating which comprises the following components in parts by mass:
in some embodiments, the photocatalytic self-cleaning coating comprises the following components in parts by mass:
in some of these embodiments, the antistatic agent comprises at least one of tin oxide, silver oxide, and tungsten oxide.
In some of these embodiments, the nanosilica has a particle size of less than 10 nm.
The invention also provides a preparation method of the photocatalytic self-cleaning coating, which comprises the following steps:
preparing nano titanium dioxide sol;
preparing nano silicon dioxide sol;
preparing at least one of an indium-containing oxide sol, a tungsten-containing oxide sol, and a tin-containing oxide sol; and
mixing the nano titania sol, the nano silica sol, and at least one of the oxide sol, the tungsten-containing oxide sol, and the tin-containing oxide sol, the antistatic agent, and water.
In some of these embodiments, preparing the nano titania sol comprises the steps of:
adding peroxotitanic acid and water into a reaction vessel to obtain a precursor liquid;
heating the reaction container to enable the temperature of the precursor liquid to reach 125-130 ℃, and keeping for 2-4 h to obtain intermediate liquid; and
and reducing the temperature of the intermediate solution to room temperature.
In some embodiments, at least one of the following (1) to (3) is included:
(1) the preparation of the indium-containing oxide sol comprises the following steps:
dissolving 3-5 g of zinc sulfate heptahydrate and 3-5 g of indium precursor in water to obtain an indium salt solution;
dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the indium salt solution to obtain hydroxide precipitate;
dispersing the hydroxide precipitate in water to obtain an intermediate solution; and
dropwise adding hydrogen peroxide into the intermediate liquid according to the molar ratio of the metal indium to the hydrogen peroxide of 1: 1-1: 8, and reacting;
(2) the preparation of the tungsten-containing oxide sol comprises the following steps:
dissolving 3-5 g of zinc sulfate heptahydrate and 3-5 g of tungsten precursor in water to obtain a tungsten salt solution;
dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the indium salt solution to obtain hydroxide precipitate;
dispersing the hydroxide precipitate in water to obtain an intermediate solution; and
dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal tungsten to the hydrogen peroxide of 1: 1-1: 8, and reacting;
(3) the preparation of the tin-containing oxide sol comprises the following steps:
dissolving 3 g-5 g of zinc sulfate heptahydrate and 3 g-5 g of tin precursor in water to obtain a tin salt solution;
1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L is dripped into the indium salt solution to obtain hydroxide precipitate;
dispersing the hydroxide precipitate in water to obtain an intermediate solution; and
and dropwise adding hydrogen peroxide into the intermediate liquid according to the molar ratio of the metal tin to the hydrogen peroxide of 1: 1-1: 8, and reacting.
In some of these embodiments, at least one of:
the indium precursor comprises indium chloride, the tungsten precursor comprises tungstic acid, and the tin precursor comprises tin chloride.
The invention also provides an application of the photocatalytic self-cleaning coating in solar cell backboard coating.
In some of these embodiments, the following steps are included:
cleaning the solar cell back plate;
spraying the photocatalytic self-cleaning coating on the cleaned solar cell backboard to obtain a first coating layer;
drying the first coating layer;
spraying the photocatalytic self-cleaning coating on the dried first coating layer to obtain a second coating layer; and
drying the second coating layer;
wherein the total spraying amount of the photocatalytic self-cleaning coating is 0.02L/m 2 ～0.07L/m 2 。
The nano titanium dioxide in the photocatalytic self-cleaning coating is used as a photocatalyst, the photocatalytic self-cleaning coating is used for forming a coating, under the irradiation of sunlight, the nano titanium dioxide in the coating is excited to form superoxide radical and hydroxyl radical with strong oxidizing property, various organic pollutants adsorbed on the surface of the coating and in micropores can be decomposed, nitrogen oxide, sulfide, organic pollutants and the like are removed through oxidation, and microorganisms such as mould, bacteria and the like contacted with the surface of the coating are killed, so that the coating formed by the photocatalytic self-cleaning coating has the functions of self-cleaning and ultraviolet absorption; the nano silicon dioxide in the photocatalytic self-cleaning coating can enable the coating formed by the photocatalytic self-cleaning coating to have better wear resistance; the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide in the photocatalytic self-cleaning coating are used as conductive substances, so that the antistatic property of the coating formed by the photocatalytic self-cleaning coating can be improved, and meanwhile, the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide are synergistic to improve the hardness of the coating.
Drawings
FIG. 1 is a TEM image of nano-titania in a nano-titania sol prepared in example 1 of the present invention.
FIG. 2 is a TEM image of an indium-containing oxide in an indium-containing oxide sol prepared in example 1 of the present invention.
Fig. 3 is a transmission electron microscope photograph of the tungsten-containing oxide in the tungsten-containing oxide sol prepared in example 1 of the present invention.
Fig. 4 is a transmission electron microscope photograph of tin-containing oxide in the tin-containing oxide sol prepared in example 1 of the present invention.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The invention provides a photocatalytic self-cleaning coating, which comprises the following components in percentage by mass:
in one embodiment, the nanosilica has a particle size of less than 10 nm.
In an embodiment, the photocatalytic self-cleaning coating may comprise only one of the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide, may also comprise two of the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide, and may also comprise all of the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide. Preferably, the photocatalytic self-cleaning coating comprises the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide. Wherein, in the photocatalytic self-cleaning coating, the mass fraction of the indium-containing oxide, the tungsten-containing oxide and the tin-containing oxide is 0.1-0.5%.
In one embodiment, the antistatic agent comprises at least one of tin oxide, silver oxide, and tungsten oxide.
The invention also provides a preparation method of the photocatalytic self-cleaning coating, which comprises the following steps:
and step S11, preparing the nano titanium dioxide sol.
Specifically, the preparation of the nano titanium dioxide sol comprises the following steps:
(1) and diluting the peroxotitanic acid to the mass fraction of the titanium dioxide of 0.1-1% by using water with the conductivity of less than 100 mu S to obtain the precursor liquid.
(2) 3 to 4L of the precursor liquid and 0.5 to 1.5L of water with the conductivity of less than 100 mu S are added into a reaction container.
In one embodiment, the reaction vessel may be an autoclave.
(3) Heating the reaction container to enable the temperature of the precursor liquid to reach 125-130 ℃, and keeping for 2-4 h to obtain intermediate liquid.
Specifically, setting the heating temperature of an autoclave to be 125-130 ℃, setting the heating time of the autoclave to be 2-4 h, and starting heating to obtain the intermediate solution.
(4) And reducing the temperature of the intermediate solution to room temperature.
Specifically, after the heating temperature and the heating time are reached, the temperature of the intermediate liquid in the autoclave is automatically reduced to room temperature, the air release valve is opened, the upper cover valve is opened, and the obtained reaction product is transparent or semitransparent sol, namely the nano titanium dioxide sol.
And step S12, preparing the nano silica sol.
In one embodiment, the nanosilica sol prepared has a pH of from 5 to 7. In one embodiment, the nanosilica in the nanosilica sol has a particle size of less than 10 nm.
Step S13, at least one of an indium-containing oxide sol, a tungsten-containing oxide sol, and a tin-containing oxide sol is prepared.
Wherein the preparation of the indium-containing oxide sol comprises the steps of:
(1) and dissolving 3g to 5g of zinc sulfate heptahydrate and 3g to 5g of indium precursor in water to obtain an indium salt solution.
Specifically, 3g to 5g of zinc sulfate heptahydrate and 3g to 5g of indium chloride are dissolved in 100mL of water to obtain an indium salt solution.
(2) And dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the indium salt solution to obtain hydroxide precipitate.
Specifically, dilute ammonia water with the concentration of 0.5-1.3 mol/L is slowly dripped into the indium salt solution under stirring, colloid generation is observed, 1-10 mL of dilute ammonia water is cumulatively dripped, and after stirring for 30 minutes, precipitate is obtained by centrifugation and washed twice by deionized water, so that hydroxide precipitate is obtained.
(3) And dispersing the hydroxide precipitate in water to obtain an intermediate solution.
Specifically, 0.2g to 0.5g of the hydroxide precipitate is dispersed into 100mL of deionized water, and the intermediate solution is obtained by uniformly dispersing the hydroxide precipitate by ultrasonic.
(4) And dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal indium to the hydrogen peroxide of 1: 1-1: 8, and reacting.
Dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal indium to the hydrogen peroxide of 1: 1-1: 8, and stirring for reacting for 1 hour to form indium-containing oxide sol.
Wherein the preparation of the tungsten-containing oxide sol comprises the following steps:
(1) 3g to 5g of zinc sulfate heptahydrate and 3g to 5g of tungsten precursor are dissolved in water to obtain a tungsten salt solution.
Specifically, 3g to 5g of zinc sulfate heptahydrate and 3g to 5g of tungstic acid are dissolved in 100mL of water to obtain a tungsten salt solution.
(2) And dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the tungsten salt solution to obtain hydroxide precipitate.
Specifically, dilute ammonia water with the concentration of 0.5-1.3 mol/L is slowly dripped into the tungsten salt solution under stirring, colloid is observed to be generated, 1-10 mL of dilute ammonia water is cumulatively dripped, and after stirring for 30 minutes, a precipitate is obtained by centrifugation and is washed twice by deionized water, so that a hydroxide precipitate is obtained.
(3) And dispersing the hydroxide precipitate in water to obtain an intermediate solution.
Specifically, 0.2g to 0.5g of the hydroxide precipitate is dispersed into 100mL of deionized water, and the intermediate solution is obtained by uniformly dispersing the hydroxide precipitate by ultrasonic.
(4) And dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal tungsten to the hydrogen peroxide of 1: 1-1: 8, and reacting.
Dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal tungsten to the hydrogen peroxide of 1: 1-1: 8, and stirring for reaction for 1 hour to form tungsten-containing oxide sol.
Wherein the preparation of the tin-containing oxide sol comprises the steps of:
(1) 3g to 5g of zinc sulfate heptahydrate and 3g to 5g of tin precursor are dissolved in water to obtain a tin salt solution.
Specifically, 3g to 5g of zinc sulfate heptahydrate and 3g to 5g of tin chloride are dissolved in 100mL of water to obtain a tin salt solution.
(2) And dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the tin salt solution to obtain hydroxide precipitate.
Specifically, under stirring, slowly dropwise adding 0.5-1.3 mol/L dilute ammonia water into the tin salt solution, observing that colloid is generated, cumulatively dropwise adding 1-10 mL dilute ammonia water, stirring for 30 minutes, centrifuging to obtain a precipitate, and washing twice with deionized water to obtain hydroxide precipitate.
(3) And dispersing the hydroxide precipitate in water to obtain an intermediate solution.
Specifically, 0.2g to 0.5g of the hydroxide precipitate is dispersed into 100mL of deionized water, and the intermediate solution is obtained by uniformly dispersing the hydroxide precipitate by ultrasonic.
(4) And dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal tin to the hydrogen peroxide of 1: 1-1: 8, and reacting.
Dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metallic tin to the hydrogen peroxide of 1: 1-1: 8, and stirring for reaction for 1h to form tin-containing oxide sol.
Step S14, mixing the nano titania sol, the nano silica sol, and at least one of the oxide sol, the tungsten-containing oxide sol, and the tin-containing oxide sol, the antistatic agent, and water.
Specifically, the nano titanium dioxide sol, the nano silicon dioxide sol, at least one of the oxide sol, the tungsten-containing oxide sol and the tin-containing oxide sol, the antistatic agent and water are respectively mixed in the mass fractions of 0.5% -1.0%, 0.1% -0.5%, 0.5% -1.0% and 97.5% -98.8%, so as to obtain the photocatalytic self-cleaning coating.
The invention also provides an application of the photocatalytic self-cleaning coating in solar cell backboard coating, which comprises the following steps:
step S21, washing the solar cell back plate with water, and washing the solar cell back plate with water when the light intensity is more than or equal to 100mW/cm 2 The drying is carried out by irradiating for 1 to 5 hours under the sunlight.
Specifically, the solar cell backboard to be sprayed with the photocatalytic self-cleaning coating is washed clean by a high-pressure water gun and is exposed to strong sunlight (the light intensity is more than or equal to 100 mW/cm) 2 ) And irradiating for 1-5 hours and drying.
And step S22, spraying the photocatalytic self-cleaning coating on the cleaned solar cell backboard to obtain a first coating layer with the thickness of 100 nm-500 nm.
Specifically, the photocatalytic self-cleaning coating is sprayed on the cleaned solar cell back plate by using a rock field spray gun with the caliber of 1mm, and the cleaned solar cell back plate is sprayed to ensure that 100% of the cleaned solar cell back plate is covered, so that the first coating layer with the thickness of 100 nm-500 nm is obtained.
And step S23, drying the first coating layer.
Specifically, the first coating layer can be irradiated for 0.5-1 h under sunlight to volatilize a solvent (namely water) in the first coating layer.
And step S24, spraying the photocatalytic self-cleaning coating on the dried first dry coating layer to obtain a second coating layer.
And step S25, drying the second coating layer to obtain a coating.
According to the thickness of the required coating, the solar cell backboard can be sprayed for multiple times, and the total spraying amount of the photocatalytic self-cleaning coating is 0.02L/m 2 ～0.07L/m 2 。
The invention has the following beneficial effects:
the nano titanium dioxide in the photocatalytic self-cleaning coating is used as a photocatalyst, the photocatalytic self-cleaning coating forms a coating, under the irradiation of sunlight, the nano titanium dioxide in the coating is excited to form superoxide radicals and hydroxyl radicals with strong oxidizing property, various organic pollutants adsorbed on the surface and in micropores of the coating can be decomposed, nitrogen oxides, sulfides, organic pollutants and the like are removed through oxidation, and microorganisms such as mold, bacteria and the like contacting with the surface of the coating are killed. The coating is irradiated for half an hour under the sunlight, and the sterilization rate of escherichia coli on the coating can reach 99.99%.
And (II) because the nano titanium dioxide in the coating has certain conductivity and is matched with the antistatic agent, the coating has antistatic adsorption capacity. Meanwhile, after the photocatalytic self-cleaning coating is sprayed on the solar cell backboard, the solar cell backboard becomes more smooth in microcosmic view, the relative adhesion area of dust particles is reduced, and the dust particles can slide down more easily, so that the adhesion of dust on the surface of the solar cell backboard can be prevented to the greatest extent from the source, and the solar cell backboard is prevented from becoming dirty.
And (III) due to the hydrophilicity of the photocatalytic self-cleaning coating, a liquid water film with thin molecules is formed on the surface of the coating, and a mesoscopic water layer is diffused on the coating. The hydrophilic coating enables the wetting and spreading of water droplets on the surface of the coating. The contact angle between the coating formed by spraying the photocatalytic self-cleaning coating related by the invention on a solar cell backboard and water is 11 degrees, and after the coating is irradiated by ultraviolet light, the contact angle between the coating and water is 3 degrees, so that a super-hydrophilic surface is formed. On the one hand, this property allows water to preferentially occupy the surface of the coating, while excluding the connection of contaminants to the surface of the coating; on the other hand, the pollutants can be carried away by the redundant water, and the continuous pollution of the pollutants on the surface of the coating is reduced.
And (IV) the photocatalytic self-cleaning coating is applied to a solar cell backboard, so that the surface pollution of the solar cell backboard can be prevented, the hardness and the light transmittance of the surface of the solar cell backboard are enhanced, and the photoelectric conversion efficiency of the solar cell prepared by the solar cell backboard is further improved.
The present invention is further illustrated by the following specific examples and comparative examples.
Example 1
(1) Preparing nano titanium dioxide sol: diluting peroxotitanic acid to the mass fraction of titanium dioxide of 0.5% by using deionized water with the conductivity of 50 [ mu ] S to obtain precursor liquid; adding 4L of precursor liquid into an autoclave, and adding 1.5L of deionized water with the conductivity of 50 muS into the autoclave; setting the heating temperature of an autoclave at 129 ℃ and the heat preservation time at 3 hours, and starting heating. And after the temperature and the time are reached, opening the air escape valve when the temperature is automatically reduced to the room temperature and the pressure is reduced to 0.00MPa, and then opening the upper cover valve to obtain the semitransparent nano titanium dioxide sol.
(2) And preparing the nano silica sol.
(3) Preparing an indium-containing oxide sol: dissolving 3g of zinc sulfate heptahydrate and 3g of indium chloride in 100mL of deionized water to obtain an indium salt solution; slowly dropwise adding 1.3mol/L dilute ammonia water into the indium salt solution under stirring, observing generation of colloid, cumulatively dropwise adding 5mL of dilute ammonia water, stirring for 30 minutes, centrifuging to obtain a precipitate, and washing twice with deionized water to obtain a hydroxide precipitate; dispersing 0.3g of hydroxide precipitate into 100mL of deionized water, and performing ultrasonic dispersion uniformly to obtain an intermediate solution; adding hydrogen peroxide dropwise into the intermediate solution according to the mol ratio of the metal indium to the hydrogen peroxide of 1:5, and stirring and reacting for 1h to form indium-containing oxide sol.
(4) Preparing oxide sol containing tungsten: dissolving 3g of zinc sulfate heptahydrate and 3g of tungstic acid in 100mL of deionized water to obtain a tungsten salt solution; slowly dropwise adding 1.3mol/L dilute ammonia water into the tungsten salt solution under stirring, observing generation of colloid, cumulatively dropwise adding 5mL dilute ammonia water, stirring for 30 minutes, centrifuging to obtain a precipitate, and washing twice with deionized water to obtain a hydroxide precipitate; dispersing 0.3g of hydroxide precipitate into 100mL of deionized water, and performing ultrasonic dispersion uniformly to obtain an intermediate solution; dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal tungsten to the hydrogen peroxide of 1:5, and stirring for reacting for 1h to form oxide sol containing tungsten.
(5) Preparing tin-containing oxide sol: dissolving 3g of zinc sulfate heptahydrate and 3g of tin chloride in 100mL of deionized water to obtain a tin salt solution; slowly dropwise adding 1.3mol/L diluted ammonia water into the tin salt solution under stirring to observe the generation of colloid, cumulatively dropwise adding 5mL diluted ammonia water, stirring for 30 minutes, centrifuging to obtain a precipitate, and washing twice with deionized water to obtain a hydroxide precipitate; dispersing 0.3g of hydroxide precipitate into 100mL of deionized water, and performing ultrasonic dispersion uniformly to obtain an intermediate solution; dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metallic tin to the hydrogen peroxide of 1:5, and stirring for reacting for 1h to form tin-containing oxide sol.
(6) Mixing the nano titanium dioxide sol, the nano silicon dioxide sol, the oxide sol, the tungsten-containing oxide sol and the tin-containing oxide sol, the antistatic agent and water respectively by mass fractions of 0.5%, 0.1%, 0.5% and 98.8% to obtain the photocatalytic self-cleaning coating.
(7) The specific construction method for spraying the photocatalytic self-cleaning coating on the solar cell backboard comprises the following steps: cleaning the solar cell backboard to be sprayed with the photocatalytic self-cleaning coating by using a high-pressure water gun, wherein the water quantity is 220 mW/cm 2 Is irradiated for 2 hours under the sunlight to obtain a dry, clean and pollution-free surface solar cell backboard; spraying a photocatalytic self-cleaning coating on a cleaned solar cell backboard with the thickness of 500mm multiplied by 1000mm by using a rock field spray gun with the caliber of 1.0mm, wherein the spraying sequence is from left to right and from top to bottom, and 100% of the coating is ensured to cover the cleaned solar cell backboard, so that a first coating layer with the thickness of 230nm is obtained; irradiating the first coating layer for 0.5h under sunlight, spraying for the second time after the solvent in the first coating layer is volatilized, spraying for four times in total, and enabling the total spraying amount of the photocatalytic self-cleaning coating to be 0.02L/m 2 。
Comparative example 1
A solar cell backsheet that is not sprayed with a photocatalytic self-cleaning coating is provided.
Respectively carrying out morphology characterization on the prepared nano titanium dioxide sol, the prepared indium-containing oxide sol, the prepared tungsten-containing oxide sol and the prepared tin-containing oxide sol.
Referring to fig. 1, it can be seen that the average particle size of the nano titania in the nano titania sol prepared in example 1 was about 5.08 nm.
Referring to fig. 2 to 4, it can be seen that the indium-containing oxide in the indium-containing oxide sol, the tungsten-containing oxide in the tungsten-containing oxide sol, and the tin-containing oxide in the tin-containing oxide sol prepared in example 1 are all nanoparticles with uniform morphology.
(II) placing the solar cell back sheet sprayed with the photocatalytic self-cleaning coating in example 1 and the solar cell back sheet not sprayed with the photocatalytic self-cleaning coating in comparative example 1 at the same place outdoors, and testing the photoelectric conversion efficiency of the solar cell prepared from the solar cell back sheet sprayed with the photocatalytic self-cleaning coating in example 1 and the solar cell prepared from the solar cell back sheet not sprayed with the photocatalytic self-cleaning coating in comparative example 1 respectively after the same time.
The test results show that the photoelectric conversion efficiency of the solar cell prepared from the solar cell back sheet sprayed with the photocatalytic self-cleaning coating in example 1 is improved by 0.3% compared with the photoelectric conversion efficiency of the solar cell prepared from the solar cell back sheet not sprayed with the photocatalytic self-cleaning coating in comparative example 1.
(III), dropping the photocatalytic self-cleaning coating prepared in the example 1 on hydrophilized glass, drying the photocatalytic self-cleaning coating at an inclination angle of 30 degrees at room temperature to form a uniform coating, and testing the contact angle of the coating and water. The coating was then placed under an ultraviolet lamp with lambda at 365nm for 0.5 hour and the contact angle of the irradiated coating with water was measured.
The test results showed that the non-irradiated coating had a contact angle with water of 7.6 ° and the irradiated coating had a contact angle with water of 2.5 °. This is because under the irradiation of ultraviolet lamp, hydroxyl species are generated on the surface of the coating, and the hydrophilicity of the coating is improved.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent should be subject to the appended claims.
Claims (10)
1. The photocatalytic self-cleaning coating is characterized by comprising the following components in percentage by mass:
0.5 to 1.0 percent of nano titanium dioxide;
0.1 to 0.5 percent of nano silicon dioxide;
0.1 to 0.5 percent of at least one of oxide containing indium, oxide containing tungsten and oxide containing tin;
0.5 to 1.0 percent of antistatic agent;
97.5 to 98.8 percent of water.
2. The photocatalytic self-cleaning coating material as claimed in claim 1, comprising the following components in parts by mass:
0.5 to 1.0 percent of nano titanium dioxide;
0.1 to 0.5 percent of nano silicon dioxide;
0.1 to 0.5 percent of oxide containing indium, oxide containing tungsten and oxide containing tin;
0.5 to 1.0 percent of antistatic agent;
97.5 to 98.8 percent of water.
3. Photocatalytic self-cleaning coating as claimed in claim 1, characterized in that the antistatic agent comprises at least one of tin oxide, silver oxide and tungsten oxide.
4. The photocatalytic self-cleaning coating of claim 1, wherein the nano silica has a particle size of less than 10 nm.
5. A method for preparing a photocatalytic self-cleaning coating as claimed in any one of claims 1 to 4, characterized by comprising the steps of:
preparing nano titanium dioxide sol;
preparing nano silicon dioxide sol;
preparing at least one of an indium-containing oxide sol, a tungsten-containing oxide sol, and a tin-containing oxide sol; and
mixing the nano titania sol, the nano silica sol, and at least one of the oxide sol, the tungsten-containing oxide sol, and the tin-containing oxide sol, the antistatic agent, and water.
6. The method for preparing the photocatalytic self-cleaning coating as claimed in claim 5, wherein the preparation of the nano titanium dioxide sol comprises the following steps:
adding peroxotitanic acid and water into a reaction container to obtain precursor liquid;
heating the reaction container to enable the temperature of the precursor liquid to reach 125-130 ℃, and keeping for 2-4 hours to obtain intermediate liquid; and
and reducing the temperature of the intermediate liquid to room temperature.
7. The method for preparing a photocatalytic self-cleaning coating material as claimed in claim 5, comprising at least one of the following (1) to (3):
(1) the preparation of the indium-containing oxide sol comprises the following steps:
dissolving 3-5 g of zinc sulfate heptahydrate and 3-5 g of indium precursor in water to obtain an indium salt solution;
dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the indium salt solution to obtain hydroxide precipitate;
dispersing the hydroxide precipitate in water to obtain an intermediate solution; and
dropwise adding hydrogen peroxide into the intermediate liquid according to the molar ratio of the metal indium to the hydrogen peroxide of 1: 1-1: 8, and reacting;
(2) the preparation of the tungsten-containing oxide sol comprises the following steps:
dissolving 3-5 g of zinc sulfate heptahydrate and 3-5 g of tungsten precursor in water to obtain a tungsten salt solution;
dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the indium salt solution to obtain hydroxide precipitate;
dispersing the hydroxide precipitate in water to obtain an intermediate solution; and
dropwise adding hydrogen peroxide into the intermediate solution according to the molar ratio of the metal tungsten to the hydrogen peroxide of 1: 1-1: 8, and reacting;
(3) the preparation of the tin-containing oxide sol comprises the following steps:
dissolving 3-5 g of zinc sulfate heptahydrate and 3-5 g of tin precursor in water to obtain a tin salt solution;
dropwise adding 1-10 mL of ammonia water with the concentration of 0.5-1.3 mol/L into the indium salt solution to obtain hydroxide precipitate;
dispersing the hydroxide precipitate in water to obtain an intermediate solution; and
and dropwise adding hydrogen peroxide into the intermediate liquid according to the molar ratio of the metal tin to the hydrogen peroxide of 1: 1-1: 8, and reacting.
8. The method of preparing a photocatalytic self-cleaning coating as claimed in claim 7, comprising at least one of:
the indium precursor comprises indium chloride, the tungsten precursor comprises tungstic acid, and the tin precursor comprises tin chloride.
9. Use of a photocatalytic self-cleaning coating according to any one of claims 1 to 4 in the coating of a solar cell back sheet.
10. The application of the photocatalytic self-cleaning coating in solar cell backboard coating, as claimed in claim 9, is characterized by comprising the following steps:
cleaning the solar cell back plate;
spraying the photocatalytic self-cleaning coating on the cleaned solar cell backboard to obtain a first coating layer;
drying the first coating layer;
spraying the photocatalytic self-cleaning coating on the dried first coating layer to obtain a second coating layer; and
drying the second coating layer;
wherein the total spraying amount of the photocatalytic self-cleaning coating is 0.02L/m 2 ～0.07L/m 2 。
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