CN114918087B - Coating device for outer wall of circular tube - Google Patents

Coating device for outer wall of circular tube Download PDF

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Publication number
CN114918087B
CN114918087B CN202210391457.4A CN202210391457A CN114918087B CN 114918087 B CN114918087 B CN 114918087B CN 202210391457 A CN202210391457 A CN 202210391457A CN 114918087 B CN114918087 B CN 114918087B
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circular tube
wall
control box
coating
box body
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CN114918087A (en
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陈刚
唐毅
秦源涛
黄俊宇
龚恒翔
肖黎
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Chongqing University of Technology
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Chongqing University of Technology
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/32Shielding elements, i.e. elements preventing overspray from reaching areas other than the object to be sprayed
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/44Sample treatment involving radiation, e.g. heat
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/30Nuclear fission reactors

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a coating device for the outer wall of a circular tube, which comprises a control box, and a lifting unit, an atomizing unit and a reaction unit which are arranged on the control box, wherein a circular tube substrate is rotatably arranged on the lifting unit; the reaction unit is including arranging in metal soaking plate on the control box, this metal soaking plate heats through evenly distributed iodine tungsten lamp above that, establish quartz cavity on the metal soaking plate, the pipe substrate is located this quartz cavity, be equipped with the thermocouple in the quartz cavity, this thermocouple pass through the wire with the control box electricity is connected, and solution is in get into after the atomizing in the atomizing unit quartz cavity realizes carry out the coating film on the pipe substrate. The invention adopts the principle of ultrasonic atomization pyrolysis spraying as film deposition, realizes the preparation of the film on the outer wall of the tubular sample, particularly the preparation of the oxide film, has the characteristics of simple and reasonable structure, convenient operation and maintenance, small environmental pollution and low comprehensive cost, and solves the difficulty of the growth of the film on the outer wall of the circular tube.

Description

Coating device for outer wall of circular tube
Technical Field
The invention relates to the technical field of film preparation, in particular to a circular tube outer wall coating device.
Background
The film is a material form with thickness dimension much smaller than length dimension, and the thickness of the film material is usually in micron order. Different from blocks and powder, the film has special shape, so that the structure, mechanical property, thermal property, electrical property and optical property are also special, not only is an idea provided for material modification, but also the application field of the material is expanded.
Most solid film materials are fabricated on a substrate or substrate. Substrates are used as attachments for thin film materials in a variety of geometric configurations, and planar substrates are most common whether prepared or tested. However, in practical applications, the case of a planar substrate is not common, and there are cases where a non-planar substrate such as a circular tube-shaped substrate is used in a large amount. It is well known that there are dimensional effects in film materials that are different from bulk materials, and that almost all physical properties are significantly related to film thickness. Therefore, the control of the film thickness is an important parameter for controlling the properties thereof. When most of the film preparation methods are applied to a planar substrate, the uniformity or the accurate regulation and control performance of the film thickness can be effectively ensured, and similar conditions exist in the physical property test method. However, with non-planar substrates, certain difficulties and uncertainties exist. Even with the same thin film manufacturing method, if the same apparatus and process are used for manufacturing without difference regardless of the geometrical characteristics of the substrate, the finally obtained thin film material cannot obtain the optimum performance. Therefore, different coating equipment needs to be designed according to different preparation methods, substrate characteristics and other factors which need to be considered.
Disclosure of Invention
Aiming at the technical problems at present, the invention provides a device for realizing coating of the outer wall of a circular tube by using the principle of ultrasonic atomization pyrolysis spraying as film deposition, which not only meets the purpose of scientific research and teaching, but also can be used for small-scale production, and has the characteristics of simple and reasonable structure, convenient operation and maintenance, small environmental pollution and low comprehensive cost.
In order to achieve the above purpose, the invention provides the following technical scheme:
a coating device for the outer wall of a circular tube comprises a control box, and a lifting unit, an atomizing unit and a reaction unit which are arranged on the control box, wherein a circular tube substrate is rotatably arranged on the lifting unit;
the reaction unit is including arranging in metal soaking plate on the control box, this metal soaking plate heats through evenly distributed iodine tungsten lamp above that, establish quartz cavity on the metal soaking plate, the pipe substrate is located this quartz cavity, be equipped with the thermocouple in the quartz cavity, this thermocouple pass through the wire with the control box electricity is connected, and solution is in get into after the atomizing in the atomizing unit quartz cavity realizes carry out the coating film on the pipe substrate.
Preferably, a cavity cover plate is arranged on the quartz cavity, a sapphire soaking plate is arranged in the quartz cavity, and the circular tube substrate is positioned between the sapphire soaking plate and the cavity cover plate.
So set up, sapphire soaking plate and cavity apron can provide even and stable temperature field, and the film of being convenient for grows.
Preferably, a heat shield is arranged on the metal soaking plate.
So set up, the heat shield can prevent on the one hand that high temperature from damaging other parts of equipment, and on the other hand reduces thermal radiation, reduces the energy consumption to the required temperature of coating film reaction is maintained to lower energy consumption, has also formed external and inside in addition and has insulated against heat relatively, and it is less to guarantee that inside temperature field distribution receives external environment influence.
Preferably, the lifting unit comprises a vertical lifting platform arranged on the control box, the vertical lifting platform is connected with a cross beam, two ends of the cross beam are respectively connected with a rotating shaft mechanism, the two rotating shaft mechanisms are oppositely arranged and coaxial along the horizontal direction, the rotating shaft mechanisms are driven by a motor, and two ends of the circular tube substrate are respectively connected with the rotating shaft mechanisms at the corresponding ends.
So set up, the distance of accessible vertical lift platform adjustment pipe substrate and sapphire soaking board on the one hand, drive pivot mechanism through the motor in the on the other hand working process, and then drive the pipe substrate at the uniform velocity and rotate, guarantee film growth thickness homogeneity.
Preferably, one end of the cross beam is connected with the vertical lifting platform, and the other end of the cross beam is arranged in the limit groove in a sliding mode along the vertical direction.
Through setting up the spacing groove, bearing horizontal hunting when can effectively avoid rotating and reciprocating.
Preferably, the rotating shaft mechanism comprises a rotating shaft which is rotatably connected to the end part of the cross beam, a rotating pin is connected to the rotating shaft through a spring and is coaxially arranged with the rotating shaft, and two ends of the circular tube substrate are connected to the rotating pins at the corresponding ends.
Preferably, the atomizing unit is including locating support on the control box is equipped with two at least atomizing jars on this support, two atomizing jars respectively with the blending tank intercommunication, this blending tank and buffer tank intercommunication, this buffer tank with quartz cavity intercommunication, every all be equipped with feed liquor pipe, drain pipe and intake pipe on the atomizing jar, the leakage fluid dram is established to the bottom of blending tank.
So set up, during the use, feed liquor pipe and drain pipe are respectively external a peristaltic pump, can supply by atomizing liquid, maintain liquid level height. The center of the bottom of the atomizing tank is provided with an ultrasonic atomizing sheet which can atomize liquid ultrasonically. The air mixing tank can fully mix the fog drops of the two atomizing tanks, and a liquid discharge port is arranged below the air mixing tank, so that accumulated liquid can be discharged in time. Meanwhile, the redundant solution is conveniently pumped out after the film coating is finished, the interior of the tank body is cleaned, gas enters the atomizing tank through the gas inlet pipe, fog drops are blown into the gas mixing tank and then pushed into the buffer tank, and finally the gas reaches the area near the surface of the circular tube substrate in the quartz cavity stably.
Preferably, a cooling fan is arranged below the atomization tank.
Preferably, the control box comprises a box body, a support lug and an exhaust pipe are arranged on the box body, the buffer tank is supported on the support lug, one end of the exhaust pipe is communicated with the quartz cavity, and the other end of the exhaust pipe extends out of the box body;
a box body cover is hinged on the box body, and the lifting unit and the reaction unit are positioned in the box body cover in the film coating process.
By the arrangement, the exhaust pipe can exhaust waste gas from the rear of the box body, so that high-temperature acid gas is prevented from corroding metal parts of equipment. And the cover of the box body is closed during film coating, so that the influence of external airflow disturbance on the film coating process can be reduced.
Preferably, each unit switch button, the temperature control touch screen and the carrier gas gauge outfit are arranged on the front panel of the box body, and heat dissipation holes are distributed in the side face of the box body.
So set up, the louvre can avoid the inside high temperature of box, is favorable to inside various electrical equipment normal stable work.
Compared with the prior art, the invention has the beneficial effects that: the device not only meets the purpose of scientific research and teaching, but also can be used for small-scale production, has the characteristics of simple and reasonable structure, convenient operation and maintenance, small environmental pollution and low comprehensive cost, solves the difficulty of the growth of the film on the outer wall of the circular tube, simultaneously produces the film with uniform thickness, and can adjust the diameter and the length of the substrate of the circular tube within the internal size range of the quartz cavity according to the requirements.
Description of the drawings:
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic diagram of the control box of FIG. 1;
FIG. 3 is a schematic structural view of the lifting unit of FIG. 1;
FIG. 4 is an internal cross-sectional view of the spindle mechanism of FIG. 3;
FIG. 5 is a schematic structural view of the atomizing unit of FIG. 1;
FIG. 6 is a schematic diagram of the structure of the reaction unit in FIG. 1.
Detailed Description
The present invention will be described in further detail with reference to test examples and specific embodiments. It should be understood that the scope of the above-described subject matter of the present invention is not limited to the following examples, and any technique realized based on the contents of the present invention is within the scope of the present invention.
In the description of the present invention, it is to be understood that the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention.
In the description of the present invention, unless otherwise specified and limited, it is to be noted that the terms "mounted," "connected," and "connected" are to be interpreted broadly, and may be, for example, a mechanical connection or an electrical connection, a communication between two elements, a direct connection, or an indirect connection via an intermediate medium, and specific meanings of the terms may be understood by those skilled in the art according to specific situations.
The device for coating the outer wall of the circular tube as shown in the attached drawings 1-6 comprises a control box 1, and a lifting unit 2, an atomizing unit 3 and a reaction unit 4 which are arranged on the control box 1, wherein a circular tube substrate 25 is rotatably arranged on the lifting unit 2.
Referring to fig. 2, the control box 1 includes a box body 11, a support lug 12 and an exhaust pipe 13 are disposed on the box body 11, the buffer tank 37 is supported on the support lug 12, the exhaust pipe 13 is Z-shaped, one end of the exhaust pipe is communicated with the quartz cavity 42, and the other end of the exhaust pipe extends out of the box body 11.
A box body cover 16 is hinged to one side of the box body 11, the lifting unit 2 and the reaction unit 4 are located in the box body cover 16 in the film coating process, the box body cover 16 can be connected with the box body 11 through hinges, a handle 17 is mounted on the box body cover 16 to facilitate operation, the box body cover 16 can be closed during film coating, and the influence of external air flow disturbance on the film coating process is reduced. A U-shaped groove 18 is provided on the box cover 16, and the buffer tank 37 is just caught at the U-shaped groove 18 when the box cover 16 is closed.
The front panel of the box body 11 is provided with unit switch buttons, a temperature control touch screen and a carrier gas gauge head, and heat dissipation holes 15 are distributed on the side surface of the box body 11, so that the overhigh temperature inside the box body 11 can be avoided, and the normal and stable work of various internal electrical equipment is facilitated.
Referring to fig. 3, the lifting unit 2 includes a vertical lifting platform 21 disposed on the control box 1, a cross beam 22 is connected to the vertical lifting platform 21, one end of the cross beam 22 is connected to the vertical lifting platform 21, and the other end is provided with a bearing, and the bearing is slidably disposed in the limiting groove 23 along the vertical direction.
Two ends of the cross beam 22 are respectively connected with a rotating shaft mechanism, the two rotating shaft mechanisms are oppositely arranged and coaxial along the horizontal direction, one rotating shaft mechanism is connected on a bearing, the other rotating shaft mechanism is connected with an output shaft of the motor 24 and driven by the motor 24 to rotate, and two ends of the circular tube substrate 25 are respectively connected with the rotating shaft mechanisms at the corresponding ends.
As shown in fig. 4, the rotating shaft mechanism includes rotating shafts 26 rotatably connected to the ends of the cross beam 22, one of the rotating shafts 26 is connected to the bearing, the other rotating shaft is connected to the output shaft of the motor 24, a rotating pin 28 is connected to the rotating shaft 26 through a spring 27, the rotating pin 28 is coaxially disposed with the rotating shaft 26 and rotates with the rotating shaft 26, and both ends of the circular tube substrate 25 are connected to the rotating pins 28 at the corresponding ends.
The circular tube substrate 25 is hung in the quartz cavity 42 under the coordination of the rotating shaft 26, the spring 27 and the rotating pin 28, and rotates at a constant speed along with the rotating shaft under the action of the motor 24. The vertical elevating stage 21 can precisely control the interval between the circular tube substrate 25 and the sapphire soaking plate.
Referring to fig. 5, the atomizing unit 3 includes a support 31 disposed on the control box 1, at least two atomizing tanks 32 are disposed on the support 31, an ultrasonic atomizing sheet is disposed at the center of the bottom of the atomizing tank 32, the liquid can be ultrasonically atomized, the two atomizing tanks 32 are respectively communicated with the mixing tank 35, the mixing tank 35 is communicated with the buffer tank 37, the buffer tank 37 is communicated with the quartz cavity 42, the buffer tank 37 is disposed on the lug 12 on the control box 1, each atomizing tank 32 is provided with a liquid inlet pipe 33, a liquid outlet pipe 34 and an air inlet pipe 36, the liquid inlet pipe 33 and the liquid outlet pipe 34 are respectively connected with an external peristaltic pump, the atomized liquid can be supplemented, the liquid level can be maintained, and meanwhile, after the film coating is finished, the redundant solution can be conveniently drawn out, and the inside of the tank can be cleaned. The bottom of the mixing tank 35 is provided with a liquid outlet 351 which can discharge the accumulated liquid in time. The bracket 31 is provided with an atomization circuit board and a heat radiation fan. The carrier gas enters the atomizing tank 32 through the gas inlet pipe 36, and the mist droplets are blown into the mixing tank 35, then pushed into the buffer tank 37, and finally smoothly reach the vicinity of the surface of the round tube substrate 25 in the quartz chamber 42.
Referring to fig. 6, the reaction unit 4 includes a metal soaking plate 41 disposed on the control box 1, the metal soaking plate 41 is disposed below the cross beam, the metal soaking plate 41 is heated by iodine tungsten lamps 47 uniformly distributed thereon, the iodine tungsten lamps 47 are fixed on a iodine tungsten lamp support 46, a quartz cavity 42 is disposed on the metal soaking plate 41, the metal soaking plate 41 can uniformly disperse and transfer heat to the quartz cavity 42 above, a cavity cover plate 43 is disposed on the quartz cavity 42, a sapphire soaking plate 44 is disposed in the quartz cavity 42, the circular tube substrate 25 is disposed between the sapphire soaking plate 44 and the cavity cover plate 43, a thermocouple is disposed in the quartz cavity 42 and electrically connected to the control box 1 through a wire, the solution is atomized in the atomization unit 3 and then enters the quartz cavity 42, and then a film is plated on the circular tube substrate 25.
The quartz cavity 42 is formed by bonding a plurality of quartz plates, is high temperature resistant and acid and alkali resistant, and is convenient for observing the real-time conditions of fog flow and a circular tube substrate in the film coating process, and the grooves 48 on the two sides of the quartz cavity 42 and the two sides of the cavity cover plate 43 are matched, so that the rotating shaft mechanism can conveniently penetrate through the quartz cavity, the air tightness of the quartz cavity can be improved as much as possible, the leakage of high-temperature acid gas can be reduced, and the influence of external airflow change on an airflow field in the quartz cavity can be reduced.
Establish heat exchanger 45 on metal soaking plate 41, establish second recess 49 in the position that corresponds recess 48 in heat exchanger 45 both sides, make things convenient for pivot mechanism to pass equally, heat exchanger material is the stainless steel, and one of them prevents other parts of high temperature damage equipment, and it reduces the heat radiation on the other hand, reduces the energy consumption, maintains the required temperature of coating film reaction with lower energy consumption, has also formed external and inside in addition and has insulated heat relatively, guarantees that inside temperature field distribution receives external environment influence less.
The invention is used as follows:
(1) Opening the cover 16 of the equipment box body, and checking whether the units of each part of the device are normal;
(2) Fixing the circular tube substrate 25 between the two rotating shaft mechanisms, and adjusting the vertical lifting platform 21 to enable the circular tube substrate 25 to be positioned between the cavity cover plate 43 and the sapphire soaking plate 44;
(3) The cavity cover plate 43 and the heat insulation cover 45 are installed, and the box body cover 16 is closed;
(4) Setting a target rotating speed on a front panel of the box body, setting a target temperature by using a temperature control touch screen and starting heating;
(5) Opening a peristaltic pump switch to send the solution into the atomizing tank 32 and maintain the liquid level, setting the air flow speed through a carrier gas gauge head and continuously introducing corresponding gas;
(6) After the temperature is raised to the target temperature and is constant, pressing an atomization switch to start ultrasonic atomization, and starting a film coating experiment;
(7) When the film coating is finished, the atomization switch is turned off, then the heating is stopped, and the gas introduction and the motor turning off can be stopped until the circular tube substrate film sample is cooled to the room temperature;
(8) And the power supply is cut off, the box body cover 16 is opened, the heat insulation cover 45 and the cavity cover plate 43 are taken down, the vertical lifting platform 21 is adjusted to enable the round tube substrate film sample to rise above the quartz cavity 42, and the sample is taken down and placed into the sample box.
The foregoing describes preferred embodiments of the present invention. It should be understood that numerous modifications and variations can be devised by those skilled in the art in light of the above teachings. Therefore, the technical solutions available to those skilled in the art through logic analysis, reasoning and limited experiments based on the prior art according to the concept of the present invention should be within the scope of protection defined by the claims.

Claims (8)

1. The utility model provides a pipe outer wall coating film device which characterized in that: the device comprises a control box (1), and a lifting unit (2), an atomizing unit (3) and a reaction unit (4) which are arranged on the control box (1), wherein a circular tube substrate (25) is rotatably arranged on the lifting unit (2);
the reaction unit (4) comprises a metal soaking plate (41) arranged on the control box (1), the metal soaking plate (41) is heated through iodine tungsten lamps (47) uniformly distributed on the metal soaking plate, a quartz cavity (42) is arranged on the metal soaking plate (41), the circular tube substrate (25) is positioned in the quartz cavity (42), a thermocouple is arranged in the quartz cavity (42) and is electrically connected with the control box (1) through a lead, and solution enters the quartz cavity (42) after being atomized in the atomization unit (3) to realize film coating on the circular tube substrate (25);
a cavity cover plate (43) is arranged on the quartz cavity (42), a sapphire soaking plate (44) is arranged in the quartz cavity (42), and the round tube substrate (25) is positioned between the sapphire soaking plate (44) and the cavity cover plate (43);
atomizing unit (3) is including locating support (31) on control box (1) is equipped with two at least atomizer tank (32) on this support (31), and two atomizer tank (32) communicate with blending tank (35) respectively, this blending tank (35) and buffer tank (37) intercommunication, this buffer tank (37) with quartz cavity (42) intercommunication, every all be equipped with feed liquor pipe (33), drain pipe (34) and intake pipe (36) on atomizer tank (32), leakage fluid dram (351) are established to the bottom of blending tank (35).
2. The device for coating the outer wall of the circular tube of claim 1, wherein: and a heat insulation cover (45) is arranged on the metal soaking plate (41).
3. The device for coating the outer wall of the round pipe according to claim 1, wherein: lifting unit (2) is including locating vertical lift platform (21) on control box (1), connect cross beam (22) on this vertical lift platform (21), the both ends of this cross beam (22) are connected with a pivot mechanism respectively, and two pivot mechanisms set up and coaxial relatively along the horizontal direction, pivot mechanism is driven by motor (24), the both ends of pipe substrate (25) respectively with correspond the end pivot mechanism connects.
4. The device for coating the outer wall of the round pipe according to claim 3, wherein: one end of the cross beam (22) is connected with the vertical lifting platform (21), and the other end of the cross beam is arranged in the limit groove (23) in a sliding mode along the vertical direction.
5. The device for coating the outer wall of the circular tube of claim 4, wherein: the rotating shaft mechanism comprises a rotating shaft (26) which is rotatably connected to the end part of the cross beam (22), a rotating pin (28) is connected to the rotating shaft (26) through a spring (27), the rotating pin (28) and the rotating shaft (26) are coaxially arranged, and two ends of the circular tube substrate (25) are connected to the rotating pin (28) at the corresponding end.
6. The device for coating the outer wall of the round pipe according to claim 5, wherein: the bracket (31) is provided with a heat radiation fan.
7. The device for coating the outer wall of the round pipe according to claim 6, wherein: the control box (1) comprises a box body (11), a support lug (12) and an exhaust pipe (13) are arranged on the box body (11), the buffer tank (37) is supported on the support lug (12), one end of the exhaust pipe (13) is communicated with the quartz cavity (42), and the other end of the exhaust pipe extends out of the box body (11);
a box body cover (16) is hinged on the box body (11), and the lifting unit (2) and the reaction unit (4) are positioned in the box body cover (16) in the film coating process.
8. The device for coating the outer wall of the round pipe according to claim 7, wherein: the portable gas carrier is characterized in that each unit switch button, the temperature control touch screen and the carrier gas gauge outfit are arranged on the front panel of the box body (11), and heat dissipation holes (15) are distributed in the side face of the box body (11).
CN202210391457.4A 2022-04-14 2022-04-14 Coating device for outer wall of circular tube Active CN114918087B (en)

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CN202210391457.4A CN114918087B (en) 2022-04-14 2022-04-14 Coating device for outer wall of circular tube

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Application Number Priority Date Filing Date Title
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CN114918087B true CN114918087B (en) 2023-01-20

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1145859A (en) * 1997-07-28 1999-02-16 Fujitsu Ltd Epitaxial growth equipment
CN101148709A (en) * 2007-11-09 2008-03-26 清华大学 Method and device for extracting high-purity rhenium from tungsten-rhenium alloy
CN106423649A (en) * 2016-11-01 2017-02-22 重庆理工大学 Continuous production-type ultrasonic atomization spraying film-coating equipment
CN108796473A (en) * 2018-06-26 2018-11-13 重庆理工大学 A kind of thermal decomposition preparation method of film
CN110346390A (en) * 2019-06-26 2019-10-18 北京科技大学 The device and method of high flux film preparation and Characterization for Microstructure in situ
CN216048384U (en) * 2021-09-18 2022-03-15 金螳螂精装科技(苏州)有限公司 Mosaic molding installation design structure of assembled atomization fireplace

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1145859A (en) * 1997-07-28 1999-02-16 Fujitsu Ltd Epitaxial growth equipment
CN101148709A (en) * 2007-11-09 2008-03-26 清华大学 Method and device for extracting high-purity rhenium from tungsten-rhenium alloy
CN106423649A (en) * 2016-11-01 2017-02-22 重庆理工大学 Continuous production-type ultrasonic atomization spraying film-coating equipment
CN108796473A (en) * 2018-06-26 2018-11-13 重庆理工大学 A kind of thermal decomposition preparation method of film
CN110346390A (en) * 2019-06-26 2019-10-18 北京科技大学 The device and method of high flux film preparation and Characterization for Microstructure in situ
CN216048384U (en) * 2021-09-18 2022-03-15 金螳螂精装科技(苏州)有限公司 Mosaic molding installation design structure of assembled atomization fireplace

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