CN114916764A - Carding device - Google Patents

Abstract

A carding machine has a base plate, a reciprocating plate and a biasing mechanism. The base plate includes a plurality of slots configured to guide hair into the plurality of slots of the reciprocating plate. The slot of the reciprocating plate is disposed in sliding abutment with the slot of the base plate and is configured as a cutting edge for cutting or slicing hair extending through the slot of the base plate.

Description

Carding device

Cross Reference to Related Applications

This application claims the benefit of U.S. provisional application No. 63/149,197, filed on 12/2/2021, the entire contents of which are incorporated herein by reference.

Technical Field

The present disclosure relates to a grooming device. More particularly, the present disclosure relates to an electric grooming device.

Background

Conventional carding units include a single piece base plate at least partially defined by a plurality of grooves and a reciprocating plate at least partially defined by a plurality of grooves. The monolithic base plate and the shuttle plate are disposed adjacent to each other such that at least the slot of the shuttle plate is adjacent to the slot of the monolithic base plate. In some carding devices, the grooves of the reciprocating plates are in sliding abutment with the grooves of the single substrate. The slots of the reciprocating plate are configured for cutting or slicing hairs that extend through the slots of the monolithic base plate. In use, a surface of the monolithic substrate opposite the surface facing the reciprocating plate is placed in sliding engagement with the combed surface such that hairs protruding from the combed surface extend through the slots of the monolithic substrate and into the slots of the reciprocating plate such that the hairs are cut or chopped when the reciprocating mechanism operates the reciprocating plate.

One drawback of such conventional grooming devices on sensitive, loose, and/or uneven skin is that the user's skin may extend through the slots of the single substrate and be squeezed, cut, and/or scratched in the slots of the reciprocating plate. These detrimental conditions cannot be mitigated by using less pressure or other techniques on the carding machine. In addition, the slots on the shuttle plate on the side opposite the side facing the monolithic substrate are typically exposed or open and are therefore dangerous because objects (e.g., a user's fingers) may touch the slots of the shuttle plate and be squeezed, cut and/or scratched.

Disclosure of Invention

In some embodiments, a carding machine includes a monolithic base plate, a shuttle plate, and a shuttle mechanism. In some embodiments, a single piece of substrate is at least partially defined by opposing first and second ends, a cavity defined at least partially by an arcuate segment of the single piece of substrate proximate the first end thereof, and a plurality of slots disposed along at least a portion of the arcuate segment. In some embodiments, the single piece of substrate from the first end to the second end is one integral piece. In some embodiments, the monolithic substrate prevents sensitive, loose, and/or uneven skin and/or other body parts of the user from extending through the slots of the monolithic substrate and, thus, prevents the skin and/or body parts from being pinched, cut, and/or scratched in the slots of the reciprocating plate. In some embodiments, the reciprocating plate is at least partially defined by a first end and a second end opposite the first end, the first end having a plurality of slots extending into the cavity of the monolithic substrate. In some embodiments, the reciprocating mechanism is operably coupled to the reciprocating plate. In some embodiments, attachments may be placed on the monolithic base plate to increase the distance between the monolithic base plate and the skin, allowing the hair shaft to be held at different lengths. In some embodiments, the hair is clamped at a selected distance from the skin, i.e. for cutting the hair to a desired length.

In some embodiments, the hair is held at a length equal to or at the skin surface. In some embodiments, hairs in the sensitive area are trapped without scratching the user's skin or causing painful razor burns because the slots of the reciprocating plate do not directly touch the skin, allowing for trimming of long hair follicles.

In some embodiments, a carding machine includes a monolithic base plate, a reciprocating plate, a biasing mechanism, and a reciprocating mechanism. In some embodiments, a single piece of substrate is at least partially defined by opposing first and second ends, a cavity defined at least partially by an arcuate segment of the single piece of substrate proximate the first end thereof, and a plurality of slots disposed along at least a portion of the arcuate segment. In some embodiments, the reciprocating plate is at least partially defined by a first end and a second end opposite the first end, the first end having a plurality of slots extending into the cavity of the monolithic substrate. In some embodiments, the biasing mechanism is configured to maintain the first end of the reciprocating plate in sliding abutment within or proximate to the cavity of the monolithic substrate. In some embodiments, the reciprocating mechanism is operably coupled to the reciprocating plate.

Drawings

FIG. 1 is a perspective view illustrating a non-limiting exemplary embodiment of some of the major components within an embodiment of the grooming device of the present disclosure;

FIG. 2 is a perspective view of a non-limiting exemplary embodiment of a monolithic substrate for use with the carding machine of the present disclosure;

FIG. 3 is a perspective view of a non-limiting exemplary embodiment of a reciprocating plate for use with the grooming device of the present disclosure;

FIG. 4 is a perspective view illustrating a non-limiting exemplary embodiment of a single piece base plate and a reciprocating plate coupled to each other for use with the carding device of the present disclosure;

FIG. 5 is a side view of the coupled monolithic base plate and reciprocating plate shown in FIG. 4;

FIG. 6 is a close-up perspective view of the coupled monolithic base plate and reciprocating plate shown in FIG. 4;

FIG. 7 is a side view illustrating an additional non-limiting exemplary embodiment of a single piece base plate and a reciprocating plate for use with the carding apparatus of the present disclosure;

FIG. 8 is a side view showing an additional non-limiting exemplary embodiment of a monolithic base plate and reciprocating plate for use with the carding device of the present disclosure;

FIG. 9 is a side view showing an additional non-limiting exemplary embodiment of a monolithic base plate and reciprocating plate for use with the carding device of the present disclosure;

FIG. 10 is a side view showing an additional non-limiting exemplary embodiment of a single piece base plate and a reciprocating plate for use with the carding apparatus of the present disclosure;

FIG. 11 is a side view showing an additional non-limiting exemplary embodiment of a single piece base plate and a reciprocating plate for use with the carding apparatus of the present disclosure;

FIG. 12 is a side view showing an additional non-limiting exemplary embodiment of a single piece base plate and a reciprocating plate for use with the carding apparatus of the present disclosure;

FIG. 13 shows a grooved end of a non-limiting exemplary embodiment of a reciprocating plate disposed within a cavity of a non-limiting exemplary embodiment of a monolithic substrate for a carding device of the present disclosure;

FIG. 14 shows exemplary angles of non-limiting exemplary embodiments of cavities defined by arcuate segments of a single piece base plate and exemplary angles at cut ends/edges of reciprocating plates for use in the grooming devices of the present disclosure; and

FIG. 15 is a perspective view showing an alternative non-limiting exemplary embodiment of some of the major components within an alternative embodiment of the grooming device of the present disclosure.

Detailed Description

One or more non-limiting exemplary embodiments are disclosed herein with reference to the accompanying drawings, in which like numerals refer to similar (but not necessarily identical) elements. It should be clearly understood that the embodiments described with reference to the drawings are merely exemplary, as any one or more of them may be implemented in alternative ways which will become apparent to those skilled in the art. The figures are not necessarily to scale. Specific structural and/or functional features and details disclosed herein are not to be interpreted as limiting, but as a basis for teaching one skilled in the art. There is no implication or other intent to limit the present disclosure in any way, shape, or form to the embodiments shown and described herein. Accordingly, all variations that provide a similar structure and/or function to those described herein for the embodiments are considered to be within the purview and scope of the disclosure.

FIG. 1 is a perspective view of a non-limiting, exemplary embodiment of some of the major components within an embodiment of a grooming device 10 of the present disclosure. In some embodiments, the grooming device 10 comprises a single piece base plate 12 (e.g., a blade guard), a reciprocating plate 14 (e.g., a cutting blade), and a biasing mechanism 16. As described further below, some embodiments of the grooming device 10 do not have a biasing mechanism such as biasing mechanism 16. In some embodiments, the monolithic substrate 12 is at least partially defined by first and second opposing ends 18 and 20, respectively, a first portion 19, a second portion 21, and an arcuate segment 24. In some embodiments, the first portion 19, the arcuate section 24, and the second portion 21 together define the cavity 22. In some embodiments, the monolithic substrate 12 includes a plurality of slots 26 disposed along at least a portion of the arcuate section 24. In some embodiments, the monolithic substrate 12 includes a tab or cantilever 44 extending away from the first end 18. Although not illustrated, the grooming device 10 comprises a reciprocating mechanism operatively coupled to the reciprocating plate 14 and configured for reciprocating the reciprocating plate 14, as is well known in the art. In some embodiments, a reciprocating mechanism is operably coupled to the reciprocating plate 14. In some embodiments, the reciprocator is operably coupled to a biasing mechanism 16, the biasing mechanism 16 being coupled to the reciprocating plate 14. In some embodiments, the biasing mechanism 16 includes a biasing plate 40 coupled to the reciprocating plate 14 and at least one biasing element 42. In some embodiments, the shuttle plate 14 is at least partially defined by opposing first and second ends 30, 32, respectively (not shown).

As used herein, "monolithic" refers to a continuous sheet of molten material. Examples of materials include, but are not limited to, metals (e.g., stainless steel) and/or may be coated metals and/or ceramic materials, as desired. For clarity, the removable plastic shield attached to the metal/ceramic substrate is not a monolithic substrate as defined herein. In some embodiments, the material is formed by processes including, but not limited to, casting, machine molding, and/or three-dimensional printing.

FIG. 2 is a perspective view of a non-limiting exemplary embodiment of a monolithic substrate 12. In some embodiments, the monolithic substrate 12 is at least partially defined by first and second opposing ends 18 and 20, respectively, a first portion 19, a second portion 21, and an arcuate segment 24. In some embodiments, the first portion 19 extends from the first end 18 to the arcuate section 24. In some embodiments, the second portion 21 extends from the second end 20 to the arcuate section 24. In some embodiments, the first portion 19, the arcuate section 24, and the second portion 21 together define the cavity 22. In some embodiments, the cavity 22 includes an inner surface 140. In some embodiments, the one-piece base plate 12 includes a cavity 22 at least partially defined by an arcuate segment 24 proximate the first end 18. In some embodiments, the single piece base plate 12 includes a plurality of slots 26 disposed along at least a portion of the arcuate section 24. In some embodiments, the monolithic substrate 12 includes a rail 28 disposed proximate the second end 20.

In some embodiments, the thickness of the monolithic base plate 12 and shuttle plate 14 may be any thickness sufficient to support the structural requirements and/or reliability of the overall structure. In some embodiments, different thicknesses of the monolithic substrate 12 and the reciprocating plate 14 are considered to be within the scope of the present disclosure, and so are different materials used for the monolithic substrate 12 and the reciprocating plate 14. In some embodiments, for example and without limitation, the monolithic substrate 12 and/or the reciprocating plate 14 may be austenitic stainless steel, i.e., having a high chromium content compared to other steel alloys, such that they have a higher corrosion resistance. In some embodiments, for example and without limitation, the monolithic base plate 12 and/or the reciprocating plate 14 may be a ferritic stainless steel to take advantage of its magnetic properties, or may be a martensitic stainless steel to increase corrosion resistance, improve tensile strength, and increase the hardness of the monolithic base plate 12 and/or the reciprocating plate 14. In some embodiments, for example and without limitation, the reciprocating plate 14 may be a ceramic material for longer blade life. In some embodiments, for example and without limitation, the monolithic substrate 12 may also be the same material as the reciprocating plate 14, if desired.

Fig. 3 is a perspective view of a non-limiting exemplary embodiment of the reciprocating plate 14. In some embodiments, the shuttle plate 14 is at least partially defined by opposing first and second ends 30 and 32, respectively. In some embodiments, the reciprocating plate 14 includes a plurality of slots 34 disposed along at least a portion of the first end 30 of the reciprocating plate 14. Thus, the reciprocating plate 14 is considered to have at least two distinct "cutting surfaces" or "cutting planes" 136 and 138, defined at least in part by the slot 34 configured as a cutting edge. It will be appreciated that the at least two different cutting surfaces 136 and 138 of the reciprocating plate 14 may be further considered to be defined at least in part by at least a portion of the inner surface 140 (not shown) of the cavity 22 (not shown) into which the slot 34 of the monolithic substrate 12 (not shown) extends, i.e., by at least a portion of the inner surface 140 (not shown) of the slot 34 of the reciprocating plate 14 that is "wrapped" around the cavity 22 (not shown). In some embodiments, the shuttle plate 14 includes at least one tab or abutment 36 disposed near the second end 32 or along the second end 32. In some embodiments, the shuttle plate 14 includes at least one protrusion or post or abutment 36 extending toward the monolithic base plate 12 (not shown). As discussed in fig. 1, although not illustrated, the grooming device 10 comprises a reciprocating mechanism operably coupled to the reciprocating plate 14 and configured for reciprocating the reciprocating plate 14, as is well known in the art. In some embodiments, the reciprocating mechanism is operably coupled to the reciprocating plate 14. In some embodiments, the reciprocator is operably coupled to a biasing mechanism 16, the biasing mechanism 16 being coupled to the reciprocating plate 14. In some embodiments, at least two different cutting surfaces 136 and 138 of the reciprocating plate 14 are not pressed against the monolithic substrate 12 (not shown). Rather, in some embodiments, the pressure on the monolithic substrate is in a direction substantially parallel to the direction of cutting the reciprocating plate 14, substantially in the direction of the cavities 22 (not shown). In some embodiments, the pressure direction is substantially tangential to cutting surfaces 136 and 138. In some embodiments, this different pressure direction may allow the shuttle plate 14 to be pressed away from the cutting surfaces 136 and 138 if a portion of the skin enters through the slot 26 of the monolithic substrate and contacts the slot 34 of the shuttle plate 14. In some embodiments, this may retract the reciprocating plate 14 from the shearing hair shaft, but in one aspect of the present disclosure, scraping, cutting, and/or razor burning on sensitive, loose, and/or uneven skin may also be reduced and/or eliminated.

Fig. 4 and 5 are a perspective view and a side view, respectively, showing the monolithic base plate 12 and the reciprocating plate 14 coupled to each other. In some embodiments, the monolithic substrate 12 is at least partially defined by first and second opposing ends 18 and 20, respectively, a first portion 19, a second portion 21, and an arcuate segment 24. In some embodiments, the first portion 19 extends from the first end 18 to the arcuate section 24. In some embodiments, the second portion 21 extends from the second end 20 to an arcuate section 24. In some embodiments, the first portion 19, the arcuate section 24, and the second portion 21 together define the cavity 22. In some embodiments, the reciprocating plate 14 may be further considered to be at least partially defined by the inner surface 140. In some embodiments, the slots 26 along the arcuate section 24 are configured to direct or guide hairs that protrude into the slots 26 or extend through the slots 26 to or into the slots 34 of the reciprocating plate 14. In some embodiments, the one-piece base plate 12 includes a cavity 22 at least partially defined by an arcuate segment 24 proximate the first end 18. In some embodiments, the shuttle plate 14 includes a first end 30 of the shuttle plate 14 and at least one tab or abutment 36 disposed near or along the second end 32. In some embodiments, at least a portion of the shuttle plate 14 proximate the second end 32 thereof is in sliding abutment or close proximity with at least a portion of the rail 28 disposed proximate the second end 20 of the monolithic base plate 12.

Fig. 6 is a close-up perspective view illustrating the slot 34 on the first end 30 of the reciprocating plate 14, the slot 34 extending into the cavity 22 of the monolithic substrate 12. In some embodiments, the monolithic substrate 12 is at least partially defined by first and second opposing ends 18 and 20, respectively (not shown), a first portion 19, a second portion 21, and an arcuate section 24. In some embodiments, the first portion 19 extends from the first end 18 to the arcuate section 24. In some embodiments, the second portion 21 extends from the second end 20 (not shown) to the arcuate section 24. In some embodiments, the first portion 19, the arcuate section 24, and the second portion 21 together define the cavity 22. In some embodiments, the one-piece base plate 12 includes a cavity 22 at least partially defined by an arcuate segment 24 proximate the first end 18. In some embodiments, the slots 26 along the arcuate section 24 are configured to direct or guide hair that protrudes into the slots 26 or extends through the slots 26 to or into the slots 34 of the reciprocating plate 14. In some embodiments, the slots 34 of the reciprocating plate 14 are configured for cutting or slicing the cutting edges of hairs protruding or extending through the slots 26 of the monolithic substrate 12. As such, in some embodiments, the cutting edge will cut or cut hair protruding into the slot 26 or extending through the slot 26 from either side of the slot 34 of the reciprocating plate 14. Thus, in some embodiments, the shuttle plate 14 is considered to have at least two distinct cutting surfaces 136 and 138 (not shown) at least partially defined by the slot 34 configured as a cutting edge. In some embodiments, it is understood that the at least two different cutting surfaces 136 and 138 of the reciprocating plate 14 may further be considered to be defined at least in part by an inner surface 140 of the cavity 22 that "wraps around" at least a portion of the slot 34 (not shown) of the reciprocating plate 14.

In some embodiments, the slot 34 of the shuttle plate 14 is in sliding abutment or close proximity with at least a portion of the cavity 22. In some embodiments, the slot 34 of the shuttle plate 14 is in sliding abutment or close proximity with at least a portion of the slot 26 disposed along the arcuate section 24 of the monolithic base plate 12.

In some embodiments, at least a portion of the reciprocating plate 14 proximate the second end 32 thereof is in sliding abutment or close proximity with at least a portion of the monolithic substrate 12 proximate the second end 20 thereof. Thus, the monolithic base plate 12 and the reciprocating plate 14 are configured to ensure that the reciprocating plate 14 reciprocates mainly in the lateral direction. The coupling of the monolithic base plate 12 and shuttle plate 14 proximate their respective second ends 20 and 32 inhibits significant movement of the shuttle plate 14 toward and away from the cavity 22. In addition, the coupling of the monolithic base plate 12 and shuttle plate 14 proximate their respective second ends 20 and 34 inhibits significant rotation of the shuttle plate 14 about an axis extending orthogonally through the shuttle plate 14 and about an axis extending orthogonal to a transverse direction or width of the shuttle plate 14 and along a plane of the shuttle plate 14. In other words, the monolithic base plate 12 and the reciprocating plate 14 are coupled for restraining significant roll and deflection of the reciprocating plate 14.

In some embodiments, the shuttle plate 14 includes at least one protrusion or post or abutment 36 (not shown) extending toward the monolithic base plate 12. In some embodiments, at least one protrusion 36 (not shown) is configured to slidably couple with at least a portion of the monolithic substrate 12. In some embodiments, the monolithic substrate 12 includes a complementary opening or slot or channel (not shown) for receiving at least a portion of at least one protrusion 36 (not shown). Thus, the monolithic base plate 12 and shuttle plate 14 are configured to substantially inhibit rolling and deflection of the shuttle plate 14.

In some embodiments, the biasing mechanism 16 is configured to exert sufficient pressure or force on the reciprocating plate 14 to retain the slot 34 within the cavity 22 and in sliding abutment or close proximity to the cavity 22. In some embodiments, the biasing mechanism 16 includes a biasing plate 40 coupled to the reciprocating plate 14 and at least one biasing element 42, the biasing element 42 configured for exerting a pressure or force on the biasing plate 40 to retain the slot 34 within the cavity 22 and in sliding abutment or close proximity with the cavity 22. In some embodiments, the biasing mechanism 16 is configured as an anti-lift mechanism for substantially inhibiting displacement of the shuttle plate 14 away from the monolithic base plate 12. In some embodiments, the biasing mechanism 16 is configured as a "shock absorber".

As used herein, "anti-lift mechanism" means that the first end 18 of the monolithic base plate 12 prevents the shuttle plate 14 from being lifted significantly away from the second portion 21 of the monolithic base plate 12.

As used herein, "preventing" refers to reducing the likelihood of the reciprocating plate 14 lifting off the second portion 21 of the monolithic substrate 12.

As used herein, "substantial lift-off" refers to movement of the reciprocating plate 14 from the second portion 21 of the monolithic substrate 12 by more than about 1 millimeter. In some embodiments, the distance between the first end 18 of the single piece substrate 12 and the reciprocating plate 14 may be equal to or less than about 1 millimeter (mm), or equal to or less than about 0.9mm, or equal to or less than about 0.8mm, or equal to or less than about 0.7mm, or equal to or less than about 0.6mm, or equal to or less than about 0.5mm, or equal to or less than about 0.4mm, or equal to or less than about 0.3mm, or equal to or less than about 0.2mm, or equal to or less than about 0.1 mm.

In some embodiments, the monolithic substrate 12 includes a tab or cantilever 44 extending away from the first end 18. In some embodiments, the tabs or cantilever arms 44 are in sliding abutment with or in close proximity to the shuttle plate 14. In some embodiments, the tab or cantilever 44 is configured as an anti-lift mechanism. Thus, the tabs or cantilevers 44 are configured to inhibit significant displacement of the shuttle plate 14 in a direction away from and/or toward the monolithic substrate 12. Thus, the grooming device will not include a biasing mechanism such as biasing mechanism 16.

FIG. 7 illustrates a non-limiting exemplary embodiment of a monolithic base plate 46 and shuttle plate 48, the monolithic base plate 46 and shuttle plate 48 configured to slidingly abut or closely abut one another. In some embodiments, the shuttle plate 48 includes a plurality of slots, such as the slot 34 (not shown), along at least a portion of the first end 50 that extend into the cavity 52 (e.g., the cavity 22) of the monolithic base plate 46. In some embodiments, the monolithic base plate 46 includes a first end 54, the first end 54 extending into a channel or slot 56 in the reciprocating plate 48 and slidably abutting the channel or slot 56. In some embodiments, at least one surface of the first end 54 that extends into the channel or slot 56 is in close proximity to at least one surface of the channel or slot 56. Thus, the monolithic base plate 46 and shuttle plate 48 are configured to substantially dampen roll and deflection of the shuttle plate 48, and to substantially dampen displacement of the slotted first end 50 into and out of the cavity 52. In some embodiments, the first end 54 extending into the channel or slot 56 at least partially helps to retain the slotted first end 50 within the cavity 52 and in sliding abutment or close proximity with the cavity 52. Thus, the biasing plate 40 and the at least one biasing element 42, i.e., the biasing mechanism 16, are not provided. In some embodiments, a channel or slot may be used to couple an accessory to the grooming device.

In some embodiments, one or both of the first end 54 of the monolithic base plate 46 and the channel or slot 56 in the reciprocating plate 48 extend the entire lateral width of the respective plates 46 and 48. In some embodiments, one or both of the first end 54 of the monolithic base plate 46 and the channel or slot 56 in the reciprocating plate 48 extend a portion of the lateral width of the respective plates 46 and 48. For example, in some embodiments, the first end 54 of the monolithic base plate 46 is configured as at least one tab or cantilever, and the channel or slot 56 in the reciprocating plate 48 extends its entire transverse width. In some embodiments, the first end 54 of the monolithic substrate 46 is configured as at least one tab or cantilever, while the channel or slot 56 is configured as a plurality of channels or slots, wherein each channel or slot is configured to receive one of the plurality of tabs or cantilevers. Of course, each channel or slot will have a sufficient width to move the shuttle plate 48 unimpeded.

FIG. 8 illustrates another non-limiting exemplary embodiment of a monolithic base plate 58 and a shuttle plate 60, the monolithic base plate 58 and the shuttle plate 60 being configured for sliding abutment or close proximity to one another. In several respects, the monolithic base plate 58 is substantially similar to the monolithic base plate 46 (depicted in FIG. 7) and the shuttle plate 60 is substantially similar to the shuttle plate 48. One difference between shuttle plate 60 and shuttle plate 48 (depicted in fig. 7) is that shuttle plate 60 does not include at least one channel or slot, such as channel or slot 56 (depicted in fig. 7), for receiving first end 62 of monolithic base plate 58. In some embodiments, the first end 62 of the monolithic base plate 58 is in sliding abutment with or in close proximity to the shuttle plate 60. In some embodiments, the first end 62 extends the entire lateral width of the monolithic substrate 58. In some embodiments, the first end 62 is configured as at least one tab or cantilever that is in sliding abutment or close proximity to the shuttle plate 60.

FIG. 9 illustrates yet another non-limiting exemplary embodiment of a monolithic base plate 64 and a shuttle plate 66, the monolithic base plate 64 and shuttle plate 66 being configured for sliding abutment or close proximity to one another. In some embodiments, first end 68 of monolithic base plate 64 extends over reciprocating plate 66 and is in sliding abutment or close proximity to reciprocating plate 66. In some embodiments, the first end 68 extends the entire lateral width of the monolithic substrate 64. In some embodiments, the first end 68 is configured as at least one tab or cantilever that is in sliding abutment or close proximity to the shuttle plate 66. In some embodiments, the inner surface 70 of the cavity 72 of the one-piece base plate 64 and the slotted first end 74 of the shuttle plate 66 have complementary geometries or profiles. In some embodiments, the biasing mechanism 16 (not shown) includes a biasing plate 40 coupled to the reciprocating plate 66 and at least one biasing element 42, the biasing element 42 configured for exerting a pressure or force on the biasing plate 40 to retain the groove 34 (not shown) within the inner surface 70 of the cavity 72 and in sliding abutment or close proximity with the inner surface 70 of the cavity 72.

FIG. 10 illustrates another non-limiting exemplary embodiment of a monolithic base plate 76 and a shuttle plate 78, the monolithic base plate 76 and the shuttle plate 78 configured to slidingly abut or be in close proximity to each other. In some embodiments, the first end 80 of the one-piece base plate 76 is not in sliding abutment or close proximity with the shuttle plate 78. In some embodiments, the inner surface 82 of the cavity 84 of the one-piece base plate 76 and the slotted first end 86 of the shuttle plate 78 have complementary geometries or profiles. In some embodiments, biasing mechanism 16 (not shown) includes a biasing plate 40 coupled to reciprocating plate 78 and at least one biasing element 42, the biasing element 42 configured for exerting a pressure or force on biasing plate 40 to retain slot 34 (not shown) within and in sliding abutment or close proximity to inner surface 82 of cavity 84.

FIG. 11 illustrates yet another non-limiting exemplary embodiment of a monolithic base plate 88 and a shuttle plate 90, the monolithic base plate 88 and shuttle plate 90 being configured to slidingly abut or be in close proximity to one another. In some embodiments, the first end 92 of the monolithic base plate 88 is not in sliding abutment or close proximity with the shuttle plate 90. In some embodiments, the inner surface 94 of the cavity 96 of the one-piece base plate 88 and the slotted first end 98 of the shuttle plate 90 have complementary geometries or profiles. In some embodiments, biasing mechanism 16 (not shown) includes a biasing plate 40 coupled to reciprocating plate 90 and at least one biasing element 42, the biasing element 42 configured for exerting a pressure or force on biasing plate 40 to retain slot 34 (not shown) within and in sliding abutment or close proximity to an inner surface 94 of cavity 96.

FIG. 12 illustrates another non-limiting exemplary embodiment of a monolithic base plate 100 and reciprocating plate 102, the monolithic base plate 100 and reciprocating plate 102 being configured to slidingly abut or be in close proximity to one another. In several respects, the monolithic base plate 100 is substantially similar to the monolithic base plate 88 (FIG. 11) and the shuttle plate 102 is substantially similar to the shuttle plate 90 (FIG. 11). In some embodiments, the first end 104 of the monolithic substrate 100 extends "on" or "over" the reciprocating plate 102, i.e., does not contact the reciprocating plate 102. In some embodiments, the first end 104 is in sliding abutment or close proximity with the shuttle plate 102. In some embodiments, the first end 104 extends the entire lateral width of the monolithic substrate 100. In some embodiments, the first end 104 is configured as at least one tab or cantilever. In some embodiments, the inner surface 106 of the cavity 108 of the monolithic substrate 100 and the slotted first end 110 of the shuttle plate 102 have complementary geometries or profiles. In some embodiments, the biasing mechanism 16 (not shown) includes a biasing plate 40 coupled to the reciprocating plate 102 and at least one biasing element 42, the biasing element 42 configured for exerting a pressure or force on the biasing plate 40 to retain the slot 34 (not shown) within and in sliding abutment or close proximity to the inner surface 106 of the cavity 108.

In some embodiments, the at least one first end 18, 54, 62, 68, 80, 92, and 104 is configured as an anti-lift mechanism for substantially inhibiting displacement of the reciprocating plate 14 away from the monolithic base plate 12.

Fig. 13 is a non-limiting exemplary illustration of the slotted first end 112 of the reciprocating plate 14 extending into the cavity 114 of the single piece substrate 12.

FIG. 14 illustrates a non-limiting exemplary embodiment of the angle 118 of the cavity 120 of the monolithic substrate 116. In some embodiments, the angle 118 of the cavity 120 is an acute angle. In some embodiments, the angle 118 of the cavity 120 is greater than or equal to 0 degrees and less than or equal to 90 degrees. In some embodiments, the angle 118 of the cavity 120 is greater than zero (0) degrees and less than ninety (90) degrees. In some embodiments, angle 118 is between about thirty-five (35) degrees and about fifty-five (55) degrees. In some embodiments, the angle 118 is between about forty (40) degrees and about fifty (50) degrees. In some embodiments, the angle 118 is approximately forty-five (45) degrees. In some embodiments, first portion 119, arcuate section 125, and second portion 121 may together allow uneven or irregular patches of skin, or loose skin, to remain outside of cavity 120 of monolithic substrate 116, while allowing hair shafts growing from such patches of skin to be sheared and/or cut by reciprocating plate 124. In some embodiments, first portion 119, arcuate section 125, and second portion 121 together allow a user to access the hair shaft from different angles. In some embodiments, the biasing mechanism 16 (not shown) includes a biasing plate 40 coupled to the reciprocating plate 124 and at least one biasing element 42, the biasing element 42 configured for exerting a pressure or force on the biasing plate 40 to retain the slot 34 (not shown) within the cavity 120 and in sliding abutment or close proximity to the cavity 120.

FIG. 14 also illustrates a non-limiting exemplary embodiment of the angle 134 of the slotted first end 122 of the reciprocating plate 124. In some embodiments, the angle 134 of the slotted first end 122 is an acute angle. In some embodiments, the angle 134 of the slotted first end 122 is greater than or equal to 0 degrees and less than or equal to 90 degrees. In some embodiments, the angle 134 of the slotted first end is greater than zero (0) degrees and less than ninety (90) degrees. In some embodiments, angle 134 is between about thirty-five (35) degrees and about fifty-five (55) degrees. In some embodiments, the angle 134 is between about forty (40) degrees and about fifty (50) degrees. In some embodiments, the angle 134 is approximately forty-five (45) degrees. In some embodiments, the angle 134 of the slotted first end 122 of the shuttle plate 124 is substantially equal or approximately equal to the angle 118 of the cavity 120.

In some embodiments, as previously described, the first end 18 of the one-piece base plate 12 is in sliding or close abutment with the surface of the channel or slot 56 in the shuttle plate 14. Thus, the monolithic base plate 12 and reciprocating plate 14 are configured to inhibit skin ingress through the interface between the first end 18 and the reciprocating plate 14.

FIG. 15 is a perspective view of a non-limiting exemplary embodiment of some of the major components within an alternative embodiment of a grooming device 126 of the present disclosure. In some embodiments, carding device 126 includes a single substrate 12, a shuttle plate 14, and a biasing mechanism 128. In some embodiments, the reciprocating plate 14 is defined at least in part by opposing first and second ends 30, 32 (not shown). In some embodiments, the monolithic substrate 12 is at least partially defined by first and second opposing ends 18 and 20, respectively (not shown), a first portion 19, a second portion 21, and an arcuate section 24. In some embodiments, the first portion 19, the arcuate section 24, and the second portion 21 together define the cavity 22. In some embodiments, the one-piece base plate 12 includes a plurality of slots 26 disposed along at least a portion of the arcuate section 24. In some embodiments, one difference between the grooming device 10 and the grooming device 126 is that the biasing mechanism 128 is configured slightly differently than the biasing mechanism 16. In all other respects, the various embodiments described above with respect to the single substrate and reciprocating plates of carding machine 10 are equally applicable to carding machine 126. This includes, but is not limited to, the interface between the first end 18 of the monolithic base plate 12 and the shuttle plate 14.

In some embodiments, biasing mechanism 128 is configured to exert sufficient pressure or force on the shuttle plate of carding device 126 to retain the grooved first end of the shuttle plate within and in sliding abutment or close proximity to the cavity of the monolithic substrate. In some embodiments, the biasing mechanism 128 includes a biasing plate 130 coupled to the reciprocating plate and at least one biasing element 132, the biasing element 132 configured to exert a pressure or force on the biasing plate 130 to retain the slotted first end of the reciprocating plate within and in sliding abutment or close proximity to the cavity of the monolithic substrate. In some embodiments, the at least one biasing element 132 is a spring. In some embodiments, at least one biasing element 132 is compressed between the first set of blocks 133 and the second set of blocks 137. In some embodiments, the first bank 133 is coupled to the second end of the reciprocating plate 32, while the second bank 137 is coupled to the biasing plate 130. In some embodiments, the biasing plate 130 is coupled to the second end 32 of the reciprocating plate 14.

In some embodiments, the blocks of the second cluster 137 are also coupled to the adapter plate 135. In some embodiments, adapter plate 135 is coupled to a mechanism in the carding device that provides motion of reciprocating plate 14 relative to embodiments of the present disclosure, the motion of reciprocating plate 14 being a rocking motion; however, the present disclosure is not limited to such motion. Other types of motion (e.g., vibration, circular motion, etc.) are possible without departing from the scope of the present disclosure.

As previously described with reference to carding machine 10, some embodiments of carding machine 126 do not include a biasing mechanism, such as biasing mechanism 128.

In view of the above, modified and/or alternative configurations of the non-limiting exemplary embodiments shown and described herein may become apparent or obvious to one of ordinary skill. All such variations are considered to be within the purview and scope of the disclosure. For example, although reference may be made to particular feature(s) and/or function(s), the disclosure is also considered to include any and all equivalents that provide similar functionality as described herein with reference to the figures. Accordingly, the spirit, scope and intent of the present disclosure include all variations.

Claims (23)

1. A grooming device (10, 126) comprising:

a monolithic substrate (12) comprising:

first (18) and second (20) opposite ends;

a first portion (19);

a second portion (21); and

an arcuate section (24);

wherein the first portion (19) extends from the first end (18) to the arcuate section (24);

wherein the second portion (21) extends from the second end (20) to the arcuate section (24);

wherein the first portion (19), the arcuate section (24) and the second portion (21) together define a cavity (22);

wherein the cavity (22) is at least partially defined by an arcuate section (24) of the monolithic substrate proximate the first end (18) thereof; and

wherein the arcuate section (24) has an angle (118) of the cavity (22) greater than zero degrees and less than ninety degrees;

a plurality of slots (26) disposed along at least a portion of the arcuate section;

a reciprocating plate (14) comprising:

a first end (30) of the reciprocating plate (14) including a plurality of slots (34) extending into the cavity (22) of the monolithic substrate (12); and

a second end (32) of the shuttle plate (14) opposite the first end (30) of the shuttle plate (14); and

a shuttle mechanism operably coupled to the second end (32) of the shuttle plate (14);

wherein the first end (18) of the monolithic base plate (12) is configured as an anti-lift mechanism that prevents the shuttle plate (14) from being significantly lifted from the second portion (21) of the monolithic base plate (12).

2. The grooming device of claim 1, wherein said grooves (26) in said monolithic substrate (12) are configured to direct hair into said grooves (34) of said reciprocating plate (14).

3. Carding device according to claim 2, characterised in that the slots (34) of the reciprocating plate (14) are configured as cutting edges.

4. Carding device according to claim 3, characterised in that the cutting edges of the reciprocating plate (14) define at least two distinct cutting surfaces.

5. A grooming device as claimed in claim 4, wherein said cutting edges shear hairs protruding through said slots (26) from either side of said monolithic substrate (12).

6. Carding device according to claim 4, characterised in that at least a part of said at least two different cutting surfaces extends into said grooves (26) of said single piece of substrate (12).

7. Carding machine as in claim 1, characterized in that the inner surface of said cavity (70) and said first end (18) of said reciprocating plate (14) have complementary geometries.

8. A grooming device as claimed in claim 1, characterized in that said angle (118) of said cavity (22) is between about thirty-five degrees and about fifty-five degrees.

9. A carding machine as in claim 8, wherein said angle (118) of said cavity (22) is between about forty and about fifty degrees.

10. A grooming device as claimed in claim 9, characterized in that said angle (118) of said cavity (22) is about forty-five degrees.

11. A grooming device as claimed in claim 1, wherein the angle (118) of the inner surface (70, 82, 94, 106) of the cavity (22) and the angle (134) of the first end of the reciprocating plate are substantially equal.

12. A carding machine according to claim 1, characterised in that said first end (18) of said single piece base plate (12) is configured as an anti-lifting mechanism.

13. A carding machine as claimed in claim 1, characterised in that said first end (18) of said single-piece base plate (12) is in sliding abutment with said reciprocating plate (14).

14. A carding machine according to claim 1, wherein the reciprocating plate (14) comprises a channel (56), said channel (56) being adapted to receive at least a portion of the first end (18) of the single piece of substrate (12).

15. A carding machine as claimed in claim 14, wherein said first end (18) of said single piece base plate (12) and said channel (56) in said reciprocating plate (14) are in sliding engagement with each other.

16. A carding machine according to claim 15, wherein the first end (18) of the monolithic substrate (12) and the channel (56) in the reciprocating plate (14) are configured to inhibit rotation of the reciprocating plate (14).

17. Carding device according to claim 1, characterised in that at least part of the second end (20) of the monolithic base plate (12) and at least part of the second end (20) of the reciprocating plate (14) are in sliding abutment with each other.

18. Carding device according to claim 17, characterised in that said single-piece base plate (12) and said reciprocating plate (14) comprise:

an opposing surface; and

complementary projections (36) extending from at least a portion of each opposing surface, wherein the projections (36) are disposed in sliding abutment with each other.

19. A carding machine as claimed in claim 18, wherein said complementary projections (36) are configured to inhibit rotation of said reciprocating plate (14).

20. A grooming device (10, 126) comprising:

a monolithic substrate (12) comprising:

first (18) and second (20) opposite ends;

a first portion (19);

a second portion (21);

an arcuate section (24);

wherein the first portion (19) extends from the first end (18) to the arcuate section (24);

wherein the second portion (21) extends from the second end (20) to the arcuate section (24);

wherein the first portion (19), the arcuate section (24) and the second portion (21) together define a cavity (22);

wherein the cavity (22) is at least partially defined by an arcuate section (24) of the monolithic substrate proximate the first end (18) thereof; and

wherein the arcuate section (24) has an angle (118) of the cavity (22) greater than zero degrees and less than ninety degrees;

a plurality of slots (26) disposed along at least a portion of the arcuate section (24);

a reciprocating plate (14) comprising:

a first end (30) of the reciprocating plate (14) including a plurality of slots (34) extending into the cavity (22) of the monolithic substrate (12); and

a second end (32) of the shuttle plate (14) opposite the first end (30) of the shuttle plate (14); and

a biasing mechanism (16) configured for maintaining the first end (30) of the shuttle plate (14) in sliding abutment within the cavity (22) of the monolithic substrate (12); and

a shuttle mechanism operably coupled to the shuttle plate (14);

wherein the first end (18) of the monolithic base plate (12) is configured as an anti-lift mechanism that prevents the shuttle plate (14) from being lifted significantly from the second portion (21) of the monolithic base plate (12).

21. A grooming device according to claim 20, characterized in that said biasing means (16) comprise:

at least one biasing element (42); and

a biasing plate (40) coupled to the reciprocating plate (14).

22. A grooming device as claimed in claim 20, wherein the biasing means (16) is configured as an anti-lift means.

23. A carding machine according to claim 20, characterised in that said first end (18) of the base plate (12) is configured as an anti-lift mechanism.

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