CN114907604A - Antireflection film, manufacturing method thereof and display panel - Google Patents
Antireflection film, manufacturing method thereof and display panel Download PDFInfo
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- CN114907604A CN114907604A CN202210473083.0A CN202210473083A CN114907604A CN 114907604 A CN114907604 A CN 114907604A CN 202210473083 A CN202210473083 A CN 202210473083A CN 114907604 A CN114907604 A CN 114907604A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2300/00—Characterised by the use of unspecified polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
- C08J2301/08—Cellulose derivatives
- C08J2301/10—Esters of organic acids
- C08J2301/12—Cellulose acetate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/04—Homopolymers or copolymers of ethene
- C08J2323/06—Polyethene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/10—Homopolymers or copolymers of propene
- C08J2323/12—Polypropene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2325/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
- C08J2325/02—Homopolymers or copolymers of hydrocarbons
- C08J2325/04—Homopolymers or copolymers of styrene
- C08J2325/06—Polystyrene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C08J2327/06—Homopolymers or copolymers of vinyl chloride
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2333/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2377/00—Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
The application discloses an antireflection film, a manufacturing method thereof and a display panel, wherein the antireflection film comprises a base material and spherical particles uniformly dispersed on the surface of the base material; the spherical particles are hollow silica spheres. The manufacturing method of the anti-reflection film comprises the following steps: providing a first substrate; coating a solvent dispersion having spherical particles on the first substrate; dissolving a portion of a first substrate with a solvent vapor to embed the spherical particles in the first substrate; arranging a second base material on one side of the spherical particles far away from the first base material, and curing; and removing the first substrate. The technical effect of this application lies in, need not control accurate membrane thickness, only need carry out substrate refracting index, globular granule when optical design, the coordination of rete thickness can.
Description
Technical Field
The application relates to the field of display, in particular to an antireflection film, a manufacturing method thereof and a display panel.
Background
In the aspect of the energy market, because the existing material system is relatively mature, the existing industry is dedicated to optimizing the optical structure of the film layer to improve the energy conversion efficiency of the battery, and the use of the antireflection film material can improve the light energy utilization rate and increase the energy conversion efficiency; in the display market, the reflection of the outside natural light of screen causes very big puzzlement to the screen is watched directly perceivedly to people's eye, when watching the display, can injure people's eye for a long time, and the reflection of light problem that appears can influence people's eye and look the thing, especially museum, classroom, traffic lights etc. need the place of observing.
Based on the above problems, for the purpose of improving the performance requirement of the display device, the anti-glare film is used on the surface of the screen to improve the above problems, but the haze is too large to cause the problems of screen definition, white picture and the like, so the anti-glare film is often used to improve the above problems, under the pure specular reflection state, the reflectivity is about 4.3%, the reflection of the better anti-glare film on the market can be 0.2% -1%, the reflection can be greatly reduced, the visual effect of the display is improved, and the display value is improved.
The anti-reflection film in the prior art has two processes, one is to carry out low-fold film coating by using CVD or evaporation and other modes, and the mode has high cost and serious color cast phenomenon; the other method is wet coating, which has low cost, but has extremely high requirements on a film thickness control process because the film thickness is small, the precise control of the film thickness is difficult, and the errors of glue solution and the film thickness need to be precisely controlled.
Disclosure of Invention
The application aims to provide an antireflection film, a manufacturing method thereof and a display panel, which are used for solving the technical problems that the existing antireflection film manufacturing process needs to precisely control errors of glue solution and film thickness so as to increase the manufacturing difficulty and the like.
In order to achieve the above object, the present application provides an anti-reflection film, comprising a substrate and spherical particles uniformly dispersed on the surface of the substrate; the spherical particles are hollow silica spheres.
Further, the spherical particles have a hollow ratio of 40 to 80%.
Further, the maximum size range of the orthographic projection of the spherical particles on the substrate is 80-200 nanometers.
Further, the substrate is a transparent substrate, and the material of the substrate includes one of resin, triacetylcellulose, acryl, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate, and polyamide.
In order to achieve the above object, the present application further provides a method for manufacturing an antireflection film, including the steps of: providing a first substrate; coating a solvent dispersion having spherical particles on the first substrate; dissolving a portion of a first substrate with a solvent vapor to embed the spherical particles in the first substrate; arranging a second base material on one side of the spherical particles far away from the first base material, and curing; and removing the first substrate.
Further, the first substrate is a polymer substrate, and the polymer substrate includes one of resin, cellulose triacetate, acryl, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate, and polyamide.
Further, after the step of dissolving a part of the first substrate with the solvent vapor and embedding the spherical particles in the first substrate, the whole is put into a solvent dispersion liquid and excess spherical particles are ultrasonically cleaned.
Further, the second substrate is coated with a cured adhesive, including a heat cured adhesive or a light cured adhesive.
Further, the solvent vapor comprises one of acetone, butanone, chloroform, chlorobenzene and ethyl acetate.
To achieve the above object, the present application also provides a display panel including the antireflection film as described above.
The technical effect of this application lies in, through with the dispersion of hollow silica bobble coating individual layer on the transparent substrate who scribbles adhesive resin, can realize from the top down refracting index continuous variation optical structure, realizes the purpose of low reflection, the advantage of this method need not control accurate membrane thickness, only need carry out substrate refracting index, globular particle when optical design, the coordination cooperation of rete thickness can.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a flow chart of a method for fabricating a reflection reducing film according to an embodiment of the present disclosure;
FIG. 2 is a schematic structural diagram of a spherical particle provided in the examples of the present application after being manufactured;
FIG. 3 is a schematic structural diagram of the steam mosaic provided by the embodiment of the present application;
FIG. 4 is a schematic structural diagram after ultrasonic cleaning provided by an embodiment of the present application;
FIG. 5 is a schematic structural view of a second substrate provided in an embodiment of the present disclosure after bonding;
fig. 6 is a schematic structural diagram of an antireflection film provided in an embodiment of the present application.
Description of the reference numerals:
10. a first substrate;
100. spherical particles; 200. a second substrate; 300. and curing the binder.
Detailed Description
The technical solutions in the embodiments of the present application will be described clearly and completely with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only some embodiments of the present application, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application. Furthermore, it should be understood that the detailed description and specific examples, while indicating exemplary embodiments of the invention, are given by way of illustration and explanation only, and are not intended to limit the scope of the invention. In the present application, unless indicated to the contrary, the use of the directional terms "upper" and "lower" generally refer to the upper and lower positions of the device in actual use or operation, and more particularly to the orientation of the figures of the drawings; while "inner" and "outer" are with respect to the outline of the device.
As shown in fig. 1 to 6, the present embodiment provides a reflection reducing film, a method for manufacturing the same, and a display panel, and the method for manufacturing the reflection reducing film is described below first, and as shown in fig. 1, the method for manufacturing the reflection reducing film includes steps S1 to S6.
S1 provides the first substrate 10, where the first substrate 10 is a polymer substrate, and the polymer substrate includes one of resin (e.g., PET resin), Triacetyl Cellulose (TAC), acryl (e.g., polymethyl methacrylate, PMMA), Polyethylene (PE), polypropylene (PP), polyvinyl chloride (PVC), Polystyrene (PS), Polycarbonate (PC), and Polyamide (PA).
S2 coating the first substrate 10 with a solvent dispersion having spherical particles 100, specifically, spraying or dipping a solvent dispersion having the spherical particles 100 incorporated therein onto the first substrate 10, wherein, referring to fig. 2, in order to ensure that as many spherical particles 100 as possible are distributed on the first substrate 10, the coated solvent dispersion has a large number of spherical particles 100, and after coating, a part of the spherical particles 100 are uniformly attached to the first substrate 10, and another part of the spherical particles 100 are stacked on the first substrate 10 without being in direct contact with the first substrate 10.
The solvent dispersion may be water, n-hexane, n-pentane, cyclohexane, n-octane, ethanol, ethylene glycol, or other solvents, and the specific solvent is selected according to the surface composition and the degree of dispersion of the spherical particles 100.
The spherical particles 100 are hollow silica spheres, the mass fraction of the spherical particles 100 in the easy dispersion liquid is 3 to 30 wt%, the maximum size range of the orthographic projection of the spherical particles 100 on the first substrate 10 is 80 to 200 nm, and in the embodiment, the maximum size of the orthographic projection of the spherical particles 100 on the first substrate 10 is preferably 130 to 160 nm. The spherical particles 100 have a hollow ratio of 40 to 80% and a refractive index of 1.2 to 1.4 in terms of a conversion.
S3 dissolving a part of the first substrate 10 with a solvent vapor, and embedding the spherical particles 100 into the first substrate 10 (see fig. 3), specifically, the solvent vapor includes one of acetone, butanone, chloroform, chlorobenzene, and ethyl acetate. The solvent vapor allows the spherical particles 100 to be embedded into the first substrate 10 by using plasticization and softening properties of the polymer substrate, and in the process, the embedding depth of the spherical particles 100 in the first substrate 10 can be adjusted by adjusting the time of the vapor.
S4 ultrasonic cleaning, specifically, the whole device is put into a solvent dispersion liquid to be subjected to ultrasonic cleaning, excess spherical particles, that is, spherical particles not adhered to the first substrate 10 are cleaned, and after cleaning, only a single layer of uniformly distributed hollow spherical particles 100 of a hundred nanometers in uniform size, which are adhered to the first substrate 10, are left (see fig. 4).
S5 a second base material 200 is placed on the side of the spherical particles 100 remote from the first base material 10, and cured. Specifically, a second substrate 200 coated with a cured adhesive 300 is disposed on the upper surface of the spherical particle 100, one side of the cured adhesive 300 is attached to the spherical particle 100, and the second substrate 200 is turned over to the lower side of the spherical particle 100 (see fig. 5) by turning the second substrate, and the cured adhesive 300 includes a thermosetting adhesive or a photo-curing adhesive. The spherical particles 100 can modify groups, so that the adhesion between the spherical particles and the curing adhesive is enhanced, and the yield of later-stage demolding is improved.
The second substrate 200 is a transparent substrate, and the material of the transparent substrate includes one of resin, triacetylcellulose, acryl, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate, and polyamide.
S6, the first substrate 10 (see fig. 6) is removed, and the spherical particles 100 are transferred.
The manufacturing method of the antireflection film has the technical effects that the hollow silica spheres are coated on the transparent base material coated with the binder resin in a single-layer mode, so that the optical structure with the refractive index continuously changing from top to bottom can be realized, and the purpose of low reflection is realized.
The present embodiment further provides a display panel, which includes the antireflection film shown in fig. 6, where the antireflection film includes a substrate and spherical particles 100 uniformly dispersed on the surface of the substrate, and the spherical particles 100 are hollow silica spheres.
The substrate is the second substrate 200 described above, and is a transparent substrate, and includes one of resin, triacetylcellulose, acryl, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate, and polyamide.
The spherical particles 100 have a hollow ratio of 40 to 80%.
The maximum size of the orthographic projection of the spherical particles 100 on the substrate is in the range of 80 to 200 nm, and in this embodiment, the maximum size of the orthographic projection of the spherical particles 100 on the first substrate 10 is preferably in the range of 130 to 160 nm. The hollow rate of the spherical particles 100 is 40-80%, the refractive index in terms of the refractive index is 1.2-1.4, and the spherical particles 100 can modify groups, so that the adhesion between the spherical particles and the curing adhesive 300 is greatly enhanced, and the demolding yield is improved.
The anti-reflection film, the manufacturing method thereof and the display panel provided by the embodiments of the present application are described in detail above, and the principles and embodiments of the present application are explained herein by applying specific examples, and the description of the above embodiments is only used to help understand the method and the core concept of the present application; meanwhile, for those skilled in the art, according to the idea of the present application, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present application.
Claims (10)
1. The anti-reflection film is characterized by comprising a base material and spherical particles uniformly dispersed on the surface of the base material; the spherical particles are hollow silica spheres.
2. The antireflection film of claim 1,
the spherical particles have a hollow ratio of 40 to 80%.
3. The antireflection film of claim 1,
the maximum size range of the orthographic projection of the spherical particles on the base material is 80-200 nanometers.
4. The antireflection film of claim 1,
the base material is transparent base material, the material of base material includes one of resin, triacetylcellulose, ya keli, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate, polyamide.
5. The manufacturing method of the anti-reflection film is characterized by comprising the following steps:
providing a first substrate;
coating a solvent dispersion having spherical particles on the first substrate;
dissolving a portion of a first substrate with a solvent vapor to embed the spherical particles in the first substrate;
arranging a second base material on one side of the spherical particles far away from the first base material, and curing; and
and removing the first substrate.
6. The method of manufacturing an antireflection film according to claim 5,
the first base material is a polymer base material, and the polymer base material comprises one of resin, cellulose triacetate, acrylic, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polycarbonate and polyamide.
7. The method of claim 5, wherein after the step of dissolving a portion of the first substrate with the solvent vapor to embed the spherical particles in the first substrate, the entire first substrate is put in a solvent dispersion to ultrasonically clean the excess spherical particles.
8. The method of manufacturing an antireflection film according to claim 5,
the second substrate is coated with a cured adhesive, including a thermally cured adhesive or a photo-cured adhesive.
9. The method of manufacturing an antireflection film according to claim 5,
the solvent vapor comprises one of acetone, butanone, chloroform, chlorobenzene and ethyl acetate.
10. A display panel comprising the antireflection film according to any one of claims 1 to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210473083.0A CN114907604A (en) | 2022-04-29 | 2022-04-29 | Antireflection film, manufacturing method thereof and display panel |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210473083.0A CN114907604A (en) | 2022-04-29 | 2022-04-29 | Antireflection film, manufacturing method thereof and display panel |
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| CN114907604A true CN114907604A (en) | 2022-08-16 |
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| CN202210473083.0A Pending CN114907604A (en) | 2022-04-29 | 2022-04-29 | Antireflection film, manufacturing method thereof and display panel |
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Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6180226B1 (en) * | 1996-08-01 | 2001-01-30 | Loctite (R&D) Limited | Method of forming a monolayer of particles, and products formed thereby |
| US20030165666A1 (en) * | 1998-12-09 | 2003-09-04 | Tomoegawa Paper Co., Ltd. | Filler lens and production method therefor |
| JP2005099778A (en) * | 2003-08-28 | 2005-04-14 | Dainippon Printing Co Ltd | Antireflection laminate |
| JP2005283611A (en) * | 2004-03-26 | 2005-10-13 | Dainippon Printing Co Ltd | Antireflection film |
| US20090128915A1 (en) * | 2007-11-15 | 2009-05-21 | Chang-Jian Weng | Antiglare film and coating composition for making the same |
| CN101470216A (en) * | 2007-12-27 | 2009-07-01 | 达信科技股份有限公司 | Anti-dazzle film and anti-dazzle masking liquid composition |
| CN102152559A (en) * | 2009-11-30 | 2011-08-17 | Jsr株式会社 | Antireflective laminate and manufacturing method thereof, and curable composition |
| CN103718065A (en) * | 2011-07-21 | 2014-04-09 | 佳能株式会社 | Optical member and method of producing the same |
| CN103739209A (en) * | 2013-12-31 | 2014-04-23 | 浙江工业大学 | Porous antireflection film consisting of nanosilicon dioxide hollow particles and preparation method thereof |
| CN104914488A (en) * | 2014-03-14 | 2015-09-16 | 佳能株式会社 | Antireflection film, optical member, and method of producing optical member |
| JP2017181693A (en) * | 2016-03-29 | 2017-10-05 | 東ソー株式会社 | Antireflection film |
| CN114249541A (en) * | 2020-09-24 | 2022-03-29 | 咸阳虹微新型显示技术有限公司 | Antireflection film, preparation method thereof and display panel |
-
2022
- 2022-04-29 CN CN202210473083.0A patent/CN114907604A/en active Pending
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6180226B1 (en) * | 1996-08-01 | 2001-01-30 | Loctite (R&D) Limited | Method of forming a monolayer of particles, and products formed thereby |
| US20030165666A1 (en) * | 1998-12-09 | 2003-09-04 | Tomoegawa Paper Co., Ltd. | Filler lens and production method therefor |
| JP2005099778A (en) * | 2003-08-28 | 2005-04-14 | Dainippon Printing Co Ltd | Antireflection laminate |
| JP2005283611A (en) * | 2004-03-26 | 2005-10-13 | Dainippon Printing Co Ltd | Antireflection film |
| US20090128915A1 (en) * | 2007-11-15 | 2009-05-21 | Chang-Jian Weng | Antiglare film and coating composition for making the same |
| CN101470216A (en) * | 2007-12-27 | 2009-07-01 | 达信科技股份有限公司 | Anti-dazzle film and anti-dazzle masking liquid composition |
| CN102152559A (en) * | 2009-11-30 | 2011-08-17 | Jsr株式会社 | Antireflective laminate and manufacturing method thereof, and curable composition |
| CN103718065A (en) * | 2011-07-21 | 2014-04-09 | 佳能株式会社 | Optical member and method of producing the same |
| CN103739209A (en) * | 2013-12-31 | 2014-04-23 | 浙江工业大学 | Porous antireflection film consisting of nanosilicon dioxide hollow particles and preparation method thereof |
| CN104914488A (en) * | 2014-03-14 | 2015-09-16 | 佳能株式会社 | Antireflection film, optical member, and method of producing optical member |
| JP2017181693A (en) * | 2016-03-29 | 2017-10-05 | 東ソー株式会社 | Antireflection film |
| CN114249541A (en) * | 2020-09-24 | 2022-03-29 | 咸阳虹微新型显示技术有限公司 | Antireflection film, preparation method thereof and display panel |
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