CN114907290B - Fluorine-containing epoxy resin with low refractive index, and synthetic method and application thereof - Google Patents
Fluorine-containing epoxy resin with low refractive index, and synthetic method and application thereof Download PDFInfo
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- CN114907290B CN114907290B CN202110168535.XA CN202110168535A CN114907290B CN 114907290 B CN114907290 B CN 114907290B CN 202110168535 A CN202110168535 A CN 202110168535A CN 114907290 B CN114907290 B CN 114907290B
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- China
- Prior art keywords
- fluorine
- epoxy resin
- containing epoxy
- refractive index
- recording medium
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- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 45
- 239000011737 fluorine Substances 0.000 title claims abstract description 45
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 44
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 42
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 42
- 238000010189 synthetic method Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000004593 Epoxy Substances 0.000 claims abstract description 10
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 5
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 21
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 10
- 238000001914 filtration Methods 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 239000012153 distilled water Substances 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 8
- 239000012074 organic phase Substances 0.000 claims description 8
- 238000002390 rotary evaporation Methods 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- 230000002194 synthesizing effect Effects 0.000 claims description 6
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 claims description 5
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 claims description 4
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 claims description 4
- LRMSQVBRUNSOJL-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)F LRMSQVBRUNSOJL-UHFFFAOYSA-N 0.000 claims description 3
- QYCPVKMFWNBDPV-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluorooctanedioic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(O)=O QYCPVKMFWNBDPV-UHFFFAOYSA-N 0.000 claims description 3
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 claims description 3
- PLDLPVSQYMQDBL-UHFFFAOYSA-N 2-[[3-(oxiran-2-ylmethoxy)-2,2-bis(oxiran-2-ylmethoxymethyl)propoxy]methyl]oxirane Chemical compound C1OC1COCC(COCC1OC1)(COCC1OC1)COCC1CO1 PLDLPVSQYMQDBL-UHFFFAOYSA-N 0.000 claims description 3
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 claims description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims description 2
- HPILSDOMLLYBQF-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COC(CCC)OCC1CO1 HPILSDOMLLYBQF-UHFFFAOYSA-N 0.000 claims description 2
- ZMRFRBHYXOQLDK-UHFFFAOYSA-N 2-phenylethanethiol Chemical compound SCCC1=CC=CC=C1 ZMRFRBHYXOQLDK-UHFFFAOYSA-N 0.000 claims description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims 4
- KKLBPVXKMBLCQX-BLVCXSLXSA-N (2e,5e)-2,5-bis[[4-(diethylamino)phenyl]methylidene]cyclopentan-1-one Chemical compound C1=CC(N(CC)CC)=CC=C1\C=C(/CC\1)C(=O)C/1=C/C1=CC=C(N(CC)CC)C=C1 KKLBPVXKMBLCQX-BLVCXSLXSA-N 0.000 claims 1
- AGWWTUWTOBEQFE-UHFFFAOYSA-N 4-methyl-1h-1,2,4-triazole-5-thione Chemical compound CN1C=NN=C1S AGWWTUWTOBEQFE-UHFFFAOYSA-N 0.000 claims 1
- TXCXZVFDWQYTIC-UHFFFAOYSA-N 5-pyridin-4-yl-3h-1,3,4-oxadiazole-2-thione Chemical compound O1C(S)=NN=C1C1=CC=NC=C1 TXCXZVFDWQYTIC-UHFFFAOYSA-N 0.000 claims 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 claims 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 claims 1
- 239000000178 monomer Substances 0.000 abstract description 27
- 229920005989 resin Polymers 0.000 abstract description 15
- 239000011347 resin Substances 0.000 abstract description 15
- 230000003287 optical effect Effects 0.000 abstract description 13
- 238000003860 storage Methods 0.000 abstract description 12
- 150000001412 amines Chemical class 0.000 abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 7
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000001308 synthesis method Methods 0.000 abstract description 4
- 125000000217 alkyl group Chemical group 0.000 abstract description 3
- 125000001153 fluoro group Chemical group F* 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 3
- -1 aromatic urethane acrylates Chemical class 0.000 description 17
- 239000000203 mixture Substances 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 8
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- VXHYVVAUHMGCEX-UHFFFAOYSA-N 2-(2-hydroxyphenoxy)phenol Chemical compound OC1=CC=CC=C1OC1=CC=CC=C1O VXHYVVAUHMGCEX-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229960000956 coumarin Drugs 0.000 description 3
- 235000001671 coumarin Nutrition 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N Bisphenol F Natural products C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 150000008062 acetophenones Chemical class 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000004657 carbamic acid derivatives Chemical class 0.000 description 2
- 239000013530 defoamer Substances 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- RCSKFKICHQAKEZ-UHFFFAOYSA-N 1-ethenylindole Chemical compound C1=CC=C2N(C=C)C=CC2=C1 RCSKFKICHQAKEZ-UHFFFAOYSA-N 0.000 description 1
- CTXUTPWZJZHRJC-UHFFFAOYSA-N 1-ethenylpyrrole Chemical compound C=CN1C=CC=C1 CTXUTPWZJZHRJC-UHFFFAOYSA-N 0.000 description 1
- AXRSOGFYDSXLQX-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluorohexanedioic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(O)=O AXRSOGFYDSXLQX-UHFFFAOYSA-N 0.000 description 1
- CCUWGJDGLACFQT-UHFFFAOYSA-N 2,2,3,3,4,4-hexafluoropentanedioic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(O)=O CCUWGJDGLACFQT-UHFFFAOYSA-N 0.000 description 1
- YUDUFRYTKFGQCL-UHFFFAOYSA-N 2,2,3,3-tetrafluorobutanedioic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(O)=O YUDUFRYTKFGQCL-UHFFFAOYSA-N 0.000 description 1
- LIHVFFFGWFBSAT-UHFFFAOYSA-N 2,2-difluoropropanedioic acid Chemical compound OC(=O)C(F)(F)C(O)=O LIHVFFFGWFBSAT-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- BBBUAWSVILPJLL-UHFFFAOYSA-N 2-(2-ethylhexoxymethyl)oxirane Chemical compound CCCCC(CC)COCC1CO1 BBBUAWSVILPJLL-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 1
- FAFCDPCRODNSLM-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)pentoxymethyl]oxirane Chemical compound C1OC1COC(CCCC)OCC1CO1 FAFCDPCRODNSLM-UHFFFAOYSA-N 0.000 description 1
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 description 1
- CAYJDIDYXCENIR-UHFFFAOYSA-N 2-[5-(oxiran-2-ylmethoxy)pentoxymethyl]oxirane Chemical compound C1OC1COCCCCCOCC1CO1 CAYJDIDYXCENIR-UHFFFAOYSA-N 0.000 description 1
- SHJXSYJQBXYBGA-UHFFFAOYSA-N 2-cyclohexyl-2-hydroxy-1-phenylethanone Chemical group C=1C=CC=CC=1C(=O)C(O)C1CCCCC1 SHJXSYJQBXYBGA-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical group CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- JZUHIOJYCPIVLQ-UHFFFAOYSA-N 2-methylpentane-1,5-diamine Chemical compound NCC(C)CCCN JZUHIOJYCPIVLQ-UHFFFAOYSA-N 0.000 description 1
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- LQSJUQMCZHVKES-UHFFFAOYSA-N 6-iodopyrimidin-4-amine Chemical compound NC1=CC(I)=NC=N1 LQSJUQMCZHVKES-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- KGLLUXBCZIVSQO-UHFFFAOYSA-N C(=C)C(CCN)C=C Chemical compound C(=C)C(CCN)C=C KGLLUXBCZIVSQO-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- KQNSPSCVNXCGHK-UHFFFAOYSA-N [3-(4-tert-butylphenoxy)phenyl]methanamine Chemical compound C1=CC(C(C)(C)C)=CC=C1OC1=CC=CC(CN)=C1 KQNSPSCVNXCGHK-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 1
- BOXSCYUXSBYGRD-UHFFFAOYSA-N cyclopenta-1,3-diene;iron(3+) Chemical class [Fe+3].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 BOXSCYUXSBYGRD-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- WTSXICLFTPPDTL-UHFFFAOYSA-N pentane-1,3-diamine Chemical compound CCC(N)CCN WTSXICLFTPPDTL-UHFFFAOYSA-N 0.000 description 1
- YPJUNDFVDDCYIH-UHFFFAOYSA-N perfluorobutyric acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)F YPJUNDFVDDCYIH-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
Abstract
The invention discloses a fluorine-containing epoxy resin, which comprises a fluorine group and at least two epoxy alkyl groups, wherein the refractive index is lower, and the fluorine-containing epoxy resin can react with organic amine with double or multiple functionalities to form a crosslinked network; the holographic recording medium is prepared by mixing the raw material of the film-forming resin with polymerizable monomers/oligomers serving as information recording components. The low refractive index and low surface energy of the fluorine-containing epoxy resin can increase the refractive index difference between the polymerized monomer/oligomer and the film-forming resin and improve the mobility of the polymerized monomer/oligomer, so that the diffraction efficiency of the holographic recording medium is more than 85%, the sensitivity is more than 0.1cm/mJ, the Bragg selection angle is less than 1 degree, and the holographic recording medium can respond in a wide-band range of 400-650 nm. Through angle multiplexing and wavelength multiplexing, the method has great application potential in the field of high-density optical storage. Meanwhile, the synthesis method of the fluorine-containing epoxy resin is simple, raw materials are easy to obtain, synthesis conditions are mild, and mass production is easy to realize.
Description
Technical Field
The present invention relates to the field of high density optical storage. More particularly, to a fluorine-containing epoxy resin with low refractive index, and a synthesis method and application thereof.
Background
With the rapid development of the human society information age, the realization of high-capacity, efficient and rapid information storage and transmission becomes an increasingly urgent problem to be solved in the current society. In recent years, photopolymers have been considered as the most practical holographic recording materials because of their high sensitivity, high diffraction efficiency, large dynamic range, simple manufacturing process, and no need for chemical/thermal post-treatment.
The photopolymer is prepared by polymerizing a monomer by light irradiation, and forming a phase-type holographic grating with refractive index modulation with a film-forming resin to record and reproduce information. During holographic exposure, two beams of coherent light interfere with each other to form interference fringes with alternate brightness on the photopolymer type recording medium. In the bright streak region, monomers polymerize and rapidly chain-grow, being consumed in large amounts and decreasing in concentration; in the dark stripe region, the monomer is hardly polymerized or rarely polymerized, so that the monomer/concentration is in gradient distribution in the dark stripe region, and the monomer in the dark stripe region is promoted to migrate to the light stripe region until the monomer is completely polymerized or the system is solidified, so that the migration of the monomer is stopped. After exposure, the refractive index of the bright stripe region is close to that of the monomer after polymerization, and the refractive index of the dark stripe region is close to that of the film forming resin, so that the spatial modulation distribution of the refractive index is formed, and the phase type holographic grating is formed. The holographic grating with the modulated refractive index is key for realizing information recording and reproduction, and the larger the modulated refractive index is, the more excellent holographic optical performance such as response time, sensitivity, angle selectivity and the like is displayed in information recording, so that the rapid and multi-angle high-density optical storage can be realized. Therefore, in order to improve the holographic recording performance of the photopolymer-type material, on the one hand, the migration and polymerization rate of the monomer in the recording medium is increased, and on the other hand, the refractive index difference (Δn) between the polymer and the film-forming resin is increased.
There are many varieties of high refractive index monomers in the market at present, and many reports are reported in the literature. The Bayer company has disclosed a series of high refractive index monomers, trifunctional aromatic urethane acrylates (WO 2008/125199), difunctional (meth) acrylates (WO 2012/020061), aromatic glycol ethers (WO 2015/161969), and the like, one or a combination of which is used as a recording monomer, and a polyisocyanate-polyol matrix and a photoinitiator are blended to obtain high diffraction efficiency and high refractive index modulation in a photopolymer type medium. Similarly, marvin et al (ACS Applied Materials Interfaces,2018, 10, pages 1217-1224) synthesized a high refractive index (n=1.6) monomeric BPTPA, and photopolymer media made with a 60% monomer/oligomer formulation gave transmission holographic gratings with refractive index modulation up to 0.029 after exposure. Tomita et al (optical Express,2020, 19 th edition, 28366-28382) studied a series of high refractive index nanoparticles, and synthesized dendritic monomers with refractive index as high as 1.82, greatly improving the refractive index modulation degree of holographic gratings.
Meanwhile, some low refractive index film-forming resins have been studied. WO2011/054797 discloses various fluorinated carbamates suitable for use in photopolymer type materials of Bayer company and a method for preparing the same, wherein the refractive index modulation degree increases with the increase of the content of the fluorinated carbamates, but the excessive content thereof causes the decrease of the optical quality of the recording medium and the deterioration of the light transmittance. CN201610389679.7 describes an allyl and methacryloxy reactive fluororesin, which can be used for the production of photopolymer type thin film photosensitive materials for holographic recording. CN201710719523.5 describes a photopolymer type film forming resin based on a low refractive index fluorine containing acrylic resin. Similarly, satoh et al (Japanese Journal of Applied Physics,2009, 48, page 03a 030) successfully recorded and reconstructed 750 holograms in 0.4 x 50mm fluorine-based photopolymer materials based on improving the refractive index modulation by improving the compatibility of the fluorine matrix with the monomers.
Accordingly, it is desirable to provide a film-forming resin having a low refractive index, and further to provide a photopolymer type hologram recording material which integrates excellent properties such as sensitivity, diffraction efficiency, angle selectivity, and storage capacity.
Disclosure of Invention
An object of the present invention is to provide a fluorine-containing epoxy resin with low refractive index, which has a simple structure and stable properties, has at least two epoxy groups in a molecular structure, and can react with difunctional or polyfunctional organic amine to form a crosslinked network.
The second object of the present invention is to provide a method for synthesizing the above-mentioned fluorine-containing epoxy resin, wherein the series of fluorine-containing epoxy resins are obtained by chemically reacting fluorine-containing fatty acids with a polyfunctional epoxy resin, and the method is simple to operate and mild in conditions.
A third object of the present invention is to provide a photopolymer type hologram recording medium comprising the above fluorine-containing epoxy resin, which can realize fast, high-capacity, high-density holographic optical storage.
In order to achieve the above purpose, the invention adopts the following technical scheme:
a fluorine-containing epoxy resin with low refractive index has a structural formula shown in a formula a or a formula b:
wherein m is 2 to 4, n is 1 to 7,p, q is 1 to 6, and R is alkyl or alkoxy.
The fluorine-containing epoxy resin molecule provided by the invention has a fluorine group and at least two epoxy groups, has a low refractive index, and can react with organic amine with double or multiple functionalities to form a crosslinked network; meanwhile, the fluorine-containing epoxy resin has low surface energy, and is favorable for improving the mobility of polymer monomers when being used for preparing the holographic recording material, so that the refractive index difference between the polymer and film-forming resin is increased, and the holographic recording material with high sensitivity and large storage capacity is obtained.
A method for synthesizing the fluorine-containing epoxy resin as described above, wherein the method for synthesizing the compound of formula a comprises the steps of:
1 (1.1-1.3) polyfunctional epoxy resin and perfluorinated acid are dissolved in dioxane, evenly mixed, triethylamine is dripped into the mixture, the mixture is stirred for 12-20 hours at the temperature of 80-90 ℃, after the reaction is finished, solvent dioxane is removed by rotary evaporation, dichloromethane is added for dilution, then 0.05mol/L NaOH, 1mol/L HCl and distilled water are used for washing in sequence, and an organic phase is subjected to anhydrous Na 2 SO 4 Drying, filtering, and concentrating.
Wherein, the synthesis method of the compound of the formula b comprises the following steps:
1, dissolving the epoxy resin with double or multiple functionality and perfluoro diacid in the molar ratio of (2.2-2.5) in dioxane, uniformly mixing, dripping triethylamine, stirring at 85-95 ℃ for 12-24 h, after the reaction, removing solvent dioxane by rotary evaporation, adding dichloromethane for dilution, then washing with 0.05mol/L NaOH, 1mol/L HCl and distilled water in sequence, wherein the method comprises the steps ofThe organic phase is treated by anhydrous Na 2 SO 4 Drying, filtering, and concentrating.
Preferably, the polyfunctional epoxy resin is selected from one of trimethylolpropane triglycidyl ether, glycerol propoxyl triglycidyl ether, pentaerythritol tetraglycidyl ether, tetra-arm polyethylene glycol glycidyl ether and penta-arm polyethylene glycol glycidyl ether.
Preferably, the perfluoro acid is selected from one of perfluoro octanoic acid, perfluoro hexanoic acid, perfluoro pentanoic acid, perfluoro butanoic acid, perfluoro propanoic acid, and perfluoro acetic acid.
Preferably, the perfluoro diacid is selected from one of perfluoro suberic acid, perfluoro adipic acid, perfluoro glutaric acid, perfluoro succinic acid and perfluoro malonic acid.
Preferably, the difunctional epoxy resin is selected from one of ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, and pentylene glycol diglycidyl ether.
A photopolymer holographic recording medium comprising a fluorine-containing epoxy resin as described above, comprising the following composition and content in weight percent:
aiming at the problems of insufficient refractive index modulation and limited storage capacity of the prior art of the photopolymer type holographic recording medium, the invention uses a fluorine-containing epoxy resin-amine curing agent crosslinking system with low refractive index as film forming resin, uses polymerizable vinyl monomer/oligomer with high refractive index as information recording component, increases the refractive index difference between the polymerized monomer and the film forming resin, improves the mobility of the polymerized monomer, obtains high-sensitivity and large-refractive index modulation, and realizes rapid and large-capacity high-density holographic optical storage.
The epoxy resin reactive diluent is aliphatic epoxy resin with low refractive index and low viscosity, and comprises at least one of n-butyl glycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, diglycidyl ester, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butanediol diglycidyl ether, pentanediol diglycidyl ether, glycerol triglycidyl ether and 3, 4-epoxycyclohexenemethyl-3, 4-epoxycyclohexenyl acid ester.
The polymerizable monomers/oligomers of the present invention are various mono-or multi-functional aromatic monomers/oligomers having c=c unsaturated double bonds and having a higher refractive index, including, but not limited to, for example, N-vinyl pyrrole, N-vinyl carbazole, N-vinyl imidazole, N-vinyl indole, N-vinyl pyrrolidone, trans-N-3-acetylenylbutylcarbazole, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, benzyl acrylate, epoxy bisphenol a acrylate, epoxy bisphenol F acrylate, and the like; preferably, the epoxy bisphenol a acrylate or epoxy bisphenol F acrylate has an epoxy linkage number of not less than 10, and is commercially available as SR348, SR349, SR540, SR541, SR542, SR601, SR602, etc. manufactured by sartomer company.
The photosensitizer is at least one of various dyes with higher electron transfer efficiency, such as cyanine dyes, fluorescein dyes, coumarin dyes, nitrogen-containing aromatic heterocyclic compounds, aromatic amine compounds, benzylidene cycloalkanone compounds, coumarin dyes connected by cycloalkanone (ZL 200310122499.5; ZL 200310122498.0), coumarin dyes connected by stilbene (ZL 200510135231.4), homemade photosensitizers and the like.
The initiator is at least one of onium salts, biimidazole, organic metal compounds, organic boride, diphenyl ketone, mi's ketone, various C1-C10 alkyl substituted thioxanthone, acetophenone derivatives, benzoin ethers, alpha-aminoketones, alpha-hydroxyketones, homemade initiator and the like.
Preferably, the onium salts of the present invention are iodonium salts, sulfonium salts, or mixtures thereof; the bisimidazoles are hexaarylbisimidazoles; the organic metal compound is a titanocene compound, ferrocenium salt or a mixture thereof; the organic boride is butyl triphenylborate; the acetophenone derivative is alpha-hydroxycyclohexyl acetophenone; the benzoin ethers are benzoin dimethyl ether; the alpha-aminoketone is I-907, I-369 or a mixture thereof produced by German Ciba company; the alpha-hydroxy ketone is Darocur-1173, darocur-2959, darocur-4265 or their mixture.
The chain transfer agent is a mercaptan compound, such as dodecyl mercaptan, hexyl mercaptan, phenethyl mercaptan, 4-methyl-4H-1, 2, 4-triazole-3-mercaptan, 5- (4-pyridyl) -1,3, 4-oxadiazole-2-mercaptan and the like or a mixture thereof.
The defoamer is an organic silicon defoamer, such as BYK-065, BYK-066, BYK-088, BYK-141, BYK-W969, BYK-LP D24043 and the like or a mixture thereof, which are produced by Bayer company of Germany.
The leveling agent is an organosilicon surface auxiliary agent and is at least one selected from the group consisting of BYK-306, BYK-310, BYK-344, BYK-358, BYK-1790, BYK-1794 produced by Germany Bayer company, and the like, which are produced by Germany rather than the pretty 455, 466.
The plasticizer is at least one selected from the group consisting of toluene, xylene, dimethylformamide, dimethylacetamide and the like with low volatility.
The amine curing agent is a medium-low temperature amine curing agent with the curing temperature less than or equal to 60 ℃, such as at least one selected from the group consisting of diethylenetriamine, triethylenetetramine, tetraethylenepentamine, divinylpropylamine, 2-methylpentanediamine, 1, 3-pentanediamine, 1, 2-cyclohexanediamine, isophoronediamine, self-made fluorine-containing amine curing agent and the like.
The invention also provides a preparation method of the photopolymer type holographic recording medium, which comprises the following steps:
the photopolymer type volume hologram recording medium of the present invention is a circular optical disk or a square disk of the above-mentioned photopolymer type hologram recording material sandwiched between two optical substrates, and is described in detail with reference to CN200910237040.7, and the specific operation steps are as follows:
processing a square or hollow disc-shaped substrate with a certain size according to the requirement, and plating one or more layers of antireflection films on one or two sides of the substrate. The substrate may be made of common glass, optical glass, quartz glass or the like commonly used in the art, wherein the square substrate has dimensions of length x width x height of (20-150 mm) × (0.5-2 mm), and the hollow disc-shaped substrate has an inner diameter of 10-20 mm, an outer diameter of 50-150 mm, and a thickness of 0.5-2 mm. The material of the antireflection film can be zirconia, silica, alumina or any combination of zirconia, silica and alumina which are commonly used in the field. The thickness of the antireflection film is determined by the laser wavelength of the required antireflection, and the specific laser wavelength is one or a combination of a plurality of wavelengths of 457nm, 473nm, 488nm, 514nm or 532 nm.
The corresponding spacers are machined according to the shape and size of the substrate. The gasket can be made of silicone rubber or polytetrafluoroethylene commonly used in the field, wherein the square gasket of the adaptive type substrate can be 0.1-2 mm in thickness, 20-150 mm in length and width, 10-146 mm in width and 10-146 mm in length and width, and the circular big gasket and the circular small gasket are respectively 10-146 mm in inner diameter, 14-150 mm in outer diameter and 0.1-2 mm in thickness.
According to the quantity of the volume of the photopolymer infusion, the gasket is provided with a small opening and is correspondingly placed between the two substrates, a mold for preparing the photopolymer type volume hologram recording medium with a sandwich structure is assembled, and the mold is fixed by a clamp.
The above-mentioned holographic recording medium mold with controllable size and thickness and the photopolymer mixture were placed in a glove box filled with nitrogen gas, and the mixture was injected into the mold through a small opening in a gasket in the mold using a syringe, as shown in fig. 2. And after the pouring is finished, placing the obtained sample at room temperature for 48-72 hours, removing the clamp after the film forming resin in the pouring liquid is completely solidified, sealing the small opening on the gasket by using sealant, and wrapping the gasket by using aluminum foil paper and preserving the gasket in a dark place to obtain the photopolymer type volume hologram recording medium.
The beneficial effects of the invention are as follows:
the fluorine-containing epoxy resin comprises fluorine groups and at least two epoxy alkyl groups, has low refractive index, and can react with organic amine with double or multiple functionalities to form a crosslinked network; the holographic recording medium is prepared by mixing the raw material of the film-forming resin with polymerizable monomers/oligomers serving as information recording components. The low refractive index and low surface energy of the fluorine-containing epoxy resin can increase the refractive index difference between the polymerized monomer/oligomer and the film-forming resin and improve the mobility of the polymerized monomer/oligomer, so that the diffraction efficiency of the holographic recording medium is more than 85%, the sensitivity is more than 0.1cm/mJ, the Bragg selection angle is less than 1 degree, and the holographic recording medium can respond in a wide-band range of 400-650 nm.
Meanwhile, the synthesis method of the fluorine-containing epoxy resin is simple, raw materials are easy to obtain, synthesis conditions are mild, and mass production is easy to realize. The manufacturing cost of the photopolymer holographic recording medium is low, the size and thickness of the photopolymer holographic recording medium are controllable, different photopolymer materials are selected for manufacturing, various lasers with matched wavelengths can be selected in a wide-band range of 400-650 nm to be used as information recording light sources, and mass storage of information is realized through angle multiplexing and wavelength multiplexing; after the information is recorded, the recorded information can be stably stored for a long time, is little influenced by environmental factors, and has application potential in the field of high-density optical storage.
Drawings
The following describes the embodiments of the present invention in further detail with reference to the drawings.
FIG. 1 shows nuclear magnetic resonance spectra (a) H of the fluorine-containing epoxy resins synthesized in examples 1 to 3 of the present invention 1 NMR and (b) F 19 HMR。
Fig. 2 is a schematic diagram showing a process flow of the photopolymer type hologram recording medium according to examples 4 to 6 of the present invention.
FIG. 3 shows exposure characteristic curves of the photopolymer type hologram recording medium (thickness of 0.5 mm) in examples 4 to 6 of the present invention and comparative example 1.
FIG. 4 shows the photopolymers of examples 4 to 6 of the present inventionHolographic recording Medium (thickness 0.5 mm) was exposed to a transmissive hologram for 30s (60 mJ/cm) 2 ) A hologram was written and a reproduction pattern was read out, (a) an original image was written ("15" had a size of 1.5mm and a distance between any two points in the lattice was 0.4 mm), (b) an image was read out in example 4, (c) an image was read out in example 5, and (d) an image was read out in example 6.
FIG. 5 shows that the photopolymer type hologram recording media (thickness of 0.1 mm) of examples 4 to 6 and comparative example 1 of the present invention were exposed to an emissive hologram exposure for 30 seconds (120 mJ/cm) 2 ) Recorded hologram original and reproduction observed under fluorescent lamp, (a) original image of coin, (b) comparative example 1 reproduction, (c) example 4 reproduction, (d) example 5 reproduction, and (e) example 6 reproduction.
Detailed Description
In order to more clearly illustrate the present invention, the present invention will be further described with reference to preferred embodiments and the accompanying drawings. Like parts in the drawings are denoted by the same reference numerals. It is to be understood by persons skilled in the art that the following detailed description is illustrative and not restrictive, and that this invention is not limited to the details given herein.
The experimental methods used in the following examples are all conventional methods unless otherwise specified; reagents, biological materials, etc. used in the examples described below are commercially available unless otherwise specified. The experimental methods and optical equipment used in the examples below are all conventional in the art.
Example 1
Preparation of fluorine-containing epoxy resin-1
Commercially available trimethylolpropane triglycidyl ether (15.14 g,0.05 mol), perfluorooctanoic acid (16.57 g,0.04 mol) and dioxane (250 mL) were added to a 500mL round bottom flask and mixed with sufficient agitation, 0.2mL of triethylamine was added, and the temperature was raised to 80℃and stirred for 12h. Thereafter, the volatile solvent was removed by rotary evaporation, and the residual reaction solution was purified with dichloromethaneAlkane was diluted, washed twice with 0.05mol/L NaOH (200 mL), 0.1mol/L HCl (200 mL) and distilled water (200 mL), respectively, and the organic phase was washed with anhydrous Na 2 SO 4 Drying, filtering and concentrating to obtain 21.48g light viscous liquid, nuclear magnetic resonance spectrum H 1 NMR and F 19 HMR is shown in FIG. 1 and its refractive index at room temperature is shown in Table 1.
Example 2
Preparation of fluorine-containing epoxy resin-2
A500 mL round bottom flask was thoroughly stirred with the addition of commercially available pentaerythritol tetraglycidyl ether (18.54 g,0.05 mol), perfluoropropionic acid (6.75 g,0.04 mol) and dioxane (250 mL), followed by 0.2mL triethylamine and stirring at 80℃for 12h. Thereafter, the volatile solvent was removed by rotary evaporation, and the residual reaction solution was diluted with methylene chloride, washed twice with 0.05mol/L NaOH (200 mL), 0.1mol/L HCl (200 mL) and distilled water (200 mL), respectively, and the organic phase was washed with anhydrous Na 2 SO 4 Drying, filtering and concentrating to obtain 17.48g light viscous liquid, nuclear magnetic resonance spectrum H 1 NMR and F 19 HMR is shown in FIG. 1 and its refractive index at room temperature is shown in Table 1.
Example 3
Preparation of fluorine-containing epoxy resin-3
Commercially available ethylene glycol diglycidyl ether (15.71 g,0.09 mol), perfluoro suberic acid (14.56 g,0.04 mol) and dioxane (250 mL) were added to a 500mL round bottom flask and mixed with sufficient agitation, 0.2mL triethylamine was added, and the temperature was raised to 90℃and stirred for 20h. Thereafter, the volatile solvent was removed by rotary evaporation, and the residual reaction solution was diluted with methylene chloride, washed twice with 0.05mol/L NaOH (200 mL), 0.1mol/L HCl (200 mL) and distilled water (200 mL), respectively, and the organic phase was washed with anhydrous Na 2 SO 4 Drying, filtering and concentrating to obtain 19.04g colorless viscous liquid, nuclear magnetic resonance spectrum H 1 NMR and F 19 HMR is shown in FIG. 1 and its refractive index at room temperature is shown in Table 1.
Table 1 shows the refractive indices of the fluorine-containing epoxy resins synthesized in examples 1 to 3 and the fluorine-free epoxy resin in comparative example 1 at room temperature.
TABLE 1 refractive index at room temperature of the fluorine-containing epoxy resins synthesized in examples 1-3 and the fluorine-free epoxy resin in comparative example 1
Example 4
Preparation of photopolymer type holographic recording medium
Preparation of photopolymer mixture: in a dark room, to 500ml of a vessel with stirring equipment, add in order:
stirring for 10-15 min at room temperature to mix them uniformly, filtering with 0.45 μm filter to remove dust and other particulates in the mixed solution to obtain filtrate. And (3) putting the filtrate into a vessel capable of being vacuumized, decompressing and degassing, injecting nitrogen into the filtrate in the vessel, and standing for later use.
Preparation of a holographic recording medium mold: 20 square substrates with the dimensions of 50X 1.0 (length X width X height, unit: mm), 5 square gaskets with the dimensions of 50X 50 (length X width, unit: mm) of an outer frame, 40X 40 (length X width, unit: mm) of an inner frame, 0.5mm of thickness and 5 square gaskets with the dimensions of 50X 50 (length X width, unit: mm) of an inner frame, 40X 40 (length X width, unit: mm) of an inner frame and 0.1mm of thickness are selected, wherein the substrates are K9 optical glass with 514nm antireflection films coated on both sides, the gaskets are made of polytetrafluoroethylene, a small opening is formed in the square gaskets, one square gasket is correspondingly placed between two square substrates, and a square mold with the hollow volume of 40X 0.5 (length X width X height, unit: mm) of a 5 sandwich structure and the hollow volume of 40X 0.1 (length X width X height, unit: mm) of the 5 sandwich structure is assembled for standby use.
Preparation of photopolymer holographic recording media: the above-mentioned hologram recording medium mold and photopolymer mixture was placed in a glove box filled with nitrogen gas, and the mixture was injected into the optical disc mold through a small opening in a spacer in the mold using a syringe, as shown in fig. 2. And after the pouring is finished, placing the obtained sample at room temperature for 48 hours, completely solidifying the film-forming resin in the pouring liquid, removing the clamp, sealing the small opening on the gasket by using sealant, and wrapping the gasket by using aluminum foil paper and preserving the gasket in a dark place to obtain the photopolymer holographic recording medium.
The holographic performance parameters of the photopolymer holographic recording medium (thickness 0.5 mm) in example 4 are shown in Table 2.
Example 5
A photopolymer type hologram recording medium was prepared according to the method described in example 4, except that the raw materials thereof were as follows:
the holographic performance parameters of the photopolymer holographic recording medium (thickness 0.5 mm) in example 5 are shown in Table 2.
Example 6
A photopolymer type hologram recording medium was prepared according to the method described in example 4, except that the raw materials thereof were as follows:
the holographic performance parameters of the photopolymer holographic recording medium (thickness 0.5 mm) in example 6 are shown in Table 2.
Comparative example 1
A photopolymer type hologram recording medium was prepared according to the method described in example 4, except that the raw materials thereof were as follows:
wherein the refractive index of the fluorine-free epoxy resin trimethylolpropane triglycidyl ether at room temperature is shown in Table 1. The holographic performance parameters of the photopolymer type holographic recording medium (thickness of 0.5 mm) in comparative example 1 are shown in Table 2.
Table 2 shows the holographic performance parameters of the photopolymer type holographic recording media (thickness 0.5 mm) of examples 4-6 and comparative example 1.
TABLE 2 holographic Performance parameters of the photopolymer holographic recording media (thickness 0.5 mm) of examples 4-6 and comparative example 1
Application example 1
Holographic performance test evaluation of photopolymer type holographic recording Medium:
a solid laser with 473nm wavelength is used as a light source, a laser spot with the diameter of 8mm is obtained through a beam expander, two light beams with the light intensity of 1:1 are obtained through a beam splitter and a half-wave plate, the light beams intersect in a photopolymer type holographic recording medium for exposure, the normal line of the recording medium bisects the two light beams, the included angle of the two light beams is 30 degrees, and the light intensity is 0.5-1.5 mW/cm 2 At the same time, a 785nm wavelength solid laser is used as a detection light source (the recording medium does not react with the solid laser), the exposure area is irradiated from Bragg angle incidence, and the light intensity of the transmitted light and the diffracted light of the holographic grating in the exposure area is monitored in real time by a photoelectric detector. The diffraction efficiency (eta) of the single grating is calculated by diffraction light/(diffraction light+transmission light), and the diffraction efficiency (eta) is calculated byThe photosensitivity (S) of the recording medium is calculated. After the exposure is completed, the incidence angle of the probe light is gradually changed near the Bragg angle, the diffraction light is reduced from a maximum value to a minimum value, and the corresponding angle interval between the minimum values is the selection angle (delta theta) of the recording medium.
Fig. 3 shows exposure characteristic curves (single grating diffraction efficiency versus exposure variation curves) of the photopolymer type hologram recording medium (thickness of 0.5 mm) in examples 4 to 6 and comparative example 1. Experimental results show that the photopolymer type volume hologram recording medium based on the fluorine-containing epoxy resin has the characteristics of quick response time, high sensitivity and good angle selectivity.
Application example 2
Transmission hologram recording and reproduction of a photopolymer type hologram recording medium:
using 514nm wavelength argon ion laser as light source, modulating original image information to object light with spatial modulator, and reference light intensity is 1mW/cm 2 The maximum light intensity of the object light is 1mW/cm 2 The included angle between the reference light and the object light is 60 degrees, the hologram is written into the photopolymer type holographic recording medium, and the high-density holographic storage of the image information can be realized by the angle multiplexing of the change of the position and the same position (the high diffraction efficiency and the good angle selectivity of the recording medium are required).
FIG. 4 shows the exposure of a photopolymer type holographic recording medium (thickness of 0.5 mm) in examples 4-6 to a transmissive hologram for 30s (60 mJ/cm) 2 ) A hologram was written and a reproduction pattern was read out, (a) an original image was written ("15" had a size of 1.5mm and a distance between any two points in the lattice was 0.4 mm), (b) an image was read out in example 4, (c) an image was read out in example 5, and (d) an image was read out in example 6. It can be seen that the images stored in the photopolymer type hologram recording media of examples 4 to 6 of the present invention can be completely clearly reproduced.
Application example 3
Reflection hologram recording and reproduction of a photopolymer type hologram recording medium:
YAG pulse laser with 532nm wavelength is used as light source, one coin is adhered to one side of the holographic record medium, the laser beam is amplified by concave lens and irradiated onto the coin from the other side via the record medium, the included angle between the laser and the coin is 80 deg, and after exposure, the hologram is observed under fluorescent lamp.
FIG. 5 shows the exposure of the photopolymer type holographic recording media (thickness 0.1 mm) of examples 4-6 and comparative example 1 to reflective holographic light for 30s (120 mJ/cm) 2 ) Recorded hologram original and reproduction observed under fluorescent lamp, (a) original image of coin, (b) comparative example 1 reproduction, (c) example 4 reproduction, (d) example 5 reproduction, and (e) example 6 reproduction. The results demonstrate that holograms recorded in photopolymer type holographic recording media based on fluorine-containing epoxy resins have better resolution and spatial resolution.
It should be understood that the foregoing examples of the present invention are provided merely for clearly illustrating the present invention and are not intended to limit the embodiments of the present invention, and that various other changes and modifications may be made therein by one skilled in the art without departing from the spirit and scope of the present invention as defined by the appended claims.
Claims (5)
1. The fluorine-containing epoxy resin with low refractive index is characterized by having the following structural formula:
2. a method of synthesizing the fluorine-containing epoxy resin according to claim 1, wherein the synthesis of the fluorine-containing epoxy resin-1 comprises the steps of:
15.14g of trimethylolpropane triglycidyl ether, 16.57g of perfluorooctanoic acid and 250mL of dioxane were added to a 500mL round bottom flask, mixed with stirring thoroughly, 0.2mL of triethylamine was added, the temperature was raised to 80℃and stirred for 12 hours, after which the volatile solvent was removed by rotary evaporation and the residual reaction solution was diluted with dichloromethane, washed twice with 200mL of 0.05mol/L NaOH, 200mL of 0.1mol/L HCl and 200mL of distilled water, respectively, and the organic phase was dried over anhydrous Na 2 SO 4 Drying, filtering and concentrating.
3. A method of synthesizing the fluorine-containing epoxy resin according to claim 1, wherein the synthesis of the fluorine-containing epoxy resin-2 comprises the steps of:
18.54g of pentaerythritol tetraglycidyl ether, 6.75g of perfluoropropionic acid and 250mL of dioxane were added to a 500mL round bottom flask, mixed with stirring thoroughly, 0.2mL of triethylamine was added, the temperature was raised to 80℃and stirred for 12 hours, after which the volatile solvent was removed by rotary evaporation and the residual reaction solution was diluted with methylene chloride, washed twice with 200mL of 0.05mol/L NaOH, 200mL of 0.1mol/L HCl and 200mL of distilled water, respectively, and the organic phase was dried over anhydrous Na 2 SO 4 Drying, filtering and concentrating.
4. A method of synthesizing the fluorine-containing epoxy resin according to claim 1, wherein the synthesis of the fluorine-containing epoxy resin-3 comprises the steps of:
15.71g of ethylene glycol diglycidyl ether, 14.56g of perfluoro suberic acid and 250mL of dioxane were added to a 500mL round bottom flask, mixed with stirring thoroughly, 0.2mL of triethylamine was added, the temperature was raised to 90℃and stirred for 20 hours, after which the volatile solvent was removed by rotary evaporation and the residual reaction solution was diluted with dichloromethane, washed twice with 200mL of 0.05mol/L NaOH, 200mL of 0.1mol/L HCl and 200mL of distilled water, respectively, and the organic phase was dried over anhydrous Na 2 SO 4 Drying, filtering and concentrating.
5. A photopolymer type hologram recording medium comprising the fluorine-containing epoxy resin according to claim 1, wherein the photopolymer type hologram recording medium is selected from one of the following schemes;
scheme one: a fluorine-containing epoxy resin according to claim 1-1 g; 10 g of butanediol diglycidyl ether; 25 g of N-vinylcarbazole; 0.01 g of 2, 5-bis [4- (diethylamino) -benzylidene ] cyclopentanone; hexaarylbisimidazole 0.9 g; 0.9 g of 4-methyl-4H-1, 2, 4-triazole-3-thiol; BYK-066.1 g; BYK-344.1 g; 3 g of dimethylformamide; 15 g of tetraethylenepentamine;
scheme II: 2-2.40 g of the fluorine-containing epoxy resin according to claim 1; 15 g of propylene glycol diglycidyl ether; 15 g of N-vinylcarbazole; 10 g of N-vinyl pyrrolidone; 0.02 g of 2, 5-bis [ 9-julolidine-2-methylene ] cyclopentanone; IR 784.9 g; 0.9 g of phenethyl mercaptan; BYK-141.1 g; BYK-358.1 g; 2 g of dimethylacetamide; diethylenetriamine 16 g;
scheme III: the fluorine-containing epoxy resin according to claim 1, wherein the fluorine-containing epoxy resin comprises-3.40 g, ethylene glycol diglycidyl ether 15 g, N-vinylcarbazole 20 g, benzyl methacrylate 5g, 2, 5-bis [4- (dimethylamino) -thiophene-2-methylene ] cyclopentanone 0.01 g, IR 2959.9 g, 5- (4-pyridyl) -1,3, 4-oxadiazole-2-thiol 0.9 g, BYK-W969 0.1 g, BYK-1790.1 g, xylene 3 g, and triethylenetetramine 15 g.
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