CN114858759A - Method for measuring in-plane optical anisotropy of low-dimensional material - Google Patents

Method for measuring in-plane optical anisotropy of low-dimensional material Download PDF

Info

Publication number
CN114858759A
CN114858759A CN202210516591.2A CN202210516591A CN114858759A CN 114858759 A CN114858759 A CN 114858759A CN 202210516591 A CN202210516591 A CN 202210516591A CN 114858759 A CN114858759 A CN 114858759A
Authority
CN
China
Prior art keywords
plane
wave
light beam
sample
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210516591.2A
Other languages
Chinese (zh)
Inventor
赵建林
罗祥元
张继巍
米婧宇
豆嘉真
王灵珂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Northwestern Polytechnical University
Original Assignee
Northwestern Polytechnical University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northwestern Polytechnical University filed Critical Northwestern Polytechnical University
Priority to CN202210516591.2A priority Critical patent/CN114858759A/en
Publication of CN114858759A publication Critical patent/CN114858759A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005Adaptation of holography to specific applications
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/0443Digital holography, i.e. recording holograms with digital recording means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/08Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0866Digital holographic imaging, i.e. synthesizing holobjects from holograms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/10Processes or apparatus for producing holograms using modulated reference beam
    • G03H1/12Spatial modulation, e.g. ghost imaging
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005Adaptation of holography to specific applications
    • G03H2001/0033Adaptation of holography to specific applications in hologrammetry for measuring or analysing
    • G03H2001/0038Adaptation of holography to specific applications in hologrammetry for measuring or analysing analogue or digital holobjects
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/0443Digital holography, i.e. recording holograms with digital recording means
    • G03H2001/0445Off-axis recording arrangement
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/08Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0866Digital holographic imaging, i.e. synthesizing holobjects from holograms
    • G03H2001/0883Reconstruction aspect, e.g. numerical focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computing Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

The invention provides a method for measuring in-plane optical anisotropy of a low-dimensional material by utilizing multi-direction excitation surface plasma resonance holographic microscopy. A thin laser beam emitted by a laser forms linearly polarized parallel light after passing through a beam expanding collimation system, enters a surface plasma resonance excitation device and excites a surface plasma wave after passing through a light beam incidence direction control device and a light beam polarization state regulation device, forms an object light wave carrying sample information after interacting with a sample placed above the excitation device, introduces a known light beam coherent with the object light wave as a reference light wave, and the known light beam and the reference light wave enter a holographic imaging system to mutually interfere and form an off-axis hologram on a camera target surface. And obtaining a plurality of holograms by changing the incident angle and the in-plane projection direction of the light beam for a plurality of times, reading by a computer, performing numerical reconstruction and data fitting, and finally measuring to obtain the in-plane optical anisotropy parameters of the sample. Compared with the traditional Raman spectrum technology, the method avoids the requirement of comparing experimental data with a huge database, and can realize wide-field quasi-dynamic measurement.

Description

Method for measuring in-plane optical anisotropy of low-dimensional material
Technical Field
The invention relates to the field of optics, in particular to the field of optical precision measurement.
Background
Low-dimensional materials such as two-dimensional materials, one-dimensional materials, quantum dot materials and the like show a quantum effect because the dimension of one or more dimensions is very limited, and the performance of the low-dimensional materials is often greatly different from that of bulk materials. Among these properties, in-plane optical anisotropy plays an important role in the production of novel optical elements, the development of micro-nano optoelectronic devices, the improvement of semiconductor devices, and the like. However, the currently used Raman spectroscopy (d.a. chenet, et al, "In-plane anisotropic In mono-and few-layer ReS2 probe by Raman spectroscopy and scanning transmission electron microscopy," Nano letters,15,5667-5672(2015)) for characterizing In-plane optical anisotropy of low-dimensional materials has the disadvantages of non-intuitive signal, difficulty In real-time monitoring, and wide-field measurement. Surface plasmon resonance (Surface plasmon resonance) holographic microscopy (SPRHM) has the advantages of high sensitivity, rapidness, real-time performance, non-destructive, non-invasive, wide-field quantitative measurement and the like, and is widely applied to the fields of virus detection, biological sample analysis, micro-nano device detection and the like. By utilizing the SPRHM and combining a computer control program and a demodulation algorithm, the in-plane optical anisotropy of the low-dimensional material sample can be represented in real time, and the weak change of the low-dimensional material sample under external (such as force, heat, sound, light, electricity, magnetism and the like) stimulation is monitored.
Disclosure of Invention
In order to achieve the purpose, the invention provides a method for measuring in-plane optical anisotropy of a low-dimensional material by using multi-direction excitation SPRHM. As shown in fig. 1, the spatial azimuth of the light irradiating the surface plasmon resonance excitation device in the SPRHM may be divided into two parts, the included angle with the normal of the sample surface is an incident angle, and a suitable incident angle may satisfy the wave vector matching condition to excite the surface plasmon resonance; the direction in which the projection of the incident light on the sample plane is located (referred to simply as the in-plane direction) determines the propagation direction of the surface plasmon wave and the vibration direction of the in-plane electric field thereof. The difference of electric field responses of the atomic layer of the low-dimensional material sample to different vibration directions in the surface is utilized, incident light waves in different directions are used for exciting surface plasmon resonance, and the complex amplitude information of reflected light waves under the corresponding resonance condition is measured through SPRHM, so that the quantitative characterization of the optical anisotropy in the surface of the low-dimensional material in the near-field region of the metal surface is realized.
Technical scheme
The technical scheme adopted by the invention for solving the technical problems is as follows: an in-plane optical anisotropy measurement method for a low-dimensional material by utilizing multi-direction excitation SPRHM is characterized by comprising the following steps:
step 1, linear polarization parallel light is incident to a surface plasma resonance excitation structure at a resonance angle to excite a surface plasma wave.
Step 2, changing the in-plane direction of the incident beam
Figure BDA0003639906200000021
The incident angle theta, the reflected light beam as object light wave and the reference light wave generate off-axis interference, and off-axis holograms corresponding to different in-plane directions and incident angles are recorded and obtained
Figure BDA0003639906200000022
Step 3, according to a wave optics theory, numerically simulating a diffraction reconstruction process of the optical wave, and numerically reconstructing the hologram to obtain amplitude and phase distribution information of an object optical wave field;
and 4, fitting and calculating the complex refractive index of the sample in each in-plane direction according to the amplitude and the phase of the object light wave field reconstructed by the numerical value according to a Fresnel formula.
The step 2 comprises the following main points:
a. the variation range of the in-plane direction is 360 degrees for one circle, and enough sampling points are ensured;
b. the variation range of the incident angle should include the resonance angle in each in-plane direction in step 1;
the step 4 comprises the following steps:
a. utilizing a Fresnel formula to theoretically calculate a plurality of groups of intensity reflectivity curves and reflection phase shift curves under different sample complex refractive indexes;
b. fitting the experimental data of the intensity reflectivity and the reflection phase shift of different incidence angles in the same in-plane direction with the theoretical curve obtained in the step a to obtain the complex refractive index of the sample in the in-plane direction;
c. and b is repeated to obtain the complex refractive index of the sample under all in-plane directions.
The technical scheme adopted by the invention for solving the technical problems is as follows: the device comprises a sample to be measured, a laser, a set of beam expanding and collimating devices, a set of light beam incidence direction control device, a set of light beam polarization state regulating and controlling device, a set of surface plasma resonance excitation device, a set of holographic imaging system, a camera, a computer and a corresponding fixing device. As shown in fig. 2, a thin laser beam emitted by the laser is collimated by the beam expanding and collimating device to form a linearly polarized plane wave, and then sequentially passes through the beam incident direction control device and the beam polarization state control device, enters the surface plasmon resonance excitation device and excites surface plasmon resonance, a low-dimensional material sample placed in a near-field region above the surface plasmon resonance excitation device interacts with the surface plasmon wave, and a reflected light wave reflected by the surface plasmon resonance excitation device carries sample information as an object light wave, and enters the holographic imaging system. A known beam of light coherent with the object beam is introduced from the laser as a reference wave, interferes with the object beam and forms an off-axis hologram on the camera. And changing the in-plane direction and the incident angle of the light beam for multiple times by the light beam incident direction control device to obtain multiple holograms, reading by the computer, performing numerical reconstruction and data fitting, and finally measuring to obtain the in-plane optical anisotropy parameters of the sample.
Advantageous effects
The invention avoids the defects that the traditional Raman spectrum technology can not carry out wide-field measurement and the measurement signal needs to be compared with a huge database, and can measure the in-plane optical anisotropy parameters of the low-dimensional material by utilizing a single system and combining a basic optical numerical reconstruction algorithm. The measuring system has higher time resolution, can realize quasi-dynamic monitoring of optical anisotropy in the low-dimensional material surface, and has important significance for researching and expanding the related physical property change of the low-dimensional material.
Drawings
FIG. 1 is a schematic diagram of a sample surface, an incident light wave, a projection direction of the incident light wave in a horizontal plane, and an incident angle;
FIG. 2 is a schematic diagram of a method for measuring in-plane optical anisotropy of a low-dimensional material by using a multi-directional excitation method;
FIG. 3 is a light path diagram of an embodiment of a method for measuring in-plane optical anisotropy of a low-dimensional material by using a multi-directional excitation method;
in fig. 1: 1-incident light wave, 2-projection of incident light wave on sample surface, 3-normal of sample surface, 4-sample surface, 5-in-plane projection direction
Figure BDA0003639906200000041
6-angle of incidence θ;
in fig. 2: 1-a laser, 2-a beam expanding and collimating device, 3-a light beam incidence direction control device, 4-a light beam polarization state regulation and control device, 5-a surface plasma resonance excitation device containing a sample to be tested, 6-a holographic imaging device and 7-a camera;
in fig. 3: 1-632.8nm laser, 2-objective lens, 3-pinhole, 4-convex lens, 5-two-dimensional galvanometer control deflection mirror, 6-convex lens, 7-unpolarized beam splitter, 8-1 order vortex half-wave plate, 9-convex lens with same focal length and 10-convex lens with same focal length, 11-high numerical aperture oil immersion microscope objective lens, 12-cover glass, 13-chromium film with thickness of 1.5nm, 14-gold film with thickness of 50nm, 15-sample to be detected, 16-convex lens, 17-Wollaston prism, 18-polaroid and 19-camera.
Detailed Description
The invention will now be further described with reference to the following examples and drawings:
the invention designs a system for measuring in-plane optical anisotropy of a low-dimensional material by utilizing multi-direction excitation SPRHM, which is shown in figure 3, and adopts an objective lens (2), a pinhole (3) and a convex lens (4) to form a beam expanding and collimating device; a two-dimensional galvanometer system (5) with orthogonal rotating shafts is used as a light beam incidence direction control device; the convex lenses (9, 10) and the 1 st order vortex half-wave plate (8) form a light beam polarization state regulating device; a surface plasma resonance excitation device (shown in a dotted line frame at the upper right of the figure 3) consists of a microscope objective (11), a cover glass (12), a chromium film (13) and a gold film (14); the micro objective (11), the convex lenses (9, 10 and 16), the 1 st order vortex half-wave plate (8), the Wollaston prism (17) and the polaroid (18) form a holographic imaging device.
The specific working process is as follows:
the linearly polarized thin laser beam emitted by the laser 1 is collimated into a beam of parallel light by the elements 2, 3 and 4, the parallel light is reflected by the vibrating mirror 5 and converged by the converging lens 6, and then passes through the non-polarized beam splitter 7, the beam is converged on the 1 st order vortex half-wave plate 8 and is modulated by the polarization state, the 4f system formed by the convex lenses 9 and 10 enables the plane where the 1 st order vortex half-wave plate 8 is located to be conjugated with the rear focal plane 12 of the microscope objective, the beam is converged on the rear focal plane of the objective in a linear polarization state of 45 degrees relative to the radial direction, and is parallelly emitted and irradiates the surface plasma resonance excitation device in the same polarization state. Wherein, P polarized light wave component excites surface plasma wave to be reflected and carries sample information as object light wave, S polarized light wave component can not excite surface plasma wave to be directly reflected and does not carry any sample information as reference light wave, the whole light beam passes through the microscope objective 11 again to be imaged, 4f systems (9, 10) translate the image presented by the microscope objective 11 to the 1 st order vortex half-wave plate 8, the object light wave and the reference light wave are modulated to the initial polarization state by the 1 st order vortex half-wave plate 8, and enters the holographic recording light path part after being reflected by the non-polarization beam splitter 7, after the image at the 1 st order vortex half-wave plate 8 is secondarily amplified by the imaging lens 16, the Wollaston prism 17 separates the object light wave and the reference light to form a certain included angle, and finally the object reference light wave is interfered after passing through the polaroid 18 and forms an off-axis hologram on the target surface of the camera 19. After the light path is built, a control signal is output by a computer, a galvanometer is slightly deflected, the incident angle of light waves in a sample area is gradually increased, images displayed on a target surface of a camera are observed, when the intensity of a sample area is severely reduced, surface plasma resonance occurs, the resonance angle under the azimuth angle is recorded, the resonance angle is respectively searched and recorded under four in-plane directions of 0 degree, 90 degrees, 180 degrees and 270 degrees, the resonance angle of 0.95 times is used as the starting point of an incident angle scanning interval, the resonance angle of 1.05 times is used as the end point of the incident angle scanning interval, and 20 sampling points are uniformly arranged; one in-plane direction sampling point is provided every 10 ° on the circumference, that is, 36 sampling points are provided on one circumference. Starting a computer scanning and automatic recording program, then starting scanning to obtain 720 off-axis holograms in total, obtaining the intensity reflectivity and the reflection phase shift under each in-plane direction and incident angle by using numerical reconstruction of a batch processing program, fitting data points under the same in-plane direction with a theoretical curve obtained by calculation of a Fresnel formula to obtain the complex refractive index (complex dielectric constant) of a sample under the in-plane direction, and comparing the complex refractive indexes of materials under different in-plane directions after finishing the data fitting of all in-plane directions to realize the in-plane optical anisotropy parameter measurement of the materials.

Claims (1)

1. A method for measuring in-plane optical anisotropy of a low-dimensional material by utilizing multi-directionally excited surface plasmon resonance holographic microscopy is characterized by comprising the following steps of:
step 1: the polarized parallel light is incident on the surface plasma resonance excitation structure at a resonance angle to excite a surface plasma wave;
step 2: changing the in-plane direction of an incident beam
Figure FDA0003639906190000011
The incident angle theta, the reflected light beam as object light wave and the reference light wave generate off-axis interference, and off-axis holograms corresponding to different in-plane directions and incident angles are recorded and obtained
Figure FDA0003639906190000012
In-plane direction
Figure FDA0003639906190000013
Range of variation of (2)The whole in-plane circle is included, and the variation range of the incident angle theta includes the resonance angle in each in-plane direction in the step 1;
and step 3: according to the wave optics theory, the diffraction reconstruction process of the optical wave is numerically simulated, the hologram is numerically reconstructed, and the amplitude and phase distribution information of the object optical wave field is obtained;
and 4, step 4: calculating a theoretical reflection intensity and a reflection phase shift curve according to a Fresnel formula, and performing least square fitting with an experimental result of the same in-plane direction to obtain a complex refractive index of the sample in the in-plane direction; this procedure is repeated to obtain complex refractive indices in all in-plane directions.
CN202210516591.2A 2022-05-12 2022-05-12 Method for measuring in-plane optical anisotropy of low-dimensional material Pending CN114858759A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210516591.2A CN114858759A (en) 2022-05-12 2022-05-12 Method for measuring in-plane optical anisotropy of low-dimensional material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210516591.2A CN114858759A (en) 2022-05-12 2022-05-12 Method for measuring in-plane optical anisotropy of low-dimensional material

Publications (1)

Publication Number Publication Date
CN114858759A true CN114858759A (en) 2022-08-05

Family

ID=82638241

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210516591.2A Pending CN114858759A (en) 2022-05-12 2022-05-12 Method for measuring in-plane optical anisotropy of low-dimensional material

Country Status (1)

Country Link
CN (1) CN114858759A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109342325A (en) * 2018-10-30 2019-02-15 南开大学 A kind of imaging method and device that low-dimensional materials anisotropy is micro-
CN115452774A (en) * 2022-09-07 2022-12-09 西北工业大学 High-resolution surface plasma resonance holographic microscopic imaging method based on multidirectional excitation

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109342325A (en) * 2018-10-30 2019-02-15 南开大学 A kind of imaging method and device that low-dimensional materials anisotropy is micro-
CN109342325B (en) * 2018-10-30 2023-12-19 南开大学 Low-dimensional material anisotropic microscopic imaging method and device
CN115452774A (en) * 2022-09-07 2022-12-09 西北工业大学 High-resolution surface plasma resonance holographic microscopic imaging method based on multidirectional excitation
CN115452774B (en) * 2022-09-07 2024-05-10 西北工业大学 High-resolution surface plasmon resonance holographic microscopic imaging method based on multidirectional excitation

Similar Documents

Publication Publication Date Title
Colomb et al. Polarization microscopy by use of digital holography: application to optical-fiber birefringence measurements
CN114858759A (en) Method for measuring in-plane optical anisotropy of low-dimensional material
EP1789753A1 (en) Method and apparatus for thin film metrology
KR102697547B1 (en) Surface shape measuring device and surface shape measuring method
CN103615993B (en) Based on micro-structural test macro and method from axle micro-interference art
US11187518B2 (en) Method and apparatus for super-resolution optical metrology
Ohyama et al. Optical interferometry for measuring instantaneous thickness of transparent solid and liquid films
Zeng et al. Axial displacement measurement with high resolution of particle movement based on compound digital holographic microscopy
CN114440785A (en) Device and method for measuring photoinduced deformation coefficient of material based on optical interference principle
CN113125387A (en) Method for enhancing surface plasma resonance phase imaging lateral resolution
Sang et al. Applications of digital holography to measurements and optical characterization
Angelsky et al. Current trends in development of optical metrology
Chein et al. New critical dimension optical metrology for submicron high-aspect-ratio structures using spectral reflectometry with supercontinuum laser illumination
CN115452774A (en) High-resolution surface plasma resonance holographic microscopic imaging method based on multidirectional excitation
Bourgade et al. Compact lens-less digital holographic microscope for MEMS inspection and characterization
Kozacki et al. Determination of optical field generated by a microlens using digital holographic method
Levin et al. An automated interference microscope for measuring dynamic objects
CN114544552B (en) Method for improving surface plasma resonance holographic microscopy image quality
Go et al. Meta Shack–Hartmann wavefront sensor with large sampling density and large angular field of view: phase imaging of complex objects
Zhang et al. Azimuthal Scanning Excitation Surface Plasmon Resonance Holographic Microscopy
Zenkova et al. New methods for measuring of surface landscape
JP6623029B2 (en) Optical distance measuring device
Choi et al. Mueller matrix metrology with multi-angle information using multiple self-interference
Ishikawa et al. Nanostructure identification using interference microscope with database
Bae et al. Beam propagation analysis on thickness measurements in quantitative phase microscopy

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination