CN114858759A - Method for measuring in-plane optical anisotropy of low-dimensional material - Google Patents
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- 239000000463 material Substances 0.000 title claims abstract description 25
- 230000003287 optical effect Effects 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 14
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- 238000000386 microscopy Methods 0.000 claims abstract description 3
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- 230000010363 phase shift Effects 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 3
- 230000010287 polarization Effects 0.000 abstract description 11
- 238000005259 measurement Methods 0.000 abstract description 7
- 238000003384 imaging method Methods 0.000 abstract description 6
- 238000001237 Raman spectrum Methods 0.000 abstract description 2
- 230000033228 biological regulation Effects 0.000 abstract description 2
- 230000001427 coherent effect Effects 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 abstract description 2
- 239000000523 sample Substances 0.000 description 25
- 238000005070 sampling Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
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- 230000005684 electric field Effects 0.000 description 2
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- 230000001105 regulatory effect Effects 0.000 description 2
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- 238000004458 analytical method Methods 0.000 description 1
- 239000012472 biological sample Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000006250 one-dimensional material Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 238000001350 scanning transmission electron microscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
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Abstract
The invention provides a method for measuring in-plane optical anisotropy of a low-dimensional material by utilizing multi-direction excitation surface plasma resonance holographic microscopy. A thin laser beam emitted by a laser forms linearly polarized parallel light after passing through a beam expanding collimation system, enters a surface plasma resonance excitation device and excites a surface plasma wave after passing through a light beam incidence direction control device and a light beam polarization state regulation device, forms an object light wave carrying sample information after interacting with a sample placed above the excitation device, introduces a known light beam coherent with the object light wave as a reference light wave, and the known light beam and the reference light wave enter a holographic imaging system to mutually interfere and form an off-axis hologram on a camera target surface. And obtaining a plurality of holograms by changing the incident angle and the in-plane projection direction of the light beam for a plurality of times, reading by a computer, performing numerical reconstruction and data fitting, and finally measuring to obtain the in-plane optical anisotropy parameters of the sample. Compared with the traditional Raman spectrum technology, the method avoids the requirement of comparing experimental data with a huge database, and can realize wide-field quasi-dynamic measurement.
Description
Technical Field
The invention relates to the field of optics, in particular to the field of optical precision measurement.
Background
Low-dimensional materials such as two-dimensional materials, one-dimensional materials, quantum dot materials and the like show a quantum effect because the dimension of one or more dimensions is very limited, and the performance of the low-dimensional materials is often greatly different from that of bulk materials. Among these properties, in-plane optical anisotropy plays an important role in the production of novel optical elements, the development of micro-nano optoelectronic devices, the improvement of semiconductor devices, and the like. However, the currently used Raman spectroscopy (d.a. chenet, et al, "In-plane anisotropic In mono-and few-layer ReS2 probe by Raman spectroscopy and scanning transmission electron microscopy," Nano letters,15,5667-5672(2015)) for characterizing In-plane optical anisotropy of low-dimensional materials has the disadvantages of non-intuitive signal, difficulty In real-time monitoring, and wide-field measurement. Surface plasmon resonance (Surface plasmon resonance) holographic microscopy (SPRHM) has the advantages of high sensitivity, rapidness, real-time performance, non-destructive, non-invasive, wide-field quantitative measurement and the like, and is widely applied to the fields of virus detection, biological sample analysis, micro-nano device detection and the like. By utilizing the SPRHM and combining a computer control program and a demodulation algorithm, the in-plane optical anisotropy of the low-dimensional material sample can be represented in real time, and the weak change of the low-dimensional material sample under external (such as force, heat, sound, light, electricity, magnetism and the like) stimulation is monitored.
Disclosure of Invention
In order to achieve the purpose, the invention provides a method for measuring in-plane optical anisotropy of a low-dimensional material by using multi-direction excitation SPRHM. As shown in fig. 1, the spatial azimuth of the light irradiating the surface plasmon resonance excitation device in the SPRHM may be divided into two parts, the included angle with the normal of the sample surface is an incident angle, and a suitable incident angle may satisfy the wave vector matching condition to excite the surface plasmon resonance; the direction in which the projection of the incident light on the sample plane is located (referred to simply as the in-plane direction) determines the propagation direction of the surface plasmon wave and the vibration direction of the in-plane electric field thereof. The difference of electric field responses of the atomic layer of the low-dimensional material sample to different vibration directions in the surface is utilized, incident light waves in different directions are used for exciting surface plasmon resonance, and the complex amplitude information of reflected light waves under the corresponding resonance condition is measured through SPRHM, so that the quantitative characterization of the optical anisotropy in the surface of the low-dimensional material in the near-field region of the metal surface is realized.
Technical scheme
The technical scheme adopted by the invention for solving the technical problems is as follows: an in-plane optical anisotropy measurement method for a low-dimensional material by utilizing multi-direction excitation SPRHM is characterized by comprising the following steps:
and 4, fitting and calculating the complex refractive index of the sample in each in-plane direction according to the amplitude and the phase of the object light wave field reconstructed by the numerical value according to a Fresnel formula.
The step 2 comprises the following main points:
a. the variation range of the in-plane direction is 360 degrees for one circle, and enough sampling points are ensured;
b. the variation range of the incident angle should include the resonance angle in each in-plane direction in step 1;
the step 4 comprises the following steps:
a. utilizing a Fresnel formula to theoretically calculate a plurality of groups of intensity reflectivity curves and reflection phase shift curves under different sample complex refractive indexes;
b. fitting the experimental data of the intensity reflectivity and the reflection phase shift of different incidence angles in the same in-plane direction with the theoretical curve obtained in the step a to obtain the complex refractive index of the sample in the in-plane direction;
c. and b is repeated to obtain the complex refractive index of the sample under all in-plane directions.
The technical scheme adopted by the invention for solving the technical problems is as follows: the device comprises a sample to be measured, a laser, a set of beam expanding and collimating devices, a set of light beam incidence direction control device, a set of light beam polarization state regulating and controlling device, a set of surface plasma resonance excitation device, a set of holographic imaging system, a camera, a computer and a corresponding fixing device. As shown in fig. 2, a thin laser beam emitted by the laser is collimated by the beam expanding and collimating device to form a linearly polarized plane wave, and then sequentially passes through the beam incident direction control device and the beam polarization state control device, enters the surface plasmon resonance excitation device and excites surface plasmon resonance, a low-dimensional material sample placed in a near-field region above the surface plasmon resonance excitation device interacts with the surface plasmon wave, and a reflected light wave reflected by the surface plasmon resonance excitation device carries sample information as an object light wave, and enters the holographic imaging system. A known beam of light coherent with the object beam is introduced from the laser as a reference wave, interferes with the object beam and forms an off-axis hologram on the camera. And changing the in-plane direction and the incident angle of the light beam for multiple times by the light beam incident direction control device to obtain multiple holograms, reading by the computer, performing numerical reconstruction and data fitting, and finally measuring to obtain the in-plane optical anisotropy parameters of the sample.
Advantageous effects
The invention avoids the defects that the traditional Raman spectrum technology can not carry out wide-field measurement and the measurement signal needs to be compared with a huge database, and can measure the in-plane optical anisotropy parameters of the low-dimensional material by utilizing a single system and combining a basic optical numerical reconstruction algorithm. The measuring system has higher time resolution, can realize quasi-dynamic monitoring of optical anisotropy in the low-dimensional material surface, and has important significance for researching and expanding the related physical property change of the low-dimensional material.
Drawings
FIG. 1 is a schematic diagram of a sample surface, an incident light wave, a projection direction of the incident light wave in a horizontal plane, and an incident angle;
FIG. 2 is a schematic diagram of a method for measuring in-plane optical anisotropy of a low-dimensional material by using a multi-directional excitation method;
FIG. 3 is a light path diagram of an embodiment of a method for measuring in-plane optical anisotropy of a low-dimensional material by using a multi-directional excitation method;
in fig. 1: 1-incident light wave, 2-projection of incident light wave on sample surface, 3-normal of sample surface, 4-sample surface, 5-in-plane projection direction6-angle of incidence θ;
in fig. 2: 1-a laser, 2-a beam expanding and collimating device, 3-a light beam incidence direction control device, 4-a light beam polarization state regulation and control device, 5-a surface plasma resonance excitation device containing a sample to be tested, 6-a holographic imaging device and 7-a camera;
in fig. 3: 1-632.8nm laser, 2-objective lens, 3-pinhole, 4-convex lens, 5-two-dimensional galvanometer control deflection mirror, 6-convex lens, 7-unpolarized beam splitter, 8-1 order vortex half-wave plate, 9-convex lens with same focal length and 10-convex lens with same focal length, 11-high numerical aperture oil immersion microscope objective lens, 12-cover glass, 13-chromium film with thickness of 1.5nm, 14-gold film with thickness of 50nm, 15-sample to be detected, 16-convex lens, 17-Wollaston prism, 18-polaroid and 19-camera.
Detailed Description
The invention will now be further described with reference to the following examples and drawings:
the invention designs a system for measuring in-plane optical anisotropy of a low-dimensional material by utilizing multi-direction excitation SPRHM, which is shown in figure 3, and adopts an objective lens (2), a pinhole (3) and a convex lens (4) to form a beam expanding and collimating device; a two-dimensional galvanometer system (5) with orthogonal rotating shafts is used as a light beam incidence direction control device; the convex lenses (9, 10) and the 1 st order vortex half-wave plate (8) form a light beam polarization state regulating device; a surface plasma resonance excitation device (shown in a dotted line frame at the upper right of the figure 3) consists of a microscope objective (11), a cover glass (12), a chromium film (13) and a gold film (14); the micro objective (11), the convex lenses (9, 10 and 16), the 1 st order vortex half-wave plate (8), the Wollaston prism (17) and the polaroid (18) form a holographic imaging device.
The specific working process is as follows:
the linearly polarized thin laser beam emitted by the laser 1 is collimated into a beam of parallel light by the elements 2, 3 and 4, the parallel light is reflected by the vibrating mirror 5 and converged by the converging lens 6, and then passes through the non-polarized beam splitter 7, the beam is converged on the 1 st order vortex half-wave plate 8 and is modulated by the polarization state, the 4f system formed by the convex lenses 9 and 10 enables the plane where the 1 st order vortex half-wave plate 8 is located to be conjugated with the rear focal plane 12 of the microscope objective, the beam is converged on the rear focal plane of the objective in a linear polarization state of 45 degrees relative to the radial direction, and is parallelly emitted and irradiates the surface plasma resonance excitation device in the same polarization state. Wherein, P polarized light wave component excites surface plasma wave to be reflected and carries sample information as object light wave, S polarized light wave component can not excite surface plasma wave to be directly reflected and does not carry any sample information as reference light wave, the whole light beam passes through the microscope objective 11 again to be imaged, 4f systems (9, 10) translate the image presented by the microscope objective 11 to the 1 st order vortex half-wave plate 8, the object light wave and the reference light wave are modulated to the initial polarization state by the 1 st order vortex half-wave plate 8, and enters the holographic recording light path part after being reflected by the non-polarization beam splitter 7, after the image at the 1 st order vortex half-wave plate 8 is secondarily amplified by the imaging lens 16, the Wollaston prism 17 separates the object light wave and the reference light to form a certain included angle, and finally the object reference light wave is interfered after passing through the polaroid 18 and forms an off-axis hologram on the target surface of the camera 19. After the light path is built, a control signal is output by a computer, a galvanometer is slightly deflected, the incident angle of light waves in a sample area is gradually increased, images displayed on a target surface of a camera are observed, when the intensity of a sample area is severely reduced, surface plasma resonance occurs, the resonance angle under the azimuth angle is recorded, the resonance angle is respectively searched and recorded under four in-plane directions of 0 degree, 90 degrees, 180 degrees and 270 degrees, the resonance angle of 0.95 times is used as the starting point of an incident angle scanning interval, the resonance angle of 1.05 times is used as the end point of the incident angle scanning interval, and 20 sampling points are uniformly arranged; one in-plane direction sampling point is provided every 10 ° on the circumference, that is, 36 sampling points are provided on one circumference. Starting a computer scanning and automatic recording program, then starting scanning to obtain 720 off-axis holograms in total, obtaining the intensity reflectivity and the reflection phase shift under each in-plane direction and incident angle by using numerical reconstruction of a batch processing program, fitting data points under the same in-plane direction with a theoretical curve obtained by calculation of a Fresnel formula to obtain the complex refractive index (complex dielectric constant) of a sample under the in-plane direction, and comparing the complex refractive indexes of materials under different in-plane directions after finishing the data fitting of all in-plane directions to realize the in-plane optical anisotropy parameter measurement of the materials.
Claims (1)
1. A method for measuring in-plane optical anisotropy of a low-dimensional material by utilizing multi-directionally excited surface plasmon resonance holographic microscopy is characterized by comprising the following steps of:
step 1: the polarized parallel light is incident on the surface plasma resonance excitation structure at a resonance angle to excite a surface plasma wave;
step 2: changing the in-plane direction of an incident beamThe incident angle theta, the reflected light beam as object light wave and the reference light wave generate off-axis interference, and off-axis holograms corresponding to different in-plane directions and incident angles are recorded and obtainedIn-plane directionRange of variation of (2)The whole in-plane circle is included, and the variation range of the incident angle theta includes the resonance angle in each in-plane direction in the step 1;
and step 3: according to the wave optics theory, the diffraction reconstruction process of the optical wave is numerically simulated, the hologram is numerically reconstructed, and the amplitude and phase distribution information of the object optical wave field is obtained;
and 4, step 4: calculating a theoretical reflection intensity and a reflection phase shift curve according to a Fresnel formula, and performing least square fitting with an experimental result of the same in-plane direction to obtain a complex refractive index of the sample in the in-plane direction; this procedure is repeated to obtain complex refractive indices in all in-plane directions.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN109342325A (en) * | 2018-10-30 | 2019-02-15 | 南开大学 | A kind of imaging method and device that low-dimensional materials anisotropy is micro- |
CN115452774A (en) * | 2022-09-07 | 2022-12-09 | 西北工业大学 | High-resolution surface plasma resonance holographic microscopic imaging method based on multidirectional excitation |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109342325A (en) * | 2018-10-30 | 2019-02-15 | 南开大学 | A kind of imaging method and device that low-dimensional materials anisotropy is micro- |
CN109342325B (en) * | 2018-10-30 | 2023-12-19 | 南开大学 | Low-dimensional material anisotropic microscopic imaging method and device |
CN115452774A (en) * | 2022-09-07 | 2022-12-09 | 西北工业大学 | High-resolution surface plasma resonance holographic microscopic imaging method based on multidirectional excitation |
CN115452774B (en) * | 2022-09-07 | 2024-05-10 | 西北工业大学 | High-resolution surface plasmon resonance holographic microscopic imaging method based on multidirectional excitation |
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