CN114849510A - Gas mixing device - Google Patents
Gas mixing device Download PDFInfo
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- CN114849510A CN114849510A CN202210780972.1A CN202210780972A CN114849510A CN 114849510 A CN114849510 A CN 114849510A CN 202210780972 A CN202210780972 A CN 202210780972A CN 114849510 A CN114849510 A CN 114849510A
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- Prior art keywords
- mixing
- gas
- baffle
- cavity
- connecting pipe
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- 238000000034 method Methods 0.000 claims abstract description 60
- 238000009792 diffusion process Methods 0.000 claims abstract description 7
- 238000007789 sealing Methods 0.000 claims description 11
- 239000007789 gas Substances 0.000 abstract description 109
- 239000012159 carrier gas Substances 0.000 abstract description 46
- 230000008021 deposition Effects 0.000 abstract description 12
- 239000000758 substrate Substances 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 12
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000012707 chemical precursor Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
- B01F25/4521—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
- B01F25/4522—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through porous bodies, e.g. flat plates, blocks or cylinders, which obstruct the whole diameter of the tube
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
Abstract
The invention provides a gas mixing device, which relates to the technical field of semiconductor deposition equipment and comprises a mixing main body and a baffle plate, wherein the mixing main body is provided with a plurality of mixing holes; the mixing main body is internally provided with a mixing channel, the baffle is positioned in the mixing main body and arranged corresponding to the mixing channel, the baffle and the end part of the mixing channel form a mixing cavity, the baffle is provided with a through hole which is arranged in a staggered way with the mixing channel, and the mixing main body is used for conveying process gas and carrier gas, when the process gas and the carrier gas are conveyed in the mixing channel, the baffle plate is used for blocking the gas in the mixing channel, the process gas and the carrier gas are forced to enter the mixing cavity for diffusion under the condition of being blocked and are finally discharged through the through hole, so that the process gas and the carrier gas are uniformly mixed after being diffused, the heavier process gas is prevented from flowing towards one direction, thereby ensuring that the gas mixing is more uniform and relieving the technical problem of nonuniform mixing of the process gas diffused into the deposition chamber to process the substrate in the prior art.
Description
Technical Field
The invention relates to the technical field of semiconductor deposition equipment, in particular to a gas mixing device.
Background
SiO plating on a substrate 2 And a-Si, it is desirable to use Tetraethylorthosilicate (TEOS) as a precursor material. Since TEOS is in standard conditions, it exists in liquid form; and chemical vapor phaseThe chemical precursors required for deposition techniques must be gases and therefore the precursors must be processed so that the starting materials can be present in a gaseous state when the reaction is taking place.
In the prior art, chemical vapor deposition uses a liquid or solid chemical source to generate a chemical precursor material, which enters a reaction chamber in a molecular form, and gaseous molecules are deposited on the surface of a substrate to generate a solid film through the reaction or decomposition of a process gas, which becomes a part of an electronic component. Therefore, the precursor material is converted to a vapor phase by passing it through a heater before it is diffused into the chemical vapor deposition chamber. However, since TEOS has a heavier specific gravity than other process or carrier gases (e.g., helium, nitrogen, etc.), if TEOS is not uniformly mixed with other process or carrier gases before being introduced into the cvd chamber, after being diffused into the cvd chamber, all TEOS tends to separate from the process or carrier gases due to the heavier TEOS, resulting in an uneven state of the solid film deposited on the substrate surface.
Disclosure of Invention
The present invention is directed to a gas mixing apparatus for reducing the problem of uneven mixing of process gases diffused into a deposition chamber for processing a substrate in the prior art.
The invention provides a gas mixing device, comprising: a mixing body and a baffle;
the mixing body is internally provided with a mixing passage, the baffle is positioned in the mixing body, the baffle and the mixing passage are correspondingly arranged, the baffle and the end part of the mixing passage form a mixing cavity, the baffle is provided with a through hole, and the through hole and the mixing passage are arranged in a staggered manner, so that gas conveyed by the mixing passage is diffused by the mixing cavity and then is discharged through the through hole.
In a preferred embodiment of the invention, the mixing body comprises a connecting tube, a cavity flange and an outlet means;
the connecting pipe with cavity flange fixed connection, the cavity flange deviates from the one end of connecting pipe with the exit mechanism is connected, the cavity flange with form sealed chamber between the exit mechanism, the baffle is located sealed intracavity portion, the baffle with form between the cavity flange the hybrid chamber, just the connecting pipe stretches into to sealed intracavity, the baffle with the tip of connecting pipe has the clearance.
In a preferred embodiment of the present invention, the baffle plate includes a recessed portion and an air guide portion;
the groove part and the air guide part are integrally formed, the air guide part is annularly arranged along the circumferential direction of the groove part, the mixing cavity is positioned between the air guide part and the cavity body flange, the through hole is positioned on the air guide part, and the mixing cavity is communicated with the sealing cavity through the through hole;
the groove part cover is arranged at the end part of the connecting pipe extending into the sealing cavity, a gap is formed between the groove part and the end part of the connecting pipe, and the groove part is used for changing the direction of the gas conveyed by the connecting pipe so as to diffuse the gas to the mixing cavity through the gap.
In a preferred embodiment of the present invention, the plurality of through holes are arranged in a circular array along the surface of the air guide portion, and the total area of the plurality of through holes is smaller than the pipe diameter area of the connecting pipe.
In the preferred embodiment of the present invention, the diameter of the through holes ranges from 0.2mm to 4mm, and the number of the through holes ranges from 10 to 150.
In a preferred embodiment of the present invention, the baffle includes a first connecting portion;
the first connecting portion and one side, far away from the groove portion, of the air guide portion are integrally formed, and the first connecting portion is connected with the cavity flange in a sealing mode.
In a preferred embodiment of the invention, the outlet means comprises a converging portion and a second connecting portion;
the convergence part is fixedly connected with the second connecting part, the second connecting part is connected with the first connecting part, the convergence part is internally connected with the through hole, and the convergence part is used for receiving gas conveyed by the through hole.
In a preferred embodiment of the present invention, an air outlet is disposed at an end of the converging portion away from the baffle, and the converging portion is arranged in a tapered shape from the end close to the baffle to the air outlet.
In a preferred embodiment of the present invention, the second connecting portion, the first connecting portion and the cavity flange are sequentially abutted, and the second connecting portion, the first connecting portion and the cavity flange are sequentially and fixedly connected.
In a preferred embodiment of the present invention, further comprises a gas inlet mechanism;
the gas inlet mechanism is connected with one end, deviating from the cavity flange, of the connecting pipe in a sealing mode, and the gas inlet mechanism is used for being connected to an outlet of an external gas tank.
The present invention provides a gas mixing device, comprising: a mixing body and a baffle; the mixing main body is internally provided with a mixing channel, the baffle is positioned in the mixing main body and arranged corresponding to the mixing channel, the baffle and the end part of the mixing channel form a mixing cavity, the baffle is provided with a through hole which is arranged in a staggered way with the mixing channel, and the mixing main body is used for conveying process gas and carrier gas, when the process gas and the carrier gas can be conveyed in the mixing channel, the gas in the mixing channel is blocked by the baffle plate, the process gas and the carrier gas are forced to enter the mixing cavity for diffusion under the condition of being blocked and are finally discharged through the through hole, so that the process gas and the carrier gas are uniformly mixed after being diffused, the heavier process gas is prevented from flowing towards one direction, thereby ensuring that the gas mixing is more uniform and relieving the technical problem of nonuniform mixing of the process gas diffused into the deposition chamber to process the substrate in the prior art.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic cross-sectional view of a gas mixing device according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a gas mixing device according to an embodiment of the present invention in a gas flowing state;
FIG. 3 is a schematic structural diagram of a gas mixing device at an inlet of a deposition chamber according to an embodiment of the present invention.
Icon: 100-a mixing body; 101-a connecting tube; 111-a mixing channel; 102-a cavity flange; 112-a mixing chamber; 103-an outlet mechanism; 113-a convergence; 123-a second connection; 133-air outlet; 200-a baffle plate; 201-groove section; 202-an air guide; 212-a via; 203-a first connection; 300-a gas inlet mechanism; 400-deposition chamber.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1 to fig. 3, the present embodiment provides a gas mixing device, including: the mixing body 100 and the baffle 200; be provided with mixing channel 111 in the mixing main part 100, baffle 200 is located mixing main part 100 inside, and baffle 200 corresponds with mixing channel 111 and arranges, and baffle 200 forms mixing chamber 112 with mixing channel 111's tip, has seted up through-hole 212 on the baffle 200, and through-hole 212 is dislocation arrangement with mixing channel 111 to discharge through-hole 212 after making mixing channel 111 convey's gas through mixing chamber 112 diffusion.
It should be noted that the gas mixing device provided in this embodiment can be installed at the outlet of the gas tank, and is used for mixing gas at the front end; or may be installed at the inlet of the deposition chamber 400 for back-end gas mixing; specifically, two kinds of gases can be input into the mixing main body 100, for the semiconductor deposition equipment, two kinds of gases, namely, a process gas and a carrier gas, can be input into the mixing main body 100, when the process gas and the carrier gas are conveyed to the end position in the mixing channel 111, the baffle 200 can block the conveying of the process gas and the carrier gas at the moment, so that the process gas and the carrier gas can enter the mixing cavity 112 along the surface of the baffle 200 to be diffused and mixed, the gases mixed in the mixing cavity 112 can be discharged through the through hole 212, and the uniform mixing is performed in the diffusion process by changing the conveying direction of the process gas and the carrier gas, so that the process gas with heavier specific gravity is prevented from flowing towards the same direction, and the gas mixing is ensured to be more uniform.
The present embodiment provides a gas mixing device, including: the mixing body 100 and the baffle 200; the mixing main body 100 is internally provided with a mixing channel 111, the baffle 200 is positioned inside the mixing main body 100, the baffle 200 and the mixing channel 111 are correspondingly arranged, the end parts of the baffle 200 and the mixing channel 111 form a mixing cavity 112, the baffle 200 is provided with a through hole 212, the through hole 212 and the mixing channel 111 are arranged in a staggered way, by conveying the process gas and the carrier gas in the mixing main body 100, when the process gas and the carrier gas can be delivered in the mixing channel 111, the gas in the mixing channel 111 is blocked by the baffle 200, the process gas and the carrier gas are forced to enter the mixing cavity 112 for diffusion under the condition of being blocked and are finally discharged through the through hole 212, so that the process gas and the carrier gas are uniformly mixed after being diffused, the condition that the heavier process gas flows towards one direction is avoided, thereby ensuring a more uniform gas mixture and alleviating the technical problem of non-uniform mixing of the process gases diffused into the deposition chamber 400 to process the substrate in the prior art.
On the basis of the above embodiments, further, in the preferred embodiment of the present invention, the mixing body 100 includes a connecting pipe 101, a cavity flange 102 and an outlet mechanism 103; connecting pipe 101 and cavity flange 102 fixed connection, cavity flange 102 deviates from the one end and the exit mechanism 103 connection of connecting pipe 101, forms sealed chamber between cavity flange 102 and the exit mechanism 103, and baffle 200 is located sealed intracavity portion, forms hybrid chamber 112 between baffle 200 and the cavity flange 102, and connecting pipe 101 stretches into to sealed intracavity, and baffle 200 has the clearance with the tip of connecting pipe 101.
In this embodiment, the connecting pipe 101 may be integrally formed with the cavity flange 102, wherein the connecting pipe 101 may be located at a central position of the cavity flange 102, an end of the connecting pipe 101 extends into the cavity flange 102, a mixing channel 111 penetrates through the inside of the connecting pipe 101, the connecting pipe 101 may receive the process gas and the carrier gas synchronously, the process gas and the carrier gas may be primarily mixed by the mixing channel 111 of the connecting pipe 101, and the connecting pipe 101 may convey the process gas and the carrier gas to the inside of the cavity flange 102; further, the cavity flange 102 and the outlet mechanism 103 are connected in a sealing manner, that is, the cavity flange 102 and the outlet mechanism 103 can form a sealed cavity, the baffle 200 is installed in the sealed cavity, and the baffle 200 can be arranged corresponding to the end of the connecting pipe 101, when the process gas and the carrier gas conveyed in the connecting pipe 101 are conveyed into the cavity flange 102, the baffle 200 can utilize the surface to block the process gas and the carrier gas in the mixing channel 111 from being conveyed linearly, in the process that the baffle 200 blocks, the process gas and the carrier gas can change the conveying direction, and diffuse into the mixing cavity 112 around the connecting pipe 101 as the center, the process gas and the carrier gas can be further mixed in the mixing cavity 112, and finally enter into the accommodating cavity of the outlet mechanism 103 through the through hole 212 penetrating through the baffle 200, so that the process gas and the carrier gas can be uniformly mixed.
Alternatively, the end of the outlet mechanism 103 remote from the cavity flange 102 may be used to connect to a pipe at the inlet of the outer deposition chamber 400, i.e., to enable back-end gas mixing.
In the preferred embodiment of the present invention, the baffle 200 includes a recessed portion 201 and an air guide portion 202; the groove part 201 and the air guide part 202 are integrally formed, the air guide part 202 is annularly arranged along the circumferential direction of the groove part 201, the mixing cavity 112 is positioned between the air guide part 202 and the cavity body flange 102, the through hole 212 is positioned on the air guide part 202, and the mixing cavity 112 and the sealing cavity are communicated through the through hole 212; groove portion 201 covers the end of connecting pipe 101 extending into the sealed cavity, and groove portion 201 has a gap with the end of connecting pipe 101, and groove portion 201 is used for changing the direction of the gas delivered through connecting pipe 101, so that the gas diffuses to mixing chamber 112 through the gap.
In this embodiment, groove portion 201 can cover the end of connecting pipe 101, and a gap is required between the bottom of groove portion 201 and connecting pipe 101, and a gap is also required between the end of groove portion 201 and cavity flange 102, that is, after the mixing passage 111 of the connection pipe 101 delivers the primarily mixed process gas and carrier gas to the chamber flange 102, the bottom wall of the groove portion 201 is directly contacted with the process gas and the carrier gas, the conveying direction of the process gas and the carrier gas can be changed by using the groove portion 201, so that the process gas and the carrier gas are extended and conveyed along the inner wall of the groove part 201 until the process gas and the carrier gas enter the mixing chamber 112 between the gas guide part 202 and the cavity flange 102, through the groove part 201, the blocking effect and the diffusion of the process gas and the carrier gas, the process gas and the carrier gas are uniformly mixed, and finally the process gas and the carrier gas after the mixing are enabled to enter the accommodating cavity of the outlet mechanism 103 through the through hole 212 penetrating through the surface of the gas guide part 202.
In the preferred embodiment of the present invention, there are a plurality of through holes 212, the plurality of through holes 212 are arranged in a circular array along the surface of the air guide 202, and the total area of the plurality of through holes 212 is smaller than the pipe diameter area of the connecting pipe 101.
In the preferred embodiment of the present invention, the diameter of the through holes 212 is in the range of 0.2mm to 4mm, and the number of the through holes 212 is 10 to 150.
In this embodiment, the discharge of the process gas and the carrier gas mixed inside the mixing chamber 112 can be ensured through the plurality of through holes 212, and the diameter range of each through hole 212 is 0.2mm to 4mm, the discharge area formed by the plurality of through holes 212 is smaller than the pipe diameter area of the connecting pipe 101, that is, the flow of the gas discharged through the through holes 212 is smaller than the flow of the gas conveyed by the connecting pipe 101, so that the process gas and the carrier gas entering the mixing chamber 112 through the conveying pipe increase the pressure, that is, the flow rate of the process gas and the carrier gas in the mixing chamber 112 can be increased, so that the process gas and the carrier gas in the mixing chamber 112 can be better mixed, and by utilizing the pressurization of the through holes 212 and the mixing of the mixing chamber 112, the complete mixing of the process gas and the carrier gas is ensured, and the design is more complete.
In the preferred embodiment of the present invention, the baffle 200 includes a first connecting portion 203; the first connecting portion 203 is integrally formed with the side of the air guide portion 202 away from the groove portion 201, and the first connecting portion 203 is hermetically connected to the cavity flange 102.
Alternatively, the cross-sectional shape of the baffle 200 may be circular, the first connection portion 203 serves as an outer circumferential structure of the baffle 200, the air guide portion 202 is located between the first connection portion 203 and the groove portion 201, and the groove portion 201 may be located at a central position of the baffle 200.
In the preferred embodiment of the present invention, the outlet mechanism 103 includes a converging portion 113 and a second connecting portion 123; the converging portion 113 is fixedly connected with the second connecting portion 123, the second connecting portion 123 is connected with the first connecting portion 203, the inside of the converging portion 113 is connected with the through hole 212, and the converging portion 113 is used for receiving the gas conveyed through the through hole 212.
In the preferred embodiment of the present invention, the second connecting portion 123, the first connecting portion 203 and the cavity flange 102 are sequentially abutted, and the second connecting portion 123, the first connecting portion 203 and the cavity flange 102 are sequentially and fixedly connected.
In this embodiment, the first connection portion 203, the cavity flange 102 and the second connection portion 123 may be arranged in a circular ring, that is, the first connection portion 203 serves as an outer circumferential structure of the baffle 200, the second connection portion 123 serves as an outer circumferential structure of the outlet mechanism 103, a receiving groove is provided inside the cavity flange 102, and an outer circumferential military training connection protrusion of the cavity flange 102 forms a sealed connection between the outlet mechanism 103, the baffle 200 and the cavity flange 102 by abutting the first connection portion 203, the connection protrusion of the cavity flange 102 and the second connection portion 123 in sequence; alternatively, the first connection portion 203, the connection protrusion of the cavity flange 102, and the second connection portion 123 may be fixed by welding or may be fixed by fixing bolts.
Optionally, the thickness of the air guide 202 is greater than that of the first connection portion 203, that is, a stepped groove is formed between the air guide 202 and the first connection portion 203, and the air guide 202 may be in sealing fixation with the inner side wall of the cavity flange 102 and the inner side wall of the converging portion 113 through the stepped groove.
In the preferred embodiment of the present invention, the end of the converging portion 113 away from the baffle 200 is provided with the air outlet 133, and the converging portion 113 is arranged in a tapered shape from the end near the baffle 200 to the air outlet 133.
In this embodiment, an accommodating cavity is formed between the converging portion 113 and the baffle 200, that is, the gas guide portion 202 and the groove portion 201 of the baffle 200 are located between the converging portion 113 and the accommodating groove of the cavity flange 102, when the process gas and the carrier gas conveyed by the connecting pipe 101 sequentially pass through the groove portion 201, the mixing cavity 112 and the through hole 212 and are conveyed to the accommodating cavity between the converging portion 113 and the baffle 200, the converging portion 113 may have a conical structure, and the gas mixed by the converging portion 113 is discharged through the gas outlet 133, optionally, the gas outlet 133 may be connected to an inlet of the deposition chamber 400, and the gas outlet 133 may also be connected to a pipe fitting before the inlet of the deposition chamber 400.
In the preferred embodiment of the present invention, a gas inlet mechanism 300 is further included; the gas inlet mechanism 300 is connected with one end of the connecting pipe 101 away from the cavity flange 102 in a sealing way, and the gas inlet mechanism 300 is used for being connected to an outlet of an external gas tank.
In this embodiment, the gas inlet mechanism 300 may include a first inlet tube and a second inlet tube, the first inlet tube and the second inlet tube are vertically disposed, the first inlet tube has a first inlet and a second inlet, the first inlet tube may be connected to the outlet of the gas box or connected to a pipe of the outlet of the gas box, wherein the first inlet tube may be respectively communicated with the process gas and the carrier gas through the first inlet and the second inlet, the process gas and the carrier gas may be respectively transported by the first inlet tube, the second inlet tube may be located at an intermediate position of the first inlet tube, that is, the process gas and the carrier gas may be converged at the second inlet tube, one end of the second inlet tube, which is far away from the first inlet tube, is hermetically connected to the connecting tube 101, and the process gas and the carrier gas that may be converged by the second inlet tube may be primarily mixed and transported to the connecting tube 101.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. A gas mixing apparatus, comprising: a mixing body (100) and a baffle (200);
be provided with mixing channel (111) in mixing main part (100), baffle (200) are located inside mixing main part (100), baffle (200) with mixing channel (111) correspond arranges, baffle (200) with mixing channel's (111) tip forms mixing chamber (112), through-hole (212) have been seted up on baffle (200), through-hole (212) with mixing channel (111) are the dislocation set, so that the gas process that mixing channel (111) carried passes through after mixing chamber (112) diffusion through-hole (212) are discharged.
2. The gas mixing device according to claim 1, wherein the mixing body (100) comprises a connecting tube (101), a cavity flange (102) and an outlet means (103);
connecting pipe (101) with cavity flange (102) fixed connection, cavity flange (102) deviate from the one end of connecting pipe (101) with exit mechanism (103) are connected, cavity flange (102) with form the seal chamber between exit mechanism (103), baffle (200) are located seal intracavity portion, baffle (200) with form between cavity flange (102) mixing chamber (112), just connecting pipe (101) stretch into to in the seal chamber, baffle (200) with the tip of connecting pipe (101) has the clearance.
3. The gas mixing device according to claim 2, characterized in that the baffle (200) comprises a groove section (201) and a gas guide section (202);
the groove part (201) and the air guide part (202) are integrally formed, the air guide part (202) is annularly arranged along the circumferential direction of the groove part (201), the mixing cavity (112) is positioned between the air guide part (202) and the cavity body flange (102), the through hole (212) is positioned on the air guide part (202), and the mixing cavity (112) and the sealing cavity are communicated through the through hole (212);
the groove part (201) is covered on the end part of the connecting pipe (101) extending into the sealed cavity, a gap is formed between the groove part (201) and the end part of the connecting pipe (101), and the groove part (201) is used for changing the direction of the gas conveyed by the connecting pipe (101) so as to diffuse the gas to the mixing cavity (112) through the gap.
4. A gas mixing device according to claim 3, wherein the through holes (212) are provided in a plurality, the plurality of through holes (212) are arranged in a circular array along the surface of the gas guide (202), and the total area of the plurality of through holes (212) is smaller than the pipe diameter area of the connecting pipe (101).
5. A gas mixing device according to claim 4, wherein the diameter of the through holes (212) ranges from 0.2mm to 4mm, and the number of through holes (212) is from 10 to 150.
6. A gas mixing device according to claim 3, wherein the baffle (200) comprises a first connection (203);
the first connecting part (203) and one side, away from the groove part (201), of the air guide part (202) are integrally formed, and the first connecting part (203) is connected with the cavity flange (102) in a sealing mode.
7. A gas mixing device according to claim 6, wherein the outlet means (103) comprises a converging portion (113) and a second connecting portion (123);
the convergence part (113) is fixedly connected with the second connecting part (123), the second connecting part (123) is connected with the first connecting part (203), the convergence part (113) is internally connected with the through hole (212), and the convergence part (113) is used for receiving gas conveyed by the through hole (212).
8. The gas mixing device according to claim 7, characterized in that the end of the converging portion (113) remote from the baffle plate (200) is provided with a gas outlet (133), the converging portion (113) being conically arranged from the end close to the baffle plate (200) to the gas outlet (133).
9. The gas mixing device according to claim 7, wherein the second connecting portion (123), the first connecting portion (203) and the cavity flange (102) are in abutting contact in sequence, and the second connecting portion (123), the first connecting portion (203) and the cavity flange (102) are in fixed connection in sequence.
10. A gas mixing device according to any of claims 2-9, further comprising a gas inlet means (300);
the gas inlet mechanism (300) is connected with one end, away from the cavity flange (102), of the connecting pipe (101) in a sealing mode, and the gas inlet mechanism (300) is used for being connected to an outlet of an external gas tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210780972.1A CN114849510A (en) | 2022-07-05 | 2022-07-05 | Gas mixing device |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030205096A1 (en) * | 2002-05-03 | 2003-11-06 | Gehner Gerrick S. | Method and apparatus for mixing gases |
| JP2004020141A (en) * | 2002-06-20 | 2004-01-22 | Mitsubishi Heavy Ind Ltd | Wet type exhaust gas treatment device |
| CN102974257A (en) * | 2012-12-03 | 2013-03-20 | 山西新华化工有限责任公司 | Dynamic activity detection mixer |
| CN203955054U (en) * | 2014-06-24 | 2014-11-26 | 浙江深度能源技术有限公司 | Two medium blenders of SCR denitrification apparatus |
| CN107583551A (en) * | 2017-10-29 | 2018-01-16 | 北京工业大学 | A kind of plane passive type micro-mixer of stepped passageway processing font baffle plate |
| CN208727198U (en) * | 2018-06-11 | 2019-04-12 | 华北电力大学（保定） | It is a kind of for mixing the gas mixer of nitrogen and ozone |
| US20220097001A1 (en) * | 2018-11-29 | 2022-03-31 | Isuzu Motors Limited | Mixing member, exhaust purification device and vehicle |
-
2022
- 2022-07-05 CN CN202210780972.1A patent/CN114849510A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030205096A1 (en) * | 2002-05-03 | 2003-11-06 | Gehner Gerrick S. | Method and apparatus for mixing gases |
| JP2004020141A (en) * | 2002-06-20 | 2004-01-22 | Mitsubishi Heavy Ind Ltd | Wet type exhaust gas treatment device |
| CN102974257A (en) * | 2012-12-03 | 2013-03-20 | 山西新华化工有限责任公司 | Dynamic activity detection mixer |
| CN203955054U (en) * | 2014-06-24 | 2014-11-26 | 浙江深度能源技术有限公司 | Two medium blenders of SCR denitrification apparatus |
| CN107583551A (en) * | 2017-10-29 | 2018-01-16 | 北京工业大学 | A kind of plane passive type micro-mixer of stepped passageway processing font baffle plate |
| CN208727198U (en) * | 2018-06-11 | 2019-04-12 | 华北电力大学（保定） | It is a kind of for mixing the gas mixer of nitrogen and ozone |
| US20220097001A1 (en) * | 2018-11-29 | 2022-03-31 | Isuzu Motors Limited | Mixing member, exhaust purification device and vehicle |
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