CN114845480A - A kind of flexible copper clad laminate graphene oxide hole metallization method - Google Patents

A kind of flexible copper clad laminate graphene oxide hole metallization method Download PDF

Info

Publication number
CN114845480A
CN114845480A CN202210331517.3A CN202210331517A CN114845480A CN 114845480 A CN114845480 A CN 114845480A CN 202210331517 A CN202210331517 A CN 202210331517A CN 114845480 A CN114845480 A CN 114845480A
Authority
CN
China
Prior art keywords
graphene oxide
clad laminate
flexible copper
copper clad
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202210331517.3A
Other languages
Chinese (zh)
Other versions
CN114845480B (en
Inventor
罗学涛
陈志城
刘文鑫
黄柳青
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xiamen University
Original Assignee
Xiamen University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xiamen University filed Critical Xiamen University
Priority to CN202210331517.3A priority Critical patent/CN114845480B/en
Publication of CN114845480A publication Critical patent/CN114845480A/en
Application granted granted Critical
Publication of CN114845480B publication Critical patent/CN114845480B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

The invention provides a method for metallizing graphene oxide holes of a flexible copper-clad plate. The hole wall produced by the hole metallization method is smooth and flat, has no flaws, and does not have the problem of plating leakage.

Description

一种柔性覆铜板氧化石墨烯孔金属化方法A kind of flexible copper clad laminate graphene oxide hole metallization method

技术领域technical field

本发明涉及一种柔性覆铜板氧化石墨烯孔金属化方法,属于柔性电路板技术领域。The invention relates to a method for metallizing graphene oxide holes of a flexible copper clad plate, and belongs to the technical field of flexible circuit boards.

背景技术Background technique

柔性电路板(Flexible Printed Circuit简称FPC)是以聚酰亚胺或聚酯薄膜为基材制成的一种具有高度可靠性,绝佳的可挠性印刷电路板。具有配线密度高、重量轻、厚度薄、弯折性好的特点,广泛应用在电子、通讯领域的液晶及等离子等平板显示器上。Flexible Printed Circuit (FPC for short) is a highly reliable and excellent flexible printed circuit board made of polyimide or polyester film as the base material. It has the characteristics of high wiring density, light weight, thin thickness and good bendability, and is widely used in LCD and plasma flat panel displays in the fields of electronics and communications.

柔性电路板是在柔性覆铜板上通过一定的工艺制备而成的,柔性电路板一般可以分为单面板、双面板和多层电路板。双面板和多层电路板分别有两层铜板和多层铜板,铜板和铜板之间由不导电的基材隔开。因此不同铜层之间需要通孔来导通层与层之间的线路。由于基材为不导电材料,所以在化学电镀时,铜无法被镀在基材上。因此,需要对通孔的孔壁进行金属化处理(孔金属化),使其能够导电,从而使化学镀铜顺利进行。Flexible circuit boards are prepared on flexible copper clad laminates through a certain process. Flexible circuit boards can generally be divided into single-sided, double-sided and multi-layer circuit boards. Double-sided and multi-layer circuit boards have two layers of copper plates and multi-layer copper plates, respectively, and the copper plates and the copper plates are separated by a non-conductive base material. Therefore, through holes are required between different copper layers to conduct the lines between layers. Since the substrate is a non-conductive material, copper cannot be plated on the substrate during electroless plating. Therefore, the hole wall of the through hole needs to be metallized (hole metallization) so that it can conduct electricity, so that the electroless copper plating can be carried out smoothly.

目前,孔金属化主要有三种工艺:第一种是由石墨或者炭黑形成导电层;第二仲是利用镀上一层金属钯作为种子层;第三种是用吡咯、噻吩、呋喃和苯胺等在孔壁上聚合形成导电高分子层。但是,石墨或炭黑形成的导电层导电性不好,而且由于颗粒较大,当通孔尺寸小时便难以附着;金属钯由于成本较高,难以量产使用;高分子导电层是目前应用最多的孔金属化工艺,但其聚合过程需要高锰酸钾溶液进行氧化处理,对环境有一定程度的污染,并且形成的高分子导电层导电能力较为有限。这些传统的孔金属化工艺应用于一些较复杂的高频电路板时,电路板孔壁经常会出现漏镀导电层的现象,严重影响后序的化学电镀导致废品。因此孔金属化工艺仍有很大程度的提升空间。At present, there are three main processes for hole metallization: the first is to form a conductive layer from graphite or carbon black; the second is to use a layer of metal palladium as a seed layer; the third is to use pyrrole, thiophene, furan and aniline The conductive polymer layer is formed by polymerizing on the hole wall. However, the conductive layer formed by graphite or carbon black has poor conductivity, and due to the large particle size, it is difficult to attach when the size of the through hole is small; metal palladium is difficult to use in mass production due to its high cost; the polymer conductive layer is currently the most widely used However, the polymerization process requires potassium permanganate solution for oxidation treatment, which pollutes the environment to a certain extent, and the conductive ability of the formed polymer conductive layer is relatively limited. When these traditional hole metallization processes are applied to some more complex high-frequency circuit boards, the hole wall of the circuit board often has the phenomenon of missing conductive layer, which seriously affects the subsequent chemical plating and leads to waste products. Therefore, there is still much room for improvement in the hole metallization process.

发明内容SUMMARY OF THE INVENTION

本发明提供了一种柔性覆铜板氧化石墨烯孔金属化方法,可以有效解决上述问题。The present invention provides a method for metallizing graphene oxide holes of flexible copper clad laminates, which can effectively solve the above problems.

本发明是这样实现的:The present invention is realized in this way:

一种柔性覆铜板氧化石墨烯孔金属化方法,将带有通孔的柔性覆铜板覆铜板在氧化石墨烯水溶液中浸泡处理后再进行化学镀铜。A method for metallizing graphene oxide holes of a flexible copper clad laminate. The copper clad laminate with a through hole is soaked in an aqueous solution of graphene oxide and then electroless copper is plated.

作为进一步改进的,所述氧化石墨烯水溶液的浓度为18-24wt%,处理时间为2-10min。As a further improvement, the concentration of the graphene oxide aqueous solution is 18-24wt%, and the processing time is 2-10min.

作为进一步改进的,所述浸泡处理的过程中还进行超声处理。As a further improvement, ultrasonic treatment is also performed during the soaking treatment.

作为进一步改进的,所述超声处理的超声波的频率范围为20-60kHz。As a further improvement, the frequency range of the ultrasonic wave in the ultrasonic treatment is 20-60 kHz.

作为进一步改进的,在浸泡处理前,还用整孔剂对柔性覆铜板通孔进行整孔处理。As a further improvement, before the immersion treatment, the through hole of the flexible copper clad laminate is also treated with a hole-forming agent.

作为进一步改进的,在浸泡处理后,还用微蚀溶液对柔性覆铜板通孔进行微蚀处理。As a further improvement, after the immersion treatment, a micro-etching solution is also used to perform a micro-etching process on the through holes of the flexible copper clad laminate.

作为进一步改进的,所述通孔为采用紫外激光钻孔机对柔性覆铜板表面进行打孔而形成。As a further improvement, the through holes are formed by drilling holes on the surface of the flexible copper clad laminate by using an ultraviolet laser drilling machine.

作为进一步改进的,所述紫外激光钻孔机的功率为4.5W,扫描速度为50mm/s,重复钻孔次数为4次。As a further improvement, the power of the ultraviolet laser drilling machine is 4.5W, the scanning speed is 50mm/s, and the number of repeated drilling is 4 times.

作为进一步改进的,所述氧化石墨烯是高锰酸钾与石墨粉末在浓硫酸中进行充分的氧化反应而形成。As a further improvement, the graphene oxide is formed by the sufficient oxidation reaction of potassium permanganate and graphite powder in concentrated sulfuric acid.

一种上述的方法制备的柔性覆铜板。A flexible copper clad laminate prepared by the above method.

本发明的有益效果是:The beneficial effects of the present invention are:

本发明采用氧化石墨烯溶液进行孔金属化处理,氧化石墨烯微观结构呈片状,分散在溶液中时,片状氧化石墨烯极易吸附在铜孔壁表面,此时有着强烈的静电吸附力,可以完整吸附整个孔壁。随着孔金属化处理时间的增长,即柔性覆铜板在氧化石墨烯溶液中黑孔时间增加,氧化石墨烯分子中的羧基与铜发生络合反应形成金属间络合物,此时孔壁与氧化石墨烯层直接形成的是结合力强的分子键力,在后续镀铜工艺不会发生脱落,通孔内壁沉铜后孔壁光滑平整,无瑕疵,且不会出现漏镀的问题。另外,氧化石墨烯孔金属化相比于其他孔金属化工艺,导电层厚度更薄,更加适用于高频电路板制作。In the present invention, graphene oxide solution is used for hole metallization treatment, and the microstructure of graphene oxide is sheet-like. When dispersed in the solution, sheet-like graphene oxide is easily adsorbed on the surface of the copper hole wall, and has a strong electrostatic adsorption force at this time. , the entire pore wall can be completely adsorbed. With the increase of the hole metallization treatment time, that is, the black hole time of the flexible copper clad laminate in the graphene oxide solution increases, the carboxyl group in the graphene oxide molecule undergoes a complex reaction with copper to form an intermetallic complex. The graphene oxide layer directly forms a molecular bond with strong binding force, which will not fall off in the subsequent copper plating process. After the inner wall of the through hole is immersed in copper, the hole wall is smooth and flat, flawless, and there will be no leakage plating problem. In addition, compared with other hole metallization processes, graphene oxide hole metallization has a thinner conductive layer thickness, which is more suitable for high-frequency circuit board production.

本发明的孔金属化方法,由于不含甲醛致癌物和危害生态环境的化学药水的使用,整个生产工艺流程对人无害,且氧化石墨烯废水可以重复利用,避免浪费及污染环境。同时,该工艺流程简单,效率得到提升,能够节省人力资源成本,得到较高的经济效益。The pore metallization method of the invention does not contain formaldehyde carcinogens and the use of chemical liquids that harm the ecological environment, the entire production process is harmless to people, and the graphene oxide waste water can be reused to avoid waste and environmental pollution. At the same time, the technological process is simple, the efficiency is improved, the cost of human resources can be saved, and higher economic benefits can be obtained.

附图说明Description of drawings

为了更清楚地说明本发明实施方式的技术方案,下面将对实施方式中所需要使用的附图作简单地介绍,应当理解,以下附图仅示出了本发明的某些实施例,因此不应被看作是对范围的限定,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他相关的附图。In order to explain the technical solutions of the embodiments of the present invention more clearly, the following briefly introduces the accompanying drawings used in the embodiments. It should be understood that the following drawings only show some embodiments of the present invention, and therefore do not It should be regarded as a limitation of the scope, and for those of ordinary skill in the art, other related drawings can also be obtained according to these drawings without any creative effort.

图1是本发明实施例1提供的柔性覆铜板氧化石墨烯黑孔处理2分钟后电镀铜层的切片金相显微镜图像。FIG. 1 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Example 1 of the present invention after the graphene oxide black hole is treated for 2 minutes.

图2是本发明实施例2提供的柔性覆铜板氧化石墨烯黑孔处理4分钟后电镀铜层的切片金相显微镜图像。2 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Example 2 of the present invention after the graphene oxide black hole is treated for 4 minutes.

图3是本发明实施例3提供的柔性覆铜板氧化石墨烯黑孔处理6分钟后电镀铜层的切片金相显微镜图像。3 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Example 3 of the present invention after the graphene oxide black hole is treated for 6 minutes.

图4是本发明实施例4提供的柔性覆铜板氧化石墨烯黑孔处理8分钟后电镀铜层的切片金相显微镜图像。4 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Example 4 of the present invention after the graphene oxide black hole is treated for 8 minutes.

图5是本发明对照例1提供的柔性覆铜板传统的炭黑黑孔处理4分钟后电镀铜层的切片金相显微镜图像。5 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Comparative Example 1 of the present invention after traditional carbon black black hole treatment for 4 minutes.

图6是本发明对照例2提供的柔性覆铜板的电镀铜层的切片金相显微镜图像。6 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Comparative Example 2 of the present invention.

图7是本发明对照例3提供的柔性覆铜板的电镀铜层的切片金相显微镜图像。7 is a metallographic microscope image of a section of the electroplated copper layer of the flexible copper clad laminate provided in Comparative Example 3 of the present invention.

图8是本发明对照例4提供的柔性覆铜板的电镀铜层的切片金相显微镜图像。8 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Comparative Example 4 of the present invention.

图9是本发明对照例5提供的柔性覆铜板的电镀铜层的切片金相显微镜图像。9 is a metallographic microscope image of a slice of the electroplated copper layer of the flexible copper clad laminate provided in Comparative Example 5 of the present invention.

具体实施方式Detailed ways

为使本发明实施方式的目的、技术方案和优点更加清楚,下面将结合本发明实施方式中的附图,对本发明实施方式中的技术方案进行清楚、完整地描述,显然,所描述的实施方式是本发明一部分实施方式,而不是全部的实施方式。基于本发明中的实施方式,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施方式,都属于本发明保护的范围。因此,以下对在附图中提供的本发明的实施方式的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施方式。基于本发明中的实施方式,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施方式,都属于本发明保护的范围。In order to make the purposes, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments These are some embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention. Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the invention as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

在本发明的描述中,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In the description of the present invention, the terms "first" and "second" are only used for the purpose of description, and cannot be understood as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature defined as "first" or "second" may expressly or implicitly include one or more of that feature. In the description of the present invention, "plurality" means two or more, unless otherwise expressly and specifically defined.

本发明实施例提供一种柔性覆铜板氧化石墨烯孔金属化方法,将带有通孔的柔性覆铜板覆铜板在氧化石墨烯水溶液中浸泡处理后再进行化学镀铜。Embodiments of the present invention provide a method for metallizing graphene oxide holes of a flexible copper clad laminate, wherein the copper clad laminate of a flexible copper clad laminate with through holes is soaked in a graphene oxide aqueous solution and then electroless copper is plated.

作为进一步改进的,所述氧化石墨烯水溶液的浓度为18-24wt%,处理时间为2-10min。所述氧化石墨烯是高锰酸钾与石墨粉末在浓硫酸中进行充分的氧化反应而形成。进一步地,氧化石墨烯制备是在浓度98%的浓硫酸中加入石墨固体粉末后搅拌均匀,等混合液体冷却后分5次缓慢加入高锰酸钾,待混合液冷却至室温后离心沉淀得到氧化石墨烯薄片。其中,浓硫酸、石墨固体粉末、高锰酸钾的比例为180-220mL:1.5-2.5g:8-12g,优选为200mL:2g:10g。此方法制备的氧化石墨烯溶液分散性好,能在水溶液中均匀分散且长时间放置下不发生团聚,氧化石墨烯微观结构呈片状,极易吸附在铜孔壁表面,利于孔金属化的顺利进行。同时,高锰酸钾分5次加入,加入方式为加入量先小,再逐渐加大,最后减少。这种加入方式使得氧化石墨烯分子为碳环边缘带有羧酸基而碳层平面上带有酚羟基与环氧基团的同时含有的羧基十分丰富,羧基与铜发生络合反应生产金属间络合物,此时孔壁与氧化石墨烯层直接形成结合力强的分子键力,在后续镀铜工艺不会发生脱落。As a further improvement, the concentration of the graphene oxide aqueous solution is 18-24wt%, and the processing time is 2-10min. The graphene oxide is formed by the sufficient oxidation reaction of potassium permanganate and graphite powder in concentrated sulfuric acid. Further, graphene oxide is prepared by adding graphite solid powder in concentrated sulfuric acid with a concentration of 98% and stirring evenly. After the mixed liquid is cooled, potassium permanganate is slowly added in 5 times. After the mixed liquid is cooled to room temperature, centrifugal precipitation is obtained to obtain oxidation. Graphene flakes. Wherein, the ratio of concentrated sulfuric acid, graphite solid powder and potassium permanganate is 180-220mL:1.5-2.5g:8-12g, preferably 200mL:2g:10g. The graphene oxide solution prepared by this method has good dispersibility, can be uniformly dispersed in the aqueous solution and does not agglomerate after being placed for a long time. went well. At the same time, potassium permanganate is added in 5 times, and the addition method is that the amount added is first small, then gradually increased, and finally reduced. This way of adding makes graphene oxide molecules with carboxylic acid groups on the edge of the carbon ring and phenolic hydroxyl groups and epoxy groups on the plane of the carbon layer. At the same time, the carboxyl groups are very rich, and the carboxyl groups are complexed with copper to produce intermetallic groups. At this time, the pore wall and the graphene oxide layer directly form a strong molecular bond force, which will not fall off in the subsequent copper plating process.

作为进一步改进的,所述浸泡处理的过程中还进行超声处理,使得氧化石墨烯更均匀分散在溶液中,便于氧化石墨烯片更均匀地吸附于孔壁上。优选的,所述超声处理的超声波的频率范围为20-60kHz,优选为40kHz,最有利于氧化石墨烯的分散。As a further improvement, ultrasonic treatment is also performed during the soaking treatment, so that the graphene oxide is more uniformly dispersed in the solution, so that the graphene oxide sheets are more uniformly adsorbed on the pore walls. Preferably, the frequency range of the ultrasonic wave in the ultrasonic treatment is 20-60 kHz, preferably 40 kHz, which is most conducive to the dispersion of graphene oxide.

作为进一步改进的,在浸泡处理前,还用整孔剂对柔性覆铜板通孔进行整孔处理。整孔又称除油,目的是将覆铜板表面的油污或者其他杂质去除,并且使柔性覆铜板通孔带有电负性;经过整孔处理的柔性覆铜板易于附着导电层,将覆铜板浸泡在带有超声波振动的氧化石墨烯悬浮液中,保持一定时间即可完成孔金属化。所述整孔步骤中带有超声波发生装置,使得孔壁带电负性更均匀。进一步地,超声波的频率范围在40-60kHz。优选地,超声波的频率为45kHz时最有利于氧化石墨烯的分散。As a further improvement, before the immersion treatment, the through hole of the flexible copper clad laminate is also treated with a hole-forming agent. The whole hole is also called degreasing, the purpose is to remove the oil or other impurities on the surface of the CCL, and make the through holes of the flexible CCL with electronegativity; the flexible CCL after the whole hole treatment is easy to adhere to the conductive layer, and the CCL is soaked. In the graphene oxide suspension with ultrasonic vibration, the hole metallization can be completed for a certain period of time. An ultrasonic generating device is provided in the hole-forming step, so that the negative charge of the hole wall is more uniform. Further, the frequency range of ultrasonic waves is 40-60 kHz. Preferably, when the frequency of the ultrasonic wave is 45 kHz, the dispersion of graphene oxide is most favorable.

所述整孔剂为主要成分是阴离子表面活性剂,比如聚丙烯酰胺。由于聚丙烯酰胺氢键与氧化石墨烯中含氧官能团结合形成范德华键,进一步提高氧化石墨烯在孔壁的附着力。所述整孔剂的使用浓度范围为15-30wt%,pH值范围为9-12,在这一浓度和pH下聚丙烯酰胺表面活性剂中最容易形成氢键,温度范围为30-40℃,此温度有益于氢键和含氧官能团结合。The main component of the pore-forming agent is an anionic surfactant, such as polyacrylamide. Due to the combination of polyacrylamide hydrogen bonds and oxygen-containing functional groups in graphene oxide to form van der Waals bonds, the adhesion of graphene oxide to the pore wall is further improved. The pore-forming agent is used in a concentration range of 15-30 wt %, a pH value in a range of 9-12, and is most likely to form hydrogen bonds in the polyacrylamide surfactant at this concentration and pH, and a temperature in the range of 30-40° C. , this temperature is beneficial for hydrogen bonding and oxygen-containing functional group bonding.

作为进一步改进的,在浸泡处理后,还用微蚀溶液对柔性覆铜板通孔进行微蚀处理。所述微蚀溶液为为60-90g/L硫酸和30-50g/L过硫酸钠混合溶液。所述微蚀溶液微蚀作用温度为30-35℃,微蚀的时间为40-90s。此微蚀溶液与氧化石墨烯相容性良好,不会对GO附着层造成破坏;此温度和时间是基于对GO附着层保护性的考虑。As a further improvement, after the immersion treatment, a micro-etching solution is also used to perform a micro-etching process on the through holes of the flexible copper clad laminate. The micro-etching solution is a mixed solution of 60-90 g/L sulfuric acid and 30-50 g/L sodium persulfate. The micro-etching temperature of the micro-etching solution is 30-35° C., and the micro-etching time is 40-90s. The micro-etching solution has good compatibility with graphene oxide and will not cause damage to the GO adhesion layer; the temperature and time are based on the consideration of the protection of the GO adhesion layer.

作为进一步改进的,所述通孔为采用紫外激光钻孔机对柔性覆铜板表面进行打孔而形成。所述紫外激光钻孔机为355nm皮秒紫外激光钻孔机,钻孔的功率为4.5W,扫描速度为50mm/s,重复钻孔次数为4次。在此钻孔条件下,孔壁具有特殊的纹理,利于氧化石墨烯附着。As a further improvement, the through holes are formed by drilling holes on the surface of the flexible copper clad laminate by using an ultraviolet laser drilling machine. The ultraviolet laser drilling machine is a 355 nm picosecond ultraviolet laser drilling machine, the drilling power is 4.5 W, the scanning speed is 50 mm/s, and the number of repeated drilling is 4 times. Under this drilling condition, the hole wall has a special texture, which is conducive to the attachment of graphene oxide.

作为进一步改进的,所述化学镀铜的温度为30-42℃,镀铜的时间为5-15min。化学镀铜工艺能够较为精准的控制镀铜厚度,并且很少出现孔壁漏镀的情形。镀铜的厚度为15-20μm,优选为18μm。As a further improvement, the temperature of the electroless copper plating is 30-42° C., and the copper plating time is 5-15 minutes. The electroless copper plating process can control the thickness of copper plating more accurately, and there is little leakage of the hole wall. The thickness of the copper plating is 15-20 μm, preferably 18 μm.

本发明实施例还提供一种上述的方法制备的柔性覆铜板。所述柔性覆铜板可以为双面覆铜板也可以是多层覆铜板,通孔内壁沉铜后孔壁光滑平整,无瑕疵,且不会出现漏镀的问题;同时,氧化石墨烯孔金属化相比于其他孔金属化工艺,导电层厚度更薄,非常适合柔性电路板的制作,尤其适用于高频电路板制作。The embodiment of the present invention also provides a flexible copper clad laminate prepared by the above method. The flexible copper clad laminate can be a double-sided copper clad laminate or a multi-layer copper clad laminate. After the inner wall of the through hole is immersed in copper, the hole wall is smooth and flat, without flaws, and there is no problem of leakage plating; at the same time, the graphene oxide hole is metallized. Compared with other hole metallization processes, the thickness of the conductive layer is thinner, which is very suitable for the production of flexible circuit boards, especially for the production of high frequency circuit boards.

实施例1Example 1

采用本发明柔性覆铜板氧化石墨烯孔金属化具体工艺步骤如下:The specific process steps of metallizing the graphene oxide holes of the flexible copper clad laminate of the present invention are as follows:

第一步,利用紫外激光打孔对柔性覆铜板上钻出若干个通孔;采用355nm皮秒紫外激光钻孔机,紫外激光钻孔机的功率为4.5W,扫描速度为50mm/s,重复钻孔次数为4次。The first step is to use ultraviolet laser drilling to drill several through holes on the flexible copper clad plate; use a 355nm picosecond ultraviolet laser drilling machine, the power of the ultraviolet laser drilling machine is 4.5W, the scanning speed is 50mm/s, repeat The number of drillings is 4 times.

第二步,将打完孔的柔性覆铜板进行循环水洗,然后用整孔剂聚丙烯酰胺对柔性覆铜板通孔进行整孔处理。整孔剂的浓度范围为20wt%,pH值范围为10,设置温度为35℃。整孔处理过程中用超声处理,频率为45kHz。In the second step, the perforated flexible copper clad laminate is washed with circulating water, and then the through hole of the flexible copper clad laminate is processed with a hole-forming agent polyacrylamide. The concentration range of the pore-forming agent is 20wt%, the pH value range is 10, and the set temperature is 35°C. Ultrasonic treatment was used during the whole hole treatment, and the frequency was 45 kHz.

第三步,在200毫升的浓度98%的硫酸中加入2g的石墨固体粉末后搅拌均匀,等混合液体问题冷却后分5次缓慢加入10g高锰酸钾(第1次1.5g,第2次2g,第3次3g,第4次2g,第5次1.5g),待混合液冷却至室温后离心沉淀得到氧化石墨烯薄片,加入纯水形成20wt%氧化石墨烯溶液。The 3rd step, add the graphite solid powder of 2g in the sulfuric acid of 98% concentration of 200 milliliters and stir well, after waiting for the mixed liquid problem to cool, slowly add 10g potassium permanganate in 5 times (1.5g for the first time, 1.5g for the second time) 2g, 3g for the 3rd time, 2g for the 4th time, 1.5g for the 5th time), centrifugal precipitation after the mixture is cooled to room temperature to obtain graphene oxide flakes, and pure water is added to form a 20wt% graphene oxide solution.

第四步,将柔性覆铜板浸泡在氧化石墨烯悬浮液在浸泡进行黑孔处理2分钟。浸泡过程中用超声处理,频率为40kHz。In the fourth step, the flexible copper clad laminate is immersed in the graphene oxide suspension for black hole treatment for 2 minutes. The immersion process was sonicated at a frequency of 40 kHz.

第五步,黑孔后的柔性覆铜板在微蚀溶液80g/L硫酸和40g/L过硫酸钠混合溶液中浸泡、喷淋达到微蚀的目的。所述微蚀溶液的温度为32℃,覆铜板微蚀的时间为60s。In the fifth step, the flexible copper clad laminate after the black hole is soaked and sprayed in a mixed solution of a micro-etching solution of 80g/L sulfuric acid and 40g/L sodium persulfate to achieve the purpose of micro-etching. The temperature of the micro-etching solution is 32°C, and the micro-etching time of the copper clad laminate is 60s.

第六步,对水洗后的柔性覆铜板进行化学镀铜。所述的化学镀铜的温度为36℃,镀铜的时间为10min。The sixth step is to perform chemical copper plating on the washed flexible copper clad laminate. The temperature of the electroless copper plating was 36° C., and the copper plating time was 10 minutes.

氧化石墨烯对柔性覆铜板孔壁进行黑孔处理两分钟,孔壁电镀铜层如图1所示,孔底圆形完整,无黑点,孔铜厚度均匀,孔口处有少量缺陷,无空洞、无分层。The hole wall of the flexible copper clad laminate is treated with black hole for two minutes by graphene oxide. The copper plating layer on the hole wall is shown in Figure 1. The hole bottom is round and complete, without black spots, the hole copper thickness is uniform, and there are a few defects at the hole. Empty, without layers.

实施例2Example 2

与实施例1不同之处在于,黑孔处理时间为4分钟,其他操作同实施例1。The difference from Example 1 is that the black hole treatment time is 4 minutes, and other operations are the same as those of Example 1.

氧化石墨烯对柔性覆铜板孔壁进行黑孔处理4分钟,孔壁电镀铜层如图2所示,孔底圆形完整,无黑点,孔铜厚度均匀,无空洞、无分层,是黑孔效果最好的一组。The hole wall of the flexible copper clad laminate was treated with black hole for 4 minutes by graphene oxide. The copper plating layer on the hole wall is shown in Figure 2. The hole bottom is round and complete without black spots. The best set of black holes.

实施例3Example 3

与实施例1不同之处在于,黑孔处理时间为6分钟,其他操作同实施例1。The difference from Example 1 is that the black hole treatment time is 6 minutes, and other operations are the same as those of Example 1.

氧化石墨烯对柔性覆铜板孔壁进行黑孔处理6分钟,孔壁电镀铜层如图3所示,孔底圆形完整,有少量黑点,孔铜厚度均匀,无空洞、无分层,孔口处有部分缺陷。The hole wall of the flexible copper clad laminate was treated with black hole for 6 minutes by graphene oxide. The copper plating layer on the hole wall is shown in Figure 3. The hole bottom is round and complete, with a few black spots. The hole copper thickness is uniform, without voids and delamination. There are some defects at the orifice.

实施例4Example 4

与实施例1不同之处在于,黑孔处理时间为8分钟,其他操作同实施例1。The difference from Example 1 is that the black hole treatment time is 8 minutes, and other operations are the same as those of Example 1.

氧化石墨烯对柔性覆铜板孔壁进行黑孔处理8分钟,孔壁电镀铜层如图4所示,孔底圆形完整,有黑点,孔铜厚度均匀,无空洞、无分层,孔口处有部分缺陷。The hole wall of the flexible copper clad laminate is treated with black hole for 8 minutes by graphene oxide. The copper plating layer on the hole wall is shown in Figure 4. The hole bottom is round and complete with black spots. There are some defects in the mouth.

对照例1Comparative Example 1

采用传统的炭黑悬浮液进行柔性电路板通孔金属化处理,其他操作同时实施例1。The traditional carbon black suspension is used for metallization of the through holes of the flexible circuit board, and other operations are performed at the same time as Example 1.

所述炭黑悬浮液的制备为将炭黑粉与分散剂三聚磷酸钠加入DI水中,炭黑粉的质量分数为3%,分散剂的质量分数为4%,用超声振动使其充分分散后制成炭黑悬浮液。The carbon black suspension is prepared by adding carbon black powder and dispersant sodium tripolyphosphate into DI water, the mass fraction of carbon black powder is 3%, the mass fraction of dispersant is 4%, and it is fully dispersed by ultrasonic vibration. After the carbon black suspension is made.

炭黑悬浮液对柔性覆铜板孔壁进行黑孔处理四分钟,孔壁电镀铜层如图5所示,孔壁镀层有6um以上,但孔内有残铜堆积至孔口,且孔底镀层与基铜有分层现象。The carbon black suspension is used to black hole the hole wall of the flexible copper clad laminate for four minutes. The copper plating layer on the hole wall is shown in Figure 5. The hole wall plating layer is more than 6um, but the residual copper in the hole accumulates to the hole, and the hole bottom plating layer There is delamination with base copper.

对照例2Comparative Example 2

紫外激光钻孔机的功率为10W,扫描速度为60mm/s,重复钻孔次数为1次,其他操作同实施例1。The power of the ultraviolet laser drilling machine is 10W, the scanning speed is 60mm/s, the number of repeated drilling is 1 time, and other operations are the same as those in Example 1.

孔壁电镀铜层如图6所示,由于激光钻孔参数不为优选参数,所钻出来的孔内残渣较多,镀铜时铜附在残渣上沉积,导致孔内出现铜瘤。The electroplated copper layer on the hole wall is shown in Figure 6. Since the laser drilling parameters are not optimal parameters, the drilled hole has a lot of residue. During copper plating, copper is deposited on the residue, resulting in copper nodules in the hole.

对照例3Comparative Example 3

所述整孔剂采用环氧乙烷环氧丙烷共聚物,其他操作同实施例1。The pore-forming agent adopts ethylene oxide propylene oxide copolymer, and other operations are the same as those in Example 1.

孔壁电镀铜层如图7所示,由于环氧乙烷环氧丙烷共聚物与GO吸附性较差,无法提供氢键与GO键合,GO无法均匀附着在孔壁上,GO在孔内沉积,从而导致电镀铜层在孔内沉积厚铜。The copper electroplating layer on the hole wall is shown in Figure 7. Due to the poor adsorption of ethylene oxide and propylene oxide copolymer with GO, it cannot provide hydrogen bonds to bond with GO, GO cannot be uniformly attached to the hole wall, and GO is in the hole. deposition, resulting in an electroplated copper layer depositing thick copper inside the hole.

对照例4Comparative Example 4

氧化石墨烯的制备中高锰酸钾一次性加入,其他操作同实施例1。In the preparation of graphene oxide, potassium permanganate was added at one time, and other operations were the same as in Example 1.

孔壁电镀铜层如图8所示,由于高锰酸钾一次性加入,使得GO无法形成足够的羧基,羧基与铜发生络合反应减少,导致GO沉积在孔底部,底部铜镀层过厚。The electroplated copper layer on the hole wall is shown in Figure 8. Due to the one-time addition of potassium permanganate, GO cannot form enough carboxyl groups, and the complex reaction between carboxyl groups and copper is reduced, resulting in GO deposition at the bottom of the hole, and the copper plating layer at the bottom is too thick.

对照例5Comparative Example 5

微蚀溶液为40g/L硫酸和80g/L过硫酸钠,其他的同实施例1。The micro-etching solution is 40g/L sulfuric acid and 80g/L sodium persulfate, and the others are the same as in Example 1.

孔壁电镀铜层如图9所示,微蚀溶液在此浓度下与GO相容性差,部分GO与会被微蚀溶液带出孔壁,导致孔壁带电性差镀铜效果差,孔壁镀铜过薄。The copper plating layer on the hole wall is shown in Figure 9. The micro-etching solution has poor compatibility with GO at this concentration, and some GO and GO will be carried out of the hole wall by the micro-etching solution, resulting in poor charging of the hole wall and poor copper plating effect. too thin.

由实施例1-4和对照例1-5可知,本发明实施例的柔性覆铜板氧化石墨烯孔金属化的方法,主要是通过采用氧化石墨烯溶液对柔性覆铜板进行孔金属化处理,同时,也通过调整打孔的工艺、整孔剂的选择和使用工艺、氧化石墨烯的制备和使用工艺、微蚀工艺和镀铜工艺,使得各个工艺与氧化石墨烯相互作用,发挥协同增效作用,促进氧化石墨烯附着于孔壁上和镀铜层的形成,从而形成均匀细致、结合牢固的导电层,电镀铜层的可靠性更高,通孔内壁沉铜后孔壁光滑平整,无瑕疵,且不会出现漏镀的问题。As can be seen from Examples 1-4 and Comparative Examples 1-5, the method for metallizing the graphene oxide holes of the flexible copper clad laminate according to the embodiment of the present invention is mainly to perform hole metallization treatment on the flexible copper clad laminate by using a graphene oxide solution, and at the same time. , and also through the adjustment of the drilling process, the selection and use process of the pore-forming agent, the preparation and use process of graphene oxide, the micro-etching process and the copper plating process, so that each process interacts with graphene oxide and exerts a synergistic effect. , to promote the adhesion of graphene oxide to the hole wall and the formation of the copper-plated layer, thereby forming a uniform, meticulous, and firmly bonded conductive layer, the reliability of the copper-plated layer is higher, and the hole wall is smooth and smooth after copper sinking on the inner wall of the through hole. , and there will be no leakage plating problem.

以上所述仅为本发明的优选实施方式而已,并不用于限制本发明,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims (10)

1. A method for metallizing graphene oxide holes of a flexible copper-clad plate is characterized in that the flexible copper-clad plate with through holes is immersed in a graphene oxide aqueous solution and then subjected to electroless copper plating.
2. The flexible copper clad laminate graphene oxide hole metallization method according to claim 1, wherein the concentration of the graphene oxide aqueous solution is 18-24 wt%, and the treatment time is 2-10 min.
3. The flexible copper clad laminate graphene oxide hole metallization method according to claim 1, wherein ultrasonic treatment is further performed in the soaking treatment process.
4. The flexible copper clad laminate graphene oxide hole metallization method according to claim 3, wherein the frequency range of the ultrasonic wave of the ultrasonic treatment is 20-60 kHz.
5. The method for metallizing graphene oxide holes on a flexible copper clad laminate according to claim 1, wherein the through holes of the flexible copper clad laminate are further subjected to hole arrangement treatment by using a hole arrangement agent before the soaking treatment.
6. The method for metallizing graphene oxide holes on a flexible copper clad laminate according to claim 1, wherein after the soaking treatment, the through holes on the flexible copper clad laminate are further microetched with a microetching solution.
7. The method for metallizing graphene oxide holes on a flexible copper clad laminate according to claim 1, wherein the through holes are formed by drilling the surface of the flexible copper clad laminate by using an ultraviolet laser drilling machine.
8. The flexible copper clad laminate graphene oxide hole metallization method according to claim 7, wherein the power of the ultraviolet laser drilling machine is 4.5W, the scanning speed is 50mm/s, and the number of repeated drilling is 4.
9. The flexible copper clad laminate graphene oxide hole metallization method according to claim 1, wherein the graphene oxide is formed by sufficient oxidation reaction of potassium permanganate and graphite powder in concentrated sulfuric acid.
10. A flexible copper clad laminate prepared by the method of any one of claims 1 to 9.
CN202210331517.3A 2022-03-31 2022-03-31 A method for metallizing graphene oxide holes in flexible copper-clad laminates Active CN114845480B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210331517.3A CN114845480B (en) 2022-03-31 2022-03-31 A method for metallizing graphene oxide holes in flexible copper-clad laminates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210331517.3A CN114845480B (en) 2022-03-31 2022-03-31 A method for metallizing graphene oxide holes in flexible copper-clad laminates

Publications (2)

Publication Number Publication Date
CN114845480A true CN114845480A (en) 2022-08-02
CN114845480B CN114845480B (en) 2025-01-28

Family

ID=82564241

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210331517.3A Active CN114845480B (en) 2022-03-31 2022-03-31 A method for metallizing graphene oxide holes in flexible copper-clad laminates

Country Status (1)

Country Link
CN (1) CN114845480B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130299217A1 (en) * 2012-05-14 2013-11-14 The Hong Kong University Of Science And Technology Electrical and thermal conductive thin film with double layer structure provided as a one-dimensional nanomaterial network with graphene/graphene oxide coating
CN103491727A (en) * 2013-09-29 2014-01-01 哈尔滨工业大学 Method using printed circuit board graphite oxide reduction method to carry out hole conductivity
CN104582324A (en) * 2015-01-07 2015-04-29 台山市精诚达电路有限公司 Hole metallization method for flexible printed circuit board
CN108712830A (en) * 2018-05-30 2018-10-26 广东天承科技有限公司 A kind of circuit board without palladium chemical-copper-plating process
CN108834309A (en) * 2018-08-30 2018-11-16 陈伟元 A kind of graphene metallization solution and the preparation method and application thereof
CN109811382A (en) * 2019-03-28 2019-05-28 烟台恒诺新材料有限公司 A kind of application of graphene oxide conductive paste in black holesization is directly electroplated
WO2021118108A1 (en) * 2019-12-13 2021-06-17 한국전자기술연구원 Surface treatment method for through-holes of printed circuit board and manufacturing method therefor

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130299217A1 (en) * 2012-05-14 2013-11-14 The Hong Kong University Of Science And Technology Electrical and thermal conductive thin film with double layer structure provided as a one-dimensional nanomaterial network with graphene/graphene oxide coating
CN103491727A (en) * 2013-09-29 2014-01-01 哈尔滨工业大学 Method using printed circuit board graphite oxide reduction method to carry out hole conductivity
CN104582324A (en) * 2015-01-07 2015-04-29 台山市精诚达电路有限公司 Hole metallization method for flexible printed circuit board
CN108712830A (en) * 2018-05-30 2018-10-26 广东天承科技有限公司 A kind of circuit board without palladium chemical-copper-plating process
CN108834309A (en) * 2018-08-30 2018-11-16 陈伟元 A kind of graphene metallization solution and the preparation method and application thereof
CN109811382A (en) * 2019-03-28 2019-05-28 烟台恒诺新材料有限公司 A kind of application of graphene oxide conductive paste in black holesization is directly electroplated
WO2021118108A1 (en) * 2019-12-13 2021-06-17 한국전자기술연구원 Surface treatment method for through-holes of printed circuit board and manufacturing method therefor

Also Published As

Publication number Publication date
CN114845480B (en) 2025-01-28

Similar Documents

Publication Publication Date Title
CN102713020B (en) Surface-treated copper foil, method for producing same, and copper clad laminated board
TW442395B (en) Composite copper foil, process for preparing the same, and copper-clad laminate and printed wiring board using the same
CN103491727B (en) Printed circuit board (PCB) graphite oxide reducing process carries out the method for hole electricity conduction
WO2017016395A1 (en) Method for preparing adhesive-free, polyimide flexible printed circuit board
CN103249255B (en) A kind of method directly preparing conducting wire on resin substrate
CN104582324B (en) Flexible PCB hole metallization method
JPH1036997A (en) Electroplating method
CN110029382A (en) A kind of process of surface treatment and its related directly electroplating technology for being directly electroplated
CN114845480A (en) A kind of flexible copper clad laminate graphene oxide hole metallization method
CN114657610A (en) Preparation method of strippable ultrathin carrier copper foil
JP2006024808A (en) Conductive composition preparation method, interlayer connection method, and conductive film or conductive image preparation method
Cobley et al. Improved electroless copper coverage at low catalyst concentrations and reduced plating temperatures enabled by low frequency ultrasound
CN112194815A (en) Double-sided copper-plated polyimide film and preparation method thereof
CN117438134A (en) Graphene slurry and preparation method and application thereof
CN113543523A (en) A substrate hole processing method and application thereof
CN106350789A (en) Preparation method of metal layer for electromagnetic shielding film
US9451707B2 (en) Stabilized silver catalysts and methods
TWI707982B (en) Chemical deposition system
CN111424272A (en) Browning liquid for printed circuit board
JPS5831754B2 (en) Insulating substrate for printed wiring boards
CN111826643A (en) A kind of method for modifying metal surface to activate copper plating to improve the bonding force of coating
CN119243159B (en) Carrier copper foil roughening liquid medicine and carrier copper foil roughening method
CN219876272U (en) Multilayer antioxidant printed circuit board
CN110582166B (en) Ceramic plate processing method combining DBC and DPC and ceramic substrate
CN117202524A (en) Circuit board and method for preparing circuit board by electrostatic printing mode

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant