CN114805425A - Silane monomer, benzocyclobutene organic silicon resin, device and preparation method - Google Patents
Silane monomer, benzocyclobutene organic silicon resin, device and preparation method Download PDFInfo
- Publication number
- CN114805425A CN114805425A CN202110125974.2A CN202110125974A CN114805425A CN 114805425 A CN114805425 A CN 114805425A CN 202110125974 A CN202110125974 A CN 202110125974A CN 114805425 A CN114805425 A CN 114805425A
- Authority
- CN
- China
- Prior art keywords
- group
- benzocyclobutene
- substituted
- unsubstituted
- silane monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 title claims abstract description 144
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 128
- 239000000178 monomer Substances 0.000 title claims abstract description 128
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 125
- 229920005989 resin Polymers 0.000 title claims abstract description 70
- 239000011347 resin Substances 0.000 title claims abstract description 70
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 59
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 58
- 239000010703 silicon Substances 0.000 title claims abstract description 56
- 238000002360 preparation method Methods 0.000 title abstract description 25
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 64
- 230000003301 hydrolyzing effect Effects 0.000 claims abstract description 50
- 238000006482 condensation reaction Methods 0.000 claims abstract description 38
- 230000007062 hydrolysis Effects 0.000 claims abstract description 32
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 30
- 239000000126 substance Substances 0.000 claims abstract description 30
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims abstract description 23
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims abstract description 23
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 15
- 125000004423 acyloxy group Chemical group 0.000 claims abstract description 11
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 8
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- ZETZHGKAZZCCRL-UHFFFAOYSA-N 5-ethenylbicyclo[4.2.0]octa-1(6),2,4-triene Chemical group C=CC1=CC=CC2=C1CC2 ZETZHGKAZZCCRL-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000006243 chemical reaction Methods 0.000 claims description 63
- 229920002050 silicone resin Polymers 0.000 claims description 56
- 239000003054 catalyst Substances 0.000 claims description 40
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 30
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 24
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 24
- 125000001424 substituent group Chemical group 0.000 claims description 21
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 20
- 238000007341 Heck reaction Methods 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 19
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 18
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims description 15
- 125000006650 (C2-C4) alkynyl group Chemical group 0.000 claims description 15
- GMHHTGYHERDNLO-UHFFFAOYSA-N 4-bromobicyclo[4.2.0]octa-1(6),2,4-triene Chemical compound BrC1=CC=C2CCC2=C1 GMHHTGYHERDNLO-UHFFFAOYSA-N 0.000 claims description 13
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 12
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 12
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 10
- -1 dimethylamino, diethylamino Chemical group 0.000 claims description 10
- 239000012074 organic phase Substances 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 8
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical group [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 claims description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 8
- 239000003377 acid catalyst Substances 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 6
- 239000007795 chemical reaction product Substances 0.000 claims description 6
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 6
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 6
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 6
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 6
- 235000011181 potassium carbonates Nutrition 0.000 claims description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 6
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 6
- 239000012298 atmosphere Substances 0.000 claims description 5
- 239000002585 base Substances 0.000 claims description 5
- 235000017550 sodium carbonate Nutrition 0.000 claims description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 4
- 238000006555 catalytic reaction Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- IWDFHWZHHOSSGR-UHFFFAOYSA-N 1-ethylimidazole Chemical compound CCN1C=CN=C1 IWDFHWZHHOSSGR-UHFFFAOYSA-N 0.000 claims description 3
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 claims description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 3
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 claims description 3
- 239000011230 binding agent Substances 0.000 claims description 3
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 claims description 3
- 229910000024 caesium carbonate Inorganic materials 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 235000019253 formic acid Nutrition 0.000 claims description 3
- 239000011736 potassium bicarbonate Substances 0.000 claims description 3
- 229910000028 potassium bicarbonate Inorganic materials 0.000 claims description 3
- 235000015497 potassium bicarbonate Nutrition 0.000 claims description 3
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 claims description 3
- 235000011118 potassium hydroxide Nutrition 0.000 claims description 3
- 239000002516 radical scavenger Substances 0.000 claims description 3
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 3
- 239000001488 sodium phosphate Substances 0.000 claims description 3
- 229910000162 sodium phosphate Inorganic materials 0.000 claims description 3
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims description 3
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 2
- KFGVRWGDTLZAAO-UHFFFAOYSA-N cyclopenta-1,3-diene dicyclohexyl(cyclopenta-1,3-dien-1-yl)phosphane iron(2+) Chemical compound [Fe++].c1cc[cH-]c1.C1CCC(CC1)P(C1CCCCC1)c1ccc[cH-]1 KFGVRWGDTLZAAO-UHFFFAOYSA-N 0.000 claims description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 8
- 238000010923 batch production Methods 0.000 abstract description 3
- 125000001309 chloro group Chemical group Cl* 0.000 abstract description 2
- 239000002861 polymer material Substances 0.000 abstract description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 17
- 239000000706 filtrate Substances 0.000 description 17
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 13
- 239000003921 oil Substances 0.000 description 10
- 238000002390 rotary evaporation Methods 0.000 description 10
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 9
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- 238000000967 suction filtration Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000004821 distillation Methods 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 6
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 6
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 229920005573 silicon-containing polymer Polymers 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 238000007865 diluting Methods 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 238000011031 large-scale manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 238000004377 microelectronic Methods 0.000 description 4
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 125000005375 organosiloxane group Chemical group 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- MYXKPFMQWULLOH-UHFFFAOYSA-M tetramethylazanium;hydroxide;pentahydrate Chemical compound O.O.O.O.O.[OH-].C[N+](C)(C)C MYXKPFMQWULLOH-UHFFFAOYSA-M 0.000 description 2
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 description 1
- BDKAJBQJBPSANH-UHFFFAOYSA-N 2-iodobicyclo[4.2.0]octa-1(6),2,4-triene Chemical compound IC1=C2C(CC2)=CC=C1 BDKAJBQJBPSANH-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 235000011148 calcium chloride Nutrition 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- XSDCTSITJJJDPY-UHFFFAOYSA-N chloro-ethenyl-dimethylsilane Chemical compound C[Si](C)(Cl)C=C XSDCTSITJJJDPY-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- JEWCZPTVOYXPGG-UHFFFAOYSA-N ethenyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)C=C JEWCZPTVOYXPGG-UHFFFAOYSA-N 0.000 description 1
- NUFVQEIPPHHQCK-UHFFFAOYSA-N ethenyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)C=C NUFVQEIPPHHQCK-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Polymers (AREA)
Abstract
The application discloses a silane monomer, benzocyclobutene organic silicon resin, a device and a preparation method, and belongs to the field of high polymer materials. The chemical structural formula of the silane monomer is shown as follows:
Description
Technical Field
The disclosure relates to the field of high polymer materials, in particular to a silane monomer, benzocyclobutene organic silicon resin, a device and a preparation method.
Background
Benzocyclobutene (BCB) has excellent electrical insulation, high thermal stability, and high hydrophobicity, and the silicone polymer has good heat resistance and easy processability, but the film-forming property of the silicone polymer is generally poor, and the silicone resin containing benzocyclobutene functional groups with relatively good film-forming property can be obtained by modifying the silicone polymer with benzocyclobutene.
In the related technology, firstly, silane containing oxetane and benzocyclobutene groups is synthesized, and the silane containing oxetane and benzocyclobutene groups is used as an initial reaction monomer to carry out ring-opening polymerization to obtain the linear organic silicon resin with the main chain being carbosilane and the side chain being benzocyclobutene.
In the course of implementing the present disclosure, the inventors found that there are at least the following problems in the prior art:
in the related art, silane containing silacyclobutane and benzocyclobutene groups is used as an initial reaction monomer, but the initial reaction monomer is harsh in synthesis conditions, complex in synthesis steps, low in reaction yield, difficult to produce in large scale and high in cost.
Disclosure of Invention
In view of this, the embodiments of the present disclosure provide a silane monomer, a benzocyclobutene silicone resin, an electric device, and a manufacturing method, which can solve the above technical problems.
Specifically, the method comprises the following technical scheme:
in one aspect, embodiments of the present disclosure provide a silane monomer, where the chemical structural formula of the silane monomer is as follows:
wherein R1, R2, R3, R4 and R5 are independently selected from the following groups: H. alkyl, alkoxy, alkenyl, phenyl;
r6, R7, R8 are independently selected from the group consisting of: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene group, or a hydrolysis group, and at least one of R6, R7, R8 is the hydrolysis group;
the hydrolysable group is selected from a substituted or unsubstituted amino group, an alkoxy group, an acyloxy group, or-Cl.
In some possible implementations, the hydrolyzing group is selected from dimethylamino, diethylamino, alkoxy of C1-C4, or acyloxy of C1-C4.
In some possible implementations, the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent that is a C1-C4 alkyl group, a C2-C4 alkenyl group, a C2-C4 alkynyl group, an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group;
the substituted phenyl group has a second substituent selected from the group consisting of C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, or unsubstituted phenyl.
In some possible implementations, the chemical structural formula of the silane monomer is as follows:
in some possible implementations, the chemical structural formula of the silane monomer is as follows:
In another aspect, embodiments of the present disclosure provide a benzocyclobutene silicone resin prepared by subjecting any one of the silane monomers described above to a hydrolytic condensation reaction.
In some possible implementations, the chemical structural formula of the benzocyclobutene silicone resin is as follows:
wherein n is an integer greater than or equal to 0;
r' is selected from the following groups: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene radical.
In some possible implementations, the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent selected from a C1-C4 alkyl group, a C2-C4 alkenyl group, a C2-C4 alkynyl group, an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group;
the substituted phenyl group has a second substituent selected from the group consisting of C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, or unsubstituted phenyl.
In some possible implementations, the chemical structural formula of the benzocyclobutene silicone resin is as follows:
wherein x, y and z are integers greater than or equal to 0;
r' is selected from the following groups: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl.
In some possible implementations, the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent selected from a C1-C4 alkyl group, a C2-C4 alkenyl group, a C2-C4 alkynyl group, an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group;
the substituted phenyl group has a second substituent selected from the group consisting of C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, or unsubstituted phenyl.
In another aspect, embodiments of the present disclosure provide a method for preparing any one of the silane monomers described above, where the method for preparing the silane monomer includes:
under inert atmosphere and alkaline environment, performing Heck reaction on siloxane containing vinyl and 4-bromobenzocyclobutene in a dry solvent with a first catalyst and an acid-binding agent to obtain the silane monomer;
wherein the chemical structural formula of the siloxane containing vinyl is shown as follows:
r6, R7, R8 are independently selected from the group consisting of: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene group, or a hydrolysis group, and at least one of R6, R7, R8 is the hydrolysis group;
the hydrolytic group is selected from dimethylamino, diethylamino, alkoxy of C1-C4, or acyloxy of C1-C4.
In some possible implementations, the first catalyst is selected from palladium acetate, palladium chloride, tetrakis (triphenylphosphine) palladium, palladium on carbon catalyst, diphenylphosphinoferrocene palladium dichloride.
In some possible implementations, the acid scavenger is selected from at least one of triethylamine, diethylamine, potassium carbonate, sodium carbonate, pyridine, imidazole.
In some possible implementations, the drying solvent is selected from at least one of benzene, acetonitrile, tetrahydrofuran, dioxane, N-dimethylformamide, N-dimethylacetamide.
In some possible implementations, the Heck reaction has a reaction temperature of 50 ℃ to 120 ℃ and a reaction time of 4 hours to 48 hours.
In another aspect, embodiments of the present disclosure provide a method for preparing any one of the above benzocyclobutene silicone resins, where the method for preparing the benzocyclobutene silicone resin includes:
providing at least one silane monomer as set forth in the first aspect above;
and (3) carrying out hydrolytic condensation reaction on the at least one silane monomer in an aqueous solution under the catalysis of a second catalyst to obtain the benzocyclobutene organic silicon resin.
In some possible implementations, the hydrolytic condensation reaction is performed using at least one silane monomer containing a single hydrolyzable group.
In some possible implementations, the second catalyst is an acid catalyst or a base catalyst;
the acid catalyst is at least one of formic acid, acetic acid, hydrochloric acid, phosphoric acid and sulfuric acid;
the alkali catalyst is at least one selected from sodium hydroxide, potassium hydroxide, sodium bicarbonate, potassium bicarbonate, sodium carbonate, potassium carbonate, cesium carbonate, sodium phosphate, ammonia water, diethylamine, triethylamine, pyridine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, imidazole, N-methylimidazole, N-ethylimidazole and benzyltrimethylammonium hydroxide.
In some possible implementations, the reaction temperature of the hydrolytic condensation reaction is from 15 ℃ to 120 ℃.
In some possible implementations, the method for preparing benzocyclobutene silicone resin further includes:
after the hydrolysis condensation reaction is finished, removing the second catalyst from a reaction product system to obtain an organic phase;
and drying and filtering the organic phase to obtain the benzocyclobutene organic silicon resin.
In yet another aspect, embodiments of the present disclosure provide a device having a resin layer prepared using any one of the benzocyclobutene silicone resins described above.
The technical scheme provided by the embodiment of the disclosure has the beneficial effects that:
1. the silane monomer provided by the embodiment of the disclosure has a benzocyclobutene group, and can generate a hydrolytic condensation reaction based on the use of a hydrolyzable group, so as to synthesize a benzocyclobutene organic silicon resin. When synthesizing benzocyclobutene organic silicon resin, through the proportion of adjustment silane monomer and the proportion of the functional group of hydrolysising that contains, can adjust benzocyclobutene organic silicon resin's viscosity adaptively, avoided adopting the prepolymerization technology to adjust its viscosity, effectively reduced benzocyclobutene organic silicon resin's the preparation degree of difficulty and cost. In addition, the benzocyclobutene organic silicon resin is synthesized by performing hydrolytic condensation on silane monomers with different hydrolytic groups, so that the molecular weight and viscosity of the benzocyclobutene organic silicon resin are easily controlled, the hydrolytic condensation reaction is mild in condition, the operation is simple, the cost is low, and the large-scale batch production is facilitated.
2. The vinyl-containing siloxane and the 4-bromobenzocyclobutene can generate Heck reaction under specific conditions to prepare the silane monomer, the Heck reaction has mild and easily controlled reaction conditions, and the used raw materials are stable, simple and easily obtained, so that the preparation process of the silane monomer is simple and easily controlled, and is convenient for large-scale production.
3. The benzocyclobutene organic silicon resin provided by the embodiment of the disclosure combines benzocyclobutene with organic siloxane, and the number of the benzocyclobutene groups and the number of the organic siloxane groups can be easily regulated, so that the benzocyclobutene organic silicon resin has at least the following advantages: excellent electrical insulation, excellent dielectric property, high thermal stability, high water repellency, easy processability, easy film forming property and the like.
4. The preparation method of benzocyclobutene organic silicon resin provided by the embodiment of the disclosure can realize the synthesis of benzocyclobutene organic silicon resin mildly by co-hydrolyzing silane monomers with different hydrolysis groups, does not need a prepolymerization process, and has the advantages of simple process, low cost and convenience for large-scale production. In addition, the polymerization degree of the benzocyclobutene organic silicon resin can be controlled, and the problems of poor film forming property and the like caused by small molecular weight of the benzocyclobutene organic silicon resin in the related technology are solved; the proportion of benzocyclobutene groups in the benzocyclobutene organic silicon resin can be easily regulated, so that the benzocyclobutene organic silicon resin has excellent dielectric property, heat resistance and adhesion.
Detailed Description
In order to make the technical solution and advantages of the present disclosure more clear, embodiments of the present disclosure will be described in further detail below.
Benzocyclobutene (BCB) has excellent electrical insulation, high thermal stability, and high hydrophobicity, and the silicone polymer has good heat resistance and easy processability, but the film-forming property of the silicone polymer is generally poor, and the silicone resin containing benzocyclobutene functional groups with relatively good film-forming property can be obtained by modifying the silicone polymer with benzocyclobutene.
In the related technology, firstly, silane containing oxetane and benzocyclobutene groups is synthesized, and the silane containing oxetane and benzocyclobutene groups is used as an initial reaction monomer to carry out ring-opening polymerization to obtain the linear organic silicon resin with the main chain being carbosilane and the side chain being benzocyclobutene.
However, in the related art, silane containing silacyclobutane and benzocyclobutene groups is used as an initial reaction monomer, but the initial reaction monomer has harsh synthesis conditions, complicated synthesis steps, and low reaction yield, and is not only difficult to mass-produce on a large scale, but also high in cost.
In addition, for example, dow corporation has also developed a typical bis-benzocyclobutene group-containing siloxane having the following chemical structure:
however, the siloxane with the chemical structure has small molecular weight, but high boiling point and complicated purification process, and especially when the requirements of ultralow metal ion residue and ultralow halogen residue in application in the field of microelectronics are met, the resin monomer has higher purification process requirements, and if the purity of the monomer is not high, the resin performance in the later period can be greatly influenced. In addition, when in use, the prepolymer is required to be performed at the temperature of more than 160 ℃, and the prepolymer with certain viscosity can be used. However, the prepolymerization process is prone to oxidation reaction, which results in byproduct generation, color deepening and influence on the performance of siloxane, so the prepolymerization process needs to be strictly controlled to be anhydrous and oxygen-free, and the prepolymerization product needs to be controlled to have a proper prepolymerization molecular weight, so that the prepolymerization product meets the use requirements, and meanwhile, gel does not occur, and the difficulty of the prepolymerization process is further increased.
In one aspect, embodiments of the present disclosure provide a silane monomer, which has a chemical structural formula as follows:
wherein R1, R2, R3, R4 and R5 are independently selected from the following groups: H. alkyl, alkoxy, alkenyl, phenyl. For example, the alkyl group is methyl, ethyl, propyl, butyl, pentyl, hexyl, etc., the alkoxy group is C1-C6, etc., the alkenyl group is vinyl, propenyl, butenyl, pentenyl, etc., and the phenyl group is toluene, benzene ring, etc.
R6, R7, R8 are independently selected from the group consisting of: H. unsubstituted or substituted C1-C6 alkyl (methyl, ethyl, propyl, butyl, pentyl, hexyl), unsubstituted or substituted C2-C6 alkenyl (ethenyl, propenyl, butenyl, pentenyl, hexenyl), unsubstituted or substituted phenyl, 4-ethenyl-benzocyclobutene radical, or a hydrolyzing group.
At least one of R6, R7, R8 is a hydrolyzing group selected from substituted or unsubstituted amino, alkoxy, acyloxy, or-Cl.
For example, the hydrolyzable group is selected from dimethylamino, diethylamino, alkoxy of C1-C4 (methoxy (CH3O-), ethoxy (C2H5O-), propoxy (C3H7O-), butoxy (C4H9O-), etc.), or acyloxy of C1-C4 (formyloxy, acetyloxy, propionyloxy, butyryloxy, etc.).
Among the silane monomers provided by the embodiments of the present disclosure, by way of example, unsubstituted C1-C6 alkyl groups are, for example, methyl, ethyl, propyl, butyl, pentyl, etc.; unsubstituted C2-C6 alkenyl is, for example, ethenyl, propenyl, butenyl, pentenyl and the like.
In some possible implementations, the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent, and the first substituent is, for example, a C1-C4 alkyl group (e.g., methyl, ethyl, propyl, butyl, etc.), a C2-C4 alkenyl group (e.g., ethenyl, propenyl, butenyl), a C2-C4 alkynyl group (e.g., ethynyl, propynyl, butynyl), an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group.
In some possible implementations, the substituted phenyl group has a second substituent selected from an alkyl group of C1-C4 (e.g., methyl, ethyl, propyl, butyl, etc.), an alkenyl group of C2-C4 (e.g., ethenyl, propenyl, butenyl), an alkynyl group of C2-C4 (e.g., ethynyl, propynyl, butynyl), or an unsubstituted phenyl group.
As a representative example, embodiments of the present disclosure provide silane monomers having the chemical formula shown below:
wherein, any one or two of R6, R7 and R8 are hydrolytic groups, or the three are hydrolytic groups, and when two or three hydrolytic groups are included, the hydrolytic groups can be the same or different.
In the disclosed embodiment, any one of R6, R7, R8 may be made a hydrolyzable group to constitute a silane monomer having a single hydrolyzable group; any two of R6, R7 and R8 may be a hydrolyzable group (the two hydrolyzable groups may be the same or different) to form a silane monomer having a double hydrolyzable group; the silane monomer having a trihydrolytic group may be formed by using all three of R6, R7, and R8 as hydrolyzable groups (the three hydrolyzable groups may be the same or different).
As an example, the silane monomer is a silane monomer having a single hydrolyzable group, and the hydrolyzable group is a methoxy group, and in this case, the chemical structural formula of the silane monomer is as follows:
as another example, the silane monomer is a silane monomer having a double hydrolyzable group, and the hydrolyzable group is a methoxy group, and in this case, the chemical structural formula of the silane monomer is as follows:
as still another example, the silane monomer is a silane monomer having a tri-hydrolyzable group, and the hydrolyzable group is a methoxy group, and in this case, the silane monomer has a chemical structural formula as follows:
the silane monomer provided by the embodiment of the disclosure has a benzocyclobutene group, and can generate a hydrolytic condensation reaction based on the use of a hydrolyzable group, so as to synthesize a benzocyclobutene organic silicon resin. When synthesizing benzocyclobutene organic silicon resin, through the proportion of adjustment silane monomer and the proportion of the functional group of hydrolysising that contains, can adjust benzocyclobutene organic silicon resin's viscosity adaptively, avoided adopting the prepolymerization technology to adjust its viscosity, effectively reduced benzocyclobutene organic silicon resin's the preparation degree of difficulty and cost. In addition, the benzocyclobutene organic silicon resin is synthesized by performing hydrolytic condensation on silane monomers with different hydrolytic groups, so that the molecular weight and viscosity of the benzocyclobutene organic silicon resin are easily controlled, the hydrolytic condensation reaction is mild in condition, the operation is simple, the cost is low, and the large-scale batch production is facilitated.
Compared with the resin monomer of the dow chemistry, the silane monomer provided by the embodiment of the disclosure has at least the following advantages: the molecular weight is small, the boiling point is low, the purification can be carried out by ordinary reduced pressure distillation, and the purity can easily reach the electronic grade or the microelectronic grade.
In another aspect, embodiments of the present disclosure also provide a method for preparing any one of the silane monomers, where the method for preparing the silane monomer includes:
under an inert atmosphere, performing Heck reaction on siloxane containing vinyl and 4-bromobenzocyclobutene in a dry solvent with a first catalyst and an acid-binding agent to obtain a silane monomer.
Wherein the chemical structural formula of the siloxane containing vinyl is shown as follows:
r6, R7, R8 are independently selected from the group consisting of: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene group, or a hydrolyzing group, and at least one of R6, R7, R8 is a hydrolyzing group selected from dimethylamino, diethylamino, C1-C4 alkoxy, or C1-C4 acyloxy. R6, R7 and R8 are referred to above in connection with the description of R6, R7 and R8 in the silane monomer, and are not repeated here.
The vinyl-containing siloxane and 4-bromobenzocyclobutene can undergo a Heck reaction under the above specific conditions to prepare the silane monomer. The Heck reaction has mild and easily controlled reaction conditions, and the used raw materials are stable, simple and easily obtained, so that the preparation process of the silane monomer is simple and easily controlled, and the scale production is facilitated. Among them, 4-iodobenzocyclobutene may be used in place of 4-bromobenzocyclobutene, and can function similarly to 4-bromobenzocyclobutene. During the reaction, the vinyl-containing siloxane may be slightly in excess relative to the 4-bromobenzocyclobutene to allow the 4-bromobenzocyclobutene to react fully and thoroughly.
The reaction conditions involved in the Heck reaction are described below separately:
the Heck reaction is performed in an inert atmosphere, which may be provided by nitrogen or argon in the disclosed embodiment, to stabilize the reaction from undesired side reactions.
The Heck reaction can generate hydrobromic acid continuously in the reaction process, which has an inhibiting effect on the first catalyst and is not beneficial to forward reaction.
Illustratively, the acid scavenger used in the embodiments of the present disclosure is at least one selected from triethylamine, diethylamine, potassium carbonate, sodium carbonate, pyridine, and imidazole.
In order to improve the reaction efficiency and ensure that the reaction is smoothly carried out, the first catalyst is at least one selected from palladium acetate, palladium chloride, palladium-tetrakis (triphenylphosphine) palladium, palladium-carbon catalyst (Pd/C catalyst for short) and diphenylphosphinferrocene palladium dichloride. Further, in order to make the first catalyst fully exert activity, when in use, the first catalyst is used in combination with a corresponding ligand, and when the first catalyst is palladium acetate, tris (o-methylphenyl) phosphorus can be used as the corresponding ligand to promote the Heck reaction to fully progress.
The Heck reaction is required to be performed in a strictly anhydrous environment, so the embodiment of the present disclosure uses a dry solvent, that is, the solvent needs to be dried before being used, for example, by fractional distillation, or dry gas reflux. Illustratively, the drying solvent is selected from at least one of benzene, acetonitrile, tetrahydrofuran, dioxane, N-dimethylformamide, N-dimethylacetamide.
For example, redistilled acetonitrile or redistilled tetrahydrofuran which are subjected to two or more distillation treatments may be used as the drying solvent.
In some possible implementations, in order to improve the reaction efficiency of the Heck reaction, the reaction temperature of the Heck reaction is 50 ℃ to 120 ℃, such as 60 ℃ to 100 ℃, and for example, 60 ℃, 70 ℃, 80 ℃, 90 ℃, 100 ℃ and the like can be achieved; the reaction time for the Heck reaction is 4 hours to 48 hours, for example 6 hours to 12 hours.
After the Heck reaction is finished, the silane monomer can be separated from the reaction product system in the following way: and (3) carrying out silica gel suction filtration twice on the reaction product system, washing the obtained filtrate with a non-polar solvent (such as n-hexane, petroleum ether and the like) so as to be convenient for subsequent use, and carrying out rotary evaporation concentration, reduced pressure distillation and purification on the obtained organic phase in turn to obtain the high-purity silane monomer.
On the other hand, embodiments of the present disclosure also provide a benzocyclobutene silicone resin prepared by subjecting the above-mentioned silane monomer to a hydrolytic condensation reaction.
By controlling the structure of the silane monomer used, and in particular the number of hydrolysable groups contained in the silane monomer, the structure of the synthesized benzocyclobutene silicone resin includes, but is not limited to: linear, tree-like, ring-like, or network-like.
The embodiments of the present disclosure provide benzocyclobutene silicone resin, which combines benzocyclobutene with organosiloxane, and the number of benzocyclobutene groups and organosiloxane groups can be easily controlled, so that the benzocyclobutene silicone resin has at least the following advantages: excellent electrical insulating property, excellent dielectric property, high thermal stability, high water repellency, easy processability, easy film forming property and the like.
In some possible implementations, the benzocyclobutene silicone resin can be prepared by the following preparation method:
providing at least one silane monomer;
and (3) carrying out hydrolytic condensation reaction on at least one silane monomer in an aqueous solution under the catalysis of a second catalyst to obtain the benzocyclobutene organic silicon resin.
One, two or more silane monomers may be used to perform a hydrolytic condensation reaction to obtain the benzocyclobutene silicone resin desired by embodiments of the present disclosure. A plurality of silane monomers are adopted for carrying out cohydrolysis condensation reaction, and the obtained benzocyclobutene organic silicon resin has controllable molecular weight and good film forming property, and is beneficial to further thermocuring and crosslinking.
Wherein at least one silane monomer containing a single hydrolyzable group is used for hydrolysis condensation reaction, that is, at least one silane monomer containing a single hydrolyzable group is used as a reaction raw material in the hydrolysis condensation reaction, and the silane monomer containing a single hydrolyzable group can be used as an end capping agent to obtain benzocyclobutene terminated benzocyclobutene silicone resin. And a silane monomer containing a single hydrolytic group is used as an end-capping agent, the structure of the silane monomer is basically consistent with that of a hydrolytic main silane monomer, and the ratio of benzocyclobutene groups to silicon atoms and vinyl groups is ensured to be 1:1: 1.
Of course, in some possible implementations, the proportion of benzocyclobutene groups in the benzocyclobutene silicone resin can also be adjusted by copolymerizing a silane monomer that does not contain benzocyclobutene groups.
In some possible implementations, the benzocyclobutene silicone resin with a linear structure and terminated benzocyclobutene can be synthesized by cohydrolysis polymerization of a silane monomer with a single hydrolysis group and a silane monomer with a double hydrolysis group.
As a typical example, the chemical structural formula of the benzocyclobutene silicone resin is shown as follows:
wherein n is an integer greater than or equal to 0;
r' is selected from the following groups: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene radical.
Illustratively, the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent, and the first substituent is, for example, a C1-C4 alkyl group (e.g., methyl, ethyl, propyl, butyl, etc.), a C2-C4 alkenyl group (e.g., ethenyl, propenyl, butenyl), a C2-C4 alkynyl group (e.g., ethynyl, propynyl, butynyl), an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group.
Illustratively, the substituted phenyl group has a second substituent selected from the group consisting of an alkyl group of C1-C4 (e.g., methyl, ethyl, propyl, butyl, etc.), an alkenyl group of C2-C4 (e.g., ethenyl, propenyl, butenyl), an alkynyl group of C2-C4 (e.g., ethynyl, propynyl, butynyl), or an unsubstituted phenyl group.
In the benzocyclobutene silicone resin, R' refers to a non-hydrolyzable group derived from a non-hydrolyzable group in the silane monomer, and may arbitrarily correspond to R6, R7, or R8 as long as it is a non-hydrolyzable group.
As an example, the chemical structural formula of the benzocyclobutene silicone resin is as follows:
the reaction equation of the benzocyclobutene organic silicon resin is as follows:
therefore, the benzocyclobutene organic silicon resin with the linear structure can be prepared by performing hydrolysis condensation reaction on the silane monomer with the single hydrolytic group and the silane monomer with the double hydrolytic groups.
Wherein, the silane monomer with single hydrolytic group is used as the end capping agent to perform end capping, and the silane monomer with double hydrolytic groups is used as the resin matrix to influence the polymerization degree of the benzocyclobutene organic silicon resin, namely the n value. The desired degree of polymerization can be obtained by controlling the ratio of silane monomer having a double hydrolyzable group to silane monomer having a single hydrolyzable group.
In some possible implementations, the benzocyclobutene silicone resin with a network-type structure of a branched chain can be synthesized by cohydrolytic polymerization of a silane monomer with a single hydrolytic group, a silane monomer with a double hydrolytic group, and a silane monomer with a triple hydrolytic group.
As another typical example, the chemical structural formula of the benzocyclobutene silicone resin is as follows:
wherein x, y and z are integers greater than or equal to 0;
r' is selected from the following groups: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl.
Illustratively, the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent, and the first substituent is, for example, a C1-C4 alkyl group (e.g., methyl, ethyl, propyl, butyl, etc.), a C2-C4 alkenyl group (e.g., ethenyl, propenyl, butenyl), a C2-C4 alkynyl group (e.g., ethynyl, propynyl, butynyl), an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group.
Illustratively, the substituted phenyl group has a second substituent selected from the group consisting of an alkyl group of C1-C4 (e.g., methyl, ethyl, propyl, butyl, etc.), an alkenyl group of C2-C4 (e.g., ethenyl, propenyl, butenyl), an alkynyl group of C2-C4 (e.g., ethynyl, propynyl, butynyl), or an unsubstituted phenyl group.
In the benzocyclobutene silicone resin, R ″ refers to a non-hydrolyzable group derived from a non-hydrolyzable group in the silane monomer, and may arbitrarily correspond to R6, R7, or R8 as long as it is a non-hydrolyzable group.
In the chemical structural formula of the benzocyclobutene organic silicon resin, the number of the hydrolysis groups contained in the corresponding silane monomer groups is determined according to the number of R' connected on Si atoms in each silane monomer group. For example, when the number of R' attached to Si atom in a silane group is two, it means that the silane monomer corresponding to the silane monomer group has one hydrolyzable group; when the number of R' attached to Si atom in the silane group is one, it means that the silane monomer corresponding to the silane monomer group has two hydrolyzable groups; when no linkage R' is attached to the Si atom in the silane group, it means that the silane monomer group corresponds to a silane monomer having three hydrolyzable groups.
Wherein, the wavy line bonded to Si in the above chemical formula means a group capable of undergoing hydrolysis, for example, dimethylamino group, diethylamino group, alkoxy group of C1-C4, or acyloxy group of C1-C4. This means that the hydrolysis group does not participate in the previous hydrolysis-condensation reaction, and a new hydrolysis-condensation reaction can be performed, so that the chemical structural formula of the benzocyclobutene organic silicon resin continues to extend outwards, and the molecular weight continues to increase.
As an example, the chemical structural formula of the benzocyclobutene silicone resin is shown as follows:
the reaction equation of the benzocyclobutene organic silicon resin is as follows:
the polymerization degree, i.e. molecular weight, of the benzocyclobutene silicone resin is controlled by the adding time of the silane monomer containing a single hydrolysis group, and in the embodiment of the disclosure, the molecular weight of the benzocyclobutene silicone resin may be, for example, 1500-. Meanwhile, by controlling the adding time of the silane monomer containing the single hydrolytic group and the silane monomer containing the double hydrolytic groups, the chemical structure of the benzocyclobutene organic silicon resin can be changed, namely whether the groups of x, y and z exist or not and the existence quantity of the groups are changed.
For example, in the chemical structure of the benzocyclobutene silicone resin, x has a value in a range of 0 to 50, for example, 1, 5, 10, 20, 30, 40, 45, and the like; y ranges from 0 to 50, e.g., 1, 5, 10, 20, 30, 40, 45, etc.; z ranges from 0 to 50, such as 1, 5, 10, 20, 30, 40, 45, etc.; and at least one group of x, y and z exists.
The benzocyclobutene organic silicon resin provided by the embodiment of the disclosure can be subjected to crosslinking polymerization (for example, through Diels-Alder reaction (D-a reaction for short), and further crosslinking and curing), and the obtained crosslinked product has controllable viscosity, good heat resistance and electrical properties, high crosslinking density, small free volume, and lower dielectric loss (equivalent to or better than DVS-BCB).
The benzocyclobutene organic silicon resin provided by the embodiment of the disclosure can be used in the fields of microelectronic multi-chip modules (MCM), integrated circuits, optoelectronic devices, aerospace and the like, can be directly applied, and can also be modified by adding other organic modifiers or inorganic modifiers.
For example, the benzocyclobutene silicone resin provided by the embodiment of the disclosure can be used as an encapsulation material or an insulating coating layer, and is applied to electronic devices or photoelectric devices such as solar cells, display devices, LEDs, MEMS, and the like. The benzocyclobutene organic silicon resin provided by the embodiment of the disclosure can be used as an optical device or an optical thin film material, and can also be used as a low dielectric interlayer dielectric material, a low dielectric electro-optic resist, a patterning material, a chip bonding adhesive and the like in the fields of semiconductors and integrated circuits; can also be used for preparing high-performance resin composite materials.
In another aspect, embodiments of the present disclosure also provide a method for preparing any one of the benzocyclobutene silicone resins described above, where the method for preparing a benzocyclobutene silicone resin includes:
providing at least one silane monomer, the silane monomer being as set forth above;
and (3) carrying out hydrolytic condensation reaction on at least one silane monomer in an aqueous solution under the catalysis of a second catalyst to obtain the benzocyclobutene organic silicon resin.
Wherein the hydrolytic condensation reaction is carried out using at least one silane monomer having a single hydrolyzable group, and when the hydrolytic condensation reaction is carried out using two or more silane monomers, one of the silane monomers may be slightly in excess so that the other silane monomer is sufficiently completely reacted.
The hydrolysis condensation reaction is carried out under the catalytic action of a second catalyst, and in some possible implementation modes, the second catalyst is an acid catalyst or a base catalyst; wherein the acid catalyst is at least one selected from formic acid, acetic acid, hydrochloric acid, phosphoric acid and sulfuric acid. The acid catalyst may be a diluted acid aqueous solution or a high-purity acid.
The alkali catalyst is at least one selected from sodium hydroxide, potassium hydroxide, sodium bicarbonate, potassium bicarbonate, sodium carbonate, potassium carbonate, cesium carbonate, sodium phosphate, ammonia, diethylamine, triethylamine, pyridine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, imidazole, N-methylimidazole, N-ethylimidazole and benzyltrimethylammonium hydroxide. The alkali catalyst may be a diluted alkali aqueous solution or an alcohol solution.
In the above hydrolysis-condensation reaction, the reaction system may or may not contain a solvent. Whether the solvent needs to be added can be judged according to the requirement of the molecular weight of the benzocyclobutene organic silicon resin: when benzocyclobutene organosilicon resin needs larger molecular weight, a solvent is added, so that the benzocyclobutene organosilicon resin is beneficial to stirring to fully hydrolyze products and raw materials, the molecular weight distribution of the hydrolysis products is more uniform, the polymer structure is easier to control, and the mechanical property of the resin is facilitated. The benzocyclobutene organic silicon resin needs small molecular weight, and no solvent can be added.
The solvent suitable for the hydrolysis condensation reaction is at least one selected from methanol, ethanol, isopropanol, butanol, benzene, toluene, trimethylbenzene, tetrahydrofuran, alkane solvents (N-hexane, petroleum ether, cyclohexane, etc.), diethyl ether, dioxane, dichloromethane, chloroform, N-dimethylformamide, N-dimethylacetamide, acetone, methyl ethyl ketone, cyclohexanone, ethyl acetate, and butyl acetate.
In order to smoothly and sufficiently perform the hydrolytic condensation reaction, the hydrolytic condensation reaction is performed in an atmosphere of air, nitrogen or argon, and the reaction temperature is 15 ℃ to 120 ℃.
The hydrolytic condensation reaction can be carried out under normal pressure or reduced pressure, and the reaction time can be within 1-24 hours according to the dosage and proportion of the reaction raw materials.
After the hydrolysis condensation reaction is finished, removing the second catalyst from the reaction product system to obtain an organic phase; and then drying and filtering the organic phase to obtain the benzocyclobutene organic silicon resin.
The removal method is selected adaptively based on the specific type of the second catalyst, for example, when the second catalyst is tetramethylammonium hydroxide, the temperature of the reaction product system can be raised to 125-150 ℃ by heating to achieve the purpose of removing the second catalyst. When the second catalyst is a water-washable acid or base, the catalyst can be removed by alkali washing or acid washing with a suitable base or acid, followed by water washing.
In drying the organic phase, a drying agent such as sodium sulfate, magnesium sulfate, or calcium chloride may be used to achieve thorough drying of the organic phase.
In conclusion, compared with the related technology in which the pre-polymerization process of benzocyclobutene organic silicon resin is difficult to control, the pre-polymerization process is easy to generate oxidation to generate byproducts or generate gel to cause failure, or the related technology in which the pre-polymerization resin is not required to be cross-linked by benzocyclobutene, the synthesis steps are complicated, the cost is high, and the large-scale mass production is difficult.
The benzocyclobutene organic silicon resin and the preparation method thereof provided by the embodiment of the disclosure can realize the synthesis of the benzocyclobutene organic silicon resin mildly by co-hydrolyzing silane monomers with different hydrolysis groups, do not need a prepolymerization process, have simple process, low cost and convenience for large-scale production, can reserve double bonds to the maximum extent and are beneficial to being made into photosensitive patterned resin. And the polymerization degree of the benzocyclobutene organic silicon resin can be controlled, and the problems of poor film forming property and the like caused by small molecular weight of the benzocyclobutene organic silicon resin in the related technology are solved. Meanwhile, the proportion of benzocyclobutene groups in the benzocyclobutene organic silicon resin can be easily regulated, so that the benzocyclobutene organic silicon resin has excellent dielectric property (low dielectric property), heat resistance and adhesion.
Specifically, the benzocyclobutene silicone resin provided by the embodiment of the disclosure does not need to be prepolymerized before being used, which is a difficult-to-control step (in the related art, the benzocyclobutene silicone resin mostly needs to be prepolymerized at a high temperature without oxygen, and can be conveniently used after the viscosity of the system is increased). Wherein, at the same reaction temperature, the more the amount of the second catalyst, the faster the hydrolytic polymerization reaction rate, and the higher the degree of polymerization, the greater the resin viscosity.
In the hydrolytic condensation reaction, a silane monomer having a single hydrolyzable group is used as an end-capping agent, which substantially conforms to the structure of the hydrolysis subject, i.e., the silane monomer, ensuring that the ratio of benzocyclobutene groups, silicon atoms, and vinyl groups is 1:1: 1. Of course, the proportion of the benzocyclobutene groups in the benzocyclobutene silicone resin can be adjusted by participating in the hydrolysis condensation reaction with the silane monomer containing no benzocyclobutene groups, so that the proportion of the benzocyclobutene groups in the benzocyclobutene silicone resin can be controlled.
In the embodiment disclosed by the invention, the preparation of the silane monomer relates to a Heck reaction, the reaction condition is relatively mild and is convenient to control, and the preparation method is suitable for large-scale production. The preparation of benzocyclobutene organic silicon resin relates to hydrolysis condensation reaction, and has mild hydrolysis condensation reaction conditions, simple and convenient operation and wide reaction temperature range (room temperature-120 ℃). Therefore, the two preparation processes avoid the adoption of a reaction mode with harsh reaction conditions (such as Grignard reaction) and unstable raw materials (such as butyl lithium, chlorosilane and the like), so that the benzocyclobutene organic silicon resin can be produced in large scale and in batch, and the cost can be reduced.
In yet another aspect, embodiments of the present disclosure also provide a device having a resin layer prepared using any one of the benzocyclobutene silicone resins described above.
By way of example, the devices include, but are not limited to, the following: electronic devices (e.g., microelectronic multi-chip modules (MCMs), Micro-Electro-Mechanical systems (MEMS)), integrated circuit devices, semiconductor devices, optoelectronic devices (e.g., solar cell devices, display devices, LED devices), optical devices, and the like.
Embodiments of the present disclosure will be further described below by way of specific examples:
example 1
Example 1 a silane monomer was prepared: benzocyclobutene-4-vinyltrimethoxysilane, and the preparation principle of the benzocyclobutene-4-vinyltrimethoxysilane is shown in the following reaction formula:
the preparation method comprises the following specific steps:
after introducing nitrogen gas into a 250mL eggplant-shaped bottle under vacuum, 4-bromobenzocyclobutene (10mmol), vinyltrimethoxysilane (10.5mmol), palladium acetate (0.05mmol), tris (o-methylphenyl) phosphorus (0.20mmol), triethylamine (12mmol) and heavy dry acetonitrile (80mL) were added to the eggplant-shaped bottle to form a reaction system. Replacing the reaction system once with nitrogen, heating the oil bath to the reflux temperature of 80 ℃, reacting at the reflux temperature for 10 hours, finishing the reaction, and returning to the room temperature. And (4) carrying out suction filtration treatment to remove salt solids precipitated in the reaction system (the salt solids are washed with n-hexane for three times so as to be reused). And (3) carrying out rotary evaporation and concentration on the filtrate, diluting the filtrate by using normal hexane, carrying out suction filtration on the filtrate, carrying out rotary evaporation and concentration on the filtrate to remove a solvent, and then carrying out reduced pressure distillation on an oil pump to obtain a light yellow transparent liquid which is benzocyclobutene-4-vinyltrimethoxysilane according to a test, wherein the reaction yield is 70%.
Example 2
Example 2 a silane monomer was prepared: benzocyclobutene-4-vinylmethyldimethoxysilane, which is prepared according to the following reaction formula:
the preparation method comprises the following specific steps:
after introducing nitrogen gas into a 250mL eggplant-shaped bottle under vacuum, 4-bromobenzocyclobutene (10mmol), vinylmethyldimethoxysilane (10.5mmol), palladium acetate (0.08mmol), tris (o-methylphenyl) phosphorus (0.30mmol), triethylamine (12.5mmol) and heavy dry acetonitrile (80mL) were added to the bottle to form a reaction system. Replacing the reaction system once with nitrogen, heating the oil bath to the reflux temperature of 70 ℃, reacting at the reflux temperature for 12 hours, finishing the reaction, and returning to the room temperature. And (4) carrying out suction filtration treatment to remove salt solids precipitated in the reaction system (the salt solids are washed with n-hexane for three times so as to be reused). And (3) carrying out rotary evaporation and concentration on the filtrate, diluting the filtrate by using n-hexane, carrying out suction filtration on the filtrate, carrying out rotary evaporation and concentration on the filtrate to remove a solvent, and then carrying out reduced pressure distillation on an oil pump to obtain a light colorless transparent liquid which is benzocyclobutene-4-vinylmethyldimethoxysilane through testing, wherein the reaction yield is 75%.
Example 3
Example 3 a silane monomer was prepared: benzocyclobutene-4-vinyldimethylmethoxysilane, and the preparation principle of the benzocyclobutene-4-vinyldimethylmethoxysilane is shown in the following reaction formula:
the preparation method comprises the following specific steps:
after introducing nitrogen gas into a 250mL eggplant-shaped bottle under vacuum, 4-bromobenzocyclobutene (10mmol), vinyldimethylmethoxysilane (10.8mmol), palladium acetate (0.04mmol), tris (o-methylphenyl) phosphorus (0.18mmol), triethylamine (11.5mmol) and heavy dry acetonitrile (80mL) were added to the eggplant-shaped bottle to form a reaction system. Replacing the reaction system once with nitrogen, heating the oil bath to the reflux temperature of 85 ℃, reacting at the reflux temperature, finishing the reaction after 12 hours of reaction, and returning to the room temperature. And performing suction filtration to remove salt solid precipitated in the reaction system. And (3) carrying out rotary evaporation and concentration on the filtrate, diluting the filtrate by using n-hexane, carrying out suction filtration on the filtrate, carrying out rotary evaporation and concentration on the filtrate to remove a solvent, and then carrying out reduced pressure distillation on an oil pump to obtain a light colorless transparent liquid which is benzocyclobutene-4-vinyldimethylmethoxysilane according to a test, wherein the reaction yield is 80%.
Example 4
Example 4 a silane monomer was prepared: benzocyclobutene-4-vinyldimethylethoxysilane, which is prepared according to the principle of the formula:
the preparation method comprises the following specific steps:
after a 250mL eggplant-shaped bottle is vacuumized and nitrogen is introduced, 4-bromobenzocyclobutene (10mmol), vinyl dimethylethoxysilane (11 mmol) which is prepared by reacting vinyl dimethylchlorosilane with absolute ethyl alcohol, palladium acetate (0.04mmol), tri (o-methylphenyl) phosphorus (0.18mmol), triethylamine (12mmol) and heavy evaporated dry acetonitrile (80mL) are added into the eggplant-shaped bottle to form a reaction system. Replacing the reaction system once with nitrogen, heating the oil bath to the reflux temperature of 75 ℃, reacting at the temperature, finishing the reaction after reacting for 12 hours, and returning to the room temperature. And performing suction filtration to remove salt solid precipitated in the reaction system. And (3) carrying out rotary evaporation and concentration on the filtrate, diluting the filtrate by using n-hexane, carrying out suction filtration on the filtrate, carrying out rotary evaporation and concentration on the filtrate to remove a solvent, and then carrying out reduced pressure distillation on an oil pump to obtain a light colorless transparent liquid which is benzocyclobutene-4-vinyl dimethylethoxysilane according to a test, wherein the reaction yield is 78%.
Example 5
Example 5 a benzocyclobutene silicone resin was prepared: linear polybenzocyclobutene-4-vinylmethylsiloxane, the preparation principle of which is described in the following reaction scheme:
the preparation method comprises the following specific steps:
adding 0.1g of aqueous solution (1 wt%) of 1mmol of benzocyclobutene-4-vinyldimethylmethoxysilane, 1.5mmol of benzocyclobutene-4-vinylmethyldimethoxysilane and tetramethylammonium hydroxide pentahydrate into a 25mL single-neck eggplant-shaped bottle, uniformly stirring at room temperature, carrying out oil bath to 50 ℃, carrying out stirring reaction for 1h, after the reaction is finished, heating to 125 ℃ to decompose the catalyst to obtain light yellow flowable viscous liquid, and verifying that the structure of the liquid is polybenzocyclobutene-4-vinylmethylsiloxane resin through nuclear magnetic resonance characterization.
Example 6
Example 6 a benzocyclobutene silicone resin was prepared: hyperbranched polybenzocyclobutene-4-vinylmethylsiloxane, the preparation principle of which is shown in the following reaction formula:
the preparation method comprises the following specific steps:
1mmol of benzocyclobutene-4-vinyldimethylmethoxysilane, 1.5mmol of benzocyclobutene-4-vinylmethyldimethoxysilane, 1.5mmol of benzocyclobutene-4-vinyltrimethoxysilane and 0.15g of an aqueous solution (1 wt%) of tetramethylammonium hydroxide pentahydrate are added into a 25mL single-neck eggplant-shaped bottle, the mixture is uniformly stirred at room temperature, the oil bath is carried out to 80 ℃, the stirring reaction is carried out for 1h, then the room temperature is recovered, the catalyst is removed by water washing after dilution by using n-hexane, the organic phase is dried by anhydrous sodium sulfate, filtered and concentrated by rotary evaporation, and light yellow viscous liquid which is difficult to flow is obtained. The liquid was tested to be a benzocyclobutene silicone resin, and the dielectric constant of the benzocyclobutene silicone resin at 1MHz was as low as 2.26, and excellent electrical insulation was obtained.
The above description is only for facilitating the understanding of the technical solutions of the present disclosure by those skilled in the art, and is not intended to limit the present disclosure. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present disclosure should be included in the protection scope of the present disclosure.
Claims (21)
1. A silane monomer, wherein the silane monomer has the following chemical formula:
wherein R1, R2, R3, R4 and R5 are independently selected from the following groups: H. alkyl, alkoxy, alkenyl, phenyl;
r6, R7, R8 are independently selected from the group consisting of: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene group, or a hydrolysis group, and at least one of R6, R7, R8 is the hydrolysis group;
the hydrolysable group is selected from a substituted or unsubstituted amino group, an alkoxy group, an acyloxy group, or-Cl.
2. The silane monomer of claim 1, wherein the hydrolysable group is selected from the group consisting of a dimethylamino group, a diethylamino group, an alkoxy group from C1 to C4, and an acyloxy group from C1 to C4.
3. The silane monomer of claim 1 or 2, wherein the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group each have a first substituent which is a C1-C4 alkyl group, a C2-C4 alkenyl group, a C2-C4 alkynyl group, an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted with a C1-C4 alkyl group;
the substituted phenyl group has a second substituent selected from the group consisting of C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, or unsubstituted phenyl.
6. A benzocyclobutene silicone resin produced by subjecting the silane monomer according to any one of claims 1 to 5 to a hydrolytic condensation reaction.
7. The benzocyclobutene silicone resin according to claim 6, characterized in that the chemical structural formula of the benzocyclobutene silicone resin is as follows:
wherein n is an integer greater than or equal to 0;
r' is selected from the following groups: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene radical.
8. The benzocyclobutene silicone resin according to claim 7, wherein each of the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group has a first substituent selected from a C1-C4 alkyl group, a C2-C4 alkenyl group, a C2-C4 alkynyl group, an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted by a C1-C4 alkyl group;
the substituted phenyl group has a second substituent selected from the group consisting of C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, or unsubstituted phenyl.
9. The benzocyclobutene silicone resin according to claim 6, characterized in that the chemical structural formula of the benzocyclobutene silicone resin is as follows:
wherein x, y and z are integers greater than or equal to 0;
r' is selected from the following groups: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl.
10. The benzocyclobutene silicone resin according to claim 9, wherein each of the substituted C1-C6 alkyl group and the substituted C2-C6 alkenyl group has a first substituent selected from a C1-C4 alkyl group, a C2-C4 alkenyl group, a C2-C4 alkynyl group, an unsubstituted phenyl group, or a phenyl group in which 1 to 3 hydrogen atoms on the phenyl ring are substituted by a C1-C4 alkyl group;
the substituted phenyl group has a second substituent selected from the group consisting of C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, or unsubstituted phenyl.
11. The method of producing the silane monomer of any one of claims 1 to 5, comprising:
under an inert atmosphere, performing Heck reaction on siloxane containing vinyl and 4-bromobenzocyclobutene in a dry solvent with a first catalyst and an acid-binding agent to obtain the silane monomer;
wherein the chemical structural formula of the siloxane containing vinyl is shown as follows:
r6, R7, R8 are independently selected from the group consisting of: H. unsubstituted or substituted C1-C6 alkyl, unsubstituted or substituted C2-C6 alkenyl, unsubstituted or substituted phenyl, 4-vinyl-benzocyclobutene group, or a hydrolysis group, and at least one of R6, R7, R8 is the hydrolysis group;
the hydrolytic group is selected from dimethylamino, diethylamino, alkoxy of C1-C4, or acyloxy of C1-C4.
12. The method of claim 11, wherein the first catalyst is selected from palladium acetate, palladium chloride, tetrakis (triphenylphosphine) palladium, palladium on carbon catalyst, and diphenylphosphinoferrocene palladium dichloride.
13. The method of claim 11, wherein the acid scavenger is at least one selected from the group consisting of triethylamine, diethylamine, potassium carbonate, sodium carbonate, pyridine, and imidazole.
14. The method of claim 11, wherein the drying solvent is at least one selected from the group consisting of benzene, acetonitrile, tetrahydrofuran, dioxane, N-dimethylformamide, and N, N-dimethylacetamide.
15. The method of claim 11, wherein the Heck reaction is carried out at a temperature of 50 ℃ to 120 ℃ for a time of 4 hours to 48 hours.
16. The method of preparing benzocyclobutene silicone resin according to any one of claims 6 to 10, characterized in that the method of preparing benzocyclobutene silicone resin comprises:
providing at least one silane monomer as set forth in any one of claims 1-5;
and (3) carrying out hydrolytic condensation reaction on the at least one silane monomer in an aqueous solution under the catalysis of a second catalyst to obtain the benzocyclobutene organic silicon resin.
17. The method for preparing benzocyclobutene silicone resin according to claim 16, characterized in that at least one silane monomer containing a single hydrolyzable group is used for the hydrolytic condensation reaction.
18. The method for producing benzocyclobutene silicone resin according to claim 16, characterized in that the second catalyst is an acid catalyst or a base catalyst;
the acid catalyst is at least one of formic acid, acetic acid, hydrochloric acid, phosphoric acid and sulfuric acid;
the alkali catalyst is at least one selected from sodium hydroxide, potassium hydroxide, sodium bicarbonate, potassium bicarbonate, sodium carbonate, potassium carbonate, cesium carbonate, sodium phosphate, ammonia water, diethylamine, triethylamine, pyridine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, imidazole, N-methylimidazole, N-ethylimidazole and benzyltrimethylammonium hydroxide.
19. The method for preparing benzocyclobutene silicone resin according to claim 16, characterized in that the reaction temperature of the hydrolytic condensation reaction is 15 ℃ to 120 ℃.
20. The method of preparing benzocyclobutene silicone resin according to any one of claims 16-19, characterized in that the method of preparing benzocyclobutene silicone resin further comprises:
after the hydrolysis condensation reaction is finished, removing the second catalyst from a reaction product system to obtain an organic phase;
and drying and filtering the organic phase to obtain the benzocyclobutene organic silicon resin.
21. A device having a resin layer prepared using the benzocyclobutene silicone resin according to any one of claims 6 to 10.
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CN116880126A (en) * | 2023-08-08 | 2023-10-13 | 西南科技大学 | Preparation and application of branched benzocyclobutenyl polysiloxane low dielectric loss photosensitive resin |
CN117111405A (en) * | 2023-08-04 | 2023-11-24 | 西南科技大学 | Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning |
CN117111405B (en) * | 2023-08-04 | 2024-09-24 | 西南科技大学 | Preparation of linear polysiloxane low dielectric loss photosensitive resin and application of photoetching patterning |
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