CN114789190A - Fluidized plasma restores soil device - Google Patents

Fluidized plasma restores soil device Download PDF

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Publication number
CN114789190A
CN114789190A CN202210379119.9A CN202210379119A CN114789190A CN 114789190 A CN114789190 A CN 114789190A CN 202210379119 A CN202210379119 A CN 202210379119A CN 114789190 A CN114789190 A CN 114789190A
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CN
China
Prior art keywords
fluidized
fluidized plasma
plasma
soil
soil remediation
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Pending
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CN202210379119.9A
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Chinese (zh)
Inventor
刘振
张硕
闫克平
张诗豪
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Zhejiang University ZJU
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Zhejiang University ZJU
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Priority to CN202210379119.9A priority Critical patent/CN114789190A/en
Publication of CN114789190A publication Critical patent/CN114789190A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B09DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
    • B09CRECLAMATION OF CONTAMINATED SOIL
    • B09C1/00Reclamation of contaminated soil

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  • Life Sciences & Earth Sciences (AREA)
  • Soil Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma Technology (AREA)

Abstract

The invention discloses a fluidized plasma soil remediation device, which comprises a fluidized plasma device, a high-voltage power supply and a bag-type dust remover, wherein the fluidized plasma device comprises a top buffer zone, a fluidized plasma cavity and a bottom feeding bin from top to bottom; a coaxial structure consisting of an inner electrode, a dielectric material and an outer electrode which is tightly attached to the dielectric material and is grounded is arranged in the fluidized plasma cavity; a feed inlet and an air outlet are arranged on the side surface of the bottom feed bin, and the air outlet is connected with a bag-type dust collector; the lower end of the bottom feeding bin is provided with a discharge opening; the lower part of the bottom feeding bin is provided with an air inlet and a circulating discharge hole which are opposite to each other, the air inlet is connected with a fan through a pipeline, and the circulating discharge hole is communicated with the top buffer zone through a conveying pipe. The invention can enhance the remediation effect of the polluted soil on the premise of ensuring the treatment capacity of the device, and is suitable for heavily polluted soil.

Description

Fluidized plasma restores soil device
Technical Field
The invention relates to the field of plasma application, in particular to a fluidized plasma soil remediation device.
Background
In recent years, the problem of soil pollution has received much attention, especially in the soil around chemical plants and in the soil left in the field after the relocation of chemical products, which contain a large amount of chemical substances such as Persistent Organic Pollutants (POPs).
Among them, some persistent organic pollutants, especially organochlorine pesticides (hexachloro-hexa, DDT, hexachlorobenzene, etc.), POPs not only diffuse laterally and deeply in soil, but also have semi-volatility, and also diffuse and transfer spatially, and it is reported that hexachlorobenzene is detected at a concentration of 7-32pg/m3 in the upper air in the arctic region. Therefore, in the areas with concentrated POPs pollution, appropriate measures should be taken to restore the polluted soil.
The traditional soil remediation techniques mainly comprise physical methods, chemical methods and biological methods. The plasma technology is used as an advanced oxidation technology, and active substances (such as OH, O and O3) with strong oxidizability are produced by a discharge process to react with POPs in soil to generate CO2, H2O and other small molecular organic matters.
Chinese patent publication No. CN207043013U discloses a novel soil remediation integrated device, which comprises a heating device and a plasma generator, wherein organic matters in soil are transferred into a gas phase by heating, and a carrier gas passing through a discharge area can be converted into an active gas by the plasma generator, so as to degrade and mineralize organic pollutants in the soil.
Chinese patent publication No. CN209439190U discloses an integrated low-temperature plasma soil remediation device, which is implemented by compacting soil with a compactor, and then performing remediation through a plasma discharge region.
The above patent documents all use plasma technology as main oxidation performance to repair soil, and use a conveyor belt to move the soil in a discharge area, thereby increasing the processing capacity of the device, but the single passage of the soil through the discharge area fails to better utilize active substances generated in the plasma discharge process, and is not suitable for heavily polluted soil and high pollution concentration conditions.
Disclosure of Invention
The invention provides a fluidized plasma soil remediation device, which can enhance the remediation effect of polluted soil on the premise of ensuring the treatment capacity of the device and can be suitable for heavily polluted soil.
A fluidized plasma soil remediation device comprises a fluidized plasma device, a high-voltage power supply and a bag-type dust collector, wherein the fluidized plasma device comprises a top buffer zone, a fluidized plasma cavity and a bottom feeding bin from top to bottom;
a coaxial structure consisting of an inner electrode, a dielectric material and an outer electrode which is tightly attached to the dielectric material and is grounded is arranged in the fluidized plasma cavity;
a feed inlet and an air outlet are arranged on the side surface of the bottom feed bin, and the air outlet is connected with a bag-type dust collector; the lower end of the bottom feeding bin is provided with a discharge opening; the lower part of the bottom feeding bin is provided with an air inlet and a circulating discharge hole which are opposite to each other, the air inlet is connected with a fan through a pipeline, and the circulating discharge hole is communicated with the top buffer area through a conveying pipe.
In the invention, the inside of the fluidized plasma cavity is in a wire cylinder type, thereby ensuring full discharge and being beneficial to the flowing of soil in a discharge space.
Furthermore, a transparent observation window is arranged on the upper end face of the top buffer area, and the inner electrode is fixed with the transparent observation window; a support frame for supporting the top buffer area is fixedly arranged outside the fluidized plasma cavity; the bottom feeding bin is connected with the fluidized plasma cavity through a flange.
Furthermore, the upper end face of the transparent observation window is provided with a high-voltage electrode with an insulating protective sleeve, the lower end of the high-voltage electrode is connected with the inner electrode, and the upper end of the high-voltage electrode is connected with a high-voltage power supply.
Furthermore, the conveying pipe is provided with a regulating valve at a position close to the top buffer area, and the regulating valve can be used for regulating the amount of soil entering the top buffer area.
Furthermore, the high-voltage power supply adopts a high-voltage pulse power supply or an alternating current power supply.
Furthermore, the inner electrode is a metal rod with prickles on the surface; preferably, the barbs on the outer surface of the metal rod are arranged in a clockwise spiral form.
Furthermore, a quality controller is arranged between the air inlet and the circulating discharge hole at the lower part of the bottom feeding bin, and the quality controller is used for controlling the quality of soil entering the conveying pipe; and the quality controller and the fan are both connected with the control cabinet. The quality controller controls the quality of soil entering the conveying pipe by adjusting the rotating speed of the control cabinet
Furthermore, the fluidized plasma device is fixed on a movable support, and the bottom of the movable support is provided with a universal wheel.
In the invention, the fluidized plasma device is used for a series of physical and chemical reactions between soil and active particles, and the bag-type dust collector is used for collecting fine particles carried in gas; the method comprises the following steps of placing polluted soil to be repaired in a bottom feeding bin, controlling the quality of the soil in a conveying pipe by a quality controller, conveying the soil to a buffer area at the top of the device by a fan, enabling the soil to pass through a discharge space from top to bottom through self gravity and a conveying speed, and enabling the soil after flowing once in a fluidized plasma cavity to return to the bottom feeding bin for next circulation.
In a specific application process, the invention is directed to soil, but not limited to soil, and can be other solid particles, such as dust, catalysts, fly ash and the like; the high-voltage power supply can be a pulse power supply, but is not limited to the pulse power supply, and can be other high-voltage power supplies, such as an alternating-current power supply and the like; the discharge mode is dielectric barrier discharge, and plasma can be generated in other modes, such as corona discharge and the like; the structure is a single-medium bobbin type structure, but is not limited to a single medium, and can be a double medium; the fluidized plasma device is connected with the bag-type dust remover, but is not limited to bag-type dust removal, and can also adopt other dust removal modes, such as electrostatic dust removal, leaching tower and the like.
Compared with the prior art, the invention has the following beneficial effects:
1. the soil in the device circularly flows in the discharge space, the contact probability of the moving soil particles and active ions is increased, and the remediation effect of the polluted soil is further enhanced.
2. The invention utilizes the pulse power supply to drive the plasma, and improves the output of active ions, thereby improving the oxidation capacity of the device.
3. The soil flows in the device, so that the problem of low treatment capacity of the soil fixed in the discharge space is solved, the scale of repairing the polluted soil by the plasma is greatly increased, and the device is suitable for repairing the industrialized large-scale polluted soil.
4. When the device finishes one-time circulation, the kinetic energy sources are the fan and the self weight of the soil, and the soil needs lower electric energy under the same kinetic energy.
5. The gas outlet of the invention is connected with a bag-type dust collector to collect fine particles carried in the gas.
Drawings
FIG. 1 is a schematic view of the overall structure of a fluidized plasma soil remediation device according to the present invention;
FIG. 2 is a schematic view of the structure of the fluidized plasma apparatus shown in FIG. 1;
in the figure: 1-fan, 2-control cabinet, 3-bottom feeding bin, 4-conveying pipe, 41-regulating valve, 5-top buffer zone, 6-fluidized plasma cavity, 7-bag dust collector, 8-transparent observation window, 9-movable support, 31-feeding port, 32-discharging port, 33-gas outlet, 34-flange, 35-quality controller, 61-internal electrode, 62-bur, 63-dielectric material, 64-external electrode, 65-insulating protective sleeve, 66-high voltage power supply, 67-support frame, 91-main support, 92-control cabinet support and 93-universal wheel.
Detailed Description
The invention will be described in further detail below with reference to the drawings and examples, which are intended to facilitate the understanding of the invention without limiting it in any way.
As shown in fig. 1 and fig. 2, a fluidized plasma soil remediation device comprises a fluidized plasma device, a high-voltage power supply 66 and a bag-type dust remover 7, wherein the fluidized plasma device comprises a top buffer zone 5, a fluidized plasma chamber 6 and a bottom feeding bin 3 from top to bottom.
In this embodiment, the fluidized plasma chamber 6 is in a bobbin type, which ensures sufficient discharge and facilitates the flow of soil in the discharge space.
The plasma generation mode is a dielectric barrier discharge method, and a coaxial structure consisting of an inner electrode 61, a dielectric material 63 and an outer electrode 64 which is tightly attached to the dielectric material 63 and is grounded is arranged in the fluidized plasma cavity 6. The dielectric material 63 may be glass or ceramic material, and has the following dimensions: the length is 60cm, the inner diameter is 8cm, the thickness is 8mm, and the average power of a single tube is 3-5 kW.
The side surface of the bottom feeding bin 3 is provided with a feeding hole 31 and an air outlet 33, and the air outlet 33 is connected with the bag-type dust remover 7; the lower end of the bottom feeding bin 3 is provided with a discharge opening 32; the lower part of the bottom feeding bin 3 is provided with an air inlet and a circulating discharge hole which are opposite to each other, the air inlet is connected with the fan 1 through a pipeline, and the circulating discharge hole is communicated with the top buffer zone 5 through a conveying pipe 4.
The upper end face of the top buffer area 5 is provided with a transparent observation window 8, and the inner electrode 61 is fixed with the transparent observation window 8. A support frame 67 for supporting the top buffer zone 5 is fixedly arranged outside the fluidized plasma chamber 6; the bottom feed bin 48 is connected to the fluidized plasma chamber 6 by a flange 34.
The upper end face of the transparent observation window 8 is provided with a high-voltage electrode with an insulating protective sleeve 65, the lower end of the high-voltage electrode is connected with the inner electrode 61, and the upper end of the high-voltage electrode is connected with a high-voltage power supply 66. The high voltage power supply 66 employs a high voltage pulse power supply or an alternating current power supply.
The transfer pipe 4 is provided with a regulating valve 41 near the top buffer 5, which regulating valve 41 can be used to regulate the amount of soil entering the top buffer.
The inner electrode 61 is a metal rod with prickles 62 on the surface; the barbs 62 on the outer surface of the metal rod are arranged in a clockwise spiral pattern.
A quality controller 35 is arranged between the air inlet and the circulating discharge hole at the lower part of the bottom feeding bin 3, and the quality controller 35 is used for controlling the quality of soil entering the conveying pipe 23. The quality controller 35 and the fan 1 are both connected with the control cabinet 2.
The fluidized plasma device is fixed on the movable support 9 through a main support 91, the control cabinet 2 is fixed on the movable support 9 through a control cabinet support 92, and the bottom of the movable support 9 is provided with a universal wheel 93.
The working process of the invention is as follows:
in the leading-in bottom feeding storehouse 3 of feed inlet 31 with soil, through 2 control fan 1 of switch board, quality controller 35 control gets into the interior soil quality of conveyer pipe 4, adjust conveyer pipe 4 amount of wind size, 5 soil volume of governing valve 41 control entering top buffer, soil gets into fluidization plasma chamber 6 after 5 mixing in top buffer, the bottom feeding storehouse 3 is got back to soil after accomplishing the primary cycle, treat that soil opens high voltage power supply 66 in the device after continuous stable cycle and carry out discharge treatment.
The inner electrode 61 is provided with barbs 62 and connected to a high voltage power supply 66, and the outer electrode 64 is made of a mesh metal material, is close to the dielectric material 63 and is grounded. The gas in the device can enter the bag-type dust collector 7 through the gas outlet 33 to collect fine particles brought out by gas disturbance. The treated soil may be discharged through discharge opening 32.
The technical solutions and advantages of the present invention have been described in detail with reference to the above embodiments, it should be understood that the above embodiments are only specific examples of the present invention and should not be construed as limiting the present invention, and any modifications, additions and equivalents made within the scope of the principles of the present invention should be included in the scope of the present invention.

Claims (8)

1. The fluidized plasma soil remediation device is characterized by comprising a fluidized plasma device, a high-voltage power supply (66) and a bag-type dust remover (7), wherein the fluidized plasma device comprises a top buffer zone (5), a fluidized plasma cavity (6) and a bottom feeding bin (3) from top to bottom;
a coaxial structure consisting of an inner electrode (61), a medium material (63) and an outer electrode (64) which is tightly attached to the medium material (63) and is grounded is arranged in the fluidized plasma cavity (6);
a feed inlet (31) and an air outlet (33) are formed in the side surface of the bottom feed bin (3), and the air outlet (33) is connected with a bag-type dust collector (7); the lower end of the bottom feeding bin (3) is provided with a discharge opening (32); the lower part of the bottom feeding bin (3) is provided with an air inlet and a circulating discharge hole which are opposite to each other, the air inlet is connected with the fan (1) through a pipeline, and the circulating discharge hole is communicated with the top buffer area (5) through a conveying pipe (4).
2. The fluidized plasma soil remediation device of claim 1 wherein the top buffer zone (5) has a transparent window (8) at its upper end, the inner electrode (61) being secured to the transparent window (8); a support frame (67) for supporting the top buffer area (5) is fixedly arranged outside the fluidized plasma chamber (6); the bottom feeding bin (48) is connected with the fluidized plasma cavity (6) through a flange (34).
3. The fluidized state plasma soil remediation device of claim 2, wherein the upper end face of the transparent observation window (8) is provided with a high voltage electrode with an insulating protective sleeve (65), the lower end of the high voltage electrode is connected with the inner electrode (61), and the upper end of the high voltage electrode is connected with a high voltage power supply (66).
4. Fluidized plasma soil remediation device according to claim 1, wherein said duct (4) is provided with a regulating valve (41) adjacent the top buffer zone (5).
5. The fluidized plasma soil remediation device of claim 1 wherein the high voltage power source (66) is a high voltage pulsed or ac power source.
6. The fluidized plasma soil remediation device of claim 1 wherein said inner electrode (61) is a metal rod with barbs (62) on its surface; the barbs (62) on the outer surface of the metal rod are arranged in a clockwise spiral form.
7. The fluidized plasma soil remediation device as claimed in claim 1, wherein a quality controller (35) is provided between the air inlet and the circular discharge port at the lower part of the bottom feed bin (3), and the quality controller (35) is used for controlling the quality of soil entering the conveying pipe (23); and the quality controller (35) and the fan (1) are both connected with the control cabinet (2).
8. The fluidized plasma soil remediation device of claim 1 wherein said fluidized plasma device is mounted on a movable support (9), said movable support (9) having universal wheels (93) at the bottom thereof.
CN202210379119.9A 2022-04-12 2022-04-12 Fluidized plasma restores soil device Pending CN114789190A (en)

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Application Number Priority Date Filing Date Title
CN202210379119.9A CN114789190A (en) 2022-04-12 2022-04-12 Fluidized plasma restores soil device

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Application Number Priority Date Filing Date Title
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6455014B1 (en) * 1999-05-14 2002-09-24 Mesosystems Technology, Inc. Decontamination of fluids or objects contaminated with chemical or biological agents using a distributed plasma reactor
CN101496987A (en) * 2009-01-20 2009-08-05 浙江工商大学 Wet-type flue gas treating reactor by pulse corona
CN103759275A (en) * 2013-12-27 2014-04-30 浙江大学 Device and method for combusting and treating organic waste gas through plasma enhanced porous medium
CN206227174U (en) * 2016-11-25 2017-06-09 齐齐哈尔市宝宏科技有限公司 A kind of agricultural greenhouse for being easy to fold
CN112355045A (en) * 2020-11-17 2021-02-12 浙江大学 Fluidized bed type DBD plasma organic matter contaminated soil remediation system and process
CN112355046A (en) * 2020-11-17 2021-02-12 浙江大学 Fluidized bed type device for treating organic matter contaminated soil
CN112893435A (en) * 2020-12-29 2021-06-04 浙江大学 Dielectric barrier discharge plasma repairing method and device for POPs contaminated soil

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6455014B1 (en) * 1999-05-14 2002-09-24 Mesosystems Technology, Inc. Decontamination of fluids or objects contaminated with chemical or biological agents using a distributed plasma reactor
CN101496987A (en) * 2009-01-20 2009-08-05 浙江工商大学 Wet-type flue gas treating reactor by pulse corona
CN103759275A (en) * 2013-12-27 2014-04-30 浙江大学 Device and method for combusting and treating organic waste gas through plasma enhanced porous medium
CN206227174U (en) * 2016-11-25 2017-06-09 齐齐哈尔市宝宏科技有限公司 A kind of agricultural greenhouse for being easy to fold
CN112355045A (en) * 2020-11-17 2021-02-12 浙江大学 Fluidized bed type DBD plasma organic matter contaminated soil remediation system and process
CN112355046A (en) * 2020-11-17 2021-02-12 浙江大学 Fluidized bed type device for treating organic matter contaminated soil
CN112893435A (en) * 2020-12-29 2021-06-04 浙江大学 Dielectric barrier discharge plasma repairing method and device for POPs contaminated soil

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
邓云坤: "新型环保气体绝缘与放电基础及应用", 机械工业出版社, pages: 172 *

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Application publication date: 20220726