CN114763271A

CN114763271A - Sewage treatment device and system

Info

Publication number: CN114763271A
Application number: CN202110045018.3A
Authority: CN
Inventors: 李志伟; 魏贤龙
Original assignee: Peking University
Current assignee: Peking University
Priority date: 2021-01-13
Filing date: 2021-01-13
Publication date: 2022-07-19

Abstract

The application discloses sewage treatment device and system, sewage treatment device can include conduit and at least one irradiation source based on miniature electron source, and the irradiation source is used for producing electron beam or X ray and shines the pending liquid in the conduit to the pending liquid purifies. The irradiation source based on the miniature electron source has small size and can be arranged in a smaller space; the energy is lower, and fewer protective measures are needed; the cost is lower by adopting a micro-nano processing technology, so that the method has wider application range. The irradiation sources based on the miniature electron source can be arranged in an array mode to work in parallel, so that the treatment capacity can be improved, the requirement on irradiation uniformity can be lowered, and a better treatment effect is achieved.

Description

Sewage treatment device and system

Technical Field

The application relates to the field of electronic science and technology, in particular to a sewage treatment device and a sewage treatment system.

Background

Sewage treatment (sewage treatment) is a process of purifying sewage to a water quality required for discharge into a certain water body or reuse. Sewage treatment is widely applied to various fields such as buildings, agriculture, traffic, energy, petrifaction, environmental protection, urban landscape, medical treatment, catering and the like. The sewage has various types, different properties, complex components and poor biodegradability, the traditional method is extremely difficult to treat, and especially the industrial wastewater with high concentration and difficult degradation is one of the great problems in the sewage treatment industry.

Advanced oxidation technology (AOP) is a process of performing oxidative degradation on pollutants in sewage that cannot be oxidized by common oxidants by generating hydroxyl radicals under reaction conditions of electricity, sound, high temperature, high pressure, light irradiation, catalysts, and the like. The hydroxyl free radical (OH-) is the strongest oxidant in the solution, and can generate a series of chain reactions with organic pollutants, so that macromolecular persistent organic pollutants in sewage are oxidized and degraded into low-toxicity or non-toxic micromolecular organic matters, or directly degraded into harmless substances. It overcomes the problems of common oxidation method and draws more and more attention.

The sewage treatment by utilizing the ionizing radiation technology belongs to the category of advanced oxidation, has the advantages of high reaction speed, thorough pollutant degradation and the like, does not need to add chemical reagents, and has environmental friendliness. The ionizing radiation has low or no selectivity to sewage, can be applied to various high-difficulty and difficult-to-degrade domestic sewage and industrial wastewater, and can obtain stable effluent quality.

The existing ionizing radiation water treatment technology generally uses electron beams generated by a large-scale electron accelerator to perform radiation water treatment (such as Chinese invention patents CN102320677B, CN109467276A and CN108640210A), and the technology has been identified by the technology and successfully applied industrially. Large electron accelerators are very expensive, the construction threshold is very high, and the application scenarios and ranges are greatly limited.

Disclosure of Invention

In view of this, the application provides a sewage treatment device and system, improves sewage treatment's range of application, reduces sewage treatment's cost, guarantees excellent sewage treatment effect.

In order to solve the technical problem, the following technical scheme is adopted in the application:

the embodiment of the application provides a sewage treatment device, which comprises a water pipeline and at least one irradiation source based on a miniature electron source, wherein the irradiation source is used for generating electron beams or X rays to irradiate liquid to be treated in the water pipeline so as to purify the liquid to be treated.

Optionally, the micro electron source comprises an on-chip thermal emission electron source, an on-chip field emission electron source, and/or an on-chip tunneling electron source.

Optionally, the irradiation energy of the irradiation source is less than or equal to 200 keV.

Optionally, the irradiation source is disposed on an inner wall of the water pipe, or the irradiation source is embedded in an opening penetrating through the water pipe.

Optionally, the water pipe comprises at least one tee pipe fitting and/or at least one box body, the inner wall of the tee pipe fitting is provided with at least one irradiation source, and the inner wall of the box body is provided with at least one irradiation source.

Optionally, the sewage treatment device further comprises a protective shell on the periphery of the water conveying pipeline so as to prevent the electron beams or the X-rays generated by the irradiation source from leaking to the periphery of the sewage treatment device.

Optionally, the protective casing is a metal casing or a wall, the metal casing is made of one of lead, steel, aluminum, tungsten, nickel, chromium, titanium, copper, silver and the like, and the wall is a cement wall or a concrete wall.

Optionally, the irradiation sources are multiple, and the multiple irradiation sources are arranged on the water conveying pipeline in parallel or in series.

The embodiment of the application provides a sewage treatment system, which comprises a controller and a sewage treatment device; the controller is used for controlling the electron beam or X-ray output of the irradiation source.

Optionally, the sewage treatment system is a sewage treatment room or a sewage treatment vehicle.

Optionally, the controller is specifically configured to: and controlling at least one of irradiation duration, irradiation direction and irradiation intensity of the irradiation source.

Compared with the prior art, the method has the following beneficial effects:

based on the technical scheme, the application provides a sewage treatment device and system, and the sewage treatment device can include water pipeline and at least one irradiation source based on miniature electron source, and the irradiation source is used for producing electron beam or X ray and shines the pending liquid in the water pipeline to the pending liquid purifies. The irradiation source based on the miniature electron source has small size and can be arranged in a smaller space; the energy is lower, and fewer protective measures are needed; the cost is lower by adopting a micro-nano processing technology, so that the method has wider application range. The irradiation sources based on the miniature electron source can be arranged in an array mode to work in parallel, so that the treatment capacity can be improved, the requirement on irradiation uniformity can be lowered, and a better treatment effect is achieved.

Drawings

FIGS. 1 to 6 are schematic structural views of a sewage treatment apparatus provided in an embodiment of the present application;

fig. 7-9 are schematic structural diagrams of a sewage treatment system provided in an embodiment of the present application.

Detailed Description

In order to make the purpose and technical solution of the embodiments of the present invention clearer, the following will clearly and completely describe the technical solution of the present invention with reference to the embodiments of the present invention. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the invention without any inventive step, are within the scope of protection of the invention.

The sewage treatment is a process for purifying sewage according to the requirement of the water quality of the sewage discharged into a certain water body or reused, the treatment of the sewage by utilizing the ionizing radiation technology has the advantages of high reaction speed, thorough pollutant degradation and the like, and the sewage treatment does not need to add chemical reagents and is environment-friendly. The existing ionizing radiation water treatment technology usually uses electron beams generated by a large-scale electron accelerator for radiation water treatment, however, the large-scale accelerator is very expensive, the construction threshold is very high, the application scene and range are greatly limited, the high-energy electron beams have great destructiveness to organisms, and the human body can face extremely high carcinogenic risk when exposed to weak ray leakage, so the existing sewage treatment method needs thick and heavy matched protection measures.

The inventor has found that for some industrial waste water, electron beams with energy of only 100keV are enough to produce the ideal purification effect, which shows that although the penetration performance is better and the treatment capability is stronger, high energy is not a necessary condition for treating waste water by electron beams, and a small irradiation source with low energy can achieve good sewage treatment effect.

In order to ensure an excellent sewage treatment effect, the embodiment of the application provides a sewage treatment device and a system, wherein the sewage treatment device can comprise a water conveying pipeline and at least one irradiation source based on a miniature electron source, and the irradiation source is used for generating electron beams or X rays to irradiate liquid to be treated in the water conveying pipeline so as to purify the liquid to be treated. The irradiation source based on the miniature electron source has small size and can be arranged in a smaller space; the energy is lower, and fewer protective measures are needed; the cost is lower by adopting a micro-nano processing technology, so that the method has wider application range. The irradiation sources based on the miniature electron source can be arranged in an array mode to work in parallel, so that the treatment capacity can be improved, the requirement on irradiation uniformity can be lowered, and a better treatment effect is achieved.

In order to make the aforementioned objects, features and advantages of the present application more comprehensible, embodiments accompanying the present application are described in detail below with reference to the accompanying drawings.

The embodiment of the application provides a sewage treatment device and a sewage treatment system, the sewage treatment device is used for purifying liquid to be treated, and as shown in fig. 1, fig. 2, fig. 3, fig. 4, fig. 5 and fig. 6, the sewage treatment device provided by the embodiment of the application is structurally schematic, specifically, the sewage treatment device may include a water pipeline and an irradiation source based on a miniature electron source, and the irradiation source may generate electron beams/X rays to irradiate the liquid to be treated in the water pipeline so as to purify the liquid to be treated.

In the embodiment of the application, the sewage treatment device is a device for realizing sewage treatment, is used for purifying sewage, and can comprise a water pipeline, the liquid to be treated circulates through the water pipeline, and is purified by irradiation of the irradiation source when flowing through the irradiation source, and the flowing speed of the liquid to be treated can be determined according to the purification requirement of the liquid to be treated and the purification capacity of the sewage treatment device.

The shape of the cross section of the water pipe may be designed according to actual conditions, that is, the shape of the liquid to be treated in the water pipe is designed according to actual conditions, as shown in fig. 1 and 2, the cross sections of the water pipe 101 and the water pipe 301 may be polygonal, such as rectangular, or as shown in fig. 3, the cross section of the water pipe 201 may also be circular. The size of the cross section of the water pipe may be uniform or non-uniform, as shown in fig. 4, the water pipe 401 may be provided with a tee pipe 402, the tee pipe 402 has a limited length and has a pipe orifice 403, which forms a cavity with an opening above the water pipe 401, thereby forming a structure with a large local cross section size, as shown in fig. 5, the water pipe 501 may be provided with a box 502 with a large volume, thereby forming a structure with a large local cross section size, as shown in fig. 6, the water pipe may have a water inlet pipe 6011 and a water outlet pipe 6012, and form a box 602 with a large local cross section size, thereby forming a structure with a large local cross section size.

The miniature electron source (on-chip) can be an on-chip miniature electron source, which is a small electron source formed on a substrate, can realize large-batch low-cost processing through a semiconductor process, can control the size of beam current through the size of an array, and has better application prospect. The miniature electron source can comprise at least one of an on-chip thermal emission electron source, an on-chip field emission electron source, an on-chip tunneling electron source, and the like, wherein the miniature electron source can be operated in a low vacuum environment, and the advent of miniature vacuum pumps based on MEMS technology provides a technical basis for on-chip micro vacuum equipment and systems, so that the cost of the equipment and systems based on the miniature electron source is further reduced, and the size is greatly reduced.

In the embodiment of the application, an irradiation source based on a miniature electron source can be arranged in the sewage treatment device. The irradiation source can generate an electron beam, and specifically, the irradiation source can include a miniature electron source, a vacuum chamber and a thin film window, the miniature electron source can emit the electron beam, and the electron beam is accelerated in the vacuum chamber and then emitted into the air through the thin film window. The irradiation source may also generate X-rays, and specifically, the irradiation source may include a micro electron source and an anode target, the micro electron source may emit an electron beam, and the electron beam may bombard the anode target surface after being accelerated to generate X-rays. The X-ray has high energy and penetrating performance, and can degrade pollutants in sewage. Therefore, the liquid to be treated in the water conveying pipeline can be irradiated by the X-ray generated by the radiation source so as to purify the liquid to be treated.

The irradiation source may be disposed on an inner wall of the water pipe and face the inside of the water pipe, so that the generated electron beams or X-rays irradiate the liquid to be treated in the water pipe, specifically, the water pipe may be closed except for a water inlet and a water outlet, the irradiation source may be fixed on the inner wall of the water pipe, and the irradiation source is provided with a waterproof housing. The irradiation source can also be embedded into an opening penetrating through the water conveying pipeline and faces the inside of the water conveying pipeline, the opening is a hole except the water inlet and the water outlet, and the irradiation source can emit electron beams or X rays into the water conveying pipeline through the opening so that the generated electron beams or X rays irradiate the liquid to be treated of the water conveying pipeline.

In order to make the irradiation source have higher universality, the irradiation energy of the irradiation source can be set to be less than or equal to 200keV, so that the irradiation source can be used for different sewage treatment scenes. The irradiation source can be one or a plurality of irradiation sources, the plurality of irradiation sources can be distributed on the water conveying pipeline in parallel or in series so as to provide uniform irradiation for the liquid to be treated, the plurality of irradiation sources can have the same structure or different structures, for example, the irradiation source can be based on at least one of an on-chip thermal emission electron source, an on-chip field emission electron source and an on-chip tunneling electron source. It should be noted that, when the two irradiation sources are disposed in the same cross section or different cross sections of the water pipe to irradiate the liquid to be processed at the same position from different directions, the two irradiation sources may be considered to be distributed in parallel on the water pipe, and when the two irradiation sources are disposed in different cross sections of the water pipe to irradiate the liquid to be processed at different positions, the two irradiation sources may be considered to be distributed in series on the water pipe, and the parallel and serial distribution of the plurality of irradiation sources is the same.

The existing irradiation sewage treatment device is a large-scale electron beam linear accelerator, and can only carry out one-time or few-time irradiation treatment on sewage due to the reasons of large volume, high manufacturing cost and the like of a single device, so that the requirement on the uniformity of irradiation dose is higher, the requirement on the speed distribution and the water film thickness distribution of an irradiated water film on the same section is also uniform, the penetration of an electron beam is required to be high, and the technical difficulty and the cost are very high. The irradiation source based on the miniature electron source is adopted, and due to the small size and low cost, a plurality of irradiation sources can be placed on the same water conveying pipeline in parallel (irradiation from multiple directions) and in series (multiple irradiation at different positions), so that the requirement on the irradiation uniformity is reduced, and the requirement on the energy of the irradiation sources is also reduced.

The water pipe can be made of metal so as to shield ionizing radiation, a protective shell can be arranged on the periphery of the water pipe and can be a metal shell or a wall body and other physical isolation components so as to prevent electron beams/X rays generated by the irradiation source from leaking to the periphery of the sewage treatment device, the metal shell can be made of one of lead, steel, aluminum, tungsten, nickel, chromium, titanium, copper, silver and other materials, the wall body is a cement wall body or a concrete wall body, and the thickness of the protective shell can be determined according to the energy of the irradiation source so as to ensure that the safe protection level is achieved. For example, when the energy of the irradiation source does not exceed 200keV, a lead plate within 1cm can achieve good protection effect.

Referring to fig. 1, the cross section of the water pipe 101 is rectangular, and the material thereof is metal. The upper wall of the water pipe 101 is provided with an opening 102, an irradiation source is arranged above the opening 102, the irradiation source may Be based on a micro electron source, specifically, the irradiation source may include a housing 1031, a micro electron source 1032, and an electron beam/X-ray exit window 1033, the electron beam/X-ray exit window 1033 may Be a hard material that allows electron beam/X-ray to pass through, such as a silicon nitride film, a Be/BeO film, a titanium film, and a carbon film, the electron beam/X-ray exit window 1033 may Be embedded into the water pipe 101 through the opening 102, the shape and size of the opening 102 may Be matched with the shape and size of the electron beam/X-ray exit window 1033, when the irradiation source is fixed on the water pipe 101, the opening 102 is sealed by the irradiation source, and the liquid to Be treated in the water pipe 101 may not leak out of the water pipe 101 through the opening 102. When the sewage treatment apparatus is in operation, the electron beam (e)^-) X-ray emission window capable of emitting electron beam/X-ray1033 directly enters the liquid to be treated, and the liquid to be treated is decontaminated through oxidation-reduction reaction. The side wall of the water conveying pipeline 101 is a plane, so that the installation of the small irradiation source 102 is facilitated. In addition, the height of the water pipe 101 may be smaller than the width, which may ensure a certain penetration of the electron beam/X-ray to some extent, thereby enabling more sufficient irradiation of the liquid to be treated.

Referring to fig. 2, the cross section of the water pipe 301 is rectangular, and the material thereof is metal. An opening 302 is disposed on each of four side walls of the water pipe 101, an irradiation source 303 is disposed outside the opening 302, the irradiation source 303 may Be based on a micro electron source, specifically, the irradiation source 303 may include a housing, a micro electron source, an electron beam/X-ray exit window, similar to the housing 1031, the micro electron source 1032, and the electron beam/X-ray exit window 1033, the electron beam/X-ray exit window in fig. 2 may Be a hard material that allows electron beam/X-ray to pass through, such as a silicon nitride film, a Be/BeO film, a titanium film, and a carbon film, the electron beam/X-ray exit window may Be embedded into the water pipe 301 through the opening 302, the shape and size of the opening 302 are matched with the shape and size of the electron beam/X-ray exit window, when the irradiation source 303 is fixed on the water pipe 301, the opening 302 is sealed by the irradiation source 303, the liquid to be treated in the water pipe 301 does not leak out of the water pipe 301 through the opening 302. Electron beam (e) during operation of the sewage treatment apparatus^-) The X-ray can directly enter the liquid to be treated from the electron beam/X-ray exit window, and the liquid to be treated is subjected to decontamination treatment through oxidation-reduction reaction. The plurality of irradiation sources can irradiate the liquid to be treated at the same time, so that the uniformity of irradiation and decontamination can be effectively improved.

Referring to fig. 3, the cross section of the water pipe 201 is circular, and the material thereof is metal. The upper wall of the water pipe 201 is provided with an opening 202, an irradiation source 203 is arranged above the opening 202, the irradiation source 203 can be based on a micro electron source, specifically, the irradiation source can comprise a housing, a micro electron source, an electron beam/X-ray exit window, similar to the housing 1031, the micro electron source 1032 and the electron beam/X-ray exit window 1033, the electron beam/X-ray exit window in fig. 3 can beIn order to allow the electron beam/X-ray to penetrate through the hard material, such as silicon nitride film, Be/BeO film, titanium film, carbon film, the electron beam/X-ray exit window can Be embedded into the water pipe 201 through the opening 202, the shape and size of the opening 202 are matched with those of the electron beam/X-ray exit window, when the irradiation source 203 is fixed on the water pipe 201, the opening 202 is sealed by the irradiation source 203, and the liquid to Be treated in the water pipe 201 cannot leak out of the water pipe 201 through the opening 202. When the sewage treatment apparatus is in operation, the electron beam (e)^-) The X-ray can directly enter the liquid to be treated from the electron beam/X-ray exit window, and the liquid to be treated is subjected to decontamination treatment through oxidation-reduction reaction. The circular water conveying pipeline can be directly transformed on the basis of the circular pipeline in the prior art, and the transformation cost is reduced.

Referring to fig. 4, the water pipe 401 is provided with a tee pipe 402, the tee pipe 402 has an upward opening 403, and the distance between the opening 403 and the horizontal pipe of the water pipe 401 may be 1-10cm, and specifically may be 5 cm. Above the nozzle 403, an irradiation source 404 may be arranged, which irradiation source 404 may be based on a micro electron source, in particular, the irradiation source 404 may comprise a housing, a micro electron source, an electron beam/X-ray exit window, similar to the housing 1031, the micro electron source 1032, the electron beam/X-ray exit window 1033, the electron beam/X-ray exit window in figure 4 may be a hard material allowing the electron beam/X-ray to pass through, such as silicon nitride film, Be/BeO film, titanium film, carbon film, electron beam/X-ray exit window may Be embedded into the water conduit 401 through the nozzle 403, the shape and size of the orifice 403 fits the shape and size of the electron beam/X-ray exit window, when the irradiation source 404 is fixed on the water pipeline 401, the pipe opening 403 is sealed by the irradiation source 404, and the liquid to be treated in the water pipeline 401 cannot leak out of the water pipeline 401 through the pipe opening 403. During operation of the sewage treatment plant, due to the larger cross-section at the tee 402, there will normally be air, an electron beam (e), between the liquid to be treated and the pipe orifice 403^-) X-rays can enter the liquid to be treated from the electron beam/X-ray exit window and the air of the thin layer, and the liquid to be treated is subjected to oxidation-reduction reactionAnd (4) decontamination treatment. Because the electron beam/X-ray exit window and the water body of the liquid to be treated are isolated by air, the water body of the liquid to be treated can be prevented from being electrified due to the high pressure of the electron beam/X-ray window, and the feasibility and the usability in practical use are higher.

Referring to fig. 5, the water pipe 501 is provided with a box 502 with a larger volume, the two sides of the box 502 are respectively provided with a water inlet and a water outlet, the box 502 can Be used for circulating and storing the liquid to Be processed, the upper wall of the box is provided with an opening 503, an irradiation source 504 can Be arranged above the opening 503, the irradiation source 504 can Be based on a miniature electron source, specifically, the irradiation source 504 can comprise a housing, a miniature electron source and an electron beam/X-ray exit window, similar to the housing 1031, the miniature electron source 1032 and the electron beam/X-ray exit window 1033, the electron beam/X-ray exit window in fig. 5 can Be a hard material allowing the electron beam/X-ray to penetrate, such as a silicon nitride film, a Be/BeO film, a titanium film and a carbon film, the electron beam/X-ray exit window can Be embedded into the water pipe 501 through the opening 503, the shape and the size of the opening 503 are matched with the shape and the size of the electron beam/X-ray exit window, when the irradiation source 504 is fixed on the water pipe 501, the opening 503 is sealed by the irradiation source 504, and the liquid to be treated in the water pipe 501 does not leak out of the water pipe 501 through the opening 503. In operation of the sewage treatment apparatus, air, electron beam (e), is generally present between the liquid to be treated and the opening 503 due to the large cross-section at the tank 502^-) The X-ray can enter the liquid to be treated from the electron beam/X-ray exit window and the air of the thin layer, and the liquid to be treated is subjected to decontamination treatment through oxidation-reduction reaction. The box body can pass through a larger treatment area of the liquid to be treated, is suitable for an irradiation source with slightly higher energy, and can improve the treatment efficiency.

Referring to fig. 6, a large-sized tank 602 is disposed in the water pipe 601, a water inlet pipe 6011 and a water outlet pipe 6012 are disposed on two sides of the tank 602, the tank 602 may be used for both circulation and storage of a liquid to be treated, the water inlet pipe 6011 is higher than the water outlet pipe 6012, and sewage flows into the tank 602 from the water inlet pipe 6011 and then is subjected to a projectile motion to form a water curtain. Junction of water inlet pipe 6011 and tank 602An arcuate seam 6013 is provided to adjust the exit angle of the projectile motion. An opening 603 is provided in the upper wall of the housing 602, an irradiation source 604 may be provided above the opening 603, the irradiation source 604 may be based on a miniature electron source, in particular, the irradiation source 604 may comprise a housing, a miniature electron source, an electron beam/X-ray exit window, similar to the housing 1031, the miniature electron source 1032, the electron beam/X-ray exit window 1033, the electron beam/X-ray exit window in figure 6 may be a hard material allowing the electron beam/X-ray to pass through, such as silicon nitride film, Be/BeO film, titanium film, carbon film, electron beam/X-ray exit window may Be embedded in the water duct 601 through the opening 603, the shape and size of the opening 603 fits the shape and size of the electron beam/X-ray exit window, when the irradiation source 604 is fixed on the water pipeline 601, the opening 603 is sealed by the irradiation source 604, and the liquid to be treated in the water pipeline 601 cannot leak out of the water pipeline 601 through the opening 603. In operation of the sewage treatment apparatus, due to the larger cross-section at the tank 602, there is usually air, an electron beam (e), between the liquid to be treated and the opening 603^-) The X-ray can enter a water curtain formed by the liquid to be treated from the electron beam/X-ray exit window and a thin layer of air, and the liquid to be treated is subjected to decontamination treatment through oxidation-reduction reaction. The device has the advantages that the water curtain formed by the liquid to be treated is relatively thin, and the treatment efficiency can be improved.

The embodiment of the application provides a sewage treatment device, which can comprise a water pipeline and at least one irradiation source based on a miniature electron source, wherein the irradiation source is used for generating electron beams/X rays to irradiate liquid to be treated in the water pipeline so as to purify the liquid to be treated. The irradiation intensity of the irradiation source based on the micro electron source can be well controlled, so that the safety is higher, and the irradiation source based on the micro electron source does not need huge mechanical equipment, so that the irradiation source can be arranged in a smaller space, has a higher application range and lower cost, and can ensure an excellent sewage treatment effect.

Based on the above sewage treatment apparatuses, an embodiment of the present application further provides a sewage treatment system, and referring to fig. 7, for a schematic diagram of a sewage treatment system provided in an embodiment of the present application, the sewage treatment system may include a controller 705 and at least one sewage treatment apparatus, where 3 sewage treatment apparatuses are taken as an example for description, and the sewage treatment apparatus may include a water pipe 701 and an irradiation source 702 as described in the previous embodiments, and may further include a protective housing 703 disposed at the periphery of the water pipe.

The controller may be connected to the irradiation source 702 through a cable 704, and may control an electron beam/X-ray output of the irradiation source, and specifically, may control at least one of an irradiation direction, an irradiation intensity, irradiation energy, and an irradiation duration of the irradiation source, thereby controlling an intensity of the electron beam/X-ray irradiating the liquid to be treated, and controlling a sewage purification capability of the sewage treatment apparatus. The irradiation of the irradiation source to the liquid to be treated can be continuous irradiation or intermittent irradiation, the duration and the intermittent period can be determined according to the sewage treatment requirement and the irradiation energy, namely, the irradiation source can work continuously or intermittently. Compared with continuous irradiation, the intermittent irradiation method has slightly higher requirement on the intensity, but the accumulated working time of the irradiation source is greatly reduced, so that on one hand, the actual service life of the irradiation source can be prolonged, and simultaneously, the power consumption is reduced to a certain extent, and on the other hand, the longer irradiation interval also allows personnel to approach the equipment in the non-working time, thereby being beneficial to safety protection.

The controller can control the cooperative work of each sewage treatment device, and the treatment capacity is allocated according to the treatment requirement, so that a better sewage treatment effect and lower overall power consumption are achieved. The sewage treatment device is uniformly controlled by the plurality of sewage treatment devices and the controller, so that the sewage treatment capacity of the whole system can be proportionally improved. The whole system has controllable construction scale and controllable cost, and is particularly suitable for places with small treatment capacity and portable and mobile application scenes, such as hospitals, restaurants, hotels and the like.

The sewage treatment system may further include a sewage pretreatment system, and the sewage pretreatment system may transfer the liquid to be treated into a water pipe of the sewage treatment apparatus so as to purify the liquid to be treated by the sewage treatment apparatus. The sewage pretreatment system can be a module such as a water pump.

Referring to fig. 8, a schematic diagram of another sewage treatment system provided in the embodiments of the present application, the sewage treatment system may be a sewage treatment room, the sewage treatment system may include a controller 805 and at least one sewage treatment device, here illustrated as 1 sewage treatment device, the sewage treatment device may include a water pipe 801 and an irradiation source 802, and may further include a protective housing 803 disposed at the periphery of the water pipe, as described in the previous embodiments. The water pipe 801 may be arranged in a curve, and the protective casing 803 may be a protective wall that encloses the water pipe 801 and the radiation source 802 indoors.

The controller may be connected to the irradiation source 802 via a cable 804, and may control output of electron beams/X-rays of the irradiation source, specifically, at least one of irradiation direction, irradiation intensity, irradiation energy, and irradiation duration of the irradiation source, so as to control intensity of the electron beams/X-rays irradiating the liquid to be treated, and control sewage purification capability of the sewage treatment apparatus. The irradiation of the irradiation source to the liquid to be treated can be continuous irradiation or intermittent irradiation, the duration and the intermittent period can be determined according to the sewage treatment requirement and the irradiation energy, namely, the irradiation source can work continuously or intermittently. Compared with continuous irradiation, the intermittent irradiation method has slightly higher requirement on the intensity, but the accumulated working time of the irradiation source is greatly reduced, so that on one hand, the actual service life of the irradiation source can be prolonged, and meanwhile, the power consumption is reduced to a certain extent, and on the other hand, the longer irradiation interval also allows personnel to approach the equipment in the non-working time, thereby being beneficial to safety protection.

The controller can control the cooperative work of each sewage treatment device, and the treatment capacity is allocated according to the treatment requirement, so that a better sewage treatment effect and lower overall power consumption are obtained. The sewage treatment device is uniformly controlled by the plurality of sewage treatment devices and the controller, so that the sewage treatment capacity of the whole system can be proportionally improved. The closed irradiation chamber has better protection effect, can properly improve the energy and the intensity of an irradiation source, can also make full use of the indoor space, is provided with more irradiation devices, greatly improves the treatment capacity of the system, and is suitable for places such as factories with larger sewage treatment requirements.

Referring to fig. 9, a schematic diagram of a sewage treatment system according to an embodiment of the present disclosure is provided, where the sewage treatment system may be a sewage treatment vehicle 903, and the sewage treatment system may include a controller 905 and at least one sewage treatment device, where 1 sewage treatment device is taken as an example, and the sewage treatment device may include a water pipe 901 and an irradiation source 902, and may further include a protective housing 803 disposed on the periphery of the water pipe, as described in the foregoing embodiments. The water pipe 801 may be arranged in a curve and includes a main body 9011, a water inlet 9012 and a water outlet 9013, the sewage treatment system may further include a vehicle head 9031, a vehicle body 9032, a vehicle door 9033 and wheels 9034, wherein the vehicle body 9032 may have a metal protection shell. The system can lead the liquid to be treated into the water inlet 9012 through a peripheral water pump and other devices, treat the liquid to be treated through the sewage treatment device 902, and discharge the liquid from the water outlet 9013.

The controller may be connected to the irradiation source 902 through a cable 904, and may control an output of electron beams/X-rays of the irradiation source, specifically, at least one of an irradiation direction, an irradiation intensity, an irradiation energy, and an irradiation duration of the irradiation source, so as to control an intensity of the electron beams/X-rays irradiating the liquid to be treated, and control a sewage purification capability of the sewage treatment apparatus. The irradiation of the irradiation source to the liquid to be treated can be continuous irradiation or intermittent irradiation, the duration and the intermittent period can be determined according to the sewage treatment requirement and the irradiation energy, namely, the irradiation source can work continuously or intermittently. Compared with continuous irradiation, the intermittent irradiation method has slightly higher requirement on the intensity, but the accumulated working time of the irradiation source is greatly reduced, so that on one hand, the actual service life of the irradiation source can be prolonged, and simultaneously, the power consumption is reduced to a certain extent, and on the other hand, the longer irradiation interval also allows personnel to approach the equipment in the non-working time, thereby being beneficial to safety protection.

The controller can control the cooperative work of each sewage treatment device, and the treatment capacity is allocated according to the treatment requirement, so that a better sewage treatment effect and lower overall power consumption are achieved. The sewage treatment device is uniformly controlled by the plurality of sewage treatment devices and the controller, so that the sewage treatment capacity of the whole system can be proportionally improved. The carrier vehicle is used as a carrier, so that the carrier vehicle can be quickly arranged in an emergency and temporary sewage treatment site, and can be quickly put into operation, thereby greatly reducing the construction cost of a sewage treatment plant and improving the sewage treatment effect of an emergency sewage disposal site.

The foregoing is merely a preferred embodiment of the present application and, although the present application has been described with reference to the preferred embodiments, it is not intended to limit the present application. Those skilled in the art can now make numerous possible variations and modifications to the disclosed embodiments, or modify equivalent embodiments, using the methods and techniques disclosed above, without departing from the scope of the claimed embodiments. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present application are still within the protection scope of the technical solution of the present application without departing from the content of the technical solution of the present application.

Claims

1. The sewage treatment device is characterized by comprising a water pipeline and at least one irradiation source based on a miniature electron source, wherein the irradiation source is used for generating electron beams or X rays to irradiate the liquid to be treated in the water pipeline so as to purify the liquid to be treated.

2. The apparatus of claim 1, wherein the miniature electron source comprises an on-chip thermionic emission electron source, an on-chip field emission electron source, and/or an on-chip tunneling electron source.

3. The apparatus according to claim 2, wherein the irradiation energy of the irradiation source is less than or equal to 200 keV.

4. The device of claim 1, wherein the radiation source is disposed on an inner wall of the water conduit or is embedded in an opening through the water conduit.

5. The device according to claim 1, characterized in that the water duct comprises at least one tee and/or at least one box, the inner wall of the tee being provided with at least one irradiation source and the inner wall of the box being provided with at least one irradiation source.

6. The device according to any one of claims 1 to 5, further comprising a protective shell at the periphery of the water conveying pipeline so as to prevent the electron beams or X-rays generated by the irradiation source from leaking to the periphery of the sewage treatment device.

7. The device of claim 6, wherein the protective shell is a metal shell or a wall, the metal shell is made of one of lead, steel, aluminum, tungsten, nickel, chromium, titanium, copper and silver, and the wall is a cement wall or a concrete wall.

8. The device according to any one of claims 1 to 5, wherein the irradiation source is a plurality of irradiation sources, and the plurality of irradiation sources are arranged on the water conveying pipeline in parallel or in series.

9. A sewage treatment system comprising a controller and the sewage treatment apparatus of any one of claims 1 to 8; the controller is used for controlling the electron beam or X-ray output of the irradiation source.

10. The system of claim 9, wherein the wastewater treatment system is a wastewater treatment room or a wastewater treatment vehicle.

11. The system of claim 9 or 10, wherein the controller is specifically configured to: and controlling at least one of irradiation duration, irradiation direction, irradiation energy and irradiation intensity of the irradiation source.