CN114762958A - Liquid circulation system and grinding equipment - Google Patents

Liquid circulation system and grinding equipment Download PDF

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Publication number
CN114762958A
CN114762958A CN202110042004.6A CN202110042004A CN114762958A CN 114762958 A CN114762958 A CN 114762958A CN 202110042004 A CN202110042004 A CN 202110042004A CN 114762958 A CN114762958 A CN 114762958A
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CN
China
Prior art keywords
liquid
outlet end
liquid outlet
fluid
circulation system
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Pending
Application number
CN202110042004.6A
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Chinese (zh)
Inventor
周嬅
权林
张宇磊
季文明
胡文才
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Zing Semiconductor Corp
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Zing Semiconductor Corp
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Priority to CN202110042004.6A priority Critical patent/CN114762958A/en
Priority to TW110111273A priority patent/TW202227225A/en
Publication of CN114762958A publication Critical patent/CN114762958A/en
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

The invention provides a liquid circulation system and a grinding apparatus. Among the liquid circulation system, the feed liquor pipeline is including the feed liquor end and first play liquid end and the second play liquid end of connecting the feed liquor groove, and the working area is reachd from first play liquid end to the liquid that the feed liquor end flowed in, first return pipeline connect the second play liquid end of feed liquor pipeline with between the feed liquor groove, wherein, be provided with flow direction controller on the feed liquor pipeline to make the feed liquor end switch on with first play liquid end and with the second play liquid end switches over between switching, through flow direction controller, the liquid that the feed liquor end flowed in changes and goes out liquid end flow direction feed liquor groove from the second after the work of first play liquid end is ended. The liquid circulating system still keeps the liquid to circularly flow when the working area does not work, so that the phenomena of precipitation or crystallization separation and the like caused by the fact that the liquid is static in the pipeline can be avoided, and the influence on the process stability and the quality of a machined part is reduced. The grinding equipment comprises the liquid circulation system.

Description

Liquid circulation system and grinding equipment
Technical Field
The invention relates to the field of semiconductor process equipment, in particular to a liquid circulation system and grinding equipment.
Background
A Chemical Mechanical Polishing (CMP) process polishes a workpiece (e.g., a semiconductor substrate such as a silicon wafer) placed on a polishing pad by adding a polishing liquid to the polishing pad. Fig. 1 is a schematic view of a conventional chemical mechanical polishing apparatus. The hollow arrows in fig. 1 indicate the flow direction of the polishing liquid when the chemical mechanical polishing apparatus performs the polishing operation. As shown in fig. 1, the chemical mechanical polishing apparatus has a liquid supply tank 10 for supplying a stock solution of polishing liquid (slurry), and when polishing is performed, after the temperature of the stock solution is set to a target temperature value required for polishing by a heater 20 in the liquid supply tank 10, the stock solution of polishing liquid reaches an upper plate 40 of a double-side polishing machine (DSP) through a circulation pump 30 and a liquid supply pipe 120, and then falls to a lower plate 50 through a plurality of liquid outlets in the upper plate 40, and contacts a polishing pad and a workpiece provided on the lower plate 50. The polishing slurry flowing out of the lower plate 50 can flow back to the liquid supply pipe 120 through the recovery tank 60, the circulation pump 30, and the return pipe 130' and be recycled for a predetermined number of times.
When the chemical mechanical polishing apparatus is in a non-polishing state (idle), the liquid supply and recovery process is stopped, and still polishing liquid remains in the liquid supply pipe 120 and the return pipe 130'. It was found that, since the heater 20 stops operating and the slurry stops flowing in the non-polishing state, the temperature of the slurry remaining in the pipe rapidly decreases, causing precipitation of solid matter. For example, the polishing liquid usually contains silicon dioxide (SiO) as abrasive particles 2) SiO in the polishing slurry with decreasing temperature2The solubility of the SiO is reduced, the supersaturation phenomenon is generated, and part of SiO2The solute is precipitated in the form of crystals and adheres to the inner wall of the pipe.
SiO attached to inner wall of pipeline2Subsequent grinding of the crystal pairThe process has adverse effects. On the one hand, the flow of the grinding fluid is blocked, so that the grinding fluid is unstable, and on the other hand, the SiO adhered to the inner wall of the pipeline2The crystals may fall onto the lower plate 50 with the flow of the abrasive liquid, and the SiO having a high hardness when contacting the workpiece2The crystal is very easy to scratch the surface of a workpiece.
Since the liquid flow stops in the non-working state, the liquid in the pipeline is still and is easy to precipitate and separate out, thereby affecting the process stability and the quality of the processed piece, and the problems are also easy to occur in other semiconductor processes (such as photoresist coating, surface cleaning and the like).
Disclosure of Invention
The invention provides a liquid circulation system, which avoids the phenomenon that liquid (such as grinding liquid) is static in a pipeline to precipitate and separate out and the like, thereby reducing the influence on the process stability and the quality of a workpiece. A grinding device is also provided.
The liquid circulation system provided by the invention comprises a liquid supply tank, a liquid supply pipeline and a first return pipeline; the liquid supply pipeline comprises a liquid inlet end, a first liquid outlet end and a second liquid outlet end, wherein the liquid inlet end is connected with the liquid supply groove; the first backflow pipeline is connected between the second liquid outlet end of the liquid supply pipeline and the liquid supply tank; the liquid supply pipeline is provided with a flow direction controller so that the liquid inlet end is communicated with the first liquid outlet end or the second liquid outlet end, and liquid flowing into the liquid inlet end turns to flow from the second liquid outlet end to the liquid supply tank after liquid outlet work of the first liquid outlet end is finished through the flow direction controller.
Optionally, the liquid circulation system further includes a temperature control module, and the temperature control module is configured to control a temperature of the liquid flowing from the liquid supply tank into the liquid supply pipe and flowing out from the first liquid outlet end and the second liquid outlet end of the liquid supply pipe.
Optionally, the liquid circulation system includes more than two temperature probes, and at least one of the temperature probes is disposed on the liquid supply pipeline and the first return pipeline in front of the flow direction controller; and the temperature control module adjusts the temperature of the liquid in real time according to the temperature value measured by the temperature measuring probe.
Optionally, the temperature control module includes a heater disposed at the liquid outlet end of the liquid supply tank and a heating controller connected to the heater.
Optionally, the liquid circulation system further includes a second return pipe, an inlet of the second return pipe receives the liquid discharged from the working area, and an outlet of the second return pipe is communicated with the liquid supply pipe before the flow direction controller.
Optionally, a valve is arranged at an outlet of the second return pipeline; during the liquid outlet period of the first liquid outlet end, the valve is in an open state, the flow direction controller conducts the first liquid outlet end and turns off the second liquid outlet end, and the liquid is guided into the liquid supply pipeline from the liquid supply tank and then enters the liquid supply pipeline through the first liquid outlet, the working area and the second return pipeline to form working state circulation; when the liquid outlet work of the first liquid outlet end is finished, the valve is closed to cut off the working state circulation, the flow direction controller cuts off the first liquid outlet end to conduct the second liquid outlet end, and the liquid flows into the liquid supply pipeline from the liquid supply tank and enters the liquid supply tank through the second liquid outlet end and the first return pipeline to form non-working state circulation.
Optionally, a water flow sensor is disposed between the inlet of the second return pipe and the valve, and the water flow sensor is configured to detect a liquid flow from the inlet to the outlet of the second return pipe; and when the detected liquid flow in the set time is less than the minimum flow required by the working state circulation, the valve is closed, and the non-working state circulation is started.
Optionally, circulation pumps are disposed on the liquid supply pipeline, the first return pipeline and the second return pipeline before the flow direction controller.
Optionally, the liquid is a grinding liquid, the working area is provided with a grinding table, and the grinding liquid is provided to the grinding table from the first liquid outlet end of the liquid supply pipeline.
The invention also provides grinding equipment which comprises the liquid circulation system, wherein the liquid is grinding liquid, and the working area is provided with a grinding table.
The liquid circulating system comprises a liquid supply tank, a liquid supply pipeline and a first return pipeline; wherein, the liquid supply pipe comprises a liquid inlet end connected with the liquid supply tank, a first liquid outlet end and a second liquid outlet end, the liquid flowing into the liquid inlet end reaches a working area from the first liquid outlet end, the first return pipe is connected between the second liquid outlet end of the liquid supply pipe and the liquid supply tank, a flow direction controller is arranged on the liquid supply pipe to enable the liquid inlet end to be communicated with the first liquid outlet end or communicated with the second liquid outlet end, the liquid flowing into the liquid inlet end of the liquid supply pipe turns to flow from the second liquid outlet end to the liquid supply tank after the liquid outlet work of the first liquid outlet end is finished through the flow direction controller, namely when the liquid outlet work of the first liquid outlet end is finished, the liquid circulation system can realize the circulation flow of the liquid, and can avoid the phenomena of precipitation and separation of the liquid (such as grinding liquid) caused by static state in the pipe, is beneficial to reducing the influence of liquid precipitation and the like on the process stability and the quality of a processed part.
Further, the liquid circulation system may further include a temperature control module, where the temperature control module is configured to control a temperature of the liquid flowing from the liquid supply tank into the liquid supply pipeline and flowing out from the first liquid outlet end and the second liquid outlet end of the liquid supply pipeline, so that when the liquid outlet at the first liquid outlet end of the liquid supply pipeline is finished, the liquid in the liquid circulation system may flow from the liquid supply tank into the liquid inlet end of the liquid supply pipeline while maintaining a certain temperature, and flow back to the liquid supply tank from the second liquid outlet end.
The grinding equipment comprises the liquid circulation system, the liquid is grinding liquid, the grinding table is arranged in the working area, so that when the grinding table stops grinding, the grinding liquid can flow into the liquid inlet end of the liquid supply pipeline from the liquid supply groove and flow back to the liquid supply groove from the second liquid outlet end of the liquid supply pipeline by using the liquid circulation system, the circulating flow of the grinding liquid is realized, the phenomena of precipitation and separation of the grinding liquid due to the fact that the grinding liquid is static in the pipeline can be avoided, for example, the quality problems that the grinding liquid is separated out of crystals to scratch a workpiece and the like can be reduced, and the process stability can be improved.
Drawings
Fig. 1 is a schematic view of a conventional chemical mechanical polishing apparatus.
Fig. 2 is a schematic view of a fluid circulation system according to an embodiment of the present invention during the supply of fluid to a work area.
FIG. 3 is a schematic diagram of the fluid circulation system after stopping the supply of fluid to the work area according to one embodiment of the present invention.
Description of reference numerals: 10-a liquid supply tank; 20-a heater; 30-a circulating pump; 40-upper dish; 50-lower disc; 60-a recovery tank; 70-a first return conduit; 80-flow direction controller; 91-a heating controller; 92-a temperature measuring probe; 100-water flow sensor; 110-a valve; 120-a liquid supply conduit; 121-a first liquid outlet end; 122-second liquid outlet end; 130-a second return conduit; 130' -return line.
Detailed Description
The liquid circulation system and the grinding device according to the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is provided for the purpose of facilitating and clearly illustrating embodiments of the present invention.
In order to avoid the phenomena of precipitation and the like caused by the standing of liquid in the pipeline and reduce the influence on the process stability and the quality of a workpiece, the embodiment provides a liquid circulation system. The liquid circulating system comprises a liquid supply tank, a liquid supply pipeline and a first return pipeline; wherein, the feed liquor pipeline is including connecting the feed liquor end and the first play liquid end and the second play liquid end of feed liquor groove, the liquid that the feed liquor end flowed in is followed first play liquid end reachs the workspace, first return pipeline is connected the second play liquid end of feed liquor pipeline with between the feed liquor groove, be provided with flow direction controller on the feed liquor pipeline, so that the feed liquor end with first play liquid end switch on or with the second goes out the liquid end and switches on, through flow direction controller, the liquid that the feed liquor end flowed in is in turn to follow after the play liquid work of first play liquid end the second goes out liquid end flow direction the feed liquor groove.
In this embodiment, the liquid circulation system may be applied to a grinding process, the liquid may be a grinding liquid, the working area may be provided with a grinding table, and the grinding liquid may be provided to the grinding table from the first liquid outlet end of the liquid supply pipeline. In other embodiments, the liquid circulation system can also be used for other processes such as photoresist coating or surface cleaning; for example, the liquid may be other liquids that are easily precipitated, such as photoresist or surface cleaning liquid, and the work area may be used for other processes, such as photoresist coating or surface cleaning.
The embodiment also provides a grinding device, the grinding device comprises the liquid circulation system, the liquid can be grinding liquid, and the working area is provided with a grinding table. The liquid circulation system and the polishing apparatus of the present embodiment will be described below by taking the polishing apparatus as an example.
FIG. 2 is a schematic diagram of a fluid circulation system during fluid supply to a work area in accordance with one embodiment of the present invention. FIG. 3 is a schematic diagram of the fluid circulation system after stopping the supply of fluid to the work area according to one embodiment of the present invention. In fig. 2 and 3, the hollow arrows indicate the flowing direction of the liquid, and the main structure of the liquid circulation system is shown in the dashed line box.
As shown in fig. 2 and fig. 3, a liquid (for example, grinding fluid) is stored in the liquid supply tank 10, the liquid supply pipeline 120 includes a liquid inlet end connected to the liquid supply tank 10, and a first liquid outlet end 121 and a second liquid outlet end 122, and the liquid flowing into the liquid inlet end reaches the working area from the first liquid outlet end 121; the first return conduit 70 is connected between the second outlet end 122 of the liquid supply conduit 120 and the liquid supply tank 10. The liquid supply pipe 120 is provided with a flow direction controller 80, the flow direction controller 80 may be a water flow direction controller, and is configured to enable the liquid inlet end to be communicated with the first liquid outlet end 121 (as shown in fig. 2), or communicated with the second liquid outlet end 122 (as shown in fig. 3), and through the flow direction controller 80, the liquid flowing in from the liquid inlet end turns to flow from the second liquid outlet end 122 to the liquid supply tank 10 after the liquid outlet operation of the first liquid outlet end 121 is finished.
In this embodiment, the liquid supply tank 10 is connected to a liquid supply pipe 120, the liquid circulation system only supplies liquid to a working area, and the second liquid outlet 122 of the liquid supply pipe 120 is correspondingly connected to a first return pipe 70. In another embodiment, the liquid supply tank is connected to more than two liquid supply pipelines, and the first liquid outlet end of each liquid supply pipeline is correspondingly connected to a working area, the liquid circulation system can supply liquid to multiple working areas, correspondingly, the second liquid outlet end of each liquid supply pipeline is correspondingly connected to a first return pipeline, and the liquid outlet of each first return pipeline is connected to the liquid supply tank.
The grinding device can be a double-sided polishing machine (DSP), and a grinding table is arranged in a working area of the grinding device. As shown in fig. 2, the grinding table may include an upper plate 40 and a lower plate 50 disposed opposite to each other. During the liquid outlet of the first liquid outlet end 121, the liquid (i.e., the grinding liquid) in the liquid supply tank 10 flows into the liquid supply pipe 120 from the liquid inlet of the liquid supply pipe 120 and flows out from the first liquid outlet end 121 of the liquid supply pipe into the liquid inlet of the upper tray 40 to supply the liquid to the grinding table.
The upper disc 40 is provided with a plurality of liquid outlet channels, the liquid output from the first liquid outlet end 121 of the liquid supply pipeline 120 can flow out to the grinding pad of the lower disc 50 through the plurality of liquid outlet channels, and the liquid can be uniformly distributed on the grinding pad through reasonably arranging the plurality of liquid outlet channels, which is beneficial to improving the grinding uniformity of the machined piece.
The liquid generated by the polishing of the polishing table may be collected in the lower plate 50 and may be discharged from the liquid discharge port of the lower plate 50. In order to recycle the liquid discharged from the working area (i.e. the liquid discharged from the lower tray 50), as shown in fig. 2, the liquid circulation system may further include a second return pipe 130, an inlet of the second return pipe 130 receives the liquid discharged from the working area, and an outlet of the second return pipe 130 is communicated with the liquid supply pipe 120 before the flow direction controller 80. Here, "before" refers to upstream of the liquid flow path. In this embodiment, "before" in the description of other positions is also the same meaning.
In this embodiment, a valve 110 may be disposed at an outlet of the second backflow pipe 130. Referring to fig. 2, during the liquid outlet period of the first liquid outlet end 121, the valve 110 may be in an open state, the flow direction controller 80 turns on the first liquid outlet end 121 and turns off the second liquid outlet end 122, and the liquid is guided into the liquid supply pipe 120 from the liquid supply tank 10 and then enters the liquid supply pipe 10 through the first liquid outlet 121, the working area (for example, the upper plate 40 and the lower plate 50), and the second return pipe 130, forming an active cycle.
As shown in fig. 3, when the liquid outlet operation of the first liquid outlet end 121 is finished, the valve 110 may be closed to cut off the operating state cycle, the flow direction controller 80 turns off the first liquid outlet end 121 to turn on the second liquid outlet end 122, and the liquid continues to flow into the liquid supply tank 120 from the liquid supply tank 10, and may enter the liquid supply tank 10 again through the second liquid outlet end 122 and the first return pipe 70 to form a non-operating state cycle.
A water flow sensor 100 may be disposed between the inlet of the second return pipe 130 and the valve 110 to detect the liquid flow rate from the inlet to the outlet of the second return pipe 130; wherein, when the detected liquid flow in the set time is less than the minimum flow required by the working state circulation, the valve 110 is closed, and the non-working state circulation of the liquid circulation system is started.
In another embodiment, the non-operational circulation of the fluid circulation system may be initiated by the water flow sensor 100. Specifically, when the liquid flow detected by the water flow sensor 100 is smaller than the minimum flow required by the operation state cycle, the flow direction controller 80 may be triggered to turn off the first liquid outlet end 121 and turn on the second liquid outlet end 122, the liquid continuously flows into the liquid supply tank 10 from the liquid supply tank 10 and then enters the liquid supply tank 10 through the second liquid outlet end 122 and the first return pipeline 70, and at this time, the valve 110 is in a closed state.
A circulation pump 30 may be provided in each of the liquid supply line 120, the first return line 70 and the second return line 130 before the flow direction controller 80. The circulation pump 30 on the liquid supply pipe 120 may provide power so that the liquid supply pipe 120 may direct the liquid out of the liquid supply tank 10. The circulating pump 30 on the first return pipe 70 can provide power for circulating the liquid during the liquid discharging from the first liquid discharging end 121, so that the liquid discharged from the second liquid discharging end 122 of the liquid supplying pipe 120 flows to the liquid supplying tank 10. The circulation pump 30 on the second return pipe 130 can provide power for the liquid flowing out from the working area after the liquid outlet operation of the first liquid outlet end 121 is finished, so that the liquid flowing out from the working area can flow from the working area to the liquid supply pipe 120 before the flow direction controller 80 through the second return pipe 130.
In order to improve the quality of the liquid flowing out of the working area and avoid impurities in the recycled liquid from scratching the workpiece and affecting the grinding quality, the liquid circulation system can further comprise a recycling tank 60. The liquid outlet of the lower tray 50 is connected to the liquid inlet of the recycling tank 60, the liquid outlet of the recycling tank 60 is connected to the inlet of the second return pipeline 130, and the liquid flowing out from the working area can be purified in the recycling tank 60 before entering the second return pipeline 130.
Specifically, a filtering device may be provided in the recovery tank 60 for adsorbing and/or filtering the grinding waste liquid in the recovery tank 60. In order to further improve the quality of the liquid input into the liquid supply pipe 120 by the second return pipe 130, a plurality of filters may be arranged on the second return pipe 130, and the filtering accuracy of the plurality of filters may be sequentially improved in the flowing direction of the liquid. In another embodiment, a multi-stage filter may be provided in the liquid supply conduit 120 to improve the quality of the liquid supplied to the upper tray 40.
In this embodiment, the liquid circulation system may further include a temperature control module, and the temperature control module may be configured to control a temperature of the liquid flowing from the liquid supply tank 10 into the liquid supply pipe 120 and flowing from the first liquid outlet end 121 and the second liquid outlet end 122 of the liquid supply pipe 120.
By using the temperature control module, during the liquid outlet period of the first liquid outlet end 121, the temperature of the liquid flowing from the liquid supply tank 10 into the liquid inlet end of the liquid supply pipeline 120 and being output to the working area through the first liquid outlet end 121 of the liquid supply pipeline can be controlled, so as to meet the process requirements; when the liquid outlet operation of the first liquid outlet end 121 is finished, the liquid in the liquid circulation system can flow from the liquid supply tank 10 into the liquid inlet end of the liquid supply pipeline 120 and flow back to the liquid supply tank from the second liquid outlet end 122 while maintaining a certain temperature, and since the temperature of the liquid can be maintained at a certain temperature value, the phenomena of precipitation and the like of the liquid (such as grinding liquid) in the pipeline can be further reduced, the influence of the precipitation and the like of the liquid on the quality of a workpiece can be reduced, and the process stability can be further improved.
As shown in fig. 2 and 3, the temperature control module may include a heater 20 and a heating controller 91 connected to the heater 20. The heater 20 may heat the liquid by means of hydrothermal isolation heating. In one embodiment, the heater 20 may be disposed at the liquid outlet end of the liquid supply tank 10. In other embodiments, the heater 20 may be disposed at other positions of the liquid supply tank 10, as long as the purpose of heating the liquid can be achieved.
The fluid circulation system may also include more than two temperature probes 92. Referring to fig. 2 and 3, at least one of the temperature probes 92 may be disposed on both the liquid supply pipe 120 and the first return pipe 70 before the flow direction controller 80; the temperature control module adjusts the temperature of the liquid in real time according to the temperature value measured by the temperature measuring probe 92.
In this embodiment, at least one temperature measuring probe 92 may also be disposed in the liquid supply tank 10. The temperature measuring probes 92 are arranged on the liquid supply tank 10, the liquid supply pipeline 120 and the first return pipeline 70 in the liquid circulation system, so that the temperature of liquid in the liquid supply tank 10, the liquid supply pipeline 120 and the first return pipeline 70 can be monitored, and when the temperature detected by any one of the temperature measuring probes 92 is lower than a set temperature value, the heating controller 91 can control the heater 20 to heat the liquid in the liquid supply tank 10, so as to realize the regulation and control of the temperature of the liquid in the liquid circulation system.
The liquid circulation system of the present embodiment includes a liquid supply tank 10, a liquid supply pipe 120, and a first return pipe 70; wherein, the liquid supply pipe 120 includes a liquid inlet end connected to the liquid supply tank 10, a first liquid outlet end 121 and a second liquid outlet end 122, liquid flowing in from the liquid inlet end reaches a working area from the first liquid outlet end 121, the first backflow pipe 70 is connected between the second liquid outlet end 122 of the liquid supply pipe 120 and the liquid supply tank 10, a flow direction controller 80 is disposed on the liquid supply pipe 120 so as to enable the liquid inlet end to be communicated with the first liquid outlet end 121 or with the second liquid outlet end 122, through the flow direction controller 80, liquid flowing in from the liquid inlet end of the liquid supply pipe 120 turns to flow from the second liquid outlet end 122 to the liquid supply tank 10 after the liquid outlet operation of the first liquid outlet end 121 is finished, that is, when the liquid outlet operation of the first liquid outlet end 121 is finished, the liquid circulation system can realize the circulation flow of liquid, and can avoid the phenomenon of precipitation and the like caused by the liquid (for example, grinding liquid) standing still in the pipe, is beneficial to reducing the influence of liquid precipitation and the like on the process stability and the quality of a processed part.
The grinding device of this embodiment includes foretell liquid circulation system, liquid is the lapping liquid, the workspace is provided with the grinding table, when the grinding table stops grinding work, utilizes liquid circulation system, the lapping liquid can flow in from feed liquor groove 10 feed liquor end of liquid supply pipeline 120, and follow feed liquor pipeline's second play liquid end 122 flows back to feed liquor groove 10, has realized the circulation flow of lapping liquid, can avoid the lapping liquid static in the pipeline and take place phenomenons such as precipitate, for example can reduce the lapping liquid and appear crystal and quality problems such as fish tail machined part, be favorable to improving process stability.
The above description is only for the purpose of describing the preferred embodiments of the present invention and is not intended to limit the scope of the claims of the present invention, and any person skilled in the art can make possible the variations and modifications of the technical solutions of the present invention using the methods and technical contents disclosed above without departing from the spirit and scope of the present invention, and therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention belong to the protection scope of the technical solutions of the present invention.

Claims (10)

1. A fluid circulation system, comprising:
a liquid supply tank;
the liquid supply pipeline comprises a liquid inlet end, a first liquid outlet end and a second liquid outlet end, wherein the liquid inlet end is connected with the liquid supply groove, and liquid flowing into the liquid inlet end reaches a working area from the first liquid outlet end;
the first return pipeline is connected between the second liquid outlet end of the liquid supply pipeline and the liquid supply tank;
the liquid supply pipeline is provided with a flow direction controller, so that the liquid inlet end is communicated with the first liquid outlet end or the second liquid outlet end, and liquid flowing into the liquid inlet end turns to flow from the second liquid outlet end to the liquid supply groove after the liquid outlet work of the first liquid outlet end is finished through the flow direction controller.
2. The fluid circulation system of claim 1, further comprising a temperature control module for controlling the temperature of the fluid flowing from the fluid supply tank into the fluid supply conduit and out of the first and second fluid outlet ends of the fluid supply conduit.
3. The fluid circulation system of claim 2, wherein the fluid circulation system comprises more than two temperature probes, at least one of the temperature probes being disposed on the liquid supply pipe and the first return pipe before the flow direction controller; and the temperature control module adjusts the temperature of the liquid in real time according to the temperature value measured by the temperature measuring probe.
4. The liquid circulation system of claim 2, wherein the temperature control module comprises a heater disposed at the liquid outlet end of the liquid supply tank and a heating controller connected to the heater.
5. The fluid circulation system of claim 1, further comprising a second return conduit having an inlet for receiving fluid discharged from the working area and an outlet in communication with the supply conduit prior to the flow controller.
6. The fluid circulation system of claim 5, wherein a valve is provided at an outlet of the second return conduit; during the liquid outlet period of the first liquid outlet end, the valve is in an open state, the flow direction controller conducts the first liquid outlet end and turns off the second liquid outlet end, and the liquid is guided into the liquid supply pipeline from the liquid supply tank and then enters the liquid supply pipeline through the first liquid outlet, the working area and the second return pipeline to form working state circulation; when the liquid outlet work of the first liquid outlet end is finished, the valve is closed to cut off the working state circulation, the flow direction controller cuts off the first liquid outlet end to conduct the second liquid outlet end, and the liquid flows into the liquid supply pipeline from the liquid supply tank and enters the liquid supply tank through the second liquid outlet end and the first return pipeline to form non-working state circulation.
7. The fluid circulation system of claim 6, wherein a water flow sensor is disposed between the inlet of the second return conduit and the valve, the water flow sensor being configured to detect the flow of fluid from the inlet to the outlet of the second return conduit; and when the detected liquid flow in the set time is less than the minimum flow required by the working state circulation, the valve is closed, and the non-working state circulation is started.
8. The fluid circulation system of claim 5, wherein a circulation pump is disposed in each of the supply conduit, the first return conduit and the second return conduit prior to the flow direction controller.
9. The fluid circulation system according to any one of claims 1 to 8, wherein the fluid is an abrasive fluid, the working area is provided with a polishing table, and the abrasive fluid is supplied to the polishing table from the first liquid outlet end of the fluid supply conduit.
10. A grinding apparatus comprising a fluid circulation system according to any one of claims 1 to 9, wherein the fluid is a grinding fluid, and wherein the working area is provided with a grinding table.
CN202110042004.6A 2021-01-13 2021-01-13 Liquid circulation system and grinding equipment Pending CN114762958A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202110042004.6A CN114762958A (en) 2021-01-13 2021-01-13 Liquid circulation system and grinding equipment
TW110111273A TW202227225A (en) 2021-01-13 2021-03-29 Liquid recycle system and polishing apparatus

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