CN114750004B - High-gloss ceramic and preparation method thereof - Google Patents
High-gloss ceramic and preparation method thereof Download PDFInfo
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- CN114750004B CN114750004B CN202210668704.0A CN202210668704A CN114750004B CN 114750004 B CN114750004 B CN 114750004B CN 202210668704 A CN202210668704 A CN 202210668704A CN 114750004 B CN114750004 B CN 114750004B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
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Abstract
The invention discloses a high-gloss ceramic and a preparation method thereof, and belongs to the technical field of ceramic manufacturing. The processing method of the high-gloss ceramic tile comprises the following steps: (1) pre-polishing and grinding: (2) high-concentration low-agglomeration highlight liquid highlight treatment; and (3) dripping high-concentration low-agglomeration high gloss liquid into the ceramic tile and coating the ceramic tile on the surface treated in the step (1) for continuous polishing and grinding. The high-concentration low-agglomeration highlight liquid comprises a component A, a component B and a component C, and the preparation method of the high-concentration low-agglomeration highlight liquid comprises the following steps: respectively preparing and mixing the component A and the component B, and standing at room temperature for more than 3 days; then mixing the component A and the component B, and then adding the component C serving as a stabilizer; and continuously stirring uniformly to obtain high-concentration low-agglomeration high-gloss liquid. The processing technology of the high-gloss ceramic can reduce the polishing and grinding time, achieves the effects of energy conservation and environmental protection, and has better high-gloss effect and lower cost.
Description
Technical Field
The invention relates to the technical field of ceramic manufacturing, in particular to a high-gloss ceramic and a preparation method thereof.
Background
The ultra-clean technology is that a special high-precision polishing machine is adopted to drop nano polishing solution on the surface of a ceramic tile, and the nano polishing solution better permeates into pores of the polished tile through repeated pressure application, polishing and polishing of a grinding head, so that the pores and microcracks of the polished tile are blocked, and a special and continuous nano film is formed, thereby enabling the polished tile to have a bright surface; and the surface can effectively prevent the invasion of pollutants and has better antifouling performance. The ultra-clean technology is the most effective method for protecting and treating the polished tiles at present, and a high-precision ultra-clean polishing machine and nano polishing solution are required to be used.
At present, 10-18nm silica sol is adopted as a main grinding material in the existing nano polishing solution, but in order to save energy and reduce consumption, various ceramic factories improve the production efficiency in unit production time, namely, reduce polishing time of ceramic tile units, and the concentration of the existing nano polishing solution is not enough to meet the surface treatment effects of luminosity, permeability and antifouling. And the existing nano polishing solution has an unsatisfactory highlight effect. For this reason, the present inventors tried to add a large particle size silica sol to the existing small particle size nano-polishing solution in a corresponding ratio for the purpose of increasing the polishing rate and rapidly filling the surface and inner fine pores. However, the preparation cost of the silica sol with large particle size is far higher than that of the silica sol with small particle size. And the concentration of the small-particle silica sol is increased to cause agglomeration, which also influences the highlight effect. Therefore, new requirements are provided for the nano polishing solution, and the effects of energy conservation and environmental protection as well as high gloss, permeability and antifouling are achieved.
Disclosure of Invention
The existing surface treatment process needs to reduce polishing and grinding time of a tile unit to achieve the effects of energy conservation and consumption reduction, but the concentration of the existing nano polishing solution is not enough to meet the surface treatment effects of luminosity, permeability and antifouling, so that new requirements are provided for the nano polishing solution. According to the invention, by improving the formula and preparation process of the existing nano polishing solution, the prepared high-concentration low-agglomeration high-gloss solution replaces the original nano polishing solution, and is applied to the processing process of ceramic tiles, so that the polishing time in the ceramic surface processing process can be reduced, the energy-saving and environment-friendly effects are achieved, and the obtained high-gloss ceramic has a better high-gloss effect and a lower cost.
One of the purposes of the invention is realized by adopting the following technical scheme: a preparation method of high-gloss ceramic comprises the following steps:
(1) pre-polishing and grinding:
the surface of the ceramic tile is pressed and polished by polishing equipment, so that the surface of the ceramic tile is smooth and free of debris;
(2) high-concentration low-agglomeration high-gloss liquid highlight treatment;
dripping high-concentration low-agglomeration highlight liquid into the high-concentration low-agglomeration highlight liquid, coating the high-concentration low-agglomeration highlight liquid on the surface of the ceramic tile treated in the step (1), and continuously polishing and grinding; the addition amount of the high-concentration low-agglomeration highlight liquid is 45-55g/m 2 The sanding coating time is 2.75s/m 2 The revolution speed of the grinding disc of the polishing equipment is 80-90r/min, the rotation speed of the grinding material arranged on the grinding disc is 700-800r/min, so that the grinding material penetrates into coarse pores on the surface of the ceramic tile to finish the highlight processing treatment;
the high-concentration low-agglomeration highlight liquid is prepared by the following method:
(2.1) preparation steps of the component A:
preparing silica sol, resin emulsion and grinding aid, mixing the materials, standing the mixture at room temperature for more than 3 days, and fully grafting and combining the mixture to obtain high-concentration nano liquid with increased content of particle size;
(2.2) preparation steps of the component B:
preparing the silica sol and the grinding aid, mixing the silica sol and the grinding aid, standing the mixture at room temperature for more than 3 days, and fully grafting and combining the mixture to obtain low-concentration nano liquid with increased internal particle size;
(2.3) a step of mixing:
mixing the component A and the component B, and then adding the component C serving as a stabilizer; and continuously stirring uniformly to obtain high-concentration low-agglomeration high-gloss liquid.
Further, the high-concentration low-agglomeration high-gloss liquid comprises a component A, a component B and a component C, wherein the mass ratio of the component A to the component B is (0.5-2): 1, the using amount of the component C accounts for 0.3 to 0.5 percent of the total weight of the component A and the component B; wherein the component A comprises 25 to 40 mass percent of silica sol with the particle size of 10 to 18nm, 0.1 to 1 mass percent of resin emulsion and 0.05 to 0.3 mass percent of grinding aid; the component B comprises 10-18% by mass of silica sol with the particle size of 10-18nm and 0.05-0.3% by mass of grinding aid; the component C is one or a mixture of more than two of borax, boric acid and oxalic acid.
Further, in the step (2.3), the stirring speed is 800-1200r/min, and the stirring time is 30-45 min.
Further, the component A comprises 28-35% by mass of silica sol with the particle size of 10-15nm, 0.3-0.8% by mass of resin emulsion and 0.1-0.25% by mass of grinding aid; the component B comprises 14-16% by mass of silica sol with the particle size of 10-15nm and 0.1-0.25% by mass of grinding aid.
Further, the mass ratio of the component A to the component B is 1: 1, the C component accounts for 0.4 percent of the total weight of the A component and the B component.
Further, the grinding aid in the component A and the component B is selected from one or a mixture of more than two of borax, boric acid and oxalic acid.
Further, the component B also comprises 0.8-1.5 mass percent of resin emulsion.
Further, the resin emulsion is selected from one or a mixture of more than two of polyacrylic resin emulsion, polyurethane resin emulsion, rosin resin emulsion and epoxy resin emulsion.
Further, the silica sol in the component a and the component B was purchased from nano silica sol provided by beijing german koshijiki technologies ltd.
The second purpose of the invention is realized by adopting the following technical scheme: the high-gloss ceramic is prepared by the preparation method of the high-gloss ceramic.
Compared with the prior art, the invention has the beneficial effects that:
the high-concentration low-agglomeration highlight liquid is applied to the surface treatment processing technology of the ceramic tile, can reduce polishing and grinding time, achieves the effects of energy conservation and environmental protection, and has better surface treatment effect and lower cost. The high-concentration low-agglomeration highlight liquid prepared by the preparation method can obtain excellent effects on the ceramic tile subjected to surface treatment on the ceramic tile in glossiness and antifouling and waterproof capabilities, reduces the cost investment, and is energy-saving and environment-friendly.
The specific mechanism analysis of the high-concentration low-agglomeration high-gloss liquid is as follows: according to the invention, hydroxyl-OH active groups distributed on the surface of silica sol are subjected to a grafting reaction with resin emulsion and grinding aid surface active groups-OH or-COOH to form a plurality of-O-Si-O-structure macromolecular compounds, so that the particle size of the nano liquid is increased. According to the invention, the high-concentration low-agglomeration highlight liquid is obtained by adjusting the content of the auxiliary agent and the grafting reaction time, so that the effects of energy conservation and environmental protection can be achieved, namely, the polishing and grinding time is reduced, the surface treatment effect is better, and the investment cost is lower. In addition, the concentration of the grinding aid in the steps (1) to (2) cannot be too high, and the addition of more grinding aid can cause agglomeration and deterioration of the nano liquid, so the step (3) needs to be added, and after the component A and the component B are respectively and fully grafted, a proper amount of borax, boric acid, oxalic acid and other aids are added to improve the stability of a mixed system.
Detailed Description
The present invention is further described below with reference to specific embodiments, and it should be noted that, without conflict, any combination between the embodiments or technical features described below may form a new embodiment.
In the present invention, all parts and percentages are by weight, unless otherwise specified, and the equipment and materials used are commercially available or commonly used in the art. The methods in the following examples are conventional in the art unless otherwise specified.
The invention also provides high-concentration low-agglomeration high-gloss liquid which comprises a component A, a component B and a component C, wherein the mass ratio of the component A to the component B is (0.5-2): 1, the dosage of the component C accounts for 0.3 to 0.5 percent of the total weight of the component A and the component B; wherein the component A comprises 25-40% by mass of silica sol with the particle size of 10-18nm, 0.1-1% by mass of resin emulsion and 0.05-0.3% by mass of grinding aid; the component B comprises 10-18% by mass of silica sol with the particle size of 10-18nm and 0.05-0.3% by mass of grinding aid; the component C is one or a mixture of more than two of borax, boric acid and oxalic acid;
the specific preparation method of the high-concentration low-agglomeration highlight liquid comprises the following steps:
(1) the preparation steps of the component A are as follows:
preparing the silica sol, the resin emulsion and the grinding aid according to the formula amount in the component A, mixing the materials, standing the mixture at room temperature for more than 3 days, and fully grafting and combining the materials to obtain high-concentration nano liquid with increased content of particles;
(2) the preparation steps of the component B are as follows:
preparing the silica sol, the grinding aid and the resin emulsion (if any) according to the formula amount in the component B, mixing the materials, standing the mixture at room temperature for more than 3 days, and fully grafting and combining the materials to obtain low-concentration nano liquid with increased content of granularity;
(3) and (3) mixing:
mixing the component A and the component B according to the mass ratio of the formula amount, and then adding the component C; and continuously stirring uniformly to obtain high-concentration low-agglomeration highlight liquid.
The specific reaction mechanism analysis of the high-concentration low-agglomeration high-gloss liquid is as follows:
the component A and the component B respectively form single system stable compositions after fully grafting and combining by standing for more than 3 days, so that the nano-liquids with different particle size ranges are obtained. Active groups-OH distributed on the surfaces of the silica sol in the component A and the component B are subjected to graft reaction with the resin emulsion and the active groups-OH or-COOH on the surface of the grinding aid to form a plurality of-O-Si-O-structure macromolecular compounds, so that the particle size of the nano silica sol is increased. The component A and the component B respectively and fully carry out grafting reaction to respectively form stable and independent nano-liquids containing different particle size ranges, and then the stable and independent nano-liquids are physically mixed under the condition of additives such as borax, boric acid, oxalic acid and the like of the component C to obtain the nano-polishing solution which is stable in system, high in concentration and low in agglomeration and meets the production requirement.
Taking the component A as an example (the component A contains silica sol, boric acid grinding aid and polyacrylic resin emulsion):
the grafting reaction was as follows:
the silica sol surface active group-OH and the boric acid grinding aid surface active group-OH are subjected to a grafting reaction, and according to the grafting degree, macromolecular compounds with different particle sizes and-O-Si-O-structures are formed. In the same way, the surface active group-COOH of the polyacrylic resin emulsion and the surface active group-OH of the silica sol have grafting reaction to form-O-Si-O-structure macromolecular compounds with different particle sizes, and the high-concentration low-agglomeration highlight liquid meeting the production requirements is obtained by adjusting the content of the auxiliary agent and the grafting reaction time, namely the standing time.
As a further preferable scheme, the component A in the high-concentration low-agglomeration high-gloss liquid comprises 28-35% by mass of silica sol with the particle size of 10-15nm, 0.3-0.8% by mass of resin emulsion and 0.1-0.25% by mass of grinding aid; the component B comprises 14-16% by mass of silica sol with the particle size of 10-15nm and 0.1-0.25% by mass of grinding aid.
As a further preferable scheme, in the step (3), the component a and the component B are mixed according to a mass ratio of 1: 1 are mixed with each other, and the component C accounts for 0.4 percent of the total weight of the component A and the component B.
In a further preferred embodiment, the grinding aid in the component a is selected from one or a mixture of two or more of borax, boric acid and oxalic acid.
In a further preferable mode, the grinding aid in the component B is one or a mixture of more than two of borax, boric acid and oxalic acid.
As a further preferable scheme, the component B also comprises 0.8 to 1.5 mass percent of resin emulsion.
More preferably, the resin emulsion is one or a mixture of two or more selected from the group consisting of a polyacrylic resin emulsion, a polyurethane resin emulsion, a rosin resin emulsion, and an epoxy resin emulsion.
As a further preferable scheme, the silica sol in the components A and B is purchased from nano silica sol provided by Beijing Dekojima technologies, Inc.
As a further preferable scheme, in the step (3), the stirring speed is 800-1200r/min, and the stirring time is 30-45 min.
The invention also provides a preparation method of the high-gloss ceramic, which comprises the following steps:
(1) pre-polishing and grinding:
the surface of the ceramic tile is pressed and polished by polishing equipment, so that the surface of the ceramic tile is smooth and free of debris;
(2) high-concentration low-agglomeration high-gloss liquid highlight treatment;
the obtained high concentrationDripping the low-agglomeration high-gloss liquid into the ceramic tile, coating the ceramic tile surface treated in the step (1), and continuously polishing and grinding; the addition amount of the high-concentration low-agglomeration highlight liquid is 45-55g/m 2 The sanding coating time is 2.75s/m 2 The revolution speed of the grinding disc of the polishing equipment is 80-90r/min, and the rotation speed of the grinding material arranged on the grinding disc is 700-800r/min, so that the grinding material penetrates into coarse pores on the surface of the ceramic tile to finish the highlight processing.
The invention also provides the high-gloss ceramic prepared by the preparation method.
The following are specific examples of the present invention, and raw materials, equipments and the like used in the following examples can be obtained by purchasing them unless otherwise specified.
[ preparative examples ]
The components are weighed according to the formula in the following table 1-2 and prepared for use in each example, and then different high-concentration low-agglomeration high-gloss liquids are prepared according to the following preparation method of the high-concentration low-agglomeration high-gloss liquid. Wherein the silica sol in tables 1-2 is purchased from nanometer silica sol with a particle size range of 10-18nm provided by Beijing Deke island gold technologies, Inc. The grinding aid selected in the table is borax, unless otherwise specified; the selected resin emulsion is polyacrylic resin emulsion; the selected component C is oxalic acid.
Table 1 shows the formulation composition of the A component of each example
Table 2 shows the formulation composition of the B components of each example
[ examples 1 to 3 and comparative examples 2 to 9 ]
The method is characterized in that ceramic tiles of the same batch produced by a company on the market are taken and subjected to high-gloss surface treatment according to the following processing method, wherein the difference is that the preparation method and the dosage ratio of high-concentration low-agglomeration high-gloss liquid are subjected to relevant comparison design to obtain the ceramic tiles of each example.
Unless otherwise stated, the ceramic processing method of each example specifically includes the following steps:
(1) pre-polishing and grinding:
the surface of the ceramic tile is pressed and polished by polishing equipment, so that the surface of the ceramic tile is smooth and free of debris;
(2) high-concentration low-agglomeration high-gloss liquid highlight treatment;
dripping high-concentration low-agglomeration highlight liquid into the high-concentration low-agglomeration highlight liquid, coating the high-concentration low-agglomeration highlight liquid on the surface of the ceramic tile treated in the step (1), and continuously polishing and grinding; the addition amount of the high-concentration low-agglomeration highlight liquid is 50g/m 2 The sanding coating time is 2.75s/m 2 The revolution speed of the grinding disc of the polishing equipment is 85r/min, and the rotation speed of the grinding material arranged on the grinding disc is 700-.
The preparation method of the high-concentration low-agglomeration high-gloss liquid comprises the following steps:
(2.1) preparation steps of the component A:
according to the table 1-2, the silica sol, the resin emulsion and the grinding aid in the formula amount in the component A are prepared, then are mixed with each other, are kept stand at room temperature for more than 3 days, and are fully grafted and combined to obtain high-concentration nano liquid with increased content of particle size;
(2.2) preparation steps of the component B:
preparing the silica sol, the grinding aid and the resin emulsion (if any) according to the formula amount in the component B, mixing the materials, standing the mixture at room temperature for more than 3 days, and fully grafting and combining the materials to obtain low-concentration nano liquid with increased content of granularity;
(2.3) a step of mixing:
mixing the component A and the component B according to the mass ratio of the formula amount, and then adding the component C of the formula amount; and continuously stirring uniformly to obtain high-concentration low-agglomeration high-gloss liquid.
[ example 1 ]
In this example, in step (2.3) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the component a and the component B are mixed in a mass ratio of 0.5: 1, then adding a component C, wherein the dosage of the component C accounts for 0.3 percent of the total weight of the component A and the component B; stirring is continuously carried out uniformly at the stirring speed of 800-.
[ example 2 ]
In this example, in step (3) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the component a and the component B are mixed in a mass ratio of 1: 1, then adding a component C, wherein the using amount of the component C accounts for 0.4 percent of the total weight of the component A and the component B; stirring is continuously carried out uniformly at the stirring speed of 800-.
[ example 3 ]
In this example, in step (3) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the component a and the component B are mixed in a mass ratio of 2: 1, then adding a component C, wherein the dosage of the component C accounts for 0.5 percent of the total weight of the component A and the component B; continuously stirring evenly at the stirring speed of 800-1200r/min for 30-45min to obtain the high-concentration low-agglomeration highlight liquid.
Comparative example 1
The same batch of ceramic tiles, which were produced by the same company as the above-mentioned examples, were obtained without polishing, and used as a blank control.
Comparative example 2
In this example, in the steps (2.1) - (2.2) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the standing time of the component A and the component B is 0 day, namely the component A, the component B and the component C are directly mixed and stirred after being mixed to obtain the polishing nano liquid, and the reagent formula used in the rest is basically the same as that of the example 2.
Comparative example 3
In this example, in the steps (2.1) - (2.2) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the standing time of the component A and the component B is 1 day, namely, the component A and the component B are respectively stood for 1 day and then mixed and stirred with the component C to obtain the polishing nano liquid, and the reagent formula used for the rest is basically the same as that of the example 2.
Comparative example 4
In this example, in the steps (2.1) - (2.2) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the standing time of the component A and the component B is 2 days, namely, the component A and the component B are respectively stood for 2 days and then mixed and stirred with the component C to obtain the polishing nano liquid, and the reagent formula used for the rest is basically the same as that of the example 2.
Comparative example 5
In this example, in the steps (2.1) - (2.2) of the preparation method of the high-concentration low-agglomeration high-gloss liquid, the standing time of the component A and the component B is 6 days, namely, the component A and the component B are respectively stood for 6 days and then mixed and stirred with the component C to obtain the polishing nano liquid, and the reagent formula used for the rest is basically the same as that of the example 2.
Comparative example 6
In this example, the nano-polishing solution lacking the component a is obtained except for the step (2.1) of lacking in the preparation method of the high-concentration low-agglomeration high-gloss solution, and the rest steps and conditions are basically the same as those of the reagent formula used in example 2.
Comparative example 7
In this example, the nano-polishing solution lacking the component B is obtained except for the step (2.2) of the preparation method of the high-concentration low-agglomeration high-gloss solution, and the rest steps and conditions are substantially the same as those of the reagent formula used in example 2.
Comparative example 8 (existing nano polishing solution formula and existing ceramic tile processing technology)
The existing nano polishing solution has the following formula: 10-18nm of 15 mass percent of silica sol, 0.5 mass percent of resin emulsion and 0.3 mass percent of borax;
the ceramic tile processing technology of the embodiment comprises the following steps: carrying out surface pre-polishing grinding on the ceramic tile by using polishing equipment to enable the surface of the ceramic tile to be smooth without fragments, then respectively dripping and coating the nano polishing solution on the surface of the ceramic tile, and continuing polishing and grinding; the addition amount of the nano polishing solution is 50g/m 2 The sanding coating time is 3.9s/m 2 (now)In the prior art, the polishing time for the surface processing of ceramic tiles is about 3.9s/m 2 ) The revolution speed of the grinding disc of the polishing equipment is 85r/min, and the autorotation speed of the grinding material arranged on the grinding disc is 700-800r/min, so that the grinding material penetrates into coarse pores on the surface of the ceramic tile to finish the surface treatment processing of the ceramic tile.
COMPARATIVE EXAMPLE 9 (modified nanometer polishing solution formulation)
The formula of the improved nano polishing solution is as follows: 10-18nm of 7.5 percent silica sol, 100-120nm of 7.5 percent silica sol, 0.5 percent resin emulsion and 0.3 percent borax;
the ceramic tile processing technology of the embodiment comprises the following steps: carrying out surface pre-polishing grinding on the ceramic tile by using polishing equipment to enable the surface of the ceramic tile to be smooth without fragments, then respectively dripping and coating the nano polishing solution on the surface of the ceramic tile, and continuing polishing and grinding; the addition amount of the nano polishing solution is 50g/m 2 The sanding coating time is 2.75s/m 2 The revolution speed of the grinding disc of the polishing equipment is 85r/min, and the rotation speed of the grinding material arranged on the grinding disc is 700-.
Effect evaluation and Performance detection
The ceramic tiles manufactured by the processing methods of examples 1 to 3 and comparative examples 2 to 9 were subjected to performance tests, and the surface treatment effects of the different examples were tested. The detection items comprise glossiness and antifouling and waterproof capabilities, wherein the glossiness is detected according to GB/T13891-2008 standard, and the results of the detection items and the results are shown in the following table 3.
Table 3 shows the results of testing the properties of the ceramic tiles of examples 1 to 3 and comparative examples 1 to 9
Remarking: the glossiness of the surface of the ceramic tile refers to that the ceramic tile is subjected to surface highlight treatment by highlight liquid prepared by each embodiment, then the fine pores on the surface of the ceramic tile are filled and repaired, and then the glossiness of the surface of the ceramic tile is detected. In addition, the antifouling and waterproof capabilities of the invention are as follows from high to low: very good > general.
As can be seen from the above table, the ceramic tiles of examples 1 to 3 have higher gloss, more transparent feeling, gloss of 90 or more, and superior antifouling and waterproofing ability than those of comparative example 1, and particularly, the ceramic tiles of example 2 have higher gloss, and superior antifouling and waterproofing ability, which is the best embodiment.
Comparing example 2 with comparative example 2, the standing time of the component A and the component B of comparative example 2 is 0 day, namely the component A, the component B and the component C are directly mixed and stirred after being mixed, which shows that the interior of the component A and the component B which are not subjected to standing cannot form a stable combination system, namely the nano polishing solution which is not fully grafted, the glossiness of the obtained ceramic tile is reduced, the surface is poor in fog-like transparency, the antifouling and waterproof capabilities are reduced, and the influence on the highlight effect and the antifouling capability is very large.
Comparing example 2 with comparative examples 3-4, the standing time of both the A component and the B component of comparative examples 3-4 is less than 3 days, the glossiness of the obtained tile is reduced, the surface is poor in fog-like transparency, and the antifouling and waterproof capabilities are reduced, which indicates that the standing time of the A component and the B component is more than 3 days, and the A component and the B component can respectively form a stable grafting system.
Comparing example 2 with comparative example 5, the standing time of the component A and the component B of the comparative example 5 is 6 days, the glossiness and the permeability of the obtained tile are basically unchanged, and the fact that the standing time is 3-6 days is enough, and the standing time is not too long and is not necessary to be large.
Comparing example 2 with comparative example 6, comparative example 6 lacks step (1), and the nano-polishing solution lacking component a, whose surface treatment effect is slightly reduced, indicates that the absence of high-concentration nano-polishing solution containing increased particle size decreases the effective components of the nano-polishing solution, which affects the surface treatment effect.
Comparing example 2 with comparative example 7, comparative example 7 lacks step (2), and thus the nano-polishing solution lacking component B is obtained, the surface treatment effect of which is slightly reduced, which indicates that the effective components of the nano-polishing solution are reduced due to the lack of the low-concentration nano-solution containing increased particle size, and the surface treatment effect is also affected, indicating that component a and component B cooperate to have a certain complementary and synergistic effect.
Compared with the comparative example 8 in the embodiment 2, the comparative example 8 is that the existing nano polishing solution formula is polished by the existing polishing process, the surface treatment effect of the obtained ceramic tile can basically meet the requirements of the existing products, and in contrast, the nano treatment solution prepared by the invention has better surface treatment effect, the time required by polishing is reduced, and the effects of energy conservation and environmental protection can be achieved.
Comparing example 2 with comparative example 9, comparative example 9 is a modified nano polishing solution formulation, which is polished by the existing polishing process, and the surface treatment effect is better, but the batching cost is increased compared with example 2. Compared with the conversion, the processing cost (the batching cost and the energy consumption) of the ceramic tile can be reduced by 30 percent per ceramic tile.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are within the protection scope of the present invention.
Claims (9)
1. The preparation method of the high-gloss ceramic is characterized by comprising the following steps:
(1) pre-polishing and grinding:
pressing and grinding the surface of the ceramic tile by using polishing equipment to ensure that the surface of the ceramic tile is smooth and has no fragments;
(2) high-concentration low-agglomeration high-gloss liquid highlight treatment;
dripping high-concentration low-agglomeration highlight liquid into the high-concentration low-agglomeration highlight liquid, coating the high-concentration low-agglomeration highlight liquid on the surface of the ceramic tile treated in the step (1), and continuously polishing and grinding; the addition amount of the high-concentration low-agglomeration highlight liquid is 45-55g/m 2 The sanding coating time is 2.75s/m 2 The revolution speed of the grinding disc of the polishing equipment is 80-90r/min, the rotation speed of the grinding material arranged on the grinding disc is 700-800r/min, so that the grinding material penetrates into coarse pores on the surface of the ceramic tile to finish high light heatingCarrying out machining treatment;
the high-concentration low-agglomeration highlight liquid is prepared by the following method:
(2.1) preparation steps of the component A:
preparing silica sol, resin emulsion and grinding aid, adding water, mixing, standing at room temperature for more than 3 days, and grafting and combining completely to obtain high-concentration nanometer liquid with increased content of particle size;
(2.2) preparation steps of the component B:
preparing silica sol and a grinding aid, adding water, mixing, standing at room temperature for more than 3 days, and fully grafting and combining to obtain a low-concentration nano liquid with increased content of granularity;
(2.3) a step of mixing:
mixing the component A and the component B, and then adding the component C serving as a stabilizer; and continuously stirring uniformly to obtain high-concentration low-agglomeration high-gloss liquid.
2. The preparation method of the high-gloss ceramic according to claim 1, wherein the high-concentration low-agglomeration high-gloss liquid comprises an A component, a B component and a C component, and the mass ratio of the A component to the B component is (0.5-2): 1, the dosage of the component C accounts for 0.3 to 0.5 percent of the total weight of the component A and the component B; wherein the component A comprises 25-40% by mass of silica sol with the particle size of 10-18nm, 0.1-1% by mass of resin emulsion, 0.05-0.3% by mass of grinding aid and the balance of water; the component B comprises 10-18% by mass of silica sol with the particle size of 10-18nm, 0.05-0.3% by mass of grinding aid and the balance of water; the component C is one or a mixture of more than two of borax, boric acid and oxalic acid.
3. The method for preparing the high gloss ceramic according to claim 1, wherein in the step (2.3), the stirring speed is 800-.
4. The method for preparing the high gloss ceramic according to claim 2, wherein the component A comprises 28-35% by mass of silica sol with a particle size of 10-15nm, 0.3-0.8% by mass of resin emulsion and 0.1-0.25% by mass of grinding aid; the component B comprises 14-16% by mass of silica sol with the particle size of 10-15nm and 0.1-0.25% by mass of grinding aid.
5. The preparation method of the high gloss ceramic according to claim 2, wherein the mass ratio of the component A to the component B is 1: 1, the C component accounts for 0.4 percent of the total weight of the A component and the B component.
6. The method for preparing high gloss ceramic according to claim 2, wherein the grinding aid in the component A and the component B is selected from one or a mixture of more than two of borax, boric acid and oxalic acid.
7. The method for preparing the high gloss ceramic according to claim 2, wherein the component B further comprises 0.8-1.5% by mass of a resin emulsion.
8. The method for preparing the high gloss ceramic according to claim 2 or 7, wherein the resin emulsion is one or a mixture of two or more selected from polyacrylic resin emulsion, polyurethane resin emulsion, rosin resin emulsion, and epoxy resin emulsion.
9. A high gloss ceramic prepared by the method of claim 1.
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