CN114720406A - Method for evaluating laser damage threshold of optical material based on multi-scale calculation damage precursor - Google Patents
Method for evaluating laser damage threshold of optical material based on multi-scale calculation damage precursor Download PDFInfo
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Abstract
The invention discloses a method for evaluating a laser damage threshold of an optical material based on a multi-scale calculation damage precursor, which comprises the following steps of (1) taking a mie scattering theory into consideration, taking various types of damage precursors as laser absorption sources, combining a heat transfer model, dynamically introducing laser energy into the optical material, and evaluating the influence of the damage precursors on the material damage threshold. Different from the prior simulation method of a pure surface fixed heat source (setting local initial high temperature). (2) The invention covers various parameters related to optical materials, and the damage threshold value and the damage radius of various optical materials can be simulated and analyzed by adjusting related parameters. This is different from the existing laser damage simulation model for only a single material.
Description
The technical field is as follows:
the invention relates to the field of calculation and evaluation of laser damage thresholds of damage precursors to optical materials, in particular to a method for evaluating laser damage thresholds of the damage precursors to the optical materials based on multi-scale calculation.
Background art:
the existing three-dimensional heat absorption model based on a general heat conduction equation can simulate the heat transmission process of the optical material under a specific condition, analyze the temperature field distribution and obtain the information related to damage. However, these models can only analyze a certain optical material, neglect the absorption process of the laser energy by the defect as the damage precursor, and simply set a high temperature as a heat source in a certain region in the material to simulate the energy generated by laser-induced absorption.
The invention content is as follows:
the invention aims to solve the existing problems and provides a method for evaluating the laser damage threshold of an optical material based on multi-scale calculation of a damage precursor.
The technical solution of the invention is as follows: a method for evaluating laser damage threshold of an optical material based on multi-scale calculation damage precursors comprises the following steps:
s1, designing optical and thermodynamic property parameters of the damage precursor and the optical element: firstly, constructing and optimizing an optical material defect model in the presence of a stable damage precursor, secondly, calculating and obtaining the structure density, the electronic structure (energy band gap Eg) and the dielectric function epsilon of the defect model in the presence of various damage precursors by a first principle, and finally, obtaining various thermodynamic parameters of the defect-free optical element at different temperatures by utilizing molecular dynamics calculation, wherein the thermodynamic parameters mainly comprise thermal conductivity k (T) and specific heat capacity Cp (T).
S2, designing and dynamically introducing incident laser: firstly, setting laser power density I and laser pulse width lambda, and selecting a dielectric function epsilon of a precursor under the wavelength; the operation of embedding a heat source is completed by combining the dimension r, the absorption section, the scattering section and the reflection section of the defect structure of the damaged precursor obtained by the Mi scattering theory, and finally the laser energy Q absorbed by the defect of the damaged precursor as the heat source is solved;
s3, constructing a macroscopic laser damage model combining microscopic calculation aiming at different optical materials: (1) introducing a laser energy item Q into a conventional heat conduction model, setting a delimiting condition in a contact area of a damaged precursor and an optical element, and perfecting the transmission process of laser energy from the precursor to the element; (2) introducing temperature-dependent element parameters k (T) and Cp (T) into the model, introducing a dynamic process of element performance as a function of temperature; (3) and (3) the improved heat transmission model is subjected to three-dimensional transformation, boundary conditions are added, the time domain difference method is utilized to solve and obtain the material lattice temperature distribution information in the laser irradiation process, and the damage threshold value and the damage radius of the optical material are calculated based on the information according to the criterion of thermal damage.
Preferably, the boundary condition includes, but is not limited to, setting a heat flow transfer state between the surface of the device and air when solving the device surface damage problem.
Preferably, the criterion of thermal damage is based on the critical temperature of the material lattice.
Preferably, the construction of the optical material defect model in S1 includes the following steps: the method comprises the steps of constructing a material crystal structure by utilizing MS software, establishing doping models of different defect types and relaxing the structure by utilizing a DFT method.
Preferably, the parameters of the damage precursor in S1 are used in the introduction process of the incident laser, and the parameters of the optical element may be introduced into the macroscopic laser damage model to simulate the dynamic laser damage process.
The invention has the beneficial effects that:
(1) according to the method, a meter scattering theory is considered, various damage precursors are used as laser absorption sources, and laser energy is dynamically introduced into the optical material by combining a heat transmission model, so that the influence of the damage precursors on the damage threshold of the material is evaluated. Different from the prior simulation method of a pure surface fixed heat source (setting local initial high temperature).
(2) The invention covers various parameters related to optical materials, and the damage threshold value and the damage radius of various optical materials can be simulated and analyzed by adjusting related parameters. This is different from the existing laser damage simulation model for only a single material.
(3) The present invention combines the microscopic properties of defects (light absorption, band gap, etc.) with the macroscopic properties of optical materials (thermodynamic properties), unlike existing theoretical models that focus on macroscopic or microscopic scales.
(4) The invention can control the incident laser parameters, thereby analyzing the influence of the laser parameters (pulse width, power density, etc.) on the damage threshold of the optical material. This is different from the theoretical model of laser damage for a single wavelength.
Description of the drawings:
FIG. 1 is a schematic flow diagram of the present invention;
FIG. 2 is the temperature field distribution of fused quartz when the damage threshold is reached under the laser irradiation with the power density of 1.7GW/cm2, the pulse width of 5ns and the wavelength of 355nm in the first embodiment;
FIG. 3 is a graph showing the distribution of the fused silica temperature field at the damage threshold for different laser pulse widths according to one embodiment;
FIG. 4 is a graph showing the surface temperature field distribution of single crystal silicon at an ambient temperature of 300K, a pulse width of 400ps and a laser energy of 0.36j/cm2 in accordance with an example;
FIG. 5 is a graph showing the relationship between the laser-induced damage threshold and the ambient temperature of the single-crystal silicon material in the second embodiment, in which iron is used as a damage precursor;
the specific implementation mode is as follows:
the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "or/and" includes any and all combinations of one or more of the associated listed items.
The method for evaluating the laser damage threshold of the optical material based on the multi-scale calculation damage precursor comprises the following steps:
s1, designing optical and thermodynamic property parameters of the damage precursor and the optical element: firstly, constructing and optimizing an optical material defect model in the presence of a stable damage precursor, secondly, calculating and obtaining the structure density, the electronic structure (energy band gap Eg) and the dielectric function epsilon of the defect model in the presence of various damage precursors by a first principle, and finally, obtaining various thermodynamic parameters of the defect-free optical element at different temperatures by utilizing molecular dynamics calculation, wherein the thermodynamic parameters mainly comprise thermal conductivity k (T) and specific heat capacity Cp (T).
S2, designing and dynamically introducing incident laser: firstly, setting laser power density I and laser pulse width lambda, and selecting a dielectric function epsilon of a precursor under the wavelength; the operation of embedding a heat source is completed by combining the dimension r, the absorption section, the scattering section and the reflection section of the defect structure of the damaged precursor obtained by the Mi scattering theory, and finally the laser energy Q absorbed by the defect of the damaged precursor as the heat source is solved;
s3, constructing a macroscopic laser damage model combining microscopic calculation aiming at different optical materials: (1) introducing a laser energy item Q into a conventional heat conduction model, setting a delimiting condition in a contact area of a damaged precursor and an optical element, and perfecting the transmission process of laser energy from the precursor to the element; (2) introducing temperature-dependent element parameters k (T) and Cp (T) into the model, introducing a dynamic process of element performance as a function of temperature; (3) and (3) the improved heat transmission model is subjected to three-dimensional transformation, boundary conditions are added, the time domain difference method is utilized to solve and obtain the material lattice temperature distribution information in the laser irradiation process, and the damage threshold value and the damage radius of the optical material are calculated based on the information according to the criterion of thermal damage.
Specifically, the boundary conditions include, but are not limited to, setting a heat flow transfer state between the surface of the component and air when solving the component surface damage problem.
Specifically, the criterion of the thermal damage is based on the critical temperature of the material crystal lattice.
Specifically, the construction of the optical material defect model in S1 includes the following steps: the method comprises the steps of constructing a material crystal structure by utilizing MS software, establishing doping models of different defect types and relaxing the structure by utilizing a DFT method.
Specifically, the parameters of the damage precursor in S1 are used for the introduction process of the incident laser, and the parameters of the optical element can be introduced into the macroscopic laser damage model to simulate the dynamic laser damage process.
Example 1
And simulating the damage threshold of the fused quartz material under different laser pulse widths during triple frequency laser irradiation when the neutral oxygen vacancy defect is used as a damage precursor. Firstly, a fused quartz defect model with a large number of neutral oxygen vacancy defects is constructed, and the complex refractive index of 1.08-0.16i and the Eg of 6.08eV are obtained by calculation according to a first principle. Then, the k (T) and Cp (T) of the defect-free fused quartz are calculated by adopting a molecular dynamics method simulation. Setting the defect size to be 200nm and the fused quartz density to be 2.2g/cm3, bringing all parameters into a heat transmission model with boundary conditions added, and finally obtaining the damage threshold of the fused quartz material under different laser pulse widths during triple frequency laser irradiation by adjusting the laser power density I (GW/cm2) and the laser pulse width lambda (ns). In FIG. 2, under the laser irradiation with power density of 1.7GW/cm2, pulse width of 5ns and wavelength of 355nm, the temperature field distribution of the fused quartz surface at different moments is shown. In the figure, the black and red curves represent the advance of the absorption wavefront with the temperature when the laser acts, and a black curve is generated every 0.5 ns; a red curve is generated every 0.25. The result shows that when the laser power density is 1.7GW/cm2, the central temperature of the precursor is greatly increased to about 14500K, and the radius of the region with obvious high temperature on the surface of the fused quartz reaches 650 nm. In addition, when the irradiation time exceeds 4ns, i.e., the red curve portion, the temperature of the precursor region rises rapidly, and the propagation range of the high temperature also increases greatly, resulting in a significant absorption wavefront. FIG. 3 shows the distribution of the fused silica surface and internal temperature fields at the damage threshold for different laser pulse widths. The smaller the pulse width, the smaller the damage threshold, and the simulation result satisfies the root relation found in the experiment (the damage threshold is proportional to the root value of the pulse width).
Example 2
The method is used for simulating the damage threshold of the monocrystalline silicon material under 1064nm laser irradiation at different environmental temperatures by taking iron as a damage precursor. Firstly, a dielectric function of a precursor defect model and k (T) and Cp (T) of monocrystalline silicon are obtained through first-principle calculation and molecular dynamics calculation. Then setting the laser parameter as 1064nm and the pulse width as 400 ps. The surface temperature of the monocrystalline silicon is manually set, and damage threshold of the monocrystalline silicon material is simulated when laser irradiation is carried out at 1064nm under different environmental temperatures. FIG. 4 shows the surface temperature distribution of a single crystal silicon at room temperature with a laser energy of 0.36j/cm 2. At this time, the central region temperature is 4000K, and it can be determined that the central region temperature exceeds the damage threshold (the damage threshold is determined based on the surface temperature exceeding 1500K, and 1500K is the melting point of the single crystal silicon material). The damage threshold results at different environmental temperatures are shown in fig. 5, and it can be seen that there is a linear relationship between the environmental temperature and the damage threshold, and the damage threshold of the single crystal silicon material decreases after the environmental temperature gradually increases.
The foregoing is only for the purpose of understanding the method and the core concept of the present invention, and it should be noted that modifications and variations can be made by those skilled in the art without departing from the principle of the present invention, and these modifications and variations also fall into the protection scope of the appended claims.
Claims (5)
1. A method for evaluating laser damage threshold of an optical material based on multi-scale calculation damage precursors is characterized by comprising the following steps: comprises the following steps:
s1, designing optical and thermodynamic property parameters of the damage precursor and the optical element: firstly, constructing and optimizing an optical material defect model in the presence of a stable damage precursor, secondly, calculating and obtaining the structure density, the electronic structure (energy band gap Eg) and the dielectric function epsilon of the defect model in the presence of various damage precursors by a first principle, and finally, obtaining various thermodynamic parameters of the defect-free optical element at different temperatures by utilizing molecular dynamics calculation, wherein the thermodynamic parameters mainly comprise thermal conductivity k (T) and specific heat capacity Cp (T).
S2, designing and dynamically introducing incident laser: firstly, setting laser power density I and laser pulse width lambda, and selecting a dielectric function epsilon of a precursor under the wavelength; the operation of embedding a heat source is completed by combining the dimension r, the absorption section, the scattering section and the reflection section of the defect structure of the damaged precursor obtained by the Mi scattering theory, and finally the laser energy Q absorbed by the defect of the damaged precursor as the heat source is solved;
s3, constructing a macroscopic laser damage model combining microscopic calculation aiming at different optical materials: (1) introducing a laser energy item Q into a conventional heat conduction model, setting a delimiting condition in a contact area of a damaged precursor and an optical element, and perfecting the transmission process of laser energy from the precursor to the element; (2) introducing temperature-dependent element parameters k (T) and Cp (T) into the model, introducing a dynamic process of element performance as a function of temperature; (3) and (3) the improved heat transmission model is subjected to three-dimensional transformation, boundary conditions are added, the time domain difference method is utilized to solve and obtain the material lattice temperature distribution information in the laser irradiation process, and the damage threshold value and the damage radius of the optical material are calculated based on the information according to the criterion of thermal damage.
2. The method for evaluating the laser damage threshold of an optical material based on a multi-scale calculation damage precursor according to claim 1, wherein: the boundary conditions include, but are not limited to, setting a heat flow transfer state between the surface of the component and the air when solving the problem of the damage to the surface of the component.
3. The method for evaluating the laser damage threshold of an optical material based on a multi-scale calculation damage precursor according to claim 1, wherein: the criterion of the thermal damage is based on the critical temperature of material crystal lattice.
4. The method for evaluating the laser damage threshold of an optical material based on a multi-scale calculation damage precursor according to claim 1, wherein: the construction of the optical material defect model in the S1 comprises the following steps: the method comprises the steps of constructing a material crystal structure by utilizing MS software, establishing doping models of different defect types and relaxing the structure by utilizing a DFT method.
5. The method for evaluating the laser damage threshold of the optical material based on the multi-scale calculation damage precursor according to claim 1, wherein: various parameters of the damage precursor in the S1 are used for the introduction process of the incident laser, and various parameters of the optical element can be brought into a macroscopic laser damage model to simulate the dynamic laser damage process.
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| CN202210161626.5A CN114720406A (en) | 2022-02-22 | 2022-02-22 | Method for evaluating laser damage threshold of optical material based on multi-scale calculation damage precursor |
| PCT/CN2022/133068 WO2023160046A1 (en) | 2022-02-22 | 2022-11-21 | Assessment method for calculating laser-induced damage threshold value of damage precursor to optical material on basis of multiple scales |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN116282122A (en) * | 2023-03-24 | 2023-06-23 | 吉林大学 | Strong optical absorption inducing material based on photoinduced blackbody effect and preparation method thereof |
| WO2023160046A1 (en) * | 2022-02-22 | 2023-08-31 | 电子科技大学长三角研究院(湖州) | Assessment method for calculating laser-induced damage threshold value of damage precursor to optical material on basis of multiple scales |
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| JP2007071831A (en) * | 2005-09-09 | 2007-03-22 | Tokuyama Corp | Method and device for evaluating optical material |
| CN110849815B (en) * | 2019-12-02 | 2022-10-18 | 中国工程物理研究院激光聚变研究中心 | Method and system for predicting laser damage performance of surface of optical element |
| CN114018984B (en) * | 2021-12-17 | 2022-07-26 | 电子科技大学 | Method for detecting laser damage of fused quartz based on first principle |
| CN114720406A (en) * | 2022-02-22 | 2022-07-08 | 电子科技大学长三角研究院(湖州) | Method for evaluating laser damage threshold of optical material based on multi-scale calculation damage precursor |
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| WO2023160046A1 (en) * | 2022-02-22 | 2023-08-31 | 电子科技大学长三角研究院(湖州) | Assessment method for calculating laser-induced damage threshold value of damage precursor to optical material on basis of multiple scales |
| CN116282122A (en) * | 2023-03-24 | 2023-06-23 | 吉林大学 | Strong optical absorption inducing material based on photoinduced blackbody effect and preparation method thereof |
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