CN114702248A - Visible and near-infrared light-transmitting micro-structure coated glass substrate and manufacturing method thereof - Google Patents
Visible and near-infrared light-transmitting micro-structure coated glass substrate and manufacturing method thereof Download PDFInfo
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- CN114702248A CN114702248A CN202210369271.9A CN202210369271A CN114702248A CN 114702248 A CN114702248 A CN 114702248A CN 202210369271 A CN202210369271 A CN 202210369271A CN 114702248 A CN114702248 A CN 114702248A
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- glass substrate
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- 239000011521 glass Substances 0.000 title claims abstract description 70
- 239000000758 substrate Substances 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 15
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- 238000012545 processing Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 17
- 229910003460 diamond Inorganic materials 0.000 claims description 12
- 239000010432 diamond Substances 0.000 claims description 12
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 8
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 abstract 4
- 239000011247 coating layer Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 description 21
- 238000004544 sputter deposition Methods 0.000 description 9
- 238000013461 design Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000002310 reflectometry Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Abstract
The invention provides a visible light and near infrared light transmitting micro-structure coated glass substrate and a manufacturing method thereof, wherein the structure comprises a glass substrate body, a triangular micro-structure meeting secondary total internal reflection is processed on the upper surface of the glass substrate body, a low refractive index layer and a high refractive index layer which are alternately laminated are sequentially arranged on the upper surface of the glass substrate body from bottom to top, the micro-structure meeting the secondary total internal reflection is designed and processed on the glass substrate body to increase the transmittance of visible light, the coating realizes the reflection of near infrared light, the micro-structure is combined with the alternately laminated low refractive index layer and high refractive index layer, the transmittance of visible light is improved while the number of coating layers is reduced, and the problems of low visible light transmittance, insufficient firmness and the like caused by more traditional coating layers are solved.
Description
Technical Field
The invention relates to the technical field of optical technology of glass surface spectrum, in particular to a micro-structure coated glass substrate capable of transmitting visible light and reflecting near infrared light and a manufacturing method thereof.
Background
At present, the traditional method for realizing visible light transmission and near infrared light reflection is film coating. The thickness of the film is designed by adopting a lambda/4 dielectric method, and the visible-reflective near infrared is realized by alternately stacking layers with higher refractive indexes and layers with lower refractive indexes. The material is usually coated on the substrate by thermal evaporation or magnetron sputtering. However, the dielectric processing of λ/4 requires several hundreds of layers of λ/4 thick films, and too many layers not only reduce the transmittance and make the processing difficult, but also increase the manufacturing cost, and too many layers make it difficult to secure the film firmness.
The traditional lambda/4 dielectric method adopts a film coating mode in the process of transmitting visible reverse near infrared light, and the problems that the processing is difficult, the manufacturing cost is increased, the firmness of the film with excessive layers is insufficient, the visible light transmittance is low due to excessive layers and the like are easily caused by excessive layers of the film coated by the traditional lambda/4 dielectric method in the process of transmitting visible reverse near infrared light.
Disclosure of Invention
The invention aims to provide a micro-structure coated glass substrate capable of transmitting visible light and near infrared light and a manufacturing method thereof.
The invention provides a micro-structure coated glass substrate capable of transmitting visible light and reflecting near-infrared light, which comprises a glass substrate body, wherein a micro-structure meeting secondary total internal reflection is processed on the upper surface of the glass substrate body, and a low-refractive-index layer and a high-refractive-index layer which are alternately laminated are sequentially arranged on the upper surface of the glass substrate body from bottom to top.
Preferably, the sum of the number of layers of the low refractive index layer and the high refractive index layer is 8.
Preferably, the glass substrate body is BK7 glass.
Preferably, the low refractive index layer is formed by plating a magnesium fluoride film.
Preferably, the high refractive index layer is formed by a titanium oxide plating film.
Preferably, the thickness of the high refractive index layer is 111nm, and the thickness of the low refractive index layer is 225 nm.
Preferably, the cross-sectional shape of the microstructure is a plurality of triangles arranged in sequence.
Preferably, the apex angle of the microstructure is 90 °.
The manufacturing method of the microstructure coated glass substrate which is transparent to visible light and near infrared light comprises the following steps:
s1: processing a microstructure meeting secondary total internal reflection on the upper surface of the glass substrate body;
s2: and alternately plating low-refractive-index layers and high-refractive-index layers on the surface of the microstructure.
Preferably, in step S1, a microstructure satisfying the secondary total internal reflection is precisely ground and machined on the glass substrate body by a diamond grinding wheel;
in step S2, a magnetron sputtering coating machine is used to alternately sputter a low refractive index layer and a high refractive index layer on the surface of the microstructure in sequence.
The technical scheme of the invention provides the microstructure coated glass substrate capable of transmitting visible light and reflecting near infrared light and the manufacturing method thereof, and solves the problems of processing difficulty, increased manufacturing cost, insufficient firmness of a film with excessive layers, low visible light transmittance and the like caused by excessive layers of coating in the near infrared light reflection field by the traditional lambda/4 dielectric method.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic diagram of the reflection and refraction of light at the microstructure interface according to the present invention;
FIG. 2 is a cross-sectional view of the overall structure of the present invention;
FIG. 3 is a graph comparing the reflectance curves of near infrared light measured by a spectrophotometer according to the present invention for a glass substrate body having a microstructure and a coating film and for a glass substrate having only a coating film.
Description of reference numerals: 1-incident light, 2-glass substrate body, 3-low refractive index layer, 4-high refractive index layer.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise. Furthermore, the terms "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Example 1
The invention provides a micro-structure coated glass substrate capable of transmitting visible light and reflecting near-infrared light, which comprises a glass substrate body 2, wherein the glass substrate body 2 is BK7 glass, a micro-structure meeting secondary total internal reflection is processed on the upper surface of the glass substrate body 2, the cross section of the micro-structure is in the shape of a plurality of triangles arranged in sequence, and the vertex angle of each triangular micro-structure is 90 degrees.
The upper surface of the glass substrate body 2 is provided with a low refractive index layer 3 and a high refractive index layer 4 which are alternately laminated from bottom to top, and the sum of the number of layers of the low refractive index layer 3 and the high refractive index layer 4 is preferably 8.
The low refractive index layer 3 is formed by coating magnesium fluoride, the high refractive index layer 4 is formed by coating titanium oxide, the thickness of the high refractive index layer 4 is 111nm, and the thickness of the low refractive index layer 3 is 225 nm.
The manufacturing method of the microstructure coated glass substrate which is transparent to visible light and near infrared light comprises the following steps: firstly, a microstructure which meets the requirement of secondary total internal reflection is precisely ground and processed on the glass substrate body 2 through a diamond grinding wheel. And then, sequentially and alternately sputtering the low-refractive-index material and the high-refractive-index material on the surface of the microstructure by a magnetron sputtering film plating machine to form the low-refractive-index layer 3 and the high-refractive-index layer 4 by alternate sputtering. Thereby realizing the visible and near infrared reflecting effect.
The specific design idea and the manufacturing method comprise the following steps:
step 1; satisfying the design of the secondary total internal reflection microstructure. As shown in FIG. 1, in order to ensure that the incident light 1 can pass through the BK7 glass after being reflected twice, the actual incident angle beta should be the nominal incident angle alpha and the inclined angle alpha on the surface of the microstructure
The sum is as follows:
angle of refraction beta of the interface for angle of incidence beta according to Snell's law1Satisfies the following conditions:
n hereMgF2Is the refractive index of the low refractive index material, nmatThe material refractive index of BK7 glass, the critical condition of total reflection is:
βc＝arcsin(nMgF2/nmat) (3)
in order to satisfy the two total internal reflections of the microstructured prism, the following conditions need to be satisfied:
first, when the reflected light reaches the next reflecting surface, the reflecting angle β is2Less than 90 degrees, that is:
second, the angle of reflection β2Is greater than the critical angle betac：
Third, to satisfy the second total internal reflection, the second reflection angle β3At the same time, the angle is also larger than the critical angle betac：
By combining equations (1) - (3) and solving inequalities (4) - (6), it can be obtained that the incident angle β needs to satisfy the following condition to obtain two total internal reflections:
in the case of normal incidence, the nominal angle of incidence α is 0 °, the actual angle of incidence β is not zero, and the angle of incidence with the microstructure isAngle of inclination
In this connection, MgF2, which is a material for the low refractive index layer 3, has a refractive index nMgF21.33, BK7 glass having a refractive index nmat1.56. The first condition is that beta is less than or equal to 61 degrees, the second condition is that beta is more than or equal to 26.5 degrees, and the third condition is that beta is less than or equal to 67.9 degrees. Thus, the tilt angle of the microstructure
Is required to be between 26.5 deg. and 61 deg.. And the apex angle theta and the inclination angle of the microstructure
The relationship between is that of an isosceles triangle, i.e.:
therefore, the apex angle θ of the microstructure needs to be satisfied between 58 ° and 127 °. The apex angle θ of the microstructure is selected to be 90 ° in consideration of the process of processing the microstructure.
nHtH＝nLtL＝λ0/4 (9)
in the formula nHIs the refractive index of the high refractive index material, tHIs the layer thickness of the high refractive index material, nLIs the refractive index of the low refractive index material, tLIs the layer thickness of the material with low refractive index, lambda0Is the reflected wavelength.
According to the photon forbidden band:
as the number of layers increases, the reflectivity will be closer to 1 within the forbidden band.
The high index material is titanium oxide and the low index material is magnesium fluoride, with indices of refraction of 2.70 and 1.33, respectively. The reflection wavelength of 1.2um was selected according to equations (9) and (10), and the high refractive index layer 4 was calculated to be 111nm thick, the low refractive index layer 3 was calculated to be 225nm thick, and the high refractive index layer 4 and the low refractive index layer 3 were laminated with each other by 8 layers.
And selecting the rough grinding depth, the rotating speed of a rough grinding wheel, the rough grinding feeding speed and the fine grinding depth, the rotating speed of a fine grinding wheel and the fine grinding feeding speed required by the process. By the method, array microstructures meeting the requirement of secondary total internal reflection can be processed on the BK7 glass substrate.
The visible and near-infrared light transmitting glass substrate can be prepared through the steps, and the reflectivity of the glass substrate can be measured by adopting a spectrophotometer.
The design and processing of this example is as follows:
titanium oxide with the refractive index of 2.7 and magnesium fluoride with the refractive index of 1.33 are respectively selected as a high refractive index material and a low refractive index material, and the vertex angle theta of the microstructure needs to be between 58 degrees and 127 degrees by meeting the design of a quadratic total internal reflection microstructure. Considering the processing technology of the microstructure, the vertex angle theta of the microstructure is selected to be 90 degrees, and the section size of the microstructure is as follows: an isosceles right triangle with a base of 100um, a height of 50um and a vertex angle of 90 degrees.
The reflection waveband is 0.8-2um, the thickness of the high-refractive-index layer 4 is calculated to be 111nm and the thickness of the low-refractive-index layer 3 is calculated to be 225nm according to the film thickness design of the near-infrared reflection film, and the high-refractive-index layer 4 and the ground-refractive-index layer are mutually laminated to form 8 layers according to the processing difficulty and the cost.
Fixing a BK7 glass substrate on a processing surface, wherein the coarse grinding depth is 0.08 mm, the rotation speed of a coarse grinding wheel is 2500 rpm, the coarse grinding feed speed is 600 mm/min, and the coarse grinding feed depth is 0.002 mm; the finish grinding depth is 0.002 mm, the rotation speed of the finish grinding wheel is 4000 rpm, the finish grinding feed speed is 100 mm/min, the finish grinding feed depth is 0.001 mm, the rough grinding V-shaped tip grinding wheel is a #600 metal-based diamond grinding wheel, and the finish grinding V-shaped tip grinding wheel is a #3000 resin-based diamond grinding wheel. An array microstructure BK7 glass substrate of an isosceles right triangle with the apex angle theta of 90 degrees, the base side of 100um and the height of 50um is obtained through processing.
Magnetic control sputtering coating method is adopted to coat the glass substrate of the BK7 microstructureLow refractive index layers 3 and high refractive index layers 4 are alternately plated. Plating a low refractive index layer 3 and a high refractive index layer 4 by a magnetron sputtering film plating machine direct current sputtering method with the vacuum degree of 1 multiplied by 10-4Pa, argon as working gas, pressure of 0.5Pa, power of 80W, and sputtering rate of 1 nm/min. The low refractive index layer 3 and the high refractive index layer 4 were alternately sputtered on a microstructure BK7 glass substrate, respectively, with the low refractive index layer 3 being 225nm thick and the high refractive index layer 4 being 111nm thick. And (3) sequentially sputtering the low-refractive-index layer 3 and the high-refractive-index layer 4, wherein the number of the sputtered layers is 8.
The microstructure and the plated film were processed on the BK7 glass substrate by the above method, and as shown in fig. 3, a BK7 glass substrate having the microstructure and the plated film and a BK7 glass substrate having only the plated film were measured by a spectrophotometer, wherein a is a reflectance curve of the conventional art and b is a reflectance curve of the present invention. The measurement result shows that the layer thickness is 8 layers, the reflectivity is more than 95% in the near infrared 0.9-1.7um wave band, and the reflectivity of the BK7 glass substrate with the microstructure and the coating film is averagely lower by about 10% in the visible light 0.5-0.76um wave band than that of the BK7 glass substrate without the microstructure.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. The microstructure coated glass substrate capable of transmitting visible light and reflecting near-infrared light is characterized by comprising a glass substrate body, wherein a microstructure meeting secondary total internal reflection is processed on the upper surface of the glass substrate body, and a low refractive index layer and a high refractive index layer which are alternately laminated are sequentially arranged on the upper surface of the glass substrate body from bottom to top.
2. The visible light-transmitting and near-infrared light-reflecting microstructured coated glass substrate according to claim 1, wherein the sum of the number of layers of the low refractive index layer and the high refractive index layer is 8.
3. The visible light-transmitting near-infrared light-reflecting micro-structured coated glass substrate according to claim 1, wherein the glass substrate body is BK7 glass.
4. The visible light-transmitting near-infrared-reflecting micro-structured coated glass substrate according to claim 1, wherein the low refractive index layer is formed by coating magnesium fluoride.
5. The visible anti-nir microstructured coated glass substrate according to claim 1, wherein the high refractive index layer is formed by a titanium oxide coating.
6. The visible-reflective near-infrared light transmitting microstructured coated glass substrate according to claim 1, wherein the high refractive index layer has a thickness of 111nm and the low refractive index layer has a thickness of 225 nm.
7. The visible light-transmitting near-infrared-light-reflecting micro-structured coated glass substrate according to claim 1, wherein the cross-sectional shape of the micro-structure is a plurality of triangles arranged in sequence.
8. The visible light-transmitting near-infrared light-reflecting micro-structured coated glass substrate according to claim 7, wherein the apex angle of the micro-structure is 90 °.
9. The method for manufacturing the visible light-transmitting near infrared-reflecting micro-structure coated glass substrate according to claim 1, comprising the following steps:
s1: processing a microstructure meeting secondary total internal reflection on the upper surface of the glass substrate body;
s2: and alternately plating low-refractive-index layers and high-refractive-index layers on the surface of the microstructure.
10. The method for manufacturing a micro-structure coated glass substrate capable of transmitting visible light and reflecting near infrared light according to claim 9, wherein in step S1, a micro-structure meeting the requirement of secondary total internal reflection is precisely ground and processed on the glass substrate body through a diamond grinding wheel;
in step S2, a magnetron sputtering coating machine is used to alternately sputter a low refractive index layer and a high refractive index layer on the surface of the microstructure in sequence.
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| CN202210369271.9A CN114702248A (en) | 2022-04-08 | 2022-04-08 | Visible and near-infrared light-transmitting micro-structure coated glass substrate and manufacturing method thereof |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018135504A1 (en) * | 2017-01-17 | 2018-07-26 | Ａｇｃ株式会社 | Wavelength-selectively permeable laminated glass |
| CN108417645A (en) * | 2018-04-09 | 2018-08-17 | 江苏绿能电力科技有限公司 | A kind of photovoltaic module structure that can reduce light pollution |
| CN111290066A (en) * | 2018-12-07 | 2020-06-16 | 张家港康得新光电材料有限公司 | Infrared band cut-off filter and application thereof |
-
2022
- 2022-04-08 CN CN202210369271.9A patent/CN114702248A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018135504A1 (en) * | 2017-01-17 | 2018-07-26 | Ａｇｃ株式会社 | Wavelength-selectively permeable laminated glass |
| CN108417645A (en) * | 2018-04-09 | 2018-08-17 | 江苏绿能电力科技有限公司 | A kind of photovoltaic module structure that can reduce light pollution |
| CN111290066A (en) * | 2018-12-07 | 2020-06-16 | 张家港康得新光电材料有限公司 | Infrared band cut-off filter and application thereof |
Non-Patent Citations (1)
| Title |
|---|
| PING LI等: ""Long-term photovoltaic performance of thin-film solar cells with diffractive microlens arrays on glass substrates"" * |
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Application publication date: 20220705 |