CN114690282A - Method for manufacturing lens - Google Patents
Method for manufacturing lens Download PDFInfo
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- CN114690282A CN114690282A CN202011638221.3A CN202011638221A CN114690282A CN 114690282 A CN114690282 A CN 114690282A CN 202011638221 A CN202011638221 A CN 202011638221A CN 114690282 A CN114690282 A CN 114690282A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 105
- 239000000463 material Substances 0.000 claims abstract description 90
- 239000007788 liquid Substances 0.000 claims abstract description 78
- 230000000873 masking effect Effects 0.000 claims abstract description 43
- 238000002791 soaking Methods 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 claims description 27
- 229920002120 photoresistant polymer Polymers 0.000 claims description 25
- 238000009736 wetting Methods 0.000 claims description 20
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- 238000012546 transfer Methods 0.000 description 9
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
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- 238000013461 design Methods 0.000 description 3
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
Abstract
The embodiment of the invention provides a method for manufacturing a lens, which comprises the following steps: providing a substrate; forming a soaking structure on a substrate, wherein the soaking structure and the substrate enclose a groove; adding a liquid masking material into the groove, so that the liquid masking material has a curved top surface due to surface tension; solidifying the liquid mask material to form a lens mask; and transferring the pattern of the lens mask into the substrate to form a lens. According to the embodiment of the invention, the lens with the curved top surface can be manufactured without repeated processes, so that the process is simplified, and the manufacturing efficiency is improved.
Description
Technical Field
The embodiment of the invention relates to the field of semiconductor manufacturing, in particular to a method for manufacturing a lens.
Background
The optical lens applied by the traditional optical system has the top surface with a curved surface outline, so that the design freedom degree of the optical system is increased, the number of lenses of the optical system is reduced, the size of the lenses is reduced, the system structure is simplified, and meanwhile, the imaging quality is further improved, the view field is enlarged, the detection distance is increased, and the measurement precision is improved.
Referring to fig. 1, a schematic flow chart of a lens manufacturing method in the prior art is shown. The method comprises the following steps:
providing a substrate 10; a mask layer 11 is formed on a partial region of the substrate 10.
And etching the substrate layer 10 to be etched with a part of thickness by taking the mask layer 11 as a mask to form a mask structure 12 with a convex part.
The raised portions 13 are formed by transferring the pattern of the masking structure 12 into the substrate layer 10 to be etched, thereby forming a lens having a three-dimensionally curved top portion.
However, this approach generally only allows four types of top surface profiles to be obtained, specifically: the included angle between the lateral wall of the protruding portion and the surface of the substrate is a positive angle, or the included angle between the lateral wall of the protruding portion and the surface of the substrate is a negative angle, or the lateral wall of the protruding portion is perpendicular to the surface of the substrate, or the vertex angle of the protruding portion is a fillet, so that the adjusting effect on the top surface profile is limited.
In particular, the difficulty in controlling the top surface profile is more pronounced when large-size silicon lenses are manufactured. As shown in fig. 2, when the top line width of the protruding portion is large (for example, far greater than the height of the protruding portion), the protruding portion 15 formed by the method shown in fig. 1 has a curved surface in the edge region 1 or 3, and the central region of the top surface of the protruding portion is still a plane, so that a curved surface profile meeting the requirements of the lens cannot be obtained. It can thus be seen that the process shown in figure 1 makes it difficult to control the profile of the top surface of the formed lens 15.
At present, the manufacturing method for obtaining the curved surface profile of the lens is more, but the current manufacturing process is more complex.
Disclosure of Invention
The embodiment of the invention solves the problem of providing a method for manufacturing a lens so as to simplify the manufacturing process of the lens
In order to solve the technical problem, an embodiment of the present invention provides a method for manufacturing a lens, including: providing a substrate; forming a soaking structure on a substrate, wherein the soaking structure and the substrate enclose a groove; adding a liquid masking material into the groove, so that the liquid masking material has a curved top surface due to surface tension; solidifying the liquid mask material to form a lens mask; and transferring the pattern of the lens mask into the substrate to form a lens.
Optionally, the step of forming a wetting structure on the substrate comprises: and forming an annular convex structure, wherein the annular convex structure and the substrate enclose a groove.
Optionally, the step of forming the annular protrusion structure comprises: forming a sacrificial layer on the substrate; forming a side wall layer on the side wall of the sacrificial layer; and removing the sacrificial layer to form the annular bulge structure.
Optionally, the material of the annular protrusion structure is photoresist or a hard mask material.
Optionally, the step of forming the annular projection structure comprises: forming an annular mask pattern layer on the substrate; and etching the substrate by taking the annular mask pattern as a mask to form the annular bulge structure.
Optionally, the step of forming the wetting structure on the substrate comprises: forming a pattern layer covering the substrate on the substrate; and forming a groove exposing the substrate in the pattern layer.
Optionally, the groove projects on the substrate in a circular shape.
Optionally, the liquid mask material is a liquid photoresist; and adding a liquid mask material into the groove in a dispensing manner.
Optionally, the manufacturing method further comprises: after adding a liquid mask material into the groove and before forming the lens mask, a shaping process is performed.
Optionally, the lens mask pattern is transferred into the substrate by dry etching.
Compared with the prior art, the technical scheme of the embodiment of the invention has the following advantages:
according to the manufacturing method of the lens, the liquid masking material is added into the groove, so that the liquid masking material has the curved top surface due to surface tension; the liquid masking material is then cured to form a lens mask also having a curved top surface, and the pattern of the lens mask is then transferred into the substrate to form a lens having a three-dimensional curved profile. The curved top surface formed by the surface tension of the liquid is integrally in a certain radian, so that the problem that the top is a plane is not easy to occur; in addition, the profile of the curved top surface of the lens mask, and thus the three-dimensional profile of the lens being manufactured, can be controlled by controlling parameters such as the size of the grooves, the amount of liquid masking material added to the grooves, or the wettability between the liquid masking material and the groove walls. According to the embodiment of the invention, the lens with the curved top surface can be manufactured without repeated processes, so that the process is simplified, and the manufacturing efficiency is improved.
Drawings
FIG. 1 is a schematic flow diagram of a prior art lens manufacturing process;
FIG. 2 is a schematic view of the difficulty in controlling the top surface profile of the lens manufacturing process of FIG. 1;
FIG. 3 is a schematic flow chart of another prior art lens manufacturing method;
FIGS. 4 to 7 are schematic structural views of steps of a first embodiment of a lens manufacturing method according to the present invention;
FIGS. 8 and 9 are schematic views showing the steps of the second embodiment of the method for manufacturing a lens of the present invention
FIGS. 10 to 12 are schematic structural views showing steps of a third embodiment of the method for manufacturing a lens of the present invention
Fig. 13 to 15 are schematic structural views showing steps of the fourth embodiment of the method for manufacturing a lens of the present invention.
Detailed Description
As can be seen from the background art, the prior art lens manufacturing method has difficulty in controlling the top surface profile, and the current lens manufacturing method has difficulty in being complicated.
In the lens manufacturing method shown in fig. 3, a stepped top surface profile is obtained by multiple exposure and etching, and specifically, the manufacturing method comprises: forming a first mask 21 on a substrate 20, and etching the substrate 20 through the first mask 21 to form a first step structure 22; forming a second mask 23 covering the top surface and the side wall of the first step structure 22 on the substrate, etching the substrate 20 through the second mask 23, and forming a second step structure 24 which is positioned below the first step structure 22 and has a size larger than that of the first step structure 22; a third mask 25 is formed on the substrate 20 to cover the top surfaces and sidewalls of the first step structure 22 and the second step structure 24, and the substrate is etched through the third mask 25 to form a third step structure 26 under the second step structure 24, thereby forming a stepped top surface profile. In the actual process, the size of each step is more refined, and the outline of the step-shaped structure is smoother, so that the lens with the three-dimensional curved surface outline is formed.
In addition, in the prior art, a gray-scale mask with various light transmittances is used for patterning, and the manufacturing involves repeated process steps, so that the manufacturing method is relatively complicated, and the process efficiency is influenced.
In order to solve the technical problem, an embodiment of the present invention provides a method for manufacturing a lens, including: providing a substrate; forming a soaking structure on a substrate, wherein the soaking structure and the substrate enclose a groove; adding a liquid masking material into the groove, so that the liquid masking material has a curved top surface due to surface tension; solidifying the liquid mask material to form a lens mask; and transferring the pattern of the lens mask into the substrate to form a lens.
The manufacturing method of the lens provided by the embodiment of the invention comprises the following steps: providing a substrate; forming a soaking structure on a substrate, wherein the soaking structure and the substrate enclose a groove; adding a liquid masking material into the groove, so that the liquid masking material has a curved top surface due to surface tension; solidifying the liquid mask material to form a lens mask; the pattern of the lens mask is transferred into the substrate to form the lens, and the lens with the curved top surface can be manufactured without repeated processes, so that the process is simplified, and the manufacturing efficiency is improved.
According to the embodiment of the invention, the liquid masking material is added into the groove, so that the liquid masking material has a curved top surface due to surface tension; the liquid masking material is then cured to form a lens mask also having a curved top surface, and the pattern of the lens mask is then transferred into the substrate to form a lens having a three-dimensional curved profile. The curved top surface formed by the surface tension of the liquid is integrally in a certain radian, so that the problem that the top is a plane is not easy to occur; in addition, the profile of the curved top surface of the lens mask, and thus the three-dimensional profile of the lens being manufactured, can be controlled by controlling parameters such as the size of the grooves, the amount of liquid masking material added to the grooves, or the wettability between the liquid masking material and the groove walls. According to the embodiment of the invention, the lens with the curved surface top surface can be manufactured without repeated processes, so that the process is simplified, and the manufacturing efficiency is improved.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
Fig. 4 to 7 are schematic views of a first embodiment of the method for manufacturing a lens of the present invention. The manufacturing method of the lens comprises the following steps:
as shown in fig. 4, a substrate 100 is provided to provide a carrier for formation of the lens. Specifically, the substrate 100 can be patterned by using a semiconductor etching process, so that the substrate 100 can be patterned by using the semiconductor etching process in the following step.
In this embodiment, the lens is a lens, and the lens can be applied to the fields of infrared remote sensing or imaging and the like. For example: the lens is a convex lens, and correspondingly, the top surface profile of the subsequent lens is a spherical surface with a curved structure.
In this embodiment, the target structure is a silicon lens, and therefore, the substrate 100 is a silicon substrate.
It should be noted that, in other embodiments, the substrate may also be other materials that can be patterned by using a semiconductor etching process according to a specific application scenario, and the material of the substrate may be determined by the use function of the lens.
Specifically, in other embodiments, the substrate may also be other semiconductor materials, such as germanium (Ge), silicon germanium (SiGe), silicon carbon (SiC), silicon germanium carbon (SiGeC), indium arsenide (InAs), gallium arsenide (GaAs), indium phosphide (InP), or other III/V compound semiconductors. Alternatively, the substrate may be a ceramic substrate of alumina or the like, a quartz or glass substrate, or the like. Referring to fig. 5a and 5b in combination, a side view and a top view are shown, respectively. A wetting structure 200 is formed on the substrate 100, and the wetting structure 200 and the substrate 100 enclose a groove 400.
The groove 400 is used to provide a space for forming a lens. The size of the groove 400 is comparable to the size of the lens to be formed, and the groove 400 may be formed according to the lens size design specification.
In this embodiment, the projection of the groove 400 on the substrate 100 is circular, so as to form a lens with a circular shape. In other embodiments the grooves may be provided according to the shape of the lens to be formed. For example, the lens has a rectangular (or square) shape, and accordingly, the projection of the groove 400 onto the substrate has a rectangular (or square) shape.
For example, the lens is a circular convex lens with a diameter D. Correspondingly, the groove 400 is a circular groove with a diameter D. The groove 400 may be designed for practical use according to the shape and size of the lens to be formed.
The wetting structure 200 is used to provide a solid sidewall that contacts the liquid mask material and produces a wetting effect.
In this embodiment, the wetting structure 200 is a protruding structure protruding from the substrate 100, and the protruding structure is a solid sidewall surrounding the substrate and forming an annular closed structure. Specifically, the step of forming the wetting structure 200 on the substrate 100 includes: forming an annular protrusion structure, which encloses a groove 400 with the substrate 100.
In an actual process, the annular protrusion structure may be formed on the substrate 100 by a sacrificial layer. Specifically, the step of forming the annular projection structure includes: forming a sacrificial layer on the substrate 100; forming a side wall layer on the side wall of the sacrificial layer; and removing the sacrificial layer to form the annular bulge structure.
In this embodiment, the lens to be formed is a circular lens, and the sacrificial layer is made of photoresist. A circular photoresist layer is formed at the position of a lens to be formed in an exposure and development mode, the circular photoresist layer plays a role in occupying space for the groove, and the size of the circular photoresist layer is the same as that of the circular lens to be formed.
And then, forming a hard mask material layer covering the top and the side wall of the circular photoresist layer and exposing the substrate by a chemical vapor deposition process.
Removing the hard mask material layer on the substrate 100 and on the top of the circular photoresist layer by dry etching; and removing the sacrificial layer through wet etching to form the annular protruding structure.
In this embodiment, the material of the annular protrusion structure is a hard mask material, for example: silicon oxide or silicon nitride, etc. The hard mask materials are dielectric materials commonly used by semiconductor process materials and have good process compatibility.
Referring to fig. 6a-6e in combination, a masking material 300 in a liquid state is added to the recess 400 such that the masking material 300 in a liquid state has a curved top surface due to surface tension.
The liquid masking material has stronger plasticity and flexibility because the liquid masking material has certain fluidity. In an actual process, the size and shape of the groove 400 may be adjusted, the amount of the liquid masking material added to the groove 400 may be adjusted, or the top surface morphology of the liquid masking material may be adjusted by adjusting the parameters such as wettability between the liquid masking material and the groove walls, so as to adjust the curved top surface profile of the cured lens mask, and further control the three-dimensional profile of the lens to be manufactured.
In this embodiment, the liquid mask material 300 is a liquid photoresist; the liquid mask material 300 is added into the groove 400 by dispensing.
In other embodiments, the liquid masking material 300 may also be a dry film, an epoxy resin, a polyimide, a phenolic resin, an acrylic resin, a silicone resin, a triazine resin, or the like.
In a combined comparison of fig. 6a and fig. 6b, under the premise that the size of the grooves is the same, the dispensing amount in fig. 6b is larger than that in fig. 6a, and the liquid surface tension in fig. 6b is larger, so that the top surface has a larger arc. That is, the amount of the liquid masking material added to the recess can be controlled according to the dispensing amount, thereby controlling the curved surface profile of the top surface. It should be noted that if the dispensing amount is too large, the problem of photoresist overflow is easily caused; if the dispensing amount is too small, the problem that the radian of the top curved surface is not obvious easily occurs, so that the subsequent pattern transfer step is influenced. Accordingly, in the present embodiment, the diameter of the circular groove 200 is in the range of 50 micrometers to 5 millimeters. In practical application, the dispensing amount is adjusted by combining the size of the groove according to the height and curvature of the lens to be formed, so that the height of the formed lens is smaller than half of the diameter, and the lens meets the design specification of the lens.
In combination with comparing fig. 6a, 6c and 6d, under the premise of the same dispensing amount, the size of the groove 201 in fig. 6c is larger than that of the groove 200 in fig. 6a, and the size of the groove 202 in fig. 6d is smaller than that of the groove in fig. 6 a. As can be seen by comparison, the larger the size of the groove, the larger the accommodation space of the liquid masking material 300, the smaller the surface tension, and thus the smaller the curvature of the curved top surface; the smaller the groove size, the smaller the accommodation space of the masking material 300 in the liquid state, the greater the surface tension, and thus the greater the curvature of the curved top surface. It should be noted that, if the size of the groove 200 is too small, the liquid mask material is difficult to enter the groove, which increases the difficulty of dispensing; if the groove 200 is oversized, it is difficult to form a contoured shape with a curved surface. Thus, the groove size can be adjusted with respect to the size and radius of curvature of the lens to be formed.
Referring to fig. 6e, a schematic diagram of the liquid masking material 300 and the surface of the solid groove 200 without wetting is shown. As shown in FIG. 6a, under the wetting effect, the liquid masking material 300 forms a convex surface for forming a convex lens (e.g., a convex lens); as shown in fig. 6e, the masking material 300 in a liquid state forms a concave surface for forming a concave lens (e.g., a concave lens) without a wetting effect. Therefore, the curved top surface of the liquid masking material 300 can be curved by controlling the wetting or non-wetting effect, so that lenses with different surface profiles and different functions can be formed.
The manufacturing method of the lens of the embodiment of the invention further comprises the following steps: and solidifying the liquid mask material to form the lens mask.
The liquid mask in the recess is transformed from a liquid state to a solid state by a curing process, thereby stabilizing the shape of the curved top surface in preparation for a subsequent pattern transfer step.
In this embodiment, the liquid mask material is a liquid photoresist, and the photoresist may be cured by baking (bake) to form a lens mask. The lens mask remains with the curved top surface of the liquid mask after curing. Specifically, baking is performed by means of ultraviolet irradiation or the like.
In other embodiments, the corresponding curing process is selected according to the liquid mask material actually used, so as to realize the conversion of the mask material from the liquid state to the solid state.
The manufacturing method of the lens of the embodiment of the invention also comprises the following steps: after adding a liquid mask material into the groove and before forming the lens mask, a shaping process is performed.
The shaping process can optimize the surface profile of the lens mask. Specifically, the liquid mask material is photoresist, and a photoresist reflow (PR reflow) process can be used, where the reflow process includes liquefaction and resolidification processes, so that the final lens mask surface can be smoother and has better symmetry.
As shown in fig. 7, the pattern of the lens mask is transferred into the substrate 100 to form a lens 501.
In this embodiment, the pattern transfer is realized by dry etching. Specifically, the etching rate of the dry etching process to the lens mask is set to be approximately equivalent to the etching rate to the substrate 100 (for example, the ratio of the etching rate of the dry etching process to the lens mask to the etching rate to the substrate 100 is 0.9-1.1), so that the curved top surface shape of the lens mask is transferred to the substrate 100, and the lens 501 with the curved surface is formed.
It should be noted that, in other embodiments, the ratio of the etching rate of the etching process to the lens mask to the etching rate of the etching process to the substrate is 1: (0.5-8), the etching process in the range can realize the transfer of the contour of the curved top surface of the lens mask into the lens.
In this embodiment, the lens mask is a photoresist, the substrate 100 is silicon, and the dry etching process may be a plasma dry etching process.
Specifically, the dry etching process may be performed using an etching gas containing fluorine. For example, the etching gas is SF4C4F8。
The wetting structure 200 is an annular protrusion structure made of a hard mask material. The material of the hard mask is harder to remove than the photoresist, so that the wetting structure 200 remains on the substrate 100 during the transfer of the pattern of the lens mask to the substrate 100. Accordingly, the method for manufacturing a lens of the present embodiment further includes, after forming the lens: and removing the annular bulge structure by a wet etching method.
Specifically, the annular protruding structure is made of silicon oxide, and the silicon oxide material is removed through diluted hydrofluoric acid.
Referring to fig. 8 and 9, there are shown schematic structural views of the steps of the second embodiment of the method for manufacturing a lens of the present invention.
The same parts of this embodiment as those of the first embodiment are not described again, and the difference between this embodiment and the first embodiment is:
the material of the annular protrusion structures 211 is the same as the liquid mask material. Specifically, the material of the annular protrusion structure 211 is photoresist.
As shown in fig. 8, after forming a liquid masking material in the recess, the annular raised structures 211 and the liquid masking material together constitute the lens mask.
As shown in fig. 9, in the process of transferring the pattern of the lens mask to the substrate 100, since the etching rate of the lens mask and the etching rate of the substrate 100 are approximately equivalent to each other in the dry etching process. The shape of both the annular raised structures 211 and the liquid masking material are transferred into the substrate 100.
Compared with the first embodiment, in the process of pattern transfer, the annular convex structure 211 is also removed, so that the steps of removing the annular convex structure can be reduced, and the process is further simplified.
Referring to fig. 10 and 12, there are shown schematic structural views of the steps of the third embodiment of the method for manufacturing a lens of the present invention.
The same parts of this embodiment as those of the first embodiment are not described again, and the difference between this embodiment and the first embodiment is:
in the present embodiment, the annular raised structure 211 is formed by the substrate 100, as shown in the side and top views of fig. 10a and 10b, respectively.
Specifically, the step of forming the annular protrusion structure 211 includes: forming an annular mask pattern layer on the substrate 100; and etching the substrate by taking the annular mask pattern as a mask to form the annular convex structure 211.
The annular mask pattern layer may be photoresist. The silicon substrate may be etched by a dry etching process to form the annular protrusion structure 221.
As shown in fig. 11, the groove is defined by an annular protrusion 221 made of a base material. In the step of dropping the liquid mask material 304 into the groove, the sidewall and the bottom of the groove where the liquid mask material 304 is located are made of the same material, which is silicon.
As shown in fig. 12, during the pattern transfer, the etching rate of the lens mask and the etching rate of the substrate 100 are substantially equivalent by the dry etching process, because the annular protrusion structure 221 is a part of the substrate 100, and therefore the etching rate of the lens mask and the etching rate of the annular protrusion 221 by the dry etching process are substantially equivalent, so that the shapes of the annular protrusion 221 and the lens mask are unified and transferred into the substrate 100.
Compared with the first embodiment, since the annular protrusion structure 221 is also removed during the pattern transfer process, the steps of removing the annular protrusion structure can be reduced, and the process is further simplified.
Referring to fig. 13-15, there are shown schematic views of the steps of a fourth embodiment of the lens manufacturing method of the present invention.
The same parts of this embodiment as those of the first embodiment are not described again, and the difference between this embodiment and the first embodiment is:
in this embodiment, the wetting structure is a groove formed on the substrate, as shown in the side and top views of fig. 13a and 13b, respectively.
Specifically, the step of forming the wetting structure on the substrate 100 includes:
forming a graphic layer 222 on the substrate 100 to cover the substrate 100; specifically, the patterning layer 222 is made of photoresist, and the patterning layer 222 of photoresist material may be formed on the substrate 100 through a coating process.
Thereafter, a recess 411 exposing the substrate 100 is formed in the pattern layer 222. Specifically, the step of forming the groove includes: the recess 411 is formed in the photoresist layer by means of exposure and development.
That is, in the present embodiment, the sidewall of the wetting structure is made of photoresist.
As shown in fig. 14, a masking material in a liquid state is injected into the recess 411. In this embodiment, the liquid mask material is a photoresist, and the liquid mask material is the same as the material of the pattern layer 222. Thus, after curing, the patterning layer 222 and the liquid masking material are fused together to form the lens mask 511.
Referring to fig. 15, in the pattern transfer process, the pattern of the lens mask 511 is transferred into the substrate 100, forming a lens 611.
In the embodiment, the soaking structure is formed by forming the groove in the pattern layer, so that the requirement on the process is not high, the problem of collapse and the like of the groove is not easy to occur, and the process stability is better.
According to the above embodiments, the profile of the curved top surface of the lens mask can be controlled by controlling parameters such as the size of the grooves, the amount of liquid masking material added to the grooves, or the wettability between the liquid masking material and the groove walls, thereby controlling the three-dimensional profile of the lens being manufactured.
In summary, the embodiment of the invention can realize the manufacturing of the lens with the curved surface top surface without repeated processes, thereby simplifying the process and improving the manufacturing efficiency.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (10)
1. A method of manufacturing a lens, comprising:
providing a substrate;
forming a soaking structure on a substrate, wherein the soaking structure and the substrate enclose a groove;
adding a liquid masking material into the groove, so that the liquid masking material has a curved top surface due to surface tension;
solidifying the liquid mask material to form a lens mask;
and transferring the pattern of the lens mask into the substrate to form a lens.
2. The method of manufacturing of claim 1, wherein forming the wetting structure on the substrate comprises: and forming an annular convex structure, wherein the annular convex structure and the substrate enclose a groove.
3. The method of manufacturing of claim 2, wherein the step of forming the annular protrusion structure comprises:
forming a sacrificial layer on the substrate;
forming a side wall layer on the side wall of the sacrificial layer;
and removing the sacrificial layer to form the annular bulge structure.
4. The manufacturing method according to claim 3, wherein the material of the annular protrusion structure is a photoresist or a hard mask material.
5. The method of manufacturing of claim 2, wherein the step of forming the annular protrusion structure comprises:
forming an annular mask pattern layer on the substrate;
and etching the substrate by taking the annular mask pattern as a mask to form the annular bulge structure.
6. The method of manufacturing of claim 1, wherein forming the wetting structure on the substrate comprises:
forming a pattern layer covering the substrate on the substrate;
and forming a groove exposing the substrate in the pattern layer.
7. The method of any of claims 1 to 6, wherein the grooves have a circular shape projected on the substrate.
8. The manufacturing method according to any one of claims 1 to 6, wherein the liquid mask material is a liquid photoresist;
and adding a liquid mask material into the groove in a dispensing manner.
9. The manufacturing method according to any one of claims 1 to 6, further comprising: after the liquid mask material is added into the groove and before the lens mask is formed, a shaping process is performed.
10. The manufacturing method according to any one of claims 1 to 6, wherein the lens mask pattern is transferred into the substrate by dry etching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011638221.3A CN114690282A (en) | 2020-12-31 | 2020-12-31 | Method for manufacturing lens |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011638221.3A CN114690282A (en) | 2020-12-31 | 2020-12-31 | Method for manufacturing lens |
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| CN114690282A true CN114690282A (en) | 2022-07-01 |
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| CN202011638221.3A Pending CN114690282A (en) | 2020-12-31 | 2020-12-31 | Method for manufacturing lens |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005158824A (en) * | 2003-11-20 | 2005-06-16 | Seiko Epson Corp | Depositing method, film, electronic device and electronic equipment |
| JP2008034832A (en) * | 2006-07-04 | 2008-02-14 | Semiconductor Energy Lab Co Ltd | Process for fabricating display |
| JP2009056402A (en) * | 2007-08-31 | 2009-03-19 | Sharp Corp | Method for manufacturing pattern film, pattern film, organic thin film transistor, organic light-emitting device, apparatus for dropping solution, and mask for manufacturing pattern film |
| KR20180031321A (en) * | 2016-09-20 | 2018-03-28 | 한국기계연구원 | Fabrication Method of Mold for Microneedle |
| CN112034540A (en) * | 2020-09-24 | 2020-12-04 | 北京北方华创微电子装备有限公司 | Processing method of micro-convex lens array structure |
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2020
- 2020-12-31 CN CN202011638221.3A patent/CN114690282A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005158824A (en) * | 2003-11-20 | 2005-06-16 | Seiko Epson Corp | Depositing method, film, electronic device and electronic equipment |
| JP2008034832A (en) * | 2006-07-04 | 2008-02-14 | Semiconductor Energy Lab Co Ltd | Process for fabricating display |
| JP2009056402A (en) * | 2007-08-31 | 2009-03-19 | Sharp Corp | Method for manufacturing pattern film, pattern film, organic thin film transistor, organic light-emitting device, apparatus for dropping solution, and mask for manufacturing pattern film |
| KR20180031321A (en) * | 2016-09-20 | 2018-03-28 | 한국기계연구원 | Fabrication Method of Mold for Microneedle |
| CN112034540A (en) * | 2020-09-24 | 2020-12-04 | 北京北方华创微电子装备有限公司 | Processing method of micro-convex lens array structure |
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